` soluble metal recovery improvement using high density thickeners in a ccd circuit ruashi ii a case...
TRANSCRIPT
![Page 1: ` Soluble Metal Recovery Improvement Using High Density Thickeners in a CCD Circuit Ruashi II a Case Study February 2009 M. Mulligan (Presenter) L. Bradford](https://reader030.vdocument.in/reader030/viewer/2022032708/56649e5d5503460f94b560b6/html5/thumbnails/1.jpg)
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Soluble Metal Recovery Improvement Using High Density Thickeners in a
CCD Circuit
Ruashi II a Case Study
February 2009M. Mulligan (Presenter)
L. Bradford
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Agenda
Introduction Thickener technologies Lab Simulations CCD Simulations High Density vs High Rate Thickeners
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Introduction
Ruashi is a Copper/Cobalt mine in the DRC Circuit overview: Leach-CCD-SX-EW Copper recovery is critical in the CCD circuit Lab & CCD simulations to optimise recovery Selection and design of the best thickener
technology
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Thickener Development
Conventional
High Rate – flocc + dilution
High density – flocc + dilution + compression
Paste – flocc + dilution + compression + residence time
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Different Thickener Technologies
Wt % Solids
Yie
ld S
tres
s, P
a
Filter Cake
Paste Thickener
High DensityThickener
Conventional
High RateThickener
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Counter Current Decantation (CCD)
Ruashi II CCD CircuitFLSmidth Minerals
High Density ThickenersFlocculant
Leach Residue
High Grade PLS
Low Grade PLS
Wash Liquor
Leach Residue
CCD1
CCD5
CCD4
CCD3
CCD2
Interstage Mix
Interstage Mix
Interstage Mix
Interstage Mix
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Lab Simulation
s
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Lab Simulations
Sedimentation testwork done within hours of the leach done at Mintek
Settling & flocculant flux curves 4 litre batch tests 4 litre continuous tests Rheology
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Optimal % Solids for Settling
Optimum = 7% – 8%
Ruashi Post Leach Slurry
Optimum Solids Flux
0
500
1000
1500
2000
2500
3000
3500
0.0% 2.0% 4.0% 6.0% 8.0% 10.0% 12.0% 14.0%
% Solids (m/m)
Se
ttlin
g F
lux
(k
g/h
/m2 )
10.0 g/t MF 1011 15.0 g/t MF 1011 20.0 g/t MF 101125.0 g/t MF 1011 30.0 g/t MF 1011 40.0 g/t MF 101150.0 g/t MF 1011 60.0 g/t MF 1011 70.0 g/t MF 1011
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Optimal Flocculant Dosage
Optimum = 50g/t
Ruashi Post Leach Slurry
Optimum Flocculant Dosage
0.0
10.0
20.0
30.0
40.0
50.0
60.0
5.0 15.0 25.0 35.0 45.0 55.0 65.0 75.0
Flocculant Dosage (g/t)
Se
ttlin
g R
ate
(m
/h)
4.0% 5.5% 7.0% 8.5% 10.0% 11.5% 13.0%
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Underflow % Solids vs Time
Batch: 55% Continuous: 59%
Ruashi Post Leach Sample Deep Tube Test Retention Time vs Solids Concentration
0.0
10.0
20.0
30.0
40.0
50.0
60.0
70.0
0.0 2.0 4.0 6.0 8.0 10.0 12.0 14.0 16.0
Elapsed Time, hr
Slu
rry S
olid
s C
on
cen
trati
on
, w
t%
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Rheology
Haake Viscometer Measure yield stress
of thickener u/flow Info used to size rake
drive
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Rheology
Ruashi Rheology
0
50
100
150
200
250
300
50.00 52.00 54.00 56.00 58.00 60.00 62.00 64.00
% Solids (m/m)
Yie
ld S
tres
s (P
a)
60 Pa at 59% Solids
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CCD Simulation
s
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CCD Simulations
Variables used in base case simulation
Wash Ratio
U/F Suspended Solids
Concentration (wt%)
Feed Suspended Solids
Concentration (wt%)
Soluble Cu Recovery
(%)
1.6 55 30 +99
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CCD Wash Recovery
C.C.D. THICKENERS CALCULATIONS
96.0
97.0
98.0
99.0
100.0
2 Stages 3 Stages 4 Stages 5 Stages 6 Stages 7 Stages
No. of Stages
Eff
icie
ncy
98% 99% 100%
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Sensitivity to Wash Ratio
SENSITIVITY TO WASH RATIO
80.0
82.0
84.0
86.0
88.0
90.0
92.0
94.0
96.0
98.0
100.0
No. of Stages
Eff
icie
ncy
@ 2.1 WR
@ 1.6 WR
@ 1.1 WR
@ 2.1 WR 93.52 97.48 98.95 99.55 99.80 99.91
@ 1.6 WR 91.21 95.74 97.76 98.78 99.31 99.59
@ 1.1 WR 87.37 92.15 94.61 96.08 97.02 97.65
2 Stages 3 Stages 4 Stages 5 Stages 6 Stages 7 Stages
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Sensitivity to Underflow % Solids
SENSITIVITY TO U/FLOW SOLIDS
96.00
97.00
98.00
99.00
100.00
No. of Stages
Eff
icie
ncy
@ u/f. Sol. (59%)
@ u/f. Sol (55%).
@ u/f. Sol. (51%)
@ u/f. Sol. (59%) 93.40 97.20 98.72 99.39 99.70 99.85
@ u/f. Sol (55%). 91.21 95.74 97.76 98.78 99.31 99.59
@ u/f. Sol. (51%) 88.40 93.65 96.21 97.63 98.46 98.96
2 Stages 3 Stages 4 Stages 5 Stages 6 Stages 7 Stages
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Counter Current Decantation (CCD)
Ruashi II CCD CircuitFLSmidth Minerals
High Density ThickenersFlocculant
Leach Residue
High Grade PLS
Low Grade PLS
Wash Liquor
Leach Residue
CCD1
CCD5
CCD4
CCD3
CCD2
Interstage Mix
Interstage Mix
Interstage Mix
Interstage Mix
U/f % Solids: 59%
Wash Ratio: 1.6
RECOVERY: > 99%
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High Density
vs High Rate
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High Density vs High Rate Thickeners
CCD wash recovery HD always has higher wash recovery per
stage for a given wash ratio
Capital cost implications Per thickener cost is similar – HD diameter
smaller Overall CCD plant costs less with HD – less
stages required
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Increase in Income
Copper Produced (tons/day)Thickener Type High Rate High DensityRecovery (%) 98.78% 99.39%Copper Produced (tons/day) 128.41 129.21Production Days (Days)Copper Produced (tons/year) 44,945 45,222Copper Price ($/ton)Income per Annum ($/year) 242,901,639 244,401,639
Increase per Annum ($/year)
350
5,404
Copper Recovery for 45,000tpa Plant
1,500,000
130.00
Based on 5 stages. Wash ratio = 1.6
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Thickener Design Differences
Higher tank sidewall depth Steeper tank floor slope Higher rake mechanism torque Rake mechanism – Pickets Thickener discharge cylinder
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Conclusions
Lab simulations & CCD simulations are important for decision making and design of a CCD plant
5 High Density thickeners give a better recovery than 6 High Rate thickeners for Ruashi
Capex and Opex costs both lower with High Density thickeners at Ruashi
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Questions ???