91 the effect of chloride ions on copper deposition l
TRANSCRIPT
7/30/2019 91 the Effect of Chloride Ions on Copper Deposition l'
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T h e E f f e ct o f C h l o r i d e I o n s o n C o p p e r D e p o s i t i o n l'2
W . H . G A U V I N A ND C . A . W I N K L E R
McGill Universi ty , Montreal , Canada
A B S T R A C T
A d d i t i o n o f c h l o r i d e i o n s t o a n a c i d i f i e d c o p p e r s u l f a t e s o l u t i o n h a d n o e f f e c t o n t h e
e l e c t r o d e p r o c e s se s b e l o w a de f i n it e m i n i m u m c o n c e n t r a t i o n , c o r r e s p o n d i n g t o t h e p r e -
c i p i t a t i o n o f c u p ro u s c h l o r i d e . T h e l a t t e r w a s a d s o r b e d b y t h e d e p o s i t a n d a c t e d a s a
m i l d a d d i t i o n a g e n t , d e c r e a s i n g th e g r a i n s i z e w i t h a c o r r e s p o n d i n g i n c r e a s e in h a r d n e s s
a n d r e f l e c t i v i t y o f t h e d e p o s i t , a n d a s m a l l i n c r e a s e i n p o l a r i z a t i o n . I n c r e a s e d p o w d e r
f o r m a t i o n a n d , a t h i g h c h l o r id e c o n c e n t r a t i o n , f o r m a t i o n o f c u p r o u s c h l o r i d e w e r e n o t e d
a t t h e a n o d e . T h e g e n e r a l b e h a v i o r w a s n o t a f f e c t ed b y t h e a d d i t i o n o f b in d a r i n e t o t h e
e l e c t r o l y t e , b u t g e l a t i n c o n s i d e r a b l y i n c r e a s e d t h e p o w d e r f o r m a t i o n , t h e l a t t e r b e i n g
m a x i m a l a t g i v e n c h l o r i de a n d g e l a t i n c o n c e n t r a t io n s , a n d p r e v e n t e d t h e c h l o r i d e f r o m
e n t e r i n g t h e d e p o s i t , p r e s u m a b l y d u e t o t h e f o r m a t i o n o f a g e l a t in - c u p r o u s c h l o r i d e
c o m p l e x .
I N T R O D U C T I O N
Addition of chlorides (NaC1 or HC1) to acidified
copper sulfate electrolytes has been common prac-
tice in copper refineries for many years. Indeed,
their presence may be considered essential, since
it keeps the silver ion concentration very low, and
minimizes the codeposition of antimony and bis-
mut h with copper. The chloride concentration used
is usually from 10 to 50 mg/1 (1, 2).
Little information is available on the effect of
chloride ion on copper deposition. It has been re-
ported that the presence of chloride decreases thegrain size of the deposit (3), though this has been
contradicted (4); while an increase in chloride ion
concentration from 0 to 0.12 g/1 has been stated to
cause a slight decrease in cathode polarization, with-
out change in the anode polarization (4). It has
also been reported that addition of chloride ions to
electrolytes containing sulfite liquor as additio n agent
prevents brittleness of the copper deposit (5).
The most thorough investigation was published by
Yao in 1944 (6). Working with pure acidified electro-
lytes, in the absence of addition agents, he found th at
an increase of concentration at low chloride con-
centrations resulted in small increases in cathode
polarization and Vickers Hardness Number, and a
large decrease in the grain size. At concentrations
greater than about 15 rag/l, however, cathode polari-
zation and hardness decreased sharply with chloride
concentration, while an increase in grain size was
observed.
1 M a n u s c r i p t r e c e i v e d A p r i l 2 3, 1 95 1. T h i s p a p e r p r e p a r e d
f o r d e l i v e r y b e f o r e t h e D e t r o i t M e e t i n g , O c t o b e r 9 t o 12 ,
1951.2 C o n t r i b u t i o n f r o m t h e P h y s i c al C h e m i s t r y L a b o r a t o r y ,
M c G i l l U n i v e r s i t y , w i t h fi n a n c i a l a s s i s t a n c e f r o m t h e N a -
t i o n a l R e s e a r c h C o u n c i l o f C a n a d a .
71
The present study was made in view of the many
aspects of copper deposition in the presence of chlo-
ride that still require explanation, and in particular
to determine the effect of chloride in the presence
of addition agents, about which no information was
available in the literature.
E X P E R I M E N T A L
Reagent grade copper sulfate pentahydrate, sul-
furic acid, and sodium chloride were used through-
out. The composition of the electrolyte was the
same for all experiments, and consisted of 125 g/1
of copper sulfate pentahydrate and 150 g/1 of sul-
furic acid. Deposits were obtained on a cathode
between two anodes of high purity at a current
density of 2 am p/dm 2. Glass b atte ry jars were used,
and no agitation was provided. The same precau-
tions observed in previous studies (7-9) were again
followed for preparing and cleaning the electrodes,
and for drying the deposits. Chloride concentrations
were determined potentiometrically, using a silver-
silver chloride electrode as reference electrode. This
method was also used in the presence of addition
agents, since recently published results (10) con-
firm earlier conclusions (11) and indicate that theaccuracy of the method is little affected by proteins.
The effects of chloride were studied with gelatin
and with bindarine present in the electrolyte. Both
substances are commonly used in copper refining,
the former as glue, the lat ter as a by-product of the
sulfite pulp industry containing 50 to 60 per cent
calcium lignosulfonate as the active material.
R E S U L T S
in preliminary experiments, it was observed tha t
addition of chloride ion as sodium chloride to the
electrolyte had no obvious effect on deposition be-
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72 JOURNAL OF THE ELEC TROC HEMI CAL SOCIETY February 1952
low a minimum concentration, which was quite re-
producible and amounted to 9 rag/1 at 25~ and
abou t 19 mg/1 at 50~ Above this minimum con-
centrati on, th e deposits became finer grained and
gradua lly changed to a salmon pink color. Increased
concentrations gave increased fineness to the struc-
ture.
Above the minimum concentration, t he anode proc-
esses were also affected. Corrosion was more ir-
regular and pitting and irregular depressions were
frequently observed. Differences in thickness showed
that solution occurred mainly from the upper part
of the anodes. A great deal of very fine copper powder
O O'0eI: k
L dC i
Z O04
h i
O
O 002_ J
TID
r1 -
Ota J
h A
C)
~9
Z
h J
b 9
OZ
- 0 . 1
- 0 . 2
f o w
yI , [
- 0 ' 3 , J t r
0 100 200 300 400 50 0
CHLORIDE ION, MG PER LITE R
F I G . ] Top: E f f e c t of c h l o r i d e c o n c e n t r a t i o n o n t h e
c h l o r i d e i n t h e d e p o s i t . Bottom: E f f e c t o f c h l o r i d e c o n c e n -
t r a t i o n o n t h e c a t h o d e e x c e s s w e i g h t ( A ) in t h e a b s e n c e o f
a d d i t i o n a g e n t ; ( B ) i n t h e p r e s e n c e o f g e l a t i n .
was found to accumulate d irectly under the" latt er
at the bottom of the cells, at both 25 ~ and 50~At still larger concentrations, less and less copper
powder was formed, b ut a grayish white precipitate
began to appear on the anodes, partially covering
them, and slowly accumulating in the cells in the
form of very thin flakes. Analysis showed that this
materi al was cuprous chloride. At sufficiently high
concentrations of chloride, the film completely sur-
rounded the anodes, and increased the anode polari-
zation severely. Analysis of the electrolyte showed
that the chloride ion concentration became depleted
at a fairly rapid rate especially at higher concentra-
tions. These effects were shown to be due to chloride
ion rather than sodium ion by the observation that
addition of sodium sulfate instead of sodium chloride
had no effect on the e lectrode processes, even afte r
prolonged electrolysis.
Presence of Chloride in the D eposits
Large deposits (avg wt 22.7 g) were obtained in
the presence of increasing amounts of chloride and
were stripped off the cathode which had been previ-
ously dipped in a solution of beeswax in carbon
tetrachloride. The deposits were dissolved ill 50 per
cent nitric acid, and their chloride content deter-
mined electrometrically with the results shown in Fig.
1, top.
Identical determinations when 50 mg of bindarine
was present in the electrolyte showed that, within
the experimental error, the amount of chloride en-
tering the deposit was not affected by this addition
agent. On the other hand, deposits obtained in thepresence of 10 and 50 mg/1 of gelatin contained no
chloride at the lower chloride concentrations, and
only traces could be detected at chloride concentra-
tions above 300 mg/1.
Increase in Weight o f Cathode Deposits
The excess weights of copper deposits obtained
in the presence of increasing amounts of chloride ions
were determined relative to the weight of a deposit
obtained in series under the same conditions, but
in the absence of these ions. The results, expressed
on the basis of the weight of the deposit in the coulom-eter in series, are shown in curve A, Fig. 1, bottom,
for a temperat ure of 25~ Addition of 50 mg/1 of
bindarine to the system did not in any way affect
these results, but addition of 50 mg/1 of gelatin
(curve B, Fig. 1) caused no increase in the excess
weight at tow concentration and gave a sharp de-
crease in cathode weight at concentrations above
100 rag/1.
Reflectivity and P hysical Appearance of Deposits
A previous study of the reflectivity of copper de-
posits (12) has shown that this property is verysensitive to minute changes in crystal size and orien-
tation. The change in the reflectivity of the deposit
caused by an increase in the chloride content of the
electrolyte was determined relative to a polished
silver standard, with the results shown in Fig. 2,
top. A definite increase in reflectivity was observed
up to a concentration of approximately 100 mg/1.
The slight decrease at higher concentrations is prob-
ably not to be ascribed to an increase in crystal
size, but to an increased roughening of the surface
and the appearance of irregularities on the deposits,
even after a short period of deposition.
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Vol. 99, No. 2 EFF ECT OF CHLOR IDE IONS ON Cu DEPOSITION 73
Gelatin increases the reflectivity of copper de-
posits to a considerable extent (12) and addition of
chlorides in concentrations up to 100 rag/1 did not
decrease it. At higher concentrations, however, Jr-
regularities and excrescences began to appear, which
decreased the refleetivity. Bindarine, on the other
hand, when present alone in an electrolyte (12) in-creases the reflectivity to an extent comparable with
that for chloride in Fig. 2. No appreciable changes
were observed when chloride was added, except th at
at high chloride concentrations, deep convection
current lines and irregularities were again observed
in the deposits.
2O>_-
h-
- 1 5I-L)kdJ
ks_w I 0rr
uJ>- 5F-<_1Wrr
OZ 80/
JL,J
75
OO 70r r
,n 65i, i
Zd3
a:: 60
:Z
I 1 I I
I I I I I I100 200 300
CHLORIDE ION, MG PER L ITER
F r o . 2 . Top: E f f e c t o f c h l o r i d e c o n c e n t r a t i o n o n t h e r e -
f l e c t i v i t y o f t h e d e p o s i t . Bottom: E f f e c t o f c h l o r i d e c o n c e r t -
t r a t i o n o n t h e h a r d n e s s o f th e d e p o s i t .
Hardness of Deposits
In Fig. 2, bottom, is plotted the relation between
chloride concentration and hardness of the deposit
as obtained with a Rockwell Hardness Tester, using
a ~-in. penetrator and 60-kg load, due precautions
being taken to minimize the effect of the base metal.
The maximum effect is comparable with that when
the electrolyte contained 50 rag/1 of bindarine alone
(82 Rockwell Number), but considerably smaller
than that when the electrolyte contained gelatin
(a Rockwell Number of 90.5 for 20 mg/1 of gelatin).
As with reflectivity, the hardness of deposits ob-
tained in the presence of gelatin or bindarine is not
affected when chlorides are added to the electrolyte.
Cathode Polarization
Measurements of the anode mid cathode polariza-
tions are most easily made in a Haring cell (13) with
good accuracy and reproducibility of results, pro-
riding the same initial surface is always used, and
sufficient time is allowed for steady state values to
be reached (7). Starting with an initial cathode
surface deposited at 25~ at an apparent current
density of 2 amp/dm', the rate of attainment of
steady state polarization values in the presence of
various amounts of chloride is shown by the typical
curves in Fig. 3. It should be noted that the values
observed after a few minutes of eleetrolysis--a pro-
cedure which was followed by Yao (6) are con-
siderably different from the final steady st ate values.
The effect of chloride ion on the steady state cathode
polarization is also shown in Fig. 3.
> 9 0B
8 5
! i 84
7s
0 1 O 2 0 3 0 4 0 5 0 6 0 2 0 4 0 6 0 8 0 1O O
T l i X / I E - M I N U T E S C H L O R I D E I O N , ~ ,/ IC ~ P E R L I T E R
F I G . 3 . Left: V a r i a t i o n o f c a th o d e p o l a r i z a t i o n w i t h
t i m e , i n t h e p r e s e n c e o f ( A ) 1 0 ra g , ( B ) 2 0 r a g , ( C ) 4 0 n ag , a n d
( D ) 1 0 0 i n g p e r l i t e r o f c h l o r i d e i o n . Right: V a r i a t i o n o f
s t e a d y s t a t e c a t h o d e p o l a r i z a t i o n w i t h c h l o r i d e i o n c o n c e n -
t r a t i o n .
No effect on the polarization measured in the
presence of 5 mg/1 of gelatin, or of 50 mg/1 bindarine,
was observed when 100 rag/1 of chloride ion was
added to the electrolyte.
Anode Solution, Copper Powder, and C~tprous
Chloride Formation
In an effort to explain some of these results, a
study was made of the effects of increased chloride
concentrations on the rate of solution of the anodes,
and on the formation of copper powder and cuprous
chloride. The extent of solution of the anodes was
found by direct weighing. At the end of the deposi-
tion, the electrolyte was filtered through a tared
sintered glass crucible, the powder and precipitate
washed with small portions of dilute sulfurous acid,
dried, and weighed. The total weight of copper
powder and cuprous chloride was thus obtained.
The cuprous chloride was then dissolved, the copper
powder weighed, and the weight of cuprous chloride
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74 JOURNAL OF THE ELECT ROCHE MICA L SOCIETY February 1952
obtained by difference. The extent of anode solution
and of copper powder and cuprous chloride forma-
tion (the latter in terms of its copper content) were
calculated on the basis of the weight of the copper
deposited on the cathode in the coulometer in series.
The results are given in Table I. The peculiar be-
havior of anode corrosion in presence of chloride ions
has already been mentioned, but it was particularly
unusual at 2~ at which tempe ratu re the lower
part of the anode was covered with a pinkish zone,
very even and smooth, strongly reminiscent of the
appearance of an electrodeposit, and considerably
thicker than the rest of the electrode.
TABLE I. Copper powder and cuprous chloride format ion
C h l o r i d e i o n A n o d e C o p p e r C u C I I C o p p e r i nin solut ion solution powde r preci pitat e CuCI
mg/l % % [ % . %
Tempera ture: 25~ Current, density: 2 amp/din 2
0
10
30
50
100
250
500
100.7
102.6
102.6
102.4
101.5
102.3
103.1
0.22
1 . 9 3
1.96
1 . 7 5
0.68
0.22
0.16
0.4O5
3.07
3.78
I
0.26
1 . 9 7
2.43
Temperature
0
30
50
100
250
500
: 50~ Current densit y: 2 amp/din 2
0.28
1 . 4 3
1.52
1.22
0.34
0.21
102.1
103.3
103.5
103.2
104.0
104.6
i
0.11
2.263.47
m
0.07
1 . 4 1
2.23
Temperat ure: 2~ Current density: 1 amp/ dm ~
0
0
50
50
100
100
100.1
100.1
104.9
104.1
102.8
102.9
0.05
0.04
4.75
3.70
0.39
0.67
I
I
0.125
3.27
3.22
I
I
I
0.08
2.09
2.07
indicated that, within the experimental error, the
anode processes were not altered by the presence of
bindarine. In the presence of 50 mg of gelatin, Fig. 4
shows the same trends as in the absence of addition
agent, with the striking exception that the copper
powder formation was now considerably greater, re-
presenting 33.8 per cent of the coulometer deposit
weight for the optim um concent ratio n of 50 rag/1 of
chloride. Keeping the chloride at the latter con-
centration, an even greater yield amounting to 39.5
per cent of the coul ometer deposit, could be obtained
I' -
o
3,.D
LdI- "
~ o 2 0
9
o
L l 0o
0
Ld[Ln 0 I O 0 2 0 0 3 0 0
o CHLORI DE ION, MG PER LITER
FIG. 4. Effect of chloride concentration on the copper
powder and cuprous chloride formation in the presence of
gelatin. Insert: Copper powder formation in the presence
of 50 mg/l of chloride ion and varying amounts of gelatin.
9 C O P P E R P O W D E R 2 5 ~ 0 ~ " ~ ' o
o , , " ' 5 0 ~ ~ I
9 C O P P E R I N C u C I , 2 5 ~ I
TABLE II. Anode polariza tion in )resence of :hloride ions
C h l o r i de G e l a t i n B i n d a r i n e D e p o s i t i o n A n o d ei o n s p o l a r i z a t i o nr a g / I r ag ,. 1 m g / I h r m v
0
100
500
500
100
500
500
_ _ I
_ _ L
I
- - 5 0
- - 50
20
31.5
65.2
431.9
532.3
94.3
387.0
1050
Table I shows that, without addition of chloride
ion, the powder formation was quite small and in-
creased with temperatur e. In the presence of chloride,
the powder formation passed through a maximum
at a given temperature, then decreased sharply,
while the cuprous chloride formation increased. Max-
imum copper powder formation also seemed to de-
crease as the temperature increased. Finally, the
difference between the amount of anode dissolved
and the sum of copper going to powder and to
cuprous chloride remained approximately constant
at a given temperature.
Results obtained with increasing amounts of chlo-
ride ions and a fixed amount of bindarine (50 mg/1)
with 200 mg/1 of gelatin, as shown by the insert in
Fig. 4.Anode Polarization
Measurements of the anode polarization showed
tha t at 25~ and 2 amp /d m 2, chloride ion had no
effect whateve r until cuprous chloride formed, above
the minimum chloride concentration required. It
then rose slowly, with marked irregularities when
flakes of cuprous chloride became detach ed from the
anode. It was observed to increase more regularly
when a complete film of cuprous chloride surrounded
the anodes. Table II shows values of the anode
polarization at different times of deposition and for
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Vo l . 9 9 , No . 2 E F F E C T O F C H L O R I D E I O N S O N C u D E P O S I T I O N 75
d i f f e r e n t e l e c t r o l y t e s . T h e f i r s t v a l u e , i n t h e a b s e n c e
o f c h lo r i d e io n , is a s t e a d y s t a t e v a l u e w h i c h r e m a i n s
e s s e n t ia l l y c o n s t a n t a f t e r t h e f i rs t h o u r o f d e p o s i t i o n .
T h e o t h e r v a l u e s s h o w e d m a r k e d f l u c t u a t i o n s a s
d e p o s i t i o n p r o g r e s s e d a n d a r e g i v e n m e r e l y t o i n d i-
c a t e t h e o r d e r o f m a g n i t u d e . I t s h o u l d b e m e n t i o n e d
t h a t t h e p a r t i M p a s s i v i t y i n d i c a t e d b y t h e h i g h
p o l a r i z a t i o n v a l u e s , e s p e c i a l ly i n t h e p r e s e n c e o f
g e l a t i n , m e r e l y r e f l e c t s t h e i n c r e a s e i n p o t e n t i a l
n e e d e d t o m a i n t a i n a g i v e n c u r r e n t d e n s i t y w i t h
i n c r e a s e d r e s i s t a n c e o f t h e c u p r o u s c h l o r i d e f i l m .
DISCUSSION
C a r e f u l c o n s i d e r a t i o n o f t h e m e c h a n i s m o f c o p p e r
d e p o s i t i o n f r o m s u l f a t e s o l u t i o n s i s r e q u i r e d b e f o r e
a s a t i s f a c t o r y e x p l a n a t i o n f o r s o m e o f t h e r e s u l t s
p r e s e n t e d c a n b e o f f e r e d .
I f a s h e e t o f c o p p e r is i m m e r s e d i n a c o p p e r s u l f a t e
s o l u t io n , i n t h e a b s e n c e o f a n y c h l o r id e s o r a d d i t i o na g e n t s , t h e f o l l o w i n g r e a c t i o n w i l l o c c u r u n t i l e q u i l i b -
r i u m p r e v a i l s a t t h e m e t a l - s o l u t i o n i n t e r f a c e :
Cu ++ + Cu +~- 2C u +. ( I )
F r o m t h e e q u i l i b r iu m c o n s t a n t fo r t h i s r e a c t i o n
( 1 4 - 1 6 ), i t c a n b e c a l c u l a t e d t h a t t h e e q u i l i b r i u m
c o n c e n t r a t i o n o f c u p r o u s i o n s i n t h e b o d y o f a 0 .5
m o l a r c o p p e r s u l f a t e s o l u t i o n , s u c h a s t h a t u s e d i n
t h i s i n v e s t i g a t i o n , w o u l d b e c l os e t o 0 . 8 7 . 1 0 - 3 g r a m
m o l e / 1 a t 2 5 ~ I n t h e a b s e n c e o f t h e m e t a l o r o f a
s u i t a b l e p r o c e s s t o m a i n t a i n t h e c u p r o u s i o n c o n -
c e n t r a t i o n , t h e l a t t e r w i ll c o n t i n u o u s l y d e c r e a se ,
o w i n g t o o x i d a t i o n b y d i s s o l v e d a t m o s p h e r i c o x y g e n
i n a c i d i c s o l u t i o n s , o r t h r o u g h h y d r o l y s i s ( 1 7 ) . S i m -
i l a r l y , i t i s p o s s i b l e t o e s t i m a t e ( 1 8 ) t h e e q u i l i b r i u m
c o n c e n t r a t i o n o f c u p r o u s i o n s i n t h e a n o d e f i l m t o
b e a p p r o x i m a t e l y 1 . 1 0 - 3 g r a m m o l e /1 a n d t h a t i n
t h e c a t h o d e f il m t o b e a p p r o x i m a t e l y 0 . 6 5 . 1 0 -~
g r a m m o l e / 1 u n d e r t h e o p e r a t i n g c o n d i t i o n s u se d .
T h e f a c t t h a t t h e c u p r o u s i o n s a r e li k e l y t o b e p r e s e n t
i n t h e f o r m o f t h e c o m p l e x ( C u S O 4 ) - d o e s n o t i n
a n y w a y a l t e r t h i s d i s c u s s i o n .
I f c h l o r id e io n s a r e n o w a d d e d t o a n e q u i l i b r i u m
s o l u t i o n o f c u p r i c a n d c u p r o u s i o n s s t i l l w i t h o u t
e l e c t r o l y s i s , f o r m a t i o n o f t h e l i t t l e s o l u b l e C u C 1p r o c e e d s a c c o r d i n g t o t h e e q u a t i o n
C u + + C 1 - ~ C u C I . ( I I )
U s i n g 2 . 2 . 1 0 - 7 as t h e v a l u e o f t h e s o l u b i l it y p r o d u c t
c o n s t a n t a t 2 5 ~ ( 1 4 ), i t c a n b e c a l c u l a t e d t h a t f o r
a 0 . 5 m o l a r c o p p e r s u l f a t e s o l u t i o n , p r e c i p i t a t i o n o f
C u C 1 w i ll c o m m e n c e w h e n t h e c o n c e n t r a t i o n o f c h lo -
r i d e i o n i s g r e a t e r t h a n 2 . 5 . 1 0 - 4 g r a m m o l e / l , o r
8 .9 r a g/ 1 . T h e e x p e r i m e n t a l o b s e r v a t i o n t h a t d e p -
o s i ti o n b e g i n s t o b e a f f e c te d b y t h e p r e s e n c e o f
c h l o r id e io n a t a p p r o x i m a t e l y t h i s c o n c e n t r a t i o n
g i v e s s t r o n g r e a s o n t o a s s u m e t h a t C u C 1 , s t i l l i n
c o l l o i d a l f o r m s i n c e i t h a s h a d n o t i m e t o g r o w i n t o
a v i s i b l e p r e c i p i t a t e , i s r e s p o n s i b l e f o r t h e a d d i t i o n
a g e n t e f f e ct o f c h l o ri d e s. T h i s i s f u r t h e r s u p p o r t e d
b y t h e a d s o r p t i o n t y p e o f c u r v e f o r t h e c h l o r i d e c o n -
t e n t o f t h e d e p o s i t ( F i g . 1 ). T h e s o l u b i l it y p r o d u c t
c o n s t a n t a t 50 ~ c o u ld n o t b e o b t a i n e d f ro m p u b -
l is h e d d a t a , b u t c a n b e e s t i m a t e d t o b e 1 . 2 . 1 0 - 6
f r o m t h e m i n i m u m c o n c e n t r a t i o n t h a t w i l l a f f e c t
d e p o s i t i o n a t t h i s t e m p e r a t u r e . I t m u s t b e p a r -
t i c u l a r l y n o t e d t h a t s o l u t i o n o f C u C 1 t o f o r m t h e
c o m p l e x i o n ( C u CI _~ )- a c c o r d i n g t o t h e e q u a t i o n
C u C 1 + C I - ~ - ( C u C1 2 )- ( I I I )
c a n o c c u r t o a p p r e c i a b l e e x t e n t o n l y in t h e p r e s e n c e
o f c o n s i d e r a b l y l a r g e r c o n c e n t r a t i o n o f c h l o ri d e i o ns
t h a n w a s u s e d i n t h i s i n v e s t i g a t i o n ( 1 7 , 1 9 - 2 1 ) .
T h e A n o d e P r o c es s es
S o f a r , o n l y e q u i l i b r i u m c o n d i t i o n s i n t h e a b s e n c eo f e l e c t r o l y s i s h a v e b e e n c o n s i d e r e d . I f t h e p r o c e s s e s
o c c u r r i n g a t t h e a n o d e d u r i n g e l e c t r o l y s is in t h e
a b s e n c e o f c h l o r i d e o r a d d i t i o n a g e n t s a r e n o w e x -
a m i n e d , t h e f o l lo w i n g t h r e e r e a c t i o n s a r e p o s s i b l e :
Cu ~ Cu +~ + 2e , ( IV)
Cu - -~ Cu + + e , (V)
Cu+ - -~ Cu++ + e . (V I)
E q u a t i o n ( I V ) p r e d o m i n a t e s d u r i n g a n o d i c s o l u ti o n .
S i n c e t h e a n o d e f i l m c o n t a i n s c u p r o u s i o n s i n c o n -
c e n t r a t i o n h i g h e r t h a n i n t h e s o l u t i o n , t h e s e i o n sp a s s b y m i g r a t i o n a n d d i f f u s i o n a c r o s s t h e a n o d e
f il m . U p o n r e a c h i n g t h e s o l u t i o n s i d e o f t h i s l a y e r ,
a r e g i o n w h e r e t h e e q u i l i b r i u m c o n c e n t r a t i o n o f
c u p r o u s i o n s i s l e s s , r e a c t i o n ( I ) g o e s t o t h e l e f t ,
a n d m e t a l l i c c o p p e r i s p r e c i p i t a t e d a s a v e r y f i n e l y
d i v i d e d p o w d e r . T a b l e I s h o w s t h a t , i n t h e a b s e n c e
o f c h l o r i d e s , t h i s p o w d e r f o r m a t i o n i s r a t h e r s m a l l ,
s i nc e m o s t o f t h e c u p r o u s i o n s d i f f u si n g f r o m t h e
a n o d e f il m m e r e l y s e r v e t o r e - e s t a b li s h t h e c u p r o u s
i o n c o n c e n t r a t i o n i n t h e s o l u t io n , w h i c h i s c o n s t a n t l y
b e i n g d e p l e t e d b y o x i d a t i o n a n d h y d r o l y s i s . I t i s
i n t e r e s t i n g t o n o t e t h a t , u p o n f o r m a t i o n o f m e t a l l i c
c o p p e r a c c o r d i n g t o r e a c t i o n ( I ), a n e q u i v a l e n t
a m o u n t o f c u p r i c i o n s i s a l s o f o r m e d , r e s u l t i n g i n a
s t e a d y i n c r e a s e o f t h e c u p r i c io n c o n t e n t o f t h e s o l u -
t i o n a s e l e c t r o l y s i s p r o c e e d s . S i m i l a r l y , t h e a c i d i t y
w i l l s l o w l y d e c r e a s e w i t h t i m e , o w i n g t o t h e o x i d a -
t i o n o f c u p r o u s i o n s i n t h e s o l u t i o n . S in c e t h e c u p r o u s
i o n s c o n t i n u o u s l y l e a v i n g t h e a n o d e f il m m u s t b e
r e p l a c e d t o m a i n t a i n t h e e q u i l i b r i u m v a l u e , r e a c t i o n
( V ) m u s t a l s o o c c u r c o n c u r r e n t l y w i t h ( I V ) , a n d i t
i s s e e n a t o n c e t h a t c o p p e r , e v e n u n d e r i d e a l c o n d i-
t i o n s , m u s t d i s s o l v e a n o d i c a l l y w i t h a t l e a s t s l i g h t l y
g r e a t e r t h a n 1 0 0 p e r c e n t e f f i c i e n c y .
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76 JOURNAL OF THE ELEC TROC HEMI CAL SOCIETY February 1952
If now the Mdition of chloride ions to the solu-
tion is considered, the free chloride migrating to the
anode film will cause further prec ipitation of cuprous
chloride. The amount of cuprous chloride formed in
the film will be considerably larger than in the body
of the solution and cuprous chloride will diffuse
across the anode layer. Two possibilities must now
be considered in turn. If the original addition of
chloride to the solution was small, say up to about
50 rag/l, the concentr ation of Cu + ions in the solu-
tion will not be appreciably decreased and will soon
be restored to the equilibrium value. It will be possi-
ble for the molecules of CuC1 which have diffused
away from the anode layer to dissociate back into
chloride and cuprous ions according to equa tion (II),
and the latter will, in turn, precipitate metallic
copper since the equilibrium value for the cuprous
ions is now exceeded. Powder formation in the pres-
ence of chlorides will therefore follow the overallreaction:
2CuC1 ~ Cu ++ + 2C1- + Cu. (VII)
However, if large additions of chloride have been
made to the solution, the concentration of free cup-
rous ions in the solution will be drastically reduced,
its free chloride ion concentration will be corre-
spondingly increased, and although the formation of
cuprous chloride in the anode film will be higher, less
and less of the CuC1 diffusing across the anode layer
will dissociate according to the above equation as the
chloride conten t increases. Table I clearly shows that
as the yield of copper powder decreases after pass-ing through a maximum, that of cuprous chloride
increases. Anode convection currents will at first
wash away the undissoeiated salt, and may even
carry it to the cathode, where its presence may be
responsible for the deep vertical convection lines
which have been observed. At still higher concen-
trations of chloride, the cuprous chloride forms a
slowly growing film on the anode.
The effect of chloride ions on the anode processes
does not seem to be altered in any way when
bindarine is added to the system, but it is strikingly
changed when gelatin and chloride are both present.
Whereas a maximum powder formation amounting
to about 2 per cent of the weight of the deposit in
the coulometer was observed at 25~ in the presence
of chloride alone, opt imum concentra tions of chloride
and gelatin increased the powder formation to 39.5
per cent, indicating that the anode now dissolved
largely in the cuprous form. This phenomenon can be
explained in the light of the proposed mechanism if
it is assumed that the effective concentration of
cuprous chloride in the solution is radically decreased,
allowing the dissociation of the salt formed in the
anode film to proceed unhampered upon diffusion to
the solution side of the anode layer. Formation of a
complex between cuprous chloride and gelatin ap-
pears to be a reasonable possibility, as it has been
shown to occur at least in basic media not only with
gelatin but with other proteins as well (22-2t). The
large increase in powder formation can be explained
by accelerated diffusion under the influence of a
much larger effective concentra tion gradient.
The Cathode Processes
In the absence of chlorides or addition agent, the
three following cathode reactions are possible:
Cu++ + 2e ~ Cu, (VIII)
Cu + -t- e --* Cu, (IX)
Cu ++ + e+ Cu +. (X)
Under steady state conditions in the cathode film,
reaction (VIII) preponderates, since (IX) cannot
occur until the potential requirements for the dep-
osition of cuprous ions are met. If the cuprous ion
concentration demanded by equation (I) were at all
times maintained, reaction (VIII) would be the only
one to occur, and two faradays of electricity would
convert one gram ion of cupric ions to metallic
copper. The efficiency of deposition in this case
would be 100 per cent. In practice, however, de-
pletion of the cuprous ions does occur, and to restore
the equilibrium, reaction (X) must take place to
some extent, resulting in less than 100 per centefficiency of deposition. It can be predicted, there-
fore, that all conditions leading to depletion of the
cuprous ions by favoring its oxidation and hydrolysis,
such as dissolved oxygen, low acidity, high temper-
ature, low apparent current density (or, alterna-
tively, current densities near the critical value), will
decrease the cathode efficiency. Ample experimental
evidence has been presented to support these views.
As an example of an extreme case, it is possible to
electrolyze a strong, hot copper sulfate solution at
low current density with no copper whatever de-
positing at the cathode, the whole of the current
being used for the conversion of cupric to cuprous
ions (25, 26).
The cathode behavior will not be greatly affected
in the presence of small additions of chloride, since
no appreciable depletion of the cuprous ions in the
film occurs, and deposition will proceed normally
except for the addition agent effect resulting from
adsorption of CuC1, with a corresponding increase in
weight of the deposits, as shown by the first part of
curve A, Fig. 1, bottom. But when the chloride ion
concentration is high, the cuprous ions concentration
will be depleted to a much greater extent, and the
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Vo l . 99 , No . 2 E F F E C T O F C H L O R I D E I O N S O N C u D E P O S I T I O N 7 7
reduction of Cu ++ to Cu+ [reaction (X)] will proceed
to an increasing extent, resulting in decreased dep-
osition efficiency. The second part of curve A, Fig.
1, bottom, occurring beyond a critical chloride ion
concentrati on of between 50 and 75 mg/1, is really a
composite curve, representing a combination of the
increase in weight due to CuC1 adsorption, and the
decrease due to lowered deposition efficiency.
Addition of bindarine to an electrolyte containing"
chloride ions does not in any way alter the various
effects on the cathode process observed in the pres-
ence of chloride alone. Cuprous chloride is still ad-
sorbed by the deposit, and to very nearly the same
extent. Gelatin, however, appears to prevent the ad-
sorption of CuC1 by the deposit, as shown by the
analyti cal tests, and also by the first part of curve B,
Fig. 1, bottom, which does not exhibit the regular
increase due to adsorption in presence of chloride
alone. However, the second par t of this curve closelyfollows the behavior of curve A, indicating that the
depletion of cuprous ions in the cathode film must
again operate. These observations, of course, support
the assumption previously made that the effective
concentrat ion of CuC1 in the solution is considerably
reduced by the formation of a gelatin-cuprous
chloride complex.
In an effort to explain the depression observed in
the polarization-chloride ion concentration curve
(Fig. 3), fur ther expe riments were made a t low halide
concentrations in the presence of gelatin. Entirely
new phenomena were encountered, discussion of
which will be presented in a subsequent paper.
A C K N O W L E D G M E N T
Grateful acknowledgment is made to the Com-
mittee on Research, McGill University, for financial
assistance in the preparation of this manuscript.
A n y d i s c u s s i o n o f t h i s p a p e r w i l l a p p e a r i n a D i s c u s s i o n
S e c t i o n , t o b e p u b l i s h e d i n t h e D e c e m b e r 1 95 2 i s s ue o f t h e
JOURNAL.
R E F E R E N C E S
l . Y U -LIN YAO, Trans . E lec trocbem. Sou . , 8 6 ,3 6 5 (1 9 4 4 ) .
2 . ANON., C a n . M i n i n g J . , 58, 685 (1937).
3 . K . A R ND T , " T e c h n i s c h e E l e k t r o c h e m i e , " p . 29 7, V e r l a g
F . E n k e , S t u t t g a r t ( 19 29 ).
4 . E . W . R o u s e A ND F . K . A U BE b , Trans . E lec trochem. Sou . ,
52, 189 (1927).
5 . A . I . M O TO R ~ N , Tsve lnge Meta l . , 4, 54 (1940).
6 . YU-LIN YAO, Trans_ Eleetrochem. Sou. , 86,371 (1944).
7 . W . H . G A U V lN A ND C . A . WIN K LER , C a n . J . R e s e a r c h ,
A21, 37 (1943).
8 . W . H . G A U V IN A ND C . A . WIN K LER , Can. J . Research ,
B21, 81 (1943).
9 . W . H . GA ~'VIN AND C. A. WINKLER, Can. J . Research ,
B21, 125 (1943).
1 0 . Y U -LIN Y A O , Trans . E lec trochem. Sou . , 85,213 (1944).
11 . I . M . KOLTHOFF AND O. TOM ICEK, Chem. Weekb lad . , 21 ,
106 (1924).
1 2 . W . H . G A U V IN A ND C . A . WIN K LER , U n p u b l i sh e d re su l t s .
1 3 . H . E . H A m N G , Trans . E lec trochem. Sou . , 49,417 (1926).
14 . R. LUTHER, Z . p h y s i k . C h e m . , 34 , 488 (1900).
15 . G. Bi iDLANDER, Z . E l e k t f v c h e m . , 7, 159 (1907).
1 6 . E . H E I N ~ R T n , Z . E l e k t r o c h e m . , 37, 61 (1931).
1 7 . F . F6 R STER A N D G . COFFE'rTI,Z . E l e k t r o c h e m . , 10, 736
(1904).
18 . A. BRENNER, Proc . An t . E lec trop la ters ' Soc . , 28, 95
(1940); 29, 28 (1941).
19 . G. BbDLANDER AND O. STORB ECK, Z. anorg. Chem., 31, 7
(1902).
20 . R. LUTHER, Z . p b g s i k . C h e m . , 3 6 ,3 8 6 (1 9 0 1 ) .
2 1 . A . A . N o Y E s A ND M IN G C H O W, J . A n t . C h e m . S e c . , 40 ,
739 (1918).
2 2 . H . D . B A ER N STEIN , J . B i o l . C h e m . , 7B, 481 (1928).
23 . W . EHRENBERG AND P. WULFF, K o l l o i d - B e i h e f t e , 42, 1
(1935).
24 . W. D . TREAI)WEbL, S. JANETT AND M . BLUMENTHAL,
Heb~. CAirn. Aura, 6 , 513 (1923).
25. F. FOERSTER AND O. SEIDEL, Z. anorg. Chem., 14, 106
(1897).
26 . F. J . SCHWAB AND J. BAUM, J . P h y s . C h e m . , 7,493 (1903).