a user manual for maskless micromodel fabrication …wyun/heidelberg/wonjinyun_user_manual… · 6...
TRANSCRIPT
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A USER MANUAL
FOR MASKLESS MICROMODEL FABRICATION
USING HEIDELBERG (MLA-150)
1. Written by Wonjin Yun, PhD ([email protected])
2. Reference: Yun, W. “Advanced microfluidic framework for understanding of fluid-flow in porous media : microfabrication, imaging,
and deep-learning / Appendix.3” (PhD Diss., Stanford University, 2019), 220-37. http://purl.stanford.edu/wt253cj8804
3. Ver. 4 updated on July 28 2019
4. This file is available at https://web.stanford.edu/~wyun/Heidelberg/
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TABLE OF CONTENTS
1. Intro to Heidelberg (MLA-150)
2. Point-of-contact
3. Design your micromodel
• AutoCAD-based design
• File format conversion
4. A user guide for MLA-150 (maskless-exposure)
• Step 1: File (design) conversion
• Step 2: Loading wafer + parameter setting
• Step 3: Exposure + unload wafer
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HEIDELBERG (MLA 150) : A HIGH SPEED DIRECT WRITE L ITHOGRAPHY TOOL
1) Directly expose pattern without prior fabrication of a mask resulting in a significantly shorter prototyping cycle
2) Light source at 405 nm and 375 nm
3) Allows using substrates of any size and shape
4) Exposure area upto 150 by 150 mm2
5) Provides flexible change of pattern using drawing mode
6) Produces structures down to 600 nm
7) Alignment accuracy - as good as 500 nm
8) Automatic labeling and serialization
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Main PC
MLA-150
Laser protection window-
shielded chamber
Window control switch
Light switch
Vacuum & laser control switch
inside of MLA-150
Wafer (b) loading zone
with alignment-chuck (a)
(a)
(b)
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2. POINT-OF-CONTACT
• Want to become a user of MLA-150 ?
• Swaroop Kommera / [email protected] / 721-7546
• Any question regarding tool, file preparation, and shadowing?
• Wonjin Yun / [email protected] / 650-862-2190
• https://web.stanford.edu/~wyun/Heidelberg/
• Want to read full manual ?
• https://snf.stanford.edu/SNF/equipment/nSiL/heidelberg-mla-150
• Check training schedule ?
• https://snf.stanford.edu/SNF/training/training-calendar
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3. DESIGN YOUR MICROMODEL
1. AutoCAD-based design
2. File format conversion
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AUTOCAD-BASED DESIGN TIPS
• It will show an example of way to design channel using AutoCAD
• You can download “tutorial.dxf” file from https://web.stanford.edu/~wyun/Heidelberg/
• Couple of useful tools will be introduced for quicker and easier design
a. Mirror : easy to copy many objects at designated coordinates
b. Join: Connect all polylines, arc, and lines. Prerequisite to “hatch” command.
c. Region: redefine all object or joined object as Regions. Prerequisite to “Union” and “Subtract”
d. Union : Combine two regions into single region
e. Subtract : Subtract two regions
f. Hatch : Fill the region or joined object
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CHANGE BASE UNIT
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DRAW OBJECT
1- choose one of layers where
you want to draw you design
2- use this tool if you want to
draw rectangle
(0,0) : the coordinates represent a center of wafer
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CREATE SQUARE
1- Define and Fine-tune your object (rectangle) by
setting the coordinates of all vertices
1st 2nd
3rd4th
Now, your object becomes 1000 micron size square that is
centered at (0,0) coordinates (center of water).
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DUPLICATE SQUARE VIA MIRROR
3rd
1- Create a mirrored copy of square across mirror line that
is 1000 micron away from the 3rd vertex.
Mirror Line
Now we have two identical objects separated by 2000 micron
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MORE COPIES
1- Create a mirrored copy of two squares across mirror
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ADD MORE OBJECTS
1- create more objects using “mirror” and “rectangle” tool
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UNIFY ALL OBJECT
1- First, make all object (defined as polyline)
regions using “region” command.2 - Then, you can use “Union” command to
combine all regions into single region.
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FILL THE AREA
1- Fill the area using “Hatch” tool
so that Heidelberg can recognize
your design.
In Heidelberg, the hatched area will
be exposed.
2- In Heidelberg, the hatched area
will be exposed.
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EXPORT AS .DXF FORMAT
1- Save as other format .dxf format2 – your design is in readable
.dxf format for Heidelberg,
but you can keep this file as
a master file for the future
adjustment or modifications
on different layers.
3 – If you need the design
only in certain layer for your
upcoming exposure, next
slides show how to create
separate file with the
necessary layers using
Klayout.
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FILE FORMAT CONVERSION
• This tutorial is to simplify and select layers from AutoCAD .dxf file using
Open-Source software (Klayout)
• Klayout (installed in Heidelberg main PC) is a useful tool to quick check your
design beforehand and remove unnecessary layers as it is needed.
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FILE CONVERSION (.gds)
3- Visible layers only
• Using free software (Klayout), you can
make a simple file without all unnecessary
layers from AutoCAD generated .dxf
format master file.
• You can install your own computer or
Heidelberg main PC has it already.
• Heidelberg can read .gds format
1- Drag and drop your .dxf file to open in Klayout
2- Close all unnecessary layers except “control” layer
where your design is located.
2- Save as -> .gds format
4- check Multi-XY record mode
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FILE CONVERSION ( .dxf)1- Close all unnecessary layers except “control”
layer where your design you want to use.
2- Save as -> .dxf format
• Using free software (Klayout), you
can make a simple file without all
unnecessary layers from master file.
• You can install your own computer or
Heidelberg main PC has it already.
• Heidelberg can read .dxf format
• .dxf format is better choice for some
design that has tremendous small
polylines (e.g. vectorized rock image)
3- Base unit is 0.001 micron
4- Select “Write HATCH entity or Decompose into SOLID entities”
3- Visible layers only
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4. A USER GUIDE FOR MLA-150 (MASKLESS-EXPOSURE)
Step 1: File (design) conversion
Step 2: Loading wafer + parameter setting
Step 3: Exposure + unload wafer
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STEP 1 : FILE (DESIGN) CONVERSION
• Transfer your design from your USB to Heidelberg Main PC directory (/home/convert/gdsii/ ):
• Do not use too long file name, this causes error.
• Do not transfer your design into sub-folder that you
created in the directory (/home/convert/gdsii/ ), this
causes error.
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STEP 1 : FILE (DESIGN) CONVERSION
Screenshot of Main PC running MLA-150 program
1- Click for new job
2 – double click to add your design
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STEP 1 : FILE (DESIGN) CONVERSION
Double click to add your design
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STEP 1 : FILE (DESIGN) CONVERSION
Click file and New
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STEP 1 : FILE (DESIGN) CONVERSION
Click file and New
1- click “Add” and select “gds” format
2- Select your design
that you transferred
from USB and hit
“Open”
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STEP 1 : FILE (DESIGN) CONVERSION
Hit “Create”
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STEP 1 : FILE (DESIGN) CONVERSION
1- Hit “Viewer” to check your
design. Viewer is showing one
of my loop design.
2- Hit “complete Task” and save your job , e.g.
01_Wonjin_0519_loop
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STEP 1 : FILE (DESIGN) CONVERSION
1- click your job just created
2- hit “Load”
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STEP 1 : FILE (DESIGN) CONVERSION
Now, your design is added.
2- double click to select/specify wafer we are going to load
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STEP 1 : FILE (DESIGN) CONVERSION
2- load
1- select 4-inch wafer if you are going to load 4-inch wafer
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STEP 1 : FILE (DESIGN) CONVERSION
2- keep “standard”
1- confirm “4-inch = 100 mm wafer”
3- now you are ready to load wafer, do not hit “load
substrate this step
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STEP 2 : LOADING WAFER + PARAMETER SETTING
• Material : 100 mm (4-inch) wafer
• Prerequisite :
Photoresist coating has been applied on the wafer
2 mm EBR required
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STEP 2 : LOADING WAFER + PARAMETER SETTING
6 - Hit “load substrate” and hit “continue” in following screen so that the program
automatically center the wafer.
1- open window 2- place chuck (
4inch = 100 mm
mark aligned with
mark on the stage)
3- load resist-coated wafer,
flat bottom attached to the
chuck , do not worried about
precision of the wafer
location (MLA-150
automatically detect the
center of wafer)
4- push vacuum
button to hold wafer
in position
5 - get rid of chuck
6 - Close window
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STEP 2 : LOADING WAFER + PARAMETER SETTING
1- Choose critical parameters, “dose” and Defocus.
For 1.6 µm thickness 3612 photoresist coating:
Light : 405 nm
Dose : 90
Defoc : -2
You can take a look at the log-book to see what settings lab
member used for different photoresist and thickness.
3- Hit to start exposure
2- optional, check if you want
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2- After exposure process is done, release vacuum and unload wafer
3- your wafer is now ready for the normal developing process
STEP 3 : EXPOSURE + UNLOAD
1- Exposure in progress
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QUALITY CHECK OF EXPOSURE & DEVELOPING
After Developing : Program #4 and # 2 Bake
Photoresist removed
Clean and fine edge of
30 µm-width channel
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After Developing : Program # 4 and # 2 Bake
QUALITY CHECK OF EXPOSURE & DEVELOPING
Successfully developed 30 µm-width loop
channel without any channel blocking