advanced technologies for optical frequency control and
TRANSCRIPT
Advanced Technologies forOptical Frequency Control and Optical Clocks
MURI - Technology for Optical Frequency Control and Optical Clocks
Yoel FinkThomas Greytak
Erich IppenFranz KaertnerDaniel Kleppner
Leslie KolodziejskiJeffrey ShapiroFranco Wong
Massachusetts Institute of TechnologyResearch Laboratory of Electronics
Cambridge, MA 02139
Department of Electrical Engineering and Computer ScienceDepartment of Materials Science and EngineeringDepartment of Physics<[email protected]>
Outline
MURI - Technology for Optical Frequency Control and Optical Clocks
• Efficient SHG and DFG with chirped-grating PPLN• 3-to-1 self phase-locked optical frequency divider• DFG for comb locking to methane-stabilized HeNe laser
• Novel wide-area GaAlAs oxidized mirrors• Saturable Bragg reflectors for few-cycle lasers
• Novel microstructured fiber for nonlinear optics• Broadband dispersion characteristics of bandgap fibers
Few-cycle laser development• Ti:sapphire, Cr:forsterite, Cr:YAG• Phase sensitive nonlinear optics• Attosecond-precision laser synchronization
Optical frequency metrology with ultracold hydrogen• Hydrogen spectroscopy and frequency referencing • Locking of femtosecond laser comb to single frequency cw laser
Nonlinear optical techniques for comb technology
Ultra-broadband mirrors and saturable absorbers for few-cycle lasers
Cylindrical photonic bandgap fibers
Ultra-low-jitter modelocked diode laser • Locking to visible wavelength reference
•enhanced SPM
•dispersion-managed modelocking•octave-spanning spectrum
•double-chirped mirrors
5-fs Ti:sapphire Laser
MURI - Technology for Optical Frequency Control and Optical Clocks
Chirped and Double-Chirped Mirrors
MURI - Technology for Optical Frequency Control and Optical Clocks
Double-Chirped Mirror: Bragg-Wavelength and Coupling Chirped
Air
“Impedance” - Matching
d =h λB/4SiO -Substrate
2 AR-Coating
Bragg-Mirror: TiO / SiO2 2 - LayersλB4
Air
Chirped Mirror: Bragg-Wavelength Chirpedλ1λ2 λ1λ2 >
Negative Dispersion:
λB
--> R. Szipöcs & F. Krausz (Opt. Lett. 19, 201-203, 1994) Computer Optimization
SiO -Substrate
2
SiO -Substrate
2
Designed Measured
100
80
60
40
20
0
REF
LEC
TIVI
TY (%
)
140012001000800600WAVELENGTH, NM
-600
-400
-200
0
200
400
600
GD
D, FS
2
100
80
60
40
20
0
REF
LEC
TIVI
TY (%
)
140012001000800600WAVELENGTH, NM
-600
-400
-200
0
200
400
600
GD
D, FS
2
DCM-Pairs Covering One Octave
MURI - Technology for Optical Frequency Control and Optical Clocks
Fabricated by Tschudi Group, Darmstadt
8
6
4
2
0
IAC
3020100-10-20TIME DELAY, FSa)
1.0
0.8
0.6
0.4
0.2
0.0SPEC TR UM, a.u.
12001000800600W AVELENGTH, NM
10-5
10-4
10-3
10-2
10-1
100
b)
-12
- 8
- 4
0
PH
AS
E,
RA
DIA
N
140012001000800600W AVELENGTH, NMd)
PO
WE
R,
a.u.
-40 -20 0 20 40TIME, FSc)
FWHM 5 fs
• Nonlinear autocorrelation• Spectrum• Recovered amplitude and phase
5-fs Pulse Characterization
MURI - Technology for Optical Frequency Control and Optical Clocks
PHASEGROUP VV ≠
Modelockedlaser
gain
∆φ
2nGL/c
Pulse-to-Pulse Phase Slip in a Modelocked Laser
MURI - Technology for Optical Frequency Control and Optical Clocks
-100
-80
-60
-40
-20
0
RF
spec
tral p
ower
den
sity
[dB]
706050403020100RF Frequency [MHz]
• rf tones reveal dφ/dt
Phase-Dependent 2nd Harmonic
MURI - Technology for Optical Frequency Control and Optical Clocks
Trf
mTopt = Trf
Stopping the Optical Phase Slip
The optical frequency is locked to an exact multiple of the rf rep rate !
MURI - Technology for Optical Frequency Control and Optical Clocks
dtdφ
=δlaser
modescavitymodes
Ln2mcf
ngL2mcff f2
g1121 =⇒+==
1f 2fLn2
ncf 0g
1 =⇒=δ
Ln2cg
Locking an octave by SHG:
•Phase slip in the frequency domain
Frequency Locking of Laser Modes
MURI - Technology for Optical Frequency Control and Optical Clocks
Second Harmonic Generation with Octave-Spanning Spectrum
=> Interference between fundamental and 2nd harmonic
2nd Harmonic
eiφ Fundamental
e2iφ
ωo
2ωo
MURI - Technology for Optical Frequency Control and Optical Clocks
Continuum Generation with Microstructured Fiber
10-6
10-4
10-2
100
Pow
er (a
rb. u
nits)
1600140012001000800600400
Wavelength (nm)
Input Output
Spectrum resulting when 80fs pulses from a Ti:sapphire oscillator are focused into a holey fiber
Strong guiding shifts the zero-dispersion wavelength to the near visible
J. Ranka et al.
MURI - Technology for Optical Frequency Control and Optical Clocks
-40 -20 0 20 400
4
8
Inte
rfer.
Auto
corre
latio
n (n
orm
.)
Delay Time (fs)
• All solid state• 1.3 µm wavelengths
Chuboda et.al.
1.2 1.4 1.60
1
Spec
tral I
nten
sity
(nor
m.)
Wavelength (µm)
Recent result: SBR stabilized
14 fs Cr:forsterite Laser
MURI - Technology for Optical Frequency Control and Optical Clocks
DCM
DCM
DCM
DCM
Autocorrelator
Faraday -rotator
Nd :YAG
OC
L
MX
P
λ /2
20-fs Cr4+:YAG Laser
Nd:YVO4Laser – 1064nm
2-cm Cr4+:YAGOC
f = 10 cmDCM
DCM
DCM
SBR
20 fs FWHM
SBR
Ref
l ect
ivi ty
Wavelength (µm)
MURI - Technology for Optical Frequency Control and Optical Clocks
Overlapping Femtosecond Laser Spectra
Ti:Sapphire, Cr:Forsterite and Cr:YAG
MURI - Technology for Optical Frequency Control and Optical Clocks
A Compact Prismless Ti:sapphire Laser
• Even more compact• Scaling to higher repetition rates• >500 MHz, ring laser
Future:
2mm Ti:Al2O3φ = 10ο
PUMP
OC 1
OC 2Base Length = 30cm for 82 MHz Laser
L =
20 c
m
BaF2 - wedges
BaF2
Octave-spanning spectrum
MURI - Technology for Optical Frequency Control and Optical Clocks
Overlapping Femtosecond Laser SpectraSp
ectra
l Pow
er [l
og]
-60
-50
-40
-30
-20
-10
0
1600140012001000800600Wavelength [nm]
Cr:forsterite
Ti:sapphire
30 dB
• Compact, prismlessoctave spanning Ti:sapphire laser
• Stabilized Cr:forsteritelaser
• Laser synchronization300 asec timing-jitter
• Opportunities:
extended frequency comb: 600–1600 nm
and/orsingle-cycle pulse
generation
MURI - Technology for Optical Frequency Control and Optical Clocks
Balanced Cross-Correlation for Laser Synchronization
Ti:sa
Cr:fo
3mm Fused Silica
SFG
SFG
Rep.-RateControl
(1/496nm = 1/833nm+1/1225nm).
-
+
GD
-GD/2
∆t
Ti:sa
Cr:fo
3mm Fused Silica
SFG
SFG
Rep.-RateControl
(1/496nm = 1/833nm+1/1225nm). Ti:sa
Cr:fo
3mm Fused Silica
SFG
SFG
Rep.-RateControl
(1/496nm = 1/833nm+1/1225nm).
-
+
GD
-GD/2
GDGD
-GD/2
∆t∆t
1.00.80.60.40.20.0C
ross
-Cor
rela
tion
Am
plitu
de
-100 0 100
Time [fs]
100806040200Time [s]
Timing jitter 0.30 fs (2.3MHz BW)
The residual out-of-loop timing jitter measured from 10mHz to 2.3 MHzis 300 as (a tenth of an optical cycle)
Output spectrum: 650-1450nm
MURI - Technology for Optical Frequency Control and Optical Clocks
Optical Frequency Metrologywith Ultracold Hydrogen
OVERALL GOAL
• Resolve discrepancies in the theory of quantum electrodynamics• Better values for fundamental constants• Test theories of atomic interactions and atomic structure
SCIENCE
• Explore the possibilities for an atomic hydrogen optical clock• Develop and apply techniques for measuring the frequencies of optical transitions• Stimulate the development and application of optical frequency combs
TECHNOLOGY
IMMEDIATE GOAL
Measure absolute frequencies of transitions such as 2S →10S (2-photon, 730 nm)using atomic hydrogen as an optical frequency standard
To pursue ultraprecise spectroscopy of ultracold atomic hydrogen for:
MURI - Technology for Optical Frequency Control and Optical Clocks
Spectroscopy with a Hydrogen Optical Clock
x 2
486 nm
Lock
x 2 Cold Hydrogen
Lock to 1S-2S (243 nm)
764 nm
Excite 2S-10S
972 nm
• Excite 1S→2S transition (known to about 1 partin 1014.)
• Lock 486 nm laser to 1S→2S • Excite two-photon transition such as 2S→10S• Measure excitation frequencies with an optical
frequency comb, referenced to the 486 nm laser,i.e. referenced to hydrogen
MURI - Technology for Optical Frequency Control and Optical Clocks
Nonlinear Optical Techniques for Comb Technology
Ultra-broadband SHG with zero group velocity mismatch• 70 nm bandwidth for 1580 nm → 790 nm in PPKTP
Difference-frequency generation of 3.39 µm• locking Ti:sapphire laser comb to CH-stabilized HeNe laser• collaboration between MIT and JILA
3-to-1 frequency divider• self-phase-locked optical parametric oscillator with cascaded nonlinear
interactions in PPLN • provides phase-locked markers at 532, 798, and 1596 nm
MURI - Technology for Optical Frequency Control and Optical Clocks
Difference Frequency Generation of 3.39 µm
Ti:S fs pulses
cw 3.39 µm output
667 nm 830 nm
Ti:S spectrum
N pairs of modesyield N2 enhancement
N~15,000
CH-stabilized He-Ne@ 3.39 µm
4
}Phase-locked
Servo to lock comb spacing to He-Ne
PPLNdifference-frequency
generator
MURI - Technology for Optical Frequency Control and Optical Clocks
Self-Phase-Locked OPO Yields3:2:1 Frequency Markers
PZT
PPLNPump
532 nm
Signal 798 nm
Idler 1596 nm
OPOgrating
SHGgrating
Self-phase locking(∆ω=0)
ω
Signal 2ω
Pump 3ω 2ω
2ω
MURI - Technology for Optical Frequency Control and Optical Clocks
Ultra-Broadband Saturable Absorber Mirrors
• High index-contrast oxidized mirrorsfor broadband low dispersion
• In-based absorber optimized forwavelength – integrated on mirror
• Large area for low power density• Stable, durable structures
delaminated interfacedelaminated interface
AlxOy
GaAs
GaAs substrate
500 µm
GaAs/AlxOy Mirror
500µm
GaAs/InGaAs
AlxOy
Al0.3Ga0.7As
GaAs substrate
AlGaAs/AlxOy Mirror
GOALS
PROGRESS
• Integrated broadband SBRs for Cr:YAG and Cr:forsterite lasers
• Dramatic improvement in layerstability with AlGaAs/AlxOy structures
• Wide area oxidization(>500µm diameter)
MURI - Technology for Optical Frequency Control and Optical Clocks
Issues Affecting the Distributed Bragg Reflector
Oxidation of AlGaAs Layers
• Edges of mesa less oxidized than at center • Mirror bandwidth a function of position
13µm from mesa edge
R946, 5 hr, 415 COxidized 11/13/2002GaAs/InGaAs
AlxOy
Al0.3Ga0.7As
GaAs substrate99µm from mesa edge
R946, 5 hr, 415 COxidized 11/13/2002
MURI - Technology for Optical Frequency Control and Optical Clocks
Issues Affecting Saturable Absorber
Sensitivity toGrowth
Temperature
Sensitivity toOxidation
Temperature
Sensitivity toOxidation
Time
Center = ~3mm from wafer edge Center = ~18.4mm from wafer edgeCenter = ~11.4mm from wafer edge
420C 435C
~230 µm
8hrs5hrs
MURI - Technology for Optical Frequency Control and Optical Clocks
primary gap centered around 1.5 µm
OmniGuide Mirror Fibers
MURI - Technology for Optical Frequency Control and Optical Clocks
1µm
100µmRegular OmniGuide structure
Modified (defect) structure
Bandgap Fiber with and without Defect
MURI - Technology for Optical Frequency Control and Optical Clocks
Mirror-guide Dispersion Characteristics
1.2 1.4 1.6 1.8 2 2.2-20
-15
-10
-5
0
5
10
15
20
Metallic
LH
Dis
pers
ion
D (p
s/nm
-km
)
Vacuum wavelength (µm)1.2 1.4 1.6 1.8 2 2.2
-20
-15
-10
-5
0
5
10
15
20
Metallic
LH
Dis
pers
ion
D (p
s/nm
-km
)
Vacuum wavelength (µm)1.2 1.4 1.6 1.8 2 2.2
-20
-15
-10
-5
0
5
10
15
20
Vacuum wavelength (µm)
Dis
pers
ion
D (p
s/nm
-km
) LH
ZD
1.55 µm
Metallic
1.2 1.4 1.6 1.8 2 2.2-20
-15
-10
-5
0
5
10
15
20
Vacuum wavelength (µm)
Dis
pers
ion
D (p
s/nm
-km
) LH
ZD
1.55 µm
Metallic
Bandgap fiber Fiber with cavity mode
MURI - Technology for Optical Frequency Control and Optical Clocks
Modelocked External External Cavity Diode Laser
NEC external cavity MLLD
OUTPUT
OSC
SELFOCLENS
MIRRORR = 99.9%
5-nm BPF
I gain
VSA
• 500 µm gain section• 50 µm saturable absorber section• λ = 1547nm , f = 9.35 GHz• BPF = 0.7 nm : τ = 6.7 ps• BPF = 5 nm : τ = 3 ps
PoseidonSBO
MURI - Technology for Optical Frequency Control and Optical Clocks
Residual Phase Noise Measurement
• Vector signal analyzer for low frequency offsets (1-10 MHz)• RF spectrum analyzer for high frequency offsets (10 MHz – 4.5 GHz)
(RF analyzer after mixer has higher sensitivity than for direct detection.)
MLLD
DELAY
OSC AMP AMP3-dBVECTOR SIGNAL ANALYZER
CH1CH2
RF ANALYZER
MURI - Technology for Optical Frequency Control and Optical Clocks
10 100 1k 10k 100k 1M 10M 100M 1G-160
-150
-140
-130
-120
-110
-100
-90
-80
Spectrum Analyzer Data
Vector Signal Analyzer Data
Spectrum Analyzer Noise Floor
Vector SignalAnalyzer
Noise Floor
L (f)
dBc/
Hz
Offset Frequency (Hz)
Single-Sideband Phase Noise - Results• Hybrid MLLD, 9GHz, 6.7 ps, Poseiden SBO• Vector signal analyzer (0 – 10 MHz)• RF spectum analyzer (10 MHz – 4.5 GHz)
Integrated timing jitter from 10 Hz to 4.5 GHz = 86 fs154 fs including all noise spursSBO jitter = 5.6 fs (10 Hz to 10 MHz)
MURI - Technology for Optical Frequency Control and Optical Clocks
1kHz – 10MHz : 40 fs
MIT-JILA collaborationD. J. Jones et al. Opt. Lett. 2003
Synchronization of Modelocked Diode Laser to Visible Standard
MURI - Technology for Optical Frequency Control and Optical Clocks
MIT-JILA collaborationD. J. Jones et al. Opt. Lett. 2003
Timing Jitter Spectral Density of Stabilized MLLD
20 fs jitter (1Hz – 10 MHz)
MURI - Technology for Optical Frequency Control and Optical Clocks
Outline
MURI - Technology for Optical Frequency Control and Optical Clocks
• Efficient SHG and DFG with chirped-grating PPLN• 3-to-1 self phase-locked optical frequency divider• DFG for comb locking to methane-stabilized HeNe laser
• Novel wide-area GaAlAs oxidized mirrors• Saturable Bragg reflectors for few-cycle lasers
• Novel microstructured fiber for nonlinear optics• Broadband dispersion characteristics of bandgap fibers
Few-cycle laser development• Ti:sapphire, Cr:forsterite, Cr:YAG• Phase sensitive nonlinear optics• Attosecond-precision laser synchronization
Optical frequency metrology with ultracold hydrogen• Hydrogen spectroscopy and frequency referencing • Locking of femtosecond laser comb to single frequency cw laser
Nonlinear optical techniques for comb technology
Ultra-broadband mirrors and saturable absorbers for few-cycle lasers
Cylindrical photonic bandgap fibers
Ultra-low-jitter modelocked diode laser • Locking to visible wavelength reference