advances in optical interconnects ray t. chen microelectronics research center
DESCRIPTION
Advances in Optical Interconnects Ray T. Chen Microelectronics Research Center The University of Texas, Aust SanYa, China 12/22/2009. Introduction: Projection of Bandwidth. Polymer-based Photonic Technology & Business Structure. Fully Embedded Board Level Optical Interconnection. - PowerPoint PPT PresentationTRANSCRIPT
Ray T. Chen, used with permission only
Advances in Optical InterconnectsRay T. Chen
Microelectronics Research CenterThe University of Texas, Aust
SanYa, China12/22/2009
Ray T. Chen, used with permission only
Fully Embedded Board Level Fully Embedded Board Level Optical InterconnectionOptical Interconnection
45 micro-mirror
Cu Trace
Unique Architecture for Optical PWB (Printed Writing Board) ; All the optical components are interposed inside the PCB Solve the package problem / Reduce Cost Effects
VCSEL array
Micro-via
Optical PCB
1x12 PIN Photodiode
12-channel Polymer Waveguide [109 cm ]
1x12 VCSEL
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2 mm
Lamination of Optical Waveguide FilmLamination of Optical Waveguide Film & Integration of Thin Film VCSEL & Integration of Thin Film VCSEL
12-Channel Polymer Waveguide & 45o Micro-Mirror
Optical Layer (~170 m)
PSA (Pressure Sensitive Adhesive) Film (100 / 200 m)
PCB Substrate
250m
Cross Section View of Laminated Optical Layer
Cu Transmission Lines for VCSEL (or PD) Integration
PCB Sub
PCB Sub
Cu Trans. Lines(thickness = ~ 10 m)
PSA filmOptical layer
VCSEL
Optical Layer
Optical LayerVCSEL
Bottom Emitting VCSEL
Top Emitting VCSEL
- PSA (Pressure Sensitive Adhesive) Film : 100 / 200 m- Optical Waveguide Film Layer = ~ 170 m
via
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Polyimide Based 1-to-48 Fanout H-tree Optical Waveguide on Si-Substrate
(c)
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System Integration with VCSELs and Photodiodes
L = 3200 um W = 485 umH = 200 um Pitch = 250 umAperture = 15 um, 10Gbps
L = 3335 um W = 690 umH = 200 um Pitch = 250 umAperture = 70 um, 2.5Gbps
Thin film waveguide on flexible substrate
VCSEL Photodiode
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Opal, the best known periodical structure in nature.
Photonic Crystal structure in nature
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PCW
* Dark region: electrode/pad
80 μm
PCW line defect
NP
Electrodes
Gigahertz p-i-n Diode Embedded Silicon Photonic Crystal Mach Zehnder Interferometer (MZI) Modulator
9
electrodes
PCW
ModulationDepth 92%
Simulation
slow vg
Optical Performance
Modulation trace(1GHz, square wave)
I-V curve of photonic crystal p-i-n diode
Electrical Characterization
Key features• Slow light in Photonic Crystal Waveguide (PCW) to enhance modulation by up to 40X•Unique electrode routing for on-chip integration with driver•Faster speed due to the enhancement of injection current density by downscaling
the device size
Current injection
Electrode
P+
Anode
+ -Cathode
N+Intrinsic region
--Lanlan Gu, W. Jiang, X. Chen, L. Wang, and R. T. Chen “High speed silicon photonic crystal waveguide modulator for low voltage application,” Applied Physics Letters, 90, 071105 (2007).
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2-D Image 3-D Image
Rough sidewall without post-etching oxidation
Focus Ion Beam (FIB) nano-polished endface
High smoothness, exact round shape
JEOL JBX-6000FS/E E-Beam Nano-Lithography
FEI Strata DB235 Dual Beam SEM/FIBNano-characterization System
Plama-Therm 790 Si and SiO2 Reactive Ion Etching (RIE)
SEM Micrographs & Key Facilities
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Progress of Silicon Nanophotonics
Integrated APD+TIACampbell
Raman λ Conv.
UCLA
1 Gb/sec Si Modulator
Intel
10Gb/sec Si Modulator Intel/Luxtera
1Gb/s PCW Modulator (20 pJ/bit)
UT
10Gb/s PIN Modulator (5 pJ/bit)
IBM
Dual Grating Directional Coupling
Surrey
30 GHz Si-Ge Photo-
detector IBM
39 GHz Si-Ge Photo-delector U. Stuttgart
Broadband Amplifier
Cornell
30Gb/sec Si Modulator
Intel
>1Gb/s CAP Modulator
(0.54 pJ/bit) UT
Inverted Taper
NTT, Cornell
Low power PCW
Modulator IBM & UT
Hybrid Si Laser
UCSB/intel
Si Nano-membrane Array
UIUC
Cascaded Si Raman Laser
Intel
PCW Loss < 25 dB/cm
IBM
PCW Loss < 7 dB/cm IBM, Festa,
NTT
PCW Loss < 3dB/cm
NTT
20dB loss reduction for
slot-PCW UT
2002 2003 2004 2005 2006 2007 2008
The highlight research projects are accomplished by Nanophotonics and Optical Interconnects Research Lab at UT-
Austin
Ray T. Chen, used with permission only
MURI-Center for Silicon Nano-Membranes
Name of Principal Investigator
School
Ray Chen (Lead) UT Austin
Seth Bank UT Austin
Wei Jiang Rutgers
Fabiab Pease Stanford
John Rogers UIUC
Gennady Shvets UT Austin
Emanuel Tutuc UT Austin
Scientific novelty and Uniqueness:Nanomembrane lithography to form 3D well-aligned silicon nanomembranesManufacturable process to form nanowires, photonic crystal waveguides and plasmonic structures on nanomembranes2D Ultracompact phase locked laser array on silicon as a light source for Optical Phased Array (OPA)Ultracompact structure provides large steering angles to ± 70o in both azimuth and elevation directions for Optical Phased Array (OPA)Slow photon in PCW provides a group index above 300 and provides tunable delay time from 0 to 32 nsecs suitable for phased array antenna applications
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Detailed Approaches
sourcewafer
3D-HGI
device substrate
stamp
0 1 2 30.0
0.4
0.8
3V
2V
0V-6 -3 0 3 6
0
50
100
10-2
100
102
I DS(m
A)
VGS(V)
I DS(
A)
VDS(V)
1st
2nd
3rd
G DS
200 m
Transfer printing of nanomembranes that contain nanostructured waveguides Demonstrated 3-layer devices
Use electrostatic forces to align 3D membrane stack to a small fraction of a micron. Many variations are possible:• An interfacial fluid layer to allow lateral motion• A Langmuir-Blodgett trough is already installed for the deposition of mono-& oligo-layers.
thin (<100nm) sliver of crystalline diamond made by FIB. Then the FIB then ‘tacked ‘ it into place again using deposition of Pt to provide the tacks