For decades, AE has led the industry in pulsing technology for arc prevention, superior film quality, and high throughput. Today, our suite of pulsing products represents the most highly developed technology available, offering a comprehensive range of capabilities that unlocks new process options and extends innovation.

AE ADVANCES PRECISION PROCESS CONTROL—AGAIN EXTEND PROCESS INNOVATION WITH A COMPREHENSIVE SUITE OF PLASMA-CONTROL POWER PRODUCTS—FROM THE GLOBAL LEADER IN PULSED POWER TECHNOLOGY

THE INDUSTRY’S MOST ADVANCED DC PULSING• Controllablechargeclearingcycleinhibitsarcformation.

• Wideoperationalrangeunlocksarangeofmaterialoptions.

• Convenientsingle-boxsolutionforsingle-magnetronsputtering.

Availablesoonforsingle-boxdualmagnetronsputtering.

Ascent® AP Series

Vboost

Tcross

Vprocess

Only if Icable > 0

t

Vout

/Iout

Ipk

Iav

Vrev

Sputtering SputteringCharge Clearing Charge Clearing

UNPRECEDENTED CONTROL IN DUAL-MAGNETRON SPUTTERING• Advancedarchandlingenablesstability.

• Higherpowerlevelswithreducedarcdamageincreasethroughput

andquality.

• Adjustablefrequencyleadstoincreaseddepositiontimes.

• Precisecontrolenablesrepeatable,customizablefilms.

Individualcontrolofpowerdeliverytoeachmagnetronextendscampaignlengthandlowersmaterialcosts.

Ascent® DMS Series

End Boost

Turn-O�

Process Voltage

Current:Fast slew rate and higher startup threshold are desired

V Boost

Turn-On

v (V)l (A)

T (µs)

Features

› Most advanced DC pulsing technology available

› Extremely low arc rate

› Robust, reliable performance

› Arc Management System™ (AMS) technology—customer pre-sets for metal and ceramic targets

› Set point compensation™ technology—stable throughput

Benefits

› High film quality and throughput

› Reduced film, substrate, and equipment damage

› Stable throughput and power delivery under extreme arcing conditions

› Easy integration and control

Specifications are subject to change without notice. ©2016 All rights reserved. Advanced Energy®, Arc Management System™, Ascent®, Pinnacle®, and Set Point Compensation™ are U.S. trademarks of Advanced Energy Industries, Inc.

For international contact information, visit advanced-energy.com ENG-PulsingPlatform-250-02 4.16

ROBUST, RELIABLE PULSED-DC POWER DELIVERY• Reliablechargeclearing

• Repeatableperformance

• Exceptionalfilmquality

Compact3Udesignnowextendstolow-poweroperationforextremelythinandsensitivefilms.

Pinnacle® Plus Series

T

TT

�

10 Ch1: 200 Volt 2 us2) Ch 2: 10 m Volt 2 us

1>

2>

Freq: 200 kHz, trev

: 1.8 us, AL2O

3, 8 mTorr, 20 A/div

Vo

ltage

Cu

rrent

ARC MANAGEMENT SYSTEM® TECHNOLOGY NOW FOR PULSED DC• 5kHzpulsingembeddedwithinastandardDCpackage

• Industry-leadingarcdetection,shutdown,andrecoveryspeed

• Repeatablepowerdeliveryandstablesputterrate

Couplesarcpreventionwitharchandlingtoeconomicallyenhanceyourchallengingconductivefilmswhileprovidingsystemextendabilityintonewprocesses.

Ascent® AMS Series

0

0 A

0 VDC

PRECISE POWER DELIVERY FOR SENSITIVE LOW-POWER PROCESSES• Innovativesolutionfordepositingthinfilmswithinlarge-areasystems

• Improvedfilmuniformityandplasmastabilityvs.conventionallow-power

methods

Achievelowaveragepowerswithfrequenciesnearing2kHz,usingavarietyofuser-programmableONandOFFtimes.

Ascent® AMS

Large-Area, Low-Power Pulsing Series

On time t1 O� time t2

t1 t2

SYNCHRONIZED PULSING THAT EXTENDS AND INTEGRATES AE POWER SOLUTIONS• Coordinationacrossmultiplecathodeswithsynchronizedcontrol

• Optionforcross-technologyintegration

Achievehigherpowerlevelswithmaster/slaveconfiguration.

Pulse Synchronization

40/60

40/60

50/50

50/50

50/50

Cathode Pairs

Ascent® Units

Ascent®

DMS Units

Synchronization across multiple cathodes

THE PULSED-DC ADVANTAGEAE pulsed-DC products minimize arcing while enhancing deposition rate, film flatness, and packing density.

Pulsing lowers the effective electronic voltage of the whole plasma while maintaining the actual delivered voltage of individual electrons, eliminating most arcs before they occur while maintaining high sputter rate.

AE products feature the most advanced DC pulsing technology available, enabling unparalleled plasma precision and process control for high-quality, customizable films and superior throughput.

(Photo source: Centre for Advanced Materials and Surface Engineering, University of Salford, UK.)

Al2O

3 sputtered without

the aid of pulsed-DC product

Al2O

3 sputtered with the

aid of an AE pulsed-DC product