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V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
MEMS Technologies for Optical andBio-Medical Applications
Dr. Veljko MilanovićDr. Daniel T. McCormick
Adriatic Research InstituteBerkeley, CA
http://www.adriaticresearch.org
© Adriatic Research Institute, 2005
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Outline
• Motivations and Background– General Application Examples– Some micromirror examples
• Additional optical MEMS components• Bio-photonics (Medical Imaging)• ARI-MEMS
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Why Optical MEMS
• Advanced lithography techniques allow the realization of precision, aligned optical components at the scale of optical wavelengths
• MEMS devices and actuators have the ability to tune over wide ranges with sub optical wavelength accuracy.
• Optical MEMS promise to revolutionize a wide range of application areas including:– Telecommunications, displays, optical imaging…
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
BSAC Motivation: cm3 Multisensor Optical Transceiver
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
SALT Project Objectives
Free-space laser communication between mobile nodes using MEMS transceivers
RD tθ≈θdiv: Laser beam divergence
R
D 5 mθdiv
5 km
1mrad
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Applications: Automotive
• Demand for miniature and low-cost laser beam-steering systems
• High speed scanning/refresh rate
• Large deflection angles desirable
HUD – head-up display
Collision Avoidance
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Beam-steering OXC
• Analog mirrors – more complex implementation– 1DoF or 2DoF mirrors
• 2N Scaling – easier to achieve larger N
• Lucent, C-speed, Xros, etc.
• Binary Switching -N2 switches required
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Image Projection
Texas Instrument’s DLP (DMD)Technology:individual mirrors each represent asingle pixel
Silicon Light Machines’ GLVTechnology:1-D array of light “valves” to form an addressable diffraction grating
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Micro Photonics
UC Berkeley micromirror
Microvision, Inc. displays Clip-on and virtual retinal displays
Fresnel Zone Plate and Laser Diode(UCLA)
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Outline
• Motivations and Background– General Application Examples– Some micromirror examples
• Additional optical MEMS components• Bio-photonics (Medical Imaging)• ARI-MEMS
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Surface MEMS 1-D Micromirror Structure: comb-drive actuators
Torsion Hinges
Support Frame
Mirror Surface
Electrostatic Combdrive
Substrate Hinge
Frame Hinge
Combdrive Linkage
Conant et al, MOEMS99
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Lucent 2DoF Micromirror: parallel plate
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Optical Phased Arrays Of Micromirrors
Dual mode µmirror design Static top comb
electrodes
Static bottom comb electrodes
Movable mirror comb electrodes
TorsionalHinge
Moving mirror
Vertical Comb
Reference mirror
SEM of phased array for spatial switching. Far-field pattern of scanning mirror array with phase correction
-1 -0.5 0 0.5 1
10
20
30
40
50
60
70
Distance (mm)
Inte
nsity
• Phased arrays of micromirrors allow directional control and optical phase correction for precision optical spatial and spectral scanning
• Applications:SpectroscopyFiber opticsFree space optical communication
Courtesy of O. Solgaard
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Outline
• Motivations and Background– General Application Examples– Electrostatic actuators overview– Some micromirror examples
• Additional optical MEMS components• Bio-photonics (Medical Imaging)• ARI-MEMS
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
2x2 MEMS Fiber Optic Switches2x2 MEMS Fiber Optic Switches with Silicon Sub-Mount for Low-Cost Packaging
Shi-Sheng Lee, Long-Sun Huang, Chang-Jin “CJ” Kim and Ming C. WuElectrical Engineering Department, UCLA
63-128, engineering IV Building, Los Angeles, California 90095-1594Mechanical and Aerospace Engineering Department
Figure 1. SEM of the 2x2 MEMS fiber optic switch.
Figure 3. SEM of the torsion mirror device.
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Magnetic Parallel Assembly
Solid-State Sensor and Actuator WorkshopHilton Head 1998
Figure 1. (a) An SEM micrograph of a Type I structure. The flap is allowed to rotate about the Y- axis. (b) Schematic cross-sectional view of the structure at rest; (c) schematic cross-sectional view of the flap as Hext is increased.
Figure 2. (a) SEM micrograph of a Type II structure. (b) Schematic cross-sectional view of the structure at rest; (c) schematic cross-sectional view of the structure when Hext is increased.
Parallel assembly of Hinged Microstructures Using Magnetic ActuationYong Yi and Chang Liu
Microelectronics LaboratoryUniversity of Illinois at Urbana-Champaign
Urbana, IL 61801
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Outline
• Motivations and Background– General Application Examples– Some micromirror examples
• Additional optical MEMS components• Overview of design methodology• Bio-photonics (Medical Imaging)• ARI-MEMS
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
MEMS Based Optical Coherence Tomography
MEMS Based OCT
• high resolution images• non-invasive imaging• rapid scanning speed• in vivo imaging• potentially low costProvide a new tool for a wide variety of research and clinical
applications in diagnostics as well as treatment.
“OPTICAL BIOPSY”
MEMSScanningDevice
McCormick, Tien et al, Cornell University, BSAC
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Development of Fast Micromirror Scanners Development of Fast Micromirror Scanners with Large Angle Static Deflectionwith Large Angle Static Deflection
Dr. Veljko Milanović
© Adriatic Research Institute, 2005Berkeley, CA
veljko@adriaticresearch.org
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Outline
• High Aspect Ratio MEMS• Vertical combdrives in Multilevel SOI-
MEMS• Gimbal-less micromirrors
– Tip-tilt-piston actuation– Latest devices / results
• High fill-factor array development• Conclusions and demonstrations
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
High Aspect Ratio MEMS (HARM)SOI-MEMS
• Height/width > ~3:1• Height/space > ~3:1• Increased capacitance
for actuation and sensing
• Low-stress structures– single-crystal Si only
structural material
• Highly stiff in vertical direction– isolation of motion to
wafer plane– flat, robust structures
2DoF Electrostatic actuator
Thermal Actuator
Comb-drive Actuator
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
MEMS Mirrors in SOI
Courtesy Robert A. Conant, BSAC
• DRIE etching of SOI materials• High-quality, flat, and stiff
mirrors• High-speed deflection• Electrostatic actuators
• High force, Dual-mode and two-sided possible, All-conductive structure
• Flexible ProcessPhased arrays, 2-D arrays, Through-the-wafer interconnects
• Combs require accurate alignment
Yield, Reliability, Maximum deflection
• Front-side processingImproved reliability and yield, controlled damping, standard wafers, integration
O.SolgaardStanford
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
STEC Micromirror – Vertical Comb-drives
Conant et al, HH2000
Conant et al,HH2000
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Outline
• High Aspect Ratio MEMS• Vertical combdrives in Multilevel SOI-
MEMS• Gimbal-less micromirrors
– Tip-tilt-piston actuation– Latest devices / results
• High fill-factor array development• Conclusions and demonstrations
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
New possibilities with multi-level beams
• 3 masks + 1 backside mask gave 3 level beams
• With taller beams, 4 types of beams result from same set of masks– Upper and Lower
beam overlap– New beam – Middle
for highest compliance
33
2
111
22 2
Back surface of SOI device layer
Front surface of SOI device layer
Middle
Low
er Hig
hUpp
er
Upp
er
3
2
1
2 2
Back surface of SOI device layer
Front surface of SOI device layer
Low
Hig
h
Upp
er
(a)
(b)
2
2
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Vertical combdrives in Multilevel beam SOI-MEMS (ARI-MEMS)
• Lower and Upper beams can be placed at minimum spacing that is DRIE aspect-ratio limited
• Lower and Upper beam masks self-aligned by same top mask• Pre-engaged combfingers for linear force operation from 0 Volts
• Vertical comb-drives for 2D rotation and piston motion
Upper beamtorsional support
mirror
Lowerbeams
Upperbeams
Upper beamtorsional support
mirror
Lowerbeams
Upperbeams
V. Milanović et al, MOEMS’02, Aug. 2002
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Fabrication: masks and backside steps
Backup maskBackside mask
Trench and Align masks
• All masks prepared before DRIE steps• Front-side two oxide masks• One embedded oxide mask• Back-side thick-resist mask
SOI wafer with 4 masks in placefor etching steps
Milanović, V. JMEMS, Feb. 2004
Lower beam
Upper beams
High beam
DRIE
Middle beam
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Fabricated 1DoF Mirror with Independent Pistoning Control
GND
V2 V4
V1 V3
500 µm
Up combs
Down combs
A
A’
B
B’
Mirror surface
V. Milanović et al, MOEMS’02, Aug. 2002
• Self aligned combdrives• Compliant low aspect-ratio
beams• Isolated combdrives• Opposing actuation
combdrives
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Multiple modes of actuation in Multilevel Beam SOI-MEMS – combined in a single device
Up combsDown combsV2 V1
V3V4
V2 V3
V4 V1
GND
GND
GND
GND
A-A’
B-B’
A’-B
A-B’
Upper HighLower
Demonstrated bi-directional rotation, ‘pure’ rotation (no lateral or vertical motion) and ‘pure’ pistoning motion
V. Milanović et al, MOEMS’02, Aug. 2002
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
1D Rotators• Generally designed for one-sided ‘pure’ rotation to 10° mechanical,
20° optical beam deflection• <=100 V actuation• Designs from 2 kHz to 5 kHz resonant freq.• 600 um round mirror, 30um thick
Applied voltage [V]0 20 40 60 80 100 120
Opt
ical
bea
m d
efle
ctio
n [d
eg]
0
5
10
15
20
25
30
35
40
45
50
55
60
Peak-to-peak resonantscanning at 4447 Hz
Peak staticscanning
Applied voltage [V]0 20 40 60 80 100 120
Opt
ical
bea
m d
efle
ctio
n [d
eg]
0
5
10
15
20
25
30
35
40
45
50
55
60
Peak-to-peak resonantscanning at 4447 Hz
Peak staticscanning
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Two-axis rotation and independent pistoning
gimbal-based device
Kwon, et al, Optical MEMS 2002
-10 0 10 20 30 40 50 60 70 80 90
0
2
4
6
8
10
12
14
Ang
le[d
egre
e]
Driving Voltage [V]
% Inner mirror % Outter mirror
Limited speed due to gimbal inertia
200 µm200 µm
V1
V1
V2
V2
V3
V3
GND
V4
Pure pistoning vertical Pure pistoning vertical actuatorsactuators
X-X’Y-Y’
V2
V1
GND
(a) (b)V4
V2
GND
V3
V1
Microlens
V4
V2
GND
V3
V1
Microlens
(c)
Kwon, et al, Hilton Head 2002.
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Outline
• High Aspect Ratio MEMS• Vertical combdrives in Multilevel SOI-
MEMS• Gimbal-less micromirrors
– Tip-tilt-piston actuation– Latest devices / results
• High fill-factor array development• Conclusions and demonstrations
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
X-axis
Y-axis
Rotation actuator A
Rotation actuator A’
Rotation ac
tuator B
Rotation ac
tuator B
’
Backside
etched cavity
X-axis
Y-axis
Rotation actuator A
Rotation actuator A’
Rotation ac
tuator B
Rotation ac
tuator B
’
Backside
etched cavity
Concept of Gimbal-less 2D scanners – Kyoto device
Rotationactuator A
Rotationactuator A’Micromirrorplate
Rotationtransformer
Rotationtransformer
Axisof rotation
(x-axis)
Insidelinkage
OutsidelinkageRotation
actuator ARotation
actuator A’Micromirrorplate
Rotationtransformer
Rotationtransformer
Axisof rotation
(x-axis)
Insidelinkage
Outsidelinkage
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
200 µm
V 2
V 2V 1
V 1
GND
BACKSIDECAVITY
1st generation Kyoto device SEM
Milanović et al, MEMS, Kyoto, Japan, Jan. 2003
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Two-axis scanning paradigm shift
• No more gimbals – problematic isolation technologies• Both axes can have arbitrary frequencies• Inherently allows more degrees of freedom
– Tip, Tilt, Piston
• Variety of actuators can be attached (rotators, bi-dir. rotators, pure vertical pistons…)
• Problem is broken down into modules – easy design• Actuators can be very long – effectively increasing
frequency (and cost) as desired
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Characterization of a typical device
X-axis 4.46 kHz resonanceY-axis 4.56 kHz resonance
DC actuation voltage [V]0 20 40 60 80 100 120 140
Opt
ical
bea
m d
efle
ctio
n [d
eg]
-15
-10
-5
0
5
10
15
20
25Deflection from mirror on x-axisDeflection from mirror on y-axisDeflection from actuators x-axisDeflection from actuators y-axis
“shuriken” layout allows arbitrarily long actuators for each axis
Milanović et al, Spec. Issue IEEE JSTQE, May-Jun. 2004
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
‘Ultra’ high-speed applications:Reducing reflector inertia
Separate SOI wafer for micromirrorsMultilevel fabrication
PedestalTrusses for supportThin reflector plate
Custom metallizationCustom-size reflectors
The largest, 2.0 mm reflectors with Al metal coating assembled into ARI gimbal-less two-axis scanners and sealed with a anti-reflection (AR) coated quartz lid.
A 1.2 mm reflector with Au metal coating assembled into ARI gimbal-less two-axis scanner and sealed with a anti-reflection (AR) coated quartz lid.
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Low-inertia Micromirror Assembly
Assembly of ARI1.2 mm MEDIE and 2.0 mm BIGGIEwith MEMS PIcustom tool
www.memspi.com
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Actuators for Special Size Mirrors:B-type, L-type, M-type
• B-type device: small die and smaller voltages– Most economic and largest angle design
• L-type device: small die and large voltages– Most economic high speed design
• M-type device: large die and large voltages– Highest speed design
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
B
L
M
Mirror diameter vs. Resonant Freq.
2.0 mm mirror
1.2 mm mirrors
Simulation results vs. several measured points
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Breaking up the problem
• Small elements instead of one large actuator• Higher frequency response• Better reflector flatness• Issues with >96% fill-factor negligible
• Severe increase in compexity• Packaging, control, ‘calibration’
• Universal optical element?
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Low-mass reflector fabrication/transfer
Multilevel fabricationPedestalTrusses for supportThin reflector plate
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Low-mass reflector fabrication/transfer
15 µm Truss sidewallExtended pads
for characterization
Bonding using optical epoxyMicromanipulation with MEMS PI custom made instruments (collab. with C. Keller)
V. Milanović et al, Sensors and Actuators Workshop,Hilton Head, SC, Jun. 2004
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Low-mass reflector fabrication/transfer
Bonding using optical epoxyMicromanipulation with MEMS PI custom made instruments (collab. with C. Keller)
V. Milanović et al, IEEE JSTQE, May 2004.
500 µm
500
µm
500 µm
500
µm
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Conclusions
• Technologies in place to make arrays– 10 kHz update rate for tip-tilt-piston
• Actuators continue to improve performance, decrease size
• Thin micromirrors easy to fabricate• Assembly always a challenge
– Assembling in batch promising
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Frequency [Hz]0 2000 4000 6000 8000
Nor
m. r
espo
nse
mag
nitu
de
0.01
0.1
1
10
100
Res
pons
e ph
ase
[deg
]
-270
-180
-90
0
MagnitudePhase
Device model and characterization
• Typical device response as a 2nd order mechanical system, in this example with fn = 3800 Hz and Q~60
Small signalForce response
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
22
22
2)(
nn
n
ssKsH
ωωζω
+⋅⋅⋅+⋅
=[ ]21 )(tvK ⋅)(tv )(tp
Controlvoltage
Electrostaticforce (F)
Mechanical systemresponse
Micromirrorposition
Natural freq. Damping ratio Gain factorωn / 2π ζ K1*K2 [x10-4]
Device 1 6000 Hz 0.005 5.7Device 2 4400 Hz 0.008 5Device 3 2326 Hz 0.137 6.5
‘Complete’ Model in 3 parameters
Critical aspect of model – freq. doublinge.g. : v(t) = sin (wt) => F ~ sin (2wt)
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Time [s]-0.0005 0.0000 0.0005 0.0010 0.0015 0.0020
Mec
hani
cal D
efle
ctio
n An
gle
[deg
]
-0.5
0.0
0.5
1.0
1.5
2.0
2.5
3.0
3.5
4.0
HFF800 w/ bonded micromirrorHFF800 actuator only
The High-Q Problem
Step responses in open loop, no control:Actuator vs. actuator w/ bonded mirror
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Time [ms]-0.2 0.0 0.2 0.4 0.6 0.8 1.0
Opt
ical
Def
lect
ion
Angl
e [d
eg]
0
1
2
3
4
5
6
7
8Closed loop PD control w/ optical feedbackOpen loop
)(td )(tp
Desired positionvoltage
Device modelfrom Fig. 1c
Micromirrorposition
PSDsensor
PDcontroller
‘Plant’: Axisof scanner+ -
)(tv)(td )(tp
Desired positionvoltage
Device modelfrom Fig. 1c
Micromirrorposition
PSDsensor
PDcontroller
‘Plant’: Axisof scanner+ -
)(tv
Closed-Loop PD Control
Step response settling times < 100 µs measured in closed-loop schemes with optical feedback
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Open-loop Problem
• The simple solution is to LPF sharply somewhere well before ωn /2– Butterworth, Bessel filters
• Speed is limited and can never compete with closed loop response• Type of filter still critical, i.e. group delay response
Frequency [Hz]0 2000 4000 6000 8000
Nor
m. r
espo
nse
mag
nitu
de
0.01
0.1
1
10
100
Res
pons
e ph
ase
[deg
]
-270
-180
-90
0
MagnitudePhase
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Inverse System Solution
( )( )21
211 )(psps
ppsH++
⋅⋅−
Inverse Sys.
Final Response
Orig. System
Works great (but only for small signals)
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Time [ms]-0.05 0.00 0.05 0.10 0.15 0.20 0.25
Com
man
d / A
ctua
tion
volta
ge [V
]
0
5
10
15
20
25
30
35
40
Opt
ical
Def
lect
ion
Ang
le [d
eg]
0
1
2
3
4
5
6
Actuation voltage waveformOptical deflection on PSD
)(td)(tp
Desired positionvoltage
Device modelfrom Fig. 1c
Micromirrorposition
‘Plant’: Axisof scanner
)(tv)(~ 1 sH −
System inverse
( ) 121
−KK
Amplifier
)(td)(tp
Desired positionvoltage
Device modelfrom Fig. 1c
Micromirrorposition
‘Plant’: Axisof scanner
)(tv)(~ 1 sH −
System inverse
( ) 121
−KK
Amplifier
Open-Loop ‘Inverse System Square Root’ Control
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Settling Time LPF Butterworth LPF Bessel LPF Bessel ISR CLPD[µ s] Order = 6 Order = 6 Order = 24
ωp = ωn / 3.5 ωp = ωn /2.7 ωp = ωn /1.3
Device 1 376 440 292 128 104Device 2 510 476 280 96 92Device 3 1750 1050 790 284 N/A
Summarized Results
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
Vector projection demo• Driven from laptop audio port (<1 Volt, low power) or USB port• Two channel driver for X-axis and Y-axis• Scans any desired vector or point-to-point drawings at high refresh rates
Milanović et al, Optical MEMS 2004, Aug. 2004
(a) (b) (c) (d) (e)
(f)
(g)
(h) (i) (j) (k)
(a) (b) (c) (d) (e)
(f)
(g)
(h) (i) (j) (k)
V. Milanović, UCB EE245 Sp’05, Apr. 27th, 2005
MirrorcleDraw Software
MirrorcleDraw software runs on the Matlab platform and allows the user to control a two-axis micromirror scanner via soundcard port or a DAQ card. User can input text, shapes, drawings, functions, etc, and apply various digital filters to the prepared waveform which is then sent at a chosen refresh-rate to the device.
MirrorcleDraw software’s graphic user interface (GUI.) User views the input drawing in blue, a filtered drawing in red, and the predicted micromirror response in green (based on system ID.)
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