power consumption in cmos

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Power Consumption in CMOS. Two Components contribute to the power dissipation: Static Power Dissipation Leakage current Sub-threshold current Dynamic Power Dissipation Short circuit power dissipation Charging and discharging power dissipation. Power Dissipation in CMOS. - PowerPoint PPT Presentation

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CONCORDIAVLSI DESIGN LAB

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Power Consumption in CMOS

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Power Dissipation in CMOS

Two Components contribute to the power dissipation:

» Static Power Dissipation– Leakage current– Sub-threshold current

» Dynamic Power Dissipation– Short circuit power dissipation– Charging and discharging power

dissipation

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3

Static Power Consumption

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Static Power Dissipation

G

S

D

D

G

S

Vo

VDD

GND

B

B

MP

MN

Leakage Current:• P-N junction reverse biased current: iL= A. is(eqV/kT-1) • Typical value 1pA to 5A /µm2@room temp.• Total Power dissipation:

PsL= iL.VDD

Sub-threshold Current• Relatively high in low threshold devices

Vin

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Subthreshold Current

Vgs <≈VtVss

Vdd

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Subthreshold Current

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Analysis of CMOS circuit power dissipation

The power dissipation in a CMOS logic gate can be expressed as P = Pstatic + Pdynamic

= (VDD · Ileakage) + (VDD . Isubthreshold) +

(VDD · Ilshort circuit) + (α · f · Edynamic) Where α is the switching probability or activity factorat the output node (i.e. the average number of outputswitching events per clock cycle). The dynamic energy consumed per output switching

event is defined as

Edynamic =

eventswitching

DDDD dtVi__1

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Charging and discharging currents

Discharging Inverter Charging Inverter

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Currents due to Charging and Discharging

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Power Dissipation: Dynamic

VDD

Vin

G

S

D

D

G

S

Vo

GND

MP

MN

CL

VDD

Vin

Vout

ic ipip

in

ip

in

tp

0 t1

VDD

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Power Dissipation: Dynamic

G

S

D

D

G

S

Vo

GND

MP

MN

CL

VDD ip

During chargingPdp

1tp----- ip t VDD Vo– td

0

t1=

ip t CLdVo

dt-----------=

PdpCLtp------- VDD Vo– Vod

0

VDD=

PdpCL2tp-------- VDD 2=

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Power Dissipation: Dynamic

G

S

D

D

G

S

Vo

GND

MP

MN

CL

VDD

in

Pdn 1tp----- in t Vo td

t1

tp=

in t CLdVodt

-----------–=

PdnCLtp------- Vo– Vod

VDD

0=

CLtp-------VDD2

2----------------=

During Discharging

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Power Dissipation: Dynamic

Total Power dissipation Pdp+ Pdn = (CL/tp) (VDD)2

= CL. f. (VDD)2

Taking node activity factor α into consideration:

The power dissipation= α CL. f. (VDD)2

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• distributed, • voltage-dependent, and • nonlinear. So their exact modeling is quite complex and accurate

power modeling and calculation is very difficult,

inaccurate and time consuming.

The MOSFET parasitic capacitances

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Schematic of the Inverter

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CMOS Inverter VTC /short Circuit Current

Vout

V in1 2 3 4 5

12

34

5

MN linMP off

MN satMP sat

MN offMP lin MN sat

MP lin

MN linMP sat

G

S

D

D

G

S

Vout

VDD

GND

VGSN

Vin

MP

MN

VTN VDD- |VTP| VDD

ISC

ISC

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The short-circuit energy dissipation ESC is due to the rail-to-rail current when both the PMOS and NMOS devices are simultaneously on.

ESC = ESC_C + ESC_n

Where

and

DDVv

nDDcSC dtiVE0

_

0

0

_

0 DDVv

pDDdSC dtiVE

Analysis of short-circuit current

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Power Dissipation: short circuit current

Short Circuit:

G

S

D

D

G

S

Vo

GND

MP

MN

VinVTN

VDD-|VTP|

tftr

Isc

Vin

tp

Isc

For tr=tf = trf VTN=|VTP|The short circuit power dissipation:

PscKn12------- VDD 2VT–( )

3trf

tp-----=

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Current flows with load

A: InputB: VTC

C: Current flow

D: Current flow when

load is increased

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Factors that affect the short-circuit current

TVV

VI TDD

DDmean

3)2(12

1

For a long-channel device, assuming that the inverter is symmetrical (n = p = and VTn = -VTp = VT) and with zero load capacitance, and input signal has equal rise and fall times (r = f = ), the average short-circuit current [Veendrick, 1994] is

From the above equation, some fundamental factors that affect short-circuit current are:

, VDD, VT, r,f and T.)(L

W

tox

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Parameters affecting short cct current

For a short-channel device, and VT are no longer constants, but affected by a large number of parameters (i.e. circuit conditions, hspice parameters and process parameters).

CL also affects short-circuit current.

Imean is a function of the following parameters (tox is process-dependent): CL, , T (or /T), VDD, Wn,p, Ln,p (or Wn,p/ Ln,p ), tox, …

The above argument is validated by the means of simulation in the case of discharging inverter,

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The effect of CL on Short CCt Current

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Effect of tr on short cct Current

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Effect of Wp on Short cct Current

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Effect of time step setting on simulation results

Tr (ps) Timestep (ps) MaxStep (ps) iMax (uA) iaverage_inT/2 (uA) 2 10 802.6 1.258 4 10 413.8 1.264 5 10 336.4 1.24 6 10 284.9 1.234 8 10 221 1.245

0

10 20 183 1.231 2 10 73.09 1.202 4 10 64.4 1.213 5 10 58.69 1.21 6 10 65.64 1.208 8 10 76.13 1.207

100

10 20 63.1 1.217 2 10 50.96 1.311 5 10 49.78 1.295 5 20 50.46 1.313 8 10 50.72 1.311 8 20 52.08 1.311

200

10 20 51.25 1.311

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Reducing Power Consumption

It can be done in several ways: Circuit Design Architecture design Activity reduction Changing Vt Etc.

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Datapath to be optimised for power consumption

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Pipelining the circuit

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Parallelism

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Parallelism and pipelining

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Activity reduction .

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Power Distribution

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Thank you !

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InterconnectInterconnects in chips are routed in

several layers horizontally and vertically and used according to their

application

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Interconnect/Via

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Large ViasAn example of

replacing one large contact cut with

several smaller cuts to avoid current

crowding

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ElectromigrationElectromigration is the forced movement of metal

ions due to an electric field

Ftotal = Fdirect + Fwind

Direct action of electric field on metal ions

Force on metal ions resulting from momentum transfer from the conduction electrons

AlAnode+

Cathode-

Note: For simplicity, the term “electron wind force” often refers to the net effect of these two electrical forces

<<

E-

-

-

Al AlAl

Al Al Al Al

Al+ -

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Electromigration

Effects of electromigration in metal

interconnects:

• Depletion of atoms (Voids):

Slow reduction of connectivity

Interconnect failure

Short cuts (Deposition

• of atoms)

=> Metal atoms (ions) travel toward the positive end of the conductor

while vacancies move toward the negative end

Voids

Hillocks

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Incubation period

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Mean Time To Failure

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Mean Time To FailureDC interconnect, the MTTF is defined as:

kT

EAJMTTF mDC

exp2

A is the area, Jm is the current density, E is 0.5eV, K is the Boltzsman constant, and T is the absolute temperature.

2

exp

mmm

DC

JDC

ACkJJ

kT

EA

MTTF

mJ is the average current density,

mJ is the average absolute current density and

DC

AC is a constant.

For Ac interconnect the MTTF is defined as

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http://electronics.stackexchange.com/questions/128120/reason-of-multiple-gnd-and-vcc-on-an-ic

Layout of a controller

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• Current has to be distributed, it is impractical that any pad can take the total current. The resistance drop is prohibiting

• Power coming in from any one pin will probably have to snake it's away around a lot of stuff to get to every part of the device. Multiple power lines gives the device multiple avenues to pull power from, which keeps the voltage from dipping as much during high current events.

• Need for a clean supply voltage at certain areas.

• Analog devices require special attention and probably different voltage supply.

• Heat distrubution, and removal

Reasons for having multiple supply lines.

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http://electronics.stackexchange.com/questions/128120/reason-of-multiple-gnd-and-vcc-on-an-ic

The figure represents all of the power and ground pins on a Virtex 4 FPGA in a BGA package with 1513 pins. The FPGA can draw up to 30 or 40

amps at 1.2 volts

Every I/O pin is adjacent to at least one power or ground

pin, minimizing the inductance and therefore the

generated crosstalk.

Xilinx Virtex I/O distribution

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ExampleAssume a chip of 0.5cm by 0.5cm fed by one Vdd pad. The chip consumes 1A at 3.3Volts. Determine the voltages on points marked X, Y and Z. Are these values Acceptable? What can you do about it? (assume Jm = 1mA/um2 and a 1µm thick aluminum)

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Thank you !

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