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PRODUCTS GUIDE
Osaki Wiz Tower, 11-1, Osaki 2-chome,Shinagawa-ku, Tokyo 141-0032, Japan
www.coorstek.co.jp
We make the world measurably better.
For over 100 years, CoorsTek has been perfecting the process of
engineering advanced ceramics.
We are prepared to apply expertise to the toughest engineering
challenges around the world.
Much like the materials we work with, CoorsTek is versatile and
endlessly extendible. we work with our customers to develop
tomorrow’s technology for just about
every industry in the global economy.
We don’t simply deliver high-quality products.
We partner to deliver solutions that make the world
measurably better.
Contents
Semiconductor Related Products
FPD Related Products
General Industrial Products
Automotive, Electric & Mechanical Products
Solar Cell Related Products
Bio and Medical Related Products
Main Material Line-up
• Quartz Glass Crucibles• Carbon Susceptors• SiC Wafer Boats• Photomask Substrates
• Alumina Plasma Etcher Parts• Yttria Plasma Etcher Parts• Silicon Focus Rings• Silicon Susceptors
• SiC Polishing Plates• In-line Gas Filters “CEPURE”• Vacuum-Break Filters• GAISER Wire Bonding Tools
• Large Scale Photomask Substrates
• Fused Silica Refractories• SiC Heat-resistant Structural Parts• SiC Setters & Saggers• SiC Heating Elements “TECORUNDUM”
• Quartz Carbon Heaters “QCH-HEATER”• Quartz Electrostatic Chucks “ARISTORUM ESC”• Foundry Filters “FLOW-RITE”
• Carbon Brushes• Ceramic Balls “CERBEC”
• Crucibles for solar cell manufacturing
• Ceramic Bone Substitutes
3
6
7
9
10
10
11
We make the world measurably better.
For over 100 years, CoorsTek has been perfecting the process of
engineering advanced ceramics.
We are prepared to apply expertise to the toughest engineering
challenges around the world.
Much like the materials we work with, CoorsTek is versatile and
endlessly extendible. we work with our customers to develop
tomorrow’s technology for just about
every industry in the global economy.
We don’t simply deliver high-quality products.
We partner to deliver solutions that make the world
measurably better.
Contents
Semiconductor Related Products
FPD Related Products
General Industrial Products
Automotive, Electric & Mechanical Products
Solar Cell Related Products
Bio and Medical Related Products
Main Material Line-up
• Quartz Glass Crucibles• Carbon Susceptors• SiC Wafer Boats• Photomask Substrates
• Alumina Plasma Etcher Parts• Yttria Plasma Etcher Parts• Silicon Focus Rings• Silicon Susceptors
• SiC Polishing Plates• In-line Gas Filters “CEPURE”• Vacuum-Break Filters• GAISER Wire Bonding Tools
• Large Scale Photomask Substrates
• Fused Silica Refractories• SiC Heat-resistant Structural Parts• SiC Setters & Saggers• SiC Heating Elements “TECORUNDUM”
• Quartz Carbon Heaters “QCH-HEATER”• Quartz Electrostatic Chucks “ARISTORUM ESC”• Foundry Filters “FLOW-RITE”
• Carbon Brushes• Ceramic Balls “CERBEC”
• Crucibles for solar cell manufacturing
• Ceramic Bone Substitutes
3
6
7
9
10
10
11
Quartz Glass Crucibles
APPLICATION : Crucibles for single crystal silicon ingot pullingM A T E R I A L : High-purity quartz glass
■ Better yield by higher purity and less bubble■ Longer process run by crystalline layer■ Less variation by process stability
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
Carbon Susceptors
APPLICATION : Wafer carriers for epitaxial growth processingM A T E R I A L : High-purity SiC coated graphite “CLEAR CARBON”
■ High purity■ Controllability of temperature distribution on wafer■ Excellent high temperature durability
SiC Wafer Boats
APPLICATION : Wafer carriers for diffusion and LP-CVD processingM A T E R I A L : High-purity silicon impregnated silicon carbide “TPSS”
■ High purity■ High temperature stability (up to 1350℃)■ Less particle generation■ Certified by major furnace manufacturers
Alumina Plasma Etcher Parts
APPLICATION : Elements for plasma etching processingM A T E R I A L : High-purity translucent alumina “SAPPHAL”
■ Extremely high purity (≧99.9%)■ Larger grain size and translucency■ Excellent electrical properties (LLT)
Photomask Substrates
APPLICATION : Photomasks for lithography processingM A T E R I A L : High-purity synthetic silica glass
■ World's most popular substrates for lithography processing, including ArF■ Superior UV transmittance■ Superior ArF laser durability■ Low birefringence
Yttria Plasma Etcher Parts
APPLICATION : Elements for plasma etching processingM A T E R I A L : High-purity yttria “EXYRIA”
■ Excellent plasma durability■ High purity■ Large size production (up to Φ550mm)
Silicon Focus Rings
APPLICATION : Focus rings for plasma etching processingM A T E R I A L : High-purity single crystal silicon
■ High purity■ Surface damage removed by acid etching■ Very low risk of particle generation in use■ Large size production (up to Φ510mm)
CoorsTek KK develops and manufactures a variety of products made of inorganic materials such as quartz glass, graphite, silicon carbide, single crystal silicon and fine ceramics, all of which are indispensable to the production of semiconductor devices. CoorsTek KK maintains a large market share for many products related to semiconductor manufacturing, a position we achieved by providing high-quality products that contribute to the higher integration and improved productivity of semiconductor devices and by utilizing our unique high-purity material and high-precision machining technologies.
SemiconductorRelated Products
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
3 PRODUCTS GUIDE PRODUCTS GUIDE 4
Quartz Glass Crucibles
APPLICATION : Crucibles for single crystal silicon ingot pullingM A T E R I A L : High-purity quartz glass
■ Better yield by higher purity and less bubble■ Longer process run by crystalline layer■ Less variation by process stability
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
Carbon Susceptors
APPLICATION : Wafer carriers for epitaxial growth processingM A T E R I A L : High-purity SiC coated graphite “CLEAR CARBON”
■ High purity■ Controllability of temperature distribution on wafer■ Excellent high temperature durability
SiC Wafer Boats
APPLICATION : Wafer carriers for diffusion and LP-CVD processingM A T E R I A L : High-purity silicon impregnated silicon carbide “TPSS”
■ High purity■ High temperature stability (up to 1350℃)■ Less particle generation■ Certified by major furnace manufacturers
Alumina Plasma Etcher Parts
APPLICATION : Elements for plasma etching processingM A T E R I A L : High-purity translucent alumina “SAPPHAL”
■ Extremely high purity (≧99.9%)■ Larger grain size and translucency■ Excellent electrical properties (LLT)
Photomask Substrates
APPLICATION : Photomasks for lithography processingM A T E R I A L : High-purity synthetic silica glass
■ World's most popular substrates for lithography processing, including ArF■ Superior UV transmittance■ Superior ArF laser durability■ Low birefringence
Yttria Plasma Etcher Parts
APPLICATION : Elements for plasma etching processingM A T E R I A L : High-purity yttria “EXYRIA”
■ Excellent plasma durability■ High purity■ Large size production (up to Φ550mm)
Silicon Focus Rings
APPLICATION : Focus rings for plasma etching processingM A T E R I A L : High-purity single crystal silicon
■ High purity■ Surface damage removed by acid etching■ Very low risk of particle generation in use■ Large size production (up to Φ510mm)
CoorsTek KK develops and manufactures a variety of products made of inorganic materials such as quartz glass, graphite, silicon carbide, single crystal silicon and fine ceramics, all of which are indispensable to the production of semiconductor devices. CoorsTek KK maintains a large market share for many products related to semiconductor manufacturing, a position we achieved by providing high-quality products that contribute to the higher integration and improved productivity of semiconductor devices and by utilizing our unique high-purity material and high-precision machining technologies.
SemiconductorRelated Products
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
3 PRODUCTS GUIDE PRODUCTS GUIDE 4
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
SiC Polishing Plates
APPLICATION : Surface plates for wafer polishingM A T E R I A L : Sintered silicon carbide “CERASIC”
■ Exclusive bonding technology■ Large size production■ Precise green body machining
Silicon Susceptors
APPLICATION : Wafer carriers/adjusters for various processingM A T E R I A L : High-purity single crystal silicon
■ High purity■ Surface damage removed by acid etching■ Very low risk of particle generation in use ■ Large size production (up to Φ510mm)
GAISER Wire Bonding Tools
APPLICATION : Wire bonding of semiconductor chipM A T E R I A L : ZTA
■ Long life capillaries and high reliability wedge tools■ A wide range of capillaries for various types of package and wire
material (gold, silver and copper)■ A variety of wedge tools for small, large, ribbon and deep access< Manufactured by CoorsTek, Inc. (USA) >
In-line Gas Filters “CEPURE”
APPLICATION : In-line gas filters for various processingM A T E R I A L : Porous alumina (filter element), stainless steel, nickel & PTFE
■ Superior gas displacement characteristics■ High corrosion resistance
Vacuum-Break Filters
APPLICATION : Diffusers for vacuum chamber (loadlock, process, etc.)M A T E R I A L : Porous alumina / Porous silica
■ Prevention of dust dispersion■ Reduction of venting time■ High corrosion resistance
Large Scale Photomask SubstratesAPPLICATION : Photomasks for LCD manufacturingM A T E R I A L : High-purity synthetic silica glass
■ Low thermal expansion■ Superior transmittance in broad wavelength spectrum■ High purity and high homogeneous■ Large size production (up to 1220x1400mm)
Due to the enlargement of flat panel displays (FPD) and the glass substrates that are one of their main components, technologies required for FPD production have been advancing. As higher technical levels have become necessary for manufacturing FPD glass substrates, CoorsTek KK’s products for FPD glass substrate manufacturing are able to meet these requirements with our unique high-purity material and high-precision machining technologies for large scale products.
FPD Related Products
FUNCTIONS / FEATURES
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
5 PRODUCTS GUIDE PRODUCTS GUIDE 6
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
SiC Polishing Plates
APPLICATION : Surface plates for wafer polishingM A T E R I A L : Sintered silicon carbide “CERASIC”
■ Exclusive bonding technology■ Large size production■ Precise green body machining
Silicon Susceptors
APPLICATION : Wafer carriers/adjusters for various processingM A T E R I A L : High-purity single crystal silicon
■ High purity■ Surface damage removed by acid etching■ Very low risk of particle generation in use ■ Large size production (up to Φ510mm)
GAISER Wire Bonding Tools
APPLICATION : Wire bonding of semiconductor chipM A T E R I A L : ZTA
■ Long life capillaries and high reliability wedge tools■ A wide range of capillaries for various types of package and wire
material (gold, silver and copper)■ A variety of wedge tools for small, large, ribbon and deep access< Manufactured by CoorsTek, Inc. (USA) >
In-line Gas Filters “CEPURE”
APPLICATION : In-line gas filters for various processingM A T E R I A L : Porous alumina (filter element), stainless steel, nickel & PTFE
■ Superior gas displacement characteristics■ High corrosion resistance
Vacuum-Break Filters
APPLICATION : Diffusers for vacuum chamber (loadlock, process, etc.)M A T E R I A L : Porous alumina / Porous silica
■ Prevention of dust dispersion■ Reduction of venting time■ High corrosion resistance
Large Scale Photomask SubstratesAPPLICATION : Photomasks for LCD manufacturingM A T E R I A L : High-purity synthetic silica glass
■ Low thermal expansion■ Superior transmittance in broad wavelength spectrum■ High purity and high homogeneous■ Large size production (up to 1220x1400mm)
Due to the enlargement of flat panel displays (FPD) and the glass substrates that are one of their main components, technologies required for FPD production have been advancing. As higher technical levels have become necessary for manufacturing FPD glass substrates, CoorsTek KK’s products for FPD glass substrate manufacturing are able to meet these requirements with our unique high-purity material and high-precision machining technologies for large scale products.
FPD Related Products
FUNCTIONS / FEATURES
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
SEMICONDUCTOR MANUFACTURING PROCESS
Finaltesting
AssemblyDicingWafertesting
Ionimplantaton/Sputtering
EtchingLithographyOxidation/Deposition
Epitaxialgrowth
Slicing/Polishing
Silicon ingotpulling
5 PRODUCTS GUIDE PRODUCTS GUIDE 6
Fused Silica RefractoriesAPPLICATION : Elements of glass melting furnaceM A T E R I A L : Fused silica refractory “GLASSUN”
■ Extremely low thermal expansion■ Low thermal conductivity■ Complicated and very large size production (up to 2000x3000x200mm)
SiC Heat-resistant Structural PartsAPPLICATION : Radiant tubes, heat exchange tubes, etc.M A T E R I A L : Sintered silicon carbide “CERASIC”
■ Long size production (up to 2350mm)■ High heat resistance and thermal conductivity■ Excellent chemical and corrosion resistance■ Long life
SiC Setters & SaggersAPPLICATION : Kiln furniture for electric partsM A T E R I A L : Recrystallized silicon carbide
■ Excellent creep resistance and thermal shock resistance■ Eexcllent temperature followability caused by low heat capacity and
high thermal conductivity■ Also available with prasma spray coating
Quartz Carbon Heaters “QCH-HEATER”APPLICATION : Various rapid, clean and partial heatingM A T E R I A L : Quartz glass & carbon wire
■ High-speed heating (reduction of heating time)■ Long-life (reduction of running costs)■ Clean and non-contact source of energy
SiC Heating Elements “TECORUNDUM”APPLICATION : Various high temperature industrial heatingM A T E R I A L : Recrystallized silicon carbide
■ High temperature (up to 1400℃)■ High chemical and corrosion resistance■ Various material grades, shapes, and coatings
Quartz Electrostatic Chucks “ARISTORUM ESC”APPLICATION : Chucking for non-conductive substratesM A T E R I A L : Quartz glass & electrically conductive material
■ Chucking wafers of sapphire, quartz glass and silicon■ Quick chucking and de-chucking response: within 1 sec■ Particle free and low outgassing
Foundry Filters “FLOW-RITE”APPLICATION : Foundry filters for iron, aluminum and steelM A T E R I A L : A kind of mullite
■ Excellent hot strength■ Stable filtration performance■ Applicable to various sizes of casting, from small to large< Manufactured by CoorsTek, Inc. (USA) >
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
CoorsTek KK develops and manufactures a wide range of products made of inorganic materials for use in many industries with extreme environments that require high heat resistance, corrosion resistance, abrasion resistance and/or cleanliness by using in-depth knowledge and an abundance of know-how with materials such as silicon carbide and quartz glass.
General Industrial Products
7 PRODUCTS GUIDE PRODUCTS GUIDE 8
Fused Silica RefractoriesAPPLICATION : Elements of glass melting furnaceM A T E R I A L : Fused silica refractory “GLASSUN”
■ Extremely low thermal expansion■ Low thermal conductivity■ Complicated and very large size production (up to 2000x3000x200mm)
SiC Heat-resistant Structural PartsAPPLICATION : Radiant tubes, heat exchange tubes, etc.M A T E R I A L : Sintered silicon carbide “CERASIC”
■ Long size production (up to 2350mm)■ High heat resistance and thermal conductivity■ Excellent chemical and corrosion resistance■ Long life
SiC Setters & SaggersAPPLICATION : Kiln furniture for electric partsM A T E R I A L : Recrystallized silicon carbide
■ Excellent creep resistance and thermal shock resistance■ Eexcllent temperature followability caused by low heat capacity and
high thermal conductivity■ Also available with prasma spray coating
Quartz Carbon Heaters “QCH-HEATER”APPLICATION : Various rapid, clean and partial heatingM A T E R I A L : Quartz glass & carbon wire
■ High-speed heating (reduction of heating time)■ Long-life (reduction of running costs)■ Clean and non-contact source of energy
SiC Heating Elements “TECORUNDUM”APPLICATION : Various high temperature industrial heatingM A T E R I A L : Recrystallized silicon carbide
■ High temperature (up to 1400℃)■ High chemical and corrosion resistance■ Various material grades, shapes, and coatings
Quartz Electrostatic Chucks “ARISTORUM ESC”APPLICATION : Chucking for non-conductive substratesM A T E R I A L : Quartz glass & electrically conductive material
■ Chucking wafers of sapphire, quartz glass and silicon■ Quick chucking and de-chucking response: within 1 sec■ Particle free and low outgassing
Foundry Filters “FLOW-RITE”APPLICATION : Foundry filters for iron, aluminum and steelM A T E R I A L : A kind of mullite
■ Excellent hot strength■ Stable filtration performance■ Applicable to various sizes of casting, from small to large< Manufactured by CoorsTek, Inc. (USA) >
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
CoorsTek KK develops and manufactures a wide range of products made of inorganic materials for use in many industries with extreme environments that require high heat resistance, corrosion resistance, abrasion resistance and/or cleanliness by using in-depth knowledge and an abundance of know-how with materials such as silicon carbide and quartz glass.
General Industrial Products
7 PRODUCTS GUIDE PRODUCTS GUIDE 8
Carbon BrushesAPPLICATION : Brushes for DC electric motorsM A T E R I A L : Carbon & copper
■ Lead-free and silica-free■ Stable quality by high productivity manufacturing process
FUNCTIONS / FEATURES FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
Ceramic Balls “CERBEC”APPLICATION : High-temperature and high-speed bearingsM A T E R I A L : Silicon nitride
■ Harder and sti�er■ High corrosion and electrical resistance■ Light weight and low thermal expansion■ Smooth surface and accurate geometry< Manufactured by CoorsTek, Inc. (USA) >
Crucibles for solar cell manufacturingAPPLICATION : Crucibles for polycrystalline silicon ingot castingM A T E R I A L : Fused silica
■ High purity and low contamination■ Large size production (up to □1300x500mm)
Ceramic Bone SubstitutesAPPLICATION : Artifical bones for orthopedic surgeryM A T E R I A L : 3D-interconnected porous structure hydroxyapatite
■ New natural bone growing inside■ High biocompatibility■ Good machinability
CoorsTek KK develops and manufactures automotive, electric and mechanical products whose users require materials with special functions not realized by metal or resin parts.
Automotive, Electric &Mechanical Products
As bio and medical needs increase with a rapidly aging society, CoorsTek KK has been developing and manufacturing bio and medical related products with our advanced material and porous medium forming technology.
Bio and Medical RelatedProducts
Using our experience in products related to semiconductor manufacturing, CoorsTek KK applies in-depth knowledge of silicon melting processes and manufacturing technology in fused silica refractories to provide products for solar cell manufacturing.
Solar Cell Related Products
9 PRODUCTS GUIDE PRODUCTS GUIDE 10
Carbon BrushesAPPLICATION : Brushes for DC electric motorsM A T E R I A L : Carbon & copper
■ Lead-free and silica-free■ Stable quality by high productivity manufacturing process
FUNCTIONS / FEATURES FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
FUNCTIONS / FEATURES
Ceramic Balls “CERBEC”APPLICATION : High-temperature and high-speed bearingsM A T E R I A L : Silicon nitride
■ Harder and sti�er■ High corrosion and electrical resistance■ Light weight and low thermal expansion■ Smooth surface and accurate geometry< Manufactured by CoorsTek, Inc. (USA) >
Crucibles for solar cell manufacturingAPPLICATION : Crucibles for polycrystalline silicon ingot castingM A T E R I A L : Fused silica
■ High purity and low contamination■ Large size production (up to □1300x500mm)
Ceramic Bone SubstitutesAPPLICATION : Artifical bones for orthopedic surgeryM A T E R I A L : 3D-interconnected porous structure hydroxyapatite
■ New natural bone growing inside■ High biocompatibility■ Good machinability
CoorsTek KK develops and manufactures automotive, electric and mechanical products whose users require materials with special functions not realized by metal or resin parts.
Automotive, Electric &Mechanical Products
As bio and medical needs increase with a rapidly aging society, CoorsTek KK has been developing and manufacturing bio and medical related products with our advanced material and porous medium forming technology.
Bio and Medical RelatedProducts
Using our experience in products related to semiconductor manufacturing, CoorsTek KK applies in-depth knowledge of silicon melting processes and manufacturing technology in fused silica refractories to provide products for solar cell manufacturing.
Solar Cell Related Products
9 PRODUCTS GUIDE PRODUCTS GUIDE 10
Main Material Line-up
These values are typical and should not be considered as specifications. The characteristic values may vary depending on product shape and conditions of use.
1.40
90
-
17
0.18
100Hs
-
3.2RT~450℃
-
-
-
2000(inert atmos.)
5.0x10-3
-
-
0.79
4.95
-
-
-
-
-
-
0.4
-
-
-
-
-
-
-
40
-
-
-
-
-
4.8RT~450℃
-
-
1500(inert atmos.)
-
-
1.88
40
-
10
0.12
60Hs
-
4.8RT~450℃
107
52(1000℃)
-
3000(inert atmos.)
1.1x10-3
-
-
2.52
400
-
420~460
0.21
28.6~34.7GPa(2800~3400)
3~5
4.5RT~1000℃
20~40
-
10-1~101
-
-
2.4
42
401300℃
160
-
-
-
4.3RT~1000℃
105
-
-
1500
-
-
3.15
450
4501450℃
420
0.18
23.5GPa(2300)
3.5
4.5RT~1000℃
170
55(1000℃)
450
1500
104~106
-
-
3.0
260
2801200℃
360
0.16
20.4GPa(2000)
4.0
4.2RT~1000℃
220
55(1000℃)
350
1370
10+1~10-1
-
-
2.33
~300
-
190
0.27
10.6GPa(1040)
-
3.9RT~1000℃
157
-
-
1300
2.4x104
-
-
3.9
350
-
360
0.23
16GPa(1600)
4.5
7.8RT~900℃
30
8(1000℃)
220
1500
1016
9.910GHz
1.0x10-3
10GHz
3.99
300
-
395
0.23
17.7GPa(1770)
4.0
8.0RT~900℃
35
9(1000℃)
200
1800
1017
10.110GHz
1.0x10-4
10GHz
1.95
13.1
-
-
-
-
-
0.4RT~1000℃
-
1.02(1000℃)
-
1000
-
-
-
2.2
105
149900℃
72
0.17
9.7GPa(950)
-
0.65RT~1000℃
1.4
3(900℃)(t2.0mm)
>1000
1000
1018
3.581MHz
1.5x10-4
1MHz
2.2
105
149900℃
72
0.17
9.7GPa(950)
-
0.5RT~1000℃
1.5
-
>1000
1100
1018
3.581MHz
1.5x10-4
1MHz
4.9
110
-
170
0.30
6.1GPa(600)
1.2
8.2RT~900℃
14
-
130
2000
1016
12.013.56MHz
6x10-4
13.56MHz
g/cm3
MPa
MPa
GPa
-
GPa(kgf/mm2)
(MPa・m1/2)
x10-6/K
W/(m・K)
W/(m・K)
℃
℃
Ω・cm
Bulk Density
Typical Products
High-purityquartz glass
High-puritysynthetic
silica glass
GLASSUNFused silicarefractory
SAPPHALHigh-puritytranslucent
alumina
ADSHigh-purity
alumina
EXYRIAHigh-purity
yttria
High-puritysingle crystal
silicon
TPSS High-purity silicon
impregnatedsilicon carbide
CERASICSintered
silicon carbide
HE766Recrystallizedsilicon carbide
Sintered boron carbide
High-puritygraphite
CLEAR CARBONHigh-purity SiCcoated graphite
CERAPHITERobust
and sturdycarbon
3D-inter-connected porous
structurehydroxyapatite
HydroxyapatiteCarbonBoron CarbideSilicon CarbideSiliconQuartz Glass/Silica Alumina Yttria
BendingStrength
ThermalConductivity
Room Temp.
High Temp.
Young's Modulus
Poisson's Ratio
Vickers Hardness
Fracture Toughness(KⅠc)
Coe�cient of ThermalExpansion
Mec
hani
cal P
rop
erti
esTh
erm
al P
rop
erti
esEl
ectr
ical
Pro
pert
ies
Room Temp.
High Temp.
Thermal ShockResistance Tc
Max. Use Temperature
Electrical VolumeResistivity
Dielectric Constant
Dielectric Loss (Tan Delta)
Quartz glasscrucibles
Photomasksubstrates
Fused silicarefractories
Alumina plasmaetcher parts
Lapping plates Yttria plasmaetcher parts
Silicon focusrings
Siliconsusceptors
SiC wafer boats
SiC processtubes
SiC heat-resistantstructural parts
SiC polishingplates
SiC setters &saggers
Blasting nozzles Carboncrucibles
Carbon heaters
Carbonsusceptors
Carbon airsliders
Ceramic bonesubstitutes
11 PRODUCTS GUIDE PRODUCTS GUIDE 12
Main Material Line-up
These values are typical and should not be considered as specifications. The characteristic values may vary depending on product shape and conditions of use.
1.40
90
-
17
0.18
100Hs
-
3.2RT~450℃
-
-
-
2000(inert atmos.)
5.0x10-3
-
-
0.79
4.95
-
-
-
-
-
-
0.4
-
-
-
-
-
-
-
40
-
-
-
-
-
4.8RT~450℃
-
-
1500(inert atmos.)
-
-
1.88
40
-
10
0.12
60Hs
-
4.8RT~450℃
107
52(1000℃)
-
3000(inert atmos.)
1.1x10-3
-
-
2.52
400
-
420~460
0.21
28.6~34.7GPa(2800~3400)
3~5
4.5RT~1000℃
20~40
-
10-1~101
-
-
2.4
42
401300℃
160
-
-
-
4.3RT~1000℃
105
-
-
1500
-
-
3.15
450
4501450℃
420
0.18
23.5GPa(2300)
3.5
4.5RT~1000℃
170
55(1000℃)
450
1500
104~106
-
-
3.0
260
2801200℃
360
0.16
20.4GPa(2000)
4.0
4.2RT~1000℃
220
55(1000℃)
350
1370
10+1~10-1
-
-
2.33
~300
-
190
0.27
10.6GPa(1040)
-
3.9RT~1000℃
157
-
-
1300
2.4x104
-
-
3.9
350
-
360
0.23
16GPa(1600)
4.5
7.8RT~900℃
30
8(1000℃)
220
1500
1016
9.910GHz
1.0x10-3
10GHz
3.99
300
-
395
0.23
17.7GPa(1770)
4.0
8.0RT~900℃
35
9(1000℃)
200
1800
1017
10.110GHz
1.0x10-4
10GHz
1.95
13.1
-
-
-
-
-
0.4RT~1000℃
-
1.02(1000℃)
-
1000
-
-
-
2.2
105
149900℃
72
0.17
9.7GPa(950)
-
0.65RT~1000℃
1.4
3(900℃)(t2.0mm)
>1000
1000
1018
3.581MHz
1.5x10-4
1MHz
2.2
105
149900℃
72
0.17
9.7GPa(950)
-
0.5RT~1000℃
1.5
-
>1000
1100
1018
3.581MHz
1.5x10-4
1MHz
4.9
110
-
170
0.30
6.1GPa(600)
1.2
8.2RT~900℃
14
-
130
2000
1016
12.013.56MHz
6x10-4
13.56MHz
g/cm3
MPa
MPa
GPa
-
GPa(kgf/mm2)
(MPa・m1/2)
x10-6/K
W/(m・K)
W/(m・K)
℃
℃
Ω・cm
Bulk Density
Typical Products
High-purityquartz glass
High-puritysynthetic
silica glass
GLASSUNFused silicarefractory
SAPPHALHigh-puritytranslucent
alumina
ADSHigh-purity
alumina
EXYRIAHigh-purity
yttria
High-puritysingle crystal
silicon
TPSS High-purity silicon
impregnatedsilicon carbide
CERASICSintered
silicon carbide
HE766Recrystallizedsilicon carbide
Sintered boron carbide
High-puritygraphite
CLEAR CARBONHigh-purity SiCcoated graphite
CERAPHITERobust
and sturdycarbon
3D-inter-connected porous
structurehydroxyapatite
HydroxyapatiteCarbonBoron CarbideSilicon CarbideSiliconQuartz Glass/Silica Alumina Yttria
BendingStrength
ThermalConductivity
Room Temp.
High Temp.
Young's Modulus
Poisson's Ratio
Vickers Hardness
Fracture Toughness(KⅠc)
Coe�cient of ThermalExpansion
Mec
hani
cal P
rop
erti
esTh
erm
al P
rop
erti
esEl
ectr
ical
Pro
pert
ies
Room Temp.
High Temp.
Thermal ShockResistance Tc
Max. Use Temperature
Electrical VolumeResistivity
Dielectric Constant
Dielectric Loss (Tan Delta)
Quartz glasscrucibles
Photomasksubstrates
Fused silicarefractories
Alumina plasmaetcher parts
Lapping plates Yttria plasmaetcher parts
Silicon focusrings
Siliconsusceptors
SiC wafer boats
SiC processtubes
SiC heat-resistantstructural parts
SiC polishingplates
SiC setters &saggers
Blasting nozzles Carboncrucibles
Carbon heaters
Carbonsusceptors
Carbon airsliders
Ceramic bonesubstitutes
11 PRODUCTS GUIDE PRODUCTS GUIDE 12
CoorsTek KK
Head OfficeOsaki Wiz Tower, 11-1, Ohsaki 2-chome, Shinagawa-ku, Tokyo 141-0032, JapanTEL +81-3-5437-8411 FAX +81-3-5437-7172
Oguni Facility378, Oguni-machi Oaza, Oguni-machi, Nishiokitamagun, Yamagata Prefecture 999-1351, JapanTEL +81-238-62-5902 FAX +81-238-62-5178
Hadano Facility30, Soya, Hadano City,Kanagawa Prefecture 257-8566, JapanTEL +81-463-81-1050 FAX +81-463-81-1664
Kariya Facility1, Minami-Fuji, Ogakie-cho, Kariya City,Aichi Prefecture 448-8665, JapanTEL +81-566-21-2851 FAX +81-566-21-6365
CoorsTek Sales KK (Domestic Sales Company)
Head OfficeOsaki Wiz Tower, 11-1, Ohsaki 2-chome, Shinagawa-ku, Tokyo 141-0032, JapanTEL +81-3-5437-8411 FAX +81-3-5437-7395
Overseas Subsidiaries
CoorsTek Taiwan Corp.16F-4, No. 295, Sec. 2, Kuang-Fu Road, Hsin-Chu 30017, TaiwanTEL +886-(0)3-575-1238 FAX +886-(0)3-575-1633
Chubu Branch1, Minami-Fuji, Ogakie-cho, Kariya City, Aichi Prefecture 448-8665, JapanTEL (0566)21-3507 FAX (0566)21-3152
Domestic Subsidiaries
CoorsTek Tokuyama Corporation2-1-32, Eguchi, Shunan City, Yamaguchi Prefecture 745-0862, JapanTEL+81-834-32-3400 FAX+81-834-22-5898
CoorsTek Nagasaki Corporation296, Kawatana-cho Momozugo, Higashisonogi-gun, Nagasaki Prefecture 859-3605, JapanTEL+81-956-82-3111 FAX+81-956-82-3111
Tohoku Branch5-15, Kamisugi 1-chome, Aoba-ku, Sendai City, Miyagi Prefecture 980-0011, JapanTEL +81-22-264-2241 FAX +81-22-264-2242
CoorsTek Japan, which until recently had handled product sales in Japan for CoorsTek Inc., is now “CoorsTek Sales KK” as the result of a merger that took place on July 1, 2016.
CoorsTek, Inc. (USA)Based in Colorado in the United States, CoorsTek is the world’s largest engineered ceramics manufacturer. With over 50 manufacturing bases throughout the world, CoorsTek supplies products to customers in more than 10,000 businesses across 70 countries in many fields, including the semiconductor, energy, automotive and medical industries.
Our 100 year historyThe roots of CoorsTek, Inc. and CoorsTec KK originated in the US and Japan respectively in the early 1900s. We will continue to provide our customers with Amazing Solutions for the next 100 years based on assets cultivated each company over our combined 200 years.
CoorsTek KK (Japan) CoorsTek, Inc. (USA)
1910s
1920s
1930s
1940s
1950s
1960s
1970s
1980s
1990s
2000s
2010s
1918 Toyo Fire Brick Company established (later becomes Thoshiba Refractories Co., Ltd.)
1968 Thoshiba Denko and Toshiba Refractories merge to become Toshiba Ceramics Co., Ltd.
1910 Herold China and Pottery Company established (later becomes CoorsTek, Inc. (USA))
2007 Covalent Materials Corporation established through management buyout
1928 Denki Kinyu K.K. established (later becomes Thoshiba Denko Co., Ltd.)
1923 Introduces heat-resistant ovenware products
1942 Develops isostatic press technology1938 Oguni facility built
1965 Introduces ceramic substrates for use in electronic equipment
1986 Coors Porcelain becomes Coors Ceramics
2000 Coors Ceramics changes its name to CoorsTek
2011 Acquires Saint-Gobain's advanced ceramics business2014 Acquires Covalent Materials Corporation
1972 Introduces TPSS Si-Impregnated Silicone Cabide Products
1997 Develops and markets super high-purity quartz glass
2015 Covalent Materials changes its name to CoorsTek KK
13 PRODUCTS GUIDE PRODUCTS GUIDE 14
★ Corporate Headquarters
● CoorsTek Manufacturing Facility ● CoorsTek Sales/Distribution Center
CoorsTek KK
Head OfficeOsaki Wiz Tower, 11-1, Ohsaki 2-chome, Shinagawa-ku, Tokyo 141-0032, JapanTEL +81-3-5437-8411 FAX +81-3-5437-7172
Oguni Facility378, Oguni-machi Oaza, Oguni-machi, Nishiokitamagun, Yamagata Prefecture 999-1351, JapanTEL +81-238-62-5902 FAX +81-238-62-5178
Hadano Facility30, Soya, Hadano City,Kanagawa Prefecture 257-8566, JapanTEL +81-463-81-1050 FAX +81-463-81-1664
Kariya Facility1, Minami-Fuji, Ogakie-cho, Kariya City,Aichi Prefecture 448-8665, JapanTEL +81-566-21-2851 FAX +81-566-21-6365
CoorsTek Sales KK (Domestic Sales Company)
Head OfficeOsaki Wiz Tower, 11-1, Ohsaki 2-chome, Shinagawa-ku, Tokyo 141-0032, JapanTEL +81-3-5437-8411 FAX +81-3-5437-7395
Overseas Subsidiaries
CoorsTek Taiwan Corp.16F-4, No. 295, Sec. 2, Kuang-Fu Road, Hsin-Chu 30017, TaiwanTEL +886-(0)3-575-1238 FAX +886-(0)3-575-1633
Chubu Branch1, Minami-Fuji, Ogakie-cho, Kariya City, Aichi Prefecture 448-8665, JapanTEL (0566)21-3507 FAX (0566)21-3152
Domestic Subsidiaries
CoorsTek Tokuyama Corporation2-1-32, Eguchi, Shunan City, Yamaguchi Prefecture 745-0862, JapanTEL+81-834-32-3400 FAX+81-834-22-5898
CoorsTek Nagasaki Corporation296, Kawatana-cho Momozugo, Higashisonogi-gun, Nagasaki Prefecture 859-3605, JapanTEL+81-956-82-3111 FAX+81-956-82-3111
Tohoku Branch5-15, Kamisugi 1-chome, Aoba-ku, Sendai City, Miyagi Prefecture 980-0011, JapanTEL +81-22-264-2241 FAX +81-22-264-2242
CoorsTek Japan, which until recently had handled product sales in Japan for CoorsTek Inc., is now “CoorsTek Sales KK” as the result of a merger that took place on July 1, 2016.
CoorsTek, Inc. (USA)Based in Colorado in the United States, CoorsTek is the world’s largest engineered ceramics manufacturer. With over 50 manufacturing bases throughout the world, CoorsTek supplies products to customers in more than 10,000 businesses across 70 countries in many fields, including the semiconductor, energy, automotive and medical industries.
Our 100 year historyThe roots of CoorsTek, Inc. and CoorsTec KK originated in the US and Japan respectively in the early 1900s. We will continue to provide our customers with Amazing Solutions for the next 100 years based on assets cultivated each company over our combined 200 years.
CoorsTek KK (Japan) CoorsTek, Inc. (USA)
1910s
1920s
1930s
1940s
1950s
1960s
1970s
1980s
1990s
2000s
2010s
1918 Toyo Fire Brick Company established (later becomes Thoshiba Refractories Co., Ltd.)
1968 Thoshiba Denko and Toshiba Refractories merge to become Toshiba Ceramics Co., Ltd.
1910 Herold China and Pottery Company established (later becomes CoorsTek, Inc. (USA))
2007 Covalent Materials Corporation established through management buyout
1928 Denki Kinyu K.K. established (later becomes Thoshiba Denko Co., Ltd.)
1923 Introduces heat-resistant ovenware products
1942 Develops isostatic press technology1938 Oguni facility built
1965 Introduces ceramic substrates for use in electronic equipment
1986 Coors Porcelain becomes Coors Ceramics
2000 Coors Ceramics changes its name to CoorsTek
2011 Acquires Saint-Gobain's advanced ceramics business2014 Acquires Covalent Materials Corporation
1972 Introduces TPSS Si-Impregnated Silicone Cabide Products
1997 Develops and markets super high-purity quartz glass
2015 Covalent Materials changes its name to CoorsTek KK
13 PRODUCTS GUIDE PRODUCTS GUIDE 14
★ Corporate Headquarters
● CoorsTek Manufacturing Facility ● CoorsTek Sales/Distribution Center
PRODUCTS GUIDE
Osaki Wiz Tower, 11-1, Osaki 2-chome,Shinagawa-ku, Tokyo 141-0032, Japan
www.coorstek.co.jp
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