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ANALYTICS AND QUALITY ASSURANCE
F R A U N H O F E R I N S T I T U T E F O R S U R F A C E E N G I N E E R I N G A N D T H I N F I L M S I S T
What we offer
In the development of new materials and manufacturing
processes, for quality assurance in production as well as for
the clarification of damage claims, the availability of analysis
and testing methods is a decisive factor. The Fraunhofer Insti-
tute for Surface Engineering and Thin Films IST offers a wide
range of methods as well as extensive expertise in the field of
layer analysis and testing technology. With more than 2,500
investigative assignments within ten years for more than 380
customers, the Fraunhofer IST has acquired an extensive range
of experience in the processing of industry-relevant issues,
such as:
� Support of material and process development
� Quality assurance in production
� Failure analyses
� Development of customer-specific testing technology
1
1 Micrograph of a dot array by means of
confocal laser microscopy (CLM).
2 Laser-structured trench, taken with the
atomic force microscope (AFM).
3 CLM micrograph of vickers indentations
in a surface.
4 CLM micrograph of particles on a surface.
2
Our range of services
� Advice on optimal analysis and testing methods
� Contract work using the latest analysis and testing equipment
� Analysis of surfaces and coatings, including technical objects such as components, tools and all kinds of everyday objects
� Fast processing, also within 24 hours
� Documentation and electronic transmission of results
� Processing performed by experienced employees
� Access to the knowledge and expertise of all departments of the Fraunhofer IST
ANALYTICS UND QUALITY ASSURANCE
Analytics
� Scanning electron microscopy (SEM)
� Focused ion beam (FIB and STEM)
� Energy-dispersive X-ray spectroscopy (EDX)
� Electron probe microanalysis (EPMA / WDX)
� Secondary ion mass spectrometry (SIMS)
� X-ray photoelectron spectroscopy (XPS)
� Glow-discharge spectroscopy (GDOES)
� X-ray diffraction (XRD)
� X-ray reflectivity (XRR)
� Atomic force microscopy (AFM)
� Confocal laser microscopy (CLM)
Measurement and testing methods
for friction and wear
� Pin-on-disc (adhesive)
� Ball-cratering (abrasive)
� High-load tribometer
� High-temperature tribometer
� Impact test
� Taber Abraser test
� Microtribology
3 4
Optical characterization
� IR / visible / UV spectroscopy
� Raman spectroscopy
� Colorimetry
� Ellipsometry
� Scattered light (haze)
� I-V curve measurement
� Quantum yield measurement
� CPM measurement
Other analytical methods
� Film-thickness measurement
� Profilometry (2D, 3D)
� Optical microscopy (2D, 3D)
� Hardness and Young´s modulus (micro- and nano-hardness)
� Film adhesion (scratch and Rockwell tests)
� Surface energy (wetting properties)
� Corrosion testing
� Environmental testing
� Vibrating sample magnetometer (VSM)
� Photocatalytic measurement technology
OVERVIEW OF OUR EXAMINATION METHODS
Scanning electron microscopy – SEM
Scanning electron microscopy SEM allows the imaging of
surfaces, fractures or cross-sections with high resolution
(~ 2 – 5 nm) and high depth of field. It is a versatile tool which
makes it possible to move through the magnification range of
20 x to 200 000 x within seconds, to switch quickly from one
sample to another and to image non-conductive surfaces by
means of sputtering. In combination with X-ray spectroscopy
(EDX), the SEM is the ideal tool for damage analysis as it
combines microscopic visualization with local chemical
analysis. On fractures or cross-sections, it can be used for
precise determination of film thickness in the nanometer to
millimeter range. By means of various detectors (Inlens, SE,
BSE), different contrasts can be highlighted, e. g. element or
topography contrast.
Focused ion beam – FIB
With focused ion beam FIB, microscopic defects, small spot
correction, cracks or artificial microstructures can be examined
in the SEM, even under the surface, and the cause of defects
can be clarified. The finely focused ion beam allows the tar-
geted removal of sample material in SEM under visual control
with an accuracy of < 100 nm. This opens up a diverse range
of investigation possibilities.
Fields of application
� Cross-section preparation: Preparation of local cross-sec-tions, e. g. for target preparation of very small defects (see Fig. 5). Materials such as polymers, glass, diamond, hard metal, leather, textiles, wood, paper and porous materials can be processed.
� Tomography: Creation of serial cuts for three-dimensional capture of structures or microstructures below the surface.
� Lamella preparation and STEM: STEM images (scanning transmission electron microscopy) make the internal structure of a material visible at the cross-section with par-ticularly high resolution, e. g. by means of crystallographic orientation contrast (see Fig. 6). In addition, chemical anal-ysis (EDX) with a spatial resolution of only 5 nm is possible. Compared to conventional cross-sections, this means an improvement by a factor of 100.
� Lithography: Through targeted material removal, complex structures can be scribed into the surface with high resolution.
5 6 TiAgZn
ZnOx 45 nm
Ag 12 nm
SiNx 45 nm
Pt protective layer
5 FIB section in TaOx-SiOx multilayer with em-
bedded particle.
6 STEM image of a low-emissivity coating sys-
tem: ZnO / TiO2 / Ag / ZnO / SiN / glass. EDX
mapping of the low-emissivity coating sys-
tem reaches a resolution of approx. 5 nm.
7 EDX-Mapping of the elements Ti, W and Co
of 2 µm thick TiN-layer fractured edge on a
hard metal substrate (WC:Co).
8 Schematic diagram of the thin film meth-
od: Simultaneous determination of film
thickness and composition of thin multiple
layers by WDX.
TiO2 5 nm
5 µm
X-ray radiation
Layer 1Layer 2
Substrate
Electron beam
7 8
X-ray spectroscopy – EDX
Electron beam-excited X-ray spectroscopy with semiconductor
detector (EDX) is a qualitative and quantitative chemical
element analysis. Important advantages are:
� Measurability of all chemical elements except H, He, Li and Be
� Detection limit of around 0.1 wt.%
� High spatial and depth resolution of ~1 µm (partly 0.3 µm)
In combination with the imaging of the sample in the SEM,
EDX is the ideal tool e. g. for the analysis of unknown techni-
cal samples, for damage analysis or material examination. As
an example, Figure 7 shows a high-resolution 2-dimensional
element-distribution image of a TiN layer on hard metal.
X-ray spectroscopy – WDX / EPMA
In wavelength-dispersive X-ray spectroscopy (WDX), the X-ray
radiation is detected by means of five crystal spectrometers.
This has the following advantages:
� 10 x better energy resolution than EDX (see left figure)
� 10 x better detection limit of around 0.01 wt.%
� high absolute precision
It is therefore very suitable for quantitative analysis, also of
trace elements. By means of special evaluation algorithms,
WDX can also be used for the simultaneous and non-destruc-
tive determination of film thicknesses and the composition of
thin films < 500 – 1000 nm (see Fig. 8). This also applies in part
to multiple and ultra-thin films of only 1 – 10 nm. One example
is the determination of oxide film thicknesses.
TiCoW
Inte
nsity
[n]
Energy [keV]
4.2 4.4 4.6 4.8 5.0 5.2
EDX = 110 eV WDX = 10 eV
0
10000
20000
TiKα-Line energy resolution of EDX and WDX.
MO-DiskAl
GdTbFe
PC
Com
posi
tion
[at%
]
0 40
Distance from center [mm]
105 15 20 3525 30
dGd-Tb-Fe
Tb
GdFe
dAl
0
10
20
30
40
50
60
70
0
10
20
30
40
50
60
70
Thic
knes
s [n
m]
Simultaneous and location-dependent determination of film
thickness and composition of a Al/GdTbFe double layer on a
polycarbonate substrate.
1 µm
9 10
Secondary ion mass spectrometry – SIMS
In secondary ion mass spectrometry (SIMS), the sample surface
is removed layer-by-layer using an ion beam. A mass spec-
trometer enables the chemical characterization of the removed
material.
The advantages
� Quantitative concentration-depth profiles with a depth range from only a few nanometers up to more than 10 µm
� Chemical analysis of interfaces and surfaces
� Detection of trace elements with a very high degree of sensitivity (< 1 ppm)
� Detection of all elements (including hydrogen)
� Depth profiling even on technical objects such as compo-nents or tools
Calibrating the concentrations is a special challenge in
secondary ion mass spectrometry since, due to matrix effects,
raw intensities can vary by many orders of magnitude. This
problem is approached by applying the Cs+ cluster method
in combination with a pool of more than 300 different
calibration materials, which are used as matched calibration
standards. An extensive experience, in particular in the field
of tribological protective coatings (DLC, metal-DLC, nitrides,
carbides, etc.) and optical multi-layer systems with metallic
and oxidic films of only a few nanometers in thickness exists.
Applications are found in all areas of engineering, tool
manufacturing, the automotive industry and the glass-coating
industry as well as in the fields of decorative coatings and
consumer goods.
C Ti N Fe H
0
20
40
60
80
100
0 1 2 3 4 5Depth [µm]
Con
cent
ratio
n [%
]
SIMS depth profile of a TiCN coating with intermediate
layers.
0
20
40
60
80
100
0 20 40 60 80 100 120Depth [nm]
Con
cent
ratio
n [%
]
ZnOSiN
SnO2
ZnO
TiONSiO2
TiON Ag
N O Si TiZn Nb Ag Sn
SIMS depth profile of a low-E architectural glass coating.
13 14
X-ray diffraction – XRD
X-ray diffraction (XRD) is a versatile technique for investigating
the structure of crystalline materials. Advantages of XRD are
� the identification of crystallographic phases,
� the measurement of particle sizes (2 – 200 nm),
� the determination of the preferred grain orientations (texture) and
� the determination of residual stresses.
The investigation can be performed on both planar and
curved component surfaces. One field of specialty at the
Fraunhofer IST is the characterization of thin films (in the
micrometer to nanometer range).
11 12
9-10 SIMS.
11 XRD pole figures for (200), (220), (311) and (111)
lattice planes of an electroplated Ni coating.
12 Inverse pole figure of the Ni coating, calculated
from the orientation distribution function (ODF).
0
100
400
Intensity
Position [°2-theta]
20 30 40 50 60 70 80 90 100
Diffractograms of lead zirconate titanate coatings, deposited
with different process parameters, measured under grazing
incidence.
Angle of incidence (°)
Inte
nsity
0.2 0.6 1.0 1.4 1.8 2.2 2.6 3.0
0
1
10
100
1 000
10 000
100 000
1 000 000
10 000 000
Layer Density [g/cm3] Thickness [nm] Surface roughness [nm]
Ag 9.5 9.4 1.9
ZnO 4.6 18.9 1.1
SiO2 1.9 - 0.7
Reflectivity curve of an Ag-ZnO double-layer on glass. Deter-
mination of density, thickness and surface roughness.
X-ray reflectivity – XRR
By means of X-ray reflectivity (XRR), it is possible to measure
the coating thickness, density and interfacial surface rough-
ness of ultra-thin films and multiple layers on very smooth
substrates. Layer thicknesses of approx. 2 to 200 nm can be
measured. Substrates should preferably be glass or silicon
wafers. Accuracies of ~ 0.2 nm are achieved in layer-thickness
measurements. XRR is one of the few methods which permits
density measurement without the need for weighing, and
it also makes the roughness of “buried” internal interfaces
between layers accessible.
X-ray photoelectron spectroscopy – XPS
X-ray photoelectron spectroscopy is a chemical analysis tech-
nique with a high surface sensitivity and a signal depth of
only 5 – 10 nm. Excited by X ray irradiation, photoelectrons are
emitted by the sample. The kintetic energy of these photoelec-
trons allow conclusions to be drawn concerning the material
composition on the basis of element-specific energy levels (all
elements except H and He). The detection limit lies at around
0.1 wt.%, whilst the analysis accuracy is in the percentage
range. With this method, even monolayers or the slightest sur-
face impurities can be analyzed.
The surface of materials or coatings often has a different
composition than the base material due to reaction layers, ad-
sorbates or surface tension-driven processes. As an example:
In combination with ion beam-induced erosion (sputtering),
surface enrichments can be identified and depth profiles of
100 nm depth and more can be created.
XPS also offers the possibility of making statements regarding
binding states, oxidation states or the proportion of differing
binding partners, for example in polymers (e. g. CH2, =CH
and -CH2-O), as the chemical environment of an atom influ-
ences the energy levels of the electrons.
13
13 XPS unit.
14 Nanoindentor impression in polymer coating.
15 Micro-scratch in quartz glass.
900 850
0
2
4
6
380 360 340
Ag-3d
Inte
nsity
Bond energy [eV]
Ni-2p
5% Ni90% Ni
After deposition After sputtering
XPS spectra of a 50 nm Ni-Ag coating before and after
sputter erosion (approx. 30 nm) of the surface. The Ag is
concentrated at the surface.
294 292 290 288 286 284 2820
2000
4000
6000
8000
10000
12000
14000
cts
Bond energy [eV]
Bond partners:
-CH2 / = CH
-C(O)-O (ester group)
-CH2-O (ester group)
Satellite peak
C peak of an XPS measurement of a PET film. The different
bond partners of the carbon atoms result in a peak splitting.
14 15
Microtribology
The same device also facilitates friction and wear tests on a
micrometer scale. A conical diamond tip is laterally guided
over the surface under a defined load, and friction and wear
are thereby determined. Furthermore, scratch tests with an
increasing load (see diagram), oscillating tests at a constant
load and area wear tests are also possible. This technique
enables scratch and wear tests to be carried out even on very
thin coatings (thickness 5 – 500 nm), which is not possible with
conventional scratch or tribological tests.
Nanoindentation
Nanoindentation allows the local determination of hardness
and Young’s modulus for ultra-thin films (> 300 nm) with a
lateral resolution in the micrometer range and therefore also
enables local hardness measurements or hardness mappings
on inhomogeneous samples. Furthermore, creep or relaxation
tests can also be performed in order to characterize the visco-
elastic properties of polymer layers or the self-healing behavior
of scratches in paints.
-180
-160
-140
-120
-100
-80
-60
-40
-20
0
20
-7 -5 -3 -1 1 3 5 7Lateral displacement [µm]
Pene
trat
ion
dept
h [n
m]
0.1
0.12
0.14
0.16
0.18
0.2
0.22
0.24
0.26
0.28
0.3-360 0 360 720 1080 1440 1800 2160 2520 2880 3240 3600 3960
Load [µN]
Coe
ffici
ent
of f
rictio
n
Depth with load Friction coefficient
Scan after scratchingScan before scratching
Micro-scratch test with increasing load on AF45 glass.
Maximum load 3.6 mN.
2 400
10
20
30
6 8 10
H (G
Pa)
Distance [µm]
(a)
800 Å5 µm
Series of nanoindentations through a CrN precipitation in
nitrided steel.
16 CLM image of micro structured grating after
tribological test.
17 AFM image of a SQUID sensor.
18 Ball-cratering tester.
19 Scratch tester.
20 Scratch with cracking and detachments.
Confocal laser microscope – CLM
The confocal laser microscope allows three-dimensional op-
tical imaging of surfaces. The image is generated by moving
the very sharply defined focal plane vertically through the
object. The lateral resolution is in the range of 0.5 µm, whilst
the vertical resolution achieves a few nanometers. Within a
few minutes, the method provides quantitative information
concerning, amongst other things, surface topography, rough-
ness, step heights, gradient angles or particle sizes. Compared
to tactile profilometric methods, it is considerably faster and
can also image soft or unstable surfaces, such as polymers
or powders. To a certain extent, it is also possible to measure
through transparent topcoats.
Atomic force microscopy – AFM
The atomic force microscope (AFM) is suitable for higher reso-
lutions. Here, the surface is scanned with an ultra-fine tip and
a 3D image of the surface is generated. Lateral resolutions of
1 to 10 nm and vertical resolutions of less than 1 nm can be
achieved, which makes it possible to resolve monoatomic step
heights. The AFM is particularly suitable for the characteriza-
tion of extremely smooth surfaces. Material contrasts can be
visualized via friction microscopy or modulation techniques.
With the AFM, it is possible to measure not only roughness,
step heights or grain sizes but also more complex parameters
such as skewness, kurtosis, power spectral density, etc. With
the AFM device at the Fraunhofer IST, not only small samples
can be investigated but also objects of up to 15 cm in diame-
ter and 3 cm in thickness.
16 17
00 50
Distance [µm]
Hei
ght
[µm
]
100 150
10
20
Height profile of a dot array (see page 2, figure 1).
18 20
Scratch test
The scratch test is used for determining the adhesion between
the coating and the base material. A diamond stylus is thereby
pulled with an increasing load over the coating system.
The resulting scratch is then optically evaluated. During
scratch testing, various coating flaws, such as cracking and
spalling, can be observed. A microscopic examination permits
analysis of e. g. film detachment. As a measure of the coating
adhesion, the critical load is determined at which the first
signs of delamination are noted. In addition, frictional force
and acoustic emissions are recorded during the measurement
process; these are useful in the interpretation of the results.
The method correspond to ISO 20502 and ASTM C1624.
Ball-cratering test
With the ball-cratering test, the wear resistance of coatings
and surfaces can be measured precisely. An abrasive slurry is
drip-fed onto a rotating steel ball which presses against the
sample, thereby grinding a crater (hemisphere) into the coat-
ing under investigation. The wear coefficient can be calculated
from the volume of the crater. This method is suitable for
testing coatings with a layer thickness ≥ 1 µm. Abrasion wear
reacts very sensitively to changes in the coating composition
and structure and can, for this reason, be used on the produc-
tion line as a characteristic for evaluating the coating quality
corresponding to EN ISO 26423.
19
Normal force [N] Acoustic emission [%]
Depth of penetration [µm] Coefficient of friction
Distance [mm]
50
40
30
20
10
0
0
6
12
18
24
30
0.2
0.1
1 10 20 30 40 50
0 1 2 3 4 5
100 %
80 %
60 %
40 %
20 %
0 %
Scratch test on DLC on steel. Critical load at 35 N.
Rate
of
wea
r [m
3 m-1N
-110
-15
]
Number of measurements
DLCTiNSteel 100 Cr6
500
1
10
100
10 15 20
Results of ball-cratering testing.
Abrasion coefficients of steel and hard coatings.
21 Rockwell test.
22 Principle of the Taber Abraser test.
23 Pin-on-disc tester.
24 Impact tester showing damage to a coated
piston ring.
21 22
Rockwell test
One method for determining the adhesive strength of
coatings is the Rockwell indentation test. This method has
been an established test procedure in industry and research
for many years (DIN 4856, ISO 26443). On account of its
simple handling and rapid implementation, the test is very
suitable for reliably revealing fluctuations in coating adhesion.
A conventional hardness test in accordance with Rockwell-C
is hereby performed with a conical indentation body. The
hardness indentations are examined under a light microscope
and categorized into adhesive strength classes (HF1 to HF6)
according to the size and quantity of the resulting layer spall-
ing. A substrate hardness of > 54 HRC is a prerequisite.
Taber Abraser test
Resistance to abrasive wear is an important mechanical
property of surfaces. The Taber Abraser test is a widely used
method for determining abrasion resistance, which is defined
in numerous standards (DIN52347, DIN7784, ASTM D4060,
ASTM D1044, ISO9352). The test can be applied for metals,
ceramics, rubber, paper, leather and textile fabrics as well as
for paints and other types of surface coatings. The instrument
is used both in research and development and in production
and quality control. The abrasive wear is generated by two
rough friction rollers, which are pressed onto the rotating test
specimen with a defined force. Possibilities enabling a quanti-
tative evaluation of the wear resistance include the gravimetric
determination of the removed material or the photographic
documentation of the strength of the abrasion.
Exemplary results of a Rockwell test: good adhesive strength
(left), medium adhesive strength (middle), bad adhesive
strength (right).
Revolutions [R/min]
Mas
s lo
ss [m
g]
0
A
B
0
10
20
30
40
50
60
70
2000 4000 6000 8000 10000
Taber test on two different steel types A and B.
Loss of mass depending on test duration.
Tribometers
Tribometers are utilized to investigate the friction behavior
of material pairings. A steel or carbide ball is pressed with
a defined normal force against a disc-shaped, rotating test
specimen (pin-on-disc). The coefficient of friction is calculated
from the frictional force and normal force. Tribological tests
are used to determine low-friction and wear-resistant material
pairings for technical movement systems.
The Fraunhofer IST has special high-temperature tribometers
for test temperatures of up to 1000 °C as well as high-load
tribometers with normal forces in the range of 10 to 1000 N.
Investigations using liquid lubricants are also possible.
23 24
Impact test
Coatings are increasingly used where the strength of technical
components is no longer sufficient. The increasing demands
on technical components result from higher temperatures,
increased operating pressures and longer service intervals.
The fatigue behavior and the adhesion of a coating are key
parameters for ensuring its functional reliability. With the im-
pact tester available at the Fraunhofer IST, statements can be
made concerning the fatigue strength of coating systems. A
firmly clamped ball hammers on the test specimen with forces
of up to 5 kN and a frequency of approx. 50 Hz. Tests with up
to one million cycles can be performed. This dynamic loading
can damage the material. The damage pattern (deformation,
layer detachment or cracks) is assessed visually and service-life
characteristics can be specified for this type of stress.
Change of the damage pattern after impact test at 200 N,
400 N and 600 N.
0
0.4
0.2
0.6
0.8
1.0
Coe
ffici
ent
of f
rictio
n [µ
]
DLCTiNSteel 100 Cr6
Coefficient of friction of steel and hard coatings against a
steel ball.
25 26
Photocatalytic air purification
Various commercially available products for photocatalytic air
purification can be used to clean the indoor air in rooms or to
remove gaseous pollutants such as nitrogen oxides from the
environment. The Fraunhofer IST has the analytical equipment
necessary for investigating the performance of photocatalytic
active materials. With this, it is possible to evaluate the respec-
tive materials and products comparatively.
At the Fraunhofer IST, tests are carried out in accordance with
ISO 22197-1 to -4, CEN/TS 16980-1 and DIN 19279 for the
pollutants NO, NO2, C2H4O, C7H8 and HCHO. Furthermore, as
an accredited testing laboratory of the German Federation for
Applied Photocatalysis (FAP), the Fraunhofer IST is authorized
to test and certify products in accordance with the “Freiwil-
ligen Selbstverpflichtung der Hersteller von photokatalytisch
aktiven Produkten” (Voluntary commitment of manufacturers
of photocatalytically active products).
Photocatalytic self-cleaning
Photocatalytic materials with self-cleaning properties are
applied in order to prevent the fogging or fouling of surfaces
and to completely decompose organic soiling to form water
and carbon dioxide (CO2). Photocatalysis thereby completely
forgoes the use of additional chemical substances and is there-
fore one of the most environmentally friendly and sustainable
technologies.
The Fraunhofer IST offers testing of the self-cleaning behavior
of coated glass surfaces by means of the so-called “dirt
test” (DIN EN 1096-5), the investigation of methylene blue
degradation (DIN 52980 and ISO 10678) as well as semi-quan-
titative test methods in accordance with e. g. ISO 27448 and
ISO 21066. In addition, the institute is able to verify, amongst
other things, the photocatalytic degradation of dyes and fatty
acids by means of customer-specific test methods.
Con
cent
ratio
n [p
pm] 1,2
1,0
0,8
0,6
0,4
0,2
0,00 50 100 150 200 250
Time [min]
NO NOx NO2
Test result of photocatalytic deposition velocity of NO
according to DIN 19279.
Con
cent
ratio
n [µ
mol
]
11.0
10.0
9.0
8.0
7.00 30 60 90 120 150 180
Time [min]
Irradiated sample
Reference in dark
Linear range
Photocatalytic decomposition of methylene blue according
to DIN 52980 or ISO 10678.
25 Measuring station to identify air purification
capability of photocatalytic materials.
26 Measuring station to identify photocatalytic ac-
tivities by depletion of methylene.
27 Measurement of contact angle.
28 FTIR measurement by micro ATRs on plastic foil.
Contact angle and surface energy
The wetting properties of material surfaces are important pa-
rameters which allow statements to be made concerning the
purity, adhesiveness, printability and fluid adhesion of a solid.
They can be determined by measuring the contact angle.
The contact angle of several liquids allows the determination
of the polar and non-polar proportions of the surface energy.
The hysteresis of the advancing and retreating contact angle
provides information regarding inhomogeneities or rough-
ness of the surface. The contact angle is a central measured
variable wherever the intensity of the phase contact between
liquid and solid materials is to be controlled or evaluated, e. g.
in painting, cleaning, printing, hydrophobic or hydrophilic
coating, bonding, and dispersion.
27 28
FTIR and Raman spectroscopy
FTIR spectroscopy (Fourier transform infrared spectroscopy) is a
special method of infrared spectroscopy. By means of infrared
radiation, molecular vibrations are induced, which become
visible in the spectrum through absorption. The method serves
the structural resolution of, for example, chemical compounds,
materials and coatings. Special features include:
� Characteristic absorption bands through absorption of elec-tromagnetic radiation (induced or variable dipole moment)
� High flexibility of the measuring set-ups (transmission, reflection, attenuated total reflection ATR, FTIR microscopy)
� Short measuring times
� Layer analysis < 100 nm film thickness is possible
In addition to FTIR spectroscopy, Raman spectroscopy can be
applied. With this technique, the sample is irradiated with
monochromatic light (532 nm, 633 nm or 785 nm) and alter-
ations in polarizability are induced via rotation or oscillation of
the molecule.
Con
tact
ang
le [°
]
Surf
ace
ener
gy [m
N/m
]
140
120
100
80
60
40
20
0
70
60
50
40
30
20
10
0
PTFE
F Si:O
Si Cr
Ti B W N Oa-C
:H
disp
ers
pola
r
Variants of a-C:H:X-films
Abs
orpt
ion
[-]
0.06
0.04
0.02
0.00
Wave count [cm-1]
3700 3200 2700 17002200 1200 700
FTIR-ATR-spectra of plasma-polymerized NiPAAm copolymer
on polypropylene.
CONTACTFraunhofer Institute for Surface
Engineering and Thin Films IST
Bienroder Weg 54 E
38108 Braunschweig
Dr. Kirsten Schiffmann
Head of the Department
Analytics and Quality Assurance
Telephone +49 531 2155-577
www.ist.fraunhofer.de
20
20
05
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