aplications uv vis swnir rev1

47
Applied Analytics, Inc. Applications Applications Process control Quality assurance Environmental compliance Industries Petrochemical Chemical Pharmaceutical Pulp & Paper Natural Gas Metal recovery Power plants

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Page 1: Aplications uv vis swnir rev1

Applied Analytics, Inc.

ApplicationsApplications

Process control

Quality assurance

Environmental complianceIndustries

• Petrochemical• Chemical• Pharmaceutical• Pulp & Paper • Natural Gas

• Metal recovery• Power plants

Page 2: Aplications uv vis swnir rev1

Applied Analytics, Inc.

•Hydrogen Sulfide

•Sulfur dioxide

•Mercaptans

•Chlorine

•Chlorine dioxide

•Ozone

•Hydrogen Peroxide

•Bromine, Bromide, Methyl Bromide

•Nitrogen oxides

•Metal Ions, CU+2,

Some of the Hundreds of Measurable Chemicals

•Acetone

•Acetaldehyde

•Acetic Acid

•Acetamide

•Ammonia

•Aromatics (BTX)

•Iodide, Methyl Iodide

•Phenols

•Nitromethane

•Color

Page 3: Aplications uv vis swnir rev1

Applied Analytics, Inc.

• Petrochemical• Chemical• Pharmaceutical• Pulp & Paper• Refining

• Jet Fuel Delivery• Natural Gas• Food and Beverage• Metal recovery• Power plants

Potential Customers

• Process Control• Quality Assurance• Environmental Monitoring

Applicable Industries

Page 4: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Sulfur Recovery Sulfur Recovery Tail Gas analyzer monitoring - H2S, SO2, COS , CS2 , Sulfur vapor simultaneously and instantaneously. Accurate H2S to SO2 ratio.Feed Forward (FFA, air demand) - H2S, hydrocarbons, oxygen.Sales gas (sweet gas, product gas) -Low levels of H2S and total sulfurStack analysis - SO2 , NOxSulfur pit - H2S SO2 NH3Sulfurine - H2S, SO2, COS and CS2 sulfur vaporAcid gas (high levels) -H2SLean Amine -H2SRich amine - H2SSour gas feed H2S

Stack & Power generation (ammonia slip):Stack & Power generation (ammonia slip):Ammonia slip monitoring (< 5 PPM) in DeNOx units.Measuring ammonia, sulfur dioxide and nitrogen oxides   simultaneously in flue gas applications.

Synthetic Fiber QualitySynthetic Fiber Quality On line quality monitoring of fiber grade MEG (Mono Ethylene Glycol) by UV transmittance.

Page 5: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Petroleum based solvent production (BTX): Petroleum based solvent production (BTX): Measuring concentrations of aromatic compounds in petroleum products - Benzene, Toluene, Xylene total aromaticsToluene and naphta in methanolDifferentiating between xylene and other aromatics by a recognition algorithmMonitoring the interface between aromatic compounds transported sequentially through a pipeline

Monitoring Chlorine and chlorinated compounds in process Monitoring Chlorine and chlorinated compounds in process streamsstreamsUtilize the same instrument to measure the concentration of chlorine at low levels (ppm range) to the high percent levels.Measuring NCl3 (Nitrogen Tri-Chloride) in Chlorine.Low levels of Chlorine in bromine

Page 6: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Manufacturing Process of the white pigment - TiO2Manufacturing Process of the white pigment - TiO2Monitoring TiCl4 in chlorineLow levels of Vanadium.

Pharmaceutical:Pharmaceutical:Accurate mixing of various products for human consumption. CIP ( Clean In Place) monitoring trace amounts of active materialLow levels of vitamins

Polymerization Polymerization TBC (Tertiary Butyl Catechol), a polymerization inhibitor in Butadiene MEHQ, a polymerization inhibitor in AcrylonitrileExtrusion of Low Density PET: Monitoring additives at the extruder’s    mouth (phenolic compounds, pigments etc).

Page 7: Aplications uv vis swnir rev1

Applied Analytics, Inc.

ColorColorCIE L, a*, b* & xyz tristimulusSaybolt Platinum – CobaltHazen or APHADyed Aviation Gasoline Lactic Acid

TransportationTransportationMonitoring trace amounts of diesel in jet fuel

Pulp and PaperPulp and PaperMonitoring ozone a bleaching agentChlorine chlorine dioxideHydrogen peroxides

Page 8: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Sulfur recoverySulfur recovery

Tail gas analyzer Measures H2S, SO2, COS, CS2 &

Sv No Housing required High performance demister

Page 9: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Refining, Gas Producers and Petroleum Product Users

Monitoring H2S, SO2, and/or Mercaptans – Gasprom- Astrakhan Russia – Pemex –Tampico, Mexico – Distribuidora Galeon S.A. – Mexico City, Mexico– Gas de France – Paris, France – Siemens Pte. Ltd. - Singapore – RasGas Company Ltd. – Doha, Qatar – TREI GmbH - Stuttgart, Germany – Kinetics Technology Corporation – Taipei, Taiwan – Alon – Big Spring, TX

Page 10: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Refining, Gas Producers and Petroleum Product Users

Monitoring H2S, SO2, and/or Mercaptans – Analytical Systems Engineering Pte Ltd - Singapore – Sappi Saiccor (Pty) Ltd –Umkomaas, South Africa – Sasol –Secunda, South Africa – Caterpillar Inc. –Mossville, IL – Control De Plant As Industriales, S.A. - Vera Cruz, Mexico – Coastal Aruba Ref Co, NV – Aruba

– Ras Laffan CMS Joint Venture – Qatar

Page 11: Aplications uv vis swnir rev1

Applied Analytics, Inc.

H2S in sour gas feed to the primary amine absorber, feed forwards for the amine circulation rate.

H2S in sweet gas. Product quality assurance.

H2S in rich Amine- control the circulation rate of ammine through the absorber, measuring the H2S in the rich amine leaving the absorber.

H2S in lean amine – reduce regeneration cost by controlling the steam input, measuring the H2S in the amine leaving the generator column.

1

2

3

4

Analyzers:Analyzers:OMA-300

Page 12: Aplications uv vis swnir rev1

Applied Analytics, Inc.

5

Analyzers:Analyzers:

Feed forwards analyzer: determines the H2S and total air required to combust all components in the feed gas, also measures aromatics compounds.H2S to SO2 ratio in tail gas, maintain ideal ratio for max sulfur yield by providing feedback control to the Claus plant primary or trim air supply.H2S in sulfur pit for plant safety – measuring the H2S content in the vapor above the liquid sulfur pit. Providing feedback to the purge air flow controller.

6

7

5

6

7

TLG-837

TLG-837

OMA-300

Page 13: Aplications uv vis swnir rev1

Applied Analytics, Inc.

8

Analyzers:Analyzers:

For cleaning process (proprietary) all require process control analyzers. For example Sulfrine measuring H2S and SO2Stack Gas monitor for stack emission to verify regulatory compliance. Measuring H2S SO2 NH3 oxygen (NO NO2 COS CS2).

9

8

9

TLG-837

OMA-300

Page 14: Aplications uv vis swnir rev1

Applied Analytics, Inc.

0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

0.9

1

220 240 260 280 300 320 340

Wavelength (nm)

Ab

sorb

an

ce (

AU

)

0.250.50.7511.25

% H2S

0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

220 240 260 280 300 320 340Wavelength (nm)

Ab

sorb

an

ce A

U

0.250.50.7511.25

% SO2

0

0.02

0.04

0.06

0.08

0.1

0.12

0.14

0.16

0.18

0.2

220 240 260 280 300 320 340Wavelength (nm)

Abso

rban

ce (

AU

)

COS 0.1% COS 0.2% COS 0.3%CS2 0.1% CS2 0.2%CS2 0.3%

0

0.05

0.1

0.15

0.2

0.25

0.3

0.35

0.4

0.45

0.5

220 240 260 280 300 320 340

Wavelength (nm)

Ab

sorb

an

ce (

AU

)

Temp

Sv

Page 15: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Page 16: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Page 17: Aplications uv vis swnir rev1

Applied Analytics, Inc.

DeNox processDeNox process Measuring the ammonia slipMeasuring the ammonia slip

Application:10 PPM ammonia 200 PPM SO2

200 PPM NO 200 PPM NO2.

Example : SCR Process 4NO +4NH3 +O2 4N2 + 6 H2O

ASA-400ASA-400

Page 18: Aplications uv vis swnir rev1

Applied Analytics, Inc.0

0.01

0.02

0.03

0.04

0.05

0.06

0.07

0.08

190 290 390 490 590 690 790

0

0.005

0.01

0.015

0.02

0.025

190 240 290 340 390 440 490 540 590 640

0

0.005

0.01

0.015

0.02

0.025

0.03

0.035

0.04

190 195 200 205 210 215 220 225 230 235 240

0

0.01

0.02

0.03

0.04

0.05

0.06

0.07

0.08

0.09

0.1

190 195 200 205 210 215 220

NO, NO2 & NH3

NH3 NO2

NO

Page 19: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Utilities, Industrial Boiler Operators, Process Heaters in many industries

Continuous Emission Monitoring Measure SO2, NO, NO2, NH3 and O3 in flue gas from burning fossil fuel – non-compliance

Potential customers – utilities, industrial boiler operators, process heaters in many industries

Measure Benzene, Chlorides, and Fluorides in flue gas from incinerators

Potential customers - hazardous waste incinerators, medical incinerators, cement plants

Page 20: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Ambient Monitoring

Measure Ethylene Oxide, Vinyl Chloride, Acrylonitrile, Methanol, SO2, NO, NO2, O3, Cl2, and Br2 in air

Potential customers - Grain Processing, Oxy Vinyls, Tyco, Kendall, landfill sites

Page 21: Aplications uv vis swnir rev1

Applied Analytics, Inc.

BTX and Total aromaticsBTX and Total aromaticsThe BTX methodAutomating an ASTM- UV laboratory method (D1017-51) for BTX for an on-line continuous monitoring. The total aromatics method The total aromatics algorithm allows for the variation of aromatics in the stream (which creates a wavelength shift of the Absorbance peak maxima) by applying a Max-peak-find algorithm to the UV absorbance spectrum. The intensity at the peak maxima is correlated via to the total aromatics value.

nm

AU

Page 22: Aplications uv vis swnir rev1

Applied Analytics, Inc.

0

0.02

0.04

0.06

0.08

0.1

0.12

0.14

230 240 250 260 270 280 290

nm

Abs

orba

nce

0

0.2

0.4

0.6

0.8

1

1.2

1.4

1.6

230 240 250 260 270 280 290

nm

Abs

orba

nce

0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

230 240 250 260 270 280 290

nm

Ab

sorb

ance

0

0.02

0.04

0.06

0.08

0.1

0.12

0.14

230 240 250 260 270 280 290

nm

Ab

sorb

ance

benzenetoluene

xyleneprocess

Page 23: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Chemical, Plastic and Fiber Manufacturers

Monitor Purity and Color of Products– Honeywell Corporation –Hopewell, VA – Purac - Gorinchem, Netherlands – Aplein Ingenieros S.A. – Madrid, Spain – SNC Lavalin – Calgary, AB, Canada – Petro-Canada – Calgary, AB, Canada – Kimberly Clark –Neenah, WI – Trojan Technologies – London, ON, Canada

Page 24: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Mono Ethylene Glycol - a quality control application

Measuring the Transmittance on-line of MEG at

220nm, 240nm, 275nm, 350nm.

Continuos on-line

Alert instantaneously on changes in the MEG

process stream composition

The measurement is performed on fresh warm

samples eliminating the possibility of sample

contamination.

Page 25: Aplications uv vis swnir rev1

Applied Analytics, Inc.

70

75

80

85

90

95

100

nm

%T

220 230 240 250 260 270 280 290 300 310 320 330 340 350

75

80

85

90

95

100

220 230 240 250 260 270 280 290 300 310 320 330 340 350

nm

%T

Transmittance spectra of MEG samples at various purity grade levels.

Transmittance spectrum of potassium dichromate.

Page 26: Aplications uv vis swnir rev1

Applied Analytics, Inc.

TBC- A POLYMERIZATION INHIBITORTBC- A POLYMERIZATION INHIBITOR

TBC (tert-Butyl Catechol) in butadiene,

styrene and in other reactive monomer streams.

Pure isopropanol can be used for blanking &

calibration.

Correction for toluene and butadiene

interferences.

Page 27: Aplications uv vis swnir rev1

Applied Analytics, Inc.

0

0.05

0.1

0.15

0.2

0.25

0.3

230 240 250 260 270 280 290 300

165ppm

100ppm

50ppm

nm

AU

Absorbance spectra ofAbsorbance spectra of TBCTBC

Page 28: Aplications uv vis swnir rev1

Applied Analytics, Inc.

TRACE IMPURITIES IN A REACTION CHAMBER’S CLEANING PROCESS a

Clean In Place application

Validation of cleaning and final purity level. Greater availability of reactor volume Detect possible faulty valves in the flow

system. Full spectrum allows for easy method

development. Allows for calibration of various active

materials.

Page 29: Aplications uv vis swnir rev1

Applied Analytics, Inc.

• Recirculated solvent is diverted to a small by-pass flowing through the spectrometer.

• After reaching a steady state a new batch of cleaning solvent is loaded and the process is repeated until the concentration of impurities reaches a pre-set threshold value.

A pplied A nalytics, I nc.

O M A -517

Page 30: Aplications uv vis swnir rev1

Applied Analytics, Inc.

time

Co

nc

en

tra

tio

n

1st derivative

(dc/dt)

concentration

1st wash

2nd wash

3rd wash

UCL

The concentration of the active ingredient in the methanol increases until it reaches a plateau. The same occurs for each wash. The 1st derivative of the concentration with time (dc/dt) approaches zero when the process reaches steady state. The UCL (Upper Control Limit) is also shown.

Washing cycle - Timing diagramWashing cycle - Timing diagram

4th wash

Page 31: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Pharmaceutical Industry Users

Hoffman LaRoche - Paris France Merck Sharp & Dohme Ltd. - Tiperrary, Ireland Eli Lilly and Company - Indianapolis, IN Fisons Pharmaceuticals –Kent UK Boehringer Ingelhem - Petersburgh, VA The Wellcome Foundation - Dartford, UK

Page 32: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Chlorine 10 PPM to 100%Chlorine 10 PPM to 100%

UV absorbance spectra of Cl2

0

0.5

1

1.5

2

2.5

3

3.5

200 250 300 350 400 450

wavelength (nm)

Ab

sorb

ance

(A

U)

Cl2 80%

Cl2 70%

Cl2 60%

Applied Analytics, Inc.

Page 33: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Figure 1: Calibration of NCl3, Absorbance spectra, 50 psig chlorine above solution of NCl3 in CCl4.,Blank: CCl4 saturated with chlorine

Figure 2 : On-Line measurements of NCl3 and Cl2 in the Headspace

Figure 4: Ultraviolet Spectrum following Ammonia in Brine excursion of in headspace of chlorine bottoms (90% Chlorine, 10% Carbon Tetrachloride)

NCl3 in Cl2

Page 34: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Pulp & Paper

Monitor ozone in bleaching process– User Ostrand, Timra Sweden

Monitor chlorine & ClO2 in process control (bleaching) and stack emissions

Page 35: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Paint and Pigment Manufacturing

Monitor TiCl4 and Vanadium in TiO2 manufacturing process

Monitor Cl2 in TiCl4 material Monitor Cu+2 and other metal ions in solution

– DuPont Nylon Ltd. - Middlesbrough, UK – Shepherd Color Company - Cincinnati OH – Orsk - Orsk Russia – Millennium Inorganic Chemicals - Baltimore, MD

Page 36: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Pigment Users

Dupont -Wilmington, DE Millennium Inorganic Chemicals - Baltimore, MD

– Jay W. Bayors; 410-354-7304; [email protected] – Mike Griffin; [61] 89-7808-627; [email protected]

Kerr McGee - Oklahoma City, OK Tiwest Joint Venture –Kwinana Australia

Page 37: Aplications uv vis swnir rev1

Applied Analytics, Inc.

TICl4 slipTICl4 slip

Absorbance spectra of TiCl4

0

0.5

1

1.5

2

2.5

3

3.5

4

200 220 240 260 280 300 320 340

wavelength (nm)

abso

rban

ce (

AU

)

TiCl4 5000 PPM

TiCl4 2500 PPM

TiCl4 1000 PPM

Applied Analytics, Inc.

Page 38: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Electronic, Semi-conductor, Mining and Metal Processing industries

Monitor Concentrations of Metal Ions Measure Cu+2 in plating solutions

Potential customers - printed circuit board manufacturing, metal recovery and mining industries

Measure CuSO4 and Cl in metal plating solutionsMonitor Co+2, Ni+2, Cu+2 & Fe+2 in process or waste

water streamsPotential customers – Cobalt recovery plants, catalyst manufacturers

Page 39: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Absorbance spectra of Chlorine and Ferric chloride

0

0.05

0.1

0.15

0.2

0.25

0.3

0.35

0.4

260 280 300 320 340 360 380 400

Wavelength (nm)

Abs

orba

nce

(AU

)

FeCl3Cl2

Page 40: Aplications uv vis swnir rev1

Applied Analytics, Inc.0.00

0.20

0.40

0.60

0.80

1.00

1.20

1.40

1.60

1.80

500 600 700 800 900 1000 1100

Wavelength (nm)

Ab

sorb

ance

(A

U)

Copper ionsCopper ions

0

5

10

15

20

25

1 3 5 7 9 11

13

15

17

19 21 23

sample #C

u+2 p

pm

Cu(PPM) atomicabsorption

Cu(PPM) OMA-517

Page 41: Aplications uv vis swnir rev1

Applied Analytics, Inc.

CoCo+2+2, Ni, Ni+2+2, Cu, Cu+2+2 & Fe & Fe+2+2 ions ions

0

0.2

0.4

0.6

0.8

1

1.2

1.4

1.6

1.8

2

200 300 400 500 600 700 800

#1 #2 #3 #4

#8 #5 #9 #6

#7 #10 #11 #12

Page 42: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Refineries, Gas Producers, Storage Terminals and Pipeline Operators

• Monitor interface between aromatic compounds transmitted sequentially through the same pipeline

• Monitor concentrations of benzene, toluene and xylene (BTX) in petroleum products, solvents and hydrogenation processes (ASTM D1017-51)

• Measure H2S, COS, CS2, SO2 and Mercaptans in Gasoline, Diesel Fuel and Natural and a Variety of Fuel Gases (landfill gases) during production, storage, transportation or custody transfer

Potential Customers – Pipeline operators, gas storage terminals, utilities, refineries, landfill gas combustion, natural gas custody transfer

Page 43: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Refineries, Gas Producers, Storage Terminals and Pipeline Operators

Page 44: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Trace amounts of diesel in jet fuelTrace amounts of diesel in jet fuel

0

0.5

1

1.5

2

2.5

3

250 300 350 400 450 500 550 600

nm

AU

pure diesel

JP pure (no diesel)

JP + low levels of diesel

0

0.5

1

1.5

2

2.5

3

0 0.5 1 1.5 2 2.5 3 3.5Volume F-76 in JP-5 by gravimetric technique

% V

olum

e of

F-7

6 in

JP

-5 m

easu

red

by t

he

OM

A-5

17

Error bars are +/- 5% of measurement.

Figure 1: absorbance spectra of jet fuel and diesel

Figure 2: % Volume of F-76* in JP-5 *Gravimetric Vs the OMA results

Page 45: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Incoming Materials Validation ; An On-Incoming Materials Validation ; An On-line Recognition Methodline Recognition Method

0

0.05

0.1

0.15

0.2

0.25

0.3

860 870 880 890 900 910 920 930 940

wavelength (nm)

ab

so

rba

nce

(A

U)

11-POWERFORMER FEED

10-RAFFINATE

L.C.N

8-LPF

7_DEB_SCN

12-FAWLEY XYLEEN

6-mixed xylenes

9-ALKYATE

4_SCN-RAW

5_SCN_TREAT

3_FAO_SCN

2_BHC

1_BHC

Page 46: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Chemical, Plastic and Fiber Manufacturers

Monitor purity of MEG (Mono Ethylene Glycol) Monitor purity of Acetonitrile Monitor MEHQ during production of

Acrylonitrile Monitor solvent concentrations – Methanol,

Toluene and/or Naphta in water Validate incoming chemical materials for

concentration and purity– ESSO Nederlands bv - Rotterdam, Netherlands

Page 47: Aplications uv vis swnir rev1

Applied Analytics, Inc.

Methanol water toluene and naphthaMethanol water toluene and naphtha

10.00

15.00

20.00

25.00

30.00

35.00

40.00

45.00

50.00

55.00

60.00

10.00 20.00 30.00 40.00 50.00 60.00

Toluene lab (%)

Tolu

ene (

%)

T(%) lab

T(%) OMA

45.00

50.00

55.00

60.00

65.00

70.00

75.00

80.00

85.00

90.00

45.00 50.00 55.00 60.00 65.00 70.00 75.00 80.00 85.00 90.00

Naphta lab (%)

Naphta

(%

)

N(%) lab

N(%) OMA

Low Toluene rangeAnalyte Name Std.Dev. Toluene (%) 0.03Naphta (%) 0.11Methanol (%) 0.25