atomic layer deposition of tin(ii) sulfide · ald of sns from the reaction of tin(ii) amidinate and...

14
Prasert Sinsermsuksakul, Jaeyeong Heo, and Roy G. Gordon Department of Chemistry and Chemical Biology Harvard University Atomic Layer Deposition of Tin(II) Sulfide

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Page 1: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

Pras

ertS

inse

rmsu

ksak

ul,

Jaey

eong

Heo,

and

Roy

G. G

ordo

n

Depa

rtm

ent o

f Che

mist

ry a

nd C

hem

ical

Bio

logy

Harv

ard

Uni

vers

ity

Atom

ic L

ayer

Dep

ositi

on o

f Tin

(II) S

ulfid

e

Page 2: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

2

Cu(In

,Ga)

(Se,

S)2

(CIG

S)Cd

TeHi

ghes

t ene

rgy

conv

ersio

n ef

ficie

ncy

of ~

20%

Adva

ntag

e�

Low

man

ufac

turin

g co

st�

Mod

erat

e ef

ficie

ncy

Lim

itatio

n�

Use

rare

ele

men

ts (I

n, Te

, and

Se)

�Co

ntai

n to

xic

elem

ent (

Cd)

NRE

L

wik

iped

ia

Page 3: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

SnS

has s

ome

of th

ese

prop

ertie

s.

�Ba

sic C

riter

ia fo

r the

Abs

orbe

r Mat

eria

l.

�Su

itabl

e en

ergy

ban

dgap

( Eg

~ 1.

0-1.

5 eV

).

�Hi

gh o

ptic

al a

bsor

ptio

n co

effic

ient

( 10

4 -10

5 cm

-1).

�th

ickn

ess /

mas

s of m

ater

ial r

equi

red.

? Hi

gh q

uant

um y

ield

for t

he e

xcite

d ca

rrie

rs

? Lo

ng c

arrie

r diff

usio

n le

ngth

/ lo

w c

ombi

natio

n ve

loci

ty

�PV

effi

cien

cy

�Th

e co

nstit

uent

ele

men

ts a

re n

on-T

oxic

and

abu

ndan

t.

�no

n-ha

zard

, sca

labi

lity,

low

cos

t PV.

3

�Li

mita

tion

from

var

ious

dep

ositi

on te

chni

ques

�Co

ntai

n ot

her b

inar

y ph

ases

(SnS

2an

d Sn

2S3)

�Co

ntam

inat

ion

from

oxy

gen

(CBD

) and

chl

orin

e (C

VD)

�La

rge

devi

atio

n fr

om id

eal s

toic

hiom

etric

SnS

(tin

vac

anci

es)

�N

arro

w d

epos

ition

tem

pera

ture

win

dow

(25-

50 o C

rang

e @

~ 3

00 o C

)

Page 4: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

4

Atom

ic L

ayer

Dep

ositi

on�

exce

llent

con

trol

ove

r sur

face

reac

tion

�w

ell-c

ontr

olle

d st

oich

iom

etry

�hi

gh d

ensit

y fil

m�

low

impu

rity

�lo

w d

epos

ition

tem

pera

ture

Sn(a

md)

2pr

ecur

sor

�ea

sily

synt

hesiz

ed�

suffi

cien

t vap

or p

ress

ure

�th

erm

ally

stab

le Sn(a

md)

2+

H 2S �

SnS

Page 5: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

5

�M

inim

um e

xpos

ures

of 1

.5 To

rr·s

of S

n(am

d)2

and

1.1

Torr

·s o

f H 2S

are

requ

ired

to sa

tura

te th

e su

rfac

e re

actio

ns�

Grow

th ra

te o

f 0.9

0 Å/

cycl

e (1

20 o C

)

Page 6: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

6

�N

ot d

etec

t oth

er b

inar

y ph

ase

(e.g

.Sn

S 2an

d Sn

2S3)

.�

Wid

e de

posit

ion

tem

pera

ture

win

dow

.

Ram

an S

pect

rosc

opy

Page 7: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

7

S

Sn

SiO

2 su

bstr

ate

SnS 1±

0.01

Ruth

erfo

rd B

acks

catt

erin

g Sp

ectr

osco

py (R

BS)

�St

oich

iom

etric

SnS

(Low

Sn+2

vaca

ncy)

bel

ow 2

00 o C

�De

nsity

~ 4

.6 g

/cm

3(~

90%

of b

ulk

valu

e)

Page 8: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

8

From

XPS

�N

o ca

rbon

, nitr

ogen

, or o

xyge

n de

tect

ed o

n Sn

Sfil

m d

epos

ited

belo

w 2

00 o C

.(SI

M)

�~

1-2%

car

bon

cont

amin

atio

n on

film

dep

osite

d ab

ove

250

o C.

Sn(a

md)

2st

arts

to

deco

mpo

se a

bove

250

o C.

Page 9: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

SnS

CuI

nSe 2

GaA

s

CdT

e

Silic

on

a-Si

MD

MO

-PPV

(o

rgan

ic d

ye)

9

Eg ~

1.3

5 eV

�~

105

cm-1�

Nee

d ~

500

nm fo

r 95%

abs

orpt

ion

N

elso

n, J.

The

Phy

sics o

f Sol

ar C

ells;

Impe

rial C

olle

ge P

ress

Page 10: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

10

Top

view

alo

ng b

axi

sSi

de v

iew

Ort

horh

ombi

c St

ruct

ure

( a�

b� c

and

�=

�=

�=

90o

)

a =

4.28

, b =

11.

20, c

= 3

.99

Å

(111)(040)

(101)

(002)

�De

sirab

le c

ryst

al o

rient

atio

n.�

high

er m

obili

ty th

roug

h th

e fil

m.

(Sin

gle

crys

tal:

μ /// μ

�~

10.)*

�ca

rrie

r tra

nspo

rt a

long

def

ect-

tole

rant

la

yer p

lane

crys

tal p

refe

rred

orie

ntat

ion

�do

uble

laye

r dist

orte

d N

aCl

stru

ctur

e.�

high

ly a

niso

trop

ic m

ater

ial.

c

b

http

://w

ebm

iner

al.c

om

*Nas

sary

, M.M

., Jo

urna

l of A

lloys

and

Com

poun

ds, 2

005.

398

(1-2

): p.

21-

25.

Page 11: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

�Ha

ll m

easu

rem

ent

�la

tera

l res

istiv

ity �

~ 1

0 –

900

�•c

m

�lo

w h

ole

conc

entr

atio

n ~

1016

cm-3

�fe

w S

n+2va

canc

ies

�w

ide

depl

etio

n re

gion

in p

-n ju

nctio

n

�la

tera

l hol

e m

obili

ty ~

1-4

cm

2V-1

s-1

11

500n

m

SnS

Colu

mna

r str

uctu

re

�� ve

rtic

al/ �

late

ral ~

3�

low

er sc

atte

ring

from

gra

in b

ound

ary

�hi

gher

mob

ility

alo

ng c

ryst

al la

yer

plan

es

500n

m

Tsub

= 12

0 o C

Tsub

= 20

0 o C

Page 12: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

12

Tim

e-Re

solv

ed P

hoto

lum

ines

cenc

e

�M

inor

ity c

arrie

r life

time

~ 90

ns

�Es

timat

ed m

inor

ity c

arrie

r diff

usio

n le

ngth

~ 1

.5 μ

m

Page 13: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

�Sn

S is

a pr

omisi

ng a

bsor

ber m

ater

ial f

or e

arth

-abu

ndan

t, no

n-to

xic

thin

film

sola

r cel

ls.

�AL

D of

SnS

from

the

reac

tion

of ti

n(II)

am

idin

ate

and

H2S

.�

pure

SnS

phas

e ov

er w

ide

tem

pera

ture

rang

e.�

stoi

chio

met

ricSn

S�

no im

purit

y fr

om o

ther

ele

men

ts.

�lo

w d

epos

ition

tem

pera

ture

.

�O

ptic

al a

nd e

lect

rical

pro

pert

ies s

uita

ble

for t

hin

film

sola

r cel

ls.�

Eg =

1.3

5 eV

with

�>

105

cm-1

�[p

] ~ 1

016cm

-3w

ith μ

p~

1 -4

cm

2 V-1

s-1

�~

3x h

ighe

r mob

ility

thro

ugh

the

film

due

to c

olum

nar s

truc

ture

an

d cr

ysta

l orie

ntat

ion

�lo

ng m

inor

ity c

arrie

r life

time

(~ 9

0 ns

)13

Page 14: Atomic Layer Deposition of Tin(II) Sulfide · ALD of SnS from the reaction of tin(II) amidinate and H 2 S. pure SnS phase over wide temperature range. stoichiometric SnS no impurity

Prof

. Roy

G. G

ordo

n

Prec

urso

r: Ad

am S

. Hoc

k an

d W

onta

eN

oh

Reac

tor:

Shen

gXu

and

Haris

h Bh

anda

ri

Colle

ague

s : Ja

eyeo

ngHe

o, L

eizh

iSun

, and

Hel

en P

ark

Hall

mea

sure

men

t: M

ark

Win

kler

, Ren

ee S

her,

and

Prof

. Eric

Maz

ur

14