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OPTICAL SYSTEMS DESIGN Call for Papers Submit Abstracts by 23 February 2015 www.spie.org/osd15call Friedrich-Schiller-University Jena, Germany Conferences: 7-10 September 2015 Exhibition: 8-9 September 2015 C 2015 Call for Papers B I E N N I A L S P I E E V E N T

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Page 1: B I E N NIAL S T I E V E N OPTICAL SYSTEMS DESIGNspie.org/Documents/ConferencesExhibitions/EOD15-Call...T 44 29 2089 4747ifosieeuroe.org 1 Optical instruments are addressing an ever-increasing

TEL: +44 29 2089 4747 · [email protected] i

OPTICAL SYSTEMS DESIGN•

Call for Papers Submit Abstracts by 23 February 2015 www.spie.org/osd15call

Friedrich-Schiller-University Jena, Germany

Conferences:7-10 September 2015

Exhibition:8-9 September 2015 C2015

Call for Papers

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B IENNIAL

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P I E E V E N

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SPIE Optical Systems Design 2015 · www.spie.org/osd15callii

Present your work in GermanyPresent your work at the premier European event for optical instrumentation with the latest advances in optical systems applications, materials, and processing.

C.Call for Papers.

TECHNOLOGIES

DATESConferences: 7-10 September 2015 Exhibition: 8-9 September 2015

LOCATIONFriedrich-Schiller-University Jena, Germany

– Optical Design and Engineering

– Advances in Optical Thin Films

– Optical Fabrication, Testing, and Metrology

– Illumination Optics

– Computational Optics

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TEL: +44 29 2089 4747 · [email protected] 11

Optical instruments are addressing an ever-increasing number of industrial and research applications: imaging and vision, defence, space, telecommunications, transportation, industrial process control, laser fusion, etc. As end users are expecting more demanding performances, optical systems designers and manufacturers are faced with growing challenges.

This symposium on Optical Systems Design in Jena, Germany, will be the ninth of its kind in Europe. It is intended to provide an interdisciplinary forum for technicians, engineers, researchers, and managers who are involved in instrumental optics at all levels: design, specification, production, and testing.

Get face-to-face feedback from your colleagues in an interdisciplinary forum. The symposium represents an excellent opportunity to stay informed and further the debate about the latest developments in optical design. There is no doubt that Jena will be the perfect host for SPIE Optical Systems Design 2015; it is our great pleasure to welcome you.

Plan to Participate.

SYMPOSIUM CHAIR

Tina E. Kidger, Kidger Optics Associates (United Kingdom)

SYMPOSIUM CO-CHAIRS

David M. Williamson, Nikon Research Corp. of America (United States)

HONORARY SYMPOSIUM CHAIR

Juan Carlos Miñano, Univ. Politécnica de Madrid (Spain)

Wilhelm Ulrich, Carl Zeiss AG (Germany)

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SPIE Optical Systems Design 2015 · www.spie.org/osd15call2

OSD01 Optical Design and Engineering V (Mazuray, Wartmann, Wood) . . . . . . . . . . . . . . . . . 3

OSD02 Advances in Optical Thin Films V (Lequime, Macleod, Ristau) . . . . . . . . . . . . . . . . . . 4

OSD03 Optical Fabrication, Testing, and Metrology V (Duparré, Geyl) . . . . . . . . . . . . . . . . . 5

OSD04 Illumination Optics III (Kidger, David) . . . . . . . . . 6

OSD05 Computational Optics (Smith, Wyrowski, Erdmann) . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 7

General Information . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 8

Exhibition - SPIE Optical Systems Design . . . . . . . . . . . . . . 8

Abstract Submission . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . . 9

TECHNICAL COMMITTEEStuart David, Synopsys, Inc . (United

States)Angela Duparré, Fraunhofer-Institut für

Angewandte Optik und Feinmechanik (Germany)

Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

Roland Geyl, REOSC (France)Michel Lequime, Institut Fresnel (France)H. Angus Macleod, Thin Film Center, Inc .

(United States)Laurent Mazuray, Airbus Defence and

Space (France)Detlev Ristau, Laser Zentrum Hannover

e .V . (Germany)Daniel G. Smith, Nikon Research Corp . of

America (United States)Rolf Wartmann, Carl Zeiss Microscopy

(Germany)Andrew P. Wood, Qioptiq Ltd . (United

Kingdom)Frank Wyrowski, Friedrich-Schiller-Univ .

Jena (Germany)

CONTENTS.MANAGED BY

SPIE Europe Ltd ., a subsidiary of SPIE, is a not-for-profit UK-registered company serving SPIE constituents throughout Europe as an advocate and liaison to political and industry associations within the European optics and photonics community .

In addition to providing membership services, SPIE Europe Ltd . organises and manages internationally recognised conferences, education programmes, and technical exhibitions featuring emerging technologies in optics and photonics .

SPIE Europe 2 Alexandra Gate Ffordd Pengam, Cardiff, CF24 2SATel: +44 29 2089 4747 Fax: +44 29 2089 4750 info@spieeurope .org

SPIE OPTICAL SYSTEMS DESIGN 2015

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TEL: +44 29 2089 4747 · [email protected] 3

CALL FOR PAPERS

Optical Design and Engineering V (OSD01)Conference Chairs: Laurent Mazuray, Airbus Defence and Space (France); Rolf Wartmann, Carl Zeiss Microscopy (Germany); Andrew P. Wood, Qioptiq Ltd . (United Kingdom)

Programme Committee: Francoise Cau, Sagem (France); Mark Chang, Surrey Satellite Technology Ltd . (United Kingdom); Andres F. Cifuentes, ASE Optics Europe (Spain); Andrew J. Court, TNO (Netherlands); Michael Duparré, Friedrich-Schiller-Univ . Jena (Germany); Alain Durieux, Sodern (France); Regis Grasser, CILAS (France); Herbert Gross, Friedrich-Schiller-Univ . Jena (Germany); Ullrich Krüger, JENOPTIK Optical Systems GmbH (Germany); Demetrio Labate, SELEX ES S .p .A . (Italy); Paolo Laporta, Politecnico di Milano (Italy); Kevin F. Middleton, STFC Rutherford Appleton Lab . (United Kingdom); Takao Nakagawa, Japan Aerospace Exploration Agency (Japan); Iain A. Neil, ScotOptix (Switzerland); Jérôme Primot, ONERA (France); Jeffrey M. Raynor, STMicroelectronics (R&D) Ltd . (United Kingdom); Jannick P. Rolland, Univ . of Rochester (United States); Joël Rollin, Thales Angénieux S .A . (France); Elisabetta Rugi, RUAG Holding AG (Switzerland); Wolfgang Singer, Carl Zeiss SMT GmbH (Germany); Simon Thibault, Univ . Laval (Canada); Kevin P. Thompson, Synopsys, Inc . (United States); Kristina Uhlendorf, JENOPTIK Optical Systems GmbH (Germany); Min Wang, INO (Canada); Richard N. Youngworth, Riyo-LLC (United States); María J. Yzuel, Univ . Autònoma de Barcelona (Spain)

Efficient and successful optical design requires a multi-disciplinary approach . The optical designer needs to have material and production know-how, knowledge of the ap-plication and potential market, in addition to considerable ability in their main task - the design of an optical system with optimum performance . Advanced optical systems require a clear understanding of the physical limits, mate-rial science, and technical possibilities . Only then will the result be a competitive product optimised for best value for money . In many cases the success of a product in the international marketplace depends on its optical design .

New types of optical elements, such as DOEs and HOEs, active and adaptive elements, nonlinear elements, integrated optical elements, new tools for illumination, or micro-optical components find their way into new products . The design software tools have to keep pace with the research and development activities in these new technologies .

This conference is intended to address an international au-dience of optical system designers, software development engineers, and R&D experts from industry, institutions, and academia .

Please note that papers on the subject of “Detectors and Associated Signal Processing” will be included within the scope of this conference.

Original papers are solicited on, but not limited to, the following areas of research, design, and engineering of optical systems:

• modelling, simulation, and new algorithms • optomechanical design • stray light analysis and prevention • super resolution systems • space optics • x-ray optics • active and adaptive optics • integrated and guided optics • micro-optics • optics for visual instruments • detectors and their interface to optics • advanced optical materials • diffractive and holographic optics • high-power designs using nonlinear elements • environmental effects and their compensation • projection and display systems • microscopy • lithography and associated optical systems • computational imaging • freeform optics .

SUBMIT YOUR WORK BY 23 FEBRUARY

Present and publish your latest research for a worldwide audience of scientists, engineers, product developers, and decision makers

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SPIE Optical Systems Design 2015 · www.spie.org/osd15call4

Advances in Optical Thin Films V (OSD02)Conference Chairs: Michel Lequime, Institut Fresnel (France); H. Angus Macleod, Thin Film Center, Inc . (United States); Detlev Ristau, Laser Zentrum Hannover e .V . (Germany)

Programme Committee: Claude Amra, Institut Fresnel (France); Mireille Commandré, Institut Fresnel (France); Franck Delmotte, Institut d’Optique Graduate School (France); Angela Duparré, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany); Chang Kwon Hwangbo, Inha Univ . (Korea, Republic of); Norbert Kaiser, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany); Juan Ignacio Larruquert, Consejo Superior de Investigaciones Científicas (Spain); Cheng Chung Lee, National Chung Hsing Univ . (Taiwan); Xu Liu, Zhejiang Univ . (China); Ludvik Martinu, Ecole Polytechnique de Montréal (Canada); Angela M. Piegari, ENEA (Italy); Francis Placido, Univ . of the West of Scotland (United Kingdom); Ulrike Schulz, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany); Christopher J. Stolz, Lawrence Livermore National Lab . (United States); Alexander Tikhonravov, Lomonosov Moscow State Univ . (Russian Federation); Hrvoje Zorc, Institut Ruder Bo

v

skovic (Croatia)

Optical thin films are today involved in numerous optical systems where they constitute a key to their ultimate per-formance . For most applications, high accuracy is required on both the optical and non-optical properties, including low-loss energy balance, mechanical and thermal be-haviour, laser damage threshold and nonlinear properties . Great progress has been made in almost all aspects but there are still problems and barriers to progress and their identification and possible solutions represent important features of this conference .

The conference will be devoted to thin film optical coat-ings, with special emphasis on the latest developments in the field . Papers on theoretical, experimental, and techno-logical aspects will cover both fundamental and applied research, as well as development, practical techniques and applications .

We welcome papers describing advances in any aspect of thin film optical coatings and especially in the following areas:

• film deposition methods • large area deposition • process control and monitoring • optical coating materials • organic optical coatings • thin film growth and microstructure • design of optical coatings • optical coatings on plastic • coatings for ultrafast optics • soft x-ray/EUV/DUV/VUV coatings • optical coatings for displays and lighting • optical coatings for solar energy utilization • coatings for security applications • optical and scattering properties • coating stress and mechanical properties • laser-induced damage • patterned coatings and thin-film arrays • 1D photonic crystals and metamaterials .

SPIE OPTICAL SYSTEMS DESIGN 2015

IMPORTANT DATESAbstracts Due: 23 FEBRUARY 2015Author Notification: 4 MAY 2015Manuscript Due Date: 10 AUGUST 2015

PLEASE NOTE: Submissions imply the intent of at least one author to register, attend the conference, present the paper as scheduled, and submit a full-length manuscript for publication in the conference proceedings .

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TEL: +44 29 2089 4747 · [email protected] 5

Optical Fabrication, Testing, and Metrology V (OSD03)Conference Chairs: Angela Duparré, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany); Roland Geyl, REOSC (France)

Programme Committee: Genevieve M. Chabassier, Commissariat à l’Énergie Atomique (France); J. P. Chauveau, Essilor International (France); Xinbin Cheng, Tongji Univ . (China); Svetlana Dligatch, Commonwealth Scientific and Industrial Research Organisation (Australia); Sead Doric, Doric Lenses Inc . (Canada); Pierre Gloesener, AMOS Ltd . (Belgium); Philippe Godefroy, Winlight System S .A . (France); James E. Harvey, Photon Engineering LLC (United States); François Houbre, Savimex (France); Miloslav Ohlídal, Brno Univ . of Technology (Czech Republic); Manfred Prantl, Alicona Imaging GmbH (Austria); Alon Regev, Rafael Advanced Defense Systems Ltd . (Israel); Sven Schroeder, Fraunhofer-Institut für Angewandte Optik und Feinmechanik (Germany); Reinhard Völkel, SUSS MicroOptics SA (Switzerland); Lingli Wang, Jos . Schneider Optische Werke GmbH (Germany); Alexander Yascovich, Space Research Institute (Russian Federation)

Today’s optical fabrication technologies are facing ev-er-increasing demands from industry and research . This is driven by tough requirements for cost and time reduction in production and R&D as well as by rapidly developing and new application fields . Large and complex surfaces and the enormous progress of nanotechnologies in optics are just two examples . These challenging developments crucially impact the nature of testing and metrology tools as well as the way the tools are deployed . High accuracy testing procedures for ever-smaller features e .g . are needed just as much as methods for fast and efficient coverage of large application areas . All these efforts are directed to strengthen the efficiency in numerous fields such as industry, science, and consumer optics .

The aim of this conference is to review the latest devel-opments achieved in optical fabrication, testing, and metrology . To address these, contributions are sought from the following and related fields:

CALL FOR PAPERS

• large, mini-, and micro-optics fabrication • aspheric and complex or free-form optical surfaces • polishing, grinding, lapping, and cutting • ultraprecision manufacturing (diamond turning etc .) • nanostructuring of multifunctional optical surfaces • novel surface finishing techniques • additive manufacturing in optics• optical shop and the environment • computer integrated manufacture and automation • rapid surface processing • exotic or difficult material processing • figure, mid-, and high-spatial frequencies

measurement • scanning probe techniques • nano- and microroughness measurement • light scatter techniques and analysis • texture and subsurface damage testing • interferometry and holography • speckle photography, shearography, and ESPI • optical metrology at extreme UV wavelengths • coated surface testing • surface cleanliness testing • complete system testing • novel or specialized testing techniques • relative and absolute accuracy • standardization in optical metrology .

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SPIE Optical Systems Design 2015 · www.spie.org/osd15call6

Illumination Optics III (OSD04)Conference Chairs: Tina E. Kidger, Kidger Optics Associates (United Kingdom); Stuart David, Synopsys, Inc . (United States)

Programme Committee: Pablo Benitez, Univ . Politécnica de Madrid (Spain); Peter Brick, OSRAM Opto Semiconductors GmbH (Germany); William Cassarly, Synopsys, Inc . (United States); R. John Koshel, College of Optical Sciences, The Univ . of Arizona (United States); Juan Minano, Univ . Politécnica de Madrid (Spain); Julius A. Muschaweck, ARRI Inc . (Germany); Jannick P. Rolland, Univ . of Rochester (United States); Andreas L. Timinger, Philips Technologie GmbH (Germany)

There has been a resurgence in the topic of illumination optics . This resurgence has been driven by new sources (e .g ., solid state sources, organic sources, light-emitting polymers, and high luminance discharge sources), new markets and styling considerations (e .g ., wearable tech-nologies, smart devices, and automotive applications) and advances in fabrication technologies (e .g ., diamond turn-ing of complex surfaces and advanced molding of complex patterns and structures) . In addition, several optical design software companies have developed, and continue to develop and improve, sophisticated illumination modeling, including color management and optimization tools to aid the illumination design engineer . This conference offers an international podium for the discussion of these ongoing illumination R&D activities .

Submit your abstractby 23 February 2015

PRESENT TO HUNDREDS, PUBLISH TO MILLIONS• Publish your work in SPIE Proceedings.SUBMIT YOUR ABSTRACT TODAY: WWW.SPIE.ORG/OSDCALL

SPIE OPTICAL SYSTEMS DESIGN 2015

Papers are solicited on all matters pertaining to modern illumination design, including, but not limited to, the following areas:

• illumination optimization • light transport • LED source modeling and coupling and applications • illumination system modeling • information display design • transportation systems illumination • general/technical lighting • color management • illumination for wearable technologies .

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TEL: +44 29 2089 4747 · [email protected] 7

Interested in Exhibiting? Contact SPIE Europe: +44 29 2089 4747

Computational Optics (OSD05)Conference Chairs: Daniel G. Smith, Nikon Research Corp . of America (United States); Frank Wyrowski, Friedrich-Schiller-Univ . Jena (Germany); Andreas Erdmann, Fraunhofer-Institut für Integrierte Systeme und Bauelementetechnologie IISB (Germany)

Programme Committee: Donis G. Flagello, Nikon Research Corp . of America (United States); Ari T. Friberg, Univ . of Eastern Finland (Finland); Hans Peter Herzig, Ecole Polytechnique Fédérale de Lausanne (Switzerland); Olivier J. F. Martin, Ecole Polytechnique Fédérale de Lausanne (Switzerland); Ivan Richter, Czech Technical Univ . in Prague (Czech Republic); Jani Tervo, Univ . of Eastern Finland (Finland); Peter Török, Imperial College London (United Kingdom); Michael Totzeck, Carl Zeiss SMT GmbH (Germany); H. Paul Urbach, Technische Univ . Delft (Netherlands); Wei Wang, Heriot-Watt Univ . (United Kingdom); Zeev Zalevsky, Bar-Ilan Univ . (Israel)

Many modern optical instruments employ shaping, manipulation and detection of light in various spatial, spectral and temporal dimensions . The large variety of the involved optical effects and optical materials, in-cluding nonlinear optical materials, advanced polymers and nano-composites, broadens the design space and enables innovative solutions . The identification of the most appropriate design solutions requires an in-depth understanding of the involved physics and computation-al methods, which combine various optical modeling approaches, ranging from analytical thin film algorithms to rigorous Maxwell-solvers . Massive parallel computing using modern hardware and software architectures and advanced optimization algorithms fuel the development of computational optics and its growing number of appli-cations in modern optical design .

This conference will address an international audience of scientists and engineers on developments in computation-al optics - on new theories, algorithms, software, support-ing experiments, and applications that are not completely covered by traditional optical design . Papers are sought on the subject of computational optics, including but not limited to, the following sub-areas:

• optical field propagation techniques and special optical modeling techniques including, polarization, ultra-short pulses, coherence, statistical optics, speckle phenomena, light scattering

• optical field propagation techniques through optical surfaces including microstructures and freeforms, through homogeneous and inhomogeneous media, and crystals

• rigorous electromagnetic field modeling using finite-difference time-domain (FDTD), finite elements methods (FEM), rigorous coupled wave algorithms (RCWA) or similar techniques

• combination of different rigorous and approximate electromagnetic propagation techniques to obtain numerically efficient and highly accurate modeling procedures

• applications of classical and advanced optimization techniques in modern optics, including linear, quadratic and nonlinear programming, simulated annealing, genetic algorithms, ant colony optimization, multi-objective optimization techniques

• software interfacing of various models and optimization techniques, massive parallel computing including GPU based solutions for computational optics

• applications of computational optics in various fields including light source modeling, diffuser, imaging, lithography, microscopy, optical metrology, laser beam shaping, diffractive optics, micro-optics

• advances in computational imaging, Eulerian video magnification, image processing, bokeh, deblurring, denoising, plenoptic image processing, computer vision, computed tomography, three-dimensional image processing, and specialized computational hardware .

CALL FOR PAPERS

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SPIE Optical Systems Design 2015 · www.spie.org/osd15call8

TECHNICAL PROGRAMME

Available online May 2015The comprehensive Advance Technical Programme for this symposium will list conferences, paper titles, and authors in order of presentation; an outline of all planned special events; and hotel and registration information . The advance programme will be published online in May 2015 .

REGISTRATION

Available online May 2015All participants, including invited speakers, contributed speakers, session chairs, co-chairs and committee mem-bers must pay a registration fee . Fee information for conferences, courses, a registration form, and technical and general information will be available on the SPIE website in May 2015 .

SPIE MEMBERSHIPSPIE Members receive substantial discounts on conference registration fees .

HOTEL RESERVATIONSHotel reservation process will be opened late spring 2015 .

VISA INFORMATION Attendees from certain countries may not require a visa to enter Germany . For more details, please visit the German Foreign Office, which will list the point of information within your country .

LETTERS OF INVITATIONFOR CONFERENCE CHAIRS, TECHNICAL COMMITTEE MEMBERS, AND AUTHORS: If you are listed as an author on a paper, or as a participant in the programme, and you require an Official Invitation Letter for visa application purposes, please look for the instructions published at the Optical Systems Design website www .spie .org/osd following the Optical Systems Design 2015 acceptance notifications on 4 May 2015 .

NOTE: We recommend that you secure your travel visa before registering for the conference as cancellations after the preregistration cutoff may result in a cancellation fee .

GENERAL INFORMATION

E.EXHIBITION

Optical instruments are addressing an ever-increasing number of industrial and research applications: imaging and vision, defence, space, telecommunications, transportation, industrial process control, laser fusion, etc . SPIE Optical Systems Design Exhibition provides you the exposure to present your latest innovations in optical design to your target audience of qualified buyers .Featured Technologies and Solutions on Display: Optical Design and Engineering; Advances in Optical Thin Films; Optical Fabrication, Testing, and Metrology; Illumination Optics; Computational Optics .

8–9 September 2015Friedrich-Schiller-University Jena, Germany

INTERESTED IN EXHIBITING?

Exhibit at Europe’s Premier Event for Optical Instruments

Contact SPIE Europe: +44 29 2089 4747

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TEL: +44 29 2089 4747 · [email protected] 9

ABSTRACT SUBMISSION

By submitting an abstract, I agree to the following conditions:

AN AUTHOR OR COAUTHOR (INCLUDING KEYNOTE, INVITED, ORAL, AND POSTER PRESENTERS) WILL:• Register at the reduced author registration rate

(current SPIE Members receive an additional discount on the registration fee) .

• Attend the meeting .• Make the presentation as scheduled in the pro-

gramme .• Submit a full-length manuscript (6 pages mini-

mum) for publication in the SPIE Digital Library and Proceedings of SPIE .

• Obtain funding for registration fees, travel, and accommodations, independent of SPIE, through their sponsoring organizations .

• Ensure that all clearances, including government and company clearance, have been obtained to present and publish . If you are a DoD contractor in the USA, allow at least 60 days for clearance .

Submit an abstract and summary online at : www.spie.org/osdcall • Abstracts should contain enough detail to clear-

ly convey the approach and the results of the research . Accepted abstracts will be published and made available at the meeting . Please sub-mit a 500-word abstract for review .

• Please also submit a 300-word text summary suitable for early release . If accepted, this sum-mary text will be published prior to the meeting in the online or printed programs promoting the conference .

• Only original material should be submitted .• Abstracts should contain enough detail to

clearly convey the approach and the results of the research .

• Commercial papers, papers with no new re-search/development content, and papers where supporting data or a technical description can-not be given for proprietary reasons will not be accepted for presentation in this conference .

• Please do not submit the same, or similar, ab-stracts to multiple conferences .

REVIEW, NOTIFICATION, AND PROGRAMME PLACEMENT INFORMATION• To ensure a high-quality conference, all sub-

missions will be assessed by the Conference Chair/Editor for technical merit and suitability of content .

• Conference Chair/Editors reserve the right to reject for presentation any paper that does not meet content or presentation expectations .

• The contact author will receive notification of acceptance and presentation details by e-mail no later than 4 May 2015 .

• Final placement in an oral or poster session is subject to the Chairs’ discretion .

PROCEEDINGS OF SPIE AND SPIE DIGITAL LIBRARY INFORMATION• Manuscript instructions are available from the

“For Authors/Presenters” link on the confer-ence website .

• Conference Chair/Editors may require manu-script revision before approving publication and reserve the right to reject for publication any paper that does not meet acceptable standards for a scientific publication . Conference Chair/Ed-itors’ decisions on whether to allow publication of a manuscript is final .

• Authors must be authorized to transfer copy-right of the manuscript to SPIE, or provide a suitable publication license .

• Only papers presented at the conference and received according to publication guidelines and timelines will be published in the conference Proceedings of SPIE and SPIE Digital Library .

• Published papers are indexed in leading sci-entific databases including Astrophysical Data System (ADS), Chemical Abstracts (relevant content), Compendex, CrossRef, Current Contents, DeepDyve, Google Scholar, Inspec, Portico, Scopus, SPIN, and Web of Science Conference Proceedings Citation Index, and are searchable in the SPIE Digital Library . Full manuscripts are available to SPIE Digital Library subscribers worldwide .

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SPIE Optical Systems Design 2015 · www.spie.org/osd15call10

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