capacitive radiofrequency discharges and dusty …-high mobility of electrons: very low potential...
TRANSCRIPT
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CAPACITIVE RADIOFREQUENCY DISCHARGES
AND DUSTY OR COMPLEX PLASMAS
FROM FUNDAMENTAL TO APPLICATIONS
Laïfa BOUFENDI École Polytechnique de l’Université d’Orléans.
GREMI Laboratory [email protected]
http://www.univ-orleans.fr/gremi/
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OUT LINES
• Introduction: History and motivations • Capacitively coupled capacitive discharge (CCCD) • Particle charging and trapping in the plasma • Nucleation and growth of dust particles in the gas
phase • Particle detection • Temperature effects • Applications • Conclusions
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From dust in plasmas to
dusty plasma science
The first observations of dust in a laboratory plasma were made by Langmuir. He reported these observations on September 18, 1924 at the Centenary of the Franklin Institute in Philadelphia.
Langmuir, Found and Dittmer, Science, vol. 60, No. 1557, p 392 (1924)
“. . . we have observed some phenomena of remarkable beauty which may prove to be of theoretical interest.”
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A
2 – 4 Torr Argon
tungsten globules
0.01 -0.1 mm
negative particles
Langmuir’s Streamer Discharge
W
S
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MORE RECENT WORKS 1924 à 1980
• 1945 : Kenty and Cooper: effect of impurities on fluorescent lamps.
• 1966 : Garscadden and Lee: constricted discharges.
• 1970 : Emeleus and Breslin: effect of dust on positive columns.
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Dusty plasmas in astrophysics Take off
In nature • Comet tails • Planetary atmospheres (Titan’s atm. cont. N2-CH4) • Planetary rings (Saturn’s rings) • Interstellar clouds
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Take off Unexpected dust problems in plasma-surface processing : pioneering works -e.g. PECVD (a-Si:H): Spears & al , IEEE trans. Plasma Sc. 14, 179, 1986. -e.g. etching (SiO2): G. Selwyn & al , J. Vac. Sci. Techn. A 7, 2758,1989.
Images from Gary Selwyn: The original discovery that RF plasmas (etching/deposition) can be appropriat medium for particle growth in the gas phase and particle levitation.
G.S. Selwyn, Plasma Sources Sci. Tehcnol. 3, 340 (1994).
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CAPACITEVELY COUPLED CAPACITIVE RADIOFREQUENCY DISCHARGES
« Industrial, Scientific and Medical Frequencies » (ISM)
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~
lg1
lg2
Plasma
~~
lg1lg1
lg2lg2
Plasma
V
xVp
V
xVp
~
lg1
lg2
Plasma
CB
~
lg1lg1
lg2lg2
Plasma
CB
V
xVp
VDC
V
xVp
V
xVp
VDC
CAPACITEVELY COUPLED CAPACITIVE DISCHARGE
Direct coupling Capacitive coupling
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Matching network
Powered electrode
Grounded electrode
Plasma
VP
Vc(t)
T
τ1
VDC
0 With such discharge structure a self bias (VDC) occurs on the powered electrode.
VC(t) = VRF(t) + VDC
Vc(t) potential of the cathode
CAPACITEVELY COUPLED CAPACITIVE DISCHARGE
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Cur
rent
(A)" Voltage (V)"
0" 0.5"0.25" 0.75" 1"
Time (t/T)"
-600"
+100"
0"Total current"
Capacitive current"
P. Belenguer et al, Surf Interface Anal., 35, (2003), 604.
-60
-40
-20
0
20
Cur
rent
Com
pone
nts (
mA
)
1.00.80.60.40.20.0Time (t/T)
-500
-400
-300
-200
-100
0
100
Voltage (V
)
Total current Displacement current Particle current
Voltage
Power=3.17 W
CAPACITEVELY COUPLED CAPACITIVE DISCHARGE
The nonlinear relationship between the current and the voltage drop in the sheaths induces harmonics in the current waveform.
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Ar plasma, analysis of the discharge current
CAPACITEVELY COUPLED CAPACITIVE DISCHARGE
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CAPACITEVELY COUPLED CAPACITIVE DISCHARGE
RF
V1
Vp
V2
RF
V1
Vp
V2
Gaine 1 : V1, lg1
Gaine 2 : V2, lg2
RF
Dg1
Dg2Cg2
Cg1
Rg2
Rg1
rb
rb
Zp
RF
Dg1
Dg2Cg2
Cg1
Rg2
Rg1
rb
rb
Zp
Dg1
Dg2Cg2
Cg1
Rg2
Rg1
rb
rb
Zp
Equivalent Electrical circuit
Sheath 1
Sheath 2
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CAPACITEVELY COUPLED CAPACITIVE DISCHARGE
Signal RF injecté
!
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TYPICAL EXPERIMENTAL CONDITIONS mass flow controller
Typical parameters for low pressure discharge plasmas Pressure: 10-1000 µbars, gas flow : 1-100 sccm, power : 0.01-1 W/cm3 Electrical source: RF , DC , microwaves, ionization degree : 10-5-10-3
gas inlet
Vacuum vessel
power supply
electrodes
plasma
To pumping system
gas source
Id
Id
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Low pressure discharge plasmas : typical microscopic characteristics
neutrals
ions
electrons
electrons + ions + neutrals
IAC
IAC
sheaths
plasma
electrodes
nn > ni, ne
ni ~ ne ~ 109 – 1010 cm-3
1 eV ≤ Te ≤ 10 eV, Ti ≈ 0.03 eV
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Electrons: achieve gas ionization, dissociation and excitation ⇒ thermal energy of few eV; thermal speed : few 106 m.s-1
Ions : collisional equilibrium with gas ⇒ room temperature, thermal speed = few 100 m.s-1
plasma core ~ equipotential limited by space charge sheaths that control charge losses Id
Id
Plasma (potential Vp) Sheaths
Low pressure discharge plasmas : typical microscopic characteristics
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- high mobility of electrons: very low potential variation in the plasma core (B =0 ) - requirement of potential barriers (sheaths) reducing the electron drift flow to the ion flow level (ambipolar diffusion) - height of barrier : few kTe/q ( repelling most of the electrons and all negative ions) . All the negatively charged species are trapped in the core of the plasma. - ions accelerated towards the walls and ion flow velocity at the sheath edge = [kTe / Mi]0.5 (Bohm velocity).
Low pressure discharge plasmas : typical microscopic characteristics
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DUST PARTICLE CHARGING
AND TRAPPING
IN LOW PRESSURE PLASMAS
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PARTICLE CHARGING AND TRAPPING
Id
Id
Plasma (potential Vp) electron
ion
Single particle immersed in the plasma is negatively charged
The charge corresponds to the electrostatic equilibrium between the ion and electron flows collected on the dust surface.
Ii
Ie
- - - -
- -
-
0=+ ie II
⎟⎟⎠
⎞⎜⎜⎝
⎛ −
××××−=
eB
pf
e
BeDe Tk
VVq
mTeknqrI exp
24 2
ππ
⎟⎟⎠
⎞⎜⎜⎝
⎛ −−
××××=
EiVV
qm
EinqrI pf
iiDi 12
4 2
ππ
Where And ei
d IIdtdQ
+=
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PARTICLE CHARGING AND TRAPPING
Here we considered Maxwellian ion energy distribution
Vf and Vp are respectively the dust particle floating and plasma potentials.
- Er
Ion flow
Neutral plasma
Debye sheath
+ + The potential drop in the sheath is given by
⎟⎟⎠
⎞⎜⎜⎝
⎛ −=⎟⎟
⎠
⎞⎜⎜⎝
⎛ −−
eB
pf
iB
pf
ie
ei
e
i
TkVV
qTkVV
qmTmT
nn exp1
For an isolated spherical dust particle the acquired maximum charge is given by the following expression
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Secondary emission from small dust grains at high electron energies Chow, V.W. Mendis, D.A. Rosenberg, M.
IEEE Transactions on Plasma Science, 179-186, 1994
PARTICLE CHARGING MECANISMS
Ielectron collection + Iion collection
+ Ielectron emission
H+
e-
e- +
Charging by collecting electrons and ions only ⇒ Q < 0
Ielectron collection + Iion collection
e-
_
Goree, Plasma Sources Sci. Technol. 1994
Electron emission • secondary emission due to e- impact • photoemission • thermionic
⇒ Q > 0
+ +
*Meyer-Vernet, Astron. Astrophys. 105,98 (1982)
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PARTICLE CHARGING AND TRAPPING When immersed in a plasma, the dust particle acquire a negative charge and thus is confined in the plasma. It is submitted to a set of forces which are :
• Gravity
• Electrical force
• Ion drag force
• Neural drag force
• Thermophoretic force
• Photophoresis
• Particle-particle interaction.
+ +
+ +
+
+
+
+
+ +
+
+
+ + +
+
+
- - -
-
- - -
- -
-
-
-
+
+ -
-
-
-
-
- +
+ -
+
Ii
Ie
Sheath
Fi
Fth
FE
Fpp
Fg
+ - -
- -
-
- +
+ +
+
+
+ +
+ +
+
- -
- -
-
-
-
-
-
- - - -
- -
- - - - -
- -
-
+ +
+
+ + +
+ +
+ E
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PARTICLE CHARGING AND TRAPPING
iisiiisicci
oii umvnbumvnbFFF !!!!!
Η+=+= 22
2 4 πππ
• Gravity
• Electrical Force :
• Ion Drag force
• with and
• Thermophoretic force
grF dg ρπ 334
=
( )( )⎥
⎥⎦
⎤
⎢⎢⎣
⎡
++=
Ld
Ldde r
rEQFλ
λ13
12
0
⎟⎟⎠
⎞⎜⎜⎝
⎛ −−= 2
22 21ii
pfdc vm
VVqrb ⎟
⎟
⎠
⎞
⎜⎜
⎝
⎛
+
+=Η 2
22
22
2
ln21
π
πλ
bb
b
c
e
( ) gasTTnth
dth T
vrF ∇⎥⎦
⎤⎢⎣⎡ −+−=
!!κα
π 13251
1532
,
2
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Orbit force: Ion orbit is deflected
Collection force: Ion strikes particle
Momentum is imparted to the dust particle
PARTICLE CHARGING AND TRAPPING
_ _
+ +
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PARTICLE CHARGING AND TRAPPING Comparison of the different forces
Te = 3eV, Te/Ti ≈ 100, Tg = 400K, ρ = 2.3 103 kg/m3, vth,n = 500 m/s.
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Dense particle cloud dynamics
G. SELWYN, IBM, 1989
Silicon wafers
entrance hole of a rastered laser beam
Well localized traps
7
1 5
2 3
3 1
0 1 0 2 0-1 0-2 0ho riz o n ta l p o s ition (m m )
ve
rtic
al p
osi
tion
(m
m)
( a )
l in e o f p a r tic le s
Simulation
Experiment
J.P. Boeuf et al, PSST, 3, (1994) Dalvie et al, PSST, 3, 442-447, (1994)
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Dense particle cloud trapped in plasma : from independent particles to coulomb crystals
plasma
sheath
bottom electrode
floating dust crystal
1 : When the inter-particle distance is such that their « Debye spheres » overlapp : repelling forces appear 2 : If the kinetic energy is s ignif icant ly lower than the interaction energy the particles cannot move freely 3 : Phase transition (liquid to crystal) predicted theoretically before experimental evidence 4 : Crystals defects and wave propagation observed
Strongly coupled systems
⎟⎟⎠
⎞⎜⎜⎝
⎛−=Γ
DdB
d dTdk
Qλ
exp2
Coupling parameter
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Dense particle cloud trapped in plasma : from independent particles to coulomb crystals
Plasma ON : particle velocity RMS value = 0.0220 m/s kinetic energy : kTd = 0.035 eV (Td = 410 K) Plasma OFF : instantaneous gas velocity = 0.215 m/s particle-particle interaction energy : 0. 3 eV from pp
dE DqZW−
=22
041πε
- dust cloud grown in Ar-SiH4 plasma filling the whole plasma box - particle diameter : 0.4 µm , particle density 108 cm-3
- particle charge : ~40 electrons - Γ = 10, transition to crystal for > 170 (Ikezi) - measurement of particle vertical velocity using LDA evidenced a rather incompressible liquid-like behavior Ikezi H. Phys. Fluids 29, 1764 (1986).
A l'extinction du plasma
Durant le plasma
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Dense particle cloud trapped in plasma : from independent particles to coulomb crystals
Evidence of coulombian crystals
Chu & al, J Phys D , 27, 296 Hayashi & al, Jpn J. Apl. Phys. 33, L 804, Melzer & al, Phys Lett. A 320, 301 Thomas & al , Phys Rev Lett, 73, 652
First publications as early as 1994
In these experiments Γ > 1000 , well above the critical value (170)
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Dense particle cloud trapped in plasma : from independent particles to coulomb crystals
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0.05 0.1 0.15 0.2
0.534
0.535
0.536
0.537P = 1.6 mbar
0.05 0.1 0.15 0.2
0.544
0.545
0.546
0.547
P = 1.4 mbar
0.1 0.15 0.2 0.25
0.568
0.57
0.572
0.574
0.576
P = 1 mbar
0.05 0.1 0.15 0.20.585
0.59
0.595P = 0.6 mbar
0.05 0.1 0.15 0.2
0.586
0.588
0.59
0.592
0.594P = 0.5 mbar
0.05 0.1 0.15 0.2
0.582
0.584
0.586
0.588
P = 0.4 mbar
M. Mikikian, L. Boufendi, Phys. Plasmas 11, 3733 (2004)
INSTABILITIES OF THE GROWN DUST CLOUD (HEARTBEAT)
Once the dust cloud is completely formed, a dust-free region can appear in the plasma center
This region can oscillate spontaneously: Successive contractions and expansions
Electrical measurements for different pressures
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HEARTBEAT INSTABILITY HIGH SPEED IMAGING
Direct observation of plasma glow Dust cloud observed with Laser Light Scattering
High speed imaging ~1800 fps
M. Mikikian, L. Couëdel, M. Cavarroc, Y. Tessier, L. Boufendi, New J. Phys. 9, 268 (2007)
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HEARTBEAT INSTABILITY HIGH SPEED IMAGING
Direct observation of plasma glow
M. Mikikian, L. Couëdel, M. Cavarroc, Y. Tessier, L. Boufendi, New J. Phys. 9, 268 (2007)
135 142 143 144
145 146 147 148
150 152 155 170
180 200 220 230
Evolution of dust cloud during one contraction-expansion sequence
Image number
Imag
e ve
rtic
al a
xis (
pixe
ls)
100 150 200 250 300 350 400
40
60
80
100
120
140
160
Evolution of the central column profil during one contraction-expansion sequence
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DUST PARTICLE FORMATION
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DUST PARTICLE FORMATION
• The dust particle formation in a plasma can be observed in etching, PECVD and sputtering reactors.
• In all these situations, homogeneous chemical reactions are responsible of this phenomenon.
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Chemical equilibrium
Surface mobility
Electron density Electrical power
SiH +SiH4x
Radicals ClustersIons, Photons,..
Ts
IncreasePowerRF,Pressure,Geometry,Silane flux
Secondary Reactions
Si Hn mClusters , Polymers Powder
e + SiH
SiH + H
4
x
PrimaryReactionss
SiH4 4e + SiH Pumps
Growthzone
Bulk
Substrate temperature
Plas
ma
proc
esse
s
Surface & subsurface reactions
CHEMICAL REACTIONS IN PECVD REACTORS
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DUST PARTICLE NUCLEATION AND GROWTH
Particle Growth in Ar-SiH4 Plasmas
0
10
20
30
40
50
60
70
80
0 5 10 15 20 25 30 35
Time (s)S
ize
(nm
)
0
2
4
6
8
10
12
Den
sity
(108 cm
-3)
molecular sticking
coalescence
Dark field TEM micrographs evidence elementary structures as 2-3 nm diameter crystallites
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DUST PARTICLE NUCLEATION AND GROWTH
Evidence of a clustering process involving negative ions (trapped)
Clustering models: take into account neutrals, cations, anions
Main route through :
[SinH2n+1]- + SiH4*
[ Sin+1+ H2n+3]- + 2H
Mass spectrometry data give insights on cluster formation process (1 to few 10 Si atoms)
Main results : from EPFL, Lausanne Ch. Hollenstein et al. PSST 3, 278, (1994).
−3SiH
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DUST PARTICLE NUCLEATION AND GROWTH
Particle nucleation and growth process : characteristic steps in argon - silane discharge,
1 Å 1 nm 10 nm 0.1 m µ 1 m µ
SiH4
Radicals Polysilanes
Clusters
Powders nm size “crystals” Electrical charging & further
growth through radical sticking
molecular physics
cluster physics
coagulation physics
coagulation step
electron attachment
critical densities
plasma-particle interaction
particle charge
Size
0 few 100 few 1000 time (ms)
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DUST PARTICLE NUCLEATION AND GROWTH du
st p
article
diam
eter (n
m)
1 00
4 00
300
200
00 50 100 150 200 250 300
tim e (se c )
1 0 6
1 0 7
1 0 8
1 0 9
1 0 10
dust num
ber d
ensity (cm
-‐3)
Growth of carbon particles, from sputtering graphite in an rf discharge
D. Samsonov and J. Goree Particle growth in a sputtering discharge J. Vac. Sci. Technol. A 1999
This kind of dust can be also obtained in PECVD plasmas in hydrocarbon chemistries. See J. Winter et al work.
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DUST PARTICLE NUCLEATION AND GROWTH SIMULATION
A. A. Fridman, J. Appl. Phys. 79, 1303, (1996).
U. V. Bhandarkar et al, J. Phys. D 33, 2731-2746, (2000).
K. De Bleeker et al, Phys. Rev. E 69, 056409 (2004)
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MOLECULAR DYNAMICS SIMULATION OF NANOCRYSTALLITES GROWTH
In order to activate these chemical reactions the silane molecules must be vibrationally excited
See Fridman et al, J. App. Phys. 79, 1303 (1996).
Role of the atomic hydrogen
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MOLECULAR DYNAMICS SIMULATION OF NANOCRYSTALLITES GROWTH
Typical structures of hydrogenated silicon nanoparticles formed starting from these chemical reactions
Q. Brulin, N. Ning, H Vach, J. Non-Cryst. Solids 352, 1055-1058 (2006)
(a) Example of amorphous structure resulting from a growth mechanism in a pure s i l a n e p l a s m a a t r o o m temperature in the absence of atomic hydrogen;
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MOLECULAR DYNAMICS SIMULATION OF NANOCRYSTALLITES GROWTH
(b) Low atomic hydrogen flux giving rise to crystalline structures that are rich in hydrogen.
Q. Brulin, N. Ning, H Vach, J. Non-Cryst. Solids 352, 1055-1058 (2006)
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(c) High atomic hydrogen flux yielding crystalline structures
relatively poor in hydrogen that are similar to those predicted for
pure silicon clusters;
MOLECULAR DYNAMICS SIMULATION OF NANOCRYSTALLITES GROWTH
Q. Brulin, N. Ning, H Vach, J. Non-Cryst. Solids 352, 1055-1058 (2006)
Si29H24 cluster under hydrogen bombardment
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NANOPARTICLE DETECTION
AND METROLOGY
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LASER LIGHT SCATTERING
θλπ
λπ
2//
2
2
26
4
4
//
2
2
26
4
4
cos2116
2116
⋅⋅+
−⋅⋅⋅⋅ΔΩ⋅Δ⋅=
⋅+
−⋅⋅⋅⋅ΔΩ⋅Δ⋅= ⊥⊥
ipp
ipp
ImmrnVCI
ImmrnVCI
The scattered intensity allows the detection but contains also information about the size, concentration and refractive index.
Multi-angle laser light scattering.
Ch. Hollenstein et al, PSST3, (1994), 278.
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NANOPARTICLE DETECTION LASER LIGHT SCATTERING
Ch. Hollenstein et al, PSST3, (1994), 278.
Time evolution of the scattered intensities for the two polarization directions.
Time evolution of the size, concentration and refractive index of the dust particles during their growth.
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NANOPARTICLE DETECTION In this size range : Rayleigh scattering ∝ rp
6 / λ4 sophisticated techniques for signal recovery
Photon counting techniques : M. Shiratani and Y. Watanabe, The Revue of Laser Engineering 26, 449-452 (1998).
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NANOPARTICLE DETECTION LASER INDUCED INCANDESCENCE
Mainly used for soot particles detection
ILII is proportional to the dust particles volume fraction.
Decrease characteristic time depends on the dust particle size.
A. Boiarciuc et al Applied Physics B83, (2006), 413.
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NANOPARTICLE DETECTION LASER INDUCED EVAPORATION
W. W. Stoffels et al Appl. Phys Letter 74, (1993), 259
The emitted signal from the heated dust particles is much intense than the scattered one.
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• Method based on the particle explosive evaporation induced by laser irradiation (LIPEE)
• Detection of particles in the nanometer scale and evidence of the 3 different growth phases.
• This experiment was performed using an XeCl laser (308 nm) with an energy density of 400 MW/cm2.
NANOPARTICLE DETECTION LASER INDUCED PARTICLE EXPLOSIVE
EVAPORATION (LIPEE).
(L. Boufendi et al, J. Appl. Phys. 76, 148, 1994).
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NANOPARTICLE DETECTION LASER INDUCED PARTICLE EXPLOSIVE
EVAPORATION (LIPEE).
T h e L I P E E s i g n a l i n t e n s i t y i s r a t h e r proportional to the dust particle size.
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For the detection of particles formed in an industrial reactor these methods cannot be used. We have to look
for other diagnostic tools.
We have to use the plasma and discharges properties.
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NANOPARTICLE DETECTION
RF Source (13.56 MHz)
Plasma
Current probe
signal processing
Voltage probe
Real time amplitudes of disch. current third harmonics
self bias voltage and
transmitted microwave signal recording unit
Gas Argon : 30 sccm Silane : 1.2 sccm Pressure : 120 µbar Gas temperature - 30°C , 150°C RF power 10 W
Microwave generator
Matching network
Detector
Using discharge properties
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0 20 40 60 80 100 Frequency (MHz)
Pure Ar plasma
Ar-SiH4 plasma
Fundamental
3rd harmonic
Inte
nsity
(a.u
.)
0 2 4 6 8 10 Time (s)
Harmonic 3
fundamental Inte
nsity
(a.u
.)
0 2 4 6 8 10 Time (s)
Inte
nsity
(a.u
.)
Fundamental
Harmonic3
NANOPARTICULES DETECTION
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Particle Growth in Ar-SiH4 Plasmas
0
10
20
30
40
50
60
70
80
0 5 10 15 20 25 30 35
Time (s)
Siz
e (n
m)
0
2
4
6
8
10
12
Den
sity
(108 cm
-3)
molecular sticking
coalescence
Identification of the different growth phases through the electrical parameters.
Inte
nsity
(a .u
.)
t2
0 0.1 0.2 0.3 0.4 Time (s)
t1 SiH3-
Pure Ar plasma
Ar-SiH4 plasma
4 6 8 10 0 2 Time (s)
PRF= 10W, TG= 25°C
Inte
nsity
(a.u
.)
t3
SiHn
NANOPARTICLE DETECTION
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NANOPARTICLE DETECTION
-Amplitudes of 3H and Vdc are : . constant in Ar plasma . affected in Ar-SiH4 plasma
-Same trends in 3H and Vdc 0.0 0.1 0.2 0.3 0.4
-40
-39
-33
-32
-31
-30
Argon-Silane plasma
Argon plasma
Vdc
(a.
u.)
Time (s)
Nanoparticle phase Agglomeration phase
Evolutions are due to change in plasma impedance
0.0 0.1 0.2 0.3 0.40.8
1.0
1.2
2.8
3.0
3.2
Argon-Silane plasma
Argon plasma
2H (
a.u.
)
Time (s)
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16 Run, 10 W, 200 ms
Electrical measurements validation
NANOPARTICLE PHASE COAGULATION PHASE
16 Run, 10 W, 100 ms
SEM
0.0 0.1 0.2 0.3 0.4Time (s)
Inte
nsity
(u.a
.)
t1 t2
b) Ar+SiH4 plasma
a) Ar plasma
NANOPARTICLE DETECTION
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0 50 100 150 200 250 300 3500
0.5
1
1.5
2
2.5
3
3H (m
A)
0 50 100 150 200 250 300 350-120
-100
-80
-60
-40
-20
0
Temps (s)
V dc (V
)
t4 te
NANOPARTICLE DETECTION Detection of multigeneration systems
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2620 2670 2720 2770 2820 2870 2920
-0.03
-0.025
-0.02
-0.015
-0.01
-0.005
F requency (MHz)
Tra
nsm
itted
mic
row
ave
sign
al (a
.u.)
Plasm a off
P lasm a A rgon
f0 f
MICROWAVE RESONANT CAVITY METHOD
Basic relation used to calculate the electron density :
( )0
2
20 22fe
ffmn ee
Δπε= Δf
mode TM110 f=2.72GHz
For a pure Ar plasma (30sccm, 10W) : ne=1.2 1016m-3
Argon plasma on f: resonance frequency with plasma f0:resonance frequency without plasma Δf: f-f0
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negative ions formation −3SiH
0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8-130
-120
-110
-100
-90
-80
-70
-60
-50
-40
Vdc
(V)
0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.80
0.5
1
1.5
2
2.5
3
3.5
4
4.5x 10
15
Temps (s)
n e (m
-3)
Transition - '
0 0.01 0.02 0.03 0.040
1
2
3
4x 10
15
Nanocrystallites formation and accumulation
Agglomération phase
n e (1
015 m
-3)
4.5
1
Time (s)
VD
C
Correlation between the electron density and electrical parameters.
NANOPARTICLE DETECTION
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0,0 0,1 0,2 0,3 0,4 0,5 0,6 0,7
1,80E+009
1,90E+009
2,00E+009
2,10E+009
0 4 8 12 16 20 24 281,20E+009
1,35E+009
1,50E+009
1,65E+009
1,80E+009
1,95E+009
2,10E+009
Ele
ctro
nic
dens
ity (
cm-3 )
Time (s)
Zoom
0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8-120
-100
-80
-60
-40
-20
0
V dc (V
)
0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.80.2
0.8
1.4
2
2.6
3.2
3.8x 1015
Temps (s)
n e (m
-3)
t2
Vdc
ne
Phase I Phase II
The first decrease of the electron density is due to the formation of negative clusters. The time constant of this process is much longer than in the silane case.
Ar-SiH4 chemistry
N2 – CH4 Chemistry
Similarity between the two chemistries
NANOPARTICLE DETECTION
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Three different phases:
- Nucleat ion, growth and accumulation of nanometer sized “clusters (nanocrystallites?),
- 1st agglomeration phase of the nanoclusters;
- 2nd agglomeration phase.
All these phases are well i d e n t i f i e d f r o m V D C , 3 r d harmonic of the discharge current and from the time evolution of the electron density.
NANOPARTICLE DETECTION
Ar-CH4 chemistry
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GAS TEMPERATURE EFFECTS
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0 2 4 6 8 10Time (s)
Norm
alize
d in
tensit
y (a
.u.)
25°C50°C75°C
100°C
125°C
150°C
175°C
0 30 60 90 120 150 180Temperature (°C)
0.00
0.20
0.40
0.60
0.80
t 1(s)
0 30 60 90 120 150 180Temperature (°C)
0
2
4
6
8
10
12
14
t 2(s)
a) b)Coagulation step from electrical
diagnostic
2 4 6 8 10 12
40 80 120 T ( °C)
t 2 (s
)
Coagulation step from LIPEE diagnostic
GAS TEMPERATURE EFFECTS
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0 100 200 300 400 500 600 700 800 0
1
2
3
4
5 x 10 15
Temps (ms)
n e (m - 3 )
30 °C 60 °C 80 °C 100 °C
-5 0 5 10 15 20 25 0 1 2 3 4 5 x 10 15
Temps (ms)
n e (m - 3 )
GAS TEMPERATURE EFFECTS
1- The gas temperature has no effect on the negative ion formation but strongly influences chemical reaction
HHSiSiHHSi nnnn 21)1(21*412 +→+ +++
−+
2- This can also be related to the temperature dependence of the Brownian diffusion coefficients when Tg increases.
U. Bhandarkar et al, J. Phys. D: Appl. Phys. 36, 1399 (2003)
A. A. Fridman et al J. Appl. Phys. 79, 1303 (1996)
The negative ions formation is not affected by the gas temperature.
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GAS TEMPERATURE EFFECTS
What does it happen if we cool down the gas instead of heating?
The nanocristallites critical size is also affected by the gas temperature:
Tg = 100 °C dnc ≈ 2 nm
Tg = 25 °C dnc ≈ 3 nm
Tg = 0 °C dnc ≈ 6 nm
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DISCUSSION
The observed temperature effect on the dust particle formation can show that this phenomenon is close to the homogeneous nucleation and growth of nanocrystallites in a supersaturated medium (gas or liquide).
See for example:
1- J. B. Anderson et al, J. Atm. Sci., 33, 822, 1976.
2- S. Auer and D. Frenkel, Nature Vol. 409, 1020, 2001.
3- P. Peeters et al, J. Chem. Phys., 12, 5647, 2002.
4- J. W. P. Schmelzer, Mater. Phys. Mech., 6, 21, 2003.
In our experiments, we are operating at very low silane dilution in argon. However, the induction of nucleation seeds could change the conditions.
−3SiH
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DISCUSSION
⎥⎦
⎤⎢⎣
⎡ Δ−=
TkGJJB
exp0
In this case the nucleation rate is given by
ΔG is the free energy variation during the phase transition or the required energy to form a nanocrystallite and the kinetics prefactor J0 is related to
- the number of nucleation centers (seeds) which are for us the number of negative ions , and
-the number of formed nanocristallites
−3SiH
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DISCUSSION
The free energy variation ΔG between the two phases can be expressed as follow:
with:
na the number of atoms in the nanocristallites,
Δµ is the difference of the chemical potentials per mole or particles in both phases,
σ is the surface tension on the nanocrystallites and
A their area.
AnG a σµ +Δ−=Δ
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The critical radius of the nanocrystallites corresponds to the maximum of ΔG and is given by
rc increases when T decreases.
µσΔ
=c
c nr 2
DISCUSSION
Therefore if we decrease the gas temperature we can grow up bigger nanocrystallites.
rc1, T1
rc2, T2 T1 > T2
r
ΔG
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Results 200 nm
240 260 280 300 320 340 360 3800
5
10
15
20
25
30
35
40
45
Gas temperature (K)
Nan
ocry
stal
rad
ius
(nm
)
T= -40°C r = 40 nm
T= 0°C r = 3 nm T= 25°C
r = 1.5 nm T= 100°C r = 0.9 nm
Tgas = -40°C Akn
owle
gem
ent
: A
nnie
Ric
hard
Nanocrystal radius reaches 40 nm
for Tgas = -40°C
0TTArnc −
=
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APPLICATIONS
NANOTECHNOLOGIES CAN BRING SOLUTIONS IN MANY DOMAINES SUCH AS:
- Energy production and storage - Reduction of the size and energy consumption of
nanoelectronique components - Production and storage of Hydrogen - Water cleaning - Solution for the actual diseases (cancer etc…) - Biomedical applications - …..
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NANOSTRUCTURED THIN LAYERS
WIDE RANGE OF APPLICATIONS Chemistry : nanocatalysts synthesis, specific area 100 m2/g for 100 nm size particles. Mechanics : super-hard coatings (ceramic or metallic particles or CNT’s included in amorphous or polymer matrixes). Photoluminescente devices : the wavelength is size dependent. Optoelectronics: silicon nanocrystallites based sensors for UV radiations detection for example. Solar cells : Polymorphous silicon based cells (higher and stable efficiency vs a-Si:H New lasers : Silicon based lasers. Relatively important optical gain has been obtained in nanostructured SiO2. A challenge for silicon
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Nanocrystalline silicon particle
(HRTEM )
2 nm
4 nm 15 nm
Coagulation
1 Å 1 nm 10 nm 0.1 m µ 1 m µ
Atoms Molecules Radicals
Powders
Strategy for film deposition : optimizing nanoparticles contribution and avoiding powder formation
POLYMORPHOUS SILICON THIN LAYERS
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Al
n(a-Si:H)Buffer a-Si:HBuffer a-SiC:H
pm-Si:H
p(a-SiC:H)
SnO2Glass
PIN solar cells
Higher efficiency and stability compared to a-Si:H
Accelerated ligth-soaking tests
0
2
4
6
8
10
12
1 10 100 1000 104 105
pm-Si:H 750 nma-Si:H 500 nmpm-Si:H 400 nm
Eff
icie
ncy
(%)
Time (s)
Accelerated ligth-soaking tests
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SAED analysis. ns-Si:H; Ton=5s, 100°C
FCC structure, a= 0.365 nm.
The arrows point out also Diamond like diffraction spots
Sample ring dhkl hkl a (Å) Space group
1 2,11 111 3.659
2 1,83 200 3.654
3 1,29 220 3.649
4 1,10 311 3.640
5 1,05 222 3.625
6 0,84 331 3.647
ns-Si:H
7 0,81 420 3.616
FCC
Fm3m (225)
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Sample PLASER Parameters Size and volume fraction(kW/cm2)
Δω(cm-1)
W(cm-1)
XC(%)
DZ(nm)
ns-Si:H 0.34 8.1 17.8 20.1 2.85
Micro-Raman analysis
Δω is the Raman peak shift related to the crystallite size;
W is the peak width.
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SINGLE-ELECTRON DEVICES
Requirements : devices operating at room temperature.
-nanocrystallites (quantum dots) of 2-5 nm
-concentration of 1011 to 1012 cm-2
A. Dutta et al, Jpn. J. Appl. Phys. 39, 264-267 (2000).
S. Oda, Tokyo Insitute of Technology, Japan
T. Baron et al, Applied Surface Science 164, 29-34 (2000)
In general the crystallites are deposi ted us ing LPCVD. They have a dome like shape.
Transistor
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OTHER CHALLENGES
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YEAR 2000 2003 2006 2009 2012 Memory 1G 4G 16G 64G 256G Feature size, nm 180 130 100 70 50 Dkiller particle, nm 60 43 33 23 17
Source: National Technology Roadmap for Semiconductors Workshop, 2004
http://www.itrs.net
Size of “killer particles” is rapidly shrinking into the nano-regime
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FUSION PLASMA CONTAMINATION
Wall erosion Impurities in the plasma Radio-toxicity of dust particles
J. Winter, Phys. Plasmas 7, 3862 (2000)
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• Difficulty - Powder formation; - Flaking of the deposited layers on the walls during the plasma phases.
TOKAMAKS CONTAMINATION
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SAFETY AND HEALTH CARE ISSUES
There is a lack of regulation codes in the area of nanoparticles manipulation and working conditions
Also due to their size nanoparticles can remain hours in levitation in air at atmospheric pressure.
They can also penetrate and accumulate deeply in human tissues.
This require the development of robust tools for the detection, metrology and chemical and morphological properties
characterization of the nanoparticles.
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The particle size and concentration cannot be measured using light scattering
due to the very small scattering cross section.
Development of method based on the analysis of the modification of the plasma and discharge properties induced by the
presence of the nanoparticles.
Chemical composition can be analyzed using LIBS
SAFETY AND HEALTH CARE ISSUES
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DUST PARTICLE MORPHOLOGY CHARACTERIZATION USING SAXS AND WAXS
SAFETY AND HEALTH CARE ISSUES
MORPHOLOGY ANALYSIS
From this kind of measurements w e c a n d e d u c e t h e s i z e distribution functions and also the form and the surface properties of the dust particles.
J. B. A. Mitchell et al J. Appl. Phys. 100, 124918 2006
Asbestos for example has no chemical reactivity but has
fibber morphology.
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CONCLUSIONS
• Dusty or complex plasmas are a rather new research field in physics with new aspects. It is still in development.
• Step-wise dust particle formation mechanisms; new theoretical models for carbon and silicon chemistries.
• Many new applications have been developed, others are underway.
• Connection between different communities. • Many challenges
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Nébuleuse du crabe (objet Messier 1) Image OPIO , mont Mégantic,2000
Évolution après explosion (1054) d’une étoile géante
Hubble Space Telescope Nov. 21, 1995
The photograph shows three bright ring features: the F Ring, the Cassini Division, and the C Ring
(moving from the outer rings to the inner).
Thank you