challenges of ald/cvd precursor development
TRANSCRIPT
Progress and Challenges of
ALD/CVD Precursor Development
Wonyong Koh
linkedin.com/in/wonyong-koh-5652844
Korea CGMG Workshop 2017
Agenda
• Brief History of CVD/ALD
Metal-Organic Precursors
• Precursor Development Challenges:
Business Model Problem
• Summary
Korea CGMG Workshop 2017
Disclaimer
• The opinions expressed in this presentation and
on the following slides are solely those of the
presenter.
Korea CGMG Workshop 2017
Metal-Organic CVD Precursor R&D In ‘90s
Korea CGMG Workshop 2017
Cu CVD Precursors were Hot in ‘90s
Since IBM Announced Cu Chip in 1997
• Cu CVD was tested by many device makers other than IBM, however, electroplating (IBM’s choice) has been used to manufacture Cu chips.
Korea CGMG Workshop 2017
Metal Oxide Precursors R&D in ‘90s
Korea CGMG Workshop 2017
Many Precursors Developed, However, Not
Used for Semiconductor Manufacturing (1)
• Ba, Sr, Ta, Nb precursors for high-k
dielectric, ferroelectric oxide, etc.
– Metal β-diketonates
(Most are solid.)
– Metal alkoxides
• CupraSelect® for Cu metal CVD
– (hfac)Cu(vtms)
Korea CGMG Workshop 2017
Many Precursors Developed, However, Not
Used for Semiconductor Manufacturing (2)
• Al precursors for Al metal CVD
1. H3Al·NMe3 (solid)
2. H3Al·NMe2Et (liquid)
3. H3Al·(NMP) (liquid)
Thermal Stability
is less than
manufacturable.
Korea CGMG Workshop 2017
Success Stories Seldom Happen (1)
1st high-k Precursor for DRAM
• Trimethylaluminum (TMA) for Al2O3 ALD
film for DRAM high-k dielectric layer
+ O3 Al2O3 film
Korea CGMG Workshop 2017
Success Stories Seldom Happen (2)
2nd & 3rd high-k Precursors for DRAM
• Tetrakis(ethylmethylamido)hafnium (TEMAH) for
HfO2 and tetrakis(ethylmethylamido)zirconium
(TEMAZ) for ZrO2 ALD film for DRAM high-k
dielectric layer
+ O3 ZrO2 film
Korea CGMG Workshop 2017
Semiconductor industry needs
new ALD/CVD precursors
continuously. M. McSwiney (Intel) et al. ALD 2013 Workshop
Korea CGMG Workshop 2017
Precursors are easy to order!
But, it is difficult to meet all the requirements! M. McSwiney (Intel) et al. ALD 2013 Workshop
Korea CGMG Workshop 2017
MANY Precursor Candidates with Various
Metals and Ligands
Limited, still vast possible combinations of metals & ligands!
One good precursor out of HOW MANY candidates?
Korea CGMG Workshop 2017
Drug vs. Precursor Development
1 Successful Precursor
Unit Process Development
Process Integration
Precursor Discovery &
Development-Timeline
A few compounds a dozen or so compounds
Hundreds of compounds
Precursor Discovery
Korea CGMG Workshop 2017
Precursor Makers Have Limited Control
One drug company drives the whole process
(except the initial discovery stage).
1 Successful Precursor
Process Integration Unit Process Development
Precursor Discovery
Under Precursor Maker’s Control
Under Equipment Maker’s Control
Under Device Maker’s Control
What is needed is not the precursor, but film or process result.
Korea CGMG Workshop 2017
Original Drug Is NOT the Only Drug Business
Korea CGMG Workshop 2017
Original vs. Generic Drug Business Model
Original Drug Generic Drug
High risk, high return Low risk, low return
R&D intensive Manufacturing competency
Little competition
by IP protection Competition by price
Drug price ⨠ manufacturing cost Drug price > manufacturing cost
Korea CGMG Workshop 2017
Original vs. Generic Precursors
Who will develop original precursors,
if they can be copied easily by generic makers?
Korea CGMG Workshop 2017
Challenges To Precursor Makers
• No direct access to actual process (which are under equipment and device makers’ control) Unable to determine which precursor is the best.
• Less chance of academic collaboration Only a few academic groups are working on precursor R&D worldwide now.
• Very low Success Rate Few successful precursors out of vast number of candidates.
• Increasing cost for chemical safety There needs to be a way to share the burden.
• Little room for IP protection
– It is obvious now to form a metal-containing film using a volatile metal-containing molecule.
– Product (new precursor molecule) patents are preferable.
Method (process) patents are less useful.
Korea CGMG Workshop 2017
Conundrum : Business Model
• A LOT MORE semiconductor devices will be needed for
self-driving cars, IoT devices, etc., which collect, process,
transmit, and store data.
• A LOT MORE precursors will be used, therefore.
• Will the precursor market diverge?
– Generic precursors market
– High-value original precursors market (for ≤1X nm devices)
• Can original precursor developers get ROI?
• Who will survive?
• Can consolidation be a way out?
Korea CGMG Workshop 2017
Original vs. Generic Precursor Business Model
Original Precursor Generic Precursor
High risk (O)
high return (?) Low risk, low return
R&D intensive Manufacturing competency
Little competition
by IP protection (?) Competition by price and quality
price ⨠ manufacturing cost (?) price > manufacturing cost
Confidential
Korea CGMG Workshop 2017
Summary
• Hard problems can only solved through collaboration of semiconductor precursor, equipment, and device makers.
• There needs to be a way to share burden among participants. (Precursor makers may share safety-related cost. It can make the industry more cost-effective.)
• Precursor makers need business model for ROI.