chapter 7 ti/tio electrode prepared by anodizing method...
TRANSCRIPT
143
CHAPTER 7
Ti/TiO2 ELECTRODE PREPARED BY ANODIZING METHOD
7.1 Introduction
The properties of metal oxide surfaces play an important role in the kinetics of
electrochemical reactions on passive electrodes. The desire to enhance the electrocatalytic
properties of passive electrode surfaces motivates research into developing understanding
of the crystallographic and the phase formation of the oxide crystal of the films. The
fixation of TiO2 onto a substrate is very important and some methods to fix the TiO2
particles have been developed. Many deposition methods have been employed in the
literature to fix the oxide film on the substrate such as thermal oxidation of titanium,
electron beam evaporation, chemical vapor deposition, plasma enhanced chemical vapor
deposition, reactive sputtering, sol-gel, spray pyrolysis etc have been reported to prepare
nanometer-sized particle powder or thin films on titanium substrate [1]. Among such
deposition methods anodization represents a simple and low cost method to synthesis
TiO2 by electrochemical oxidation on the surface of a metallic Ti substrate. Previously,
production of anodized titania has usually been associated with a decoration process,
where colours are generated by an interference effect caused by the thickness of the film.
Cavities and pores allow passage of ions through the oxide film [1]. Recently, Paulose
and co-workers have prepared TiO2 by maximizing the electrochemical oxidation and
controlling the chemical dissolution by reducing the amount of water in their electrolytes
[2]. A number of theories, based on field-enhanced dissolution [3, 4] and localised
acidification at the base of the pores which increases chemical dissolution [5, 6] have
been proposed to explain aspects of the growth mechanism leading to the growth of
particles. The approach of anodic oxidation to form porous titanium oxide films of
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controllable pore size, good uniformity and conformability over large areas at low cost
constitutes a great challenge.
Anodic oxidation of titanium metal in acidic solution by applying electric current
between a Ti electrode and a counter electrode is an effective process to prepare a TiO2
film. The thickness and morphology of such TiO2 films can be easily controlled by
regulating electrical potential/current or chemical composition of electrolyte solution.
The high voltage anodization process has been intensively studied and applied to prepare
the crystallized TiO2 films without any thermal treatment [7, 5]. However, these anodized
TiO2 films usually have a detached hole structure at a scale of micrometers, resulting
from a violent electrolyzing oxidation reaction at a high anode-cathode voltage (usually
above 160v) far beyond a sparking discharge voltage (about 100v) [8, 9]. This present
study aims at developing a low voltage anodization process to prepare some well-
crystallized Ti/TiO2 films with a smaller pore size. We had carried out a low cost route
for the preparation of Ti/TiO2 electrodes by low voltage anodizing method. Aodization of
titanium substrate at different current density, temperature and time was carried out as per
details given in Table: 3.2 in chapter 3. The prepared electrodes were subjected to surface
morphology studies and phase study of TiO2 on titanium substrate by Scanning Electron
Microscopy (SEM) and X-Ray Diffraction (XRD). Based on these studies, the electrode
prepared at 60°C, current density 10mA/dm2 with 30 minutes time was chosen for further
corrosion studies and cyclic voltammetric studies. For the preparative electrolysis
titanium mesh was used to prepare Ti/TiO2 electrode by the same procedure. The aim of
this work is to provide further insight into the structure of anodized TiO2 films, using
information provided by SEM and XRD.
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7.2 Surface morphology by SEM Analysis
SEM Micrographs for TiO2 films prepared at different temperatures, current
densities and time are given in Fig: 7.1 A&B. The figure shows the micrographs of
Ti/TiO2 electrodes by anodizing method at different current densities, temperature and
time. It is observed that specimen ‘b’ is similar to the pretreated Ti (Fig: 7.1 A, a) at room
temperature and at 10 mA/cm2 that the TiO2 film was not formed properly. By increasing
the temperature but with same current density and time interval the formation of TiO2
with a round pattern on the surface of the specimen can be detected (Fig: 7.1 A&B, c, d, h).
This is probably due to increase in temperature and the formation of secondary clusters
from the agglomeration of primary particles was observed. SEM micrograph (Fig: 7.1 B, f)
shows that TiO2 film was formed with a multiporous structure on titanium substrate. The
size of the particles was found to in the range of 113-261nm. These results demonstrate
that the specimen ‘f’ which was prepared at 600C 10 mA/cm2 with the time interval of 30
minutes as anodization time, produced much uniform TiO2 film than other micrographs,
which means the growth of TiO2 film can be well controlled by temperature and time.
These findings are in agreement with others research (10). It is generally believed that a
heterogeneous electrocatalytic reaction in aqueous solution mainly occurs on the interface
of the solid catalysts and dissolved compound molecules. Furthermore electrocatalytic
reactivity of a well-crystallized TiO2 film mostly depends on its mass-transfer,
conducting efficiency and on the solid-liquid contacting area. Some research has
confirmed that the increase of TiO2 film thickness does not always lead to a
corresponding enhancement of electro activity once a TiO2 film reaches a certain
thickness (10). At 600C nanocrystalline porous TiO2 film formed. The primary particle
size of TiO2 film is calculated using Scherrer equation [11] from XRD peak position and
146
full width half maximum (FWHM). The crystallite size of the thin films can be
determined from broadening of corresponding XRD peaks by Scherer equation. The
particle size of the film TiO2 obtained from SEM studies and the nature of the film are
tabulated in Table: 7.1.
Table: 7.1 Characterization of surface layers of TiO2 film prepared by anodization
Temparature (°C)
Current Density
(mA/cm2)
Time (Minutes)
Surface Thickness
(nm) Crystallinity
30 10 30 - No particle
40 10 30 - Amorphous
50 10 30 - Crystalline
60 10 30 - Crystalline
60 10 45 - Crystalline
60 12 30 - Crystalline
70 10 30 172,202,254 Crystalline
Porous TiO2 can be formed at higher potentials [12, 13] due to the breakdown of
the oxide. (Fig: 7.1 B, e, f, g) show tubular structures of TiO2 on titanium substrate but
may not be well defined tubes. (Fig: 7.1 B, e) where the condition of the preparation was
at 600C, 10mA/cm2 (45 minutes) and more of tubular structures formed, by reducing the
anodization time (Fig: 7.1 B, f). But at the same temperature and current, tubular
structure reduced and by increasing the temperature (Fig: 7.1 B, g) agglomeration of TiO2
particles had taken place and thereby increasing the particle size.
147
(a) (b)
(c) (d)
Fig: 7.1 A SEM Micrographs for a) Titanium substrate and of TiO2 films on
titanium prepared by anodization at 10 mA/cm2 for 45 minutes at
b) 300C, c) 400C, d) 500C
148
(e) (f)
(g) (h)
Fig: 7.1 B SEM Micrographs of TiO2 films on titanium prepared by anodization at
10 mA/cm2 for 45 minutes at e) 600C, f) 600C at 10 mA/cm2 for
30 minutes, at 12 mA/cm2 for 45 minutes at g) 600C, h) 700C
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7.3 Microstructure analysis of Ti/TiO2 by X-Ray diffraction
XRD data has taken for the sample at different temperatures and at different
current densities and time by anodizing method are given in Fig: 7.2. The particle size
calculated using Debye-Scherer equation is tabulated in Table: 7.2. XRD results show
that the prepared TiO2 electrode is in good agreement with standard rutile type.
From the XRD data the microstructure of the electrode explains the effect of
temperature, current density and anodization time. Tang et al [14] measured the conductivity of
TiO2 films in both anatase and rutile phases, prepared by sputtering, and showed that anatase
films are more conductive than rutile films, irrespective of the preparation condition. As the
temperature increased keeping the current density the same and at less anodizing time (Fig: 7.2
B e) shows more of rutile phase formation. During the anodic oxidation of titanium, because of
quick cooling effects of the electrolyte a certain amount of amorphous TiO2 may be formed in
the film except for the formation of rutile TiO2. Increase in current density has led to the
formation of more of rutile TiO2. Besides the characteristics different peaks corresponding to
titanium substrate also appeared in the patterns because the film is thin and porous [15].
Tianium and rutile TiO2 are represented as T, R in Fig: 7.2.
To determine the crystallinity of the TiO2 films, the XRD patterns of the TiO2
thin films anodized at different current density, temperature and anodization time are
compared and analyzed. At low temperature and current density crystallization was less
but as the temperature increased both anatase and rutile phases appeared on the film
which indicates the formation of fine crystallites in the film (Fig: 7.2 A. b, c). As the
temperature further increased the phase transition of anatase as well as amorphous and
rutile been observed [Fig: 7.2 (A. d), (B. e, f, g].
150
f)
g) Ti
RA
TiR
Ti
20 40 60 80
Intens
ity (a
.u.)
2Θ (deg)
e)
R
R
RRA
TiR Ti
B
A
Fig: 7.2-A X-Ray diffractograms of TiO2 films prepared by anodization at 10
mA/cm2 for 45 minutes at a) 300C, b) 400C, c) 500C, d) 600C
Fig: 7.2-B. X-Ray diffractograms of TiO2 films prepared by anodization at 10 mA/cm2 at
e) 600Cfor 30minutes, And at 12 mA/cm2 for 45 minutes at f) 600C, g) 700C
20 40 60 80
Intens
ity (a
.u.)
2Θ (deg)
a)
b)
c)
A
d)
Ti
ARTiTiR
Ti
151
The process of formation of anodic oxide appears rather complex, yet a general
and simplified model of the chemistry involved is required to understand the process. The
outer anodic layer (partly exposed to the electrolyte) has an excess of hydroxyl ions
compared to the inner layer [16], and is considered to be Ti(OH)4. The inner layer, where
the de-hydroxylation of the film (water releasing) has occurred, is represented as TiO2. In
reality there is likely to be a concentration gradient across the film, which can be written
as TiO2.xH2O, to represent the inner (dry) and outer (hydrated) anodic oxide. The
reactions which occur at the anode are:
(i) oxidation of the metal which releases Ti4+ ions and electrons,
2Ti 2Ti4+ + 8e ¯ (Eq. 1)
(ii) combination of Ti4+ ions with OH¯ and O2– species provided by the water.
Equations (2) and (3) given below account for the hydrated anodic layer and the
oxide layer.
Further oxide is produced when the hydrated anodic layer releases water by a
condensation reaction, Eq. (4):
Ti4+ + 4OH¯ Ti(OH)4 (Eq. 2)
Ti4+ + 2O2- TiO2 (Eq. 3)
Ti(OH)4 TiO2 + 2H2O (Eq. 4)
At the cathode there is hydrogen evolution,
8H + + 8e¯ 4H2 (Eq. 5)
152
By summing the equations from (1) to (5), the overall process of oxide formation is
given:
Ti + + 2H2O TiO2 + 2H2 (Eq. 6)
The generation of oxygen at the anode, Eq. (7), has been previously reported as a
side reaction during the growth of barrier layer [17] and nano-tubular anodic titania [18]
2H2O O2 + 4e¯ + 4H+ (Eq. 7)
By anodization method the deposition of titanium dioxide on the titanium
substrate contains mostly of rutile phase of TiO2. But at very low temperature [Fig: 7.2 A. a]
more rutile and one peak corresponding to anatase phase appeared and the TiO2 film
appeared to be of having amorphous TiO2. As the temperature increased from 30 to 400C,
amorphous to rutile phase transfer occurred. The same results were observed in the XRD
pattern of the electrodes prepared at 400C, 500C and 600C at same current density and the
same anodization time. (Fig: 7.2. A: b, c, d).
The electrode prepared at 600C (Fig: 7.2 B. e) at the same current density but
reducing the anodization time more of rutile phase peaks and few characteristic peak of
anatase phase are also obtained (2θ = 25, 38, 45). This infers that by reducing the
anodization time phase transformation of anatase from amorphous occurred. But
increasing the current density and temperature (Fig: 7.2. B. f, g) show only rutile phase
and this may be due to anatase phase being unstable there might be the transformation of
anatase phase to rutile. Size of the crystal grain of anatase and rutile TiO2 in the film
catalysts calculated using Scherrer equation is tabulated in Table: 7.2.
153
Table: 7.2 Size of the crystal grain of anatase and rutile TiO2 in the film catalysts.
Preparation conditions Anatase Rutile
Current density
(mA/dm2)
Temperature (°C)
Time
(mts) 2θ (ο)
Full Width at Half
Maximum
(FWHM)
Grain Size (nm)
2θ (ο)
Full Width at Half
Maximum
(FWHM)
Grain Size (nm)
10 30 45 39.36 0.4297 185 69.89 0.6337 126
10 40 45 - - - 38.41 0.4349 183
10 50 45 - - - 37.87 0.4149 191
10 60 45 - - - 38.24 0.6167 129
10 60 30 39.79 0.2906 273 27,28 0.2628 302
12 60 45 - - - 38.01 0.4468 178
12 70 45 - - - 38.10 0.5726 138
Rutile phase is the most stable phase of titanium dioxide. On heating anatase, it
transforms irreversibly into rutile. The temperature at which the transformation takes
place varies from 400 to 1,0000C depending on the concentration of impurities in the
crystals or annealing atmosphere [19]. But an anatase phase of titanium dioxide has
higher electrocatalytic activity than rutile phase and the charge carrier in anatase thin film
[20] has higher mobility than that of rutile phase.
154
7.4 Corrosion studies
7.4.1 Tafel polarization technique
The Tafel polarization curves obtained for the electrode Ti/TiO2 prepared by
anodization method at 10 mAcm2 for 30 minutes at 60°C and titanium substrate are given
in Fig: 7.3, 7.4 and also the passivation graphs for the same are given in Fig: 7.5 and 7.6.
The various parameters calculated from Tafel technique are given in Table: 7.3.
Corrosion of the coating is influenced by several parameters, the most important being
thickness, porosity, presence of self-healing pores and high thickness, tend to increase the
corrosion resistance of the coatings. When TiO2 coating by anodizing titanium substrate
exposed in 0.1M H2SO4 shows corrosion resistance compared to the uncoated but the
difference is not much.
A thin and dense layer of TiO2 is always present on the surface of titanium, acting
as an anticorrosive film. The thickness of the film is proportional to the applied voltage
and the rate of corrosion declines as the applied voltage increases; however, gas escapes
and titanium becomes heated when the applied voltage is excessive, increasing the
corrosion rate [21]. The corrosion potential (Ecorr) and corrosion rate for the coated and
uncoated were calculated from Tafel polarization curves (Fig: 7.3, 7.4) and are reported
in Table: 7.3. The corrosion potential of the coated one had the negative shift, confirming
the cathodic protective nature of the coating.
155
Table: 7.3 Results obtained from Tafel polarization techniques
System studied
Passivation Range
(mA)
Ecorr
(mv vs SCE) Ip (A) CR (mmpy)
Ti/TiO2 (-0.6061) to (+0.3329) -0.731 -2.6374 11.858
Titanium (0.0955) to (+0.9943) -0.556 -2.8173 1.3
Fig: 7.3 Tafel polarization plot of Ti/TiO2 electrode in 0.1M H2SO4 prepared by
anodization at 10 mA/cm2, 600C for 30 minutes
Fig: 7.4 Tafel polarization plot of titanium substrate 0.1M H2SO4
156
Fig: 7.5 Passivation plot of Ti/TiO2 electrode in 0.1M H2SO4 prepared by
anodization at 10 mA/cm2, 600C for 30 minutes
Fig: 7.6 Passivation plot of titanium substrate in 0.1M H2SO4
157
7.4.2 Electrochemical impedance spectroscopic studies
The AC- impedance curves obtained for the electrode Ti/TiO2 and titanium
substrate are given in Fig: 7.7, 7.8 and the various parameters calculated from this
technique are given in Table: 7.4.
Table: 7.4 Results obtained from electrochemical impedance spectroscopy techniques
System Studied Phase Angle (θ) Rct (Ω) RF(Ω) Icorr (mA/cm2)
Ti/TiO2 15 001 0.200 13.1852
Titanium 14 1.1 - 11.85
The charge transfer resistance, (Rct), The film resistance (Rf) corrosion current
(Icorr) corrosion rate (mmpy) and phase angle for electrode and titanium substrate in 0.1M
H2SO4 were calculated from Nyquist plots (Fig: 7.7, 7.8) are reported in Table: 7.4. The
results indicate that the corrosion resistance of the TiO2 film on titanium substrate had
been improved to small extent after anodizing. This slight improvement towards
corrosion resistance may be due to to the number of larger pores in the film and therefore
the rate of corrosion improved slightly and also as the particle size increases which will
lead to decreasing of electron transition and rate of electrochemical reactions and
adhesion of coating will decrease TiO2 particle size grows. In the electrode subjected for
the corrosion studies, the particle size calculated from XRD data using Scherrer equation
is in the range of 126-302 nm. When thickness of coating grows up and also brittle ability
of the TiO2 particle coating will increase. Stress may be increased on the coating by
158
applying high voltage during anodization process which proceeds with cracks and defects
in final coating. Therefore presence of defects and cracks in coating will increase the
corrosion rate of the coating [22] and also corrosion rate can be counteracted by the
presence of the greater porosity and roughness [23-25].
From the Table: 7.4 it is found that the phase angle value obtained from the Fig:
7.7 is 15 and the range of values for phase angle from 40 to70 indicates that the
impedance has a significant contribution in the corrosion resistance properties of the
electrode TiO2 [26] compared to the uncoated titanium substrate (phase angle = 14)
shows slight improvement alone towards corrosion resistance. A decrease of the
maximum absolute value of phase angle of the electrode is attributed to the decrease of
the corrosion resistance of the metal [27-31].
Fig: 7.7 AC-Impedance spectroscopic plot of Ti/TiO2 electrode in 0.1M H2SO4
prepared by anodization at 10 mA/cm2, 600C for 30 minutes
159
Fig: 7.8 AC-Impedance plot of titanium substrate in 0.1M H2SO4
7.5 Cyclic voltammetric analysis of Ti/TiO2 in H2SO4
Cyclic voltammetric experiments were carried out using Ti/TiO2 electrode prepared by
anodization of titanium substrate at 10 mA/cm2, 600C for 30 minutes. Fig: 7.9 present the cyclic
voltammetric behavior of this electrode in 1.0 M H2SO4. Basically any anodizing process will
lead to a very thin film of the respective metal oxide. Hence the formed film on titanium is very
thin film of TiO2 on Ti. A redox oxide thin film contains uniformly distributed oxidizing and
reducing species on a planar electrode surface. In may be assumed to be compared of a number
of such uniform monolayers. Each layer the total concentration of redox species may be
assumed to be constant. The number of such layers would be a few to 20000. Hence the total
concentration of redox species in the complete film is also a constant. Ti/TiO2 electrode,
prepared by anodizing process, resulted in a very thin film which consists of few monolayers of
oxide of titanium. The concentration of reducing species present in these monolayers is very
low. Because of this, there was not much redox behavior noticed in cyclic voltammetry.
However, even with this low concentration of these species (Ti4+), cathodic and anodic peaks
were visible, which are coupled with hydrogen evolution.
160
-1.0E-04
0.0E+00
1.0E-04
2.0E-04
3.0E-04
4.0E-04
5.0E-04
6.0E-04
-0.8 -0.7 -0.6 -0.5 -0.4 -0.3 -0.2 -0.1 0.0
Cur
rent
(A)
Potential (V)
Fig: 7.9 Cyclic Voltammogram of Ti/TiO2 electrode in 1.0 M H2SO4 prepared by
anodization at 10 mA/cm2, 600C for 30 minutes
7.5.1 Cyclic voltammetric analysis of Ti/TiO2 in H2SO4 with fumaric acid
On adding fumaric acid to the electrode, a marginal increase in cathodic current
was noticed from the cyclic voltammograms presented in (Fig: 7.10 A – C). However, the
anodic peak current also marginally increased corresponding to the cathodic peak. The
approximate peak potential difference, which was noticed from (Fig: 7.10.C) shows that
the catalytic process is a reversible one. Building up higher thickness of the film may
yield a well defined peak, which could prove the reversibility of the electrode.
From the cyclic voltammetric studies, it is clear that the surface redox process
occurring in these electrodes are reversible. But because of the very thin film formed well
defined anodic and cathodic peaks are not formed. This is also proved by very low yield
efficiency in the preparative scale electrolysis.
161
-2.0E-04
-1.0E-04
0.0E+00
1.0E-04
2.0E-04
3.0E-04
4.0E-04
5.0E-04
6.0E-04
-0.8 -0.7 -0.6 -0.5 -0.4 -0.3 -0.2 -0.1 0.0
Cur
rent
(A)
Potential (V)
Fig: 7.10.A Cyclic voltammogram of Ti/TiO2 electrode in 1.0 M H2SO4 with 0.1mM
fumaric acid prepared by anodization at 10 mA/cm2, 600C for 30 minutes
-1.0E-04
0.0E+00
1.0E-04
2.0E-04
3.0E-04
4.0E-04
5.0E-04
6.0E-04
-0.8 -0.7 -0.6 -0.5 -0.4 -0.3 -0.2 -0.1 0.0
Cur
rent
(A)
Potential (V)
Fig: 7.10.B Cyclic voltammogram of Ti/TiO2 electrode in 1.0 M H2SO4 with 0.2mM
fumaric acid prepared by anodization at 10 mA/cm2, 600C for 30 minutes
162
-2.0E-04
-1.0E-04
0.0E+00
1.0E-04
2.0E-04
3.0E-04
4.0E-04
5.0E-04
6.0E-04
-0.8 -0.7 -0.6 -0.5 -0.4 -0.3 -0.2 -0.1 0.0
Cur
rent
(A)
Potential (V)
Fig: 7.10.C Cyclic voltammogram of Ti/TiO2 electrode in 1.0 M H2SO4 with 0.5mM
fumaric acid prepared by anodization at 10 mA/cm2, 600C for 30 minutes
7.6 Preparatory electrolysis
The results of the preparative electrolysis for the reduction of fumaric to succinic
acid are summarized in Table: 7.5. The concentration of sulfuric acid is 1M. Fumaric acid
gets reduced to succinic acid at low current densities. The maximum percentage yield of
succinic acid obtained is 15% at 4.0 A/dm2 at 650C. At 1-5 A/dm2 the percentage yield is
very low but at 650C the yield is 15%. The electrolyte temperature has been varied from
45-750C. The attempt to get more yields by increasing the bath temperature also ended up
in getting only 15 % (Table: 7.5, Expt 9). Low yield was obtained using this electrode for
the reduction of fumaric acid to succinic acid.
163
The reason for low yield of succinic acid from fumaric acid using Ti/TiO2
prepared by anodizing method the TiO2 film resistance was low which was confirmed by
Tafel and AC-impedance spectroscopic studies. And the phase formation of TiO2 on
titanium was in rutile form which has less electrical conductivity than anatase phase.
Table: 7.5 Galvanostatic reduction of fumaric acid at a Ti/TiO2 electrode
Conditions: Amount of Fumaric acid taken : 10g
Electrolyte : 1M H2SO4
Anode : Stainless steel
Expt. No Current Density (A/dm2)
Temperature (0C)
Weight of Succinic Acid
(g)
Yield Efficiency (%)
1 1 55 0.17 1.7
2 2 55 0.25 2.5
3 3 55 0.69 6.9
4 4 55 0.89 8.9
5 5 55 0.86 8.6
6 4 45 0.15 1.5
7 4 55 0.89 8.9
8 4 65 1.50 15.0
9 4 75 1.50 15.0
164
7.7 Product analysis
The product succinic acid was isolated as it is given in chapter 4. The separated
crystals were subjected to the lH-NMR spectrum of the solid isolated in D2O. NMR
studies showed the result with a single sharp peak at 2.56 d corresponding to the four
protons of two methylene groups confirming the formation of succinic acid as the
exclusive product from the electro reduction of fumaric acid using Ti/TiO2.
7.8 Conclusion
The Ti/TiO2 electrode prepared by anodizing method at 600C, current density at
10 mA/cm2 and time 30 minutes, was uniform, having good porous structure and good
adhesion. Microstructure and morphology studies revealed that the electrodes having
crystalline TiO2 structure and resembles the rutile phase with (200) phase of TiO2.
Micrographs revealed the uniform crystallites spread over the entire surface with
minimum surface cracks.
The corrosion resistance of the Ti/TiO2 electrode is fairly good compared to Titanium
metal and this may be due to the uniform crystallite TiO2 present over the titanium metal.
However the electrodes have very low catalytic activity which was confirmed from the
cyclic voltammetric studies. It is clear from this study that the surface redox process
occurring in these electrodes are reversible. But because of the very thin film formed well
defined anodic and cathodic peaks are not formed. This is also proved by very low yield
efficiency in the preparative scale electrolysis.
165
7.9 References
1. Taveira. L.V, Maca´k .J.M, Tsuchiya. H, Dick. L.F.P, Schmuki. P, J Electrochem
Soc, B 152 (2005) 405.
2. Paulose. M, Shankar. K, Yoriya .S, Prakasam. H.E, Varghese.O.K, Mor.G.K,
Latempa. T.A, Fitzgerald, Grimes.C.A, J Phys Chem, B 110 (2006) 16179.
3. Zhao. J, Wang. X, Chen. R, Li. L, Solid State Commun, 134 (2005) 705.
4. Mor.G.K, Varghese.O.K, Paulose. M, Mukherjee. N, Grimes. C.A, J Mater Res, 18
(2003) 2588.
5. Choi. J, Wehrspohn. R.B, Lee. J, Go¨sele. U, Electrochim Acta, 49 (2004) 2645.
6. Macak. J.M, Tsuchiya. H, Schmuki. P, Angew Chem Int Ed, 44 (2005) 2100.
7. Beranek.R, Hildebrand.H and Schmuki.P Electrchem.Solid State Lett, 6 (2003)
B12.
8. Poznyak.S.K, Talapin.D.V and Kulak.A.I, J.Electroanal.Chem, 579 (2005) 299.
9. Sul.Y.T, Joansson.C.B, Jeong.Y and Albrektsson.T, Med.Eng.Phys, 23 (2001) 329.
10. Ravichandran.C, Noel.M, Anantharaman.P.N, J.Appl.Electrochemistry, 24 (1994)
1256-1261.
11. Cullity.B.D, Elements of X-Ray Diffraction (Addison Wesley Pub.Co.Notre Dam,
(1978) 127.
12. Yang BC, Uchida M, Kim Hm, Zhang Xd, Kokubo. T, Biomaterials, 25 (2004)
1003.
13. Sul. Y.T, Johanson. C.B, Jeong. Y, Albrektsson. T, J Mater Phys, 23 (2001) 329.
166
14. Tang.H, Prasad.K, Sunjines.R.P, Schmid.P.E and Evy.F, J.Appl.Phys,75 (1994)
2042.
15. Yao Zhongping, Jiang Yanli, Jiang Zhaohua, Zhu Hongkui, and Bai Xuefeng, Rare
Metals, 28 No 5 (Oct 2009) 428.
16. Taveira. L.V, Maca´k .J.M, Tsuchiya. H, Dick.L.F.P, Schmuki. P, J Electrochem
Soc, B 145 (2006) 423.
17. Rahim M.A.A J Appl Electrochem, 25 (1995) 881.
18. Paulose. M, Shankar. K, Yoriya .S, Prakasam .H.E, Varghese. O.K, Mor. G.K,
Latempa. T.A, Fitzgerald.A, Grimes. C.A, J Phys Chem, B 110 (2006) 16179.
19. Shannon.R.D, Pask.J.A, J.Am.Ceram.Soc, 48 (1965) 391.
20. Maruska.H.P, Ghosh.A.K, Sol.Energy, 20 (1965) 493.
21. Chien-Chon Chen, Jung-Hsuan Chen, Chuen-Guang Chao, J of Material science,
40 (2005) 4053.
22. Rozenfeld.I.C, Corrosion inhibitors, Mc Graw- Hill, International Book Company,
part 2, chapter 5 (1981)145.
23. Shanaghi.A, Sabour.A.R, Shahrabi.T and Aliofkhazraee.M, Protection of Metals
and Phy.Chemistry of Surfaces, 45 No.3 (2009) 305.
24. Mcpherson. R, Surf.Coat.Technol, 39/40 (1989) 173.
25. Song .Y, Lee.I, Lee.D.Y, Kim.D, Kim.S and Lee.K, Mater.Sci & Eng, A 332 (2002) 129.
26. Li.I, Wang.X.Y, .Wei.G, Vaidya.A, Zhang.A and Sampath.S, Thin Solid films, 468
(2004)113.
167
27. Ping Gu, Yan Fu, Pig Xie, J.J. Deaudoin, Characterestics of surface corrosion of
reinforcing steel in cement paste by low frequency impedance spectroscopy,
Cement and Concrete Research, 24, No 2 (1994) 231.
28. Mansfeld.F & Shih.H, “Detection of pittig with electrochemical impedance
spectroscopy, J. Electrchem Soc, 135, No 4 (1988) 1171.
29. Shih.H & Mansfeld.F, A pittig procedure for impedance spectroscopy obtained for
cases of localized corrosion, 45, No 8 (1989) 610.
30. Mannnsfeld.F, Lin.S. Kim.S & Shih.H, Corrosion protection of Al alloys & Al based
metal matrix composites by chemical passivation, corrosion, 45, No.8 (1989) 615.
31. Macdonald.D.D, Tantawry.Y.A.EI, Rocha.R.C, Filho, M.Urquidi Macdonald
Evaluation of Electrochemical impedance techniques for detecting corrosion on
rebar in reinforced concrete, SHRP-10/UFR-91-524, Strategic highway research
programme report, National Research Council Washington, DC 1994.