complimentary metal oxide semiconductor (cmos)
TRANSCRIPT
TMEC R&D Present &
Beyond
Complimentary Metal Oxide Semiconductor (CMOS)
This type of products includes all circuits
that are made from CMOS silicon. This
kind of circuit has been widely used to the
extent where we can say that 90 percent of
the manufactured semiconductor circuits in
the industry are appliances or circuits that
consist of CMOS silicon. A CMOS circuit
consists of PMOS and NMOS.
The industrial production of CMOS silicon
circuits with the track the size of which is 0.8
micron can be counted as a successful step of
TMEC. Although the current technology in the
world has enabled the production of the circuit
with the track the size of which is 65
nanometers, the foundation of the production of
the two types of circuits is the same. The
aspects that differentiate the production of the
65-nanometer tracked circuit from the other are
the complication of the creation of the tracks;
the gap between the two lines which is smaller;
and the new chemical substances, such as metal
gate, used in the production.
TMEC offers IC design and small
volume wafer fabrication service. TMEC
facilities are:
• Design softwares: EDA tools including
Cadence IC design environment,
Tanner EDA tools, and Xilinx ISE
Foundation
• Process and device simulation software:
Sentaurus TCAD tools
• 150mm silicon wafer production line
for 0.5 µm CMOS technology
• Mask making facilities
• Measurement and analysis tools