component technologies for automotive sofc · 2016-02-05 · 3 and lacro 3 as dbl materials show...
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproduced without prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Component Technologies for Automotive SOFC
K.Rissbacher / PLANSEE SE
A3PS conference / TECHGATE Vienna
Vienna, October 16, 2009
Seite 1
This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
SOFC-APU for automotive applicationsAn (automotive) revolution
takes it course
Seite 2
This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
PLANSEE GroupFacts & figures and its mission for the emerging SOFC marketPlansee Group is a private, family owned company
– Worldwide leading company in powder metallurgical materials and components
– 1.6 Bn € sales– 70 manufacturing sites worldwide– approx. 7.000 employees – Competence in mass production of
materials and components for automotive, electronic and lighting industries
Plansee contributes to the SOFC market by means of
– Development and manufacturing of high performance, powder metallurgical stack components
– Competitive stack performance through designed alloys based on powder metallurgy
– Cost effective production by means of net shape technologies and mass production competences
Leading metallic componentsupplier for SOFC stacks
Seite 3
This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
PLANSEE GroupCompany Headquarter in Reutte, Austria
Pilot fabrication of SOFC components
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Produktportfolio Brennstoffzelle
Passive components –Energy from the heart of the SOFC
Active components –Into the heart of the SOFC
MSC Zelle – Stationary
ITM / MSC Zelle Repeat unit -Automotive
CFY Interkonnektor
ITM Interkonnektor
PLANSEE Product Portfolio for SOFC - stacks
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Metal supported cell Gas separator and catalyst
for the electrochemical reaction
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Metal supported cell (MSC-cell) technology is the next step in SOFC
Cathode
ElectrolyteSupportAnode Anode Support
ElectrolyteCathode
Anode
Metall Support
CathodeElectrolyte
AnodeAnode
1G 2G 3G
Anode Support
Electrolyte SSZ
Cathode LSCF
Anode
CGO Reduced cost
Higher robustness
Higher reliability
Better performance
Lower Stack mnfct cost
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
PLANSEE SE - Facts and Figures
FeCr
YSZ/SSZ
LSCF CGO
YSZ/NiLSM/LSCR
MSC-cell Technology Roadmap at PLANSEE
SinteredMSC
Plasma-Sprayed MSC
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
PLANSEE SE - Facts and Figures
FeCr
YSZ/SSZ
LSCF
CGO
YSZ/Ni
LSM/LSCR
Metal Substrate– Long-term corrosion
stability– Adapted CTE– High porosity– Fine porous surface
Diffusion Barrier Layer (DBL)– High electronical
conductivity– Chemical stability– Adapted CTE
Functional cell layers– same requirements as in
other cell concepts
Set-up of PLANSEE MSC Special Requirements
MSC Product Development Requirements to a MSC concept
Cathode
Protective CoatingElectrolyte
AnodeDiffusion Barrier LayerMetal support
PLANSEE focuses the development on key technologies:
1. Porous metallic substrate
2. Diffusion barrier layers (DBL)
3. Functional cell layers (electrodes, electrolyte)
PLANSEE focuses the development on key technologies:
1. Porous metallic substrate
2. Diffusion barrier layers (DBL)
3. Functional cell layers (electrodes, electrolyte)
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
PLANSEE SE - Facts and Figures
Corrosion behavior in anode gas atmosphere at 800°CP/M ITMFe26Cr (Mo, Mn, Ti, Y2O3)
MSC Product Development Porous Metallic Substrate made of P/M ITM alloy
Low Al + Si content due to high purity P/M processing
Anode gas: H2-20% H2O
Enhanced life time of P/M ITM FeCr alloy in anode gas compared to I/M ferritic FeCr alloys due to:
– Lower oxidation rate constant
– 26 % instead of typical 22 % Cr
Porous ferritic P/M ITM alloys shows an adequate long-term oxidation stability
0,000
0,010
0,020
0,030
0,040
0,050
0,060
0 200 400 600 800 1000
Fe22Cr
ITM
Exposure time t [h]
Wei
ght G
ain
Δm
/A [m
g/cm
2 ]
P/M ITM
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Facts
Interdiffusion of Ni, Fe and Cr take place during cell operation
Cr and Fe in the Ni-phase of anode causes a significant reduction of catalytic activity
Ni in the FeCr-phase of substrate causes a decrease of corrosion stability and a significant increase of CTE
M. Brandner, PhD-Thesis, Ruhruniversität Bochum, 2006, Jül-Bericht 4238
Solution:
A Diffusion Barrier Layer (DBL) at substrate/anode-interface is needed
Interdiffusion of Ni, Cr and Fe at anode side
Metallicsubstrate
Anode Ni
Cr Fe
200 µm 20 µm
Fe, Cr, Mn-Oxide
Ni
MSC Product Development Diffusion Barrier Layer (DBL)
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
PLANSEE SE - Facts and Figures
PVD-DBL based on doped LaMnO3/LaCrO3-perovskites Facts
MSC Product Development Diffusion Barrier Layer (DBL)
DBL
ITM substrate
Physical Vapor Deposition (PVD) seems to be an adequate coating technology for the fabrication of DBL layers
Doped LaMnO3 and LaCrO3 as DBL materials show good barrier effect for Ni, Fe and Cr as well as its species
Chemical stability of doped LaMnO3 could be a problem under long-term operation conditions
PVD-DBL based on doped LaMnO3/LaCrO3-perovskites enables a long-term cell operation of MSC
Sample exposure in Air at 850°C, 1000 hrs.
DBL
ITMITM
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Facts
High kinetic energy and large plasma allows coating of thin and dense layer (10-50 µm)
Uniform coating thickness distribution on thin and larger substrates (repeat units) without any substrate deformation
Low gas leakage rates of electrolyte (< 10-3 mbar * l/(cm2 * s), He)
Heat management of substrate with online temperature monitoring
Source: Sulzer Metco, Wohlen
The LPPS-TF is applicable for large scale mass production with economical benefits
LPPS-TF Process for Electrolyte Fabrication
50µm
1st Gen MSC – IntroductionMSC Product Development Electrolyte layer via Plasma spraying
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Facts:
Improvement of micro structure of both electrodes by increasing the TPB (e.g. by using nano powders)
Use of improved plasma powders with better stoichiometry
Change to LSCF instead LSM for cathode fabrication
Decreasing of the cell leakage rate by improved electrolyte structures
Source: German Aerospace Center (DLR), Stuttgart
Performance Data MSC-cells at Button Cells level
1st Gen MSC – Latest results
Cell area: 12.56 cm2
Operating temperature: 800°C
Fuel gas: 0.5 slpm H2 and 0.5 slpm N2
Oxidizing gas: 2 slpm Air
Plasma spray technology provides a high performance MSC with small button cells
MSC Product Development Electrode and electroyte via Plasma spraying
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Facts
Cell up-scaling and integration into metal stamped light weight cassettes could be demonstrated successfully
Repeat units show a power density of 380 mW/cm2 and a FU of > 30 mol.%
By a systematic development operation with high FU (48 mol.%) with adequate performance could be demonstrated (280 mW/cm2)
Source: German Aerospace Center (DLR), Stuttgart
Performance data MSC-cell at Single Repeat Unit level
1st Gen MSC – Latest resultsMSC Product Development Electrode and electroyte via Plasma spraying
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Facts
Redox-cycleability could be improved significantly by novel anode structures
20 redox cycles with no degradation of OCV and low degradation of power density(< 2.5 %) is possible
The rate of oxidation and re-oxidation in each cycle was 100%
Source: German Aerospace Center (DLR), Stuttgart
Redox-cycleability of Button cells
1st Gen MSC – Latest results
Gen 1
Gen 2
Gen 3
The MSC- cell provides a high redox stability
MSC – cell RobustnessRedox-cycleability is a key advantage of MSC-cells
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
MSC- cell Cost AdvantageLow cost manufacturing of Repeat unit (Energy Chip) by means of Metal supported Cell (MSC-cell) Technology
Current manfacturing of Current manfacturing of Repeat unit: Repeat unit: Complex and expensive Complex and expensive integrationintegration
Future manufacturing of Repeat Future manufacturing of Repeat unit with MSCunit with MSC--Cells:Cells:Less components and cost effective Less components and cost effective integration integration
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Basic Requirements:
Operating Hours (I>0A): 12000 hOperating Hours (T>100°C): 36000 hDeep Thermal Cycles (T<100°C): 300 -Medium Themal Cycles (T>100°C): 3000 -RedOx Cycles @Operat. Temp (1) 30 -RedOx Cycles to Ambient Temp. (2) 5 -Heat up Time: 30 minMaximum electrical Power: 3000 WMinimum electrical Power: 300 WSulphur Tolerance US (fuel): 15 ppmMass: 100 kgVolume: 100 LAPU Costs (for Integrator): 2000 US$Stack Costs (for Integrator): 600 US$(1) knowingly introduced for oxidation of deposits (S, C)(2) System malfunction, shut down under oxygen environment
Summary:Requirements of Truck SOFC- APU can be best fulfilled by Metal supported cell (MSC-cell) Technology
Requirements for MSC-cell technology
Robustness of MSC cell– Redox-stable MSC cell– Capability of themal cycling
Fast heat up rate – Lowest weight for metallic interconnectors– Metal supported cell with low thermal resistivity– Lower temperture operation
High performance cell– Metal supported cell in same range as ASC cell
Low cost component– Metal supported cell– Integrated design of repeat unit
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This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Fertigungsroute – MSC-ZelleSummary:PLANSEE technologies as key to establish a superior solution for the Repeat „element“ of SOFC-APU stack.
FeCr YCFY powder
Fe Cr Y MoTi
ITM powder
CFY Interconnects ITM Interconnects MSC-Zelle
H2
Powderpressing
H2sintering
Coating
H2H2sintering
Hot/cold Rolling Stamping/Welding
+ +
++
Coating
H2H2sintering
Greentape
Coating
Joining
CFY- Stack
JoiningITM / MSC-Zelle/
Repeat „Element“
Joining
Fe Cr Y MoTi
ITM powder
X, Y Z
H2 H2 H2
ITM / MSC-Zelle/ Repeat „Element“
ITM-alloy composition
P/M processing technology
Electrochemical layer technology
Performance advantages of MSC-cell based Repeat element
Seite 19
This document is the property of PLANSEE SE and shall not be communicated to 3rd parties and/orreproducedwithout prior written agreement. Its contents shall not be disclosed. PLANSEE SE – © 2007
Three more argument for PLANSEE MSC-cell technology
Cost/Unit, Cost/Hour , Cost/CO²
Tel: +43 5672 600 2778
PLANSEE SE
A-6600 Reutte