compunetics, inc. 3/21/06 trace / space outers *current12 months24 months production engineering...

14
Compunetics, Inc. 3/21/06 Trace / Space Outers * Current 12 Months 24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035” 0.0012” / 0.0012” 0.0030” / 0.0035 0.0010” / 0.0010” Technology Road Map Trace / Space Inners * Current 12 Months 24 Months Production Engineering 0.0035” / 0.0035” 0.0015” / 0.0015” 0.0030” / 0.0030” 0.0012” / 0.0012” 0.0025” / 0.0030 0.0010” / 0.0010” Trace Width Tol. Inners* Current 12 Months 24 Months Production Engineering +/- 0.0005” +/- 0.0003” +/- 0.0004” +/- 0.00025” +/- 0.0003” +/- 0.0002” Controlled Impedance Tolerance * Current 12 Months 24 Months Production Engineering +/- 10% +/- 2% +/- 7% +/- 2% +/- 5% +/- 2% Imaging And Etching Imaging And Etching * Half Ounce Copper

Upload: edwin-woods

Post on 17-Jan-2016

216 views

Category:

Documents


0 download

TRANSCRIPT

Page 1: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Trace / Space Outers * Current 12 Months 24 Months

Production

Engineering

0.0040” / 0.0035”

0.0015” / 0.0015”

0.0035” / 0.0035”

0.0012” / 0.0012”0.0030” / 0.0035”

0.0010” / 0.0010”

Technology Road Map

Trace / Space Inners * Current 12 Months 24 Months

Production

Engineering

0.0035” / 0.0035”

0.0015” / 0.0015”

0.0030” / 0.0030”

0.0012” / 0.0012”0.0025” / 0.0030”

0.0010” / 0.0010”

Trace Width Tol. Inners* Current 12 Months 24 Months

Production

Engineering

+/- 0.0005”

+/- 0.0003”

+/- 0.0004”

+/- 0.00025”+/- 0.0003”

+/- 0.0002”

Controlled Impedance Tolerance * Current 12 Months 24 Months

Production

Engineering

+/- 10%

+/- 2%

+/- 7%

+/- 2%+/- 5%

+/- 2%

Imaging And EtchingImaging And Etching * Half Ounce Copper

Page 2: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Layer-to-Layer Registration Current 12 Months 24 Months

Production

Engineering

+/- 0.0030”

+/- 0.0025”

+/- 0.0030”

+/- 0.0025”+/- 0.0025”

+/- 0.0020”

Technology Road Map

Signal Pad Annular Ring Inners Current 12 Months 24 Months

Production

Engineering

0.0040”

0.0030”

0.0035”

0.0025”0.0030”

0.0020”

Plane Clearance Inners Current 12 Months 24 Months

Production

Engineering

0.016”

0.011”

0.014”

0.010”0.012”

0.008”

Copper Feature to Board Edge Current 12 Months 24 Months

Production

Engineering

0.0050”

0.0030”

0.0045”

0.0025”0.0040”

0.0020”

Imaging And Imaging And MechanicalMechanical

Page 3: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Minimum Hole to Capture Pad Current 12 Months 24 Months

Production

Engineering

0.006” / 0.010”

0.003” / 0.006”

Technology Road Map

Aspect Ratio of Blind Microvia Current 12 Months 24 Months

Production

Engineering

0.5:1

0.7:1

0.6:1

0.8:10.7:1

1:1

Copper Filled Microvias Current 12 Months 24 Months

Production

Engineering

No

Evaluation

No

YesYes

Yes

Multi-Level Microvias (Stacked) Current 12 Months 24 Months

Production

Engineering

No

Yes

No

YesYes

Yes

Laser Drilled MicroviasLaser Drilled Microvias

0.005” / 0.009”

0.002” / 0.006”

0.004” / 0.008”

0.002” / 0.005”

Page 4: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Number of Layers Current 12 Months 24 Months

Production

Engineering

26

52

28

5632

60

Technology Road Map

Smallest Mechanical Drilled Holes* Current 12 Months 24 Months

Production

Engineering

0.0060”

0.0040”

0.0060”

0.0040”0.0050”

0.0030”

MechanicaMechanicall

*.0.062” thick board

** 0.125 thick board

Page 5: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Minimum Soldermask Web Current 12 Months 24 Months

Production

Engineering

0.0030”

0.0030”

0.0030”

0.0025”0.0030”

0.0025”

Technology Road Map

Minimum Soldermask Clearance Current 12 Months 24 Months

Production

Engineering

0.0030”

0.0025”

0.0025”

0.0020”0.0025”

0.0020”

Legend Min Height / Line Width Current 12 Months 24 Months

Production

Engineering

0.050” / 0.006”

0.040” / 0.005”

Soldermask And Soldermask And ScreeningScreening

0.030” / 0.006”

0.035” / 0.005”

0.035” / 0.005”

0.030” / 0.004”

Page 6: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Aspect Ratio Current 12 Months 24 Months

Production

Engineering

9:1

12:1

10:1

13:111:1

14:1

Technology Road Map

PTH Tolerance (finished hole size) Current 12 Months 24 Months

Production

Engineering

+/- 0.0030”

+/- 0.0015”

+/- 0.0025”

+/- 0.0012”+/- 0.0020”

+/- 0.0010”

PlatingPlating

Page 7: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Laser Drilled Blind Micro-Laser Drilled Blind Micro-viasvias

Challenging Technologies

Page 8: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Extreme Technologies

Copper Filled Micro-viasCopper Filled Micro-vias

Via-in-pad Provides Flat Pad Surface for BGA AttachFlat Surface Optimal For Stacked Micro-vias Need For Special Plating ChemistryNeed For Special Plating EquipmentEnables Pin Escaping High Pin Count .5 mm Pitch BGAsTechnology Under Development at Several US Shops

Page 9: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Extreme Technologies

Copper Filled Micro-viasCopper Filled Micro-vias

Current Plating Current Plating TechnologyTechnology

Page 10: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Extreme Technologies

Copper Filled Micro-viasCopper Filled Micro-vias

Compunetics Test Compunetics Test ResultsResultsTest Boards Have Been Received

From (2) Chemistry Manufacturers

The Smaller The Hole, The More Flat the Plating

Plating of Close to 1:1 on Blind Microvias

Both Manufacturers to Receive Stacked Microvia Tests

Stress Testing In Progress

Page 11: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Extreme Technologies

Copper Filled Micro-viasCopper Filled Micro-vias

Stacked Micro-Stacked Micro-viasvias

Page 12: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Extreme Technologies

Copper Filled Micro-viasCopper Filled Micro-vias

Stepped Micro-Stepped Micro-viasvias

Page 13: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

Extreme Technologies

High Aspect Ratio Blind Micro-High Aspect Ratio Blind Micro-via Platingvia PlatingSome Designs Require More Dielectric Between Layers 1-

2 and Still Require Blind Micro-viasCurrent Technology at approx. 0.7:1 Aspect Ratio Industry Looking for Aspect Ratios of Greater Than

1.25:1Copper Filled Micro-via Chemistry and Equipment May

Help Increase Achievable Aspect Ratios

Page 14: Compunetics, Inc. 3/21/06 Trace / Space Outers *Current12 Months24 Months Production Engineering 0.0040” / 0.0035” 0.0015” / 0.0015” 0.0035” / 0.0035”

Compunetics, Inc. 3/21/06

New Equipment

Horizontal Plate Through LineHorizontal Plate Through Line

Plate Through Line Designed To Electroless Plate High Aspect Ratio Holes And Blind Laser Drilled Micro Vias

Increased Through Put And Easier Control Of Chemistry Less Start Up Time For Chemistry