device fabrication facilities nffjeol jbx6300fs direct write on wafers, high throughput, mask...
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![Page 1: Device Fabrication Facilities NFFJeol JBX6300FS Direct write on wafers, high throughput, mask writing, for nanoelectronics –25, 50, 100 kV accelerating](https://reader030.vdocument.in/reader030/viewer/2022032704/56649d425503460f94a1e21c/html5/thumbnails/1.jpg)
Device Fabrication Facilities
NFF Jeol
JBX6300FS
Direct write on wafers, high throughput, mask writing, for nanoelectronics
– 25, 50, 100 kV accelerating voltage
– 2 nm minimum spot size
– 12 MHz scanning rate
– 150 x 190 mm write area
– 0.62 nm stage movement precision
– < 25 nm stitching & overlay accuracy
MCPF e_LiNE & ionLiNE e_LiNE is a ultra high resolution electron beam lithography system and nano-engineering workstation. Key applications: Lithography on 4 inch samples; Electron beam induced deposition and etching; In-situ electrical measurements and nano-manipulation, e.g. CNT or nanorods.
ionLiNE is dedicated to ion beam nanolithography, fabrication, and engineering. Key applications: Low dose ion events; Thin film engineering; Surface fictionalization; Localized defect injection.
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1. Light sources: Ar+ laser, He-Cd laser, Xe-lamp, Ti-sapphire fs laser.
2. Photoluminescence (PL), excitation PL, photoconductivity facilities.
3. Modulated photo-reflectance facilities.
4. Hamamatsu Streak Camera C5680 for time-resolved PL.
5. OI Spectro-Mag 4000 system: magnetic field up to 7T; sample temperature range from 5K to 300K.
6. OI Spectro-Mag 2000 system: magnetic field up to 14T; sample temperature range from 0.3K to 80K.
7. Closed cycle (10 - 300K) system for variable temperature transport and optical measurements.
8. LHe cryostat (2 – 300K) for variable temperature magneto-transport measurements.
9. LN2 cryostat (77 – 450K) for variable temperature magneto-transport and optical measurements.
10.Various electronic equipments for transport measurements
Laboratory Equipment List
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Quantum wire resonant tunneling diode fabrication by photolithography
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Structure fabricated by e-beam lithography
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2 3 4 5 60.0000
0.0002
0.0004
0.0006
T=1.6K
Cur
rent
(A
)
sweep down
sweep up
10T
12T
8T
4T
B=0T
Voltage(V)
Low temperature and high magnetic field transport measurements
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Low temperature magneto-photoluminescence measurements
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Variable temperature magneto-transport measurements
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Transport measurement facilities
Oxford Spectro-Mag 2000 system (B: 014T; T: 0.3K80K)
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LHe cryostat (2 – 300K, 0 – 800mT))
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Oxford Spectro-Mag 4000 system (B: 07T; T: 5K300K)
Magneto-optical measurement facilities
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Spex 1403 monochromator
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Closed cycle (10 - 300K) system
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Hamamatsu Streak Camera
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2D image including spectra and temporal information
Time
Wavelength
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Electronic equipments for transport measurements