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100W by the End of the YearA brief history of broken promises
(or at least bad predictions)for EUV source power
Compiled by Chris A. MackFeb. 17, 2015
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What I have to Say…
• EUV lithography has been under development for over 20 years
• For more than 10 years, promoters of EUVL have been saying the we are “close” to being manufacturing-ready
• EUV source developers have promised a 100W source “by the end of the year” (or early next year) every year since 2006
• We’re still waiting…
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History of EUV Litho Development(Peter Silverman, 1st EUVL Symposium, October, 2002)
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History of EUV Litho Development(Peter Silverman, 1st EUVL Symposium, October, 2002)
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2000
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2002
“When EUV scanners move into production in 2007 …”
“But to reach the 80-wafers/hour throughput targeted for EUV systems, the source power must be increased to the 50W to 100W range…”
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2003(Charles W. Gwyn and Peter J. Silverman, Photomask Japan 2003)
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2005(SEMICON Japan, December, 2005)
…
“We are working to develop a 100W source by 2007 and to deliver a high volume manufacturing source by 2009.” - Robert Akins, CEO of Cymer
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2006
…
“IMEC plans to install their ~100W source sometime in early 2007…”
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2008(Noreen Harned, Sematech Litho Forum 2008)
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2008(Hans Meiling, EUVL Symposium, Sep. 2008)
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2009
“Cymer also hinted that it is eyeing a scale-up to 100W exposure power within the current quarter.”
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2009(Martin van den Brink, Imec Technology Forum 2009)
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2009(Martin van den Brink, Imec Technology Forum 2009)
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2009(David C. Brandt, Sematech EUVL Symposium, October 2009)
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2010(Hans Meiling, SEMICON West presentation, July, 2010)
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2011(Skip Miller, SEMICON West presentation, July, 2011)
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2011(Article by Mike Hatcher, Editor in Chief of optics.org, March 23 2011,
http://optics.org/indepth/2/3/3)
The company is on track to deliver a 100W source to ASML in October 2011, with a 250W source to follow in 2012, with the initial 500W source delivery slated for mid-2013.
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2012(Press Report from the SPIE Advanced Lithography Symposium)
"By summertime we should be at the 100W region [at 100 percent duty cycle]" - Marc Corthout, president of Xtreme Technologies GmbH
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2012(Hans Meiling, SEMICON West presentation, July, 2012)
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2013(Skip Miller, SEMICON West presentation, July, 2013)
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Resist LER Needs Improvement(Peter Silverman, 1st EUVL Symposium, October, 2002)
In the end, it is the resist’s fault.