dual integration - verschmelzung von wafer und panel level ...€¦ · high density metallization,...
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ERÖFFNUNG DES INNOVATIONSZENTRUMS ADAPTSYS
Dual Integration - Verschmelzung von Wafer und Panel Level Technologien
Dr. Michael Töpper BDT
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Introduction
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Introduction
Why do we need such large machines
to build such small systems?
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x mm
QFP ~ 5,5 1.5 x mm
WLP (fan in) = 1
BGA ~ 2.0
Package form factor Package area / chip area
CSP < 1.2
2.5 x mm
Introduction – Development of Single Chip Packaging
Wafer Level Packaging WLP
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cross section of a three chip stack using chip embedding: thin chip embedded on wafer, formation of a RDL, Cu pillar
Final Sensor in “DAG” Housing Bumped 3-D Stack
Chip scale package integration of different microsystem technologies by thin die stacking, polymer embedding and redistribution/bumping for automotive applications
3-D Stack on leaddfram
Example of WLP at IZM: Automotive Application
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Reliability prediction is key (thermomechanical simulation) (Department: Environmental and Reliability Engineering)
Stoney equation
Bow and stress measurement
Verification of the stress and bow solution of the model
•Analytical solution •Bow measurements
•CTE & Tg •Elongation to break •Youngs modulus •Tensile strength Crack through the
polymer layer
Global model
Local model
Free standing films
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Wafer Level Packaging: Mainstream for Mobile Products
12.3mm
115.
3mm
3GS
9.3mm
4S
9.39㎜
9.46㎜
5
7.6㎜
Apple iPhone
0
5
10
15
20
No of WLPs
No of WLPs
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Wafer Level Packaging: Compatibility of Wafer Sizes is key
Sensors: 100 mm – 200 mm ASICs: 150 mm – 200 mm µProcessors: 200 mm – 300 mm Memory: 300 mm others: single chips, wafer parts, …
Electronic Systems Example ATLAS (CERN): 100 mm Sensor, 200 mm Read-Out CMOS
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IZM Wafer Level Packaging Line (RDL) for Wafer Sizes 100 mm / 150 mm / 200mm / 300 mm
Sputter Spin Coater Mask Aligner Wafer Plating Wet Etching
Spin Coater Spin Coater N2 Oven RIE Mask Aligner
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Question in 2003: Do we need a camera in a phone?
2014: Global smartphone shipments totaled 1.167 billion units in 2014
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Wafer-Level-Cameras
Bringing the electrical contact to the back-side of the sensor
Wafer level integration of optics and camera electronics
Module size: 0.7 x 0.7 x 1.0 mm³
Application: low-cost-endoscopes
Partner: Awaiba GmbH
Extension of WLP to 3D Integration using TSV
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Thinfilm technologies, Bumping
Wafer thinning, Thin Wafer Handling
Through Silicon Via (TSV) Formation
High density metallization, redistribution
Interposer, assembly and interconnection technologies
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Rolf Aschenbrenner
Waferlevel Systemintegration using TSV
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Wafer Stud Bumping 300 mm (K&S)
Automatic Die Bonder 300 mm (BESI)
Automatic Flip Chip Bonder 300 mm (PANASONIC)
High Precision Flip Chip Bonder
(SET)
Surface Plasma Protection (ONTOS)
Low Pressure Membrane Bonder
(ATV)
Batch Reflow Oven up to 300 mm (ATV, Budatec)
Halfautomated Flip Chip Bonder (Finetech)
New Assembly Cleanroom
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Waferlevel Systemintegration - Wireless Sensor Nodes
Devices:
FFT-Co-Processor, ADC Fractional-N-PLL LNA, PA, Mixer, VCO, Muliplexer
Package
Thinfilm substrate Integrated patch antenna FC Device integration
RF – Substrate
Baseband-Substrate
Board (PCB)
Patch-Antenna
Features: Working range 50m, 12mm accuracy
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Procedure for Extraction of Dielectric Parameters at >100 GHz Department: RF & Smart Sensor Systems
3D Full wave simulation
Layout
Fabrication
Test Structure
RF - Measurement
Extraction of εr and tanδ terms
Extraction of the geometrical dimensions via microsection
Measure-ment of the surface roughness
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3D WL Integration (ICs + Sensors) @ Fraunhofer IZM
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Future of WLP?
PCB: 0.5 mm pitch
PCB: 0.5 mm pitch
PCB: 0.5 mm pitch
Interposer (organic / Si)
PCB: 0.5 mm pitch
Fan-In WLP: Issue with miniaturization in Front-End (CMOS)
Packaging of high pin-count ICs: Interposers (i.e. FC-BGAs)
Fan-Out WLP
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PWB Design Rules CMOS Design Rules
PWB (organic substrate) Lowest Cost
CMOS (Si-based Wafers) Highest Cost
100 µm PCB Design Rules CMOS Design Rules sub µm 50 µm …1 µm
RDL/BEOL Bump
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Issue with WLP: Chip Shrinkage Solution Fan-Out
(Yole 2015)
For SMD-Assembly 0.5/0.4 mm ball pitch is required (yield and speed of assembly)
iWatch
Solution: Extension of Chip Surface by FO-WLP
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Chip Embedding (Chip into Substrate)
Embedding die technology: Embedding into PWB (embedded die) Reconfigured molded wafer. FOWLP (Fan-Out Wafer Level Packaging)
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FOWLP/FOPLP Process Flow Options
Die assembly on carrier
Wafer/panel overmolding
Carrier release
RDL (e.g. thin film, PCB based, …), balling, singulation
Apply thermal release tape on carrier Apply release layer on carrier
RDL (e.g. thin film, PCB based, …)
Die assembly on carrier
Wafer/panel overmolding
Carrier release, balling, singulation
Mold first RDL first
Pressure Sensor-ASIC Package
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From Wafer to Panel Level Packaging
24“x18“ 6“
PCB Technologies
Thin Film Technologies
• Based on standard PCB manufacturing equipment
• Intrinsic warpage compensation by lamination
• 3D and double sided routing are standard features for PCBs – Line/space down to 10/10 µm
• Full format/large area is standard
12“ 8“
• Based on standard thin film technology equipment
• Tightest tolerances for fine pitch line/space (5/5 µm)
• Currently limited to 12” – 300 mm
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Roadmap Panel Level Embedding
Source: Yole
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IZM Panel Level Embedding Line from Wafer Scale to Panel Scale 610 x 456 mm²/24”x18”
Datacon/Siplace Inspection Panel Molding Laminator Laser Equipment
Automatic plating line mech. drilling LDI Wet Etching Sputter
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MST SmartSense - Intelligent 3D MEMS Compass
Chip on Board technology Transfer molded LGA housing
Heterogeneous Integration BGA Multi-Sensor Package Evaluation of Material
Combinations Reliability Investigations
µC
MS-ASIC
Technology Demonstrator Commercial Product Advanced Technology
sensor
ASIC
LGA pad
TMV
PoP approach using embedding as a basis
Thin film & PCB based RDL Product well within specs!
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DUAL INTEGRATION
Summary
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Cost
Internet of Things Consumer
Trillion Sensor Vision
Miniaturization
Automotive, Medical Industry 4.0
Camera with image processing
Electrical performance
RF-Modules Mobile Wireless
X-ray of embedded System