electrodeposition of indium

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Electrodeposition of indium by Fouda, A.S.; Ahmed, A.I. (Mansoura Univ. (Egypt)); Madkour, L.H. (Tanta Univ. (Egypt)) [en] Metallic indium was deposited from aqueous solutions of indium trichloride containing also, acetate, thiocyanate, chloride, iodide, sulphate, oxalate, ethanol, acetamide and citrate of sodium or potassium. The optimum conditions are: pH 2-5, current density 2-25 mA cm-2, temperature 30OC and metal ion concentration O.2 mol l-1. Deposits have been obtained on a platinum sheet cathode. Chemical analysis reveals that the purity of the indium is better than 99%. The rate of deposition is also determined. 15 refs Subject MATERIALS SCIENCE (B2210) Source/Report Bulletin de la Societe Chimique de France; (no.2) p. 270-272; ISSN 0037-8968; CODEN BSCFA; Mar-Apr 1987 Record Type Journal article Country/Org. France DEC DEPOSITION; DISPERSIONS; ELECTROLYSIS; ELEMENTS; HOMOGENEOUS MIXTURES; METALS; MIXTURES; SOLUTIONS; SURFACE COATING DEI AQUEOUS SOLUTIONS; CURRENT DENSITY; ELECTRODEPOSITION; INDIUM; MEDIUM TEMPERATURE; PH VALUE; QUANTITY RATIO Ref. Number 18098130 Publ. Year 1987 INIS Volume 18 INIS Issue 24

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Metallic indium was deposited from aqueous solutions of indium trichloride containing also, acetate, thiocyanate, chloride, iodide, sulphate, oxalate, ethanol, acetamide and citrate of sodium or potassium. The optimum conditions are: pH 2-5, current density 2-25 mA cm-2, temperature 30OC and metal ion concentration O.2 mol l-1. Deposits have been obtained on a platinum sheet cathode. Chemical analysis reveals that the purity of the indium is better than 99%. The rate of deposition is also determined. 15 refs Subject MATERIALS SCIENCE (B2210) Source/Report Bulletin de la Societe Chimique de France; (no.2) p. 270-272; ISSN 0037-8968; CODEN BSCFA; Mar-Apr 1987 Record Type Journal article Country/Org. France DEC DEPOSITION; DISPERSIONS; ELECTROLYSIS; ELEMENTS; HOMOGENEOUS MIXTURES; METALS; MIXTURES; SOLUTIONS; SURFACE COATING DEI AQUEOUS SOLUTIONS; CURRENT DENSITY; ELECTRODEPOSITION; INDIUM; MEDIUM TEMPERATURE; PH VALUE; QUANTITY RATIO Ref. Number 18098130 Publ. Year 1987 INIS Volume 18 INIS Issue 24

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Page 1: ELECTRODEPOSITION OF INDIUM

Electrodeposition of indiumby Fouda, A.S.; Ahmed, A.I. (Mansoura Univ. (Egypt)); Madkour, L.H. (Tanta Univ. (Egypt))

[en] Metallic indium was deposited from aqueous solutions of indium trichloride containing also, acetate, thiocyanate, chloride, iodide, sulphate, oxalate, ethanol,acetamide and citrate of sodium or potassium. The optimum conditions are: pH 2-5, current density 2-25 mA cm-2, temperature 30OC and metal ion concentration O.2mol l-1. Deposits have been obtained on a platinum sheet cathode. Chemical analysis reveals that the purity of the indium is better than 99%. The rate of deposition isalso determined. 15 refs

Subject MATERIALS SCIENCE (B2210)Source/Report Bulletin de la Societe Chimique de France; (no.2) p. 270-272; ISSN 0037-8968; CODEN BSCFA; Mar-Apr 1987Record Type Journal articleCountry/Org. FranceDEC DEPOSITION; DISPERSIONS; ELECTROLYSIS; ELEMENTS; HOMOGENEOUS MIXTURES; METALS; MIXTURES; SOLUTIONS; SURFACE

COATINGDEI AQUEOUS SOLUTIONS; CURRENT DENSITY; ELECTRODEPOSITION; INDIUM; MEDIUM TEMPERATURE; PH VALUE; QUANTITY RATIORef. Number 18098130Publ. Year 1987INIS Volume 18INIS Issue 24