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Department of Semiconductor Systems Engineering SoYoung Kim Engineering Electromagnetics- 1 Lecture 15: Capacitance SoYoung Kim [email protected] Department of Semiconductor Systems Engineering College of Information and Communication Engineering Sungkyunkwan University

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Department of Semiconductor Systems Engineering SoYoung Kim

Engineering Electromagnetics- 1 Lecture 15: Capacitance

SoYoung Kim

[email protected]

Department of Semiconductor Systems Engineering

College of Information and Communication Engineering

Sungkyunkwan University

Department of Semiconductor Systems Engineering SoYoung Kim

Outline

Midterm results

Capacitance - Applications

Calculating Capacitance

Capacitance and Resistance

Method of Images

Department of Semiconductor Systems Engineering SoYoung Kim

Capacitance Applications

Department of Semiconductor Systems Engineering SoYoung Kim

Why Capacitance?

Delay

RC delay determines the timing and clock speed of a layout

Noise

Coupling cap causes noise to adjacent signal lines

Department of Semiconductor Systems Engineering SoYoung Kim

Cap Extraction in VLSI Design Flow

Cap Extraction step generates RC network netlist file

STA tool calculates from the given RC network:

Interconnect delay

Path delay

Signal integrity

Cap extraction is a critical step for timing closure.

Department of Semiconductor Systems Engineering SoYoung Kim

Basic Theory

The famous equation:

Q = CV

The potential of a conductor(V) is proportional to the total charge(Q), i.e., the capacitance(C) is constant.

C depends on the geometry of conductors and on the permittivity of the medium between them.

Department of Semiconductor Systems Engineering SoYoung Kim

Analytic Cap Calculation

Department of Semiconductor Systems Engineering SoYoung Kim

Analytic Cap Calculation

Department of Semiconductor Systems Engineering SoYoung Kim

Field Solving Methods

Department of Semiconductor Systems Engineering SoYoung Kim

Field-Solving Method

Volume-Based Method Finite element method (FEM)…

Mesh is created in space surrounding conductors

Problem is represented by a large sparse matrix

Raphael 2D, Raphael 3D

Surface-Based Method Boundary element method (BEM)…

Mesh points are placed on surface of conductors, and boundary between different dielectric materials

Representing matrices are smaller than FEM’s, but dense.

Raphael BEM 2D, Raphael BEM 3D

Random-Walk Method Randomly pick points, starting from a conductor and ending

on other conductors (random walk)

No mesh needed – much more efficient than FEM or BEM

QuickCap, Rapid3d(ranxt)

Department of Semiconductor Systems Engineering SoYoung Kim

Capacitance Extraction Methodology

Field-Solver (FEM, BEM based)

Field-Solver (Randow walk based)

Department of Semiconductor Systems Engineering SoYoung Kim

Capacitance Extraction Methodology

Asim Husain ISQED 2001

Configuration showing difference components of capacitances characterized for model library generation

Crossover structure showing 3D capacitance

Department of Semiconductor Systems Engineering SoYoung Kim

Capacitance

Capacitance

For an isolated conductor:

The ratio of charge carried by the conductor and potential of the conductor

For two conductors with charges of same magnitude but opposite sign ( called ‘capacitor’):

The ratio of charge on one conductor and potential between the two conductors

1

1 22

V V V d E l

Department of Semiconductor Systems Engineering SoYoung Kim

Procedures of Obtaining Capacitance

Methods of obtaining capacitance

Assuming Q and determining V in terms of Q (use Gauss’s law)

Assuming V and determining Q in terms of V (use Laplace’s equation)

Procedures for obtaining capacitance

Method #1

1. Choose a suitable coordinate system

2. Let the two conductors carry charges +Q and -Q

3. Determine E by Coulomb or Gauss’s law and find V.

4. Obtain C as Q/V

Method #2

1. Choose a suitable coordinate system

2. Let the two conductors have potential difference V0

3. Determine V by Laplace’s law, and find Q

4. Obtain C as Q/V

Department of Semiconductor Systems Engineering SoYoung Kim

Parallel-Plate Capacitor - Method #1

Potential between two plates

Capacitance

Energy stored in the capacitor

In general,

)

1

2 0

(

S

Sx x

d

x x

Q

S

Q

S

Q QdV d dx

S S

E a a

E l a a

Q SC

V d

2 2 2 2

2 2 2 2

1 1

2 2 2 2 2E

v

Q Q Sd Q d QW dv QV

S S S C

221 1

2 2 2E

QW CV QV

C

1

2E

vW dv D E

Department of Semiconductor Systems Engineering SoYoung Kim

– Laplace’s equation

– Boundary conditions

– Capacitance

Parallel-Plate Capacitor - Method #2

22

20

d VV

dx

V Ax B

0, 0 0 0

, 0o o

x V B

x d V V V Ad

Department of Semiconductor Systems Engineering SoYoung Kim

Coaxial Capacitor

Department of Semiconductor Systems Engineering SoYoung Kim

Spherical Capacitor

For isolated sphere, b

4C a

Department of Semiconductor Systems Engineering SoYoung Kim

– Laplace’s equation

– Boundary conditions

– Capacitance

Spherical Capacitor - Method #2

2 2

2

10

d dVV r

r dr dr

AV B

r

, 0 0 or

1 1, o o

A Ar b V B B

b b

r a V V V Ab a

22

22

0 02

1 1

1 1 1 1

4 4sin

1 11 1 1 1

oo r r r

o r o o r o

o

VdV Ar bV V V

dr rr

a b a b

V V QQ d r d d C

Vr

a ba b a b

E a a a

E S

Department of Semiconductor Systems Engineering SoYoung Kim

Connection of Capacitors

Series connection • Parallel connection

1 2

1 1 1

C C C 1 2C C C

Department of Semiconductor Systems Engineering SoYoung Kim

Relation between R and C (I)

For two conductors separated by homogeneous medium,

Resistance between the two conductors

Capacitance between the two conductors

: Identical to the relaxation time Tr

RC

Department of Semiconductor Systems Engineering SoYoung Kim

Relation between R and C (II)

Examples

Parallel capacitor

Cylindrical capacitor

Spherical capacitor

Isolated spherical capacitor

, S d

C Rd S

1n2 L

, 2

1n

b

aC Rb L

a

1 1

4,

1 1 4

a bC R

a b

14 ,

4C a R

a

Department of Semiconductor Systems Engineering SoYoung Kim

Method of Image

“A given charge configuration above an infinite grounded

perfect conducting plane may be replaced by the charge configuration itself, its image, and an equipotential surface in place of the conducting plane.”

Department of Semiconductor Systems Engineering SoYoung Kim

Method of Image

Two conditions need to be satisfied when method of image is used:

The image charge must be located in the conducting region

The potential on the conducting surface must be zero or constant

Department of Semiconductor Systems Engineering SoYoung Kim

Example 1

A point charge above a grounded conducting plane

Electric field

1 2

3 3

1 24 4o o

Q Q

r r

r rE E E

1

2

( , , ) (0,0, ) ( , , )

( , , ) (0,0, ) ( , , )

x y z h x y z h

x y z h x y z h

r

r

0z

Department of Semiconductor Systems Engineering SoYoung Kim

Example 1 (Cont’d)

Potential

Surface induced charge

1 2

1/2 1/22 2 2 2 2 2

4 4

1 1

4 ( ) ( )

o o

o

Q QV V V

r r

Q

x y z h x y z h

Department of Semiconductor Systems Engineering SoYoung Kim

Example 2

A line charge above a grounded conducting plane

Electric field

1 2

1 2

1

2

2 2 2 2

2 2

( , , ) (0, , ) ( ,0, )

( , , ) (0, , ) ( ,0, )

( ) ( )

2 ( ) ( )

E E E a a

ρ

ρ

a a a aE

L L

o o

x z x zL

o

x y z y h x z h

x y z y h x z h

x z h x z h

x z h x z h

Department of Semiconductor Systems Engineering SoYoung Kim

Example 2 (Cont’d)

Potential

Surface induced charge

11 2

2

1/22 2

2 2

1n 1n 1n2 2 2

( ) or 1n

2 ( )

L L L

o o o

L

o

V V V

x z hV

x z h

0 2 2

2 2

LS n o z z

Li S

hD E

x h

h dxdx

x h

/2

/2

Li

L

h d

h

By letting tanx h

Department of Semiconductor Systems Engineering SoYoung Kim

Example 3

A point charge between two orthogonal semi-infinite conducting planes

Potential

29

1 2 3 4

1 1 1 1

4 o

QV

r r r r

1/22 2 2

1

1/22 2 2

2

1/22 2 2

3

1/22 2 2

4

( ) ( )

( ) ( )

( ) ( )

( ) ( )

r x a y z b

r x a y z b

r x a y z b

r x a y z b