esh itwg april 7, 2006 vaals, netherlands summary of environmental, health and safety chapter itrs...
TRANSCRIPT
ESH ITWG
April 7, 2006 Vaals, Netherlands
Summary of Environmental, Health and Safety Chapter
ITRS 2006
04/10/23 20:39 File name and path go here. 2
Agenda
• 2005 (Seoul) Summary
• Technical Work– Cross-thrust Analysis– 2006 Overall ESH needs– Objectives and work assignments for July meeting
• Have Fun at the ITRS
• IRC Issues?
04/10/23 20:39 File name and path go here. 3
2006 ITRS Update ESH Focus Issues-1• Chemicals – MATERIAL CHOICE
• Material in devices vs precursor/starting materials• ALD/MOCVD/PVD • Process By-Products (e.g. – RuO4, Al(CH3)3 )• Pb-Free Roadmap
• Materials for Manufacturing Only• Non-aqueous immersion fluids• PFOS moving to PFAS/PFOA
• ERM• Proposed ERM Table would map ERD’s material classes• ESH assess for future potential risks (of each class)• Nano Infrastructure Dialog (e.g. – metrology)
• Energy• EUV (Lithography)• Energy Goals (Interconnect)• Who Owns Setting/Driving Energy Reduction Needs• Sleep State Technology (Factory Integration)• Green Fab Definition (Factory Integration)
04/10/23 20:39 File name and path go here. 4
2006 ITRS Update ESH Focus Issues-2
• Recycle Systems
• Chemical• Definition of Recycle, Reuse, Reclaim • Conflict with technology performance• Energy penalty due to dilute chemicals
• Water • Conflict with technology performance
04/10/23 20:39 File name and path go here. 5
ESH Chapter ITWG AttendeesESIA – Shane Harte (ESIA)
- Francesca Illuzzi (ST Microelectronics)
- Harry Thewissen (Philips)
JSIA –- Shigehito Ibuka (TEL)
- Takayuki Oogoshi (NEC Electronics)
- Tetsu Tomine (Seiko-Epson)
SIA – Jim Jewett (Intel)
- Walter Worth (Sematech)