fabrication and characterization of nano metric thin film devices

Upload: revathy-vijayakumar

Post on 07-Apr-2018

224 views

Category:

Documents


0 download

TRANSCRIPT

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    1/10

    ByMrs.M.S.Revathy

    Under the Guidance of

    Dr.T.ChitravelDirector-Research

    Anna University of technology Madurai

    Madurai

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    2/10

    INTRODUCTIONNanotechnology is an umbrella of multidisciplines. Its exploration in semiconductingfield is drastic and set forths vast technological

    applications such as sensors, light emittingmaterials, short diodes, memory devices etc.

    With the excitement of its growth, thepresent research work will rely on wide band gap

    semiconducting materials of II VI and III V groupin particular, chalcogenide nanometric thin filmsexhibit tremendous opto-electronic applications.

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    3/10

    Seminconductor materials with electronic band gaps larger than one or twoelectronvolts(eV).

    The exact threshold of wideness often depends on the application, such as

    optoelectronic and power devices with band gaps > 1.7 eV

    Wide band gapsemiconductor

    Oxides materials :ZnO, CuO, SnO etc Eg

    1.2 eV

    Chalcogenides,

    selenides,telluridesCdS, CuS

    etcEg 2.2 eV to 3.8 eV

    Alloys: CdZnS,

    Titanium NitrideCobalt, Nickel Ferrous

    larger Eg

    Wide band gap semiconductors

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    4/10

    FABRICATION

    Present work focuses first on the fabrication of

    chalcogenide family thin films .

    Thin film

    y Any solid or liquid object with one of its dimensions very much lesserthan that of the other two is called a thin film.

    y Thin film devices would typically be about 5 to 50 m thick in contrastto bulk devices, which are about 50 to 250 m thick.

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    5/10

    y Evaporation

    y spray pyrolysis

    ychemical bath deposition

    y dip coating

    y electro chemical deposition

    y chemical vapourdeposition (CVD).

    Out of which chemical bath depositionyields costeffective, stable, uniform, adherent and hard films withgood reproducibility by a relatively simpler process.

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    6/10

    XRD : Identifies the crystal structure. TEM : Determines the size.

    AFM: Visualizethe surface texture.

    SEM : Characterize the topography of the sample.

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    7/10

    SEM Inside surfaceof eggshell

    AFM showing all atoms within the

    hexagonal graphite unit cells. Image

    size 22 nm2

    TEM imageXRD

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    8/10

    y Sensorsy Light emitting materials.y Memory devices.y Laser Protectiony Optoelectronicsy Infrared detectiony

    Photoconductorsy Solar energy conversion, Solar Cellsy Nanomaterials (Phosphors for high-definition TV)y Nanocrystalline zinc selenide, zinc sulfide, cadmium

    sulfide, and lead telluride

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    9/10

    REFERENCESREFERENCESy [1] J. Aguilar-Hernandez, J. Sastre- Hernandez,N. Ximello-Quiebras, R. Mendoza-Perez,

    y O. Vigil-Galan, G. Contreras-Puente, M. Cardenas-Garcia , Thin Solid Films

    511-512,143 (2006).

    y [2] David Zubia, Cesar Lopez, Mario Rodriguez, ArevEscobedo, Sandra Oyer, Luis Romo,

    y

    Scott Rogers, Stella Quinonez and John McClure, J.Elect.Mater. 36,12 (2007).y [3] T, Chandra, S. Bhushan, J.Mater. Sci. 39,6303 (2004).

    y [4] Wenzhong Wang, Igor Germanenko, M.SamyEl-Shall, Chem.Mater. 14,3028 (2002).

    y [5] T.Taguchi, Y.Endoh, Y.Nozue, Appl.Phys.Lett, 56,342 (1991).

  • 8/6/2019 Fabrication and Characterization of Nano Metric Thin Film Devices

    10/10

    Thank you