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Dielectric Constant Thermal Expansion Coefficient Thermal Conductivity Processing Temperature Decomposition Temperature Fundamental Material Properties

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• Dielectric Constant

• Thermal Expansion Coefficient

• Thermal Conductivity

• Processing Temperature

• Decomposition Temperature

Fundamental Material Properties

HyperBGA

HyperBGA is a registered trademark of Endicott Interconnect

ASIC* (ay-sik)

Short for Application-Specific Integrated Circuit.

A chip designed for a particular application (as opposed to the integrated circuits that control functions such as RAM in a PC).ASICs are built by connecting existing circuit building blocks in new ways. Since the building blocks already exist in a library, it is much easier to produce a new ASIC than to design a new chip from scratch. ASICs are commonly used in automotive computers to control the functions of the vehicle and in PDAs. ________________* As defined in http://www.webopedia.com/TERM/A/ASIC.html

0.750.55Coupled Noise (mV/mm @ 1V/ns)

11.55.6Delay (ps/mm)

0.270.11Capacitance (pF/mm)

3754Impedance (Zo) (W)

3012Line height (µm) nominal

9025Line width (µm) nominal

9.52.8Dielectric Constant

2550500Substrate Thickness (µm)

179Layers

AluminaCeramic

HyperBGA

Physical / Electrical Comparison

Ceramic is: thicker (5x), heavier and slower

Why low Dk ? Fast signal propagation time,

k

cD

υ =

11.81.0Air

8.12.1PTFE

5.64.4Epoxy/Glass

3.79.5Ceramic

υ(in/ns)

DkDielectric

Dklw

lsh1

h2

210.512

842.233

2412749

h2h1lslwDk

all physical dimensions in mils

all assume Zo = 50 ohms

…also thinner and more tightly spaced.

Thermal Stress, σ

Silicon Chip Silicon Chip

Tb >> Ta

( ) ( )E T T dTσ α=∫

2

1

( ( ) ( )) ( )T

p c pT

T T E T dTσ α α= −∫

E Youngs Modulusα Coefficient of thermal expansion (CTE)αp CTE of polymerαc CTE of chip

Chip or ceramicsubstrate or chip

Thermal Stress

Temperature

Tg

α1

α2

Line

ar E

xpan

sion

1 1 1 2 2 2( ) ( ) ( ) ( )c g c gK E T T E T Tσ α α α α⎧ ⎫⎪ ⎪⎨ ⎬⎪ ⎪⎩ ⎭

= − − + − −

Lower Composite stress byminimizing the CTE mismatch,lower the modulus,and lower the Tg.

Materialslower CTE by resin & filler physical properties / loading

CTE Measurement: Thermal Mechanical Analysis

50.00°C

125.00°CAlpha=65.5µm/m°C

187.16°C

211.84°CAlpha=340.µm/m°C

171.17°C

-10

-5

0

5

10

15

Dim

ensi

on C

hang

e (µ

m)

0 50 100 150 200 250

Temperature (°C)

Sample: IBM DC ZSize: 0.5225 mmMethod: 5C/m 30-225 .1N scan 2Comment: 5C/m RT-225,LN2 cool to RT,5C/m RT-225 sc2

TMAFile: A:\gktmab.219Operator: G. Kohut T49Run Date: 13-Feb-2001 02:18p

Thermal Expansion Coefficient

0

5

10

15

20

25

30

-150 -50 50 150 250 350

Temperature (C)

TCE

(ppm

/ C

)

Cu Invar Cu Silica Filled PTFE Cu Si HyperBGA

HyperBGA

CIC*

Si

Cu

Silica-filled PTFE

TCE Data for Primary Materials in the HyperBGA Composite

* Invar is an alloy of Ni & Fe

2310Aluminum

1828Stainless 302

5 – 720CIC (Cu Invar Cu)

1717Plated Cu

400.6 – 0.9Outer layer dielectric

Softening> 125

20 – 25*0.03 – 0.10HyperBGA filled PTFE

110 – 13060 – 80*0.25 – 0.40PID soldermask

20016 – 17* 60 – 65

2.6 – 2.7BT w/ 2116 cloth

20055 – 60*0.4BT resin

644Alumina ceramic

319Glass ceramic

327Silicon die (crystal)

Tg°C

Effective TCEppm/ °C

Effective Modulus

Mpsi

Mechanical Properties of Packaging Materials

* Effective TCE below Tg

Ceramic Limited BGA fatigue lifeVery little warpage

Chip: 3

Ceramic: 5-6

PC card: 18

Component CTE

PC card: 18

Chip: 3

Laminate: 18

Gore ( 3M )Must control warpageAdhesive stressesNet: Limited die size

Chip: 3Laminate: 10

PC card: 18

HyperBGA CIC to control expansion Optimized CTE distribution Compliant dielectric Compliant adhesives Low Stress

HyperBGA 0.4mm

High Tg Epoxy 0.4mm

Epoxy/Glass 0.4mm

Epoxy/Glass 1.0mm

SLC 1.0mm

42.5mm CCGA

32mm CBGA

0 2 4 6 8 10 12

Thousands

Relative BGA life for 0/100 C

Results of• Thermal / mechanical modeling• Accelerated reliability testing

Material Composition / Properties

i 50% Silica filled PTFE

Silane coupler treated Silica mixed w/ PTFE aqueous dispersion

Dried / Sintered / Sheeted

Thickness: 0.002” & 0.0014”

Electrical properties: Dk = 2.8, Df = 0.001

Lower isotropic CTE = 25 ppm

IBM formula versus Rogers formulaPTFE is a semi-crystalline polymer

Thermoplastic Dielectric Material -- Silica Filled PTFE

Semi-crystalline polymer

Crosslinked polymer

Crystals can function like crosslinks

HyperBGALaminate Build Process is Sequential

BGA pad

Ground CIC

Signal

Power

Microvia

Bump

Chip

Underfill

Soldermask

1st Inner PTFE

Filled PTH

3rd Outer PTFE

2nd Middle PTFE

• Inner Layer exposed to three laminations

• Outer Layer exposed to one lamination

What is effect of repeated laminations ?

Starts with Ground Plane

Inner layer PTFE is laminated

2nd layer laminated

Outer layer laminated

The Competition

MICROLAM® 600 Series Dielectrics

MICROLAM® 600 Series Microvia Dielectrics have optimized electrical and mechanical properties and consist of a non-woven, continuous toughening matrix and standard epoxy resins. Engineered to resist dielectric cracking and provide improved PCB mechanical reliability in cell phones, PDAs, and other portable devices, these high performance materials are processed using the same equipment and techniques as resin-coated copper and dry films.

Microlam is both thermoplastic &thermosetting

Cu-Foil

Silica filled PTFE

Core Panel

Silica filled PTFE

Cu-Foil

Heat and Pressure

Heat and Pressure

Lamination: Squeezing Flow

Silica filled PTFE(thermoplastic)

Epoxy prepreg(thermoset)

Extreme Engineering: High temperature & pressure required to deform silica filled PTFE and “sinter” composite.

Conclusions

For a high performance and high reliability chip package:

• Use thermal / mechanical modeling to optimize package design and materials selection

• Minimize the CTE difference between the chip and package

• Use dielectric material with small particle fillerwith high filler loadingoverall low modulusgood adhesion to metal layersthermal stability

• A carefully designed process window is required for robust package performanceductility of dielectric material was a key parameter