historical data for since 1968 ieee international...

https://ieee-uffc.org/ IEEE Ultrasonics, Ferroelectrics, and Frequency Control Society (UFFC-S)

Created: July 6, 2009; Latest Revision: August 08, 2019 By General Chair and Web Master of 2008 IEEE IUS, Beijing, China: Jian-yu Lu, Ph.D.

Historical Data For Since 1968

IEEE International Symposium on Applications of Ferroelectrics (ISAF) Conferences

and Time Curves of the 2008 IEEE IUS for Future Conference Planning

NotesThese charts are based on data in the spreadsheet: “0_oper_ius2008_plots_isaf.xls”. Comments in the .xls

spreadsheet indicate where the data were obtained. The data were collected from various reports and from some individuals. However, they are far from perfect. There are many missing data. There may be inconsistencies such as the number of abstracts accepted is more than submitted or less than the number of conference proceedings papers published in some years. These data are what I have so far and many of the original data might have already been permanently lost.

This underscores the importance that, to collect conference historical data, each conference should fill out the standard data collection form “00_uffcs_conf_data_collection_fillable.pdf” soon after the conference while the memory of the conference is still fresh.

Currently, among the three annual UFFC-S conferences, historical data of IEEE IUS are relatively complete and consistent. Thank you all for those who made reports or who provided the data.

Note:

A Microsoft Excel version of these plots for details of the data is accessible at: https://ewh.ieee.org/conf/ius_2008/z_doc_misc/0_oper_ius2008_plots_isaf.xls

https://ewh.ieee.org/conf/ius_2008/z_doc_misc/0_oper_ius2008_plots_isaf.xls



# of Attendees of the IEEE International Symposia on Applications of Ferroelectrics (ISAF) by IEEE Regions (Since 1968)

- "0" values mean that data are not available for those years

0

100

200

300

400

500

600

700

800

900

1000

1968

1970

1972

1974

1976

1978

1980

1982

1984

1986

1988

1990

1992

1994

1996

1998

2000

2002

2004

2006

2008

2010

2012

2014

2016

2018

2020

2022

2024

Time (Year)

Num

ber o

f Atte

ndee

s

IEEE R1-7 (US/Canada) IEEE R8 (Europe/MiddleEast/Africa) IEEE R9 (LatinAmerica) IEEE R10 (Asia/Pacific) No Country

Attendance of Joint Symposia2004 Joint (IUS, ISAF, IFCS): Total: 1327 Regions 1-7: 718 Region 8: 342 Region 9: 6 Region 10: 261

2013 Joint (IUS, ISAF, IFCS): Total: 2033 Regions 1-7: 450 Region 8: 1005 Region 9: 20 Region 10: 481 No Country: 77



# of Abstracts Submitted to the IEEE International Symposia on Applications of Ferroelectrics (ISAF) by Each Group (Since 1968)

- "0" values mean that data are not available for those years; "Solid Bar" means no Group data

0

75

150

225

300

375

450

525

600

675

750

1968

1970

1972

1974

1976

1978

1980

1982

1984

1986

1988

1990

1992

1994

1996

1998

2000

2002

2004

2006

2008

2010

2012

2014

2016

2018

2020

2022

2024

Time (Year)

Num

ber o

f Abs

trac

ts

Group I (Fundamental) Group II (Processing) Group III (Characterizing) Group IV (Application) Group V (Misc)

Group I:

Fundamentals of Ferroelectrics and Related Materials

Group II:

Processing of Ferroelectric Crystals, Ceramics, Thick and Thin Films

Group III:

Characterization & Properties of Ferroelectrics

Group IV:

Applications of Ferroelectrics, Piezoelectrics

and Related MaterialsGroup V:

Misc

–

All Others



# of Abstracts Submitted to the IEEE International Symposia on Applications of Ferroelectrics (ISAF) by Each Group (Since 1968) - "0" values mean that data are not available for those years

0

75

150

225

300

375

450

525

600

675

750

1968

1970

1972

1974

1976

1978

1980

1982

1984

1986

1988

1990

1992

1994

1996

1998

2000

2002

2004

2006

2008

2010

2012

2014

2016

2018

2020

2022

2024

Time (Year)

Num

ber o

f Abs

trac

ts

Group I (Fundamental) Group II (Processing) Group III (Characterizing)

Group IV (Application) Group V (Line) Total # Abs Submitted

Group I:

Fundamentals of Ferroelectrics and Related MaterialsGroup II:


Group III:

Characterization & Properties of FerroelectricsGroup IV:


and Related Materials

Group V:

Misc

–

All Others



# of Abstracts Accepted for the IEEE International Symposia on Applications of Ferroelectrics (ISAF) by Each Group (Since 1968)

- "0" values mean that data are not available for those years; "Solid Bar" means no Group data

0

75

150

225

300

375

450

525

600

675

750

1968

1970

1972

1974

1976

1978

1980

1982

1984

1986

1988

1990

1992

1994

1996

1998

2000

2002

2004

2006

2008

2010

2012

2014

2016

2018

2020

2022

2024

Time (Year)

Num

ber o

f Abs

trac

ts

Group I (Fundamental) Group II (Processing) Group III (Characterizing) Group IV (Application) Group V (Misc)

Group I:

Fundamentals of Ferroelectrics and Related Materials

Group II:


Group III:

Characterization & Properties of Ferroelectrics

Group IV:


and Related MaterialsGroup V:

Misc

–

All Others



Rejection Rate (%) of the IEEE International Symposia on Applications of Ferroelectrics (ISAF) by Each Group (Since 1968) - "0" values mean that data are not available for those years

0%

10%

20%

30%

40%

50%

60%

70%

80%

90%

100%19

68

1970

1972

1974

1976

1978

1980

1982

1984

1986

1988

1990

1992

1994

1996

1998

2000

2002

2004

2006

2008

2010

2012

2014

2016

2018

2020

2022

2024

Time (Year)

Rej

ectio

n R

ate

*

Group I (Fundamental) Group II (Processing) Group III (Characterizing)

Group IV (Application) Group V (Misc) Overall

Group I:

Fundamentals of Ferroelectrics and Related MaterialsGroup II:


Group III:

Characterization & Properties of FerroelectricsGroup IV:


and Related Materials

Group V:

Misc

–

All Others



# of Abstracts Accepted vs Rejected by the IEEE International Symposia on Applications of Ferroelectrics (ISAF) (Since 1968)

- "0" means that the rejection data are not available for those years

0

75

150

225

300

375

450

525

600

675

750

1968

1970

1972

1974

1976

1978

1980

1982

1984

1986

1988

1990

1992

1994

1996

1998

2000

2002

2004

2006

2008

2010

2012

2014

2016

2018

2020

2022

2024

Time (Year)

Num

ber o

f Abs

trac

ts

Total # Abs Accepted Total # Abs Rejected



# of Papers Published in the Proceedings of the IEEE International Symposia on Applications of Ferroelectrics (ISAF) (Since 1968)

- "0" values mean no proceedings published

0

50

100

150

200

250

300

350

400

450

50019

68

1970

1972

1974

1976

1978

1980

1982

1984

1986

1988

1990

1992

1994

1996

1998

2000

2002

2004

2006

2008

2010

2012

2014

2016

2018

2020

2022

2024

Time (Year)

Num

ber o

f Pap

ers



Ratio between the # of Papers Published and # of Accepted Abstracts of the IEEE International Symposia on Applications of Ferroelectrics (ISAF) (Since

1968) - "0" values mean no proceedings published

0%

10%

20%

30%

40%

50%

60%

70%

80%

90%

100%19

68

1970

1972

1974

1976

1978

1980

1982

1984

1986

1988

1990

1992

1994

1996

1998

2000

2002

2004

2006

2008

2010

2012

2014

2016

2018

2020

2022

2024

Time (Year)

Publ

icat

ion

Rat

e



Registration Fees of the IEEE International Symposia on Applications of Ferroelectrics (ISAF) (Since 1968)

- "0" values mean that data are not available for those years

0

150

300

450

600

750

900

1050

1200

1350

1500

1968

1970

1972

1974

1976

1978

1980

1982

1984

1986

1988

1990

1992

1994

1996

1998

2000

2002

2004

2006

2008

2010

2012

2014

2016

2018

2020

2022

2024

Time (Year)

Reg

istr

atio

n Fe

e (U

S D

olla

rs)

Reg Fee (M, Adv) Reg Fee (M, On-Site) Reg Fee (NM, Adv) Reg Fee (NM, On-Site)

Student (M, Adv) Student (M, On-Site) Student (NM, Adv) Student (NM, On-Site)



# of Visits of the Home Page of the 2008 IEEE International Ultrasonics Symposia Website (Conference Dates: November 2-5, 2008)

0

6000

12000

18000

24000

30000

36000

42000

48000

54000

600008/

1/20

069/

1/20

0610

/1/2

006

11/1

/200

612

/1/2

006

1/1/

2007

2/1/

2007

3/1/

2007

4/1/

2007

5/1/

2007

6/1/

2007

7/1/

2007

8/1/

2007

9/1/

2007

10/1

/200

711

/1/2

007

12/1

/200

71/

1/20

082/

1/20

083/

1/20

084/

1/20

085/

1/20

086/

1/20

087/

1/20

088/

1/20

089/

1/20

0810

/1/2

008

11/1

/200

812

/1/2

008

1/1/

2009

2/1/

2009

3/1/

2009

4/1/

2009

5/1/

2009

6/1/

2009

7/1/

2009

Time (Month)

Num

ber o

f Vis

its



# of Abstracts Successfully Submitted to the 2008 IEEE International Ultrasonics Symposium (Submission Deadline: May 4, 2008, PST / May 5, EST)

0

150

300

450

600

750

900

1050

1200

1350

15004/

16/2

008

4/17

/200

8

4/18

/200

8

4/19

/200

8

4/20

/200

8

4/21

/200

8

4/22

/200

8

4/23

/200

8

4/24

/200

8

4/25

/200

8

4/26

/200

8

4/27

/200

8

4/28

/200

8

4/29

/200

8

4/30

/200

8

5/1/

2008

5/2/

2008

5/3/

2008

5/4/

2008

5/5/

2008

Time - EST (Day)

Num

ber o

f Abs

trac

ts



# of Papers Submitted Successfully to the 2008 IEEE International Ultrasonics Symposium (Submission Deadline: Nov. 2, 2008, Beijing Time)

0

75

150

225

300

375

450

525

600

675

75010

/10/

2008

10/1

1/20

08

10/1

2/20

08

10/1

3/20

08

10/1

4/20

08

10/1

5/20

08

10/1

6/20

08

10/1

7/20

08

10/1

8/20

08

10/1

9/20

08

10/2

0/20

08

10/2

1/20

08

10/2

2/20

08

10/2

3/20

08

10/2

4/20

08

10/2

5/20

08

10/2

6/20

08

10/2

7/20

08

10/2

8/20

08

10/2

9/20

08

10/3

0/20

08

10/3

1/20

08

11/1

/200

8

11/2

/200

8

Time (Day)

Num

ber o

f Pap

ers



# of Short Course Registrations of the 2008 IEEE International Ultrasonics Symposium (Early Registration Opened on July 20, 2008)

(Conference Dates: November 2-5, 2008)

0

40

80

120

160

200

240

280

320

360

4007/

20/2

008

8/20

/200

8

9/20

/200

8

10/2

0/20

08

Time (Month)

Num

ber o

f Reg

istr

atio

ns



# of Conference Registrations of the 2008 IEEE International Ultrasonics Symposium (Conference Dates: November 2-5, 2008)

0

150

300

450

600

750

900

1050

1200

1350

15007/

20/2

008

8/20

/200

8

9/20

/200

8

10/2

0/20

08

Time (Month)

Num

ber o

f Reg

istr

atio

ns



1.

Abstracts (674) accepted from 37

countries

Accepted Abstract by Country in the Technical Program (Total 674)

(2008 IEEE IUS, Beijing, China, November 2-5, 2008)

Europe33.2%

Japan12.5%

China (PRC)14.4%

USA and Canada30.1%

Others9.8%



2.

Attendees (1023) in 10

categories

Note:

Most “COMP”

registrants are invited speakers

Registration Types (Total 1023 Attendees) (2008 IEEE IUS, Beijing, China, November 2-5, 2008)

Life Member

0.9%

One-Day1.1%

Retiree1.5%

Student25.9%

COMP3.4%

Guest9.0%

Non-Member20.9%

Member28.5%

Staff4.8%

Exhibitor4.0%



3.

Conference Registration from 32

countries

Note:

The country counts of all charts do not include those of coauthors

Registration Distribution by Country (Excluding Staff and Exhibitors)


USA and Canada30.2%

China (PRC)14.6%

Japan13.6%

Europe29.5%

Others12.0%



4.

Papers (553) published from 32

countries

Number of Papers in Proceedings by Country (Total 553 Papers)


Others9.0%

Europe34.7%

Japan12.8%

China (PRC)12.7%

USA and Canada30.7%



5.

Papers (553) published in 3

categories

Paper Types in Proceedings (Total 553 Papers) (2008 IEEE IUS, Beijing, China, November 2-5, 2008)

Others96.9%

Multi-media Papers1.1%

Invited-Talk

Papers2.0%



6.

Papers (553) published from accepted abstracts (674)

Abstracts Statistics for Proceedings (Total 674 Abstracts)


In Proceed-

ings Oral

40.9%In

Proceed-ings

Poster41.1%

Not in Proceed-

ings18.0%



7.

Presentations of accepted abstracts (674) in the conference

Abstract Presentation Statistics (Total 674 Abstracts)


No Show8.3%

Pre-sented91.7%



8.

Categories of papers that are not published (121)

Papers Not in Proceedings (Total 121 Papers) (2008 IEEE IUS, Beijing, China, November 2-5, 2008)

No Show With-draw7.4%

Miss the Deadline

6.6%Missing -

Invited Talk8.3%

Missing - Clinical2.5%

Missing -Others75.2%



9.

Short course registration (292) types

Short Course Registration Types (Total 292) (2008 IEEE IUS, Beijing, China, November 2-5, 2008)

Student42.8%

Others57.2%



10.

Attendances (total 292) of each of the 12

short courses

Short Course Registration by Courses (Total 292)


4C3.4% 3C

6.8%

1B9.9%

2B5.8%

4A9.6%

3A6.5%

4B8.6% 3B

7.2%

2A14.0%

1A10.6%

2C11.0%

1C6.5%



A list

of the 12

short courses•

8:00 A.M. -

12:00 Noon, Sunday, November 2, 2008:Short Course 1A

(Conference Room 311A/B): Medical Ultrasound Transducers, Douglas G. Wildes

and L. Scott Smith, GE Global Research Center, Niskayuna, NY, USA.

Short Course 2A

(Conference Room 307): Ultrasound Imaging Systems: from Principles to Implementation, Kai E. Thomenius, GE Global Research Center, Niskayuna, NY, USA.

Short Course 3A

(Conference Room 308): Photoacoustic

Imaging and Sensing, Stanislav

Emelianov, Biomedical Engineering Department, University of Texas at Austin, USA.

Short Course 4A

(Conference Room 311C): Estimation and Imaging of Tissue Motion and Blood Velocity, Hans Torp

and Lasse

Lovstakken, Department of circulation and medical imaging, Norwegian University of Science and Technology, Trondheim, Norway.

•

1:00 P.M. -

5:00 P.M, Sunday, November 2, 2008:Short Course 1B

(Conference Room 311A/B): Ultrasound Elastography: Quantitative Approaches, *Jeffrey Bamber

and **Paul Barbone, *Institute of Cancer Research and Royal Marsden

Hospital, UK. **Boston University, USA. Short Course 2B

(Conference Room 307): Acoustic Microscopy -

Fundamentals and Applications, *Roman Gr. Maev, **Naohiro

Hozumi, ***Kazuto Kobayashi, and ****Yoshifumi Saijo, *Centre for Imaging Research and Advanced Materials Characterization, University of Windsor, Ontario, Canada. **Department of Electrical & Electronic Engineering, Aichi Institute of Technology, Toyota, Japan. ***Honda Electronics Co. Ltd., Aichi,

Japan. ****Tohoku University, Sendai, Japan.

Short Course 3B

(Conference Room 308): Therapeutic Ultrasound, Lawrence A. Crum, Applied Physics Laboratory, University of Washington, Seattle, WA, USA.

Short Course 4B

(Conference Room 311C): SAW Modeling Techniques, Victor P. Plessky, GVR Trade SA, Bevaix, Switzerland.

•

6:00 P.M. -

10:00 P.M, Sunday, November 2, 2008:Short Course 1C

(Conference Room 311A/B): Ultrasound Contrast Agents: Theory and Experiment, *Nico

de Jong

and **Michel Versluis, *Erasmus MC, The Netherlands. **University of Twente, The Netherlands.

Short Course 2C

(Conference Room 307): CMUTs: Theory, Technology, and Applications, B.T. Khuri-Yakub, Ömer

Oralkan, and Mario Kupnik, E.L. Ginzton

Laboratory, Stanford University, USA.

Short Course 3C

(Conference Room 308): Time Reversal Acoustics, Mathias Fink, École

Supérieure

de Physique et de Chimi

de la Ville de Paris, France.

Short Course 4C

(Conference Room 311C): Acoustical Near-Field Imaging, Walter Arnold, Fraunhofer

Institute for Non-

Destructive Testing, Saarbrücken, Germany.

http://ewh.ieee.org/conf/ius_2008/z31_short_courses.html#Short_Course_1A




http://ewh.ieee.org/conf/ius_2008/z31_short_courses.html#Short_Course_1B




http://ewh.ieee.org/conf/ius_2008/z31_short_courses.html#Short_Course_1C




historical data for since 1968 ieee international...

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