Index

1-on-1 310 Abeles matrix method 83 absorptance 183 absorption 11, 70 AC power 161 acceptor mode 54 achromatic damage 346 activated states 140 adhesion 141, 359 Ag 166 AI 119 AbOJ 112 AIF3 110 algae 27 alloys 118 amplifying medium 337 amplitude transmission and reflection

coefficients 83, 283, 287, 292 anisotropy 243 anode 155, 160 antireflection coatings 170, 260, 360 anti-reflective anti-static 170 Aphrodita 22 arc source 145 architectural glass coater 176 arcing 160 argon ions 155 atomic scattering factor 282 B4C 114 back-side-coated (BASIC) mirrors 400 BaF2 110, 112 band structure 42 bandgap 324 band-index 49 barrier coatings 359 batch system I 77 beam evaporation 297 beetles 6 bending magnet 338 bipolar twin magnetron 149 bird's feathers 21

Bragg condition 287 Bragg crystal 286 Bragg diffraction 7 Bragg reflector 396 Bragg scattering 23 Brewster's angle 285 brightness 424 brilliance 2, 338 Brillouin zone 46, 51 broadband mirrors 291 butterfly 13 CaF2 110 cambrian 1 cantilever methods 216 carbides 112 carbon contamination 341 carbon films 119 cathode ray tubes (CRTs) 426 CdS 118 CdSe 118 CdTe 118 CeF3 Ill cellulose 5 central wavelength 94 cermet films 120 characteristic matrix 83 characterization 241 Chebyshev filters I 00 chemical vapor deposition ( CVD) 131,

233,325 chirped 6 chirped mirrors 394 chitin 4, 5, 6, II C-MAG 158 coalescence 66 coating design 344 coating materials 105, 106, 347

chemical purity I 06 different deposition techniques I 05 physical properties 1 07 process suitability I 08

482 Index

production 120 requirements I 06

Coblentz-hemisphere 193 coefficient of heat transfer 166 coefficients of thermal expansion 359 cold plasmas 133 colour 424, 435 colour coatings 435

birefringent multilayer polymer films 439

cut-off edge filters 437 metal-dielectric 440 modified Philip prism 439 non-polarizing 439 Philip prisms 438 plate 438 X-cube 439

colour filters 435, 439, 446 colour schemes 424

simultaneous 425, 448 spatial 435 time-sequential 424, 438, 448

colour stimulus synthesis 20 complete photonic gaps 45, 51 compressive stress 207 conductive oxides 377 continuous nontransparent metal films

76 continuous transparent metal films 7 5 contrast enhancing coatings 431

AR coatings 433 black-layer 433 low-reflectance bandpass filters 434 low-reflectance cut-off filters 434 low-reflectance neutral density filters

433 corrugated thin films 467 coupled mode theory 402, 405 coupling out prism 462 Cr 119 cracking 223 crossed grating 468 cuticle 3, 4, II damage growth rate 3 16 DC magnetron sputtering 146, 319 DC power 159 Debye-Waller factor 295 deep and vacuum ultraviolet spectral

region 257, 335 deep grating 470 defect 54

defect model 209 delamination 223, 312 density 140 deposition methods 297 deposition rate 156, 163 design methods 398, 402, 403 design optimality 90 design parameters 84 design problem 84 design sensitivity 416 design tolerances 84 design total optical thickness 90 deterministic deposition processes 200 dichroic filters 435 dielectric films 69 diffraction 6, 16, 22 diffraction efficiency 248 diffractive optical elements 231 diffuse intermixing 295 diffusion barriers 296, 300 digital light processing (DLPs) 429, 448 digital micromirror devices (DMDs)

428,440 diode sputtering !56 dipole 460 dipole lifetime 461 directive confinement 466 disappearing anode 160 disc methods 21 7 dispersion 40, 49 dispersion control 393 dispersion relation 39, 42 dispersive multilayer reflectors 394 display 359

cathode ray tubes (CRTs) 426 digital micromirror devices (DMDs)

428 direct-view 425 electroluminescent displays (ELs)

429 emissive 426 field emission displays (FEDs) 430 flat panels 426 liquid crystal displays (LCDs) 427 liquid crystals on silicon (LCOSs)

428,439,448 non-emissive 426 plasma display panels (PDPs) 429 projection 425 properties 424

donor mode 54

doping 54 double-chirping method 402 droplets 144 Drude model 40 DyF3 110 effective medium theory (EMT) 39 effective refractive indices 97 efficiency 424, 441, 448 electrochromic architectural glazings

173 electrochromic thin films 166 electroluminescent displays (ELs) 429

organic EL displays 430 TFEL displays 430, 433

electron beam evaporation 297, 298 electron beam photolithography 471 electron-photon interaction 337 emissivity 166 enhanced stability 299 equivalent stack method 404 erbium 462 erosion pattern 158 error self-compensation 98 etching 238 europium chelate 470 EUV/Soft X-ray multilayer mirrors 281 evanescent waves 456 evaporation 131 evaporation rate 133 evolutionary algorithms 415 extinction coefficient 282, 288, 289,

347 Fabry-Perot 248, 463 feasibility demands 95 PEL optics 336, 341 fiber bundle 462, 472 field emission displays (PEDs) 430 film deposition 13 I filter cavities 98 filter prototype I 00 filters 250 fish 9 flame hydrolysis 233 flat bottom pits 3 12 flat-bottom pits 314, 323 fluorescence 455 fluorides II 0, 268 fluorides and oxides 71 Fourier synthesis 402 free electron laser 3 3 5 free space disk 469

Index 483

frequency domain optimisation method 405

Fresnel equations 283 fully radiative modes 459 Gaussian distribution 295 GdF3 110 Ge 119 Gires-Toumois interferometers 395 glass panes 15 5 glazings 3 77 global optimisation 410, 414 glow discharge 155 gold films 119 graded index 363 gradual evolution 91 grain boundary model 21 0 gratings 248 group delay dispersion 393 guanine 3, 9 guided mode 459, 471 guided mode circle 470 guided wave emission 465 guided wave power 467 guided waves techniques 241 hardness 359 heat capacity 247 helical undulator 338 helicoidal 4, 5 HtD2 113,314,324 high reflectivity dielectric mirror 46,

262,288,290,336 holey fibers 55 human eye 424 hydrophobicity 359 hysteresis 163 ideal mirror 46 impedance matching 399 imperfections 295 implantation fluence 462 In20 3 113 Inz03- Sn02 159 in-band and out-band irradiation 341,

344 index ratio 43, 51 in-line coaters 174 in-situ monitoring 297 integrated manufacturing 200 integrated optics 23 5 intensity transmission and reflection

coefficients 84 interdiffusion processes 296

484 Index

interface imperfection 294, 297 interface roughne 294 interference 5, 7, 10, 27 intermixing 295 interphase 360 intrinsic stress 207 ion assisted deposition 195 ion beam sputtering 198, 318, 325 ion beams 146 ion bombardment 368 ion exchange 235 Ion implantation 238, 462 ion plating 142, 325, 471 iridescence 2, 15, 22 LaF3 110 lanthanide ion 470 laser calorimetric measurements 189 laser conditioning 315,319 laser induced damage thresholds 181 layer-thickness-modulation method 402 Iepidoptera 11, 23 light line 41, 53 linear undulator 339 liquid crystal displays (LCDs) 172, 427,

428,449 lithography 237 Lorentz-Lorenz equation 223 low coupling regime 461 low emissivity 166 luminance 424, 432

contrast 424 reflectance 433

magnetic field 157 magnetron sputtering 155, 285, 295 main high reflection zone 94 maximum principle 97 mechanical properties 360 mechanical stress 207 memetic algorithms 411 merit function 84, 411 metal films 73, 118 metal island films 74 metal oxides 137, 220, 343 metallic mirrors 467 metallic mode 164 metallodielectric photonic crystals 52 metals 118 MgF2 110,221 microcavity 463 micro-components 231 mirror heating 340

mirror pairs 399 mixtures 115,122 m-line 242 Mo 119 modal fields 461 momentum transfer 141 morpho 2, 15, 28 MoveMag 172 multilayer dielectric structure 459 multilayer imperfections 294 multilayer mirrors 284 multilayer period 117, 287 multilayers with periodically modulated

thickness 402 multi-photon absorption 325 multistack design 292 Na3AlF6 110 NasAL3F14 111 narrowband mirrors 292 Nb205 113 NdF3 110 needle optimization technique 87 needle variations 88 negative group delay dispersion 397 nipple-array 8 nitrides 112, !59 nodular defect 31 7 nodular ejection pits 312 N-on-1 310 nucleation 63 numerical optimisation 410 omnidirectional mirror 46, 4 7 on-line spectrometric monitoring 182,

194 on-shell method 48, 50 opal 23 ophthalmic lenses 360 optical cavity 5, 340 optical coating technology 181 optical constants 282, 284 optical losses 182 optical multilayer 45 optical plastics 359 optical rotation 7 optical variable devices 382 optimum thickness ratio 290 organic materials 120 output power 346, 353 overcoats 3 14 oxides 112, 159, 266 oxynitrides 112

papilio 18 partial refinement 415 particle bombardment 149 PbTe 118 peening model 213 penetration depth 397 perturbation function 88 phase equilibrium 301 photon flux 338 photonic - crystal 231 photonic band structures 7, 36 photonic crystal 21, 35, 43 photonic gaps 43 photonic integrated circuits 232 photonic solids 7 photothermal methods 182 physical vapor deposition (PVD) 131,

362 planar magnetron !57 planar microcavities 457 plane wave 48 plant 3 plant iridescence 26 plasma 155 plasma density !57 plasma display panels (PDPs) 429 plasma emission monitor 164 plasma enhanced chemical vapor

deposition (PECVD) 360 plasma impulse CVD 148 plasma scalds 312 plasma source 142, 143 plasma surface scalds 316 plastic foils 155 polarisation 8 polarisation conversion 20 polariton 41, 51 polarization 232 polarization converter 441, 449 polarizers 441

birefringent thin film 445 MacNeille 445 metal wire-grid 444 modified MacNeille 445

polarizing beam splitters (PBSs) 440, 441 birefringent thin film 445 Li Li 447 metal wire-grid 444

polymers 234 praseodymium 462

Index 485

prism coupler 242 process tracing 200 propagation losses 242 properties of thin films I 09 proton exchange 236 pulse energy 339 pulse laser deposition 234 pulse length 339, 353 pulse magnetron sputtering 161 pulsed mode 147 quarter-wave mirrors 94, 286 quarter-wave stack 286 radiation interaction 269 radiation pattern 457, 463, 473 radiation stability 340 radiative modes 471 Rayleigh scattering 9 reactive evaporation 133 reactive gas 140 reactive gas partial pressure 164 reactive ion etching 472 reactive mode 164 reactive sputtering !58 real structure 60 refinement 85 reflectance 183 refractive index 69, 144, 282, 344 repetition rate 335, 341 resonance condition 337 Reststrahlen band 41, 52 RF power !59 robust design 417 R-on-1 310 rugate filter 3 78 rutile 163 saturation 339 Sb2S3 117 Sc 119 scattering 71 scratch resistance 363 sea-mouse 22 security devices 359 selenides 117 self-biasing 143 semiconductors 118 sensitivity 411 sensitivity optimisation 416 shading coefficient 169 Si 119 Si3N4 113, 159 SiC 113

486 Index

Silver films 119 simultaneous perturbation

approximation 418 SiO 112, 122,221

production 122 Si02 112, 122, !59, 221,462

granules 122 SiON 113 slab 469 smart windows 173 Snell's law 283 Sn02 159 solar cells 166 solar control coating 169 solar control coatings 166 sol-gel 326 S-on-1 310 spacer layers 98 spacer order 99 spectral flux 338 spectral transfer functions 181 spontaneous emission 457 spontaneous emission lifetime 458 sputter ablation 145 sputter yield 156 sputtering 131, 233 sputtering targets I 08, 123

ceramic target I 08 metallic target 108 production 123 purity 109 specific requirements 108

standardised characterisation techniques 181

standing-wave 315 standing-wave electric field 320 starting design 85 stochastic algorithms 415 stochastic design 291 stochastic quasi-gradient algorithm 418 stop band 47 storage ring free electron laser 358 stress 140, 361 stress values of Al20 3 222 stress values ofNb20 5 223 stress values of Si02 221 stress values of Ta20 5 222 stress values ofTi02 222 structure zone models 67 substrate radiation modes 459 sulfides 117

surface plasmon modes 467 surface tension model 209 surface treatment 360 synchronism angles 244 synchrotron radiation 335 Ta20 5 113, 159, 462,471 tapetal reflectors 10 target 155 target utilization 158 TbF3 110 tellurides 117 tensile stress 207 Thelen's design approach 101 thermal conductivity 187, 247 thermal emission 55 thermal evaporation 196 thermal properties 246 thermal stability 296, 359 thermal stress 208 thermo-optic coefficient 244 ThF4 111 thickness growth 67 thickness ratio 287 thin film growth 59 thin film solar cells 17 4 thin layer removal 96 Ti20 3 113 Ti30 5 113,121

production 121 tilted-front-interface (TFI) mirrors 400 TiO 113,471 Ti02 113, 159 Ti-on-sapphire 393 titanium in-diffusion process 236 total reflectance 41 total scattering 183 transfer matrix 50 transition region 164 transparent conductive coatings 117,

170 tribological properties 365 tubular target 160 tunability 337,346,351 turning point optical monitoring 98 Tyndall 8 Tyndall scattering 6, 9, 23 Ulbricht-sphere 193 ultrafast lasers 393 undulator magnet 336 uptime 175 UVFEL 339

UV NUV -spectrophotometer 183 UV-excimer laser 257 vacuum chamber !55 vacuum ultraviolet 358 w 119 waveguide grating structures 467 waveguides 231 wave-vector diagram 468 WDM filters 98 WDM-Spectrophotometer 195 web coating equipment 176 weighting factors 411 wo3 113,173

wood-pile 51 X-ray diffraction 43 Yablonovite 37, 44 Y ablonovite structure 43 YbF3 110 YF3 110 ZnO 159 ZnS 117 ZnSe 118 ZnTe 118 Zr02 113

production 121

Index 487

Biographies

Preface by Angus Macleod

Angus Macleod has more than 35 years of experi­ence in optical coatings, both in manufacturing and in research. He was born and educated in Glasgow, Scotland, and worked both in industry and academia in Great Britain before joining the University of Ari­zona as Professor of Optical Sciences in 1979. Since 1995, he has been full time with Thin Film Center, Inc., a software, training and consulting company in Tucson that he co-founded in 1986. He is the author of Thin Film Optical Filters, 3rd edition

(Institute of Physics Publishing, 200 I).

Natural Coatings Peter Vukusic, School of Physics, University of Exeter, Exeter, UK

Peter Vukusic received an undergraduate degree in physics and postgraduate degrees in optics from Exe­ter University and Imperial College. He recently re­turned to Exeter in 1997 to begin intensive work on the understanding and characterisation of photonic ef­fects in Nature. He has authored many articles detail­ing newly discovered structural photonic effects, prin­cipally in the order of Lepidoptera. Several of these have led to patents. In addition to understanding these natural structures and effects, his research addresses the application of such natural design protocols to a broad gamut of modem optical technologies. He was

awarded a UK Biological Research Council advanced fellowship to further his work on photonics in invertebrates; the only physicist to receive such an award. As part of a genuine interest to further the public understanding of science, he regularly presents lectures, seminars and workshops on the subject of light and colour in Nature, to schools, societies and non-academic organisations.

490 Biographies

Photonic Structures as Interference Devices Carl G. Ribbing; Alt., Dept. of Materials Science, Uppsala, Sweden

The thesis of Carl G. Ribbing concerned the elec­tronic structure of amorphous semiconductors. Parts of the research was made in Uppsala and parts at Stanford University, California. He re­ceived his PhD in 1973 and Docent degree in 1974 from Uppsala University,. Sweden where he was university lecturer from 1979-2000, when he was promoted professor. He is presently working part­time for Dept. of Functional Materials of theSwedish Defence Research Agency in Linkoping. Since 2000 acting as Topical editor "Optical materials" for Applied optics ".

He has studied bulk and thin film selective optical properties for various solar en­ergy, window coating and space applications. His present interests are focussed on selective thermal emission control. He has published about one hundred scientific papers, conference contributions and patents in the fields mentioned.

Some Fundamentals of Optical Thin Film Growth Norbert Kaiser, Fraunhofer Institute for Applied Optics and Precisions Engineer­ing, Jena, Germany

Norbert Kaiser received his Diplom Physiker in 1974, his Dr. rer. nat. in 1983 and his Dr. habil in 1999 from the University of Jena. After 9 years of research on nucleation and growth of thin films, he joined the Optical Thin Film Group of the Physi­kalisch Technisches Institut, Jena, and was responsi­ble for R&D on coatings for the UV. In 1991 he transferred to the vacuum laboratory of the Physi­kalisch Technische Bundesanstalt. Since 1992 he heads the Optical Thin Film Department and is dep­uty director of the Fraunhofer Institute for Applied Optics and Precision Engineering in Jena. He has au­

thored a large number of papers and patents on nucleation, growth, and structure­related properties of thin optical films and laser induced damage phenomena.

Biographies 491

Design of Optical Coatings Alexander V. Tikhonravov, Research Computer Center Moscow State University, Moscow, Russia

Alexander Tikhonravov received his Master of Sci­ence degree from Physics Faculty of Moscow State University in 1970. In 1973 he received his Ph.D. de­gree and in 1986 his Doctor of Sciences degree in Physics and Mathematics from Moscow State Uni­versity. He is now Professor of Theoretical Physics and director of Research Computing Center of Mos­cow State University. He has authored more than 200 publications, among them book "Basics of Optics of Multilayer Systems (together with Sh. Furman). Alexander Tikhonravov is the inventor of the needle

optimization technique and one of the developers of OptiLayer thin film software family.

Coating Materials Martin Friz, Merck KGaA, Gernsheim, Germany, Friedrich Waibel, Umicore Materials AG, Balzers, Fiirstentum Liechtenstein

Martin Friz received his Diplom Physiker in 1965 and his Dr. rer. nat in 1986 at the University of Tiibingen. He worked for about 2 years on nuclear technology in Munich. Since 1971 he is with Merck KGaA in Darmstadt and Gernsheim in R&D laboratory working on evaluation and development of thin film evaporation materials.

Friedrich Waibel, born 1954 in Unterterzen, Switzer­land, had different jobs in both industry and building trade before he was awarded the high school diploma through evening classes he attended from 1981 to 1984. Afterwards, he studied chemistry at the Univer­sity of Zurich as a working student and graduated with the Diploma for Inorganic Chemistry in 1992. In the group of Prof. Dr. John R. Gunter he performed his Ph.D. studies on ,Thermally induced oxygen uptake and release in the Ba-Cr-0-system", and was awarded in 1999 by the University of Zurich with the title Dr. sc.nat. Since 2000 he has been working for Unaxis

Materials AG, where he is responsible for the R&D on PVD materials for optical applications.

492 Biographies

Film Deposition Methods Hans K. Pulker, Institute oflon Physics, University ofinnsbruck, Austria

•

Hans K. Pulker was born in Austria and studied at the Universities of Vienna and Innsbruck where he received his Dr. phil. He worked many years in various thin film research and develop­ment laboratories of the Balzers AG in Liechten­stein. I973 he received his Dr.habil. from the Univer­sity of Innsbruck where he later became Profes­sor at the Institute oflon Physics and Head of the Thin Film Technology Group. 1998 he started to

~ work full time at the University. He has more than 35 years experience in deposition and characterization of thin films. He wrote the monograph Coatings on Glass (2nd rev. edn. Elsevier, Amsterdam, 1999), au­thored many patents and published a large number of papers.

Large Area Deposition Gunter Brauer, Fraunhofer Institute for Thin Films and Surface Engineering, Braunschweig, Germany

Gunter Brauer received his physics diploma in 1980 and his doctorate degree in 1984, both from the University of Giessen, where his re­search work was focussed in the field of ion beam sputtering. In 1984 he joined Leybold­Heraeus in Hanau as a member of the R&D group for thin film technology. He was mainly engaged in the development of reactive sputter processes for the production of dielectric lay­ers on large areas. From 1988 through 1992,

he was manager of R&D groups for coatings on data storage media and large area glass coating. From 1992 through 1999, he has headed the R&D department for thin film technology at Leybold. Since 1999 Gunter is professor at the Technical University of Braunschweig and director of the Fraunhofer institute for thin films and surface engineering (1ST) in Braunschweig as well as the Fraunhofer institute for electron beam and plasma technology (FEP) in Dresden.

Biographies 493

Characterization and Monitoring Detlev Ristau, Laser Zentrum Hannover, Hannover, Germany

Detlev Ristau was born in Hannover, Germany in 1957. He completed his diploma study at the Uni­versity of Hannover in 1982 under the direction of H. Welling. From 1982 to 1983 he worked at the Department of Electrical Engineering of the Rice University, Houston, as a research scholar. Since 1983 he is active in the field of optical thin film technology, starting as a research assistant at the Institute for Quantum Optics, University of Han­nover. After receiving his Ph.D. degree in 1988, he

was employed as the leader of the Thin Film Group at the Institute for Quantum Optics. Since 1992 he is responsible for the Department of Thin Film Technology at the Laser Zentrum Hannover. He is involved in the development of characteri­zation techniques and deposition processes for optical thin film components.

Mechanical Stress in Optical Coatings Georg N. Strauss, Thin Film Technology Group, Institute oflon Physics, Univer­sity of Innsbruck, Austria

Georg N. Strauss was born in Styria, Austria and studied physics at the Institute of Experimental Phys­ics at the University of Innsbruck. He received his Mag. rer. nat. in 1997 in the field of thin film technol­ogy and solid state physics with a work on stress in di­electric thin films. In 1999 he changed to the Institute of Ion Physics at the University of Innsbruck. During 1997 and 2002 Georg worked in several international projects concerning the investigation and analysis of the plasma of different ion and plasma enhanced pvd processes. At the moment he is in the last stage to fin­

ish his thesis. Georg authored a number of papers on mechanical and optical prop­erties of thin films as well as on plasma properties of different pvd processes.

494 Biographies

Optical thin film for microcomponents Ludovic Escoubas and Francois Flory, Institut Fresnel, Marseille, France

Ludovic Escoubas graduated from the Ecole Nation­ale Superieure de Physique de Marseille (ENSPM), France, in 1994 and received a PhD in Optics in 1997. Since 1998, he has been a senior lecturer teaching Optics at the ENSPM and doing his research work at the Fresnel Institute in the group "Micro­structured Optical Components". His current research interests are integrated optics, characterizations using guided waves, diffi·active optics, gas sensors, ion im­

plantation and optical interference coatings, and more generally microstructured optical components. He has authored more than 40 papers and communications.

Francois Flory received his PhD in 1978 and his "these d'Etat" in 1985 in light scattering and in the re­lation between optical properties and the microstruc­ture of thin films, respectively. He is now Professor in Optics at the Ecole Nationale Superieure de Phy­sique de Marseille. He is editor of the book "Thin Films for Optical Systems" and of more than 100 pa­pers and communications. His current research inter­est is now in the field of optical micro components.

Optical coatings for the DUVNUV Roland Thielsch, Southwall Europe, Dresden, Germany

Roland Thielsch studied physics at the Technical University Dresden. He received his Diplom Physiker in surface science and electron physics in 1978 and his Dr. rer. nat. in 1990 from the Technical University Dresden. From 1978 - 1993 Roland worked in a research group "Vacuum physics and vacuum technology" at the Physics department of the Technical University as staff research scientist in the various fields of thin film deposition technologies. In 1993 he joined the Institute of Solid state physics and material research in Dresden and in the spring of 1996 the Department of optical coatings of the Fraunhofer Institut fiir Angewandte Optik und Fein­

mechanik. From 1997 until he left the Fraunhofer Institut Roland worked as scien­tist in charge for the development of UV optical coatings. In January 2000 he joined Southwall Europe GmbH, where he held the position of a senior process engineer in the field of large area deposition of optical coatings onto plastic web.

Biographies 495

Roland authored a number of papers and patents on optical and structural proper­ties of thin films as well as on related hardware aspects.

Multilayer Coatings for EUV /X-ray Mirrors Sergey Yulin, Kharkov State Polytechnic University, Kharkov, Ukraine and Fraunhofer Institute for Applied Optics and Precision Engineering, Jena, Germany

Sergey Yulin received his Diplom Physiker in 1989 and his Dr. rer. nat. in 1998 from the State Kharkov University. From 1989 to 1999 his work was focused on research and development of EUV/Soft X-ray optics on the base of artifi­cial multilayer coatings. He has been a staff sci­entist at Fraunhofer Institute for Applied Optics and Precision Engineering in Jena since 1999, where his work has armed on Si and Sc-based

multilayer-coated optics for different applications. Since 2000 he heads the Soft­X-Ray and EUV-Coatings group. He has published over 20 scientific papers and patents.

Laser Resistant Coatings Christopher Stolz and Franyois Y. Genin, Lawrence Livermore National Labora­tory, National Ignition Facility, Livermore, CA, USA

Christopher Stolz received an undergraduate degree in Applied Mathematics, Engineering, and Physics from the University of Wisconsin - Madison and is currently pursuing a graduate degree in Material Science. He joined Law­rence Livermore National Laboratory in 1989 and has worked on laser coatings for both the Atomic Vapor Laser Isotope Separation (A VLIS) and Inertial Confinement Fusion (ICF) laser programs. He is currently respon­sible for the large-aperture high-fluence mir­

rors and polarizers to be installed on the National Ignition Facility (NIF). His re­search interests include laser resistant coatings and surfaces and laser damage characterization tools such as photothermal microscopy. He is a cochair for the annual Laser-Induced Damage in Optical Materials Symposium and has authored and coauthored over 40 papers.

496 Biographies

Fran<;ois Y. Genin received his B.S. in Electro­chemical and Electrometallurgical Engineering from the Institut Polytechnique de Grenoble in France in 1986. He was granted an IBM Fel­lowship to pursue graduate studies at Carnegie Mellon University that led to a Masters of En­gineering and a Ph.D. in Metallurgical Engi­neering and Materials Science in 1988 and 1991, respectively. He joined Lawrence Liver­more National Laboratory in 1991 as a Post Doctoral Scientist in the Chemistry and Materi­als Science Department. During his career at

LLNL, he worked for the National Ignition Facility (NIF) on laser optical damage and advanced optics polishing. He also worked on laser-materials interactions and femtosecond laser processing. He currently holds a joint position in NIF and in the Medical Division of the Physics and Applied Technology Directorate. He has au­thored/co-authored about 50 papers in the area of thin films, laser processing, and biomaterials and hold several patents in medical technology. He also has co­organized symposia on femtosecond phenomena, and guest edited a special issue on Femtosecond Laser Processing in Journal of Applied Physics A. Finally, in 1996, he co-founded a medical device company, Berkeley Advanced Biomaterials Inc. that manufactures synthetic bone graft substitutes used in orthopedic and den­tal surgery.

Coatings for UV -Free Electron Lasers Alexandre Gatto, Fraunhofer Institute for Applied Optics and Precision Engineer­ing, Jena, Germany

Alexandre Gatto graduated from the Ecole Nationale Superieure de Physique de Mar­seille in 1995. In 1996, he worked as a mili­tary scientist in Institut de Recherche sur les Phenomenes Hors Equilibre on UV photo­ablation process of nuclear materials. He ob­tained his PhD in 1999 after three years of research in Laboratoire d'Optique des Sur­faces et des Couches de Minces de Marseille

(Institut Fresnel). He joined in 1999 the Fraunhofer Institute for Applied Optics and Precision Engineering in Jena as project manager in the field of DUV-VUV resistant optics. He is involved in the development of radiation resistant VUV coatings for Excimers and Free Electron Lasers.

Biographies 497

Optical Coatings on Plastics Ludvik Martinu and Jolanta E. Klemberg-Sapieha, Ecole Polytechnique de Mont­real, Montreal, Canada

Ludvik Martinu obtained his PhD degree in Experi­mental Physics from the Charles University in Pra­gue, Czech Republic, in 1985. In 1988 he joined the Ecole Polytechnique in Montreal, Canada, where he is now Full Professor and Associate Director of the Thin Film Research Center (GCM). His main re­search interests are in the area of physics and tech­nology of thin films, in which he particularly focuses on new plasma-based fabrication processes and new materials for optical and functional coatings, optical filters, and photonic devices. He is author or co­author of more than 200 publications. He is active in

numerous scientific and organizing committees, in particular, the Society of Vacuum Coaters (SVC), International Conference on Metallurgical Coatings and Thin Films (ICMCTF), and Sigma Xi- The Scientific Research Society. He is also associate editor of "Plasmas and Polymers" published by Kluwer/Plenum.

Jolanta-Ewa Klemberg-Sapieha obtained her Master degree in Chemical Engineering and PhD degree in Materials Science from the Technical University in Lodz, Poland. Since 1978, she has been with the De­partment of Engineering Physics, Ecole Polytech­nique, Montreal, Canada, where she pursues her re­search as a Senior Research Scientist. She has many years of experience in the area of plasma processing and surface and interface analysis of materials, in par­ticular polymers. More recently, she focuses on mi­cro- and nanomechanical properties of thin films and on hard and ultra-hard protective and metallurgical coatings. She is an author or co-author of more than

150 publications and member of numerous research societies.

498 Biographies

Interference Coatings for Ultrafast Optics Gabriel Tempea, Vladislav Yakovlev and Ferenc Krausz , Vienna University of Technology, Wien, Austria

Gabriel Tempea received his Dipi.-Ing. degree in technical physics from the Technical University of Bucharest in 1996 and his PhD-degree from the Vi­enna University of Technology in 1999. Since Janu­ary 2000 he has been working as research assistant at the Photonics Institute in Vienna. He is currently at the CELIA Labs in Bordeaux, France for a half­year post-doctoral research stay. His research inter­ests focus on strong-field physics and ultrafast phe­nomena, including the design of multilayer interfer­ence coatings for femtosecond lasers. He is author or co-author of more than 25 articles published in re­viewed scientific journals.

Ferenc Krausz was born in Mor, Hungary on May 17, 1962. He received his M. S. in Electrical Engi­neering from the Budapest University of Technology in 1985, his Ph. D. in Quantum Electronics from the Vienna University of Technology in 1991, and his "Habilitation" degree in the same field from the same university in 1993. In 1998 he joined the Department of Electrical Engineering as an Associate Professor and became a Full Professor in the same department in 1999. His research interests have included nonlinear light­matter interactions, femtosecond light pulse genera­tion from the infrared to the x-ray spectral range, and

studies of ultrafast microscopic processes. His contributions to these fields were recognized by the 1994 Physics Award (Fritz-Kohlrausch Award) of the Austrian Physical Society, by the Carl-Zeiss-Award of the Ernst Abbe Foundation in Ger­many in 1998 and by the Wittgenstein Prize of the Austrian Science Fund in 2002. He is co-founder of Femtolasers GmbH, a Vienna-based company specializing in cutting-edge femtosecond laser sources, and speaker of the Center of Excellence "Advanced Light Sources "of the Austrian Science Fund. Ferenc Krausz is married, he and his wife, Angela, have two children: Anita, born in 1989 and Martina, born in 1993.

Biographies 499

Vladislav Yakovlev received his BSc in physics from the Novosibirsk state university (Russia) in 1997 and his master's degree in 1999 from the same university. Since 2000 he has been working in the Institute of Photonics, Vienna, where he was in­volved in theoretical investigations in the field of ultrafast phenomena, including the design of dis­persive mirrors.

Optical Coatings for Displays Li Li, National Research Council, Ottawa, Ontario, Canada

Li Li received her Bachelor degree in optical engi­neering from Zhejiang University in 1984, and her Master and Doctor degrees in opto-electronics from Shanghai Institute of Technical Physics (SITP), the Chinese Academy of Sciences in 1986 and 1989, re­spectively. After graduation, she worked briefly as a research associate at SITP. Between Jan. 1990-May 1991, she was a visiting scientist at the National Re­search Council of Canada (NRCC). Since May 1991 she has been with the Thin Films Group of the Insti­tute for Microstructural Sciences of NRCC. She is currently a senior research officer. Her major re­search interests are optical coatings and their appli­

cations in various fields such as electronic displays, optical storage and telecom­munications. She is the inventor or co-inventor of eight issued US patents and has authored more than 30 papers in refereed journals and conference proceedings.

500 Biographies

Optical thin films for spontaneous emission control Herve Rigneault CNRS Institut Fresnel, Marseille, France

Herve Rigneault received his Engineer Diploma from the Ecole Nationale Superieure de Physique de Mar­seille in 1991, his PhD diploma in Optics in 1993. He joined the Centre National de Ia Recherche Scientifique in 1994 as a full time researcher in Optical Physics and worked for 5 years on spontaneous emission control for ions and molecules embedded into dielectric thin films. He received his Dr. habil in 2000 from the University of Marseille. Since 2000 he heads the 'Microstructured Op­tical Components' group of the Fresnel Institut. He field of research is now moving at the optics/biology inter­face where he develops ultra-sensitive apparatus to

study molecular diffusion in living cells.

Epilogue Ric P. Shimshock, MLD Technologies, Mountain View, CAUSA

Ric Shimshock received his MSc. in Optical Engineering from the University of Arizona Optical Sciences Center (OSC) in 1987. His work at the OSC focused on the development and characterizations of transition metal nitri­des for use as high temperature solar selective absorber coatings in photothermal power sys­tems. After joining Optical Coating Laboratory Inc (OCLI) as a Project Engineer, he worked in

the Government Aerospace group from 1979-1986 supporting various projects as­sociated with space based remote sensing, infrared imaging systems and laser coa­tings. He was involved in the transfer of new materials and processes to the pro­duction environment. He worked at Deposition Sciences Inc. (DSI) as Program Manager from 1986-1995 where he developed high performance products using various processes such as LPCVD, PECVD, Long Throw Sputtering, Ion Assisted Deposition and Microwave Assisted Sputtering. He was hired by Southwall Technologies Inc in 1995 as the Director of Advanced Products and worked on supporting various web based coating technologies including sputtering AC and DC magnetron, PECVD and wet chemistries for display, solar control and archi­tectural applications. He is currently employed at MLD Technologies working on scaling an ultra low loss IBS processes. He is active in the OSA, is currently on the Board of Directors of the SVC, and involved with the ICCG and AIM CAL or­ganizations.

Springer Series in

OPTICAL SCIENCES

New editions of volumes prior to volume 6o

1 Solid-State Laser Engineering By W. Koechner, 5th revised and updated ed. 1999, 472 figs., 55 tabs., XII, 746 pages

14 Laser Crystals Their Physics and Properties By A. A. Kaminskii, 2nd ed. 1990, 89 figs., 56 tabs., XVI, 456 pages

15 X-Ray Spectroscopy An Introduction By B. K. Agarwal, 2nd ed. 1991, 239 figs., XV, 419 pages

36 Transmission Electron Microscopy Physics ofimage Formation and Microanalysis By L. Reimer, 4th ed. 1997, 273 figs. XVI, 584 pages

45 Scanning Electron Microscopy Physics ofimage Formation and Microanalysis By L. Reimer, 2nd completely revised and updated ed. 1998, 260 figs., XIV, 527 pages

Published titles since volume 6o

6o Holographic Interferometry in Experimental Mechanics By Yu. I. Ostrovsky, V. P. Shchepinov, V. V. Yakovlev, 1991, 167 figs., IX, 248 pages

61 Millimetre and Submillimetre Wavelength Lasers A Handbook of cw Measurements By N. G. Douglas, 1989, 15 figs., IX, 278 pages

62 Photoacoustic and Photothermal Phenomena II Proceedings of the 6th International Topical Meeting, Baltimore, Maryland, July 31 - August 3, 1989 By J. C. Murphy, J. W. Maclachlan Spicer, L. C. Aamodt, B.S. H. Royce (Eds.), 1990, 389 figs., 23 tabs., XXI, 545 pages

63 Electron Energy Loss Spectrometers The Technology of High Performance By H. Ibach, 1991, 103 figs., VIII, 178 pages

64 Handbook of Nonlinear Optical Crystals By V. G. Dmitriev, G. G. Gurzadyan, D. N. Nikogosyan, 3rd revised ed. 1999, 39 figs., XVIII, 413 pages

65 High-Power Dye Lasers By F. J. Duarte (Ed.), 1991, 93 figs., XIII, 252 pages

66 Silver-Halide Recording Materials for Holography and Their Processing By H. I. Bjelkhagen, 2nd ed. 1995, 64 figs., XX, 440 pages

67 X-Ray Microscopy III Proceedings of the Third International Conference, London, September 3-7, 1990 By A. G. Michette, G. R. Morrison, C. J. Buckley (Eds.), 1992, 359 figs., XVI, 491 pages

68 Holographic Interferometry Principles and Methods By P. K. Rastogi (Ed.), 1994, 178 figs., 3 in color, XIII, 328 pages

69 Photoacoustic and Photothermal Phenomena III Proceedings of the 7th International Topical Meeting, Doorwerth, The Netherlands, August 26-30, 1991 By D. Bicanic (Ed.), 1992, 501 figs., XXVIII, 731 pages

Springer Series in

OPTICAL SCIENCES

70 Electron Holography By A. Tonomura, 2nd, enlarged ed. 1999, 127 figs., XII, 162 pages

71 Energy-Filtering Transmission Electron Microscopy By L. Reimer (Ed.), 1995, 199 figs., XIV, 424 pages

72 Nonlinear Optical Effects and Materials By P. Gunter (Ed.), 2ooo, 174 figs., 43 tabs., XIV, 540 pages

73 Evanescent~aves From Newtonian Optics to Atomic Optics By F. de Fornel, 2001, 277 figs., XVIII, 268 pages

74 International Trends in Optics and Photonics ICO IV By T. Asakura (Ed.), 1999, 190 figs., 14 tabs., XX, 426 pages

75 Advanced Optical Imaging Theory By M. Gu, 2000, 93 figs., XII, 214 pages

76 Holographic Data Storage By H.J. Coufal, D. Psaltis, G.T. Sincerbox (Eds.), 2000 228 figs., 64 in color, 12 tabs., XXVI, 486 pages

77 Solid-State Lasers for Materials Processing Fundamental Relations and Technical Realizations By R. Ifflander, 2001, 230 figs., 73 tabs., XVIII, 350 pages

78 Holography The First so Years By J.-M. Fournier (Ed.), 2001, 266 figs., XII, 460 pages

79 Mathematical Methods of Quantum Optics By R.R. Puri, 2001, 13 figs., XIV, 285 pages

80 Optical Properties ofPhotonic Crystals By K. Sakoda, 2001, 95 figs., 28 tabs., XII, 223 pages

81 Photonic Analog-to-Digital Conversion By B.L. Shoop, 2001, 259 figs., 11 tabs., XIV, 330 pages

82 Spatial Solitons By S. Trillo, ~.E. Torruellas (Eds), 2001, 194 figs., 7 tabs., XX, 454 pages

83 Nonimaging Fresnel Lenses Design and Performance of Solar Concentrators By R. Leutz, A. Suzuki, 2001, 139 figs., 44 tabs., XII, 272 pages

84 Nano-Optics By S. Kawata, M. Ohtsu, M. Irie (Eds.), 2002, 258 figs., 2 tabs., XVI, 321 pages

85 Sensing with Terahertz Radiation By D. Mittleman (Ed.), 2003, 207 figs., 14 tabs., XVI, 337 pages

86 Progress in Nano-Electro-Optics I Basics and Theory of Near-Field Optics By M. Ohtsu (Ed.), 2003, 118 figs., XIV, 161 pages

87 Optical Imaging and Microscopy Techniques and Advanced Systems By F.-J. Kao, P. Ti.iri.ik (Eds.), 2003, 133 figs., XIV, 475 pages

Springer Series in

OPTICAL SCIENCES

88 Optical Interference Coatings By N. Kaiser, H.K. Pulker (Eds.), 2003, 203 figs., 50 tabs., XVI, 504 pages