infrastructure of thin films division in imp
DESCRIPTION
Infrastructure of Thin Films Division in IMP. Hubert Głowiński and Janusz Dubowik, IFM PAN. Outline. VNA-FMR FMR PIMM. Dynamic measurements. VSM PPMS MOKE. Static measurements. GIXRD XRF. Structural characterization. Field sweep FMR. - PowerPoint PPT PresentationTRANSCRIPT
Infrastructure of Thin Films Division in IMP
Hubert Głowiński and Janusz Dubowik, IFM PAN
Outline
VNA-FMRFMRPIMM
GIXRDXRF
VSMPPMSMOKE
Static measurements
Dynamic measurements
Structural characterization
Field sweep FMR
• During field sweep FMR experiment magnetization vector changes its direction
FMR
Lock-in
Gaussmeter
Microwave bridge
Field sweepcontroller
• X-band spectrometer 9.18 GHz
• Field up to 11 kOe
VNA-FMR
• Frequency up to 40 GHz
Port 1 Port 2
Próbka
External magnetic field
Microwave field
Coplanar waveguide
On frequency sweep FMR experiment magnetization vector does not change its direction
CPW – coplanar waveguide
Electric field lines
Magnetic field lines
External magnetic field
I. Neudecker et al. JMMM 307 (2006) 148–156
Simulated currentHomogenous current
Electric field lines
Magnetic field lines
Channelized Coplanar Waveguide
The other determining factor in the high frequency performance of the vias is the spacing between the rows of the vias. The wider the spacing, the lower the cutoff frequency and the closer the spacing the higher the cutoff frequency.
The vias are acting as a microwave wall
http://mpd.southwestmicrowave.com/pdf/Launch_Report.pdf
VNA-FMR
VNA
Gaussmeter
Helmholtz’s coils
Power supply
VNA-FMR
0 2000 4000 6000 8000 10000 12000
0,2300
0,2301
0,2302
0,2303
0,2304
0,2305
0,2306
0,2307
0,2308
0,2309
0,2310
0,2311
0,2312
0,2313
A [a
.u.]
Field [Oe]
PolarizerFree
Analyzer
20 GHz
SiTiAuCoAuCoAuCoAuCoAuCoAu
Field sweep modeDifferent frequencies
Frequency sweep modeDifferent fields
Pulsed inductive microwave magnetometer (PIMM)
Port
Sample
External magnetic field
Pulse magnetic field
Port
Pulse generator
Sampling oscilloscope
Trigger
Bandwidth 20 GHzPulse risetime 55 psPulse amplitude 10 V
PIMM
Pulse generator
Oscilloscope
Power supply
Helmholtz coils
Vibrating Sample Magnetometer – VSM
• Frequency: 35 Hz• Dual pickup coils• Magnetic field: up
to 16 kOe• Temperature: -
100oC to 250oC
M.Matczak, Thesis, Politechnika Poznańska, Poznań, 2011
Generator
Gaussmeter
Pickup coils
Power supply
Lock-in
Hallotron
Glass pipe
Loudspeaker
PC
PHYSICAL PROPERTY MEASUREMENT SYSTEM
(PPMS)• Options
– VSM– Resistance– Torque magnetometer
• PPMS system properties:– Temperature range: 2 K -
350 K.– Magnetic field: up to 9
tesla.– Magnetic field ramp rate:
determined by magnet and power supply.
– Temperature and magnetic field may be ramped during the measurement.
MOKE
Stepper motor
Elektromagnet
PC
Gaussmeter
Power supply
Detector
Lens
Lens
Mirror
Modulator Analyzer
Lock-in
Polarizer
Laser
Modulator
Z axis
Wavelength λ=640 nm
M.Matczak, Thesis, Politechnika Poznańska, Poznań, 2011
MOKE – device setup1. Laser diode2. Polarizer3. Modulator4. Lens 5. Electromagnet6. Sample holder and table7. Mirror8. Analyser9. Lens10. Detector (fotodiode)11. Magnetic field sensor
M.Matczak, Thesis, Politechnika Poznańska, Poznań, 2011
MOKE
-8 -6 -4 -2 0 2 4 6 8
-300
-280
-260
-240
-220
-200
-180
-160
-140
-120
-100
-80
-60
-40
-20
0
20
40
Ti4/Au60/(Co0.8/Au1)3/Au2/Co1.5/Au2/Co3/Au5
M [a
.u.]
H [kOe]
0 2 4 6 8 0 2 4 6 8
SiTiAuCoAuCoAuCoAuCoAuCoAu
XRF
• We can measure:– Thickness of thin films
(up to 200 nm)– Chemical elements
composition1 – X-ray source, 2 - collimator,
3 – sample holder, 4 - detector
K. Załęski, Masters thesis, UAM Wydział Fizyki, Poznań 2007 Wikipedia
Multichannel analyzer 10 keV / 1024 channels
Characteristic radiation
GIXRD
Seifert, model XRD 3003, X-ray source Cu-K (wavelength λ=0.15419 nm)
X-ray source
sample
detector
aperture
P. Kuświk, PhD dissertation, IFM PAN, Poznań, 2010
Allows to measure thickness of thin films
2θ varies 0o - 10o
Interference of the wave reflected from surface of the film and the surface of the substrate results in Kiessiga fringes.
Summary
• We are able to characterize magnetically samples (effective fields, anisotropy, damping parameter)
• We are able to characterize structure of the sample (film thickness, sublayer thickness, chemical composition)
Thank you for your attention!