International Advisory BoardS.E. Alexandrov (Russia)M.D. Allendorf (USA)J-O. Carlsson (Sweden)C. Cobianu (Romania)D. Davazoglou (Greece)A. Figueras (Spain)R.A. Fischer (Germany)I.L. Fragalà (Italy)K.A. Gesheva (Bulgaria)M.L. Hitchman (UK)C.R. Kleijn (The Netherlands)F. Maury (France)T. Mantyla (Finland)M. Pemble (Ireland)

InternationalOrganizing Committee Davide BarrecaISTM-CNR, Padova, Italydavide.barreca@unipd.it

Mark T. Swihart SUNY-Buffalo, USAswihart@eng.buffalo.edu

Ray AdomaitisUniversity of Maryland, USAadomaiti@umd.edu

Symposium topics include:Symposium topics include:

CVD fundamentalsCVD fundamentals

Novel CVD precursorsNovel CVD precursors

Innovative CVD strategiesInnovative CVD strategies

Non-conventional materials and complex Non-conventional materials and complex

structuresstructures

Process control and diagnosticsProcess control and diagnostics

Novel processing tools and reactorsNovel processing tools and reactors

Technological applications of CVDTechnological applications of CVD

www.eurocvd17.org

Confirmed Invited Speakers include:•Michael Heuken, AIXTRON AG, Germany •Susan Krumdieck, University of Canterbury, New Zealand •Graziella Malandrino, Università di Catania and INSTM, Italy •Sanjay Mathur, University of Cologne, Germany •Lisa McElwee-White, University of Florida, USA •Hideki Matsumura, JAIST, Japan •Kostya (Ken) Ostrikov, CSIRO, Australia •Ivan P. Parkin, University College London, England •Joan Redwing, Penn State University, USA •Mikko Ritala, University of Helsinki, Finland •Gary W. Rubloff, University of Maryland, USA •Andranik Sarkissian, Plasmionique, Quebec, Canada •Ruud Schropp, Utrecht University, The Netherlands •John White, AKT, an Applied Materials Company, USA