low mass rui de oliveira (cern) july 2 20151. outline aluminum circuits –material budget /general...
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![Page 1: Low Mass Rui de Oliveira (CERN) July 2 20151. Outline Aluminum circuits –Material budget /General possibilities –Micro-via –Finishing possibilities –Different](https://reader035.vdocument.in/reader035/viewer/2022062806/5697bf891a28abf838c8a425/html5/thumbnails/1.jpg)
Low Mass
Rui de Oliveira (CERN)
July 2 2015 1
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Outline
• Aluminum circuits– Material budget /General possibilities– Micro-via– Finishing possibilities– Different examples
• Wire bonding alternatives– Embedded active devices
July 2 2015 2
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Material budget
Material Radiation length[cm]
Density[gr/cc]
Resistivity[uohms*cm]
Gold 0.3 19.3 2.4
Copper 1.4 9.0 1.7
Aluminum 8.9 2.7 2.7
Glass epoxy 19.4
Polyimide 29.0
Beryllium 35.3 1.9 3.3
Copper is close to 6.5 times less transparent than aluminumAnd aluminum has only 1.6 times the resistivity of copperPolyimide is 1.5 times better than glass epoxy.
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Possibilities• Aluminum
– Laminated:• Foils of 15 , 30 or 50 um (crystalline)
– Vacuum deposited:• From 5 to 30um (Amorphous)
– Pattern size:• Minimum line width : 4 time the thickness (3 times for copper)
• Dielectrics– Polyimide :
• 12um , 25um, 50um, 75um• Liquid polyimide from 1 to 10um
– Photoimageable coverlay (modified epoxy):• 25um, 50um , 64um
– Epoxy glue:• 5um (liquid), 12um , 25um
• Hole or vias– Minimum 0.05mm diameter
• Sizes– Up to 2m x 50cm for single sided flex– Up to 1m x 30cm for double sided flex with plated through holes– Up to 60cm x 10 cm for multilayer structures
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Outline
• Aluminium circuits– Material budget /General possibilities– Vias/Microvias– Finishing possibilities– Different examples
• Wire bonding alternatives– Embedded active devices
July 2 2015 5
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Al
Cu
Polyimide
Glue
Cooper Etching
Dielectric Etching Anisotropic
Glue removal
Metallization
Copper etching
Al deposition
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Micro-via , Process with Laminated PI
Minimum Via : 50umProcessing temp : 170 degProcessing temp in study:
20deg
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aluminium tracks layer n-1
Glue
Deposited aluminium
Polyimide
aluminium tracks layer n-1
Glue
Polyimide
cavityno cavity
Glue removed chemically
Glue removed byMicro-sand blasting
Glue removal
04/21/23 7
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Al
Polyimide
UV exposure + development+curing
Metallization
Al deposition
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Process with liquid Polyimide
Minimum Via : 20umHigh temp process : 300 deg
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Outline
• Aluminum circuits– Material budget /General possibilities– Vias/Micro-vias– Finishing possibilities– Different examples
• Wire bonding alternatives– Embedded active devices
July 2 2015 9
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Finishing possibilities
• For wedge aluminum bonding– No treatment in case of Crystalline Aluminum– Chemical NI/Au Plating on Amorphous deposited
Aluminum
• For Au Bonding– No treatment in case of Crystalline Aluminum– Chemical NI/Thick Au Plating on Amorphous deposited
Aluminum
• For soldering– Chemical NI/Au Plating
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Bonding Close up view example
Ladder Bonding AL bus
Plating defect10umAl + 0.1umZinc + 10umNi + 0.1umAuWith sand blast pre-treatment
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Outline
• Aluminum circuits– Material budget /General possibilities– Vias/Micro-vias– Finishing possibilities– Different examples
• Wire bonding alternatives– Embedded active devices
July 2 2015 12
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Al double Sided flex with plated through Holes
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Via : 300umDouble sided
2x 30um Vacuum deposited aluminum200um line and space25um Kapton supportSize 300mm x 20mm
NI/AU finishing
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Via : 100um5 Aluminum layers
3x10um Vacuum deposited aluminum2x50um laminated aluminum layer
100um line and 50 space12um Kapton layersSize 160mm x 16mm
Staircase shape on one side170 buses produced
NI/AU finishing
5 layers ALICE Pixel Bus
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8 layer ATLAS IBL Al/Cu mixed multilayer
Via min : 300um5 Copper layers
2x50um laminated aluminum layer70um line and 50um space
25um Kapton layersSize 400mm x 20mm
Semi flex rigid structureRigidizers near connectors
100 buses producedMilli-ohms level resistivity check
200 to 300 Mrad compatibleNI/AU finishing
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outline
• Aluminum circuits– Material budget /General possibilities– Vias/Micro-vias– Finishing possibilities– Different examples
• Wire bonding alternatives– Embedded active devices
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Embedded Chip situation in industry
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Laser micro-viasThick copper pads on chip (15um)100um vias100%compatible with PCB production lineRCC gluesThick or thin chip
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Embedded Chip situation at CERN
Glue the chip on 25um kapton180deg, 1h ,20 bars under vacuum
Compensate the Chip thickness180deg, 1h ,20 bars under vacuum
Glue a new layer of 25um180deg, 1h ,20 bars under vacuum
Chemical hole etching
The 3 last steps can be repeated for multilayer AL interconnection
Vacuum Aluminium plating
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Embedded Chip at CERN
04/21/23 19Rui de Oliveira
Pixel Array: 1152 x 576, ~ 0.7 MpixelsPitch: 18.4 µmActive area: ~ 10.6 x 21.2 mm2
Row
sequ
ence
r,
1152 column-level discriminatorsZero suppression logic
Current Ref.Bias DACs
Control(R.O. and JTAG) PLL 8b/10b
Memory IP blocks
Memory managementR
ef. V
olta
ges
Buf
feri
ng
Pixels analog outputs for test
• Mimosa 26 sensor
Bonding pads: Shape : square 80um Pitch : 100um Position : peripheral Pad metal: Al
Chip thickness: 50um
Chip not flat
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Pixel Array: 1152 x 576, ~ 0.7 MpixelsPitch: 18.4 µmActive area: ~ 10.6 x 21.2 mm2
Ro
wse
qu
ence
r,
1152 column-level discriminatorsZero suppression logic
Current Ref.Bias DACs
Control(R.O. and JTAG) PLL 8b/10b
Memory IP blocks
Memory managementR
ef. V
olt
ages
B
uff
erin
g
Pixels analog outputs for test
Pixel Array: 1152 x 576, ~ 0.7 MpixelsPitch: 18.4 µmActive area: ~ 10.6 x 21.2 mm2
Ro
wse
qu
ence
r,
1152 column-level discriminatorsZero suppression logic
Current Ref.Bias DACs
Control(R.O. and JTAG) PLL 8b/10b
Memory IP blocks
Memory managementR
ef. V
olt
ages
B
uff
erin
g
Pixels analog outputs for test
Layout & block diagram redistribution layer
Mimosa 26 sensor
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Embedded Chip at CERN
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Photo imaged micro-viasStd aluminum pads on chip (no post process)40um micro-vias 2 Aluminium layersNo copperThinned chip 50 umNi/Au plating on the connectorsMimosa chipMade in collaboration with Mr Dulinski
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Embedded Chip at CERN
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Lithography details of interconnecting metal (two layers of ~10 µm thick Al) deposited on top of the pixel sensor
“Shadow” of metal measured by pixel sensor in visible light
Auto-radiography of metal measured by pixel sensor using 5.9 keV Xrays (55Fe)
Results
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9 chips
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Daisy chain chips structure
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Problems or things to be tested
• Chip/Kapton CTE mismatch creating small bowings
• Test a room temp epoxy to avoid bowings
• Test a 2 layer metal above chips• Test a back-kapton-less structure
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Back-Kapton-less structure
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Positive things
• Already positive results after only 3 trials
• Direct Al to Al contact• No assembly , no soldering , no
bonding• Flat structure • Flexible• Low massJuly 2 2015 30
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• Do gluing tests with room temperature glues
• Build new 9 chip Embedded structure if chips available
• Radiation /Climatic /electrical test.
Future
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