magazine autumn99 best

1
Decreasing silicon allowance for sili- cides places new requirements on the quality of the silicon/silicide interface for minimal roughness. Porous low-k materials are inherently non-homogeneous in structure, unlike SiO 2 . Singh explained that tantalum- based barrier materials for copper may introduce stress-related reliability concerns, and pinholes and non-uni- formity-related defects in barrier lay- ers become a greater issue below 40 nm in thickness. Table 1 illustrates the expected extension of current patterned wafer inspection methods and the timeline for bringing new technologies into R&D phases, yield ramp-up and volume production. In the interest of minimizing thermal budget, processes must be created to reduce the activation energy and use in-situ measurements to maximize performance, throughput and yield (figure 1), expecially for large diameter wafers. Reproduced with permission from SEMICONDUC - TOR INTERNATIONAL, November 1998. Copyright 1998 Cahners Business Information. SEMICONDUCTOR INTERNATIONAL is a trade- mark of Cahners Business Information. All rights reserved. Best of YMS Autumn 1999 Yield Management Solutions 41 S E C T I O N S Yield Management Seminar Series A valuable venue for innovative ideas KLA-Tencor’s Yield Management Solutions Seminars (YMS 2 ) focus on value-added, integrated solutions for yield management and process control. Key topics include CMP, lithography, in-line moni- toring and yield strategies, with an emphasis on copper. To reserve your space at the upcoming YMS 2 , contact Judy Dale by email at: [email protected]. Date: Wednesday, October 20th Time: 9:00 a.m. to 6:00 p.m. Location: Hyatt Regency Austin on Town Lake For future YMS 2 , please complete and return the enclosed business reply card. Call for future papers Papers should focus on using KLA-Tencor tools and solutions to enhance yield through increased productivity and performance. Topics of interest include defect inspection, lithography, CMP, film measurement and yield management strategies. If you are interested in presenting a paper at one of our upcoming yield management seminars, please submit a one page abstract to: Judy Dale by fax at (408) 875-4144 or email at: [email protected]. YMS 2 at a Glance DATE LOCATION ABSTRACT DEADLINE December 2 Makuhari, Japan September 1, 1999 February 16 Seoul, Korea November 1, 1999 April 5 Munich, Germany January 7, 2000

Upload: kla-tencor

Post on 03-Apr-2016

213 views

Category:

Documents


0 download

DESCRIPTION

 

TRANSCRIPT

Page 1: Magazine autumn99 best

D e c reasing silicon allowance for sili-cides places new requirements onthe quality of the silicon/silicideinterface for minimal roughness.Porous low-k materials are inherentlynon-homogeneous in structure, unlikeSiO2. Singh explained that tantalum-based barrier materials for coppermay introduce stress-related reliabilityconcerns, and pinholes and non-uni-formity-related defects in barrier lay-ers become a greater issue below40 nm in thickness.

Table 1 illustrates the expected extension of current patterned waferinspection methods and the timelinefor bringing new technologies intoR&D phases, yield ramp-up and volume production. In the interest of minimizing thermal budget,processes must be created to reduce the activation energy and use in-situ m e a s u rements to maximizep e rf o rmance, throughput and yield( fig u re 1), expecially for large diameter wafers. ❈

Reproduced with permission from SEMICONDUC -TOR INTERNATIONAL, November 1998.Copyright 1998 Cahners Business Information.SEMICONDUCTOR INTERNATIONAL is a trade-mark of Cahners Business Information. All rightsreserved.

Best of YMS

Autumn 1999 Yield Management Solutions 41

S E C T I O N S

Yield ManagementSeminar Series

A valuable venue for innovative ideas

KLA-Tencor’s Yield Management Solutions Seminars (YMS2) focuson value-added, integrated solutions for yield management andprocess control. Key topics include CMP, lithography, in-line moni-toring and yield strategies, with an emphasis on copper.

To reserve your space at the upcoming YMS2, contact Judy Dale byemail at: [email protected].

Date: Wednesday, October 20thTime: 9:00 a.m. to 6:00 p.m.Location: Hyatt Regency Austin on Town Lake

For future YMS2, please complete and return the enclosed businessreply card.

Call for future papersPapers should focus on using KLA-Tencor tools and solutions toenhance yield through increased productivity and performance.Topics of interest include defect inspection, lithography, CMP, filmmeasurement and yield management strategies.

If you are interested in presenting a paper at one of our upcomingyield management seminars, please submit a one page abstract to:Judy Dale by fax at (408) 875-4144 or email at: [email protected].

YMS2 at a GlanceDATE LOCATION ABSTRACT DEADLINE

December 2 Makuhari, Japan September 1, 1999 February 16 Seoul, Korea November 1, 1999 April 5 Munich, Germany January 7, 2000