model-based mpc enables curvilinear ilt using either vsb or … · 2020-05-12 · resist profile...

1

D2S Patented Technology

D2S is a registered trademark of D2S, Inc. in USTrueMask® and TrueModel® are registered trademarks of D2S, Inc. in US, Japan, Korea, China and Taiwan

Model-Based MPC Enables Curvilinear ILT using Either VSB or

Multi-Beam Mask WritersLeo (Linyong) Pang, Yutesu Takatsukasa, Daisuke Hara,

Michael Pomerantsev, Bo Su, Aki Fujimura D2S, Inc.

2Photomask Japan 2017

GPU can Do Many Things in Semiconductor Manufacturing

Litho SimulationWafer Plane Analysis (WPA) for Mask CD SEM (CSTIC paper)

High accuracy EPE measurement and Litho. Simulation capability for ILT, Kondo-san, Advantest

Mask Data PrepMDP with overlapping shots(This paper)

CurvilinearGeometry Engine

EUV Modeling in the Multi-Beam mask making Era, Ryan Pearman

Simulation-Based MDP Verification for Leading-Edge Masks, Bo Su


GPU can Do Many Things in Semiconductor Manufacturing

Deep learning with Convolutional Neural Network (CNN)

• Electron Beam Lithographic Modeling Assisted by Artificial Intelligence Technology, Nakayamada-san, NuFlare• Data Analytics and Machine Learning for Design-Process-Yield Optimization in Electronic Design Automation and IC Semiconductor

Manufacturing, Luigi Capodieci, Motivo• Accurate Lithography Simulation Model based on Convolutional Neural Networks, Yuki Watanabe, Toshiba• Imbalance Aware Lithography Hotspot Detection: A Deep Learning Approach, H. Yang, Chinese University of Hong Kong /Brion (SPIE)

Machine learning – GPU is the great platform Image and multi-dimensional data manipulation & computation

Ref: Minimizing Computation in Convolutional Neural Networksm Jason Cong, Bingjun XiaoICANN2014Ref: Multi-Dimensional Graph Data Opens the Door to New Applications, David S. Frankel


A Decade of ILT!

6Papers

2Foundries

1Memory

1Mask shop


ILT Adopted as the Way Forward

>200Papers Officially

announcedToday

ILT expertise proliferated 2014 panel 2016 panel


Mask Writing Used to be the Bottleneck for Curvilinear ILT Masks in Mask Making

Mask Data Preparation

Mask Writing

Mask Metrology

Mask Inspection

Mask Review

Mask Repair


VSB Mask Writer was Designed for Manhattan PatternsMulti-beam is Designed for Curvilinear ILT Patterns

Multi-beam Mask WritingMassive pixel array

B.G. Kim, et al., BACUS, 2012

ILT Mask PatternsVariable shaped BeamSingle beam, rectangular shape


Multi-beam is Great for Curvilinear ILT

Courtesy of IMS paper: alpha machine

Multi-beam exposure without loss of TPT


MPC Needs Dose and Shape CorrectionsCAD

Shot

Without MPC Shape Correction Shape + Dose Correction

Overlap shots for Line-ends

Overlap shots for rectanglesContour

Shortening Edge correction

CAD

Edge Slope


Curvilinear ILT MPC on VSB: Both Dose and Shape Correction Needed

Small feature's resist profile will be bad, shape correction won't helpResist image correction is better to be done by dose correction

Exposed ResistShot Size

100 nm

60 nm

Edge Slope

Etching and nonlinearity better to be corrected by shape correction

Resist Profile

PLASMA


Curvilinear ILT MPC on VSB: Overlapping Shots Help

1 2

3 4

5 6

7 8

910

Overlapping shots cast more energy in less write time:= Better process margin = Better CDU = No mask-write time vs. mask-quality compromise

10 conventional shots

1

2

3

4

5

5 overlapping shotsPlus, extra energy in overlapping areas

Conventional Shots (2143 shots)

Overlapped Shots (1057 shots)


Dose+Shape linearity

Feature width

Featu

re M

TT(D

rawn

-Me

asur

ed)

Featu

re M

TT(D

rawn

-Me

asur

ed)

Non-zero y-axis values mean: mask print errors if uncorrected Iso Lines

Feature width

Curvilinear ILT MPC on VSB: The Mask Model Has to Consider Dose Change

30nm to 4nm

Ref: EUV Modeling in the Multi-Beam mask making Era, Ryan Pearman


Curvilinear ILT MPC on VSB: Improving CDU


Curvilinear ILT MPC on Multi-beam: Both Dose and Shape Correction Needed

Dose modulation on each beam pixel is the bestResist image correction is better to be done by dose correction

Etching and nonlinearity better to be corrected by shape correction

Resist Profile

PLASMA


Curvilinear ILT MPC on Multi-beam: Improving CDU

Refer to: GPU-Accelerated Inline Mask Correction for the MBM-1000, H. Zable, Aki Fujimura


To Enable ILT MPC Portability, Model Has to be the Same

Multi-beam Mask Writer

VSB Mask Writer “A”

ILT Patterns

VSB Mask Writer “B” VSB Mask Writer “C”


VSB and Multi-beam Can Share the Same Mask Model

Exposure

Substrate

Post-exposure bake

Development

DRIE/WetEtch

Patterned photomask

Dose effects

Development

DRIE/WetEtch

Shape effects

ADI target

AEI target


One Model Form is All You Need for All Masks

ArF or EUV

1D or 2D Shapes

VSB or Multi-beam

Dose Modulation

Positive or NegativeResist

Overlapping Shots


GPU is Good for Mask Model and Simulation• GPU is designed to do image

processing really fast– Convolution in one operation

Gaussian convolution run on CPU-Only and on CPU+GPU Data size: ~80 µm by 80µm, 10nm pixels

0 0.5 1 1.5 2 2.5

CPU+GPU

CPUOnly

Processing Time in Seconds

• Thousands of pipeline to massively distribute the run for same operation and multiple data

Ref: Heterogeneous compute case study: image convolution filtering, Imagination Blog


GPU is Good for Both Dose and Shape Correction

GPU is Good for All Angle Geometry EngineRefer to: Simulation-Based MDP Verification for Leading-Edge Masks, Bo Su

GPU is Good for Dose Correction


GPU-Accelerated MB-MPC Enables Curvilinear ILT Using Either VSB or Multi-Beam Mask Writer• Curvilinear ILT requires model-based mask process correction• Multi-beam mask writer is ideal for curvilinear ILT because of the

constant write time• VSB mask writer needs to write curvilinear ILT as a backup of multi-

beam• Both dose and shape correction are required for MPC on VSB and

multi-beam• A single model can be used for both, enabling ILT portability• GPU enables model-based MPC with reasonable runtimes

• Fast physical model computing, dose compensation, and all-angle geometry engine


My Prediction: GPU Will Become the De Facto Computing Platform for Semiconductor Manufacturing

(Deep) Machine learning

Image ProcessingSimulation

B.G. Kim, et al., BACUS, 2012

model-based mpc enables curvilinear ilt using either vsb or … · 2020-05-12 · resist profile...

Documents