morphology and size control of mesoporous ... - hanyang

1
0 5 10 15 20 25 30 35 40 45 50 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 dV/dlog(D) Pore Diameter(nm) Morphology and Size Control of Mesoporous ORMOSIL Particles Prepared from Ternary Organosilane Mixture Gyu Il Jung, Jung Soo Kim and Sang Man Koo* Dept. of Chemical Engineering, Hanyang University, Seoul, 133-791, Korea Introduction Organically Modified Silica (ORMOSIL) particles as templates for mesoporous particles Nanostructured materials with tailored morphologies and sizes have attracted intense interest in diverse field of nanotechnology due to their novel properties, such as large surface area, controlled pores and channels, permeability, and low density. Facile, economic, and general, without using external templates, methods have to be developed to synthesize tailored nanostructured ORMOSIL particles, such as raspberry shaped, hollow, and rattle type structures. Preparation of ternary ORMOSIL particles Variation in the morphology and size of mesoporous particles depending on the relative ratio of organosilanes in ternary ORMOSIL particles. (P:PTMS, V:VTMS, A:APTMS) ORMOSIL particles Solution Acid . . . . . . . . . . . . . . . Base Si OR RO RO Z Si OR RO RO Y Si OR RO RO X Si O O X Si O Y Si O O X Si O O Z Si O O X Si O O X Si O O Y Si O O X Si O O Z Si O O X Si O O O Y Si O O X Si O O X Si O O Z Emulsion droplets from silane mixtures Co-condensation of hydrolyzed silane mixtures BET N 2 adsorption-desorption analysis analyses of mesoporous nanostructured ORMOSIL particles Y X Z X Y Z X Y Amine, Epoxy, Methacrylate, etc. X and/or Y (major component) Tailored mesoporous ORMOSIL particles, having various morphologies, such as raspberry shaped, hollow, and rattle type structures, were synthesized by a selective dissolution of organosiloxane networks in ternary ORMOSIL particles prepared using a simple two-step process. The first step, synthesis of monodisperse ORMOSIL particles with multi-layered structure, comprised a one-pot process in an aqueous solution using ternary mixture from three organosilane monomers, 3-aminopropyl-trimethoxysilane (APTMS), vinyltrimethoxysilane (VTMS), and phenyltrimethoxysilane (PTMS). In the second step, the ORMOSIL particles were treated with a mixture of water and alcohol with mild heating. The size and morphology of mesoporous ORMOSIL particles could be easily adjusted by simply changing the relative ratios of PTMS, VTMS and APTMS in reaction mixture for ORMOSIL particles. These mesoporous ORMOSIL particles were converted to mesoporous silica particles, maintaining morphologies, simply by the heat treatment at 600 o C in air. Z (minor components) Phenyl, Vinyl, Mercapto, Methyl, etc. selective etching by H 2 O/alcohol Raspberry shaped Rattle type Hollow Experimental Formation of mesoporous ORMOSIL particles by selective dissolution Conclusions Multiple-functional ORMOSIL particle 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1.0 0 10 20 30 40 50 Volume Adsorbed cm3/g STP Relative Pressure(P/P0) pore distribution curve N 2 adsorption-desorption curve 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1.0 0 50 100 150 200 250 Volume Adsorbed cm3/g STP Relative Pressure(P/P0) 0 5 10 15 20 25 30 35 40 45 50 55 60 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 dV/dlog(D) Pore Diameter(nm) a b a b 200nm Rattle 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1.0 0 20 40 60 80 100 120 140 160 180 200 Volume Adsorbed cm3/g STP Relative Pressure(P/P0) 0 5 10 15 20 25 30 35 40 45 50 55 60 0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 dV/dlog(D) Pore Diameter(nm) a b a b 100nm Raspberry a b a b 200nm Hollow 200nm 200nm 200nm After heat treatment at 600 Ratio of PTMS / VTMS (ml) P/V (3.5/1.5) P/V (2.5/2.5) P/V (1.5/3.5) P/V (1/4) P/V (0.5/4.5) A (0.5) Shape Sphere Sphere Rattle Raspberry Raspberry Size (nm) 373 (±9) 347 (±9) 309 (±14) 301 (±19) 291 (±8) A (1.5) Shape Hollow Rattle Rattle Rattle Raspberry Size (nm) 198 (±9) 328 (±18) 222 (±18) 267 (±12) 223 (±19) P/V (3.5/1.5) P/V (2.5/2.5) P/V (1.5/3.5) P/V (1/4) P/V (0.5/4.5) A (0.5) A (1.5)

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Page 1: Morphology and Size Control of Mesoporous ... - Hanyang

0 5 10 15 20 25 30 35 40 45 50

0.0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

dV

/dlo

g(D

)

Pore Diameter(nm)

Morphology and Size Control of Mesoporous ORMOSIL Particles

Prepared from Ternary Organosilane MixtureGyu Il Jung, Jung Soo Kim and Sang Man Koo*

Dept. of Chemical Engineering, Hanyang University, Seoul, 133-791, Korea

Introduction Organically Modified Silica (ORMOSIL)

particles as templates for mesoporous particlesNanostructured materials with tailored morphologies and sizes have

attracted intense interest in diverse field of nanotechnology due to their

novel properties, such as large surface area, controlled pores and

channels, permeability, and low density.

Facile, economic, and general, without using external templates,

methods have to be developed to synthesize tailored nanostructured

ORMOSIL particles, such as raspberry shaped, hollow, and rattle type

structures.

Preparation of ternary ORMOSIL particles

Variation in the morphology and size of mesoporous

particles depending on the relative ratio of

organosilanes in ternary ORMOSIL particles.

(P:PTMS, V:VTMS, A:APTMS)

ORMOSIL

particles

Solution

Acid ....... .... .. ..Base

Si

OR

RORO

Z

Si

OR

RORO

Y

Si

OR

RORO

X

SiOO

X

SiO

Y

SiO

O

X

SiO

OZ

SiOO

XSiOO

X

SiO

O

Y

Si OO

X

Si OO

Z

SiOO

X

SiO

OO

Y

SiOO

XSi

OO

X

Si

OO

Z

Emulsion droplets

from silane

mixtures

Co-condensation of

hydrolyzed silane

mixtures

BET N2 adsorption-desorption analysis analyses

of mesoporous nanostructured ORMOSIL particles

YX

Z

X

YZ

X

Y

Amine, Epoxy, Methacrylate, etc.

X and/or Y (major component)

Tailored mesoporous ORMOSIL particles, having various morphologies, such as raspberry shaped, hollow, and rattle type structures, were synthesized by a

selective dissolution of organosiloxane networks in ternary ORMOSIL particles prepared using a simple two-step process.

The first step, synthesis of monodisperse ORMOSIL particles with multi-layered structure, comprised a one-pot process in an aqueous solution using ternary

mixture from three organosilane monomers, 3-aminopropyl-trimethoxysilane (APTMS), vinyltrimethoxysilane (VTMS), and phenyltrimethoxysilane (PTMS).

In the second step, the ORMOSIL particles were treated with a mixture of water and alcohol with mild heating.

The size and morphology of mesoporous ORMOSIL particles could be easily adjusted by simply changing the relative ratios of PTMS, VTMS and APTMS in

reaction mixture for ORMOSIL particles.

These mesoporous ORMOSIL particles were converted to mesoporous silica particles, maintaining morphologies, simply by the heat treatment at 600 oC in air.

Z (minor components)

Phenyl, Vinyl, Mercapto,

Methyl, etc.

selective etching

by H2O/alcohol

Raspberry

shaped

Rattle type

Hollow

Experimental

Formation of mesoporous ORMOSIL particles

by selective dissolution

Conclusions

Multiple-functional

ORMOSIL particle

0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1.0

0

10

20

30

40

50

Vo

lum

e A

dso

rbe

d c

m3

/g S

TP

Relative Pressure(P/P0)

pore distribution curve N2 adsorption-desorption curve

0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1.0

0

50

100

150

200

250

Vo

lum

e A

dso

rbe

d c

m3

/g S

TP

Relative Pressure(P/P0)

0 5 10 15 20 25 30 35 40 45 50 55 60

0.0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

dV

/dlo

g(D

)

Pore Diameter(nm)

a

b

a

b

200nm

Rattle

0.0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 1.0

0

20

40

60

80

100

120

140

160

180

200

Vo

lum

e A

dso

rbe

d c

m3

/g S

TP

Relative Pressure(P/P0)

0 5 10 15 20 25 30 35 40 45 50 55 60

0.0

0.1

0.2

0.3

0.4

0.5

0.6

0.7

0.8

dV

/dlo

g(D

)

Pore Diameter(nm)

a

b

a

b

100nm

Raspberry

a

b

a

b200nm

Hollow

200nm200nm200nm

After heat treatment at 600 ℃

Ratio of PTMS /

VTMS (ml)

P/V

(3.5/1.5)

P/V

(2.5/2.5)

P/V

(1.5/3.5)

P/V

(1/4)

P/V

(0.5/4.5)

A (0.5)Shape Sphere Sphere Rattle Raspberry Raspberry

Size (nm) 373 (±9) 347 (±9) 309 (±14) 301 (±19) 291 (±8)

A (1.5)Shape Hollow Rattle Rattle Rattle Raspberry

Size (nm) 198 (±9) 328 (±18) 222 (±18) 267 (±12) 223 (±19)

P/V

(3.5/1.5)

P/V

(2.5/2.5)

P/V

(1.5/3.5)

P/V

(1/4)

P/V

(0.5/4.5)

A

(0.5)

A

(1.5)