mosfet cross-section. a mosfet transistor gate source drain source substrate gate drain
TRANSCRIPT
![Page 1: MOSFET Cross-Section. A MOSFET Transistor Gate Source Drain Source Substrate Gate Drain](https://reader033.vdocument.in/reader033/viewer/2022061512/56649dd55503460f94acd327/html5/thumbnails/1.jpg)
MOSFET Cross-Section
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A MOSFET Transistor
Gate
Source
Drain
Source
Substrate
Gate
Drain
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MOSFET Schematic Symbols
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Formation of the Channel for an Enhancement MOS Transistor
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Water Analogy of a (subthreshold) MOSFET
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Channel Current vs. Gate Voltage
0 0.5 1 1.5 2 2.5 3 3.5 4 4.5 50
50
100
150
200
250
300
350
400
450
Gate voltage (V)
Ch
an
ne
l Cu
rre
nt
(A
)
0.4 0.6 0.8 1 1.2 1.4 1.6 1.8 210-12
10-11
10-10
10-9
10-8
10-7
10-6
10-5
10-4
10-3
Gate voltage (V)
Ch
an
ne
l Cu
rre
nt
(A)
Above-Threshold Sub-Threshold
In linear scale, we have a quadraticdependence
In log-scale, wehave an exponentialdependence
VT
VT
Ith
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MOS Capacitor Picture
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MOSFET Channel Picture
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MOS Capacitor Picture
![Page 10: MOSFET Cross-Section. A MOSFET Transistor Gate Source Drain Source Substrate Gate Drain](https://reader033.vdocument.in/reader033/viewer/2022061512/56649dd55503460f94acd327/html5/thumbnails/10.jpg)
MOS Electrostatics
Condition is called flatband --- the voltage when this occurs is called flatband
This state is the baseline operating case --- a capacitive divider has one free parameter
Vfb
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MOS Electrostatics
Depletion Condition --- gate charge is terminated by charged ions in the depletion region
Part of this region is often referred to as weak-inversion
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MOS Electrostatics
Inversion --- further gate charge is terminated by carriers at the silicon--silicon-dioxide interface
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MOS Structure Electrostatics
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MOS Capacitor Picture
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MOS-Capacitor Regions
Qs = ln( 1 + e )((Vg - VT) - Vs)/UTQs = e
( - Vs)/UT
Depletion ((Vg - VT) - Vs < 0)
Qs = e ((Vg - VT) - Vs)/UT
Inversion ((Vg - VT) - Vs > 0)
Qs = ((Vg - VT) - Vs)/UT
![Page 16: MOSFET Cross-Section. A MOSFET Transistor Gate Source Drain Source Substrate Gate Drain](https://reader033.vdocument.in/reader033/viewer/2022061512/56649dd55503460f94acd327/html5/thumbnails/16.jpg)
MOS Capacitor Picture
![Page 17: MOSFET Cross-Section. A MOSFET Transistor Gate Source Drain Source Substrate Gate Drain](https://reader033.vdocument.in/reader033/viewer/2022061512/56649dd55503460f94acd327/html5/thumbnails/17.jpg)
MOSFET Channel Picture
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Calculation of Drain Current
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No recombination 02
2
dx
ndDn
ndx
dnqDJ
l
nnqD drainsource
n
ddC
SSC
V
V
0 l varies as VG
TSC usource en /
TdC udrain en /
n = Ax + B
RGdx
ndD
dt
dnn
2
20 0 0
eeIIUVVUVV TdgTSg / /
0
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MOSFET Current-Voltage Curves
1
/)(0
//)(0
///0
TSG
TdsTSG
TDTSTG
uVV
uVuVV
uVuVuVDS
eI
eeI
eeeII
Saturation
4 Tds UV
eeIIuVVuVV TdgTSg //
0
1 //0
TSdTSg uVVuVVeeI
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MOSFET Current-Voltage Curves
1
/)(0
//)(0
///0
TSG
TdSTSG
TDTSTG
uVKV
uVuVKV
uVuVuKVDS
eI
eeI
eeeII
Saturation
4 TdS uV
eeIIuVVuVV TdgTSg //
0
1 //0
TSdTSg uVVuVVeeI
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Subthreshold MOSFETs
0.4 0.45 0.5 0.55 0.6 0.65 0.7 0.75 0.8 0.85 0.910
-11
10-10
10-9
10-8
10-7
10-6
Gate voltage (V)
Dra
in c
urr
en
t (A
)
= 0.58680 Io = 1.2104fA
In linear scale, we have a quadraticdependence
In log-scale, wehave an exponentialdependence
G
S
D
nFET
G
S
D
B
pFET
![Page 23: MOSFET Cross-Section. A MOSFET Transistor Gate Source Drain Source Substrate Gate Drain](https://reader033.vdocument.in/reader033/viewer/2022061512/56649dd55503460f94acd327/html5/thumbnails/23.jpg)
Determination of Threshold Voltage
0.4 0.5 0.6 0.7 0.8 0.9 10.1
0.2
0.3
0.4
0.5
0.6
0.7
0.8
0.9
1
1.1
Gate voltage (V)
Dra
in c
urre
nt /
sub
thre
shol
d fit
VT = 0.86
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Drain Current --- Source Voltage
0.6 0.65 0.7 0.75 0.8 0.85 0.9
10-12
10-11
10-10
10-9
10-8
10-7
Source voltage (V)
Dra
in c
urre
nt (
A)
UT = 25.84mV
= 0.545
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Drain Characteristics
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Origin of Drain Dependencies
Increasing Vd effects the drain-to-channel region:
• increases depletion width
• increases barrier height
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Current versus Drain Voltage
Not flat due to Early effect (channel length modulation)
Id = Id(sat) (1 + (Vd/VA) )
or
Id = Id(sat) eVd/VA
RoutId(sat)
GND
Iout
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Early Voltage Length Dependence
Width of depletion regiondepends on doping, not L
Might expect Vo to linearly vary with L
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MOSFET Operating Regions
Band-diagrampicture moving from subthreshold toabove-threshold
Surface potentialmoving from depletionto inversion
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Qualitative Above-Threshold
I = (K/2) (( (Vg - VT) - Vs )2 - (( (Vg - VT) - Vd )2 )
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Above Threshold MOSFET Equations
I = (K/2) ( ((Vg - VT) - Vs)2 - ((Vg - VT ) - Vd) 2 )
Saturation: Qd = 0
I = (K/2) ( ((Vg - VT) - Vs)2
If = 1 (ignoring back-gate effects):
I = (K/2) ( 2(Vgs - VT) Vds - Vds2 )
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Detailed MOSFET Derivation
I = Q(x) E(x) Current is constant through the channel (no loss)
( E(x) = Electric Field )
Q(x) = CT ( (Vg - VT) - V(x)) CT = CD + Cox
Qs = CT ( (Vg - VT) - Vs), Qd = CT ( (Vg - VT) - Vd)
E(x) = - = (1 / CT ) d V(x)
dxd Q(x)
dxI = ( / CT ) Q(x) d Q(x)
dx
( = Cox / CT)
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Detailed MOSFET Derivation
I = (K/2) (( (Vg - VT) - Vs )2 - (( (Vg - VT) - Vd )2 )
Integrate with respect to length: I = ( / CT ) Q(x) d Q(x)dx
Qs = CT ( (Vg - VT) - Vs)
Qd = CT ( (Vg - VT) - Vd)I L = ( / 2 CT ) Q(x)2 |
I = ( / 2 CT ) ( 1 / L) (Qs2 - Qd
2)
K = Cox (W/L)
I = ( CT / 2 ) ( 1 / L) (( (Vg - VT) - Vs) 2 - ( (Vg - VT) - Vd)2)
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MOSFET Equations
I = (K/2) ( (Vg - VT - Vs)2 - (Vg - VT - Vd) 2 )
Saturation: (Qd = 0) I = (K/2) (Vgs - VT )2
When ignoring back-gate effects (we often do): = 1
I = (K/2) ( 2(Vgs - VT) Vds - Vds2 ) Above-Threshold:
Subthreshold:I = Is e (1 – e )
Vgs/UT-Vds/UT
Saturation: (Vds> 4 UT) I = Is e Vgs/UT
(Vd > Vg - VT )
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Output Characteristics of the Above-Threshold MOSFET
vDS = vGS - VT
iD /ID0
0.75
1.0
0.5
0.25
00 0.5 1.0 1.5 2.0 2.5
vGS-VTVGS0 - VT
= 0
vGS-VTVGS0 - VT
= 0.5
vGS-VTVGS0 - VT
= 0.707
vGS-VTVGS0 - VT
= 0.867
vGS-VTVGS0 - VT
= 1.0
Channel modulation effects
vDSVGS0 - VT
Active Region Saturation Region
Cutoff Region
iDvDS = vGS - VT
Increasing values of vGS
Saturation RegionActive Region
vDS
Interpretation of large-signal model
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MOSFETs
G
S
D
nFET
G
S
D
B
pFET
0 0.5 1 1.5 2 2.5 3 3.5 4 4.5 50
50
100
150
200
250
300
350
Gate voltage (V)
Cur
rent
(A
)
K = 37.861 A/V2
VT = 0.806
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Drain Current - Gate Voltage
0.5 1 1.5 2 2.5 3 3.5 4 4.5 50
0.002
0.004
0.006
0.008
0.01
0.012
0.014
0.016
0.018
0.02
Gate voltage (V)
sqrt
(Dra
in c
urr
en
t (A
))
VT = 0.806
K = 37.861 A/V2
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Drain Current --- Source Voltage
0 0.1 0.2 0.3 0.4 0.5 0.6 0.7 0.8 0.9 10
0.5
1
1.5
2
2.5
3
3.5
4
Gate voltage (V)
sqrt
(Dra
in c
urr
en
t (
A))
(Vg - VT) = 0.595
K/ = 74.585 A/V2
( = 0.54)
( = 0.7)
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An Ohmic MOSFET
I = (K/2) ( ((Vg - VT) - Vs)2 - ((Vg - VT ) - Vd) 2 )
If Vd ~ Vs, (small difference)
(Vd - Vs = 50mV)
I = K (Vg - VT)(Vd - Vs)
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A MOSFET in Saturation
Saturation: Qd = 0
I = (K/2) ( ((Vg - VT) - Vs)2
Vs = 0
I = (K/2) (Vg - VT) 2
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More Ohmic Region Data
I = (K/2) ( ((Vg - VT) - Vs)2 - ((Vg - VT ) - Vd) 2 )
Take the derivative of I with respect to Vd (Vs = 0 )
dI / d Vd = (K/2)( 0 - (-2) ((Vg - VT ) - Vd) ) = (K/2)((Vg - VT ) - Vd)
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Influence of VDS on the Output Characteristics
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Current versus Drain Voltage
Not flat due to Early effect (channel length modulation)
Id = Id(sat) (1 + (Vd/VA) )
or
Id = Id(sat) eVd/VA
RoutId(sat)
GND
Iout
![Page 44: MOSFET Cross-Section. A MOSFET Transistor Gate Source Drain Source Substrate Gate Drain](https://reader033.vdocument.in/reader033/viewer/2022061512/56649dd55503460f94acd327/html5/thumbnails/44.jpg)
Early Voltage Length Dependence
Width of depletion regiondepends on doping, not L
Might expect Vo to linearly vary with L
![Page 45: MOSFET Cross-Section. A MOSFET Transistor Gate Source Drain Source Substrate Gate Drain](https://reader033.vdocument.in/reader033/viewer/2022061512/56649dd55503460f94acd327/html5/thumbnails/45.jpg)
Small-Signal Modeling
gmV ro
V3
V2V2
V1 +
V
-V3
V2
V1
V3
V2
V1
gm ro
Above VTMOSFET
Sub VTMOSFET
Av
I I
I / UT
2I /(V1-V2 -VT) VA / I
VA / I VA / UT
2VA/(V1-V2 -VT)
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Small-Signal Modeling
gmV ro
V3
V2V2
r
V1 +
V
-
V3
V2
V1
V3
V2
V1
gm ror
BJT
Above VTMOSFET
Sub VTMOSFET
Av
(UT ) / I
I I
I / UT
I / UT
2I /(V1-V2 -VT)
VA / I
VA / I
VA / I
VA / UT
VA / UT
2VA/(V1-V2 -VT)
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Capacitances in a MOSFET
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MOSFET Depletion Capacitors
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Overlap Capacitances
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Capacitance Modeling
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Capacitance Modeling
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Velocity Saturation
Ideal Drift (Ohm’s Law)
Si Crystal Velocity Limit
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Effect of Velocity Saturation
L = 76 nm MOSFET
VT
Square-lawregion
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Small-Signal Modeling (with kappa)
gmV ro
V3
V2V2
V1 +
V
-V3
V2
V1
V3
V2
V1
gm ro
Above VTMOSFET
Sub VTMOSFET
Av
I I
I / UT
2I /(V1-V2 -VT) VA / I
VA / I VA / UT
2VA/(V1-V2 -VT)
![Page 56: MOSFET Cross-Section. A MOSFET Transistor Gate Source Drain Source Substrate Gate Drain](https://reader033.vdocument.in/reader033/viewer/2022061512/56649dd55503460f94acd327/html5/thumbnails/56.jpg)
Small-Signal Modeling (with kappa)
gmV ro
V3
V2V2
r
V1 +
V
-
V3
V2
V1
V3
V2
V1
gm ror
BJT
Above VTMOSFET
Sub VTMOSFET
Av
(UT ) / I
I I
I / UT
I / UT
2I /(V1-V2 -VT)
VA / I
VA / I
VA / I
VA / UT
VA / UT
2VA/(V1-V2 -VT)