opto-coat 2012 - ingesnetopto-coat 2012 chairmen agustín r. gonzález-elipe (institute of materials...
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![Page 1: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/1.jpg)
opto-coat 2012
CHAIRMEN
Agustiacuten R Gonzaacutelez-Elipe (Institute of Materials Science of Seville ICMSE-CSIC)
Ramoacuten Escobar Galindo (Institute of Materials Science of Madrid ICMM-CSIC)
SCIENTIFIC COMMITTEE
CN Afonso (IO-CSIC) JM Albella (ICMM-CSIC) J Barriga (Tekniker) M Brizuela
(Tecnalia) A Cavaleiro (University of Coimbra) JL Endrino (Abengoa Research)
M Gabaacutes (University of Malaga) A Griol (Polytechnic University of Valencia) M
Holgado Bolantildeos (Polytechnic University of Madrid) C Loacutepez (ICMM) J Martorell
(ICFO) R Rodriacuteguez (AIN) O Saacutenchez (ICMM-CSIC) F Yubero (ICMSE-CSIC)
Opto-Coat 2012 logo figures (from Left to Right) Fig 1- Parabolic receiver for concentrated solar power (CSP) technology Image credits Schott AG wwwschott-picturesnetpictures Fig 2 - Biology and physics come together to enable the development of advanced photonic crystals (Nature Materials 2010) Image credits Massachusetts Institute of Technology (MIT) webmitedunewsoffice2010photonics-crystals-1019html Fig 3- A drop of water balances perfectly on a plastic surface invented by researchers at Ohio State University (Nature nanotechnology 2007) Image credits Jo McCulty Ohio State University researchnewsosueduarchivenanocrpthtm Fig 4- Beneq ALD coatings for decorative coatings Image credits Beneq wwwbeneqcom Fig 5- First LEED (Leadership in Energy and Environmental Design) certified parking garage in USA Image credits Yanko design wwwyankodesigncom Fig 6- Novel structures of Plastic Optical Fibres (POF) for data communications and sensors in optoelectronics Image credits Optoelectronics Group London Metropolitan University wwwlondonmetacuk Fig 7- Transparent non-volatile memory chip that could open the way for see-through computers and other appliances Image credits Park Jae-woo and Lim Koeng-su at the Daejeon-based Korea Advanced Institute of Science and Technology wwwkaistedu Fig 8- Coloured UV Poly-Fibre Optic Spray consists of cracked polymer fibres in UV reactive sheathing Up to 8 different colours of tails can be incorporated into one harness Image credits Technical Solutions wwwtecsolcomau
3
FOREWORD 5
VENUE 7
PROGRAMME 9
ORAL SESSION I 15
ORAL SESSION II 23
ORAL SESSION III 31
ORALPOSTER SESSION 43
AUTHOR INDEX 59
5
This one day national workshop addresses the last advances in optical coatings
and other nanostructured supported systems of great importance for the
development of integrated structures and other advanced photonic components
Three main areas of RampD in this topic will be particularly considered photonics
solar energy recovery and classical optical applications of thin films The scope of
the meeting covers fundamental and applied aspects encompassing the latest
advances in fabrication technologies the analysis and properties of the films and
nanostructures as well as the modelling of their photonic behaviour OPTO-
COAT includes contributions on surface functionalization and thin film
preparation to achieve a better control and development of the optical
properties
Coinciding its celebration with the XIII National Conference of Materials
OPTO-COAT will provide a specific and unique forum where researchers and
engineers from Spain and abroad will have the opportunity to exchange their
latest experiments and more interesting scientific results with a focused
perspective onto optical and photonic applications of deposited materials The
participation in the three thematic areas of well-known speakers will provide a
unique opportunity to first-hand learning the latest advances and main
challenges in this emerging scientific discipline
Agustiacuten R Gonzaacutelez-Elipe and Ramoacuten Escobar Galindo
(OPTO-COAT Chairmen)
7
OPTO-COAT workshop will be held in the campus of the University of Alicante
The oral sessions will take place in room A10-02M on the ground floor of
the Aulario I while the poster session and the lunch will be allocated at the Club
Social I right in front of Aulario I (see map below)
VACUUM CHAMBERS
hellipmade to suit our
customersrsquo requirements
- Sample holders
- Shutters
- In-vacuum manipulation
- Thin Film Production
CRYOGENICS
hellipadapted to the
existing systems
- Cryo-free cooling
- Cryostats
- LIN sample cooling
Contact criolabclixpt
PROGRAMME
11
830 Registration
900 Opening Session
SESSION I
Chairman Agustiacuten R Gonzaacutelez-Elipe
905
Invited lecture
Thermochromics and nanothermochromics New approaches to energy
efficient ldquosmartrdquo windows
Claes G Granqvist
The Angstrom Laboratory Uppsala University Sweden
INV1
945
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR1-1
1005
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo
Instituto de Microelectroacutenica de Madrid CSIC Spain
OR1-2
1025
Computer simulation of the optical properties of MoSiO2 and MoSi3N4
cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea
Tecnalia Energy Unit Spain
OR1-3
1045
Coloured W-O coatings based on gradient of chemical composition
Albano Cavaleiro
Universidad de Coimbra Portugal
OR1-4
1105
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
Noelia Benito
Universidad Autoacutenoma de Madrid Spain
OR1-5
1125
POSTER PRESENTATION I
Spectral integrated infrared filter for the Martian airborne Dust Sensor
of the MetNet Space Mission
Francisco Corteacutes
Universidad Carlos III de Madrid Spain
PO1
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch
Universitat de Barcelona Spain
PO2
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro
Fundacioacute CTM Centre Tecnologravegic Spain
PO3
PROGRAMME
12
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena
Asociacioacuten de la Industria Navarra Spain
PO4
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing applications
Nuno Figueiredo
Universidade de Coimbra Portugal
PO5
1145 Coffee Break
SESSION II
Chairman Ramoacuten Escobar Galindo
1210
Invited lecture
Transparent Electronics From materials to devices
Elvira Fortunato
CENIMATI3N Universidade Nova de Lisboa Portugal
INV2
1250
Spectrometric ellipsometry characterization of highly conductive Ga-
doped ZnO thin films deposited onto Si wafers
Efraiacuten Ochoa
Universidad de Maacutelaga Spain
OR2-1
1310
Exciton photoluminescence in transparent ZnO thin films obtained by
DC magnetron sputtering
Adolfo Mosquera
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-2
1330
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui
Tekniker Research Centre Spain
OR2-3
1350
Optical and structural properties of Ti doped ZnO thin films grown by
magnetron co-sputtering at room temperature
Miriam Yuste
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-4
1410
POSTER PRESENTATION II
Electrochromic behaviour of WxSiyOz thin films prepared by reactive
magnetron sputtering at normal and glancing angles
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO6
Synthesis of nanostructured ZnO thin films by oblique angle sputtering
deposition
Diana Toledano
Instituto de Ciencia de Materiales de Madrid CSIC Spain
PO7
PROGRAMME
13
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO8
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de silicio
enriquecidos en silicio
Joan Juvert
Instituto de Microelectroacutenica de Barcelona CSIC Spain
PO9
Preparation of antirreflective silica-based films by sol-gel method
Cecilia Agustiacuten
Tecnalia Energy Unit Spain
PO10
1430 Lunch and Poster Session
SESSION III
Chairman Joseacute Mariacutea Albella
1600
Invited lecture
Molecular design of nanostructured inorganic and hybrid films
Cleacutement Sanchez
CNRS Universiteacute Pierre et Marie Curie France
INV3
1640
Characterization of host-guest interactions by persistent spectral hole
burning on hybrid clay-dye nanopigments
Ernesto Baena-Murillo
Universidad de Alicante Spain
OR3-1
1700
Structural and photocatalytic properties of multi-walled titanate-
based nanotubes
Ignacio Caretti
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR3-2
1720
Fluorescent thin films prepared by plasma deposition for their
integration with photonic structures
Aacutengel Barranco
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR3-3
1740
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
Ruth Lahoz
Instituto de Ciencia de Materiales de Aragoacuten CSIC Spain
OR3-4
1800
Large area self-assembled monolayers of colloidal silica nanoparticles
Enric Bertraacuten
Universitat de Barcelona Spain
OR3-5
1820 Closure
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 2: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/2.jpg)
Opto-Coat 2012 logo figures (from Left to Right) Fig 1- Parabolic receiver for concentrated solar power (CSP) technology Image credits Schott AG wwwschott-picturesnetpictures Fig 2 - Biology and physics come together to enable the development of advanced photonic crystals (Nature Materials 2010) Image credits Massachusetts Institute of Technology (MIT) webmitedunewsoffice2010photonics-crystals-1019html Fig 3- A drop of water balances perfectly on a plastic surface invented by researchers at Ohio State University (Nature nanotechnology 2007) Image credits Jo McCulty Ohio State University researchnewsosueduarchivenanocrpthtm Fig 4- Beneq ALD coatings for decorative coatings Image credits Beneq wwwbeneqcom Fig 5- First LEED (Leadership in Energy and Environmental Design) certified parking garage in USA Image credits Yanko design wwwyankodesigncom Fig 6- Novel structures of Plastic Optical Fibres (POF) for data communications and sensors in optoelectronics Image credits Optoelectronics Group London Metropolitan University wwwlondonmetacuk Fig 7- Transparent non-volatile memory chip that could open the way for see-through computers and other appliances Image credits Park Jae-woo and Lim Koeng-su at the Daejeon-based Korea Advanced Institute of Science and Technology wwwkaistedu Fig 8- Coloured UV Poly-Fibre Optic Spray consists of cracked polymer fibres in UV reactive sheathing Up to 8 different colours of tails can be incorporated into one harness Image credits Technical Solutions wwwtecsolcomau
3
FOREWORD 5
VENUE 7
PROGRAMME 9
ORAL SESSION I 15
ORAL SESSION II 23
ORAL SESSION III 31
ORALPOSTER SESSION 43
AUTHOR INDEX 59
5
This one day national workshop addresses the last advances in optical coatings
and other nanostructured supported systems of great importance for the
development of integrated structures and other advanced photonic components
Three main areas of RampD in this topic will be particularly considered photonics
solar energy recovery and classical optical applications of thin films The scope of
the meeting covers fundamental and applied aspects encompassing the latest
advances in fabrication technologies the analysis and properties of the films and
nanostructures as well as the modelling of their photonic behaviour OPTO-
COAT includes contributions on surface functionalization and thin film
preparation to achieve a better control and development of the optical
properties
Coinciding its celebration with the XIII National Conference of Materials
OPTO-COAT will provide a specific and unique forum where researchers and
engineers from Spain and abroad will have the opportunity to exchange their
latest experiments and more interesting scientific results with a focused
perspective onto optical and photonic applications of deposited materials The
participation in the three thematic areas of well-known speakers will provide a
unique opportunity to first-hand learning the latest advances and main
challenges in this emerging scientific discipline
Agustiacuten R Gonzaacutelez-Elipe and Ramoacuten Escobar Galindo
(OPTO-COAT Chairmen)
7
OPTO-COAT workshop will be held in the campus of the University of Alicante
The oral sessions will take place in room A10-02M on the ground floor of
the Aulario I while the poster session and the lunch will be allocated at the Club
Social I right in front of Aulario I (see map below)
VACUUM CHAMBERS
hellipmade to suit our
customersrsquo requirements
- Sample holders
- Shutters
- In-vacuum manipulation
- Thin Film Production
CRYOGENICS
hellipadapted to the
existing systems
- Cryo-free cooling
- Cryostats
- LIN sample cooling
Contact criolabclixpt
PROGRAMME
11
830 Registration
900 Opening Session
SESSION I
Chairman Agustiacuten R Gonzaacutelez-Elipe
905
Invited lecture
Thermochromics and nanothermochromics New approaches to energy
efficient ldquosmartrdquo windows
Claes G Granqvist
The Angstrom Laboratory Uppsala University Sweden
INV1
945
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR1-1
1005
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo
Instituto de Microelectroacutenica de Madrid CSIC Spain
OR1-2
1025
Computer simulation of the optical properties of MoSiO2 and MoSi3N4
cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea
Tecnalia Energy Unit Spain
OR1-3
1045
Coloured W-O coatings based on gradient of chemical composition
Albano Cavaleiro
Universidad de Coimbra Portugal
OR1-4
1105
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
Noelia Benito
Universidad Autoacutenoma de Madrid Spain
OR1-5
1125
POSTER PRESENTATION I
Spectral integrated infrared filter for the Martian airborne Dust Sensor
of the MetNet Space Mission
Francisco Corteacutes
Universidad Carlos III de Madrid Spain
PO1
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch
Universitat de Barcelona Spain
PO2
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro
Fundacioacute CTM Centre Tecnologravegic Spain
PO3
PROGRAMME
12
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena
Asociacioacuten de la Industria Navarra Spain
PO4
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing applications
Nuno Figueiredo
Universidade de Coimbra Portugal
PO5
1145 Coffee Break
SESSION II
Chairman Ramoacuten Escobar Galindo
1210
Invited lecture
Transparent Electronics From materials to devices
Elvira Fortunato
CENIMATI3N Universidade Nova de Lisboa Portugal
INV2
1250
Spectrometric ellipsometry characterization of highly conductive Ga-
doped ZnO thin films deposited onto Si wafers
Efraiacuten Ochoa
Universidad de Maacutelaga Spain
OR2-1
1310
Exciton photoluminescence in transparent ZnO thin films obtained by
DC magnetron sputtering
Adolfo Mosquera
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-2
1330
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui
Tekniker Research Centre Spain
OR2-3
1350
Optical and structural properties of Ti doped ZnO thin films grown by
magnetron co-sputtering at room temperature
Miriam Yuste
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-4
1410
POSTER PRESENTATION II
Electrochromic behaviour of WxSiyOz thin films prepared by reactive
magnetron sputtering at normal and glancing angles
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO6
Synthesis of nanostructured ZnO thin films by oblique angle sputtering
deposition
Diana Toledano
Instituto de Ciencia de Materiales de Madrid CSIC Spain
PO7
PROGRAMME
13
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO8
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de silicio
enriquecidos en silicio
Joan Juvert
Instituto de Microelectroacutenica de Barcelona CSIC Spain
PO9
Preparation of antirreflective silica-based films by sol-gel method
Cecilia Agustiacuten
Tecnalia Energy Unit Spain
PO10
1430 Lunch and Poster Session
SESSION III
Chairman Joseacute Mariacutea Albella
1600
Invited lecture
Molecular design of nanostructured inorganic and hybrid films
Cleacutement Sanchez
CNRS Universiteacute Pierre et Marie Curie France
INV3
1640
Characterization of host-guest interactions by persistent spectral hole
burning on hybrid clay-dye nanopigments
Ernesto Baena-Murillo
Universidad de Alicante Spain
OR3-1
1700
Structural and photocatalytic properties of multi-walled titanate-
based nanotubes
Ignacio Caretti
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR3-2
1720
Fluorescent thin films prepared by plasma deposition for their
integration with photonic structures
Aacutengel Barranco
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR3-3
1740
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
Ruth Lahoz
Instituto de Ciencia de Materiales de Aragoacuten CSIC Spain
OR3-4
1800
Large area self-assembled monolayers of colloidal silica nanoparticles
Enric Bertraacuten
Universitat de Barcelona Spain
OR3-5
1820 Closure
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 3: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/3.jpg)
3
FOREWORD 5
VENUE 7
PROGRAMME 9
ORAL SESSION I 15
ORAL SESSION II 23
ORAL SESSION III 31
ORALPOSTER SESSION 43
AUTHOR INDEX 59
5
This one day national workshop addresses the last advances in optical coatings
and other nanostructured supported systems of great importance for the
development of integrated structures and other advanced photonic components
Three main areas of RampD in this topic will be particularly considered photonics
solar energy recovery and classical optical applications of thin films The scope of
the meeting covers fundamental and applied aspects encompassing the latest
advances in fabrication technologies the analysis and properties of the films and
nanostructures as well as the modelling of their photonic behaviour OPTO-
COAT includes contributions on surface functionalization and thin film
preparation to achieve a better control and development of the optical
properties
Coinciding its celebration with the XIII National Conference of Materials
OPTO-COAT will provide a specific and unique forum where researchers and
engineers from Spain and abroad will have the opportunity to exchange their
latest experiments and more interesting scientific results with a focused
perspective onto optical and photonic applications of deposited materials The
participation in the three thematic areas of well-known speakers will provide a
unique opportunity to first-hand learning the latest advances and main
challenges in this emerging scientific discipline
Agustiacuten R Gonzaacutelez-Elipe and Ramoacuten Escobar Galindo
(OPTO-COAT Chairmen)
7
OPTO-COAT workshop will be held in the campus of the University of Alicante
The oral sessions will take place in room A10-02M on the ground floor of
the Aulario I while the poster session and the lunch will be allocated at the Club
Social I right in front of Aulario I (see map below)
VACUUM CHAMBERS
hellipmade to suit our
customersrsquo requirements
- Sample holders
- Shutters
- In-vacuum manipulation
- Thin Film Production
CRYOGENICS
hellipadapted to the
existing systems
- Cryo-free cooling
- Cryostats
- LIN sample cooling
Contact criolabclixpt
PROGRAMME
11
830 Registration
900 Opening Session
SESSION I
Chairman Agustiacuten R Gonzaacutelez-Elipe
905
Invited lecture
Thermochromics and nanothermochromics New approaches to energy
efficient ldquosmartrdquo windows
Claes G Granqvist
The Angstrom Laboratory Uppsala University Sweden
INV1
945
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR1-1
1005
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo
Instituto de Microelectroacutenica de Madrid CSIC Spain
OR1-2
1025
Computer simulation of the optical properties of MoSiO2 and MoSi3N4
cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea
Tecnalia Energy Unit Spain
OR1-3
1045
Coloured W-O coatings based on gradient of chemical composition
Albano Cavaleiro
Universidad de Coimbra Portugal
OR1-4
1105
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
Noelia Benito
Universidad Autoacutenoma de Madrid Spain
OR1-5
1125
POSTER PRESENTATION I
Spectral integrated infrared filter for the Martian airborne Dust Sensor
of the MetNet Space Mission
Francisco Corteacutes
Universidad Carlos III de Madrid Spain
PO1
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch
Universitat de Barcelona Spain
PO2
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro
Fundacioacute CTM Centre Tecnologravegic Spain
PO3
PROGRAMME
12
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena
Asociacioacuten de la Industria Navarra Spain
PO4
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing applications
Nuno Figueiredo
Universidade de Coimbra Portugal
PO5
1145 Coffee Break
SESSION II
Chairman Ramoacuten Escobar Galindo
1210
Invited lecture
Transparent Electronics From materials to devices
Elvira Fortunato
CENIMATI3N Universidade Nova de Lisboa Portugal
INV2
1250
Spectrometric ellipsometry characterization of highly conductive Ga-
doped ZnO thin films deposited onto Si wafers
Efraiacuten Ochoa
Universidad de Maacutelaga Spain
OR2-1
1310
Exciton photoluminescence in transparent ZnO thin films obtained by
DC magnetron sputtering
Adolfo Mosquera
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-2
1330
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui
Tekniker Research Centre Spain
OR2-3
1350
Optical and structural properties of Ti doped ZnO thin films grown by
magnetron co-sputtering at room temperature
Miriam Yuste
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-4
1410
POSTER PRESENTATION II
Electrochromic behaviour of WxSiyOz thin films prepared by reactive
magnetron sputtering at normal and glancing angles
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO6
Synthesis of nanostructured ZnO thin films by oblique angle sputtering
deposition
Diana Toledano
Instituto de Ciencia de Materiales de Madrid CSIC Spain
PO7
PROGRAMME
13
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO8
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de silicio
enriquecidos en silicio
Joan Juvert
Instituto de Microelectroacutenica de Barcelona CSIC Spain
PO9
Preparation of antirreflective silica-based films by sol-gel method
Cecilia Agustiacuten
Tecnalia Energy Unit Spain
PO10
1430 Lunch and Poster Session
SESSION III
Chairman Joseacute Mariacutea Albella
1600
Invited lecture
Molecular design of nanostructured inorganic and hybrid films
Cleacutement Sanchez
CNRS Universiteacute Pierre et Marie Curie France
INV3
1640
Characterization of host-guest interactions by persistent spectral hole
burning on hybrid clay-dye nanopigments
Ernesto Baena-Murillo
Universidad de Alicante Spain
OR3-1
1700
Structural and photocatalytic properties of multi-walled titanate-
based nanotubes
Ignacio Caretti
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR3-2
1720
Fluorescent thin films prepared by plasma deposition for their
integration with photonic structures
Aacutengel Barranco
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR3-3
1740
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
Ruth Lahoz
Instituto de Ciencia de Materiales de Aragoacuten CSIC Spain
OR3-4
1800
Large area self-assembled monolayers of colloidal silica nanoparticles
Enric Bertraacuten
Universitat de Barcelona Spain
OR3-5
1820 Closure
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 4: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/4.jpg)
5
This one day national workshop addresses the last advances in optical coatings
and other nanostructured supported systems of great importance for the
development of integrated structures and other advanced photonic components
Three main areas of RampD in this topic will be particularly considered photonics
solar energy recovery and classical optical applications of thin films The scope of
the meeting covers fundamental and applied aspects encompassing the latest
advances in fabrication technologies the analysis and properties of the films and
nanostructures as well as the modelling of their photonic behaviour OPTO-
COAT includes contributions on surface functionalization and thin film
preparation to achieve a better control and development of the optical
properties
Coinciding its celebration with the XIII National Conference of Materials
OPTO-COAT will provide a specific and unique forum where researchers and
engineers from Spain and abroad will have the opportunity to exchange their
latest experiments and more interesting scientific results with a focused
perspective onto optical and photonic applications of deposited materials The
participation in the three thematic areas of well-known speakers will provide a
unique opportunity to first-hand learning the latest advances and main
challenges in this emerging scientific discipline
Agustiacuten R Gonzaacutelez-Elipe and Ramoacuten Escobar Galindo
(OPTO-COAT Chairmen)
7
OPTO-COAT workshop will be held in the campus of the University of Alicante
The oral sessions will take place in room A10-02M on the ground floor of
the Aulario I while the poster session and the lunch will be allocated at the Club
Social I right in front of Aulario I (see map below)
VACUUM CHAMBERS
hellipmade to suit our
customersrsquo requirements
- Sample holders
- Shutters
- In-vacuum manipulation
- Thin Film Production
CRYOGENICS
hellipadapted to the
existing systems
- Cryo-free cooling
- Cryostats
- LIN sample cooling
Contact criolabclixpt
PROGRAMME
11
830 Registration
900 Opening Session
SESSION I
Chairman Agustiacuten R Gonzaacutelez-Elipe
905
Invited lecture
Thermochromics and nanothermochromics New approaches to energy
efficient ldquosmartrdquo windows
Claes G Granqvist
The Angstrom Laboratory Uppsala University Sweden
INV1
945
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR1-1
1005
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo
Instituto de Microelectroacutenica de Madrid CSIC Spain
OR1-2
1025
Computer simulation of the optical properties of MoSiO2 and MoSi3N4
cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea
Tecnalia Energy Unit Spain
OR1-3
1045
Coloured W-O coatings based on gradient of chemical composition
Albano Cavaleiro
Universidad de Coimbra Portugal
OR1-4
1105
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
Noelia Benito
Universidad Autoacutenoma de Madrid Spain
OR1-5
1125
POSTER PRESENTATION I
Spectral integrated infrared filter for the Martian airborne Dust Sensor
of the MetNet Space Mission
Francisco Corteacutes
Universidad Carlos III de Madrid Spain
PO1
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch
Universitat de Barcelona Spain
PO2
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro
Fundacioacute CTM Centre Tecnologravegic Spain
PO3
PROGRAMME
12
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena
Asociacioacuten de la Industria Navarra Spain
PO4
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing applications
Nuno Figueiredo
Universidade de Coimbra Portugal
PO5
1145 Coffee Break
SESSION II
Chairman Ramoacuten Escobar Galindo
1210
Invited lecture
Transparent Electronics From materials to devices
Elvira Fortunato
CENIMATI3N Universidade Nova de Lisboa Portugal
INV2
1250
Spectrometric ellipsometry characterization of highly conductive Ga-
doped ZnO thin films deposited onto Si wafers
Efraiacuten Ochoa
Universidad de Maacutelaga Spain
OR2-1
1310
Exciton photoluminescence in transparent ZnO thin films obtained by
DC magnetron sputtering
Adolfo Mosquera
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-2
1330
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui
Tekniker Research Centre Spain
OR2-3
1350
Optical and structural properties of Ti doped ZnO thin films grown by
magnetron co-sputtering at room temperature
Miriam Yuste
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-4
1410
POSTER PRESENTATION II
Electrochromic behaviour of WxSiyOz thin films prepared by reactive
magnetron sputtering at normal and glancing angles
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO6
Synthesis of nanostructured ZnO thin films by oblique angle sputtering
deposition
Diana Toledano
Instituto de Ciencia de Materiales de Madrid CSIC Spain
PO7
PROGRAMME
13
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO8
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de silicio
enriquecidos en silicio
Joan Juvert
Instituto de Microelectroacutenica de Barcelona CSIC Spain
PO9
Preparation of antirreflective silica-based films by sol-gel method
Cecilia Agustiacuten
Tecnalia Energy Unit Spain
PO10
1430 Lunch and Poster Session
SESSION III
Chairman Joseacute Mariacutea Albella
1600
Invited lecture
Molecular design of nanostructured inorganic and hybrid films
Cleacutement Sanchez
CNRS Universiteacute Pierre et Marie Curie France
INV3
1640
Characterization of host-guest interactions by persistent spectral hole
burning on hybrid clay-dye nanopigments
Ernesto Baena-Murillo
Universidad de Alicante Spain
OR3-1
1700
Structural and photocatalytic properties of multi-walled titanate-
based nanotubes
Ignacio Caretti
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR3-2
1720
Fluorescent thin films prepared by plasma deposition for their
integration with photonic structures
Aacutengel Barranco
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR3-3
1740
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
Ruth Lahoz
Instituto de Ciencia de Materiales de Aragoacuten CSIC Spain
OR3-4
1800
Large area self-assembled monolayers of colloidal silica nanoparticles
Enric Bertraacuten
Universitat de Barcelona Spain
OR3-5
1820 Closure
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 5: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/5.jpg)
7
OPTO-COAT workshop will be held in the campus of the University of Alicante
The oral sessions will take place in room A10-02M on the ground floor of
the Aulario I while the poster session and the lunch will be allocated at the Club
Social I right in front of Aulario I (see map below)
VACUUM CHAMBERS
hellipmade to suit our
customersrsquo requirements
- Sample holders
- Shutters
- In-vacuum manipulation
- Thin Film Production
CRYOGENICS
hellipadapted to the
existing systems
- Cryo-free cooling
- Cryostats
- LIN sample cooling
Contact criolabclixpt
PROGRAMME
11
830 Registration
900 Opening Session
SESSION I
Chairman Agustiacuten R Gonzaacutelez-Elipe
905
Invited lecture
Thermochromics and nanothermochromics New approaches to energy
efficient ldquosmartrdquo windows
Claes G Granqvist
The Angstrom Laboratory Uppsala University Sweden
INV1
945
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR1-1
1005
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo
Instituto de Microelectroacutenica de Madrid CSIC Spain
OR1-2
1025
Computer simulation of the optical properties of MoSiO2 and MoSi3N4
cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea
Tecnalia Energy Unit Spain
OR1-3
1045
Coloured W-O coatings based on gradient of chemical composition
Albano Cavaleiro
Universidad de Coimbra Portugal
OR1-4
1105
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
Noelia Benito
Universidad Autoacutenoma de Madrid Spain
OR1-5
1125
POSTER PRESENTATION I
Spectral integrated infrared filter for the Martian airborne Dust Sensor
of the MetNet Space Mission
Francisco Corteacutes
Universidad Carlos III de Madrid Spain
PO1
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch
Universitat de Barcelona Spain
PO2
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro
Fundacioacute CTM Centre Tecnologravegic Spain
PO3
PROGRAMME
12
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena
Asociacioacuten de la Industria Navarra Spain
PO4
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing applications
Nuno Figueiredo
Universidade de Coimbra Portugal
PO5
1145 Coffee Break
SESSION II
Chairman Ramoacuten Escobar Galindo
1210
Invited lecture
Transparent Electronics From materials to devices
Elvira Fortunato
CENIMATI3N Universidade Nova de Lisboa Portugal
INV2
1250
Spectrometric ellipsometry characterization of highly conductive Ga-
doped ZnO thin films deposited onto Si wafers
Efraiacuten Ochoa
Universidad de Maacutelaga Spain
OR2-1
1310
Exciton photoluminescence in transparent ZnO thin films obtained by
DC magnetron sputtering
Adolfo Mosquera
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-2
1330
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui
Tekniker Research Centre Spain
OR2-3
1350
Optical and structural properties of Ti doped ZnO thin films grown by
magnetron co-sputtering at room temperature
Miriam Yuste
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-4
1410
POSTER PRESENTATION II
Electrochromic behaviour of WxSiyOz thin films prepared by reactive
magnetron sputtering at normal and glancing angles
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO6
Synthesis of nanostructured ZnO thin films by oblique angle sputtering
deposition
Diana Toledano
Instituto de Ciencia de Materiales de Madrid CSIC Spain
PO7
PROGRAMME
13
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO8
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de silicio
enriquecidos en silicio
Joan Juvert
Instituto de Microelectroacutenica de Barcelona CSIC Spain
PO9
Preparation of antirreflective silica-based films by sol-gel method
Cecilia Agustiacuten
Tecnalia Energy Unit Spain
PO10
1430 Lunch and Poster Session
SESSION III
Chairman Joseacute Mariacutea Albella
1600
Invited lecture
Molecular design of nanostructured inorganic and hybrid films
Cleacutement Sanchez
CNRS Universiteacute Pierre et Marie Curie France
INV3
1640
Characterization of host-guest interactions by persistent spectral hole
burning on hybrid clay-dye nanopigments
Ernesto Baena-Murillo
Universidad de Alicante Spain
OR3-1
1700
Structural and photocatalytic properties of multi-walled titanate-
based nanotubes
Ignacio Caretti
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR3-2
1720
Fluorescent thin films prepared by plasma deposition for their
integration with photonic structures
Aacutengel Barranco
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR3-3
1740
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
Ruth Lahoz
Instituto de Ciencia de Materiales de Aragoacuten CSIC Spain
OR3-4
1800
Large area self-assembled monolayers of colloidal silica nanoparticles
Enric Bertraacuten
Universitat de Barcelona Spain
OR3-5
1820 Closure
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 6: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/6.jpg)
VACUUM CHAMBERS
hellipmade to suit our
customersrsquo requirements
- Sample holders
- Shutters
- In-vacuum manipulation
- Thin Film Production
CRYOGENICS
hellipadapted to the
existing systems
- Cryo-free cooling
- Cryostats
- LIN sample cooling
Contact criolabclixpt
PROGRAMME
11
830 Registration
900 Opening Session
SESSION I
Chairman Agustiacuten R Gonzaacutelez-Elipe
905
Invited lecture
Thermochromics and nanothermochromics New approaches to energy
efficient ldquosmartrdquo windows
Claes G Granqvist
The Angstrom Laboratory Uppsala University Sweden
INV1
945
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR1-1
1005
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo
Instituto de Microelectroacutenica de Madrid CSIC Spain
OR1-2
1025
Computer simulation of the optical properties of MoSiO2 and MoSi3N4
cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea
Tecnalia Energy Unit Spain
OR1-3
1045
Coloured W-O coatings based on gradient of chemical composition
Albano Cavaleiro
Universidad de Coimbra Portugal
OR1-4
1105
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
Noelia Benito
Universidad Autoacutenoma de Madrid Spain
OR1-5
1125
POSTER PRESENTATION I
Spectral integrated infrared filter for the Martian airborne Dust Sensor
of the MetNet Space Mission
Francisco Corteacutes
Universidad Carlos III de Madrid Spain
PO1
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch
Universitat de Barcelona Spain
PO2
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro
Fundacioacute CTM Centre Tecnologravegic Spain
PO3
PROGRAMME
12
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena
Asociacioacuten de la Industria Navarra Spain
PO4
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing applications
Nuno Figueiredo
Universidade de Coimbra Portugal
PO5
1145 Coffee Break
SESSION II
Chairman Ramoacuten Escobar Galindo
1210
Invited lecture
Transparent Electronics From materials to devices
Elvira Fortunato
CENIMATI3N Universidade Nova de Lisboa Portugal
INV2
1250
Spectrometric ellipsometry characterization of highly conductive Ga-
doped ZnO thin films deposited onto Si wafers
Efraiacuten Ochoa
Universidad de Maacutelaga Spain
OR2-1
1310
Exciton photoluminescence in transparent ZnO thin films obtained by
DC magnetron sputtering
Adolfo Mosquera
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-2
1330
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui
Tekniker Research Centre Spain
OR2-3
1350
Optical and structural properties of Ti doped ZnO thin films grown by
magnetron co-sputtering at room temperature
Miriam Yuste
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-4
1410
POSTER PRESENTATION II
Electrochromic behaviour of WxSiyOz thin films prepared by reactive
magnetron sputtering at normal and glancing angles
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO6
Synthesis of nanostructured ZnO thin films by oblique angle sputtering
deposition
Diana Toledano
Instituto de Ciencia de Materiales de Madrid CSIC Spain
PO7
PROGRAMME
13
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO8
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de silicio
enriquecidos en silicio
Joan Juvert
Instituto de Microelectroacutenica de Barcelona CSIC Spain
PO9
Preparation of antirreflective silica-based films by sol-gel method
Cecilia Agustiacuten
Tecnalia Energy Unit Spain
PO10
1430 Lunch and Poster Session
SESSION III
Chairman Joseacute Mariacutea Albella
1600
Invited lecture
Molecular design of nanostructured inorganic and hybrid films
Cleacutement Sanchez
CNRS Universiteacute Pierre et Marie Curie France
INV3
1640
Characterization of host-guest interactions by persistent spectral hole
burning on hybrid clay-dye nanopigments
Ernesto Baena-Murillo
Universidad de Alicante Spain
OR3-1
1700
Structural and photocatalytic properties of multi-walled titanate-
based nanotubes
Ignacio Caretti
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR3-2
1720
Fluorescent thin films prepared by plasma deposition for their
integration with photonic structures
Aacutengel Barranco
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR3-3
1740
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
Ruth Lahoz
Instituto de Ciencia de Materiales de Aragoacuten CSIC Spain
OR3-4
1800
Large area self-assembled monolayers of colloidal silica nanoparticles
Enric Bertraacuten
Universitat de Barcelona Spain
OR3-5
1820 Closure
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 7: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/7.jpg)
PROGRAMME
11
830 Registration
900 Opening Session
SESSION I
Chairman Agustiacuten R Gonzaacutelez-Elipe
905
Invited lecture
Thermochromics and nanothermochromics New approaches to energy
efficient ldquosmartrdquo windows
Claes G Granqvist
The Angstrom Laboratory Uppsala University Sweden
INV1
945
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR1-1
1005
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo
Instituto de Microelectroacutenica de Madrid CSIC Spain
OR1-2
1025
Computer simulation of the optical properties of MoSiO2 and MoSi3N4
cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea
Tecnalia Energy Unit Spain
OR1-3
1045
Coloured W-O coatings based on gradient of chemical composition
Albano Cavaleiro
Universidad de Coimbra Portugal
OR1-4
1105
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
Noelia Benito
Universidad Autoacutenoma de Madrid Spain
OR1-5
1125
POSTER PRESENTATION I
Spectral integrated infrared filter for the Martian airborne Dust Sensor
of the MetNet Space Mission
Francisco Corteacutes
Universidad Carlos III de Madrid Spain
PO1
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch
Universitat de Barcelona Spain
PO2
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro
Fundacioacute CTM Centre Tecnologravegic Spain
PO3
PROGRAMME
12
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena
Asociacioacuten de la Industria Navarra Spain
PO4
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing applications
Nuno Figueiredo
Universidade de Coimbra Portugal
PO5
1145 Coffee Break
SESSION II
Chairman Ramoacuten Escobar Galindo
1210
Invited lecture
Transparent Electronics From materials to devices
Elvira Fortunato
CENIMATI3N Universidade Nova de Lisboa Portugal
INV2
1250
Spectrometric ellipsometry characterization of highly conductive Ga-
doped ZnO thin films deposited onto Si wafers
Efraiacuten Ochoa
Universidad de Maacutelaga Spain
OR2-1
1310
Exciton photoluminescence in transparent ZnO thin films obtained by
DC magnetron sputtering
Adolfo Mosquera
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-2
1330
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui
Tekniker Research Centre Spain
OR2-3
1350
Optical and structural properties of Ti doped ZnO thin films grown by
magnetron co-sputtering at room temperature
Miriam Yuste
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-4
1410
POSTER PRESENTATION II
Electrochromic behaviour of WxSiyOz thin films prepared by reactive
magnetron sputtering at normal and glancing angles
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO6
Synthesis of nanostructured ZnO thin films by oblique angle sputtering
deposition
Diana Toledano
Instituto de Ciencia de Materiales de Madrid CSIC Spain
PO7
PROGRAMME
13
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO8
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de silicio
enriquecidos en silicio
Joan Juvert
Instituto de Microelectroacutenica de Barcelona CSIC Spain
PO9
Preparation of antirreflective silica-based films by sol-gel method
Cecilia Agustiacuten
Tecnalia Energy Unit Spain
PO10
1430 Lunch and Poster Session
SESSION III
Chairman Joseacute Mariacutea Albella
1600
Invited lecture
Molecular design of nanostructured inorganic and hybrid films
Cleacutement Sanchez
CNRS Universiteacute Pierre et Marie Curie France
INV3
1640
Characterization of host-guest interactions by persistent spectral hole
burning on hybrid clay-dye nanopigments
Ernesto Baena-Murillo
Universidad de Alicante Spain
OR3-1
1700
Structural and photocatalytic properties of multi-walled titanate-
based nanotubes
Ignacio Caretti
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR3-2
1720
Fluorescent thin films prepared by plasma deposition for their
integration with photonic structures
Aacutengel Barranco
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR3-3
1740
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
Ruth Lahoz
Instituto de Ciencia de Materiales de Aragoacuten CSIC Spain
OR3-4
1800
Large area self-assembled monolayers of colloidal silica nanoparticles
Enric Bertraacuten
Universitat de Barcelona Spain
OR3-5
1820 Closure
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 8: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/8.jpg)
PROGRAMME
12
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena
Asociacioacuten de la Industria Navarra Spain
PO4
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing applications
Nuno Figueiredo
Universidade de Coimbra Portugal
PO5
1145 Coffee Break
SESSION II
Chairman Ramoacuten Escobar Galindo
1210
Invited lecture
Transparent Electronics From materials to devices
Elvira Fortunato
CENIMATI3N Universidade Nova de Lisboa Portugal
INV2
1250
Spectrometric ellipsometry characterization of highly conductive Ga-
doped ZnO thin films deposited onto Si wafers
Efraiacuten Ochoa
Universidad de Maacutelaga Spain
OR2-1
1310
Exciton photoluminescence in transparent ZnO thin films obtained by
DC magnetron sputtering
Adolfo Mosquera
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-2
1330
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui
Tekniker Research Centre Spain
OR2-3
1350
Optical and structural properties of Ti doped ZnO thin films grown by
magnetron co-sputtering at room temperature
Miriam Yuste
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR2-4
1410
POSTER PRESENTATION II
Electrochromic behaviour of WxSiyOz thin films prepared by reactive
magnetron sputtering at normal and glancing angles
Francisco Yubero
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO6
Synthesis of nanostructured ZnO thin films by oblique angle sputtering
deposition
Diana Toledano
Instituto de Ciencia de Materiales de Madrid CSIC Spain
PO7
PROGRAMME
13
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO8
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de silicio
enriquecidos en silicio
Joan Juvert
Instituto de Microelectroacutenica de Barcelona CSIC Spain
PO9
Preparation of antirreflective silica-based films by sol-gel method
Cecilia Agustiacuten
Tecnalia Energy Unit Spain
PO10
1430 Lunch and Poster Session
SESSION III
Chairman Joseacute Mariacutea Albella
1600
Invited lecture
Molecular design of nanostructured inorganic and hybrid films
Cleacutement Sanchez
CNRS Universiteacute Pierre et Marie Curie France
INV3
1640
Characterization of host-guest interactions by persistent spectral hole
burning on hybrid clay-dye nanopigments
Ernesto Baena-Murillo
Universidad de Alicante Spain
OR3-1
1700
Structural and photocatalytic properties of multi-walled titanate-
based nanotubes
Ignacio Caretti
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR3-2
1720
Fluorescent thin films prepared by plasma deposition for their
integration with photonic structures
Aacutengel Barranco
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR3-3
1740
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
Ruth Lahoz
Instituto de Ciencia de Materiales de Aragoacuten CSIC Spain
OR3-4
1800
Large area self-assembled monolayers of colloidal silica nanoparticles
Enric Bertraacuten
Universitat de Barcelona Spain
OR3-5
1820 Closure
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 9: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/9.jpg)
PROGRAMME
13
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
PO8
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de silicio
enriquecidos en silicio
Joan Juvert
Instituto de Microelectroacutenica de Barcelona CSIC Spain
PO9
Preparation of antirreflective silica-based films by sol-gel method
Cecilia Agustiacuten
Tecnalia Energy Unit Spain
PO10
1430 Lunch and Poster Session
SESSION III
Chairman Joseacute Mariacutea Albella
1600
Invited lecture
Molecular design of nanostructured inorganic and hybrid films
Cleacutement Sanchez
CNRS Universiteacute Pierre et Marie Curie France
INV3
1640
Characterization of host-guest interactions by persistent spectral hole
burning on hybrid clay-dye nanopigments
Ernesto Baena-Murillo
Universidad de Alicante Spain
OR3-1
1700
Structural and photocatalytic properties of multi-walled titanate-
based nanotubes
Ignacio Caretti
Instituto de Ciencia de Materiales de Madrid CSIC Spain
OR3-2
1720
Fluorescent thin films prepared by plasma deposition for their
integration with photonic structures
Aacutengel Barranco
Instituto de Ciencia de Materiales de Sevilla CSIC Spain
OR3-3
1740
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
Ruth Lahoz
Instituto de Ciencia de Materiales de Aragoacuten CSIC Spain
OR3-4
1800
Large area self-assembled monolayers of colloidal silica nanoparticles
Enric Bertraacuten
Universitat de Barcelona Spain
OR3-5
1820 Closure
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 10: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/10.jpg)
Vaacutelvulas de Alto y Ultra‐Alto Vaciacuteo
Sistemas de Evaporacioacuten y Sputtering
raquo Vaacutelvulas angulares en liacutenearaquo Vaacutelvulas de guillotinaraquo Alto y Ultra Vaciacuteo
raquo Vaacutelvulas especiales
raquo Procesos de evaporacioacuten en alto vaciacuteoraquo Fuentes teacutermicas y cantildeoacuten de electrones
raquo Procesos de sputtering (DC RF PulsedDC RF‐Bias)
raquo Tecnologiacutea de arcoraquo Trampas friacuteas para reduccioacuten de tiempos de bombeo
raquo Teacutecnicas de limpieza y calentamiento de sustratos
Aplicacionesraquo Equipos de laboratorioraquo Maacutequinas prototiposraquo Sistemas industriales
wwwtecnovaces ‐ tecnovactecnovaces ‐ 918 041 134
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 11: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/11.jpg)
SESSION I
17
INV1
Thermochromics and nanothermochromics New approaches to
energy efficient ldquosmartrdquo windows
Claes G Granqvist
Department of Engineering Sciences The Angstrom Laboratory Uppsala University
P O Box 534 SE-75121 Uppsala Sweden
Email for corresponding author claes-gorangranqvistangstromuuse
Thermochromic technology can be employed for regulating the solar energy
throughput in ldquosmartrdquo windows with the object of achieving energy efficiency in
buildings Thin films of vanadium dioxide (VO2) give an appropriate starting
point for developing this functionality they have a significantly higher infrared
transmittance below a ldquocriticalrdquo temperature τc than above this temperature as a
result of a reversible structural transformation However VO2 films cannot be
used without modification for three main reasons (i) the modulation of solar
transmittance ΔTsol is too small at τc (ii) the luminous transmittance Tlum is too
low and (iii) τc is ~68 degC and hence too high for normal buildings-related
applications I describe how these three problems can be met to a large degree
and thus how thermochromic fenestration for energy efficient buildings can
come closer to practical realization In particular I discuss how
nanothermochromicsmdashinvolving VO2-based nanoparticle composites rather than
thin filmsmdashmake it possible to significantly improve ΔTsol as well Tlum how
magnesium doping of VO2 can give further enhancements of Tlum and how
tungsten doping (and to some extent also magnesium doping) can bring τc to a
normal comfort temperature Finally I outline how thermochromics may be
combined with electrochromics and vacuum insulation in order to create novel
ldquosuper fenestrationrdquo for buildings with radically improved energy performance
and a high degree of indoor comfort
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 12: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/12.jpg)
SESSION I
18
OR1-1
Luminescent oxide thin films prepared by reactive magnetron
sputtering and plasma decomposition of non-volatile precursors
J Gil-Rostra F Yubero A Barranco FJ Ferrer AR Gonzaacutelez-Elipe
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author yuberoicmsecsices
This paper reports on a new procedure of preparation ox mixed oxide thin films
that combines the traditional reactive magnetron sputtering (MS) deposition of
one of the oxide components with the plasma activated decomposition of non-
volatile precursors at room temperature The procedure consists of using the
plasma activated by the magnetron discharge to decompose a metal-organic
compound sublimated by means of an effusion cell within the deposition
chamber This approach is of interest when any of the cations is not stable in air
or cannot be incorporated in a mixed magnetron target [1]
In this presentation the capabilities of this new experimental procedure are
shown with the preparation of luminescent thin films consisting of rare earth
(RE) cations (Tb3+ Eu3+ hellip) incorporated as minority elements in an oxide matrix
(TiO2 SiO2 ZnO) In these preparations the oxide matrix was supplied by
reactive MS from Ti Si or Zn targets while the RE cation was dosed by
sublimation of acetylacetonate compounds The obtained mixed oxide thin films
have been characterized by different methods and their luminescent properties
studied as a function of RE element present in the film Potential applications as
luminescent electroluminescent and ionluminiscent materials are discussed
[1] J Gil-Rostra F Yubero A Barranco AR Gonzaacutelez-Elipe Procedimiento para la preparacioacuten de
peliacuteculas delgadas de oacutexidos mixtos sobre sustratos y dispositivo para su realizacioacuten Spanish patent
P201230048 Presented 13 January 2012
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 13: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/13.jpg)
SESSION I
19
OR1-2
Uso de estructuras fotoacutenicas como ARC para ceacutelulas solares de Silicio
Jeroacutenimo Buencuerpo Farintildea Jose M Llorens Montolio Luis E Mun oz
Camun ez Mariacute a L Dotor Castilla y Pablo A Postigo Resa
Instituto de Microelectroacutenica de Madrid Grupo MBE Tres Cantos Madrid Espantildea
Email for corresponding author jeronimobuencuerpoimmcnmcsices
En este trabajo nos hemos centrado en el disen o de antireflectantes para ce lulas
solares de silicio mediante estructuras foto nicas Sistemas micro-texturizados
como pira mides ldquopaneles de abejardquo han sido utilizados anteriormente dando
buenos resultados pero siempre desde una perspectiva del trazado de rayos o
por pura dispersio n de la luz por el sistema aleatorio [12] Es por ello que los
cristales foto nicos al ser estructuras regulares con taman os tiacute picos inferiores a la
longitud de onda de trabajo del sistema pueden aportar mejoras en el
atrapamiento de luz y actuar como antireflectantes y entre otras posibles
mejoras reducir el orden 0 de reflexio n como tambie n se ha explorado en otros
trabajos [3] Las simulaciones se han hecho centra ndose en la reflexio n global
para sistemas formados por un cristal foto nico como antireflectante y un sustrato
infinito de silicio Se han utilizado tres materiales distintos SiO2 Si3N4 y ZnS
tiacute picamente usados en sistemas antireflectantes laminares Tambie n se han
realizado ca lculos para una nanoestructuracio n superficial en el silicio a modo de
antireflectante Los cristales propuestos son bidimensionales (red cuadrada)
compuestos de nanopilares y nanoagujeros Las dimensiones correspondientes
al para metro de red se mantienen por debajo de una micra Se ha introducido un
fino sustrato localizado entre cristal foto nico parte superior y el sustrato de
silicio La figura de me rito que se ha utilizado es un liacute mite Shockley Queisser [4]
Para un sustrato infinito la absorcio n se calculo como 1-R Se lograron eficiencias
correspondientes a un 95 del ma ximo teo rico calculado para los sistemas de
nanopilares de Si3N4 y de ZnS Los sistemas calculados por tanto muestran una
buena respuesta para las energiacute as interesantes para la conversio n fotovoltaica
[1] J Zhao et al Applied Physics Letters 73 14 (1998)
[2] D H Macdonald et al Solar Energy 76 13 277-283 (2004)
[3] A Bozzola et al Optics Express 20 nordm S2 pp A224-A244 (2012)
[4] W Shockley y H J Queisser Journal of Applied Physics 32 3 510-519 (1961)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 14: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/14.jpg)
SESSION I
20
OR1-3
Computer simulation of the optical properties of MoSiO2 and Mo
Si3N4 cermet solar selective coatings
Joseacute Aacutengel Saacutenchez-Garciacutea1 Ramoacuten Escobar Galindo2 Eva Ceacutespedes 23 Joseacute
Mariacutea Albella3 Carlos Prieto2
1Tecnalia Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 3 Institute for Science and Technology in Medicine - Keele University Guy Hilton
Research Centre Thornburrow Drive Hartshill Stoke-on-Trent ST4-7QB UK
Email for corresponding author jangelsancheztecnaliacom
The design of solar selective coatings for concentrated solar power (CSP)
applications requires a detailed knowledge of the optical behavior of materials
forming the coating [12] Therefore this work is based on computer simulation
program CODE [3] followed by validation through fabrication of the coatings and
optical measurements The design and optimization of the composite coating was
undertaken using a computer tool developed within this program [3] employing
Bruggeman effective medium formalism By this physical model the optical
properties of a composite layer can be easily modified by changing the thickness
and metal volume fraction with the exception of particle size and orientation
Two systems of composite thin films of metal and dielectric materials based on
MoSiO2 and Mo Si3N4 were prepared by DC and RF reactive magnetron
sputtering respectively and were verified with computer simulations The optical
simulation program CODE was able to select a heterostructure based on Ag IR-
mirror[MoSiO2Si3N4]n times repeated (HMVF) [MoSiO2Si3N4]m times repeated (LMVF)
SiO2Si3N4 (AR) stratification with the desired photo-thermal parameters The
results were optimized by allowing the program to manipulate the metal volume
fraction and thickness of each layer and the results compared to choose the best
possible configuration The calculated results are within the range of 092-097
for solar absorptance and 002-010 for thermal emittance at room temperature
[1] M Farooq and MG Hutchins Sol Energy Mater Sol Cells 71 (2002) 73-83
[2] M Reza V Fathollahi and M Khalaji Solar Energy 78 (2005) 235-241
[3] W Theiss Coating Designer (CODE) software program httpwwwwtheisscom
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 15: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/15.jpg)
SESSION I
21
OR1-4
Coloured W-O coatings based on gradient of chemical composition
Nuno Parreira1 Tomas Polcar2 Tomas Kubart3 Mikhail Vasilevskiy4 Albano
Cavaleiro1
1 University of Coimbra CEMUC Coimbra Portugal 2 University of Southampton n-CATS Southampton UK
3 Uppsala University Angstrom Laboratory Uppsala Sweden 4 University of Minho Physics Department Braga Portugal
Email for corresponding author albanocavaleirodemucpt
A new design of decorative coatings will be presented The coatings have a
multilayer design consisting of alternating metallic W and W-O layers The
coatings were deposited by magnetron sputtering from a tungsten target and
pulsing the oxygen as reactive gas The controlled injection of the reactive gas can
produce a concentration profile gradient from pure tungsten to tungsten trioxide
determining the final apparent colour of the coating To this gradient layer
corresponds a graded refractive index
The pulsing parameters determines the deposition of the alternating layers
in such a way that the starting step of the O-rich layer before reaching the
deposition in compound mode originates different gradients of the chemical
composition Therefore different colours could be achieved
With the help of a dynamic sputtering model built to simulate the growth of
the coating during the reactive gas pulsing the gradient layer can be simulated as
a function of the deposition and pulsing parameters This model was validated by
direct measurement of the gradient of the oxygen content in some deposited
coatings These results in conjunction with an optical model describing the
optical properties of the deposited tungsten oxide layers allows the deposition of
coatings with a desired colour
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 16: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/16.jpg)
SESSION I
22
OR1-5
Optical properties of Cr-O-Al mixed oxides grown by reactive
magnetron sputtering
N Benito1 R Escobar Galindo2 D Diacuteaz1 O Saacutenchez2 I Caretti 2 and C Palacio1
1Departamento de Fiacutesica Aplicada Facultad de Ciencias Moacutedulo 12 Universidad
Autoacutenoma de Madrid Cantoblanco 28049-Madrid Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author noeliabenitouames
The influence of the chemical composition of Cr-O-Al thin film mixed oxides
grown on Si (100) substrates by reactive magnetron sputtering using different
target compositions from 90 Cr (10 Al) to 10 Cr (90 Al) on the optical
properties (refractive index and reflectivity) has been investigated
Concentration depth profiles (CDP) obtained with XPS and simultaneous Ar+
bombardment reveal the formation of mixed substitutional Me2O3 oxides
(Me=Al+Cr) The observed chemical shift of the Cr 2p Al 2s and O 1s bands
obtained with XPS as well as the structural information provided by FTIR and
XANES confirm the formation of such a type of oxides instead of the formation of
single oxide binary phases Finally the formation of mixed oxides derived in a
control of the optical properties of the films as measured by spectroscopic
ellipsometry and UV-VIS In particular it was found that the refractive index
measured at 600 nm varies in the range 16923 as the chromium amount
decreases Such values lie between those corresponding to Cr2O3 (n = 17) and
Al2O3 (n = 25) and are dependent both on the chemical composition and the
density of the film
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 17: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/17.jpg)
SESSION II
25
INV2
Transparent Electronics From materials to devices
Elvira Fortunato and Rodrigo Martins
CENIMATI3N Departamento de Ciecircncia dos Materiais Faculdade de Ciecircncias e
Tecnologia FCT Universidade Nova de Lisboa and CEMOP-UNINOVA 2829-516
Caparica Portugal
Email for corresponding author emffctunlpt
Transparent electronics has arrived and is contributing for generating a free real
state electronics that is able to add new electronic functionalities onto surfaces
which currently are not used in this manner and where silicon cannot contribute
[1] The already high performance developed n- and p-type TFTs have been
processed by physical vapour deposition (PVD) techniques like rf magnetron
sputtering at room temperature which is already compatible with the use of low
cost and flexible substrates (polymers cellulose paper among others)
Besides that a tremendous development is coming
through solution-based technologies very exciting for
ink-jet printing where the theoretical limitations are
becoming practical evidences In this paper we will
review some of the most promising new technologies
for n- and p-type thin film transistors based on oxide
semiconductors and its currently and future
applications
[1] P Barquinha R Martins L Pereira and E Fortunato
Transparent Semiconductors From Materials to Devices West
Sussex Wiley amp Sons (March 2012) ISBN 9780470683736
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 18: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/18.jpg)
SESSION II
26
OR2-1
Spectrometric ellipsometry characterization of highly conductive
Ga-doped ZnO thin films deposited onto Si wafers
E Ochoa1 S Bijani1 AR Landa-Caacutenovas2 P Herrero2 M Gabaacutes1 S Palanco1 L
Ayala1 F Agulloacute-Rueda2 and JR Ramos-Barrado1
1Dpto de Fiacutesica Aplicada I Lab de Materiales y Superficies Univ de Maacutelaga 29071
Maacutelaga Spain 2Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding authore8amumaes
The suitability of GaZnO as a transparent and conductive material has been
assessed in this work To this end the properties of ZnO and GaZnO thin films
deposited by RF magnetron sputtering onto Si wafer substrates have been
evaluated and compared using a wide variety of experimental techniques such as
transmission electron microscopy (TEM) optical ellipsometry secondary neutral
mass spectrometry (SNMS) and X-ray and ultraviolet photoemission
spectroscopies (XPS UPS) The electrical and optical properties of GaZnO films
have been proved to improve with respect to their respective undoped
counterparts [1] Our results illustrate a well-defined interface between the Ga-
doped film and the Si substrate with a band structure bending which smoothly
adapts to the valence bands of both GaZnO and Si Thus Ga doped ZnO films (1
at) stand out as very promising candidates with application as transparent
conductive oxides in Si solar cell fabrication
[1] M Gabaacutes P Diacuteaz-Carrasco F Agulloacute-Rueda P Herrero AR Landa-Caacutenovas JR Ramos-Barrado
Solar Ener Mat amp Solar Cells 95 2327 (2011)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 19: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/19.jpg)
SESSION II
27
OR2-2
Exciton photoluminescence in transparent ZnO thin films obtained
by DC magnetron sputtering
A Mosquera1 D Horwat2 P Miska3 A Rashkovskiy4 D Wainstein4 A Kovalev4
JL Endrino5 JM Albella1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Institut Jean Lamour Ecole des Mines de Nancy Parc de Saurupt 54042 Nancy
France 3Universite Henri Poincare Deacutepartement 2 Chimie et Physique des Solides et des
Surfaces Nancy France 4 Surface Phenomena Researches Group 2nd Baumanskaya str 923
CNIICHERMET off 475 105005 Moscow Russia 5 Abengoa Research SL Campus Palmas Altas Sector Sunp-Gu-1 Palmas Altas
41014 Sevilla Spain
Email for corresponding author aamosqueraicmmcsices
ZnO thin films with different thicknesses were deposited by DC magnetron
sputtering The structure and photoluminescence of these films before and after
annealing at a temperature of 170oC were studied The crystal structure of the
samples was analysed by XRD showing that the films have an orientation along
the lt0002gt crystalline direction with a hexagonal wurtzite structure The
chemical composition and bonding of the samples were determined by XPS In
addition transmittance and PL spectra were recorded to study the exciton
response of the samples X-ray absorption near edge structure measurements
(XANES) at K-L3 and O-K edges evidenced a different bonding state for the
thinnest film The weak exciton emission of the as-deposited ZnO films was
correlated to the presence of H2O and OH species absorbed by the surface of the
samples likely due to the polar behaviour of ZnO After annealing all the samples
showed improvement of the free exciton emission and shift towards or within
the UV region The sample with thickness t =1160plusmn08 nm exhibited the best
crystalline quality and strongest exciton response after annealing meanwhile the
thinner sample with t =100plusmn10 nm had a broad and low intensity UV emission
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 20: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/20.jpg)
SESSION II
28
OR2-3
Optimization of optical electrical and mechanical properties of
transparent and conductive al doped zinc oxide films prepared by dc
pulsed magnetron sputtering
Eva Gutieacuterrez-Berasategui Raquel Bayoacuten Cristina Zubizarreta Javier Barriga
Tekniker Research Centre Eibar Guipuzcoa Spain
Email for corresponding author egutierrezteknikeres
The demand of low cost and high performance optoelectronic devices has led to
the development of more efficient transparent conductive oxide (TCO) thin films
mainly for applications such as thin films solar cells or liquid crystal displays In
recent years Al-doped ZnO (AZO) has emerged as one of the most promising
substitute materials for the most currently used doped SnO2 due to its optical and
electrical properties high chemical and mechanical stability together with its
lower cost However work has still to be done to optimize the deposition method
and to understand the influence of growth conditions on its microstructure and
optoelectronic properties Besides the corrosion resistance of these layers is a
key factor to improve the durability of the devices comprising these TCO layers
In this paper Zinc oxide films doped with aluminium were deposited using
DC magnetron sputtering technique An exhaustive analysis of the optical
electrical and corrosion resistance properties of those films as a function of
growth conditions was carried out in order to obtain the optimum deposition
process and the optimum properties of the layers The films have been prepared
on glass substrates at 350 ordmC and 2 kW of power in a semi-industrial equipment
Two different facing ceramic targets (05 wt and 2 wt of Al doped ZnO) have
been used and compared The aim of this study is to correlate the deposition
parameters with optical properties measured by UVVIS spectrometer with the
electrical properties measured by a four point probe and with the
electrochemical corrosion properties measured by means of a standard three
electrodes cell set up The structure morphology and composition of the layers
will be also analysed by x-ray diffraction scanning electron microscopy and
atomic force microscopy
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 21: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/21.jpg)
SESSION II
29
OR2-4
Optical and structural properties of Ti doped ZnO thin films grown
by magnetron co-sputtering at room temperature
Miriam Yuste1 Ramoacuten Escobar Galindo1 Ignacio Caretti1 Noelia Benito2 Jose Ma
Albella1 Olga Saacutenchez1
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2Universidad Autoacutenoma de Madrid Departamento de Fiacutesica Aplicada Madrid
Spain
Email for corresponding author miriamyusteicmmcsices
Transition metal doping and formation of mixed oxides are widely used
mechanisms to improve the intrinsic properties of binary oxides Both
procedures have been decisive to explain the spectacular increase of applications
based on ZnO and TiO2 films Proven applications of metal-doped ZnO in
optoelectronic devices include photovoltaic and dye sensitized solar cells flat
panel displays photodetectors gas sensors light emitting diodes and blue laser
diodes The majority of previous work on doped ZnO films is related to doping
with group III elements (Al Ga In) but fewer studies have been performed on
quadrivalent dopants as titanium which can provide two free electrons per atom
to improve the conductivity of the ZnO host [1]
In this work ultrathin (thickness lt 40nm) and thin ZnOTi films (thickness
~200 nm) with stoichiometries from very low (~05 at) to high (~25 at)
titanium content were deposited at room temperature by DC reactive magnetron
co-sputtering on (100) silicon wafers and glass substrates Rutherford
backscattering spectroscopy (RBS) experiments were carried out to determine
the chemical composition of the samples The chemical states of the constituents
for the co-sputtered films were analysed by X-ray photoelectron spectroscopic
(XPS) Moreover a study of the transition from Ti doped ZnO to mixed oxide
(ZnO-TiO2) has been performed on the ultrathin films by X-ray absorption near
edge structure (XANES) A comparative study of the information obtained from
RBS XPS and XANES measurements were made The crystalline structure was
studied by X-ray diffraction observing how the highly orientated grown on the
(002) direction of the original ZnO is affected by the incorporation of titanium
Also the variation of the optical properties (transmittance and optical band gap)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 22: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/22.jpg)
SESSION II
30
was studied by UV-VIS spectrophotometry observing an improvement in the
transparency at low wavelengths when titanium is incorporated in the ZnO
lattice The optimum Ti doping for the ultrathin films was found to be ~05 at
for which the TZO sample showed a much lower resistivity than the insulating
ZnO films For higher thicknesses the behaviour of the films properties for
different Ti doping levels has been discussed
[1] J L Chung JC Chen and CJ Tseng J Phys Chem Sol 69 535 (2008)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 23: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/23.jpg)
SESSION III
33
INV3
Molecular design of nanostructured inorganic and hybrid Films
Cleacutement Sanchez
Laboratoire de Chimie de la Matiegravere Condenseacutee de Paris CNRS Universiteacute Pierre et
Marie Curie
Collegravege de France 11 Place Marcelin Berthelot Bacirctiment D 75231 Paris France
Email for corresponding author clementsanchezupmcfr
The mild synthetic conditions provided by the sol‐gel process such as metallo‐
organic precursors low processing temperatures and the versatility of the
colloidal state allow for the mixing of the organic and inorganic components at
the nanometer scale in virtually any ratio These features and the advancement
of organometallic chemistry and polymer and sol‐gel processing make possible a
high degree of control over both composition and structure (including
nanostructure) of these materials which present tuneable structure-property
relationships This in turn makes it possible to tailor and fine‐tune properties
(mechanical optical electronic thermal chemical catalytic hellip) in very broad
ranges and to design specific systems Hybrid and inorganic dense or porous
nanomaterials can be processed as monoliths thin films fibres particles The
seemingly unlimited variety unique structure‐property control and the
compositional and shaping flexibility give these materials a high potential This
conference will describe some recent advances on the Chemistry and processing
of Nanostructured and Hierarchically structured Functional Inorganic and hybrid
films
This conference will be given in the honour of my friend and colleague
Professor Purificacioacuten Escribano
For a larger information recent reviews of the group are
- Design Synthesis and Properties of Inorganic and Hybrid Thin Films having Periodically
Organized Nanoporosity C Sanchez C Boissiere D Grosso C Laberty and L Nicole Chemistry of
Materials 20 682 (2008)
- Chimie douce a Land of Opportunities for the Designed Construction of Functional
Inorganic and Hybrid Organic-Inorganic Nanomaterials C Sanchez L Rozes F Ribot C Laberty-
Robert D Grosso C Sassoye C Boissiere and L Nicole Comptes Rendus Chimie 13 3 (2010)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 24: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/24.jpg)
SESSION III
34
- Design and Properties of Functional Hybrid Membranes for Fuel Cells C Sanchez K Valle F
Perreira and C Laberty-Robert Chemical Society Reviews DOI101039C0CS00144A (2011)
- Aerosol Route to Functional Nanostructured Inorganic and Hybrid Porous Materials C
Boissiere D Grosso A Chaumonnot L Nicole and C Sanchez Advanced Materials DOI
101002adma201001410 (2011)
- Titanium Oxo-Clusters Precursors for a Legolike Construction of Nanostructured Hybrids
Materials L Rozes and C Sanchez Chemical Society Reviews DOI101039C0CS00137F (2011)
- Applications of Advanced Hybrid OrganicndashInorganic Nanomaterials from Laboratory to
Market C Sanchez P Belleville M Popall and L Nicole Chemical Society Reviews DOI
101039c0cs00136h (2011)
- Photonic and Nanobiophotonic Properties of Luminescent Lanthanide-doped Hybrid
Organic-Inorganic Materials P Escribano B Julian-Lopez J Planelles-Arago E Cordoncillo B
Viana and C Sanchez Journal of Materials Chemistry 18 23 (2008)
- Biomimetism and Bioinspiration as Tools for the Design of Innovative Materials and
Systems C Sanchez H Arribart and M M G Guille Nature Materials 4 277 (2005)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 25: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/25.jpg)
SESSION III
35
OR3-1
Characterization of host-guest interactions by persistent spectral
hole burning on hybrid clay-dye nanopigments
E Baena-Murillo B Micoacute-Vicent and F Martiacutenez-Verduacute
University of Alicante Colour and Vision Group Alicante Spain
Email for corresponding author ernestobaenauaes
Hybrid nanopigments are intercalation compounds formed by an inorganic host
and an organic cationic dye The interactions that arise are diverse and depends
on several factors [1] Due to the electric negative net charge of the solid an
electrostatic potential is the main interaction between this two components
Then the cation exchange capacity of the host and its amount and type of surface
area are the main effects on the dye adsorption and intercalation process
Besides molecular size and geometry of photoactive species also have effects on
the kinetics Van der Waals interactions and H-bondings are specially present
when the particle size distribution of the inorganic host is mainly in the
nanoscale and can be controlled by the ionic strength and pH of the media [2]
Thus multiple spectral species can be formed on this hybrid systems and the
characterization must address the type of molecular aggregation and the active
sites of adsorption
In this study the inorganic host is a Na-montmorillonite an smectite-type
clay with a layered structure and a cation exchange capacity of 116 meqg The
organic guest CI 51004 is a cationic blue dye from the family of the oxazines In
a first stage the clay is dispersed in water and after the dye solution is added By
continuous stirring the ionic exchange reactions between this two components
takes place and finally thin films of the hybrid system were prepared by the spin-
coating technique Different spectral species are formed (ie dyes adsorbed and
aggregated in different fashions) and consequently different absorption energies
can be measured in comparison with the diluted dye Using polarized light
absorption spectroscopy [3] it is possible to identify the alignment of
immobilized guest molecules within the clay matrix Using a narrow light source
it is possible to promote structural photo-induced changes in isoenergetic
species Typically the amount of molecules with a transition frequency in
resonance with the excitation light will decrease and will be appreciated as an
ldquospectral holerdquo [4] The films were irradiated separately using two laser diode
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 26: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/26.jpg)
SESSION III
36
devices with wavelengths of 635 and 655 nm and optical output power of 1500
mW Then depletion kinetics of this transition is used to determine in a relative
quantitative way the different molecular aggregates formed in the inorganic
guest
[1] C Sanchez K J Shea and S Kitagawa Chem SocRev 40 696-753 (2011)
[2] E Ruiz-Hitzky M Darder PAranda and K Ariga Advanced Materials 22 323-36 (2010)
[3] V Martiacutenez F Loacutepez Arbeloa J Bantildeuelos Prieto and I Loacutepez Arbeloa Chemistry of Materials 17
4134-4141 (2005)
[4] Jean-Pierre Galaup Low Temperature Physics 32 1008 (2006)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 27: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/27.jpg)
SESSION III
37
OR3-2
Structural and photocatalytic properties of multiwalled titanate-
based nanotubes
Ignacio Caretti1 Stefan Ribbens3 Evi Beyers3 Sepideh Zamani2 Evi Vinck2
Angel R Landa Canovas1 Ricardo Torres1 Ignacio Jimeacutenez1 Pegie Cool3 and
Sabine Van Doorslaer2
1Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 2 Department of Physics University of Antwerp Universiteitsplein 1 B-2610 Wilrijk
Belgium 3 Laboratory of Adsorption and Catalysis University of Antwerpen (UA)
Universiteitsplein 1 B-2610 Wilrijk Belgium
Email for corresponding author carettiicmmcsices
The widely known ability of TiO2 to absorb UV light is used in many diverse
applications like water treatment solar energy storage antifogging clothes or
antibacterial agents [1] Nowadays the most extended approaches for the
improvement of photoreactivity in TiO2-based materials are a) the controlled
design of new structures at nanoscopic scale [23] to increase the specific surface
area and take advantage of potential properties resulting from size-confinement
effects and b) the use of non-metal and metal doping to enhance light absorption
efficiency by making the material sensitive to visible light [45]
In this work we have investigated non-doped hydrogen trititanate
nanotubes (H-TTNT) grown by hydrothermal synthesis [3] and doped with
transition metals (Cu V hellip) which exhibit photocatalytic activity under UV and
visible light Transmission Electron Microscopy X-ray Absorption Near Edge
Structure (XANES) and photoinduced Electron Paramagnetic Resonance
combined with UV-Vis spectroscopy were used to unravel the structural and
photocatalytic properties of these materials as well as the effect of calcination at
350oC during the doping process Moreover incorporation of nitrogen via N2-
plasma surface modification of the nanotubes with an RF-CVD setup was
analysed by XANES
[1] A L Linsebigler G Lu J T Yates J Chem Rev 95 735 (1995)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 28: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/28.jpg)
SESSION III
38
[2] H Y Zhu Y Lan X P Gao S P Ringer Z F Zheng D Y Song J C Zhao J Am Chem Soc 127
6730 (2005)
[3] D V Bavykin J M Friedrich F C Walsh Adv Mater 18 2807 (2006)
[4] R Asahi T Morikawa T Ohwaki K Aoki Y Taga Science 293 269 (2001)
[5] D Dvoranovaacute V Brezovaacute M Mazuacutera M A Malati Appl Cat B Environmental 37 91 (2002)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 29: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/29.jpg)
SESSION III
39
OR3-3
Fluorescent Thin films prepared by Plasma deposition for their
integration with photonic structures
Maria Alcaire F J Aparicio Agustiacuten R Gonzaacutelez-Elipe Angel Barranco
Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain
Email for corresponding author angelbaricmsecsices
In this work we present a new method of fabrication of fluorescent organic thin
films by using a plasma based technology The process consists of evaporating an
organic dye molecule while exposing the substrate to the effect of a mild plasma
in a remote configuration The result is a polymeric-like film formed by the
linkage of molecular fragments where entire fluorescent molecules are also
present The process takes place at room temperature and is compatible with
substrates of different nature including metals glass polymers or paper The
conformal character of the films makes them ideal to cover complex substrates
including photonic structures
Herein we discuss a series of results concerning different ldquonanocompositesrdquo
and thin films obtained from different dye molecules that were integrated
together with photonic structures such as Bragg multilayers ring resonators or
Fabry-Perot resonators These integrated structures have been applied to
develop a series of environmental sensors which with a variable degree of
integration have been used for the detection of UV radiation or monitoring NO2
[1]
[1] Francisco J Aparicio Miguel Holgado Ana Borras Iwona Blaszczyk-Lezak Amadeu Griol Carlos
A Barrios Rafael Casquel Francisco J Sanza Hans Sohlstroumlm Mikael Antelius Agustin R Gonzaacutelez-
Elipe and Angel Barranco Adv Mater 2011 23 761ndash765
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 30: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/30.jpg)
SESSION III
40
OR3-4
Microstructure of planar glass substrates modified by Laser Ablation
Backwriting of metal targets
F Rey-Garciacutea1 C Goacutemez-Reino1 MT Flores-Arias1 R Lahoz2 G F De La
Fuente2 W Assenmacher3 W Mader3
1Unidad Asociada de Microoacuteptica y Oacuteptica GRIN Departamento de Fiacutesica Aplicada
Facultade de Oacuteptica e Optometriacutea Universidade de Santiago de Compostela
Campus Sur sn E-15782 Santiago de Compostela Spain 2Laboratorio de Aplicaciones del Laser Instituto de Ciencia de Materiales de
Aragoacuten CSIC-Universidad de Zaragoza Mariacutea de Luna 3 E-50018 Zaragoza Spain
e-mail xermanunizares 3 Institut fuumlr Anorganische Chemie Universitaumlt Bonn Romerstraβe 164 D-53117
Bonn Deutschland
Email for corresponding author rlahozunizares
Waveguides were prepared onto commercial soda-lime glass substrates using a
laser ablation backwriting process whereby Ag Cu brass alloy and Al metal
targets were evaporated onto glass substrates by irradiation through the same
substrates The resultant channel-like structures were characterised by SEM
TEM UV-vis-nIR spectroscopy and light guiding efficiency studies These
revealed the presence of metal nanostructures in the case of Ag Cu and brass
targets with their typical Surface Resonance Plasmon (SRP) bands In contrast Al
was found to react with SiO2 and integrate into the glass These results were
confirmed by EDS studies performed with TEM and SEM observation of
representative polished cross section samples Buried waveguides appear just
below the surface of the glass substrates in all cases suggesting that Laser
Backwriting may be a convenient method to prepare stable waveguides by
modifying inexpensive commercial window glass
Work funded by projects SURFALUX (CDTI) and MAT2010-18519 (MEC)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 31: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/31.jpg)
SESSION III
41
OR3-5
Large area self-assembled monolayers of colloidal silica
nanoparticles
Edgar-Juliaacuten Cabrera1 Lina Jaller1 Roger Amade1 Sabine Portal2 Esther Pascual1
and Enric Bertran1
1 FEMAN Group IN2UB Department of Applied Physics and Optics Universitat de
Barcelona C Martiacute i Franquegraves 1 08028 Barcelona Spain 2 Dep Photonics and Terahertztechnology Ruhr-University Bochum 44780
Bochum Germany
Email for corresponding author ebertranubedu
Large area bidimensional colloidal crystals based on silica sub-micrometre
particles were produced by an accurate Langmuir-Blodgett deposition process
(Figure 1) Monodispersed silica particles show suitable characteristics to self-
assembling in close-packed 2D crystal monolayers Multiple applications in fields
such as photonics electronics electro-optics medicine (detectors and sensors)
filtering membranes and surface devices are possible due to an accurate control
of nucleation of silica particles during the growing process which result in
improved characteristics like a high sphericity and a very low size dispersion
In this work the authors evidence how the used methodology and conditions in
self-assembled processes are decisive points for producing high quality
bidimensional colloidal crystals by Langmuir-Blodgett
Figure 1 Langmuir-Blodgett bidimensional colloidal crystal of self-assembled
mono-dispersed silica sub-micrometric particles deposited on c-Si substrates Photos
correspond to the reflected light under
several incident angles
POSTER
45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
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50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
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53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
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54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
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55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
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56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
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57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 32: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/32.jpg)
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45
PO1
Spectral integrated infrared filter for the Martian airborne Dust
Sensor of the MetNet Space Mission
F Corteacutes A Gonzaacutelez A Llopis A J de Castro J Meleacutendez F Loacutepez
LIR-Infrared Lab Departamento de Fiacutesica Instituto PJ Lastanosa
Universidad Carlos III de Madrid Leganeacutes Spain
Email for corresponding author fcmartinfisuc3mes
MetNet Presursor Mission is the first of the various mini atmospheric stations to
be deployed on the Martian surface in the Russian-Finnish-Spanish space mission
MetNet MEIGA-MetNet consortium is the Spanish contribution to MetNet LIR-
Infrared Lab of Universidad Carlos III (LIR-UC3M) is in charge of the design and
development of a microsensor for the characterization of in situ (on surface)
Martian airborne dust The sensor due to the mission constrictions must
accomplish with very strict mass and power limits 45 g and 1 W The main
component of Martian atmosphere aerosol is micron sized dust Airborne dust on
surface plays a key role in climate affecting the Martian Planetary Boundary
Layer However the basic physical properties of these aerosols are still barely
known as the measurements coming primarily from orbiting satellites provide
integrated data for the whole atmosphere and no in situ data on the surface
Although Martian dust distribution is not well known a modified gamma-like
function n(r) for particle size distribution is accepted in the stationary states
From Mars rovers measurements values on the particulate mean radius (r) of
suspension dust at surface can be assumed to be around 15 microm [1]
Concentration is very changeable depending on many different conditions
geographical position day or night seasonal periods dust devils or stationary
stateshellip and local data are almost unknown Only integrated data for the whole
atmospheric column obtained from satellites or from upward looking sensors
can be found In situ concentrations ranging from less than 10 per cm3 to many
orders of magnitude higher during strong storms or in dust devils are expected
An IR sensor based on Mie scattering properties of Martian dust has been
proposed to meet the requirements and constrictions of the mission In fact
wavelengths ranging from the visible limits up to thermal IR (1 to 14 microns)
are the best for enhancing Mie scattering as they are quite similar to particles
size A multispectral IR sensor spreading as much as possible all along IR
POSTER
46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
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53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
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54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
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55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
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56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
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57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 33: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/33.jpg)
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46
wavelengths is the best solution for dust distribution retrieval being the results
very sensitive to the detection position A bi-spectral sensor with two
transmission bands has been initially proposed as a good solution for a
demonstrative sensor for Precursor MetNet mission to be launched by 2014 The
selected bands are wide in order to optimize the detection signal for low
concentrations from 13 to 3 microm and from 3 to 6 microm Besides the position of the
detector is very important as Mie scattering is very dependent on detection
direction For these reasons a bi-spectral sensor with both bands spatially
defined onto the same FPA is preferred
In this paper the IR multilayer filters are designed to be located onto the same substrate in such a way that their spatial and spectral distribution can be properly coupled to the FPA for the improvement in the retrieval of dust distribution parameters
[1] Lemmon Atmos imaging res Mars explor rovers Science 306 (5702) 1753ndash6 2004
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 34: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/34.jpg)
POSTER
47
PO2
Light propagation in multilayer structures unconventional
calculations
Salvador Bosch1 Jordi Sancho-Parramon12 Vesna Janicki12
1 Departament de Fiacutesica Aplicada i Ograveptica Universitat de Barcelona Barcelona
Spain 2 Laser and Atomic RampD Division Rudjer Boskovic Institute Zagreb Croatia
Email for corresponding author sboschubedu
We present a numerical scheme for the calculation of light propagation in
multilayer structures including non-standard computations of interest for the
photonics community Computation of light propagation in stratified structures is
a well-established field [1] due to the development of thin film technology and
research over the past decades In this context our group developed a numerical
software package for the optical characterization of materials in single layer and
multilayer structures using spectral photometric and ellipsometric
measurements [2]
We have implemented of a numerical scheme that complements the
capacities of the above mentioned software and aims to be a tool for researchers
and students in order to understand and simulate phenomena like the attenuated
total reflection or the generation of plasmons at metal-dielectric interfaces These
phenomena which can be fully described from the point of view of classical
optics obtained a renewed interest due to the progress in controlling light-
matter interactions at the near field scale Our approach consists in determining
the full electromagnetic field at any given point of an arbitrary multilayer
structure in opposition to standard thin film software where only the tangential
components of the field are taken into account to compute far-field magnitudes
We illustrate our numerical scheme with different simulations and discuss
possible future applications
[1] PH Berning Physics of Thin Films 1 Academic Press New York (1963)
[2] NKDSoftware wwwubeduoptmat
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 35: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/35.jpg)
POSTER
48
PO3
Caracterizacioacuten de la resistencia al microrayado de recubrimientos
oftaacutelmicos
Jaume Caro1 Anna Vicente1 Nuacuteria Cuadrado1 1 Iban Gonzaacutelez1 Antoni
Vilajoana2 Pau Artuacutes2 Sergi Peris2
1 Fundacioacute CTM Centre Tecnologravegic Av Bases de Manresa 1 08242 Manresa
Espantildea 2 Indo Lens Group SL Alcalde Barnils 72 08174 Sant Cugat del Vallegraves Espantildea
Email for corresponding author jaumecaroctmcomes
La introduccioacuten de lentes orgaacutenicas en la industria oftaacutelmica ha permitido
reducir considerablemente el peso de las mismas asiacute como aumentar su
resistencia a la rotura en comparacioacuten con las lentes tradicionales de vidrio Sin
embargo su resistencia al rayado es ve considerablemente mermada Esta
problemaacutetica ha sido parcialmente solucionada a partir del desarrollo e
implementacioacuten de recubrimientos endurecedores polimeacutericos nanocompuestos
Un segundo recubrimiento formado por un apilamiento nanomulticapa de
oacutexidos metaacutelicos confiere propiedades antirreflejantes a la lente El aumento de
la durabilidad de las lentes en teacuterminos de resistencia al rayado constituye uno
de los principales objetivos de la industria oftaacutelmica En este trabajo se ha
llevado a cabo un exhaustivo estudio de la resistencia al microrayado de
diferentes lentes y recubrimientos oftaacutelmicos correlacionaacutendose los resultados
obtenidos con los ensayos de desgaste tradicionalmente utilizados en el sector
(ensayo de Bayer Steel Wool y Eraser) asiacute como los obtenidos de los ensayos de
usuario
Microrayado generado sobre una lente
oftaacutelmica orgaacutenica con recubrimiento
endurecedor y recubrimiento antirreflejante
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 36: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/36.jpg)
POSTER
49
PO4
Recubrimientos tipo cermet depositados por co-sputtering en un
proceso DC reactivo controlado por voltaje
Beatriz Navarcorena1 Juliaacuten Rodrigo1 Gonzalo G Fuentes1 Joseacute A Garciacutea1
Ramoacuten Escobar Galindo2 Carlos Prieto2 Joseacute Angel Saacutenchez2 Eva Ceacutespedes2 J M
Albella2
1 Centro de Ingenieriacutea Avanzada de Superficies (AIN Galar-Navarra Espantildea) 2 Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author bnavarcorenaaines
Los recubrimientos tipo cermet estaacuten atrayendo la atencioacuten para recubrimientos
solares selectivos en tubos colectores de energiacutea termosolar [1] En esta
aplicacioacuten el componente metaacutelico suele ser un elemento de transicioacuten de alto
punto de fusioacuten como Mo Ni Pt o Cr embebido en una matriz dieleacutectrica de SiO2
Al2O3 Si3N4 o AlN La deposicioacuten de compuestos ceraacutemicos aislantes por
deposicioacuten fiacutesica en fase vapor se realiza tiacutepicamente mediante procesos de
sputtering RF sin embargo dadas las bajas velocidades de deposicioacuten que se
consiguen con esta teacutecnica cada vez maacutes se prefiere la deposicioacuten por sputtering
reactivo DC pulsado o DC [2] En los procesos de DC reactivo existen dos modos
de operacioacuten modo metaacutelico y modo reactivo [3] El modo metaacutelico se
caracteriza por una alta velocidad de deposicioacuten y una baja presioacuten parcial del
gas reactivo Por el contrario en el modo reactivo la velocidad de deposicioacuten es
baja y la presioacuten parcial del gas reactivo alta La transicioacuten entre estos dos modos
ocurre abruptamente entre dos valores criacuteticos de gas reactivo que ademaacutes
dependen de la direccioacuten de la transicioacuten
En este trabajo se ha estudiado la co-deposicioacuten de un recubrimiento tipo
cermet de Mo-SiO2 mediante un proceso DC reactivo a partir de dos blancos
silicio y molibdeno La estrategia de co-deposicioacuten condiciona de forma notable
los paraacutemetros del proceso Por ejemplo se debe depositar silicio en forma de
oacutexido (SiO2) y sin embargo Mo en estado metaacutelico con el fin de alcanzar los
valores LMVF y HMVF requeridos Ademaacutes se debe controlar de forma muy fina
el voltaje de los caacutetodos para evitar transiciones no controladas entre modos de
sputtering metaacutelico y reactivo
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 37: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/37.jpg)
POSTER
50
Los recubrimientos se han caracterizado mediante GDOES rugosidad
espesor espectroscopiacutea UV-VIS-NIR y FTIR El estudio muestra las diferentes
propiedades de absorcioacuten y emisioacuten teacutermica en funcioacuten de los paraacutemetros
posibles de proceso Asiacute mismo la caracterizacioacuten oacuteptica de los iacutendices n y k
permite mediante simulacioacuten predecir las propiedades finales de absorcioacuten y
emisividad de los selectivos
[1] N Selvakumar et al Solar Energy Materials amp Solar Cells 98 1 (2012)
[2] R Cremer et al Surface and Coatings Technology 120-121 213 (1999)
[3] I Safi Surface and Coatings Technology 127 203 (2000)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 38: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/38.jpg)
POSTER
51
PO5
Optical and structural study of reactive sputtered titanium dioxide
coatings embedded with Au clusters for LSPR gas-sensing
applications
NM Figueiredo12 T Kubart2 JA Saacutenchez-Garciacutea3 R Escobar Galindo3 A
Climent-Font4 A Cavaleiro1
1SEG-CEMUC ndash Department of Mechanical Engineering University of Coimbra Rua
Luiacutes Reis Santos 3030-788 Coimbra Portugal 2The Aringngstroumlm Laboratory Uppsala University PO Box 534 SE-751 21 Uppsala
Sweden 3Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain 4Centro de Micro-Anaacutelisis de Materiales (CMAM-UAM) 28049 Madrid Spain
Email for corresponding author nunofigueiredodemucpt
Thin composite films consisting of metal nanoparticles in an oxide matrix are of
interest for the electronics glass detectors catalysis semiconducting and bio
industries The ability of the noble metal nanoparticles to support Localized
Surface Plasmon Resonance (LSPR) makes them attractive for a myriad of
applications including their use as intrinsic refractive index sensors This is
because the LSPR is heavily dependent not only on the nanoparticle dielectric
constant size and shape but also on the dielectric constant of the surrounding
medium Thus molecular binding events can be accessed in a novel way by real-
time monitoring the SPR extinction signal of a nanocomposite coating containing
Au or Ag embedded in a reactive matrix The sensitivity and selectivity of these
sensors can generally be increased by the exploitation of the operating
temperature the thermal stability of these nanocomposites should thus be
carefully addressed in order to enhance the field of operation by LSPR sensing
In the present study nanocomposite coatings of Au clusters embedded in
a TiO2 matrix were synthesized using pulsed DC magnetron sputtering The
depositions were carried out in three steps depositing titania Au and again
titania The thickness of the Au layer was varied between 1 and 3 nm in order to
achieve different cluster sizes and morphologies and nanocomposite
topographies Basic optical and morphological characterization of these coatings
was carried out before and after annealing at increasing temperatures Light
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 39: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/39.jpg)
POSTER
52
extinction increased with the Au content Peculiar SPR extinction bands were
observed and correlated with the different cluster morphologies With the
increase in Au content red-shifted SPR peaks with higher intensity and increased
widths were observed due to changes in the metal clusters sizes and morphology
and due to interparticle effects With increasing temperature the SPR signal was
enhanced The intensity increased and the width of the SPR peaks diminished
and small shifts were observed due to changes in the metal clusters morphology
and in the dielectric properties of the oxide matrix The increased surface area
and the strong (and well confined) SPR extinction bands as well as their thermal
behaviour makes these coatings optimal for gas sensing and also catalysis albeit
many other application fields can be envisaged
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 40: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/40.jpg)
POSTER
53
PO6
Electrochromic Behaviour of WxSiyOz Thin Films Prepared by
Reactive Magnetron Sputtering at Normal and Glancing Angles
J Gil-Rostra1 F Garciacutea-Garciacutea1 JC Gonzaacutelez1 M Cano2 JM Pedrosa2 FJ Ferrer3
F Yubero1 AR onza lez-Elipe1
1 Grupo de Nanotecnologiacutea en superficies Instituto de Ciencia de Materiales de
Sevilla (CSIC-Univ Sevilla) Avda Ameacuterico Vespucio 49 41092 Sevilla Spain 2 Departamento de Sistemas Fiacutesicos Quiacutemicos y Naturales Universidad Pablo de
Olavide Ctra Utrera km 1 E-41013 Sevilla Spain 3 Centro Nacional de Aceleradores (CSIC-USE) Thomas A Edison 7 E-41092 Sevilla
Spain
Email for corresponding author yuberoicmsecsices
This work reports the synthesis at room temperature of transparent and colored
WxSiyOz thin films by magnetron sputtering (MS) from a single cathode The films
were characterized by a large set of techniques including X-ray photoelectron
spectroscopy (XPS) Rutherford backscattering spectrometry (RBS) Fourier
transform infrared (FT-IR) and Raman spectroscopies Their optical properties
were determined by the analysis of the transmission and reflection spectra It
was found that both the relative amount of tungsten in the WminusSi MS target and
the ratio O2Ar in the plasma gas were critical parameters to control the blue
coloration of the films The long-term stability of the colour attributed to the
formation of a high concentration of W5+ and W4+ species has been related with
the formation of WminusOminusSi bond linkages in an amorphous network At normal
geometry (ie substrate surface parallel to the target) the films were rather
compact whereas they were very porous and had less tungsten content when
deposited in a glancing angle configuration In this case they presented
outstanding electrochromic properties characterized by a fast response a high
coloration a complete reversibility after more than one thousand cycles and a
relatively very low refractive index in the bleached state [1]
[1] J Gil-Rostra M Cano JM Pedrosa FJ Ferrer F Garciacutea-Garciacutea F Yubero AR Gonzaacutelez-Elipe ACS
Appl Mater Interf 22 (2012) 628-638
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 41: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/41.jpg)
POSTER
54
PO7
Synthesis of Nanostructured ZnO thin films by oblique angle
sputtering deposition
D Toledano M Yuste R Escobar Galindo JM Albella and O Saacutenchez
Instituto de Ciencia de Materiales de Madrid Consejo Superior de Investigaciones
Cientiacuteficas Cantoblanco 28049-Madrid Spain
Email for corresponding author dianatoledanoicmmcsices
We report the successful growth of ZnO nanostructured films by oblique angle
magnetron sputtering deposition (OAD) Films were found to be porous and
consisting in an inclined columnar structure with columns tilting in the direction
of the incident flux The experimental results reveal that the deposition angle
(85o 75o 65o and 0o) deposition pressure and the ArO2 gas ratio play a
significant role in the structural formation crystalline texture and the
composition of the ZnO thin films The film microstructure and the surface
morphology of the samples was explored by Field Emission Gun Scanning
Electron Microscopy (FEGSEM) the crystalline structure and the composition
were determined by grazing incidence X-ray diffraction (GIXRD) and Rutherford
Backscattering Spectrometry (RBS) respectively In addition the optical
properties were also studied by Reflectance in the UV-visible range and
spectroscopic ellipsometry We have correlated the ZnO thin film structure
evolution chemical composition and porosity changes to the optical properties
of the ZnO films In particular we have focused on the influence of the deposition
angle on the refractive index of the deposited films
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 42: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/42.jpg)
POSTER
55
PO8
Microstructural characterization of magnetron sputtered porous
silicon coatings
Jaime Caballero-Hernaacutendez Vanda Godinho Roland Schierholz Asuncioacuten
Fernaacutendez
Instituto de Ciencia de Materiales de Sevilla CSIC-Uni Sevilla Sevilla Spain
Email for corresponding author godinhoicmsecsices
Over the recent years porous silicon has attracted considerable attention due to
possible applications such as solar cells [1] optoelectronics [2] and photonic
devices [3] Being fully compatible with the established microelectronic
technology one of the most attracting features of porous silicon is its ldquomade to
orderrdquo refractive index Recently we reported on the formation of porous silicon
oxynitride coatings by magnetron sputtering with controlled refractive index
depending on their deposition conditions [45] The closed porosity formed
allowed to keep the good mechanical properties characteristic of these coatings
Porous silicon has been produced by a variety of approaches but it is most
commonly prepared by electrochemical etching in HF based solutions In this
work we present the possibility to produce porous silicon coatings by magnetron
sputtering Silicon coatings with closed porosity presenting different pore size
and alignment were produced by Glancing Angle Magnetron Sputtering The
microstructure of the coatings was evaluated by SEM and TEM which showed
clearly well-defined closed pores The presence of deposition gas inside the pores
was proved by RBS measurements confirming that the pores are closed and the
chemical bonding state of silicon was investigated by XPS and EELS
[1] A Ramizy Z Hassan K Omar Y Al-Domi MA Mahdi Appl Surf Sci 257 6112 (2011) [2] D Abidi SRomdhane A Brunet-Burneau JL Fave European Physical Journal Applied Physics 45 10601(2009) [3] RS Dubey DK Gautam Optik 122 494 (2011) [4] VGodinho MC Jimeacutenez de Haro J Garciacutea-Loacutepez V Goossens H Terryn MP Delplancke--Ogletree A Fernandez Appl Surf Sci 256 4548 (2010) [5] V Godinho TC Rojas A Fernandez Microporous and Mesoporous Materials 149 142 (2012)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 43: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/43.jpg)
POSTER
56
PO9
Anaacutelisis de las caracteriacutesticas electroluminiscentes de oacutexidos de
silicio enriquecidos en silicio
Joan Juvert1 Alfredo onza lez1 Mariano Aceves2 Andreu Llobera1 Carlos
Domiacute nguez1
1 Instituto de Microelectroacutenica de Barcelona CNM-CSIC Campus UAB 08193
Bellaterra Espantildea 2 INAOE Dpt de Electroacutenica PO box 51 Puebla Pue 72000 Meacutexico
Email for corresponding author joanjuvertimb-cnmcsices
Se han fabricado dispositivos electroluminiscentes basados en dio xido de silicio
enriquecido con silicio (SRO) mediante procesos compatibles con la tecnologiacute a
esta ndar CMOS La capa activa de SRO fue obtenida a trave s de la implantacio n de
iones de silicio en un o xido estequiome trico depositado por PECVD sobre un
sustrato de silicio tipo p PO9(Se usaron tres dosis de implantacio n que segu n
ana lisis de XPS corresponden a excesos de silicio del (19plusmn05) (33plusmn05) y
(42plusmn05) Sobre la capa activa se deposito un electrodo semitransparente de
silicio policristalino dopado con fo sforo Los dispositivos presentaron
fotoluminiscencia bajo bombeo o ptico a 325 nm asiacute como electroluminiscencia
en forma de puntos brillantes bajo estiacute mulo de corriente directa en re gimen de
inversio n
Los espectros de fotoluminiscencia muestran una banda ancha entre 600 y
1000 nm con un pico que se desplaza al rojo y una intensidad que decrece al
incrementar del exceso de silicio Los espectros de electroluminiscencia (EL)
muestran una banda ancha entre 500 y 1000 nm La emisio n entre 500 y 600 nm
no presente en los espectros de fotoluminiscencia indica una diferencia entre los
mecanismos de emisio n al ser estimulado el material o ptica y ele ctricamente Los
valores de eficiencia de EL (conversio n de potencia ele ctrica a potencia o ptica)
variacute an con el exceso de silicio en el rango medido La intensidad de
electroluminiscencia crece con la corriente ele ctrica inyectada
Agradecimientos A onza lez agradece la beca No 213571 (CONACyT
Me xico) El trabajo se ha desarrollado dentro de los proyectos BioLoC (PN I+D
TEC2011-29045-C04-01) y Hip-Lab (ERC rant No 209243)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 44: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/44.jpg)
POSTER
57
PO10
Preparation of antireflective silica-based films by sol-gel method
Cecilia Agustiacuten Joseacute Aacutengel Saacutenchez Ashley Gracia Maider Machado Oihana
Zubillaga Marta Brizuela
TECNALIA Energy Unit Mikeletegi Pasealekua 2 20009 San Sebastiaacuten Spain
Email for corresponding author ceciliaagustintecnaliacom
Antireflective (AR) coatings have been developed to be applied onto the
secondary optical elements (SOE) in a High Concentrator Photovoltaic
Technology (HCPV) [1 2] by sol-gel method Sol-gel process is an efficient
method to prepare homogeneous porous film by incorporating pore-generating
agents [3-5]This technique presents some advantages compare to other methods
such as easy control of the composition low sintering temperature good
adherence to the substrate and good optical properties
Porous SiO2 thin films have been prepared by dip-coating procedure onto
glass-slides in order to study the effect of porosity on the enhanced
transmittance properties Silica sols were synthesized using silicon
tetraisopropoxide (TEOS) as precursor in acidic medium and different types of
pore generating agents The transmittance and reflectance of coatings were
characterised by UV-Vis spectrophotometry From these measurements
refractive index was obtained by using numerical calculation In addition the
refractive index values were compared by spectral ellipsometric measurements
Environmental ellipsometric porosimetry measurements were performed using a
spectral ellipsometer modified with a system that allows controlling the relative
humidity (RH) to characterise films porosity [6 7] Theory of Bruggeman
effective medium approximation (EMA) was used to obtain the volume fraction
(VF) porosity of the SiO2 films to compare with the experimental values obtained
[1] G Helsch A Moumls J Deubener M Houmlland Sol Energy Mater Sol Cells 94 (2010) 2191-2196 [2] A Gombert W Gaubitt K Rose J Dreibholz B Blasi A Heinzel D Sporn W Doll V Wittwer Sol Energy 68 (2000) 357-360 [3] C J Brinker G W Scherer Sol-Gel Science 1st ed Processing Academic Press New York 1990 [4] L Nicole C Boissiere D Grosso A Quach C Sanchez J Mater Chem 15 (2005)3598-3627 [5] CJ Brinker Y Lu A Sellinger H Fan Adv Mater 11 (1999) 579-585 [6] N Arconada Y Castro A Duran Applied Catalysis A General 385 (2010) 101-107 [7] S Suaacuterez N Arconada Y Castro JM Coronado R Portela A Duran B Saacutenchez Applied Catalysis B Environmental 108-109 (2011) 14-21
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 45: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/45.jpg)
AUTHOR INDEX
61
Aceves M PO9 58
Agullo -Rueda F OR2-1 28
Agustiacuten C PO10 59
Albella JM OR1-3 22 OR2-2 29 OR2-4 31
PO451 PO756
Alcaire M OR3-3 41
Amade R OR3-5 43
Aparicio FJ OR3-5 43
Artuacutes P PO3 50
Assenmacher W OR3-4 42
Ayala L OR2-1 28
Baena-Murillo E OR3-1 37
Barranco A OR1-1 20
OR3-3 41
Barriga J OR2-3 30
Bayoacuten R OR2-3 30
Benito N OR1-5 24
OR2-4 31
Bertraacuten E OR3-5 43
Beyers E OR3-2 39
Bijani S OR2-1 28
Bosch S PO2 49
Brizuela M PO10 59
Buencuerpo Farin a J OR1-2 21
Caballero-Hernaacutendez J PO8 57
Cabrera E-J OR3-5 43
Cano M PO6 55
Caretti I OR1-5 4
OR2-4 31
OR3-2 39
Caro J PO3 50
Cavaleiro A OR1-4 23 PO5 53
Ceacutespedes E OR1-3 22
PO4 51
Climent-Font A PO5 53
Cool P OR3-2 39
Corteacutes F PO1 47
Cuadrado N PO3 50
de Castro AJ PO1 47
de La Fuente GF OR3-4 42
Diacuteaz D OR1-5 65
Domiacute nguez C PO9 58
Dotor Castilla ML OR1-2 21
Endrino JL OR2-2 29
Escobar Galindo R OR1-3 22 OR1-5 24 OR2-4 31
PO451PO553 PO656
Fernaacutendez A PO8 57
Ferrer FJ OR1-1 20 PO6 55
Figueiredo NM PO5 53
Flores-Arias MT OR3-4 42
Fortunato E INV2 27
Fuentes Gonzalo G PO4 51
aba s M OR2-1 28
Garciacutea Joseacute A PO4 51
Garciacutea-Garciacutea F PO6 55
Gil-Rostra J OR1-1 20 PO6 55
Godinho V PO8 57
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 46: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/46.jpg)
AUTHOR INDEX
62
Goacutemez-Reino C OR3-4 42
Gonzaacutelez A PO1 47
onza lez A PO9 58
Gonzaacutelez I PO3 50
Gonzaacutelez JC PO6 55
Gonzaacutelez-Elipe AR OR1-120 OR3-341
PO6 55
Gracia A PO10 59
ranqvist C INV1 19
Gutierrez-Berasategui E OR2-3 30
Herrero P OR2-1 28
Horwat D OR2-2 29
Jaller L OR3-5 43
Janicki V PO2 49
Jimeacutenez I OR3-2 39
Juvert J PO9 58
Kovalev A OR2-2 29
Kubart T OR1-4 23 PO5 53
Lahoz R OR3-4 42
Landa-Caacutenovas AR OR2-1 28
OR3-2 39
Llobera A PO9 58
Llopis A PO1 47
Llorens Montolio J M OR1-2 21
Loacutepez F PO1 47
Machado M PO10 59
Mader W OR3-4 42
Martiacutenez-Verduacute F OR3-1 37
Martins R INV2 27
Meleacutendez J PO1 47
Micoacute-Vicent B OR3-1 37
Miska P OR2-2 29
Mosquera A OR2-2 29
Mun oz Camun ez LE OR1-2 21
Navarcorena B PO4 51
Ochoa E OR2-1 28
Palacio C OR1-5 24
Palanco S OR2-1 28
Parreira N OR1-4 23
Pascual E OR3-5 43
Pedrosa JM PO6 55
Peris S PO3 50
Polcar T OR1-4 23
Portal S OR3-5 43
Postigo Resa PA OR1-2 21
Prieto C OR1-3 22
PO4 51
Ramos-Barrado JR OR2-1 28
Rashkovskiy A OR2-2 29
Rey-Garciacutea F OR3-4 42
Ribbens S OR3-2 39
Rodrigo J PO4 51
Sanchez C INV3 35
Saacutenchez O OR1-5 24 OR2-4 31
PO7 56
Saacutenchez-Garciacutea JA OR1-3 22
PO451PO553
PO10 59
Sancho-Parramon J PO2 49
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 47: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/47.jpg)
AUTHOR INDEX
63
Schierholz R PO8 57
Toledano D PO7 56
Torres R OR3-2 39
van Doorslaer S OR3-2 39
Vasilevskiy M OR1-4 23
Vicente A PO3 50
Vilajoana A PO3 50
Vinck E OR3-2 39
Wainstein D OR2-2 29
Yubero F OR1-1 20 PO6 55
Yuste M OR2-4 31 PO7 56
Zamani S OR3-2 39
Zubillaga O PO10 59
Zubizarreta C OR2-3 30
![Page 48: opto-coat 2012 - INGESNETopto-coat 2012 CHAIRMEN Agustín R. González-Elipe (Institute of Materials Science of Seville, ICMSE-CSIC) Ramón Escobar Galindo (Institute of Materials](https://reader036.vdocument.in/reader036/viewer/2022081521/5ed284f3971d207441798ff2/html5/thumbnails/48.jpg)