phill mai, jem america corp. (presenter) shin …swtw 2002 probing for the 21st century memoryfine...
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Probing for the 21st centurySWTW 2002
Phill Mai, JEM America Corp. (Presenter)Shin Kozaki, JEM JapanTeru Sakata, JEM JapanKaz Okubo, JEM America Corp.
Probing for the 21st centurySWTW 2002
Roadmap HAWK Concept Electrical and Mechanical Data Maintenance Specifications Summary
Probing for the 21st centurySWTW 2002
Memory Fine Pitch
Area Array
HF 1-10 GHz
Para-metric
Wafer- level
burn-in
Epoxy
VSCC
HAWK
VCPC
Coax Probe
Probing for the 21st centurySWTW 2002
50
70
90
110
130
150
2001 2002 2003 2004
Year
Pitc
h (
m)
VCPC (64 Die)
Epoxy (32 Die)
HAWK (128 Die)
Probing for the 21st centurySWTW 2002
Smaller pitch Lower probe force Individually-replaceable probes Improved DUT layout flexibility Fewer cleanings Higher bandwidth
Probing for the 21st centurySWTW 2002
Probing for the 21st centurySWTW 2002
PCBTop Stiffener
Guide Plate Bottom StiffenerSpace Transformer
Planarization Spring
Probe
Probing for the 21st centurySWTW 2002
10 um
Probing for the 21st centurySWTW 2002
Release
Over Drive
Probing for the 21st centurySWTW 2002
0
1
2
3
4
OD25 OD50 OD75
Overdrive (µm)
Prob
e Fo
rce
(gf)
MaxMinAvg
Probing for the 21st centurySWTW 2002
22
10
28
11
50 µm OD 70 µm OD
Probing for the 21st centurySWTW 2002
-20
-15
-10
-5
0
5
10
15
20
-20 -15 -10 -5 0 5 10 15 20X-Deviation (µm)
Y-D
evia
tion
( µm
) 1K300K
TEST CONDITIONS
Temp : 100oCOD : 70 umLoad : 50mA; 10 msPad : Al-Cu
Probing for the 21st centurySWTW 2002
-30-20-10
0102030
0 25 50 75 100Pin No.
Plan
arity
(µm
) INT300K TEST CONDITIONS
Temp : 100oCOD : 70 umLoad : 50mA; 10 msPad : Al-Cu
Probing for the 21st centurySWTW 2002
0
5
10
15
0 20 40 60 80 100
Overdrive (µm)
CR
ES ( Ω
) TEST CONDITIONS
Temp : 100oCOD : 10 - 80 umLoad : 50mA; 10 msPad : Al-Cu
max
avg.
min
Probing for the 21st centurySWTW 2002
0
2
4
6
8
10
0 2000 4000 6000 8000 10000
Touchdowns
CR
ES
(Ω
)
MAXMINAVG
TEST CONDITIONS
Temp. : 90 °COD : 60 umLoad : 50mA; 10 msPad : Al-CuNo cleaning
Probing for the 21st centurySWTW 2002
0
1
23
4
5
6
78
9
10
1 2500 5000 2500 5000 2500 5000 2500 5000 2500 5000
Touchdowns
CR
ES
(Ω
)
Cleaning
Probing for the 21st centurySWTW 2002
5K TD Clean 5K TD70µm OD / 85 °C / Al-Cu
Clean 5K TD Clean 5K TD Clean
Probing for the 21st centurySWTW 2002
INT 500TD 1000TD 5000TD
One cycle of 10 touchdowns on the cleaning sheet is repeated 500 times.
==> Probe tip wear is relatively little.
Probing for the 21st centurySWTW 2002
Minimum Pitch : 80 µm
Probe Force : 2.8 gf @ 70 µm OD
Max. Scrub Mark : 30 µm
Alignment : ±10 µm
Planarity : ±10 µm
Tip Shape : Flat-top pyramid
Tip Size : 10±5 µm
Tip to Guide Plate : 750 µm
Max. Current : 250 mA (continuous)
Probing for the 21st centurySWTW 2002
New solution for highly-parallel memory.
Fine pitch.
Easy to repair.
Uniform probe shape.
In use at multiple production sites.