quantum technology: supplying the picks and shovels · 2016-08-03 · event 7th august 2014,...
TRANSCRIPT
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Page 1 © Oxford Instruments 2014
Quantum Technology: Supplying
the Picks and Shovels
Dr John Burgoyne
Quantum Control Engineering: Mathematical Solutions for Industry – Open for Business
Event 7th August 2014, 12.30-17.00, Isaac Newton Institute, Cambridge
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Why “picks and shovels”?
20 February 2006
…Tools enable discovery
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Behind the metaphor
New ideas
+
New tools
New
science =
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Why this dialogue is important V
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A suite of materials, metrology and
measurement tools for QT
Plasma deposition
and etch
Qbit measurement
Qbit manipulation
Surface analysis
- chemical
SEM
MBE & UHV sputtering fabrication
Surface analysis
- structural
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Device fabrication
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• Growth
• MBE
• Nanowires/nanotubes
• High temperature plasma-
enhanced chemical vapour
deposition (PECVD)
• Deposition
• PECVD
• Inductively coupled plasma
(ICP) deposition
• Ion beam deposition
• Atomic layer deposition (ALD)
• Etch
• ICP etch
• Reactive ion etch (RIE)
• Ion beam etch
Enabling device fabrication via a suite of
advanced techniques and processes
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Capabilities from research to pilot-scale and production
– solutions that grow with the technology
Wafer handling
50 mm Wafer size 450 mm
Production – cassette to cassette
Open load
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Multi-tool clusters
Kelvin probe
ALD
(thermal &
plasma)
Hex handler
with integrated
Kelvin Probe
PECVD Sputter
ICP-CVD
#1
ICP-CVD
#2
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• Process library of > 6,000 processes
developed over 25 years
• Accessible to all our customers
• Close collaboration with major
Universities and R&D facilities
• Caltech, Cornell, LBNL, TU
Eindhoven, IMEC, Southampton
University, Cambridge University, …
• Process guarantees for key
parameters
• Including wafer-to-wafer repeatability
for rate and uniformity
Our process advantage
TEOS based SiO2 deposition Typical GaN etched feature (PR
remains intact)
Waveguide etch HB LED substrate etch
SiC metal mask etch High rate SiNx at 8 0ºC
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• Unique capability of ALD for
monatomic/ mono-molecular layer
control over extremely high aspect
ratio features
• Example (top): ALD of Al2O3 on
carbon nanotubes (CNT)
• Using TMA and O2 plasma
• O2 plasma just enough to react
with TMA but not etch CNT
• No additional functionalisation of
CNT necessary
• Example (bottom): 20 nm HfO2
onto 25:1 AR Si trenches
• Conformality ~ 100%
Extreme aspect ratio conformal deposition via
Atomic Layer Deposition
Trench corner
HfO2 Si
Trench bottom
HfO2
Si
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Deposition UHV multi-chamber tool: Institute for
Quantum Computing, University of Waterloo, Canada
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• MBE and UHV sputtering
methods on multiple
materials within the same
device
• Metals, metal oxides,
superconductors,
topological insulators…
• XPS (X-ray photoelectron
spectroscopy) analysis of
samples
• Oxford Instruments
Omicron ARGUS analyser
• In-process analysis
• Enables layer-by-layer
quality control of the MBE
and sputtering growth
processes
Deposition UHV multi-chamber tool: Institute for
Quantum Computing, University of Waterloo, Canada
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Device physics and
characterisation
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• QT device physics needs low (ultra-low)
temperatures
• The initial, “obvious” advantage: no liquid
cryogens
• No compromise on performance
• Base temperature <10 mK
• Cooling power up to 400 µW at 100 mK
• Attraction for QT science emerged:
greatly enhanced sample space vs. ‘wet’
• 240 mm diameter mixing chamber plate
• Open structure for easy experimental
access
• Ease of use
• Sample in vacuum with only a single room
temperature O-ring seal (no IVC)
• Fully automatic cool-down from room
temperature to base
• Remote control through TCP/IP protocol
A key enabler for QT/QIP R&D: the TritonTM
Cryofree® dilution refrigerator platform
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• ULT plus…
• Electrical
• Wide bandwidth electronics
• GHz pulse sequences
• Low noise amplification
• Low temperature filtering and amplification
• Low electron temperatures
• Magnetic
• Homogeneous fields
• Gradient fields
• 3D Vector fields
• AC fields
• Optical
• Low vibration
• HV/UHV
• fs pulse sequences
• Single photon emitters
• Optical windows
• Spectroscopic detectors
• Atomic
• UHV
• Gas injection
• Ion/electron beam
• Rapid scan SPM
What else is needed for QIP ‘read/write’
control
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Triton DR: typical experimental services
96 off dc
lines
Still plate
100 mK
plate
4 K plate
2 off optical
fibres
10 off UT-85
rigid coaxial
cables
10 off S1
flexible coaxial
cables
Mixing chamber
plate, <10 mK
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Experimental services, heat sinking and
available cooling powers
“Fully loaded” Triton DR: base temperature < 15 mK
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Triton DR integrated 3-axis superconducting
magnets
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Multiple Triton DR systems: Centre for Quantum
Devices, Niels Bohr Institute, University of
Copenhagen, Denmark
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Multiple Triton DR systems: TU Delft,
Netherlands
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Fast throughput: top-loading sample
exchange
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• 4 off 18 GHz
• 25 off dc lines
30 mm top-loading sample puck
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OVC break
Sample puck
Magnet
Vacuum lock
and gate valve
Drive rods
Fast throughput with larger sample space:
bottom-loading sample exchange
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• 14 off 40 GHz
• 50 off dc lines
• < 8 hours cool-down
time
70 mm bottom-loading sample puck
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MC plate
Docking
station
Sample holder
Coaxes routed
from MC plate
to docking
station
Field centre
Fast throughput with larger sample space:
bottom-loading sample exchange
Repeat connect/disconnect cycles
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Sample instrumentation
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New platform for yet greater capacity and
capability: TritonXL
Ø 240 mm
706 mm
Ø 430 mm
1003 mm
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TritonXL: sample space and wiring access
Triton
• Ø 240 mm
• 1 x 50mm + 2 × 40 mm
+ 1 x 65 mm LoS ports
TritonXL
• Ø 430 mm
• 6 x 50 mm + 1 x 100 mm
LoS ports
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• The future
• On-board cold electronics
• Filtering, multiplexing, amplifiers, …
• Enhanced measurement
• Electron temperature thermometry
• Standardised measurement pucks
• Anticipating close participation in a number of QT Hubs
• For discussion!
• What are we not seeing yet in QC/QIP?
• What are we not seeing yet in QT beyond QC/QIP?
And finally…
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Thank you