redefining the future compact online trace n in argon ... · the information given in this document...

www.asdevices.com - [email protected] | ©copyright 2018 Analytical Sensing Devices

* = patent pendingASDevices is a fully owned Canadian company that is proud to design and manufacture its products in Canada

Pri

nted

in C

anad

a

Improving the past...Redefining The Future

COMPACT ONLINE TRACE N2 IN ARGON/HELIUM ANALYSER WITH ENHANCED PLASMA DISCHARGE (Epd)* TECHNOLOGY

APPLICATIONS

The N2Sense is powered by the Enhanced plasma discharge (Epd)* technology. Compared to

other commercially available analysers which use a single wavelength measurement, the N2Sen-

seTM uses a combination of our unique stabilising/focusing electrodes* and electron injection electrodes* with the spectral compensation* optical measurement to improve performance and signal stability. This is a super enhanced version of our previous technology introduced in 1995, the K2001 from Kontrol AnalytikTM, which became a standard in the industry.

Air separation plants

Chemical plants

Argon purification plants

Helium liquefication plants

Speciality gas laboratories

Steel industries

Leak testing

Welding control

Process control

Semiconductor

Cryogenic truck loading station

Gas management systems

Glove box

Other application capabilities

< 0,5 ppb, ten times lower limit of detection compared to competitor instruments (N

2Sense Plus)

Interference free

Proprietary design leak free flow controller

Industrial grade touch screen display

12 months internal data storage

IIoT ready

Ultra compact

Designed for 19” rack (133 x 202 x 330 mm) (5.25 x 8.0 x 13.0 in)

Ultra stable

Not affected by moisture or other impuri-ties in the sample background

Powerful processing algorithm* backed by a digital signal processor, treating multi spectral data

Multi language user interface

Multi-touch

Advanced embedded inter-face and software

Powered by

Epd technology

Interactive help



Pri

nted

in C

anad

a


* = patent pending

The technology powering the N2Sense

Spectral compensation technology*

Flow path

User interface

Instrument inletBuilt-in particle filter to prevent small particles from corrupting system

High-purity valve boxProprietary design and purged high-purity valve box to preserve the sample integrityKeeps the athmosphere surronding the valve always inert, without air

Doping moduleAdds a proprietary compound and H

2O.

Helps to stabilise the plasma discharge and improves the plasma de-excitation pro-cess in combination with the focusing/stabilising* and election injection electrodes*

Epd detectorPerforms the N

2 measurement and corrects it using the spectral compensation

technology* Supported by the focusing/stabilising electrodes and electron injection elec-trodes.

Flow transducerThe vent of the detector is then flowing into a flow transducer, which is used to control the flow and keep it stable

State-of-the-art industrial grade touch screen displayErgonomic and user-friendly

Multi-touch technologyMulti language user interface

Menu barEasy access to main software menus

Operate the instruments by using only 7 self-explanatory menus

Information barIndicates real-time nitrogen measurement,

date and timePermanently display, regardless of the menu

selected

The N2Sense analyser is based on our Enhanced plasma discharge (Epd) Technology*. Compared to other plas-ma-based analysers which use only the optical emission as a source of measurement, the N

2Sense uses a combi-

nation of our unique focusing/stabilising and electron injection electrodes with a spectral compensation algorithm, and a closed loop force-driven plasma generator.

The second method uses the spectral compensation mode. This is controlled by our proprietary embedded algo-rithm* and is fully transparent to the user. Flow and ambient pressure variations are both causing measurement errors with traditional plasma emission technologies. This is due to a change in power distribution in the plasma. Our proprietary embedded algorithm overcomes that issue by continuously adjusting the power distribution and consequently compensating for the Bremsstrahlung (plasma-based emission) fluctuation. The result is the cancel-lation of flow and pressure effect on the plasma baseline emission.

The first way consists of properly controlling the energy in the plasma by improving the ionisation efficiency. This is achieved with our focusing/stabilising and electron injection electrodes*. This addresses the quenching issue which other plasma technologies are all still suffering.

Those unique technologies address the problems of baseline fluctuation due to flow and pressure variations and impacts of quenching molecules such as H

2O on the measurement, in two ways. This has the impact of reducing

substantially drift and noise.

Fill in the blank type interfaceAllow easy-access calibration, diagnostics,

monitoring and remote control.Data trending and alarm history summary

12 months internal data storage



Pri

nted

in C

anad

a


* = patent pending

Enhanced plasma discharge (Epd) technology*

The Enhanced plasma discharge technology brings two disrruptive ad-vancements to the previous and well-known technology (PED).

First, two stabilising/focusing elec-trodes* have been introduced in the de-sign to resolve plasma source instability (quenching and filamentary oscillation) and hence signal to noise improvement at low concentration.

Second, the electron injection elec-trodes* improve ionisation efficiency.

Spectral compensation technology*• Unique to our Epd technology* and to our proprietary spectral

compensation algorithm*.

• Cancel measurement drift from ambient pressure, flow and

temperature variations.

• The result is an unsurpassed measurement precision

Reach analytical performance with an industrial/instrumentation double ferrule compression fittingBy using LipLOK on your instruments benefit from:

Proprietary flow controller

Advanced embedded software

Purged enclosureNo leak

Improved stabilityReduced noise

Improved reliability

Our proprietary leak free flow controller is based on a micro proportional valve and a unique purged enclosure

Micro proportional valveNo dead volume

Less driftFaster response time

Unique graphical user interfaceIIoT ready

Data trending and alarm history summary12 months internal data storage

• Leak detection capability• Better leak integrity

• No dead volume• Compatible with the industrial standard

double ferrule type

Ethernet ports IIoT ready

Remote connectivity Remote data storageRemote alarm

iOS® and Android®

compatibility

Custom ultra stable interference filterAdjustable pre-amp gainDifferential measurement, eliminate electrostatic noise coupling

Customable optical cartidge

Special response bandwidth photodiode



Pri

nted

in C

anad

a


* = patent pending

Sample trap

Auto-calibration flow path option

24 hour drift

In our previous design, back from Kontrol AnalytikTM in 1992, we did cancel out the detrimental effect of moisture in the sample by the combine effect of a molecular sieve 3A trap (N

2 have 4A diameter) and the permeation tube

installed before the detector [1]. However, this solution didn't eleminate the effect of organic compound found in some older installation. This organic compound causes a lost of sensitivity of the detector, due to carbon deposition inside the cell reducing.

Our new sample trap resolves this issue and also results in a better response time compared to the prior solution, because the molecular sieve 3A was adding some delay. Our new sample trap have an higher trapping capacity for the H

2O, traps also the organic, and has a faster recovery time. The trap should be installed at the sample inlet of

the instrument, as shown below.

Sample trapSample inlet

Analyserinlet

Analyser enclosure

Vent Plate for rackmounted N2Sense installation (19'')

Noise performance Sensitivity

Response time

[1] AN-05, Contrôle Analytique: An improved system and method for on-line N2 measurement in noble gases, 1996.




LEGAL DISCLAIMERTHE INFORMATION GIVEN IN THIS DOCUMENT (INCLUDING BUT NOT LIMITED TO CONTENTS OF REFERENCED WEBSITES) IS GIVEN AS A HINT FOR THE IMPLEMENTATION OUR PRODUCTS AND TECHNOLOGIES COMPONENT ONLY AND SHALL NOT BE REGARDED AS ANY DESCRIPTION OR WARRANTY OF A CERTAIN FUNCTIONALITY, CONDITION OR QUALITY OF THE ASDEVICES TECHNOLOGIES COMPONENT. THE RECIPIENT OF THIS DOCUMENT MUST VERIFY ANY FUNCTION DESCRIBED HEREIN IN THE REAL APPLICATION. ASDEVICES HEREBY DISCLAIMS ANY AND ALL WARRANTIES AND LIABILITIES OF ANY KIND (INCLUDING WITHOUT LIMITATION WARRANTIES OF NONINFRINGEMENT OF INTELLECTUAL PROPERTY RIGHTS OF ANY THIRD PARTY) WITH RESPECT TO ANY AND ALL INFORMATION GIVEN IN THIS APPLICATION NOTE..THIS MATERIAL IS PROPRIETARY TO ANALYTICAL SENSING DEVICES AND CANNOT BE COPIED, REPRODUCED OR DISSEMINATED IN ANY WAY WITHOUT ITS PRIOR WRITTEN APPROVAL.. THE TECHNOLOGY DESCRIBED HEREIN MAY BE SUBJECT TO PATENT PROTECTION OR OTHER FORMS OF INTELLECTUAL PROPERTY RIGHTS.

Pri

nted

in C

anad

a

Information in this paper is subject to change without prior notice.All ASDevices products respect CE/RoHS (CSA optional) standards.

Specifications

Technology

Limit of Detection

Range

Drift

Response time

Standard Features

Interface

Gas Connections

Recommended calibration gas

High calibration set point

Low calibration set point

Sample Flow

Pressure inlet range

Operating Temperature

Operating voltage

Power consumption (max)

Weight

Dimensions

Enhanced plasma discharge (Epd)*

Spectral compensation*

< 0,5 ppb with N2Sense Plus

< 2 ppb with standard version

0-1 ppm 0-10 ppm 0-100 ppm Up to 1% available

< 0,5% of range in use

< 10 sec. for 90% step change @ 75 mL/min

3 x range relays 1 x status relay 2 x alarm relays

Ethernet / IIoT ready - Remote access and control - Built-in I/Os

MQTT protocole for M2M communication and RS-232

4-20 mA output as standard - Other optional

Industrial grade touch screen display

Data trending and alarm history summary - 12 months internal data storage

1/8” LipLOKTM (Compatible with SwagelokTM type fitting)

> 90% of range N2 in Ar or He

0 - 20% of range N2 in Ar or He

5 mL/min to 200 mL/min

20,68 to 172,37 kPa (3 to 25 PSIG) (other pressure available on request)

5°C to 40°C (41°F to 104°F)

24 VDC

40 watts

4,54 kg (10 lbs)

133 x 202 x 330 mm (5.25 x 8.0 x 13.0 in) (Designed for 19" rack)

Product nomenclature N2S-AAA-BB-C-DD-E

AAA

BB

C

DD

E

100: Max range 100 ppm10000: Max range 10000 ppm

AR: ArgonHE: HeliumAH: Argon and Helium

A: Automatic calibrationM: Manual calibration (Standard)

AP: Atmospheric pressure (Standard)LP: Low pressure

S: Standard versionP: Plus version

Range

Sample gas

Calibration mode

Sample pressure

Version

OptionsParameter

redefining the future compact online trace n in argon ... · the information given in this document...

Documents