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Semion ™ Process Ion Energy and Ion Flux Analysis System

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  • Semion ™Process Ion Energy and Ion Flux Analysis System

  • Product Information The Semion™ Retarding Field Energy Analyzer System is designed to measure both the Ion Energy and Ion Flux at a biased surface in a plasma chamber.

    The Semion™ System consists of a Retarding Field Energy Analyzer (RFEA) multi-grid Probe, chamber feed-through assembly, and electronic control unit.

    Impedans employs a range of 3-grid and 4-grid retarding field analyzers to provide industry leading ion energy distribution and ion flux measurements.

    The RFEA Probe can be mounted on an electrode/substrate holder, or in a dummy wafer to sample wafer processing conditions.

    The Semion™ System is suitable for installation on a wide range of plasma source configurations; capacitively coupled, inductively coupled, magnetron, pulsed bias, cascaded arc, and remote source.

    Semion™ can be used under the following bias conditions (single-, dual-, and multi-frequency)

    • Grounded

    • DC

    • Floating

    • RF

    • Pulsed/shaped bias

    A unique feature of the product is the ability to place the RFEA probe on a driven electrode. The RFEA probe floats with the electrode, similar to a wafer or substrate, and can measure the ion flux and ion energy at the substrate surface, without disturbing the process.

    The Semion™ Control Unit provides all of the required grid voltage biases and comes with software to sweep and control the RFEA Probe automatically.

    • Substrate mounted Retarding Field Energy Analyzer Probe

    • In-situ measurement of:

    • Ion Energy Distribution • Ion Flux • Ion Current • Electron Flux and Energy

    • Measurement of Ion Energies up to 2500eV at pressures up to 300mT

    • Time resolved measurement capability up to 500kHz for pulsed systems, with time resolution of 44nS

    • Plasma floating potential measurement adjustment feature

    • Easy to install, no chamber retrofit required

    • Portable system allowing analysis in multiple chambers using single system

    ApplicationsThe Semion™ System finds many applications in research and industry:

    • Plasma Research

    ❍ – IEDF, Ion Flux, EEDF, negative ion investigation

    • Semiconductor process and tool R&D

    ❍ – Etch, PECVD, Deposition

    • Materials/Thin Film Coating Process development

    ❍ – DC Magnetron Sputtering, HiPIMS, HPPMS etc.

    • Ion Beam Analysis

    • Solar/Flat Panel process and tool R&D

    ❍ – IEDF and ion flux monitoring

    • Tool Equipment R&D

    ❍ – Power supply, chamber development

    • Plasma Manufacturing Process Diagnostics

    – Verify tool operating conditions post PM

    – Measure Vdc on substrate bias voltage

    Probe Material The RFEA Probe may be supplied in a wide range materials and surface finishes to match the end-user application.

    Options include:

    • Standard Aluminium, suitable for standard plasmas e.g. Ar, O2 and deposition Plasmas e.g. CH4, Ti

    • Anodized Aluminium compatible with mild and aggressive etch chemistries

    • Ceramic coated (Al2O

    3) compatible with mild and aggressive

    etch chemistries

    • Stainless Steel

    Button Probe™The Semion Button Probe™ is the first customer-serviceable retarding field energy analyzer probe, and assists with the maintenence of the Semion system in processes where a coating is deposited on the RFEA Probe while operating in a plasma process.

    The Button Probe is inserted in the custom probe-holder. Once the button Probe has been coated (or etched) the probe may be removed and a new probe placed in the holder. Once the Button Probe kit has been fully expended, the kit may be returned to Impedans to be recycled and a replacement kit ordered.

    High-Resolution Time-Resolved Pulsed DC measurementsThe Semion pDC system is a unique scientific instrument which delivers high-resolution IEDF and ion flux measurements in pulsed DC systems. The Semion RFEA probe sits on a floating, DC, or pulsed bias electrode or substrate holder and may be installed in HiPIMS, reactive sputtering, DC Magnetron sputtering, and a wide range of process chambers where a pulsed DC or pulsed shape bias is applied.

    InstallationThe RFEA Probe is a compact device and does not require modification of the electrode during installation. The sensor sits on the electrode surface in place of a substrate. Sensor cables are fed through the chamber side port via a feed-through assembly. Electrical connections are carried to the Semion™ Control Unit from the chamber flange feed-through connections. Customized substrate holders can be supplied to support installation in all chamber types.

    Features

    Range of Probe Material

    Button Probe

    IEDF plots for pDC bias @ 350kHz

    Semion™ Software Screenshot

    Semion™ RFEA Probe Mounted in a Plasma Chamber

  • Impedans Ltd. Unit 8, Woodford Court, Woodford Business Park, Santry, Dublin 17, Ireland

    Tel: + 351 1 443 4882 Email: [email protected]

    www.impedans.com

    For more information contact:

    Semion 800

    Ion Energy Range 0 to 800eV *

    Ion Current 2mA DC max

    Ion Flux 0.1 - 20mA/cm²

    IEDF Resolution +/- 1eV nominal

    Semion HV-2500

    Ion Energy Range 0 to 2500eV*

    Ion Current 2mA DC max.

    Ion Flux 0.1 - 20mA/cm²

    Time Resolved Frequency Range 1kHz to 500 kHz

    IEDF Resolution +/- 1eV nominal

    Semion pDC

    Ion Energy Range 0 to 800eV*

    Ion Current 2mA DC max.

    Ion Flux 0.1 - 20mA/cm²

    Time Resolved Frequency Range 1kHz to 500 kHz

    IEDF Resolution +/- 1eV nominal

    Time Resolution 44nS

    RFEA Probe

    Probe Configuration 3-grid & 4-grid options

    Button Probe Diameter 32mm

    Holder Diameter 70mm, 100mm (4”), 300mm (12”) as standard, other dimensions on request

    Holder Thickness 5mm

    Mounting RFEA Probe holder mounted on electrode

    Probe Enclosure Material Aluminium, anodized aluminium, stainless steel, Al

    2O

    3, or

    custom materials to order

    Probe Holder Material Aluminium, anodized aluminium, stainless steel, Al

    2O

    3, or

    custom materials to order

    RFEA Probe Cable Length 500mm standard, or custom length to order

    Semion System Specifications

    Feed-through Assembly

    Flange type KF40 standard, CF40 or other to order

    Control Unit Electronics

    Voltage Range Semion 800, Semion pDC -600V to +600V (suppression voltage), -420V to +420V (grid voltages),

    Semion HV-2500 -2kV to +2kV(suppression voltage), 1.5kV to +1.5kV (grid voltages)

    Current range 100pA to 2.4mA

    Connectivity USB 2.0

    Application Software

    Operating System Windows 2000/XP/Vista/ Windows 7 Compatible

    *dependant on DC bias