shear stress measurements via elastomer micropillar arrays · 2014-10-17 · sensing and...
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![Page 1: Shear Stress Measurements via Elastomer Micropillar Arrays · 2014-10-17 · Sensing and Controlling Motion with Polymeric Materials Symposium Shear Stress Measurements via Elastomeric](https://reader034.vdocument.in/reader034/viewer/2022043021/5f3d61a288a1ac17ef37ad12/html5/thumbnails/1.jpg)
Sensing and Controlling Motion with Polymeric Materials Symposium
Shear Stress Measurements via Elastomeric Micropillar Arrays
Dr. Christopher J. Wohl, Advanced Materials and Processing Branch, NASA LaRC Dr. Frank L. Palmieri, Advanced Materials and Processing Branch, NASA LaRC Dr. John W. Connell, Advanced Materials and Processing Branch, NASA LaRC
Dr. Yi Lin, National Institute of Aerospace (NIA) Allen Jackson, Fabrication Technology Development Branch, NASA LaRC
Alexxandra Cisotto, NASA Langley Aerospace Research Summer Scholars Program, NASA LaRC Dr. Mark Sheplak, Interdisciplinary Microsystems Group, University of Florida
246th American Chemical Society National Meeting September 8-12, 2013
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Airflow & Shear Stress
2
0
y
wy
U
u(y) = 0.99U¥• For a 2D flow, the shear stress can be
approximated by the linear change of mean velocity with distance from the wall
U= Free Stream Velocity = Kinematic Viscosity
U
y
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Research Objective
• The objective of this work is to generate a robust shear stress sensor capable of making accurate shear stress measurements up to 10 Pa with Pa sensitivity without airflow disruption.
3
Length, L
Diameter, d
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Research Objective
• The objective of this work is to generate a robust shear stress sensor capable of making accurate shear stress measurements up to 10 Pa with Pa sensitivity without airflow disruption.
4
A Smooth Wall A Rough Wall
Image from: Potter, Merle C. Fluid Mechanics Demystified. The McGraw Hill Company, New York, 2009, p. 144.
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
State-of-the-Art Shear Stress Sensing
Indirect Measurements
• Hot Wire Anemometer
• Pitot Tube
• Whispering Gallery Mode
Direct Measurements
• Oil Interference
• MEMS devices
Our approach … “Capped” Micropost Arrays
Current shear stress measurement techniques that minimally impact airflow are difficult to implement, of questionable reliability, and sensitive to environmental factors.
Development of these sensors would alleviate many of these issues enabling shear stress measurement on a variety of surfaces including acoustic liner applications with sensors that: (1) Are robust, (2) Reduce complexity for integration into a wind tunnel model, (3) Enable measurement in 360°.
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Previous Micropillar Shear Stress Sensors
W. Schröder, RWTH Aachen University Other Research
6
S. Große and W. Schröder Int. J. Heat and Fluid Flow 2008, 29, 830. S. Große, et. al. Meas. Sci. Technol. 2006, 17, 2689.
E. Gnanamanickam and J. Sullivan J. Micromech. Microeng. 2012, 22, 125015. B. Li, et. al. Cell Motil. Cytoskeleton 2007, 64, 509.
Novel Manufacturing Methods
Investigation of Bio-adhesion
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Laser Ablation for Template Generation
• Generation of master templates amenable to micropillar array fabrication: laser ablation patterning
7
2 layers of electrical tape used to absorb energy that, when applied to the epoxy, led to large diameter, shallow side-wall angle ablation.
Dicing tape applied to enable facile removal of the electrical tape layers.
Glass Substrate
Dicing Tape
2 layers of electrical tape
Laser ablation patterning affords excellent depth control but has limited diameter control with a minimum achievable diameter of approximately 30 m.
Epoxy
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Contact Lithography for Template Generation
• Generation of master templates amenable to micropillar array fabrication: contact lithography
8
Substrate (Si wafer)
Photoresist
Photomask with chromium
UV Light
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Contact Lithography for Template Generation
• Generation of master templates amenable to micropillar array fabrication: contact lithography
9
Substrate
50 m
Photolithography offers greater capability for increased aspect ratios relative to laser ablation patterning. However, the available photomask patterns are far too dense.
Photoresist
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Contact Lithography for Template Generation
Designed Photomask for Contact Lithography Master Template Fabrication
Close-up of Pattern Schematic
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Pitch of stress-relief
grid: 2 mm
Width of grid
lines: 0.1 mm
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Micropillar Array Fabrication: Soft Lithography
• Fabrication of micropillar arrays using soft lithographic techniques
11
Uncured Silicone Master Template Cured Silicone
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Micropillar Array Fabrication: Soft Lithography
• Fabrication of micropillar arrays using soft lithographic techniques: using laser ablation generated templates
12
% power kHz in/s Post Height
(μm)
90 60 2.5 115
90 60 2.0 123
92 60 3.0 62
92 60 2.5 45 - 85
92 60 2.0 132
95 60 3.0 85
95 60 2.5 123
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Micropillar Array Fabrication: Soft Lithography
• Fabrication of micropillar arrays using soft lithographic techniques: using contact lithography templates
13
Results from old Photomask 45-50 m
50°
90°
Results from New Photomask Aspect Ratio: 4:1
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Force Calibration of Micropillars
• Force-displacement pillar calibration experiments using atomic force microscopy
14
1
1
2
2
3
3
~35 μm
~230 μm
a1 ~ 110μm a2 ~ 145μm
a3 ~ 175μm
Bending distance (m)
0.0 0.5 1.0 1.5 2.0 2.5 3.0 3.5
No
rma
lize
d F
orc
e (
nN
)
0
20
40
60
80
100
120
140
Point 1
Point 2
Point 3
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
“Capping” Micropillar Arrays
• Fabrication of “capped” micropillar arrays: schematic of approach
15
Length, L
Diameter, d
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
“Capping” Micropillar Arrays
Sylgard 184 Spin Curve SEM Image of “Capped” Pillars
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“Cap” film thickness can be easily varied based on spin-coater settings. With greater pillar spacing, the caps readily formed and were free standing, i.e., no pillar coupling.
0
2
4
6
8
10
12
14
16
18
20
22
24
26
0 1000 2000 3000 4000 5000 6000
Thic
knes
s (μ
m)
Spin Speed (rpm)
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Future Work
• Micropillar array design refinement
– Identification of greatest efficacy methods for micropillar capping and signal enhancing dopant
– Characterize micropillar deflection
– Develop micropillar arrays for various wind speeds
• Characterization for signal implementation
– Determine measurement range, sensitivity, noise floor, etc.
• Use of PIV equipment and visualization techniques to see pillar deflection
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Acknowledgements
• Research Assistance:
– John Hopkins-Ablation Laser Operations
– Vincent Cruz-Contact Lithography Assistance
• Discussion
– Xiaoning Jiang, North Carolina State University
• Funding:
– NASA Aeronautics Research Directorate NARI Seedling Program
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Supplementary Slides
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Experimental Approach
• Pillar Array Design and Fabrication – Generate master templates using available lithographic
processes Identify requisite pillar parameters for shear stress measurements in subsonic flows
• Laser ablation of epoxy substrates
• Contact lithography of SU-8 coated Si wafers
– Fabricate micropillar arrays using commercially available elastomeric materials
• Pillar Calibration and Signal Transduction – Calibrate pillar deflection using atomic force microscopy
– Determine signal transduction approach
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Concept
Pillar Parameter Value
Length, L L < 100 m
Aspect Ratio, L/d (diameter)
L/d ≥ 3
Pillar Spacing, s s > 2L
Deflection Limit, w w ≤ 0.1L
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Contact Lithography for Template Generation
• Generation of master templates amenable to micropillar array fabrication: contact lithography
– This procedure required process refinement for several steps:
• Plasma exposure of Si wafers
• Dehydration baking
• SU-8 adhesion promotion layer
• SU-8 application
• Soft bake
• Photomask positioning and exposure
• Pattern development
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
• Generation of a macroscopic example of the micropost array sensor
Accomplishments
22
Pillar deflection was readily observed on the macroscopic sample.
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Micropillar Array Fabrication: Soft Lithography
• Evaluation of different silicones
23
Shore 00 0 10 20 30 40 50 60 70 80 90 100
Shore A 0 10 20 30 40 50 60 70
Ecoflex -
0010
Shore
Hardness:
00-10
Solaris
Shore
Hardness:
A-15
Ecoflex 00-
50
Shore
Hardness:
00-50
Silastic
T-2
Shore
Hardness:
A-42
Mold Star
30
Shore
Hardness:
A-30
Sylgard 184
Shore
Hardness:
A-50
Extra Soft Soft Medium Soft Medium Hard
Silicone Hardness (Shore A)
Tensile Strength (MPa)
Ecoflex-0010 00-10 0.83
Ecoflex-0050 00-50 2.17
Solaris 15 1.24
Mold Star 30 30 2.90
Silastic T2 42 5.52
Sylgard 184 50 7.07
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Signal Transduction
24
• Integration of Micropillar Array Sensors with Existing (Micro) Particle Image Velocimetry Instrumentation
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246th American Chemical Society National Meeting
Sensing and Controlling Motion with Polymeric Materials Symposium
Fluorescent Dye Doping of “Caps”
• Identification of most efficacious method for signal transduction: optical, piezoelectric, etc.
Visible Light Illumination UV Light Illumination
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