signatures of chemical defects in carbon nanotube electronic devices
DESCRIPTION
Signatures of Chemical Defects in Carbon Nanotube Electronic Devices. Brett Goldsmith Collins Lab Department of Physics and Astronomy. A broad look at defects. Tools to Study CNT Defects. Fan, Nature Materials. December, 2005. Drain. Source. V SD. V F. V tip. - PowerPoint PPT PresentationTRANSCRIPT
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Signatures of Chemical Defects in
Carbon Nanotube Electronic Devices
Brett GoldsmithCollins LabDepartment of Physics and Astronomy
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A broad look at defects
Types of Devices (all CVD SWCNT):
•pristine nanotube with nearly ballistic conduction
•Growth defects in unmodified nanotubes
•Mild oxidation (no missing carbon)
•Harsh oxidation (missing carbon)
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Tools to Study CNT Defects
•Scanning Tunneling MicroscopyIshigashi, PRL. November, 2004
•Chemical LabelingFan, Nature Materials. December, 2005
•Scanning Gate MicroscopyBachtold, PRL. June, 2000
•Kelvin Force MicroscopyBachtold, PRL. June, 2000
Fan, Nature Materials. December, 2005
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Scanning Probe Microscopy - KFM
Kelvin Force Microscopy (KFM):• Records forces between tip and
sample• Measures Surface Potential• Allows indirect measurement of
local resistance
Source
VSD
Vtip
Drain
VF
Source
Drain
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Scanning Probe Microscopy - SGM
Scanned Gate Microscopy (SGM):• Records current through the
nanotube circuit• Measures local field sensitivity• Shows where the device is “gate
sensitive”
Source
VSD
Vtip
Drain
VF
topography topography + SGM
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Growth Defects - KFM
Ballistic Nanotube Nanotube with Growth Defects
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Ballistic Nanotube
Growth Defects – KFM detail
Nanotube with Growth Defects:
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Growth Defects - SGM
topography
topography + SGM
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Defect Creation on Nanotubes
WE
RE
CE
Vg
Many ways to create defects:
• Mechanical• Chemical• Irradiation• Electrochemical
Jaan Mannik V18.7
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Basic Effects of Oxidation
-6000
-4000
-2000
0
2000
4000
6000
Cur
rent
(na
noA
mps
)
-0.50 -0.25 0.00 0.25 0.50Voltage
Pristine Nanotube
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Basic Effects of Oxidation
-200
-100
0
100
200
Cur
rent
(na
no A
mps
)
-0.50 -0.25 0.00 0.25 0.50Voltage
Weak DefectWeak Oxidation
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Basic Effects of Strong Oxidation
-4
-2
0
2
4
Cur
rent
(na
noA
mps
)
-0.50 -0.25 0.00 0.25 0.50Voltage
Strong DefectStrong Oxidation
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Mild Oxidation - SGM
topography topography + SGM
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One SWNT after Progressively Harsh Treatments
Surface Potential along as-grown CNT:
Surface Potential after mild oxidation:
Surface Potential after strong oxidation:
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Weak Defects - KFM
Ballistic Nanotube Mildly Oxidized Nanotube
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Summary
Microscopy techniques such as KFM and SGM show that oxidation and growth defects have similar effects on CNT circuits.
Engineering the Microworld at The University of California, IrvineUCI Integrated Nanosystems Research Facility
Dr. Yuwei FanDr. Jaan MannikBrett GoldsmithAlex KaneDerek KingreyBucky Khalap
Kevin LoutherbackFatima AlimYasser Elliasal
ACS-PRF