spie.orgspie.org/documents/courses/2007_spie_education_catalog.pdf · 2007-04-05 · professional...

■ Courses

■ Workshops

■ In-Company Training

■ DVDs/CD-ROMs/Videos

SPIEEducationCatalog

2007

Professional development optionswith SPIE will help you:

• Improve your job performance

• Meet changing job demands

• Increase your value to your organization

Create the plan that works for you.

Courses and Workshops at SPIE events offer all-inclusive experiencesfor those who prefer live instruction, where teacher and studentinteraction is important.

In-Company Training brings customized technical courses directly toyour facility. Taught by expert instructors, these courses help you toreduce travel costs while meeting company objectives.

DVDs, Videos, and CD-ROMs from SPIE offer excellent self-directedlearning experiences where convenience and time management areprimary considerations.

Design Your FutureIt’s your career—take charge of shaping it.

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What are SPIE FoundationCourses?Foundation courses provide an introductionto and overview of the technical area theyaddress. They are an ideal entry point forunderstanding core concepts and tools ifyou’re new to a field, looking to brush upyour knowledge in a specific area, or wantto take a closer look at a specializationyou’re considering pursuing. Courses aretaught by instructors with deep knowledgeand years of in-the-field experience, andoffer the unique opportunity to learn fromsome of the most accomplished opticsprofessionals in their respective industries.

SPIE Foundation Courses areideal for:• Technical sales professionals looking to

increase their knowledge to better workwith customers

• Early career professionals who need anin-depth background in theirspecialization

• Mid-career professionals interested inchanging focus to a new field

• Companies looking for training for theirentry-level engineers

• Professionals seeking to broaden theirskills with interdisciplinary training

• Anyone looking to gain a fundamentalunderstanding of the subject

SPIE Foundation Courses

2007

Professional Development from SPIEspie.org/education

Contents

In-Company Training . . . . . . . . . 4-5

Course and Workshop Listings:

Optical Design& Engineering . . . . . . . . . . . 6–14

Optomechanics . . . . . . . . . . . 15–17

Electronic Imaging & SignalProcessing . . . . . . . . . . . . . 18–28

Defense & Security . . . . . . . . 29–36

Biomedical Optics &Medical Imaging . . . . . . . . 37–40

Micro/Nano Lithography& Fabrication . . . . . . . . . . . 41–48

Nanotechnology . . . . . . . . . . 49–50

Industrial Sensing& Measurement . . . . . . . . . 51–55

Lasers & Sources . . . . . . . . . 56–59

Remote Sensing . . . . . . . . . . 60–61

Astronomy . . . . . . . . . . . . . . . 62–63

Illumination Engineering . . . . 64–65

Communications &Networking . . . . . . . . . . . . 66–68

Business & ProfessionalDevelopment . . . . . . . . . . . 69–71

Self Directed Learning . . . . . . 72–74

SPIE Event Calendar . . . . . . . . . . . 75

SPIE course instructors are world-renowned expertsfrom industry and academia, often the authors ofdefinitive texts in their areas of expertise. Coursesand instructors are consistently evaluated to ensurequality and timeliness.

■ Courses

■ Workshops



In-Company CoursesAll of the courses listed in this catalog can be brought to yourcompany. SPIE courses are taught by world-renowned experts fromindustry and academia, and can run from one-day to three-daysessions of concentrated instruction. Strengthen your staff by givingthem the new skills and technical edge necessary to compete intoday’s market.

Technology areas include:

• Astronomy

• Biomedical Optics & Medical Imaging

• Business & Professional Development

• Communications & Networking

• Defense & Security

• Electronic Imaging & Signal Processing

• Illumination Engineering

• Industrial Sensing & Measurement

• Lasers & Sources

• Micro/Nano Lithography & Fabrication

• Nanotechnology

• Optical Design & Engineering

• Optomechanics

• Remote Sensing

Bring Courses to Your Facility:In-Company Training

Save Time and MoneyBy bringing training into your own facility you will cut travelcosts and reduce the amount of time your staff is out of theoffice. Your team will acquire new knowledge and skillswithout loss in productivity.

In-Company

“Great Course! Liked the test examples.Great collection of information in one place.Very relevant to my work.”

– In-Company course attendee,Ball Aerospace & TechnologiesInstructor: Arnold Daniels,The Boeing Company

“Phil Stahl’s knowledge wasimpressive. Thank you for teachingthis course, I learned a lot ofuseful information.”

– In-Company course attendee,Lockheed Martin CorporationInstructor: Phil Stahl, NASA

“Dan Vukobratovich gave a thorough overview of Opto-MechanicalSystem Design. The class was an excellent springboard for applyingmaterial to specific examples of my project work.”

– In-Company course attendee, Hewlett-PackardInstructor: Daniel Vukobratovich,Raytheon Company

Empower your staff with relevanteducation and training:spie.org/inco

Expert Instructors, Relevant TrainingIn-Company instructors and courses receive high marksfrom course attendees:

Contact Gayle Lemieux, Education [email protected] • Tel: +1 360 685 5537

6 spie.org/education · +1 360 676 3290 · [email protected]

Optical Design & Engineering

Optical System Design:Layout Principles andPracticeSC001 VT · CDCourse level: Introductory

This course provides the background andprinciples necessary to understand howoptical imaging systems function, and teachesthe simple methods and techniques withwhich you can lay out a system which willsatisfy the performance requirements of yourapplication.

Optical system imagery can readily becalculated using the cardinal points of Gauss,or by simple ray tracing. These principles canbe extended to specific equations for thelayout and analysis of multi-componentsystems. System performance limits due todiffraction, human vision, sensorcharacteristics and radiometric throughputshould be taken into account.

This course provides simple methods ofarriving at, and understanding, the first-orderlayout by a process which determines thecomponent powers and locations for anoptical system. This process will produce animage of the right size, in the right location andwith the right orientation. The course willemphasize practical applications, not abstracttheory.

INTENDED AUDIENCEThis course is intended for engineers,scientists, managers, technicians and studentswho want to understand the principles ofoptical system imagery, and who want to carryout optical system design/layout. The courseapproach uses only simple mathematics, andis intended to equip the participant to analyze,calculate, and design the best and simplestlayout possible.

Practical OpticalSystem DesignSC003 VT · CDCourse level: Intermediate

This course will provide attendees with a basicworking knowledge of optical design, or morespecifically, lens design. While the course willconcentrate on optical system configurationsand performance optimization and analysis,many practical and useful examples will beincluded throughout. Even if you have neverused an optical design program before, youwill become fluent with how one designsoptical systems for many varied applications.

INTENDED AUDIENCEThis course is intended for anyone who needsto learn how to design optical systems. It willbe of value to those who either design theirown optics or those who work directly orindirectly with optical designers, as you willnow understand what is really going on andhow to ask the right questions of yourdesigners.

Modern Lens DesignSC006Course level: Intermediate

The course begins with a brief review ofparaxial optics, then third-order aberrationtheory, as it applies to optical design, iscovered. Factors that affect aberrations andthe principles of aberration correction arediscussed. Advanced techniques of practicallens design are illustrated with easy-to-understand examples drawn from the designof anastigmats and telescope objectives.These demonstrate design improvementtechniques that are applicable to most opticalsystems. Telephoto and retrofocus lenses,optics for laser systems, mirror andcatadioptric systems are discussed.Descriptions of petzval and microscopeobjectives; fifth-order, inherent and inducedaberrations, diffractive surfaces, double gausslenses, zoom and wide angle lenses areincluded. Computer lens design, design formanufacture, stop shift theory, andapochromatic systems are explained as well.

INTENDED AUDIENCEThis course is intended for optical engineersand scientists who have some knowledge oflens design and who want to increase theiroptical design proficiency through a betterunderstanding of the subject.

COURSE PRICE INCLUDES the text ModernLens Design, by Warren J. Smith (2nd edition,SPIE Press/McGraw-Hill, 2004).

Introduction to OpticalAlignment TechniquesSC010 VT · CDCourse level: Introductory

Please refer to this course descriptionon page 15.

Miniature Optics for DiodeLasers and Beam ShapingSC012Course level: Intermediate


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Courses at SPIE EventsLive instruction for Optical Design& Engineering will take place at theSPIE Events listed below. Registrationand course information is available12 weeks prior to the event dates.

Photonics West

Defense & Security

Optics & Photonics

Optics East

Optifab 2007

See page 75 for a calendar of theseevents.

Bring any of these courses to yourfacility with In-Company training,anytime.

Money-back Guarantee

We are confident that once you experiencean SPIE course for yourself you will look toSPIE for your future education needs.However, if for any reason you aredissatisfied, SPIE will gladly refund yourmoney. We just ask that you tell us whatyou did not like; suggestions forimprovement are always welcome.

Continuing Education Units

SPIE is an authorized providerof Continuing Education Units(CEUs) though ICAET—TheInternational Association ofContinuing Education andTraining. SPIE awards CEUs toparticipants who successfullyattend courses, and completeand return the evaluation formwithin 30 days of the coursepresentation. SPIE maintains arecord of all CEUs earned foreach participant for seven years.

Legend for Education Products:

SC001 = Course Number

WS001 = Workshop NumberVT = Course available

on Video TapeCD = Course available

on CD-ROMDVD = Course available

on DVD= Foundation Course

spie.org/education · +1 360 676 3290 · [email protected] 7

important (defense optics, semiconductors,computer disks, flat panel displays, andsurface appearance). The use of scatteringstandards in the semiconductor industry hasbecome much more important over the last 10years and SEMI has introduced a suite ofwritten standards that are useful across manyindustries. The course emphasizesquantifying, understanding and measuringscatter. Modeling scatter is emphasized inSC492 taught by Thomas Germer.

INTENDED AUDIENCEEngineers, scientists, and managers who needto understand and apply the basic concepts ofscatter metrology to laboratory research andindustrial process control. Some knowledgeof calculus is helpful, but the course does notrequire that the student follow mathematicalderivations.

COURSE PRICE INCLUDES the text OpticalScattering: Measurement and Analysis, 2ndEdition (SPIE Press, 1995), by John Stover.

Testing and Reliability ofSemiconductor LasersSC053Course level: Intermediate

The course covers the device physics,characterization and testing, the lifetime, andreliability evaluations of semiconductor lasers.The features of semiconductor lasers that arerelevant to the device performance andreliability are briefly reviewed. Various lasercharacterization and testing methods aredescribed. The techniques of evaluation oflaser lifetime and factors affecting laserreliability are discussed. Recent developmentsin semiconductor lasers are presented.

INTENDED AUDIENCEThis course is intended for engineers,scientists and graduate students familiar withdiode lasers who want to become familiar withspecification, handling, testing and reliabilitymethods, as well as the latest developments.

Testing and Evaluation ofE-O Imaging SystemsSC067Course level: Advanced

This course will describe all the quantitativeand qualitative metrics that are used tocharacterize imaging system performance.These include resolution, responsivity, theaperiodic transfer function, the slit responsefunction, random noise, uniformity, fixedpattern noise, modulation transfer function,contrast transfer function, and the minimumresolvable contrast. All imaging systemsspatially sample the scene, sampling artifactsoccur in all imagery. Sampling effects becomeevident when viewing test targets such as barpatterns.

Introduction toOptomechanical DesignSC014 VT · DVDCourse level: Introductory


Structural Adhesives forOptical BondingSC015Course level: Intermediate


Principles of FourierOptics and DiffractionSC017 VT · CDCourse level: Intermediate

This course introduces the application ofFourier theory in diffraction and imageformation. The first part of the course providesa review of a number of mathematical topics,including convolution and the Fouriertransform. Next, the phenomenon ofdiffraction is introduced, the effects of lenseson diffraction are discussed, and thepropagation of Gaussian beams is treated.Finally, the effects of diffraction on theperformance of image-forming systems andother optical devices are discussed.

INTENDED AUDIENCEThis course is intended for scientists andengineers who need to understand thediffraction of optical wavefields and the effectsof diffraction on the performance of image-forming systems and other optical devices.

COURSE PRICE INCLUDES the text LinearSystems, Fourier Transforms, and Optics(Wiley, 1978), by Jack Gaskill.

Optical Scattering:Measurement and AnalysisSC020 VT · DVDCourse level: Intermediate

Optical scatter can be used as a sensitiveindicator of surface and bulk defects in manyprocesses. In its various quantitative forms(BRDF, TIS, DSC), it has been used tocalculate and map component parameterssuch as surface texture statistics, particle size,stray radiation and surface appearance.Originally used almost exclusively in the opticsindustry, it is now finding use as a source offast, non-contact metrology in a variety ofindustries where defect-free surfaces are

INTENDED AUDIENCEThis course is for managers, specificationwriters and test engineers involved imagingsystem characterization; from satisfyingcustomer requirements to insuring thatspecifications are unambiguous and testable.

COURSE PRICE INCLUDES the text, Testingand Evaluation of Infrared Imaging Systems,Second Edition, (SPIE Press and JCDPublishing, 1998) by Gerald C. Holst.

Optical DesignFundamentals forInfrared SystemsSC134Course level: Intermediate


Electro-Optical ImagingSystem PerformanceSC154Course level: Intermediate

While this course highlights thermal imagingsystems, most concepts are generic and canbe applied to all imaging systems (CCDs,intensified CCDs, and near IR cameras). Theminimum resolvable temperature (MRT) andminimum resolvable contrast (MRC) arecoupled with the target signature andatmospheric transmittance to provide rangeperformance predictions. The MRT and MRCdepend upon the subsystem MTFs, noise(primarily NEDT and fixed pattern noise), andthe eye’s response. Limitations of back-of-the-envelope approximations such as sensitivityand resolution are discussed. The two-dimensional (fictitious) spatial frequencyapproach, three-dimensional noise model, andnew target discrimination metrics (Johnsoncriteria) are applied to performancepredictions. Limitations and applications ofFLIR92 and NVTherm are discussed.

INTENDED AUDIENCEThis course is intended for engineers andmanagers who desire an appreciation ofimaging system end-to-end analysis. It isassumed that the students are familiar withlinear system theory (MTF analysis).

COURSE PRICE INCLUDES the text Electro-Optical Imaging System Performance, ThirdEdition (SPIE Press and JCD Publishing,2002), by Gerald Holst.


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training, anytime.


Infrared Systems DesignSC155Course level: Intermediate

This course covers the range of topicsnecessary for the understanding of moderninfrared-systems design. Practicalengineering calculations are highlighted, withexamples of trade studies illustrating theinterrelationships among the various hardwarecharacteristics. This course is comprised offour sections.

Section 1 introduces the geometrical opticsconcepts including image formation, stopsand pupils, lens combinations, image quality,and infrared properties of materials. In Section2 the essentials of radiometry necessary forthe quantitative understanding of fluxtransferred are covered. These concepts arethen developed and applied to flux-transfercalculations for blackbody and graybodysources. Remote temperature measurementsare then used as an illustration of theseradiometric principles. Section 3 is devoted tofundamental background issues for opticaldetection-processes. It compares thecharacteristics of photon detectors andthermal detectors with an emphasis onspectral responsivity, D*, and noise issues.With this background, Section 4 considers thesystems-design aspects of IR imagers. Theimpact of scan format on signal-to-noise ratiois described, and the engineering tradeoffsinherent in the development of infrared searchsystems are explained. Figures of merit suchas MTF, NETD, and MRTD are examined forthe performance metrics of thermal sensitivityand spatial resolution of thermal imagingsystems. The interrelationships among thedesign parameters are identified throughtrade-study examples.

INTENDED AUDIENCEThis course is directed to the practicingengineers or scientists who require boththeoretical and effective practical technicalinformation on infrared systems design. Abackground at the bachelor’s level inengineering is recommended. This course hasbeen successfully taken by engineers,managers, maintenance personnel, andgraduate students.

COURSE PRICE INCLUDES the SPIE FieldGuide to Infrared Sytems Design (SPIE Press,2006) by Arnold Daniels and Infrared Detectorsand Systems (Wiley, 1996), by Eustace L.Dereniak and Glenn D. Boreman.

Basic Optics forEngineersSC156 VT · DVDCourse level: Introductory

This course introduces each of the followingbasic areas of optics, from an engineeringpoint of view: geometrical optics, imagequality, flux transfer, sources, detectors, andlasers. Basic calculations and concepts areemphasized.

INTENDED AUDIENCEThis class is intended for engineers,technicians, and managers who need tounderstand and apply basic optics concepts intheir work. The basics in each of the areas arecovered, and are intended for those with littleor no prior background in optics, or for thosewho need a fundamental refresher course.

COURSE PRICE INCLUDES the text BasicElectro-Optics for Electrical Engineers byGlenn D. Boreman (SPIE Press, 1998).

MTF in Optical and Electro-Optical SystemsSC157Course level: Introductory

Modulation transfer function (MTF)is used tospecify the image quality achieved by animaging system. It is useful in analysis ofsituations where several independentsubsystems are combined. This courseprovides a background in the application ofMTF techniques to performance specification,estimation and characterization of optical andelectro-optical systems.

INTENDED AUDIENCEEngineers, scientists, and managers who needto understand and apply the basic concepts ofMTF to specifying, estimating, orcharacterizing performance. Some priorbackground in Fourier concepts is helpful.

COURSE PRICE INCLUDES the textModulation Transfer Function in Optical andElectro-Optical Systems (SPIE Press, 2001) byGlenn D. Boreman.

Introduction toRadiometry andPhotometrySC178Course level: Introductory

In this half-day course, the four basicquantities of radiometry, units, and therelationships to electro-magnetic fieldquantities are presented. Photometry, its units,and conversion factors to old units are alsoaddressed. The course covers the basics ofblack body radiation and transfer, showing thebasic equations needed to set up and solveproblems and the instrumentation for each.The textbook offers more detail in detectoroptical/ electrical characterization, colortheory, and optical properties of specificmaterials.

INTENDED AUDIENCEThis course is for engineers and scientists whodeal with electromagnetic radiation who needto quantify this radiation using internationalstandard units and terminology. The course isfor teachers, students, and researchersinterested in using proper methods,terminology, symbols, and units in theircourses and their research work. It is also forpractitioners solving problems in radiationtransfer, and in measuring radiant andluminous flux in optical systems and in nature.

COURSE PRICE INCLUDES the textIntroduction to Radiometry and Photometry(Artech House, 1994) by Ross McCluney.

Introduction to Opticsfor Non-OpticalPersonnelSC192 VT · DVDCourse level: Introductory

Optical systems are used almost everywheretoday. From eyeglasses to medicalinstrumentation, from telecommunications tospace exploration, optical systems make adifference in our world. This short coursecovers the fundamentals needed tounderstand optical concepts and showsexamples of these concepts used in variousapplications. The material concentrates onconcepts, not the math. The experimentsdemonstrate the basic properties of light andlight sources, and the fundamental propertiesof a laser. Light pipes, basic lenses,radiometry, polarization, and holography aredemonstrated as well. The course concludeswith a slide show that will familiarize attendeeswith critical interdisciplinary opticalengineering, design, and manufacturing steps.

INTENDED AUDIENCEThis introductory tutorial is intended foradministrators, administrative supportpersonnel, engineers, scientists, managers,and those new to optics who need tounderstand optics and be able to conversewith optical experts.


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Polarized Light: APractical Hands-onIntroductionSC206Course level: Introductory

Covering introductory and intermediate topicsin polarized light, simple explanations, andconcepts are the emphasis of this hands-oncourse. There are demonstrations, and eachparticipant receives two linear polarizers, acircular polarizer, a quarter-wave plate and ahalf-wave plate. Topics include: linearpolarizers, mechanical strains, birefringence,orthogonality, circular polarization, matrices,reflective properties, practical applications,optical activity, and Faraday rotation. The goalof the course is that each participant retains asound grasp of each concept, and the use ofmathematics is kept to a minimum. Attendeeslearn to appreciate a light beam’s “polarizationdegree of freedom,” and how to usepolarization-modifying elements to convert abeam’s state of polarization from one form toanother.

INTENDED AUDIENCEThis presentation is aimed at researchers,engineers, technicians, managers and otherswho wish to develop an intuitive grasp ofpolarization concepts.

Fundamentals ofContamination ControlSC210Course level: Intermediate

This course introduces contamination controlas related to the aerospace industry. Thecourse material includes molecularcontamination; particulate contamination; andcontamination control. In particular, the effectof contamination on spacecraft surfaces,(thermal control surfaces, solar arrays, opticalsensors), is examined in order to relatecontamination requirements to systemperformance specifications. Examples fromlaboratory and research operations are alsoincluded.

INTENDED AUDIENCEThis course is aimed at contamination controlengineers, spacecraft designers, and systemsdevelopers who need to quantify the effects ofcontamination on system performance.Specific design examples referenced in thecourse are of interest individuals working on:thermal control systems; electrical powersystems; optical sensors; and spacesimulation measures. Program managers whoneed to develop a justification to support thehigh cost of enforcing rigorous contaminationcontrol techniques will also benefit.

COURSE PRICE INCLUDES the textFundamentals of Contamination Control (SPIEPress, 2000) by Alan C. Tribble.

Practical Interferometryand Fringe AnalysisSC211Course level: Intermediate

You’ve no doubt heard of interferometrictesting and all the wonderful things it can doto solve your measurement problems. Youmay have attended an introduction tointerferometry or been shopping for aninstrument. But how do you get started? Howdo you determine which type of interferometerwill solve your problem? Do you make yourown or buy a commercial instrument? Onceyou’ve got an instrument how can you be sureyou aligned it correctly and are getting thebest data you can for your measurementproblem?

This intermediate-level course offers anoverview of the fundamentals ofinterferometric testing and the analysis ofinterferometric fringe patterns applicable tomany different areas of interferometry, opticaltesting, nondestructive testing, and metrology.It is geared towards technically minded typeswho have had some exposure to the basics ofinterferometry and want to find out more aboutthe practical nuts and bolts of usinginterferometry as a tool. We will begin with anoverview of the basic fundamentals ofinterferometry including formation ofinterference fringes for different types ofsources, fringe visibility and how fringes relateto basic properties of the object being tested.We then will cover common interferometertypes and phase modulation techniques,essentials for creating, detecting and digitizingfringes, alignment and environmentalconsiderations and calibration.

Throughout this course real-world problemswill be used as examples. The second half ofthe class will focus on these same questionsfrom the aspect of fringe analysis techniques.We will outline the basic techniques and thenbrainstorm how you determine whether yougot good data and how you would begin if youwere analyzing your own raw fringe data.During this discussion common pitfalls andsources of errors will be pointed out to helpstreamline your process of getting up andrunning to take your own measurements.Attendees are encouraged to bring along theirreal-world problems and offer them as startingpoints for our discussion.

INTENDED AUDIENCEThis course is for engineers working withoptical interferometry, optical testing, surfacemetrology, experimental mechanics,nondestructive testing, and Moire gratingtechniques. It will be assumed that attendeeshave a basic knowledge of geometrical opticsand interferometry.

Modern OpticalTestingSC212 VT · CDCourse level: Intermediate

This course describes the basic interferometrytechniques used in the evaluation of opticalcomponents and optical systems. It discussesinterferogram interpretation, computeranalysis, and phase-shifting interferometry, aswell as various commonly used wavefront-measuring interferometers. The instructordescribes specialized techniques such astesting windows and prisms in transmission,90-degree prisms and corner cubes,measuring index inhomogeneity, and radius ofcurvature. Testing cylindrical and asphericsurfaces, determining the absolute shape offlats and spheres, and the use of infraredinterferometers for testing ground surfaces arealso discussed. The course also covers state-of-the-art direct phase measurementinterferometers.

INTENDED AUDIENCEEngineers and technical managers who areinvolved with the construction, analysis or useof optical systems will find this material useful.

Introduction toInterferometric OpticalTestingSC213Course level: Introductory

This course introduces the field ofinterferometric optical testing. Topics coveredinclude basic interferometers for opticaltesting, and concepts of phase-shiftinginterferometry including error analysis. Longwavelength interferometry, testing of asphericsurfaces, measurement of surfacemicrostructure, and the state-of-the-art ofdirect phase measurement interferometers arealso discussed.

INTENDED AUDIENCEEngineers, scientists, and managers who needto understand the basic concepts ofinterferometric optical testing.


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Advanced CompositeMaterials forOptomechanical SystemsSC218Course level: Intermediate


Materials: Properties andFabrication for StableOptical SystemsSC219Course level: Intermediate


Optical AlignmentMechanismsSC220Course level: Intermediate


Optomechanics andTolerancing of InstrumentsSC221Course level: Advanced


Integrated Opto-MechanicalAnalysisSC254Course level: Advanced


Thin Film OpticalCoatingsSC321Course level: Intermediate


Light Source ModelingSC345Course level: Advanced

The increasing power of illumination softwarehas accentuated the demand for creatingaccurate source models. This course is anoverview of source modeling techniquesranging from apodization of point sources toconstruction of sources using extendedemitters to apodization using multiple CCDcamera images. Emphasis is placed onincoherent sources including incandescent,halogen, fluorescent, high intensity discharge,and light emitting diodes. The use ofoptimization to fine tune source models isshown.

INTENDED AUDIENCEThe intended audience is scientists, engineersand those who want to know more about lightsource modeling.

Optical ManufacturingOverviewSC350Course level: Introductory

This course provides a basic understanding ofthe methodology and processes used in thefabrication of precision optical elements.Emphasis is placed on the selection and useof tooling, materials and equipment used inthe manufacturing process with specificexamples.

INTENDED AUDIENCEEngineers, technicians, and buyers whorequire an awareness of current opticalfabrication methodology as well as “leadtimes” associated with low volume production.

Fundamentals ofPhotochemicalContamination Control forLithographic ToolsSC355Course level: Introductory

This course is an overview of contaminationcontrol and discusses the issue of opticalperformance degradation as limited by theinteraction of the actinic radiation with traceambient vapors. This course draws from theUV/VUV space optics and lithographycommunity. Means to test and identifyincompatible materials, minimize the effects ofcontamination, and restore the performance ofcontaminated optics are covered.

INTENDED AUDIENCEThis course is intended for engineers whoseresponsibilities include design and/ormaintenance of lithographic exposure toolsand for photoresist chemists who wish tounderstand the issues of photoresistoutgassing and contamination in a broadercontext.

Course price includes the tutorial textFundamentals of Contamination Control (SPIEPress, 2000) by Alan Tribble.

The Design of Plastic OpticalSystemsSC384Course level: Introductory

This course provides attendees with theunderstanding of how and when plastic opticalsystems can be effectively used in products,and provides the optical engineer with designmethods for integrating plastic opticalcomponents into product designs. Coursetopics include description of themanufacturing processes, tool designfeatures, materials properties, design methodsunique to molded optical elements,manufacturing tolerances, coatings, testmethods, sources of manufacturing services,and examples of products that use opticalelements.

INTENDED AUDIENCEThis course is primarily directed to opticalengineers who have limited experience withprecision plastic molding processes and theunique design limitations associated withthese processes. It is also beneficial totechnical management staff who need tounderstand the advantages and limitations ofmolded plastic optical components.

Principles for MountingOptical ComponentsSC447 VT · CDCourse level: Intermediate



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Predicting, Modeling, andInterpreting Light Scatteredby SurfacesSC492Course level: Intermediate

The measurement of light scattered bysurfaces can be used to locate and identifyroughness, particulates, and defects on a widevariety of materials. Applications include theinspection of silicon wafers, optics, andstorage media, characterization of thin filmroughness, identification of objects in remotesensing, and prediction of optical systemperformance. The aim of this course is toprovide tools to engineers and scientists toenable them to predict scattering for differentsources, differentiate amongst differentscattering sources, and to designinstrumentation that maximizes sensitivity ordifferentiation amongst scattering sources fortheir specific application. Emphasis will beplaced on the use of the SCATMECH library ofscattering codes and the Modeled IntegratedScatter Tool (MIST) in order to minimize themathematics that can often be a barrier tothose who would otherwise be interested inusing optical scatter. The measurement ofscatter is emphasized in SC020 taught byJohn Stover.

INTENDED AUDIENCEThis course is intended for scientists andengineers who are interested in modeling,predicting, and interpreting light scatter fromsurfaces for material inspection, opticaldesign, or remote sensing applications.

Aspheric Optics: Design,Fabrication, and TestSC552 VT · CDCourse level: Introductory

This course will provide attendees with abroad and useful understanding of asphericsurfaces and components. Aspheric or non-spherical surfaces in a lens or mirror systemcan bring significant benefits to the opticalperformance. This is not without the liabilitiesof added cost, delivery time, and evenproducibility. The course will begin with lensdesign, and specifically how and when toincorporate aspherics into a variety of lensdesign forms. We discuss what aspherics willdo for a design, and also what they will not do.We then will discuss how aspheric surfacesare manufactured along withrecommendations on how to specifyaspherics. Several methods for predictingperformance for systems with asphereinduced wavefront irregularities will be shown.We also will discuss the testing of aspherics.

INTENDED AUDIENCEThis course is intended for anyone whodesigns optical systems. It will be of value tothose who either design their own optics orthose who work directly or indirectly withoptical designers, as you will now understandwhat is really going on with aspheric surfacesand how to ask the right questions of yourdesigners or fabricators.

COURSE PRICE INCLUDES the text OpticalSystem Design (SPIE Press, 2000) by RobertE. Fischer.

Exploring OpticalAberrationsSC560Course level: Intermediate

The quality of an optical system is determinedby its aberrations. This course will explore theeffect of aberrations on image quality. Startingwith basic aberrations of optical systems, wewill discuss how they affect central irradianceon a target, energy on a detector, and line ofsight and resolution of a system. Theimportance of the use of Zernike polynomialsin optical testing and design, spot diagrams inoptical system analysis, and Strehl ratio foraberration tolerance will be covered. Thechromatic aberrations will also be discussed.

INTENDED AUDIENCEThis course is intended for anyone interestedin acquiring a working knowledge ofaberrations. Those who have a background inlens and optical system design or opticaltesting will benefit from this course. Moreover,managers and system engineers will find thiscourse helpful in communicating effectivelywith optical engineers and designers.

COURSE PRICE INCLUDES the textsAberration Theory Made Simple and the two-volume set Optical Imaging and Aberrations(SPIE Press), both authored by the instructor.

Optomechanics for SpaceApplicationsSC561Course level: Introductory


Optical Phased Array Design& ImplementationSC649Course level: Intermediate

This course provides the attendee withknowledge of optical phased array technology,design, and implementation. Optical phasedarray technology will allow revolutionaryconformal apertures that steer optical systemswith no moving parts. This technology willrevolutionize laser communication, lasersensing, laser countermeasures, and laserweapons. In the longer term it will alsorevolutionize passive optical systems such ashyperspectral sensors. The course focuses onliquid crystal based approaches toimplementing one dimension at a time, spacefed, optical phased arrays. Methods ofextending the size of optical phased arraydevices through combining sub-apertures arealso discussed, as well as the potential forcombining optical phased arrays with RFphased arrays. Course notes will be provided.

INTENDED AUDIENCEThis course is intended for anyone wanting tolearn more about the design and use of non-mechanical approaches to beam steering.

Fundamentals ofFree-Space LaserCommunicationsSC656Course level: Introductory


Accurate Measurement ofLED Optical PropertiesSC657Course level: Intermediate



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Understanding ReflectiveOptical DesignSC659Course level: Intermediate

This course provides attendees with a basicworking knowledge of reflective opticalsystems. The course concentrates onanalytical differences from refractive systems,including basic 1st order layout considerationsand optimization techniques. It provides anoverview of the conceptual development ofvarious reflective designs, and provides anunderstanding of the basic capabilities,advantages and disadvantages of manycommon reflective forms.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to design or specify reflective opticalsystems, or who works with optical designerson a regular basis. A basic understanding of1st order optics is helpful; a brief overview willbe provided. No optical design experience isrequired, but a basic knowledge of opticalaberrations will be assumed for a few opticaldesign specific discussions. Those who haveeither little optical design experience or justminimal reflective design experience will findthis course especially valuable.

Geometrical OpticsSC690Course level: Introductory

This course will provide the attendee with afundamental understanding of optical systemdesign. While applicable to any type of opticalsystem, the course material is organizedaround the design, layout and specification ofoptical imaging systems. The course includestopics such as imaging with thin lenses andsystems of thin lenses, Gaussian and paraxialoptics, stops and pupils, radiative transfer, andillumination. Numerous examples of opticalsystems are described. A special emphasis isplaced on the practical aspects of the designof optical systems.

INTENDED AUDIENCEThis course is intended for anyone who needsto use or design optical systems. No previousknowledge of optics is assumed in thematerial development, and only basic math isused (algebra, geometry and trigonometry). Bythe end of the course, these techniques willallow the analysis of relatively sophisticatedoptical systems.

COURSE PRICE INCLUDES the text FieldGuide to Geometrical Optics (SPIE Press,2004) by John Greivenkamp.

Understanding Scratchand Dig SpecificationsSC700Course level: Introductory

Surface imperfection specifications (i.e.Scratch-Dig) are among the mostmisunderstood, misinterpreted, andambiguous of all optics componentspecifications. This course provides attendeeswith an understanding of the source ofambiguity in surface imperfectionspecifications, and provides the contextneeded to properly specify surfaceimperfections using a variety of specificationstandards, and to evaluate a given optic to aparticular level of surface imperfectionspecification. The course will focus on thedifferences and application of the Mil-PRF-13830, ISO 10110-7, and BSR/OP1.002. Manypractical and useful specification examples areincluded throughout, as well as a hands-ondemonstration on visual comparisonevaluation techniques.

INTENDED AUDIENCEThis material is intended for anyone whoneeds specify, quote, or evaluate optics forsurface imperfections. Those who eitherdesign their own optics or who are responsiblefor optics quality control will find this coursevaluable.

COURSE PRICE INCLUDES a copy of thelatest ANSI approved surface imperfectionsspecification standard.

Optics and OpticalQuality of theHuman EyeSC702Course level: Introductory

The eye has a complex and exquisitelydesigned optical system yet, when comparedwith modern optical systems, its image qualityis surprisingly poor. This course will discussthe optical properties of the differentcomponents of the eye from the cornea to theretina, and how they impact visual quality. Wewill evaluate benefits and limitations of varioustechniques, such as adaptive optics and laserrefractive surgery, which have been developedto overcome the eye’s optical limitations.Aberration limits will be presented so thatdesigners of optical systems, where the eyeoften plays an intrinsic role, can estimate thedegree of correction required for theirproducts to produce high quality perceivedimagery.

INTENDED AUDIENCEThe course is intended to impart practicalknowledge to optical design engineers orclinicians (ophthalmologists, refractivesurgeons, optometrists), but it will also be ofgeneral interest to anyone who is interested inlearning about the unique optical system ofthe eye.

Impact Of Variability On VLSICircuitsSC708Course level: Intermediate


Engineering Approachto Imaging SystemDesignSC713Course level: Intermediate

This course discusses the three popularapproaches to electro-optical imaging systemdesign: spatial resolution, sensitivity (signal-to-noise ratio), and modulation transfer function(MTF) analysis. While often evaluatedindividually, all three must be considered tooptimize system design. Usually, the dominantMTFs in machine vision devices are imagemotion (including random vibration of thesensor), optics (including aberrations), and thedetector. For man-in-the-loop operation, thedisplay and the eye are of concern and, inmany situations, these limit the overall systemperformance.

Equally important, but often neglected issampling; an inherent feature of all electronicimaging systems. Sampling, which createsblocky images are particularly bothersomewith periodic targets such as test targets andbar codes. An engineering approach is taken.This course will provide numerous practicaldesign examples (case studies) to illustrate theinterplay between subsystem MTFs,resolution, sensitivity, and sampling.

INTENDED AUDIENCEThe course is for managers, system designers,test engineers, machine vision specialists, andcamera users who want the best performancefrom their systems. It is helpful if the studentsare familiar with linear system theory (MTFanalysis).


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Cost-Conscious Tolerancingof Optical SystemsSC720Course level: Introductory

The purpose of this course is to presentconcepts and tools that will help attendeeseffectively lay out optimally produciblesystems. Topics in this course apply to allvolumes of systems being developed - fromsingle systems to millions of units. Subjectsinclude variability, relevant applied statistics,introduction to statistical process control,tolerancing methodology, and an introductionto design of experiments. The course includesreferences and examples to help practicingresearchers, designers, engineers, andtechnicians apply the concepts to plan,design, engineer, and build high-quality cost-competitive optical systems.

INTENDED AUDIENCEThis material is intended for managers,engineers, and technical staff involved inproduct design from concept throughmanufacturing.

Precision Machining ofOpticsSC721Course level: Intermediate

This course will provide the attendee with thefundamentals of single point diamond turning(SPDT) and its applications for manufacturingoptical elements and systems. Materialssuitable for the process (metals, crystals andplastics) will be discussed. The limits ofprecision of SPDT in terms of surface figure,finish and irregularity will be covered. Thecourse informs about alternative opticalconfigurations, not suitable for conventionalconstruction, such as monolithic collimatorsand “snap-together” opto-mechanicalassemblies. Included are several examplesdemonstrating how such elements andsystems are designed to fully take advantageof this manufacturing method.

INTENDED AUDIENCEThe presented material is intended forengineers, scientists and technicians whowant to be able to apply the SPDT technologyin their design. Project managers will gainknowledge of the process and can betterjudge the reasons for the designer’s choice.

Optical & Laser ScanningTechnology: Devices,Systems & ApplicationsSC725Course level: Introductory


Introduction to the OpticalSystem Engineeringof Remote SensingSystemsSC726Course level: Intermediate


OptomechanicalAnalysisSC781Course level: Advanced


Polarization in OpticalDesignSC792Course level: Intermediate

This course provides a survey of issuesassociated with calculating polarization effectsin optical systems using optical designprograms. Many optical systems arepolarization critical and require carefulattention to polarization issues. Such systemsinclude liquid crystal projectors, imaging withactive laser illumination, very high numericalaperture optical systems in microlithographyand data storage, DVD players, imaging intotissue and turbid media, optical coherencetomography, and interferometers.

Polarization effects are complex: retardancehas three degrees of freedom, diattenuation(partial polarization) has three degrees offreedom, and depolarization, the coupling ofpolarized into partially polarized light, has ninedegrees of freedom. Due to this complexity,polarization components and the polarizationperformance of optical systems are rarelycompletely specified.

The polarization aberrations introduced bythin films and uniaxial crystals can be readilyevaluated in several commercial optical designcodes. These routines are complex and mostoptical engineers are unfamiliar with thecapabilities and the forms of output. But thesepolarization ray tracing routines provide bettermethods to communicate polarizationperformance and specifications betweendifferent groups teamed on complex opticalproblems. Better means of technicalcommunication speed the development ofcomplex systems.

INTENDED AUDIENCEThis class is intended for optical engineers,scientists, and managers who need tounderstand and apply polarization concepts tooptical systems. Some prior exposure tooptical design programs and to linear algebrawould be helpful.

Interference MicroscopySC795Course level: Intermediate

We begin with a review of the principles ofinterferometry using language and visualsaccessible to a broad audience. A survey ofinstruments takes us from early Fizeauinterferometers to automated phase shiftingsystems and finally to vertically scannedwhite-light interferometers-presently the mostwidely used microscope for general-purposeprofiling. We then advance to modernprinciples of interference microscopy,including mathematical modeling, analysis ofcomplex surface structures, thin films anddynamic measurements.Armed with this background, we proceed toapplications, data interpretation andpresentation, supported by a gallery ofexamples including automotive parts, flatpanel displays, data storage and MEMSdevices, aspheric optics and semiconductorwafers.

INTENDED AUDIENCEThe intended audience includes R&Dscientists, process and quality controlengineers, and measurement specialists fromall applications areas requiring high-precision,high-resolution surface characterization. Thematerial ranges from basic to complex toprovide both an overview and reference forfurther study.


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Allowable Stresses in Glassand Engineering CeramicsSC796Course level: Intermediate

This course provides attendees with a basicunderstanding of the terminology and analysesused in a fracture mechanics approach todetermine the strength of glass, crystals, andceramics. The course focuses on thedetermination of inert strength based onsurface flaws, and reduction of such strengthof these materials in the presence of time andmoisture. Included are the effects of residualstress on lifetime, and basic reliabilitypredictions. Examples from the literature arepresented to bear out the theoretical designprinciples.

INTENDED AUDIENCEThis material is intended for structural,mechanical and optical engineers who wish toobtain an understanding of the principles ofstrength determination for opticalcomponents. Those who work with ground, air,or space-based systems will leave with a keenunderstanding of fracture mechanicsapplications without the need for complex andunwieldy computation.

Practical RadiometrySC798Course level: Introductory

This course will provide attendees with a basicworking knowledge of radiometric concepts.Radiometry deals with generation,propagation, modification, and detection ofradiation. It is based on the generation ofradiation in matter, propagation through apartially transmissive 3-dimensional space,and detection in matter. Many practical anduseful examples are included throughout.While the geometrical concepts employed inradiometry often imply detailed calculations,useful and reasonable approximations will beemphasized.

The following topics will be included:• Concepts of geometrical optics (ray, beam,

optical system, object and image similarity)• Generation of radiation: sources• Detection of radiation• Spatial extent of sources: point and

extended sources• Geometry of sources and detectors• Directional properties of sources and

detectors• Angle, projected angle, solid angle, and

projected solid angle• Spectral and radiative characteristics of

sources (power)• Spectral characteristics of sources and

detectors• Derived radiometric quantities and units:

radiance, exitance (emittance), incidence(irradiance), intensity

• Blackbody radiators and emissivity• Planck´s law, Wien´s law, Stefan-

Boltzmann´s law, and Kirchoff´s law• Stray light, and configuration factors• Two invariants of optical systems:

throughput (etendue) and radiance• Loss of information between plane 1 and

plane 2• Radiance at the sensor• Detected radiance

INTENDED AUDIENCEThis material is intended for anyone who needsto learn how radiation carries information frompoint 1 to point 2 and how the propagation in 3-D space may affect it. Those who either designtheir own optics or who work with opticaldesigners will find this course valuable. Onlyalgebra, geometry and basic trigonometry arerequired to appreciate the course contents.

Fundamentals andApplications of Slow LightSC820Course level: Intermediate


Basic Optics forNon-Optics PersonnelWS609 VT · DVDCourse level: Introductory

This course will provide the technical manager,sales engineering, marketing staff, or othernon-optics personnel with a basicunderstanding of the terms, specifications,and measurements used in optical technologyto facilitate effective communication withoptics professionals on a functional level.Topics to be covered include basic conceptssuch as interference, diffraction, polarizationand aberrations, definitions relating to colorand optical quality, and an overview of thebasic measures of optical performance suchas MTF and wavefront error. The material willbe presented with a minimal amount of math,rather emphasising working concepts,definitions, rules of thumb, and visualinterpretation of specifications. Specificapplications will include defining basic imagingneeds such as magnification and depth-of-field, understanding MTF curves andinterferograms, and interpreting radiometricterms.

INTENDED AUDIENCEThis course is intended for the non-opticalprofessional who needs to understand basicoptics and interface with optics professionals.


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Optomechanics

Structural Adhesives forOptical BondingSC015Course level: Intermediate

Optomechanical systems require securemounting of optical elements. This importantaspect of the design can cause a productionto stop if sound engineering is not applied. Awide variety of adhesives are discussed withrespect to their relevant properties. Designconsiderations, differing mounting techniques,production concerns, and reliability arereviewed. The instructor gives success andfailure case histories.

INTENDED AUDIENCEThis course is for engineers, managers, andtechnicians, this course provides a foundationfor the correct design for successful opticalmounting; an understanding of the bestoptions to employ for each application, andthe selection and approach conducive toproduction. A bound course outline isprovided including summaries of popularadhesives and their properties. Some adhesivesamples are available.

Advanced CompositeMaterials forOptomechanical SystemsSC218Course level: Intermediate

Advanced composite materials are being usedincreasingly in optomechanical systems,mirrors, machine components, metrology,photolithography, thermal management andelectronic packaging. Numerous and growingnumbers of polymer matrix-, metal matrix-,ceramic matrix- and carbon/carboncomposites provide dramatic improvements instiffness, strength, dimensional stability,thermal conductivity and corrosion resistanceover conventional materials of construction,and are considerably lighter. Low cost, net-shape manufacturing processes make many ofthese materials economically attractive.

INTENDED AUDIENCEThis course is designed for engineers,scientists and managers involved in designand manufacture of optomechanical and high-speed mechanical systems and thermalmanagement.

Introduction to OpticalAlignment TechniquesSC010 VT · CDCourse level: Introductory

This course discusses the equipment,techniques, tricks, and skills necessary toalign optical systems and devices. You learn toidentify errors in an optical system, and how toalign lens systems.

INTENDED AUDIENCEThis course is directed toward engineers andtechnicians needing basic practicalinformation and techniques to achievealignment of simple optical systems, as well asseemingly more complicated off-axis asphericmirrors. To benefit most from this course youwill need a basic knowledge of the elementaryproperties of lenses and optical systems (i.e.focal lengths, f/numbers, magnification, andother imaging properties) and a workingknowledge of simple interferometry. Somefamiliarity with the basic aberrations such asspherical aberration, coma, and astigmatismwill be helpful.

Introduction toOptomechanical DesignSC014 VT · DVDCourse level: Introductory

This course will provide the training needed forthe optical engineer to work with themechanical features of optical systems. Theemphasis is on providing techniques for rapidestimation of optical system performance.Subject matter includes material properties foroptomechanical design, kinematic design,athermalization techniques, window design,lens and mirror mounting.

INTENDED AUDIENCEEngineers who need to solve optomechanicaldesign problems. Optical designers will findthat the course will give insight into themechanical aspects of optical systems. Thecourse will also interest those managingprojects involving optomechanics. Shortcourse SC001, Optical System Design: LayoutPrinciples and Practice, or a firmunderstanding of its content, is required asbackground to this course.

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Courses at SPIE EventsLive instruction for Optomechanicswill take place at the SPIE Eventslisted below. Registration and courseinformation is available 12 weeksprior to the event dates.

Photonics West

Defense & Security

Optics & Photonics

Optics East

Optifab 2007






SPIE is an authorized providerof Continuing Education Units(CEUs) though ICAET—TheInternational Association ofContinuing Education andTraining. SPIE awards CEUs toparticipants who successfullyattend courses, and completeand return the evaluation formwithin 30 days of the coursepresentation. SPIE maintains arecord of all CEUs earned foreach participant for sevenyears.






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Materials: Properties andFabrication for StableOptical SystemsSC219Course level: Intermediate

This course describes materials and theirproperties for instrument and optical systems,emphasizing dimensional stability ofcomponents and covering issues such as UHVand cryo compatibility, options for mirrors,benches and other structures, andathermalization of both refractive and reflectivesystems. Optical materials such as glasses,beryllium and silicon carbide will be reviewed.Structural materials covered include:aluminum alloys, steels and invars, andcomposites. Fabrication methods will bedescribed for each material.

INTENDED AUDIENCEManagers, engineers, and technicians involvedin design of mirrors and selection of materialsand processes for mirrors and components inprecision instruments and optical systems.

Optical AlignmentMechanismsSC220Course level: Intermediate

This is a practical “how to” course dealing withthe design and fabrication of precision opticalalignment and adjustment devices. The courseuses example optical systems to identifytypical alignment requirements and provides acatalog of proven adjustment techniques.

INTENDED AUDIENCEThis course is intended to help the mechanicalor opto-mechanical design engineer identifyand characterize the degrees-of-freedomnecessary to align an optical system and toprovide him with a catalog of provenconfigurations. While the course primarilyaddresses small optics, the concepts apply tolarger systems as well. A general knowledge ofoptics is required; familiarity with opticalmeasurement and mounting techniques ishighly recommended.

Optomechanics andTolerancing of InstrumentsSC221Course level: Advanced

This course teaches mechanical engineers anddesigners how to identify and evaluate thefeatures in a mechanical design that maycontribute to image motion (registration errors)at the detector. Registration errors may causean otherwise sharp image to appear blurred(focusing error) and for even sharp images tobe in the wrong place (tracking error).Registration errors are controlled by theoptomechanical constraint equations thatrelate all the motions of all the elements in asystem to the position, orientation and size ofthe image at the detector. The students aretaught to develop the optomechanicalconstraint equations from the optical imaginglaws and to use them to specify alignmentrequirements, calculate thermal sensitivity anddistribute dimensional tolerances in opticalmetering structure.

INTENDED AUDIENCEThis course is intended for mechanicalengineers who conceive, design and analyzeoptical instruments. The results may be easilyused by anyone with a grasp of opticalimaging principles.

Integrated Opto-MechanicalAnalysisSC254Course level: Advanced

The purpose of this course is to present opto-mechanical modeling methods to design andanalyze high performance optical systems.The course emphasizes the application offinite element modeling techniques to opticalelements and support structures includingstatic, dynamic, thermal, and optimizationanalyses. The second emphasis is on theintegration of thermal, structural, and opticalmodeling tools. This latter emphasis allowsend-to-end optical performance predictionsover the service environment and leads tomore efficient and optimal designs by allowingmechanical design variables to be selectedbased on optical performance criteria. Inaddition, the effects of optical surfacedisplacements, temperature, and mechanicalstress on optical performance will bediscussed along with methods to predict LOSjitter and system wavefront error. The designand analysis of adaptive optical systems isalso presented. Examples will be drawn fromground-based, airborne, and spaceborneoptical systems.

INTENDED AUDIENCEThis course is intended for mechanical andoptical engineers involved in the design andanalysis of optical systems.

COURSE PRICE INCLUDES the textIntegrated Optomechanical Analysis (SPIEPress, 2002) by Keith Doyle, Victor Genberg,and Gregory Michels. The text includes anaccompanying CD-ROM with examples.

Principles for MountingOptical ComponentsSC447 VT · CDCourse level: Intermediate

This intermediate level, two-day coursereviews techniques commonly used to mountindividual and multiple lenses, windows,shells, optical filters, and prisms, as well assmall and large mirrors in optical instruments.Mounting means described include retainingrings, flanges, clamps, adhesives, sealingcompounds, and flexures. Many examples ofcomponent mountings in typical opticalinstrument applications are considered inorder to illustrate successful designconfigurations. Techniques for precisionalignment of individual lens elements and lensassemblies are summarized. Analyticaltechniques for estimating stress buildup withintypical optical components due to imposedmounting forces are discussed. The importantconsequences of changing materialsproperties, interface geometry, and partdimensions on these stresses are presented.The effects of temperature changes onmechanical forces and stresses in lens mountsalso are discussed.

INTENDED AUDIENCEParticipation in this course will help opticaland mechanical technicians, engineers,designers, scientists, project managers, andteam supervisors as well as individuals fromother technical disciplines learn how opticalcomponents can best be integrated intoinstruments, as well as learn techniques foranalyzing optomechanical designs, and waysto solve common design problems relating topackaging of optical systems and potentialstress buildup in optics due to mechanicalcauses.

COURSE PRICE INCLUDES the text MountingOptics in Optical Instruments, 3rd Edition, byPaul R. Yoder, Jr. (SPIE Press, 2005).

Optomechanics

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Optomechanics for SpaceApplicationsSC561Course level: Introductory

Optomechanics intended for flight applicationson satellite, rocket, or high altitude balloonpayloads have special design requirements inaddition to those necessary for earth-basedsystems. Space environment conditions suchas micro-gravity, vacuum, radiation,temperature gradients, and jitter imposespecial constraints on optomechanical design.Optics and their mounts must not only survivelaunch loads, but also meet mass andenvelope restrictions, maintain precisionalignment, and demonstrate long-termstability. Further, these systems must operateremotely once they arrive on-orbit and remainreliable throughout the life of the mission. Thiscourse reviews environmental conditions forcommon orbits, spacecraft, and launchvehicles and describes how they influenceoptomechanical design requirements. Theeffect of space conditions on materials iscovered in detail. Participants are providedwith tools necessary for selecting suitablestructural and optical materials, lubricants,and adhesives for flight design.Optomechanical principles appropriate forflight designs are reviewed and methods forresolving common design issues arepresented. Flight design examples related tocourse topics are covered in detail at the endof the day.

INTENDED AUDIENCEEngineers, scientists, managers andtechnicians interested in the special designparameters involved in specifying and/ordeveloping space-based instrumentation. Thecourse is intended to equip these participantswith a basic knowledge of the spaceenvironment and how it affectsoptomechanical design.

Prerequisite: SC014 Introduction toOptomechanical Design, by DanielVukobratovich, or equivalent knowledge ofoptomechanical principles.

OptomechanicalAnalysisSC781Course level: Advanced

This course teaches the basic requirements foraccurately predicting the influences of thermal,structural and servo system designs on theperformance and quality of optical imagingsystems. It is based upon the instructor’s fortyyears’ experience in designing, analyzing andbuilding complex optical systems, especiallyfor the Federal market place. It incorporateselements from some of his earlier tutorials,“Finite Element Methods in Optics,” “OpticalFlexures” and “Optomechanics and theTolerancing of Instruments.” The instructor willreview the goals of “Integrated Analysis” aspromoted by NASA and DoD since the early90’s. Strengths and weakness of variousapproaches will be discussed. Specialoptomechanical modeling tools (theOptomechanical Constraint Equations and theOptical Analog) will be presented in somedetail. Analytical error functions will bedeveloped and evaluated. Sources ofanalytical error will be discussed andanalyzed. Analytical error budgets will bedeveloped and compared for variousapproaches to end-to-end analysis ofsystems. A candidate strategy will bepresented for consideration.

The course will be illuminated with both textbook-type problems and actual examples ofapplication from the instructor’s experiences.Students will learn the strengths andweakness of the analytical methods in thevarious disciplines, how to estimate thesources and magnitudes of errors in variousapproaches to analysis, how to put togetheran error budget for a proposed analytical effortand how to select the most appropriatemethods for end-to-end system analysis.

INTENDED AUDIENCEOptics professionals (engineers, scientists,designers and managers) who are responsiblefor designing and building optical instruments.

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Electronic Imaging & Signal Processing

Design of EfficientIllumination SystemsSC011 VT · CDCourse level: Intermediate

Illumination systems are included in fiberilluminators, projectors, and lithographysystems. The design of an illumination systemrequires balancing uniformity, maximizing thecollection efficiency from the source, andminimizing the size of the optical package.These choices are examined for systems usinglightpipes, lens arrays, faceted optics, tailorededge rays designs, and integrating spheresthrough a combination of computersimulations, hardware demonstrations anddiscussions.

INTENDED AUDIENCEIndividuals who design illumination systems orneed to interface with those designers will findthis course appropriate. Previous exposure toOptical Fundamentals (Reflection, Refraction,Lenses, Reflectors) is expected.

Stereoscopic DisplayApplication IssuesSC060Course level: Intermediate

When correctly implemented, stereoscopic 3Ddisplays can provide significant benefits inmany areas, including endoscopy and othermedical imaging, teleoperated vehicles andtelemanipulators, CAD, molecular modeling,3D computer graphics, 3D visualization, photointerpretation, video-based training, andentertainment. This course conveys a concreteunderstanding of basic principles and pitfallsthat should be considered when setting upstereoscopic systems and producingstereoscopic content. The course willdemonstrate a range of stereoscopic hardwareand 3D imaging & display principles, outlinethe key issues in an ortho-stereoscopic videodisplay setup, and show 3D video from a widevariety of applied stereoscopic imagingsystems.

INTENDED AUDIENCEThis course is designed for engineers,scientists, and program managers who areusing, or considering using, stereoscopic 3Ddisplays in their applications. The solidbackground in stereoscopic systemfundamentals, along with many examples ofadvanced 3D display applications, makes thiscourse highly useful both for those who arenew to stereoscopic 3D and also for thosewho want to advance their currentunderstanding and utilization of stereoscopicsystems.

Applied Morphological andNonlinear Image AnalysisTechniquesSC063Course level: Advanced

This course is designed as a very practical andapplications-oriented overview ofmorphological image analysis. Morphologyrefers here to the study of shapes andstructures in images, using a rigorousmathematical framework that translates intoefficient and robust algorithms. Themethodology was originally designed forquantitative analysis of materials, but as newmorphological operations and methods wereinvented, morphology grew exponentially moreuseful in a wide range of application areas. It isnow recognized as an essential toolbox for avariety image analysis tasks, such assegmentation, feature extraction, tracking andmachine vision.

Starting from the basic concepts of erosionsand dilations, the course will gradually moveon to increasingly advanced and usefuloperations such as openings and closing,granulometries, skeletons, and watersheds.These tools - described in a manner that isboth intuitive and detailed - are shown to beincredibly useful for complex imagesegmentation and feature extraction tasks.Examples of application, taken from remotesensing, document image analysis, industrialinspection, material science, sonar and radardata analysis, biology, medical imaging, etc,will be used throughout the course to illustratethe concepts described. Practical issues ofalgorithm design, automatic parametercalibration, system robustness, and efficientimplementation will also be covered.

INTENDED AUDIENCEThis tutorial is intended for anyone (engineer,academic, student, etc.) with concrete imageanalysis needs, or simply wishing to learnabout recent advanced image analysistechniques. It will be especially useful todesigners and developers of algorithms forfast and robust image analysis systems. Thiscourse is a practical, problem-solving orientedcourse, therefore no particular background isrequired. Some basic notions of imageanalysis and morphology could be anadvantage, but are not essential.

Courses at SPIE EventsLive instruction for ElectronicImaging & Signal Processing willtake place at the SPIE Events listedbelow. Registration and courseinformation is available 12 weeksprior to the event dates.

Photonics West

Electronic Imaging

Medical Imaging

Defense & Security

Optics & Photonics

Optics East














Use of CCD and CMOSSensors in VisibleImaging ApplicationsSC068 VT · DVDCourse level: Introductory

This course will describe the imagingcapabilities of visible sensors and illustratetheir use with examples as varied as satelliteimaging and commercial color scanningapplications. The methodology for configuringand specifying a visible imaging system will bedescribed, including the role of charge-coupled device (CCD), and complementarymetal-oxide-silicon (CMOS) focal planetechnologies.

INTENDED AUDIENCEEngineers, scientists, and managers who areinterested in utilizing CCD, CMOS or CIDsensors in advanced camera and imagingapplications.

Effective Color ComputingSC075Course level: Advanced

This course will provide an overview of thecolor concepts used in the computer worldtoday, illustrated with practical examples andcomputer demonstrations. It translatestheoretical color concepts into practicalknowledge useful to the application developer.The course is structured in three parts: colorperception (trichromatic color vision,metamerism, color generation), color analysis(clustering and segmentation), and colorreproduction (device dependent color,halftoning, gamut mapping, colormanagement). Computer animation is used forillustration of color spaces, 3D histograms,devices gamut, and gamut mapping.Halftoning examples are presented for severalscreening methods (stochastic screening,several error diffusion variants, pulse densitymodulation and mixed techniques). Colormanagement system architecture is discussedand the ICC profile specifications for accuratecolor reproduction are explained.

INTENDED AUDIENCEEngineers, scientists, and managers involvedin designing color applications or functions tosolve effectively color problems in computerapplications will benefit from this course.Participants should have some familiarity withcolor imaging and computer systems.

SAR Signal ProcessingSC162Course level: Intermediate


Fundamentals ofDigital Signal/ImageProcessingSC197Course level: Intermediate

This course covers: fundamental concepts ofdigital signal processing (DSP) systems suchas analog to digital converter (A/D), aliasing,scalar and vector quantization, and coding;point spread function (PSF) of imagingsystems; modulation transfer function (MTF);circularly symmetric imaging systems;techniques used for analyzing DSP basedsystems such as convolution, frequencyresponse, MTF measurement, etc.; DiscreteFourier Transform (DFT), Fast FourierTransform (FFT) algorithms, fast convolutionand correlation; design of 1-D and 2-D digitalFIR filters; sampling rate conversion; spectralestimation; adaptive signal processing withapplications to deconvolution, systemidentification, and noise removal; adaptivearrays and beamforming; signal detection andestimation techniques; software for simulatingsome of the component blocks will beprovided by the instructor.

INTENDED AUDIENCEThis course is planned for practicing engineersand scientists who work with programmedequipments and software that involve DSPelements as well as managers who overseetechnical groups working on DSP basedproducts. The course is appropriate for peopleworking in biology and biomedicalengineering.

Digital Mammography andComputer-Aided DiagnosisSC356Course level: Advanced

The term Digital Mammography refers to thetechnology that is used for the electroniccapture and display of x-ray images of thebreast. In this process, film is not essential butit may be used as a recording medium forviewing and storing digital mammographicimages. The various digital mammographictechnologies are reviewed with emphasis ondetector design and acquisition approach.These technologies include flat paneldetectors using amorphous silicon detectorarrays with a scintillator, flat panel amorphous

selenium, stimulable phosphors, and slotscanning techniques using charge-coupleddevices. Recent progress on advancedapplications, such as tomographic and 3-Dimaging of the breast, is presented. Theinterpretation of breast images can benefitfrom computer technology with advances inCAD. Computer-aided diagnosis (CAD) can bedefined as a diagnosis made by a radiologistwho uses the output from a computerizedanalysis of medical images as a secondopinion in detecting lesions and in makingdiagnostic decisions. The final diagnosis ismade by the radiologist. Rationale,computerized image analysis methods, andevaluation of performance of multi-modalityCAD in the detection, diagnosis, and riskassessment of breast cancer will be reviewed.

INTENDED AUDIENCEEngineers, physicists, physicians, biomedicalscientists and managers who need an updateon the state-of-the-art in digitalmammography.

Principles andAdvancements in X-rayComputed TomographySC471Course level: Introductory

This course will present a description of thefundamental physics and mathematicalprinciples of CT. Key system performanceparameters and design tradeoffs are reviewed.Causes and corrections of various imageartifacts are extensively discussed. Potentialimpact of image artifacts and performanceparameters on other computer-basedalgorithms, such as CAD and 3D volumerendering, is outlined. The second part of thetutorial will focus on the recent technologyadvancements in CT. Basic principles,benefits, and inherent issues associated withthe helical (spiral) CT, multi-slice CT, andvolumetric CT will be described. Differentreconstruction approaches to combat artifactsassociated with cone beam and helicalinterpolation are examined. The tutorial willconclude with a discussion on the recentadvancements in CT applications, such ascardiac imaging, perfusion, dual energy, andfluoroscopy.

INTENDED AUDIENCEEngineers, physicists, biomedical scientists,radiologists, and managers who need tounderstand the fundamentals and the state-of-the-art of CT. No special knowledge on CT isrequired, although basic knowledge of x-rayphysics and Fourier transform is a plus.

COURSE PRICE INCLUDES the textComputed Tomography: Principles, Design,Artifacts, and Recent Advances (SPIE Press,2003) by Jiang Hsieh.


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Neural NetworksApplications in ImageProcessingSC491Course level: Introductory

This course provides a broad introduction tothe basic concepts of artificial neural networksand its applications in image processing. Alarge number of neural network architecturesand their training algorithms are reviewed.Examples of neural networks architecturesthat are covered in this course are single layerperceptrons, multilayer perceptrons, time-delay neural networks, Kohonen feature maps,learning vector quantization, radial basisfunction and Hopfield neural networks. Anintroduction to support vector machine andlearning theory is provided. Applications thatare covered are object and patternrecognition, object inspection, classifiers,handwritten word and digit recognition,automatic target recognition, and imagecompression.

INTENDED AUDIENCEThis course is intended for managers,engineers, computer scientists, and graduatestudents who are interested in disciplines,such as signal and image processing andoptics. Engineers and scientists interested inacquiring the basic technical knowledge inneural networks and its applications in vision.

Color Considerations forLiquid Crystal DisplaysSC516Course level: Intermediate

This tutorial discusses and illustrates the mostimportant factors of color rendering in thin-filmtransistor liquid crystal displays (TFT-LCD).Factors such as technology, luminance/brightness, color gamut, gain function, whitepoint, gray tracking, response time, colormodel, and color dependency on the viewingangle are discussed. Several TFT-LCDtechnologies such as twisted nematic (TN), in-plane switching (IPS, Super-IPS), and fringefield switching (FFS) are covered. Theimportance of color management (includingcalibration and ICC characterization) foraccurate color control is explained and theanalytical/empirical color models arecompared. The influence of viewing conditionsand adaptation in the evaluation of thedisplayed color is highlighted. The role ofmeasurement and interpretation of data(including gamut visualization and comparison)is demonstrated.

INTENDED AUDIENCEThis tutorial is intended for engineers,scientists, and managers confronting colorissues in TFT-LCDs.

Color Imaging with VisibleImage SensorsSC528Course level: Intermediate

This course describes the principles, keytechnologies, and applications of colorimaging using visible image sensors (CCD,CMOS). It briefly overviews the theory ofhuman color perception; discusses therelevant television-based standards whichapply to broadcast color video signals;discuss the evolution of color CCD and CMOScamera architectures and associated analogand digital signal processing techniquesincluding those used to process color-filterarray video signals; overview imagertechnology basics for digital still cameraapplications, and review the MPEGcompression standard for High DefinitionTelevision.

INTENDED AUDIENCEEngineers, scientists and managers who areinterested in color imaging and non-broadcastmulticolor imaging applications will benefitfrom this class.

Image Based MotionAnalysisSC536Course level: Introductory

Image based motion analysis is a keytechnology that can be used to analyze missileflight performance, aircraft stores separation,aircraft safety and crash worthiness, ejectionseat dynamics, artillery and small armsprojectile performance and scoring, andexplosive projectile distribution and velocity.Other applications include biological motionanalysis and automotive crash test analysis.Imagery may be visible (standard or highspeed), IR, or digitized film. This coursedescribes techniques for extractingquantitative information from a time sequenceof imagery. The primary focus is on positionversus time of multiple objects, but intensity,separation distances, velocities, shape, angleof attack, and other features can bedetermined as well. The course covers basicsingle camera motion analysis, multiplecamera three-dimensional motion analysis,rigid body 6 Degree Of Freedom analysis, andthe use of non-image data (such as mountpointing data) to provide additional informationduring analysis. The course also provides abasic understanding of the image formationsequence from target radiance to imagepixels, in order to understand how variouseffects in the image formation process mayaffect the final motion analysis results, andhow these effects can be compensated forduring analysis.

INTENDED AUDIENCEThis course is intended for people who acquireor analyze time sequences of imagery toobtain quantitative information concerning thetime evolution of objects. In particular,photographers, analysts, and engineers willfind this course useful in providing anunderstanding of the types of information thatcan be extracted from a sequence of imagery,techniques for extracting the information, andrequirements in image and associated datacollection to enable good quantitativeinformation extraction.

Medical Image Analysis withITK and Related Open-Source SoftwareSC538Course level: Intermediate

This course introduces attendees to selectopen-source efforts in the field of medicalimage analysis. Opportunities for users anddevelopers are presented. The courseparticularly focuses on the open-sourceInsight Toolkit (ITK) for medical imagesegmentation and registration. The coursedescribes the procedure for downloading andinstalling the toolkit and covers the use of itsdata representation and filtering classes.Attendees are shown how ITK can be used intheir research, rapid prototyping, andapplication development.COURSE SCHEDULE:Luis Ibanez, Kitware Inc.1) The Insight Software Consortium:

contributing and using open-source2) The architecture and installation of the

Insight ToolkitJosh Cates, Univ. of Utah1) Segmentation methods of the Insight

ToolkitLydia Ng, Allen Brain Institute1) Registration methods of the Insight ToolkitJulien Jomier, CADDLab, Univ of North

Carolina1) Image IO using the Insight Toolkit2) The Image-Guided Surgery Toolkit:

architecture overviewBill Lorensen, GE Research1) Using the Insight Toolkit with TK/TCL2) Applications of the Insight Toolkit

INTENDED AUDIENCEThis course is intended for anyone involved inmedical image analysis. In particular it targetsgraduate students, researchers andprofessionals in the areas of computer scienceand medicine. Attendees should have anintermediate level on object orientedprogramming with C++ and must be familiarwith the basics of medical image processingand analysis.



COURSE PRICE INCLUDES a CD with thesource code of the Insight Toolkit, theexamples presented in the course and the fulltext of the written material. Course attendeesare welcome and encouraged to bring theirpersonal notebook computers to the event. ACD-ROM with interactive examples will bedistributed during the course in order to runand modify exercises based on ITK.

Video Compression:Standards and TrendsSC589 VTCourse level: Intermediate

The MPEG family of standards is ubiquitous inalmost all applications involving digital motionsequences. Examples include VCD, DVD,digital camcorders, digital still cameras withvideo mode, HDTV, and satellite television.This course is an introduction to the basicconcepts as well as the functionalities of theMPEG family of standards, namely, MPEG1,MPEG2, MPEG4-2, and MPEG4-10, akaH.264 or JVT. It includes a comprehensivedescription of the technical aspects, scope,performance, and differentiating factors ofthese standards. Special emphasis is placedon H.264 due to its novel features and itsimportance in enabling many newapplications. Numerous image and videoexamples complement the technicaldescriptions.

INTENDED AUDIENCEScientists, engineers, managers, and productplanners who need to understand thecapabilities of state-of-the art videocompression techniques and standards willbenefit from this course. No prior imagecompression knowledge or experience isassumed. Although not essential, some basicmathematical skills would help with fullunderstanding of some of the concepts.

Advanced Digital Image andVideo EnhancementAlgorithmsSC590Course level: Advanced

This course discusses some of the advancedalgorithms in the field of digital image andvideo processing. In particular, it familiarizesthe audience with the understanding, design,and implementation of advanced algorithmsused in contrast enhancement, sharpening,noise reduction, and artifact removal in stillimages and video. Some of the applicationsinclude medical imaging, entertainmentimaging, digital cameras and camcorders,digital photofinishing, professionalphotography, forensic imaging, andastronomical imaging. Numerous imageexamples and live demonstrationscomplement the technical descriptions.

INTENDED AUDIENCEScientists, engineers, and managers who needto understand and/or apply the techniquesused in digital image and video processing invarious products in a diverse set ofapplications such as medical imaging,professional and consumer imaging, forensicimaging, etc. will benefit from this course.Some prior knowledge of basic digital imagingconcepts such as image histogram and digitalfiltering would be helpful.

Introduction to SensorNetworksSC640Course level: Introductory


Challenges in Imaging forData, Evidence & NationalSecuritySC658Course level: Introductory

Imaging, the use of photographic techniques,has become an important tool for scientificdata, legal evidence, and national security.Every phase of the photographic processalters the information carried within the image.In a time when image manipulation hasbecome commonplace, it is a challenge tomake an image record information that isscientifically and legally defensible. Thiscourse will explore the technical issues ofimaging where accuracy, validity, andcredibility are the key issues. This is a systemsurvey, touching on all aspects of the processfor both film and digital technologies includingsubject, lighting, camera, image analysis, andarchiving. An overview of techniques forchoosing and adjusting equipment appropriatefor given tasks will be given. We will cover thevisualization and recording of diverse subjectsranging from microscopic biological samplesand crime scenes to issues in surveillance,reconnaissance, ordinance evaluation andtarget designation. Finally, we will discuss thechallenges and techniques involved inestablishing a chain of evidence essential fordefensible information.

INTENDED AUDIENCEThis course is for scientists, engineers,investigators & technicians interested inphotographic techniques for recordingtechnical information, scientific data and legalevidence. Participants should have somefamiliarity with basic photography.

Applied Image ProcessingSC661Course level: Intermediate

This course presents both fundamental andadvanced concepts useful in different aspectsof optical, digital, biomedical and multimediaimage processing. It is aimed at peopleinterested in learning practical applications ofimage processing techniques for solvingbiomedical image modeling and recognition,video image segmentation, feature extraction,statistical modeling and automatic targetrecognition (ATR) problems. This course willreview fundamentals of image processing andrecent progress in image segmentation,modeling and feature extraction. Qualitativeinsight into the mathematical operationsperformed by image processing functions willbe provided.

INTENDED AUDIENCEScientists, engineers and managers interestedin a fundamental and/or advanced exposition ofimage processing techniques and applications.

Applied Model-Based SignalProcessingSC663Course level: Intermediate

This short course provides the participants withthe basic concepts of model-based signalprocessing using an applied approach. Thecourse is designed to take the participant frombasic probability and random processes tostochastic model development through theheart of physics-based stochastic modeling—the Gauss-Markov state-space model.Estimation basics will be discussed includingmaximum likelihood and maximum a-posterioriestimators. The state-space model-basedprocessor (MBP) or equivalently Kalman filterwill be investigated theoretically in order todevelop an intuition for constructing successfulMBP designs using the “minimum errorvariance approach”. Practical aspects of theMBP will be developed to provide a reasonableapproach for design and analysis. Overall MBPDesign Methodology will be discussed.Extensions of the MBP follow for a variety ofcases included prediction, colored noise,identification, linearized and nonlinear filteringusing the extended Kalman filter. Applicationsand case studies will be discussed throughoutthe lectures including the tracking problemalong with an application suite MBP problems.Practical aspects of MBP design usingSSPACK_PC, a third party toolbox in MATLAB,will be discussed for “tuning” and processingalong with some actual data.

In summary, this course not only provides theparticipants with the essential theory underlyingmodel-based signal processing techniques, butapplied design and analysis.



INTENDED AUDIENCEThe student is assumed to have basicknowledge in linear systems, probability andrandom processes. Only a brief overview ofthese subjects will be presented.

COURSE PRICE INCLUDES the text SignalProcessing: The Model-Based Approach byJames Candy.

Fundamental Principles andStatistical Analysis ofMagnetic ResonanceImagingSC701Course level: Intermediate

The first half of the course will provide anintroduction to the basic principles ofmagnetic resonance imaging (MRI). Thefundamentals of nuclear magnetism will firstbe described, followed by mechanisms ofrelaxation and image contrast. Then, principlesof spatial encoding and the concept of k-space will be discussed, in conjunction withan investigation of the basic MRI pulsesequences. The sources of noise and commonimage artifacts observed in MRI will also beexamined, with a discussion on means fortheir reduction.

The second half of the course will describestatistics of MRI based on its physical imagingprinciples and mathematical imagereconstruction procedures. Intrinsic statisticsof MR data (bulk magnetizations, MR signals,and k-space samples) will be introduced first.Then, a set of statistical properties of MRimages (pixels, regions, and images) will bediscussed. The proved stochastic imagemodels for MR image, the model-based imageanalysis methodologies and their performanceevaluation will be presented.

INTENDED AUDIENCEThis course is intended for engineers,physicists, biomedical scientists, radiologists,managers as well as Ph.D. students andpostdoctoral fellows desiring to understandthe fundamentals of MRI physics, MR imagingstatistics, and their applications in MR imageanalysis.

Image Guided Proceduresand Computer AidedSurgerySC704Course level: Introductory

This tutorial will cover the basic technicalbackground in the field of image guidedprocedures and computer aided surgery. Thetutorial will begin with an overview of theclinical issues with a focus on minimally

invasive techniques in interventional radiology.The basic technology components such asimage acquisition devices, localizers,registration techniques, and display methodswill be discussed. A historical overviewincluding some of the early work in the fieldwill be presented. Case studies will also bediscussed with a focus on the use ofelectromagnetic tracking for image-guidedabdominal interventions. A summary ofresearch issues and directions for futureresearch will also be given.

INTENDED AUDIENCEThis material is intended for anyone who isinterested in the field or for persons who wantan overview of this topic. Some familiarity withmedical imaging devices is helpful, but notrequired.

Energy-Constrained SensorNetworks, Aeroacoustics,and Distributed SignalProcessingSC712Course level: Intermediate


Engineering Approachto Imaging SystemDesignSC713Course level: Intermediate


From FFTs to Waveletsfor Image & SignalProcessingSC714Course level: Introductory

Wavelets and conventional filter banks havebecome popular because of their convenientrepresentation and ability to isolatecharacteristic elements of an input in acompact subband form, often for thepurposes of analysis, efficient processing, andcompression. Directional filter banks aredecompositions of the same ilk but with theadditional advantage of allowing directionalinformation to be extracted. Recent researchin this area has focused on perceptuallyrelevant feature extraction, curve and shapecharacterizations, orientation selectiveprocessing, and efficient analysis-reconstruction. Directional decompositions arenow receiving a great deal of attention forimage processing applications. This four-hourcourse presents the fundamentals of

directional filter banks and wavelets (in the first2 hours) and in the remaining time discussestheir application in several important imageprocessing areas including object detectionand tracking in image and video data, imageenhancement, and compression. History fromFFTs evolving to treat non-stationary signalprocessing such as second order Time-Frequency joint representation instantaneousfrequency representation and recently to thefirst order linear wavelet representation will bebriefly reviewed.

INTENDED AUDIENCEEngineers, applied mathematician, scientists,and technical managers seeking to understandthis new technology and its implications inimage analysis and processing will benefitfrom this course. Some prior background inFourier domain concepts is helpful.

Independent ComponentAnalysis and Beyond: BlindSignal Processing and itsApplicationsSC715Course level: Intermediate

Blind Signal Processing (BSP) is an emergingarea of research and technology with solidtheoretical foundations and many potentialapplications. The problems of separating orextracting of the source signals from sensorarrays, without knowledge of the transmissionchannel characteristics and the real sourcescan be expressed briefly as a number of blindsource separation (BSS) or related generalizedcomponent analysis (GCA) methods:Independent Component Analysis (ICA) (andits extensions), Sparse Component Analysis(SCA), Sparse Principal Component Analysis(SPCA), Non-negative Matrix Factorization(NMF), Time-Frequency Component Analyzer(TFCA) and Multichannel Blind Deconvolution(MBD).

BSP is not limited to ICA or BSS. With BSPwe aim to discover and validate principles orlaws which govern relationships betweeninputs (hidden components) and outputs(observations) when the information about thepropagation Multi-Input Multi-Output (MIMO)system and its inputs are limited or hindered.BSP incorporates many problems, like blindidentification of channels of unknown systemsor a problem of suitable decomposition ofsignals into basic latent (hidden) componentswhich do not necessary represent true sourcesbut rather some of their features or sub-components. This four-hour course presentsthe fundamentals of blind signal processing,especially blind source separation andextraction, and in the remaining timediscusses their applications in severalimportant signal processing areas includingestimation of sources, novel enhancement,denoising, artifact removal, filtering, detection,classification of multi-sensory signals anddata, especially in biomedical applications andBrain Computer Interface (BCI)


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INTENDED AUDIENCEEngineers, applied mathematicians, scientists,and technical managers seeking to understandthis new emerging technology for extraction,enhancement, decomposition, filtering anddenoising of hidden source signals orcomponents from superimposed, andoverlapped multi-sensory signals or images orextract hidden information frommultidimensional data. Some prior backgroundin signal processing, mathematics, statisticsconcepts would be very helpful.

COURSE PRICE INCLUDES the extendededition of Adaptive Blind Signal and ImageProcessing (Wiley, 2002) by Andrzej Cichokiand Shun-ichi Amari, and the softwarepackage ICALAB in MATLAB.

3D Visualization Techniquesfor Laser RadarSC717Course level: Introductory


3D TV and DisplaySC737Course level: Introductory

3-dimensional imaging is believed to be thenext generation imaging technology, which willeventually replace the current plane image. Inspite of the fact that the first stereoscopicviewing device was introduced on 1838, thelack of supporting technologies such as highresolution display devices, high speedelectronics, high resolution viewing zoneforming optics and high speed imageprocessing deterred further development in 3-D imaging for a long time. However, the recentprogress in high resolution and high densityflat panel display devices as well as PCtechnology have enabled the construction of anumber of multiview 3-D imaging systems.This one-day course is intended for those whohave an interest in 3-D imaging. Recentprogress in 3-D imaging technologies and theirperspectives will be presented, the theoreticalbackground behind various 3-D imagingsystems will be covered in-depth andfundamental limits imposed on the 3-Dimaging process will be explained.

INTENDED AUDIENCEThis course is intended for engineers,physicists, computer vision specialists,managers and others who are interested inlearning about 3-D image generation,processing and display as well as applying 3-D imaging methods and systems to theirresearch.

Basic Testing andCalibration of DigitalImagersSC745Course level: Introductory

The course is aimed at providing anunderstanding of basic performance testing ofimage acquisition for digital cameras andscanners, in both consumer and technicalapplications. The assembly of basic elements,optics, detector, supporting electronics andimage processing, are described. We thenidentify several key imaging performancemetrics for such systems, and testingmethods consistent with ISO standards. Howthe standard methods are applied to severaltypes of image acquisition systems and fieldconditions will be explained using results fromactual measurements. It is common to applycompensation for practical performancelimitations either in the device or supportingdriver software. We describe and demonstrateseveral approaches to this for; spatialdistortion, white-point balance, resolution andsharpness, scene uniformity, and detectorfixed-pattern noise, and pixel defects.Attendees should then be prepared for othercourses on, e.g., Color Management,understanding sources of performancevariation.

INTENDED AUDIENCEThis course is intended for technical users ofdigital imaging systems, and those responsiblefor selecting components of such systems. Nobackground in imaging performanceevaluation or image processing will beassumed, although some familiarity with thebasic technology of imaging systems, andimage editing will be helpful.

The Image Pipeline and HowIt Influences QualityMeasurements Based onExisting ISO StandardsSC753Course level: Intermediate

When a digital image is captured using adigital still camera, DSC, it needs to beprocessed. For consumer cameras thisprocessing is done within the camera andcovers various steps like dark currentsubtraction, flare compensation, shading andcolor compensation, demosaicing, whitebalancing, tonal and color correction,sharpening, and compression. All of thesesteps have a significant influence on imagequality so it is important to know how imagequality can be measured and whatstandardized methods exist.

The course provides the basic methods foreach step of the imaging pipeline. While werun several images through a sample pipelinewe will alter the algorithms to discover thevisual differences and the differences in themeasured values using the various testmethods. This helps to understand theprocess and provides a lot of information onhow to increase the over all image quality. Thecourse topics include basic review of theimage processing pipeline; explanation of thedifferent steps and their basic algorithms;practical image processing using sampleimages and software; introduction to imagequality analysis; discussion on test scenes andvisual image analysis; measurement ofdifferent image quality aspects like OECF,Dynamic Range, Noise, Resolution, ColorReproduction; explanation of the available freeand commercial software; and demonstrationof illuminator, test chart, and software basedmeasurements.

INTENDED AUDIENCEAnyone evaluating the image quality of digitalcameras and scanners will benefit fromparticipation. Technical staffs ofmanufacturers, as well as journalists andstudents studying image technology areamong the intended audience. The instructorsassume participants are familiar with thebasics of digital photography and have someexperience in using a computer.

Human Shape PerceptionSC754Course level: Introductory



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CCD Technology/DigitalPhotographic SystemsTechnologySC760Course level: Intermediate

In the past, the quality of a picture taken, forinstance by a DSC, was determined to a largeextent by the quality of the lens and of theimage sensor, but digital-signal-processingpower has made a lot of progress over the lastyear. The understanding of the physics behindthe various defects and limitations of thecomponents that make up a DSC has alsogrown rapidly. The combination of these twofactors allows many defects in a DSC to becorrected. Along the road from photons IN todigital numbers OUT, the signal can passthrough several calculation and correctioncycles to improve the quality of the end result.This course will study the main artifacts thatare introduced by the lens and the imagesensor, and show how they can be correctedor compensated. Examples are lens vignetting,white balance, color sampling, non-ideal colorfilters, temporal noise, fixed-pattern noise,dead pixels, dark current, etc. Applicationscan range from consumer cameras (mobileimaging, DSC, cam-corders, etc.) toprofessional or scientific applications (medical,broadcast, astronomy, metrology, etc.). Allartifacts and correction algorithms will bedemonstrated by means of images. A basicunderstanding of the working principles ofimage sensors will be reviewed very briefly inthe class.

INTENDED AUDIENCEScientists, engineers, and managers who wantand need to understand or apply the theory ofimage processing in a digital camera willbenefit from the class.

Novel Spatially AdaptiveAnisotropic LocalApproximation Techniques inImage ProcessingSC761Course level: Intermediate

This half-day course presents a practical andapplication oriented overview of noveladvanced image processing algorithms. Brieflythe idea is as follows: the concept of adaptivelocal polynomial approximation (LPA) has beendeveloped to deal with anisotropic signals.This type of method searches for a largestlocal star-shaped neighborhood where LPA fitswell to data. It is typically applied in a point-wise manner and defines a nonlinear varyingscale (window size and shape) adaptive filter.This adaptation is based on recent adaptive

estimation results that have been obtained inmathematical statistics. Local versions of thelocal maximum/quasi likelihood are used fornon-Gaussian models. Special algorithmshave been designed for photon-limitedimaging based on the Poisson distribution ofdata. Overall, the techniques covered in thecourse belong to the general class of nonlinearspatially adaptive filters and they demonstratestate-of-art performance and on manyoccasions visually and quantitativelyoutperform the best methods currently in use.A wide scope of imaging problems isconsidered: denoising Gaussian and non-Gaussian images, non-blind deblurring, blindmultichannel deblurring, super-resolutionimaging, denoising poissonian signals,multiresolution imaging, edge detection, colorimaging, etc. The algorithms are implementedin Matlab codes and based on efficientfrequency domain calculations.

INTENDED AUDIENCEScientists, researchers, engineers, studentsinterested in advanced algorithms for imageand signal processing. The mathematicalcomplexity is at level of college seniors andfirst-year graduate students, who have basicknowledge in mathematical analysis, vectors,matrices, probability and statistics. No priorknowledge or experience in the subject isassumed.

Device Simulation for ImageQuality EvaluationSC762Course level: Intermediate

This course will use Matlab simulations tomodel and evaluate the effects of imagingsystems components on the final imagequality. The course will introduce models tosimulate the scene, optics, sensor, processor,display, and human observer. Simulatedcamera images will be used to visualize howchanges in specific system componentsinfluence the perceived quality of the finaloutput. Image quality metrics, such as SNR,MTF, and S-CIELAB will be used to quantifythese effects. New metrics, such as theminimum photometric exposure, will beintroduced. Course examples will includedemonstrations of the effects that scenedynamic range, sensor pixel size, demosaicingand color balancing algorithms, display pixelstructure, gamma, and gamut have uponperceived image quality.

INTENDED AUDIENCEThis tutorial is intended for engineers who aredesigning optics, sensors, processingalgorithms, or displays for digital cameras andcell phone imagers.

Subband/Wavelet ScalableVideo CodingSC763Course level: Intermediate

The class of video coders using 3-D subband/wavelet transforms along the motion trajectoryhas received a lot of interest lately. These non-hybrid or stateless video coders can be highlyscalable in bitrate, resolution, and frame rate,and hence are very attractive forimplementation on heterogeneous networks.These interframe subband/wavelet codersrequire a highly accurate local motion fieldthough, and the question of motion vectorscalability naturally arises. In this tutorial, wetry to illustrate some of the new issues byusing the motion-compensated video coderMC-EZBC as a concrete example. Wecompare results of scalable MC-EZBC tothose of the non-scalable H.264 coder, as wellas the new scalable video coder currentlybeing developed by MPEG. We also raise thedifficult issue of comparison of scalablecoders at lower frame rates and resolutions,where they generally have different naturalreferences, and propose a cross-checkmethod. We cover the different architecturesof current interframe subband/wavelet videocoders and present their advantages anddisadvantages. We also present results fromwired network video simulation and also in-network data adaptation (scaling) for this classof imbedded video coders. The short courseendeavors to bring the attendees knowledgein basic image and video coding up to date onrecent developments in this exciting field.

INTENDED AUDIENCEEngineers, researchers, managers, andstudents in video compression, networkedvideo, wireless video, and multimedia softwareand hardware will benefit from this course.Prerequisites are a familiarity with signalprocessing and basic image/videocompression.



Filter Banks and Wavelets:Design and Use inPerceptual CodingSC764Course level: Intermediate

The increasing use of digital media drives ademand for higher quality coding at lower bit-rates, for instance for images, video, andsound. Possible applications are for the nextgeneration wireless networks, like UMTS,3GPP, 3GPP2, WLAN, and DSL. The problemis how to obtain good compression with littleperceived distortion. The bit-rate determinesthe total distortion. How can the distortion behidden or masked for the ear or eye? To reachthis goal of obtaining high-quality compressionat lower bit-rates, perceptual coding is used.Perceptual coding uses models of perception,i.e. models of the sensitivity of the eye forimage and video coding, and models ofhearing for audio coding. To apply thesemodels in coding, a decomposition of thesignal into subbands is useful. This subbanddecomposition is obtained with filter banks,block transforms (DCT), or wavelet transforms,all of which have widespread use in perceptualaudio and video coding. An important factor intheir success is the ease of includingperceptual properties in the coding process,either explicitly or implicitly.

This course will describe their properties,classes, and design methods, and show howthey are used in audio and video codingapplications. Topics covered include filterbanks/wavelets/block transforms, psycho-physical models and effects for coding,psycho-acoustic models, psycho-visualeffects, application examples, basicstructures, and applications of psycho-physical effects.

INTENDED AUDIENCEThose are interested in signal processing andperceptual coding applications, designers ofsoftware, and researchers will benefit from thiscourse. The instructor assumes a basicknowledge of digital signal processing.

The Biology, Physics, andMetrology of ColorPerceptionSC765Course level: Intermediate

This course covers the history of mankind’sunderstanding of light and color from thetheories of the ancient Greeks to quantumelectrodynamics, the evolutionary history ofthe eye, animal vision, and the structure andfunction of the human eye. The history ofspectrophotometry and colorimetry is alsocovered. The course concludes with aphilosophical discussion of the relationshipbetween subjective perception and objectivereality.

INTENDED AUDIENCEThis short course is intended for students withsome physics and chemistry background andwho work with color measurement systems.

Information Processing forVideo SurveillanceSC766Course level: Intermediate

The purpose of this course is to give a broadview of the many aspects of video surveillance.In particular, we will review state-of-the-art invideo surveillance, as well as discuss the latestdevelopments and future trends. From atechnical point of view, the course will addressseveral important areas which are relevant in avideo surveillance system, including videoanalysis, video coding, security, transmission,and video database management. Besides thetechnical aspects, the course will also addresssocietal issues and legal aspects.

INTENDED AUDIENCEScientists, engineers, graduate students, andstrategy and product planners who need tounderstand all the aspects of state-of-the-art invideo surveillance applications and its futuretrends will benefit from this course. Basic imageand video processing knowledge or experienceis assumed, along with some basicmathematical skills, for full understanding of allthe concepts exposed.

Optoacoustic Systems forMedical Imaging: FromPrinciples to ClinicalApplicationsSC768Course level: Intermediate

This course provides attendees with a basicworking knowledge of systems that combineoptical illumination and acoustic detection forimaging in the depth of tissue with high-contrastand high resolution, a feature not attainable byeither optical or acoustic technologies appliedseparately. The course gives a brief butsufficient background of the basic principles, sothat the advantages and advanced features ofoptoacoustic technologies can be readilyunderstood. Practical and useful examples areincluded throughout the course. You willbecome familiar with the main principles,designs and applications of the optoacousticimaging in one, two and three dimensions.

INTENDED AUDIENCEThis material is intended for students,researchers and engineers working in the area ofbiomedical diagnostics, medical physics andmedical imaging.

COURSE PRICE INCLUDES copies of two bookchapters by the instructor for reading asadditional materials.

Monte Carlo Simulation ofRadiation Imaging SystemsSC771Course level: Intermediate

Increases in available computational resourcesallow today’s researchers to use moreaccurate and more precise simulation tools todesign and optimize medical imaging systemsin silico. Monte Carlo methods are among themost powerful tools for simulating imagingsystems in the computer. The results of MonteCarlo simulations are exact - except forinherent statistical uncertainties - whenaccurate models of interaction cross-sectionsare employed. In addition, the conceptualsimplicity of the Monte Carlo method andprograms allows us to simulate multiplestochastic processes in complex geometriessuch as detailed and realistic anatomicalmodels, structured phosphor screens, andmultiple-layer detector pixel arrays.

This course covers state-of-the-art MonteCarlo simulation methods for medical x-rayimaging systems, and is organized in a 4-module lecture (morning session) followed bya separate, optional hands-on workshop(WS815). The codes and accessory programsdescribed during the course will be madeavailable to participants.LECTURE OUTLINE1) Fundamental Monte Carlo conceptsincluding sampling probability distributionfunctions, random number generators,scattering cross-sections, uncertaintyestimation, bias and efficiency, and variancereduction methods.2) Particle transport methods for x-ray andgamma photons, electrons and positrons inPENELOPE, including physics models,geometry descriptors, variance reductiontechniques, and benchmarking results.3) Introduction to MANTIS (a combined x-ray/electron/optical Monte Carlo imaging systemsimulation) including optical transportmethods, statistics and models of scintillationoutput, and applications to indirect x-raydetectors with columnar phosphors and multi-modality imaging simulation.4) Introduction to XSPECT and the use ofMonte Carlo methods for determining detectorsignal, detector noise, radiation dose, and x-ray spectra in cascaded models of imagingsystems.

INTENDED AUDIENCEEngineers, scientists, students engaged inbiomedical engineering and imaging researchwho have an interest in designing oroptimizing radiation imaging systems viacomputer modeling.



X-ray microCT (MicroComputed Tomography)SC794Course level: Introductory


Introduction to Statistics forImagingSC804Course level: Introductory

The purpose of this course is to review thefundamental statistical methods in the contextof imaging applications. The attendee willlearn the tools and how to apply themcorrectly in a given context. The instructor willclarify many misconceptions associated withusing statistical methods. The course is full ofpractical and useful examples of analyses ofimaging data, and the instructor willemphasize intuitive and geometricunderstanding of the introduced concepts.The topics covered include hypothesis testing,confidence intervals, regression methods, andstatistical signal processing (and itsrelationship to linear models).

INTENDED AUDIENCEParticipants who need a review of fundamentalstatistical methods for their work with imagingdata. Participants are expected to have someexperience with analyzing data.

Principles of MultivariateStatistics for ImagingSC805Course level: Intermediate

In this course, you will learn the basic tools forthe analysis of data on many variables (suchas data on many spectral bands or on severalresponses observed in an experiment). Youwill identify the benefits of incorporatinginformation from several variables as opposedto analyzing each variable separately. Throughunderstanding the principles behind thestatistical tools, you will be able to decidewhen these tools should or should not be usedin practice. Many practical and usefulexamples of analyses of imaging data areincluded. The instructor will emphasizeintuitive and geometric understanding of theintroduced concepts. The topics coveredinclude multivariate descriptive statistics,statistical (Mahalanobis) distance, multivariatenormal (Gaussian) distribution, multivariateconfidence intervals, confidence regions, andprincipal component analysis (PCA).

INTENDED AUDIENCEThis course is intended for participants whowant to gain better insight into theirmultivariate data. Students are expected tohave a basic knowledge of vector and matrixalgebra, as well as some basic univariatestatistics. The related course, SC804Introduction to Statistics for Imaging, is not aprerequisite, but is suggested for those whohave not been using statistics for a while.

Advanced MultivariateStatistics for ImagingSC806Course level: Advanced

In this course, attendees will learn some of themore advanced tools for the analysis ofmultivariate data. The topics covered includecanonical correlation analysis, discriminationand classification (supervised learning), Fisherdiscrimination, independent componentanalysis (ICA), and a new method ofnonnegative PCA. These tools are being usedmore frequently in a wide range of imagingapplications, so it is important for a user toknow how and in what context they should beused. The instructor will emphasize intuitiveand geometric understanding of theintroduced concepts and will also explain therelationships among these methods, clarifyingmisconceptions about them. All methods willbe discussed in the context of practical anduseful examples of imaging data.

INTENDED AUDIENCEParticipants who already have someexperience with analysis of multivariate databut need to learn about the more advancedstatistical tools will benefit from this class.Participants are expected to have someknowledge of linear algebra and PCA. Arelated course, SC805 Principles ofMultivariate Statistics for Imaging, is not aprerequisite, but is suggested for those whowould like to gain a broader perspective on awider range of multivariate methods.

Document Analysis onMobile DevicesSC808Course level: Introductory

The increasing availability of high-performance, low-priced, portable digitalimaging devices has created a tremendousopportunity for supplementing traditionalscanning for document image acquisition.Digital cameras attached to cellular phones,PDAs, or wearable computers, and standaloneimage or video devices are highly mobile andeasy to use. These devices can captureimages of thick books, historical manuscriptstoo fragile to touch, and text in scenes,making them much more versatile thandesktop scanners. Robust solutions to the

analysis of documents captured with suchdevices are becoming available, creatingdemand in multiple domains. Traditionalscanner-based document analysis techniquesprovide us with a good reference and startingpoint, but they cannot be used directly oncamera-captured images. Camera-capturedimages can suffer from low resolution, blur,and perspective distortion, as well as complexlayout and interaction of the content andbackground. This course will highlight thestate of the art including a survey ofapplication domains, technical challenges, andsolutions for the analysis of documentscaptured by digital cameras.

We will begin by describing typical imagingdevices and the imaging process, then discussdocument analysis from a single camera-captured image, as well as multiple framesand highlight some sample applications underdevelopment, and feasible ideas for futuredevelopment.

Course topics include imaging process;mobile imaging devices including capabilities,differences between scanner and cameracaptured document images; enhancement -rectification, lighting, document mosaicing,processing of images on the device, and othersymbologies; 1D and barcodes; applications;and market analysis and businessopportunities.

INTENDED AUDIENCEStudents considering research on mobiledevices; researchers interested in exploringtopics related to the processing of cameracaptured documents; companies consideringadapting camera analysis for theirapplications; and others who want afundamental understanding of the state-of-the-art in camera-based document analysis.The instructor assumes an interest inDocument Image Analysis and a desire tolearn about processing on mobile devices, aswell as basic understanding of imageprocessing.

Real-Time Image and VideoProcessingSC809Course level: Intermediate

The course provides a much-neededtreatment on the implementation aspects ofreal-time image and video processingsystems. It brings together in one place theguidelines, strategies, and methodologies fortaking an image or video processing algorithmfrom a research environment to a working,real-time implementation on a resourceconstrained hardware platform. Carefullyselected, relevant examples from the literaturewill be presented to illustrate the concepts.The participants will be introduced to a widevariety of strategies and tools which they canthen employ in designing a real-time image orvideo processing system of interest.



This course is based on a new book,authored by the presenters, entitled Real-TimeImage and Video Processing: From Researchto Reality. Its content consists of the followingfive parts: introductory concepts to real-timeimage and video processing; algorithmicapproaches (algorithm simplificationstrategies); hardware platforms (hardwarearchitectures for image and video processing);software tools (software optimizationstrategies); and roadmap.

INTENDED AUDIENCEEngineers and scientists interested in takingan image or video processing algorithm from adevelopment environment to an actual real-time implementation on a resourceconstrained hardware platform. Those whowish to pursue a career in image or videoprocessing and designers of image/videoprocessing systems and products. Theinstructors assume a basic knowledge ofimage processing and some background inelectrical engineering.

Digital Still Camera ImagingSystem: The UnderlyingTechnologiesSC810Course level: Intermediate

Digital still cameras, DSCs, have nowsupplanted conventional, photographic stillcameras as first choice for an imaging systemby consumers and most professionalphotographers. This course is designed totake the attendee through the digital imagingchain (DIC), step-by-step, and provide a clearunderstanding of the technologies thatsupport each of the DIC. Once all aspects ofthe DSC’s technologies have been covered, asystem analysis will be presented that allowsthe user to “build” a digital imaging system tomeet a desired need, such as a consumercamera, a professional camera or some otherwell-defined use. In addition to the above, areview of color halftone technology will bepresented to better understand how ink jetprinters or electro-photographic printers canrender images. The need for imagecompression will be studied and the basicconcepts of JPEG compression will beoutlined. A brief review of color theory will beprovided to give the basis for how to analyzethe color reproduction of DSCs.

The course topics will follow the digitalimaging chain starting with a review of digitalimaging systems relative to a film basedimaging system. The mathematical basis ofdigital imaging will be reviewed includingconcepts like Fourier Transforms, CosineTransforms, Hadamard Transforms, andconvolution. Digital imaging optics will becovered including diffraction limited lenses,optical-pre filters to control aliasing, thin filminterference on sensors and the use micro-lenses. The basic physics of sensors andimaging technologies will be presented along

with sensor architectures (including FrameTransfer and Interline Transfer CCDs, CMOSsensors and the new Foveon type buriedphoto-diode sensors), and sensor“Photographic Speed.” The fundamentals ofsampling and aliasing in monochrome imagingsystems will be presented along with theimpact of optical pre-filters, sampling andaliasing when CFAs are used to encode colorimages on the overall image quality andintroduction of artifacts. Other topics includedin the course are interpolation methods usedto de-mosaic CFA encoded color images,image enhancement techniques (enhancedsharpness and noise reduction, systemanalysis), how to define a DSC to meet aspecified need, color reproduction for DSCsincluding white balancing and color correction,digital halftone technology, and compressionfor DSCs, such as JPEG.

INTENDED AUDIENCEEngineers, scientists, managers, students,intellectual property and patent attorneys ,andgovernment laboratory personnel who wish tohave a solid overview, pursue a career indigital imaging, and/or gain a morefundamental understanding of DSC systems.Some understanding of calculus andtransform systems, as well as somebackground in physics or electricalengineering is assumed.

Color Appearance ModelingUsing CIECAM02SC811Course level: Intermediate

This course begins with a review of colorappearance phenomena and the basics ofcolor appearance modeling, includingchromatic adaptation, color attributecorrelates, and other topics. The course thenfocuses specifically on the CIECAM02 colorappearance model and its applications.Publicly available software and tools will beused to demonstrate and explore the model.Specific applications such as gamut renderingand quantification, device characterization,and interpolation will be considered, as willmodel parameters and configuration. Finallyadvantages and trade-offs of using the modelwill be considered.

INTENDED AUDIENCEBroadly applicable to those researchers anddevelopers working in the area of colorappearance and color reproduction, thecourse will include examples and discussionbased on an open source implementation ofCIECAM02 so attendees with some softwareknowledge will be able to make immediate useof the topics covered. An emphasis of thiscourse is solving specific problems withCIECAM02. Attendees will benefit fromprevious familiarity with colorimetry and thebasics of color science.

Perceptual Metrics for ImageQuality EvaluationSC812Course level: Intermediate

In the content of the course, we will examineobjective criteria for the evaluation of imagequality that are based on models of visualperception. Our primary emphasis will be onimage fidelity, i.e., how close an image is to agiven original or reference image, but we willalso discuss no-reference and limited-reference metrics. Our main focus will be onimage and video compression andtransmission. We will consider realisticdistortions that arise from compression anderror concealment in transmission over lossycannels. We will also examine both near-threshold perceptual metrics, which explicitlyaccount for human visual system (HVS)sensitivity to noise by estimating thresholdsabove which the distortion is just-noticeable,and supra-threshold metrics, which attempt toquantify visible distortions encountered in highcompression applications or when there arelosses due to channel conditions. We willconsider structural similarity metrics, whichmodel perception implicitly by taking intoaccount the fact that the HVS is adapted forextracting structural information from images,and are thus insensitive to distortions (such asspatial and intensity shifts, contrast and scalechanges) that do not change the structure ofan image. Finally, we will present a unifiedframework for perceptual and structuralsimilarity metrics.

INTENDED AUDIENCEImage and video compression specialists whowish to gain an understanding of howperformance can be quantified; engineers andscientists who wish to learn about objectiveimage and video quality evaluation; managerswho wish to gain a solid overview of imageand video quality evaluation; students whowish to pursue a career in digital imageprocessing; intellectual property and patentattorneys who wish to gain a morefundamental understanding of quality metricsand the underlying technologies; andgovernment laboratory personnel who work inimaging.

The instructors will assume a basicunderstanding of image compressionalgorithms and a background in digital signalprocessing and basic statistics: frequency-based representations, filtering, anddistributions.



MPEG Family of VideoCompression StandardsSC813Course level: Intermediate

The MPEG family of standards is ubiquitous inalmost all applications involving digital motionsequences. Examples include VCD, DVD,digital camcorders, digital still cameras withvideo mode, HDTV, and satellite television.This course is an introduction to the basicconcepts, as well as the functionalities of theMPEG family of standards, namely, MPEG1,MPEG2, MPEG4-2 (aka MPEG4 Visual), andMPEG4-10 (aka H.264, AVC or JVT). Itincludes a comprehensive description of thetechnical aspects, scope, performance, anddifferentiating factors of these standards.Special emphasis is placed on H.264 due toits novel features and its importance inenabling many new applications. Numerousimage and video examples complement thetechnical descriptions.

INTENDED AUDIENCEScientists, engineers, managers, and productplanners who need to understand thecapabilities of state-of-the art videocompression techniques and standards willbenefit from this course. No prior imagecompression knowledge or experience isassumed. Although not essential, some basicmathematical skills will help with a fullunderstanding of some of the concepts.

Image Processing,Understanding, and theAnalysis of Master Drawingsand PaintingsSC814Course level: Intermediate


Multimedia and Security: AnIntroduction toCryptography, DigitalWatermarking, MediaForensics, and Biometricsand How Things GoTogetherSC816Course level: Introductory


Holographic Techniques forAdvanced Photonic SystemsSC821Course level: Introductory

This course provides a working knowledge ofcurrent techniques in holography that providenew capabilities for medical imaging, opticaldata storage, and optical communications.In this course the basic principles of analogand digital holographic recording processesare described. Coupled wave and ray analysistools for evaluating hologram performance aredeveloped. An overview of new photopolymerrecording materials for analog recording andimportant characteristics of digital cameras fordigital recording are presented. Afterdeveloping tools for analyzing holographictechniques they are applied to medicalimaging in biological tissue samples, spectral/spatial imaging, optical data storage, andfilters for wavelength division multiplexing andcode division multiple accesscommunications.

INTENDED AUDIENCEEngineers, scientists and managers who wantto develop an understanding of holographictechniques and their application in modernphotonic systems.

Diffuse Light Transport inTissue and DiffuseTomography Reconstructionusing MATLABSC824Course level: Introductory

This course teaches how to model lightpropagation with finite element programming,utilizing the easy-to-use style of MATLAB. TheNIRFAST shareware software packagedeveloped at Dartmouth College (freelydistributed for academic research) is used asthe backbone to start modeling within the firstfew minutes of the course. The softwareincorporates image reconstruction algorithmswhich work for most diffuse tomographyapplications, and geometries. The class willreview the basic physics of the approach, stepthrough how the software works, and thevisualization capabilities of the package will beexplored for a number of geometries. Imagereconstruction from multispectral data isdemonstrated and image reconstruction fromluminescent sources is also demonstrated.

INTENDED AUDIENCEThis material is intended for biomedicalengineers and medical physicists interested inmedical applications of diffusive imagingapplications or interested in learning moreabout MATLAB and finite element modeling.Prior experience with MATLAB is beneficial.

Imaging PerformanceEvaluation for DigitalCameras, Cell-phoneCameras and ScannersSC825Course level: Intermediate

This is an updated theory-to-practice courseon imaging performance measurementmethods for digital image capture devices andsystems. We focus on science-based standardISO measurement protocols* for tone-transfer,speed, resolution, noise, dynamic range, andcolor. Using actual measurements wedemonstrate how standard methods can beadapted to measure capture devices andevaluate vendor compliance for variouscapture systems. Because practical metrologyand field application can limit measurementprecision and accuracy, we will identify waysto maintain measurement utility in thepresence of error sources. ISO-compliantexecutable software will be provided anddemonstrated. In addition, several availablealternative methods and analysis software willbe explained and compared.*(ISO 12233, 16067-1, 16067-2, 15529, 15739,21550, and 17321)

INTENDED AUDIENCEAlthough technical in content, this course isintended for a wide audience; imagescientists, quality engineers and otherscharged with evaluating or modeling digitalcamera and scanner performance. Nobackground in imaging performance (MTF,etc.) evaluation will be assumed, althoughsome familiarity with basic concepts ofimaging systems and measurement error willbe useful.



Defense & Security

An Introduction toCryptography and DigitalWatermarking withApplications to MultimediaSystems and ForensicsSC084Course level: Advanced

This course will present an overview of recentwork in modern encryption techniques andrecent advances in image, video, audiowatermarking, and forensic methods formultimedia data. The course will describeblock cipher systems (e.g. DES and AES) andpublic key systems (e.g. RSA) along withauthentication techniques. The course will alsodescribe digital watermarking techniques thatinclude both spatial, spectral, and temporalwatermarking algorithms. Particular emphasiswill be placed on how encryption andwatermarking can be used in the context ofthe protection of imaging, video, andmultimedia systems. The unique nature ofthese new technologies relative to intellectualproperty rights will be presented.

INTENDED AUDIENCEThis course is intended for engineers andscientists working in the imaging and/ormultimedia fields who are interested in thearea of data security. Students should have anundergraduate degree in science orengineering.

Optical DesignFundamentals forInfrared SystemsSC134 VT · DVDCourse level: Intermediate

This course will provide practical and directlyapplicable design and evaluation guidelines forthe initial optical layout phase of IR systems.Simple but powerful expressions will bedeveloped and presented as approximationsto predict quickly expected systemperformance. In addition to conventionalrefractive and reflective optical componentsand systems, applications of diffractive(binary) optics for the infrared spectrum will bediscussed. Since single point diamond turningis a very effective method for producing IRcomponents such as aspheres and diffractiveelements, as well as classical and modernreflective systems, details and practical hintswill be presented for consideration in thedesign phase of IR systems.

INTENDED AUDIENCEEngineers, scientists and technicians whoneed to be able to apply the basic knowledgeof optical design. Also included in the intendedaudience are managers who need tounderstand the principle of lens design. Thefabrication aspect of diamond turning IRcomponents will be of interest to designers aswell as manufacturing personnel.

COURSE PRICE INCLUDES the textbookOptical Design Fundamentals for InfraredSystems (SPIE Press, 2001) by Max Riedl.

Adaptive OpticsSC135Course level: Introductory

Adaptive optics are used to improve imageryand the transmission of optical signals bysensing a wavefront disturbance and using theinformation for real-time control of an activeoptical element such as a deformable mirror.This course covers the basic principles ofadaptive optics with emphasis on improvingimage resolution by atmospheric turbulencecompensation.

INTENDED AUDIENCEThis course is intended for engineers,scientists, technicians, and students tounderstand the basic principles andapplications of adaptive optics and to makebasic performance predictions.

COURSE PRICE INCLUDES the textIntroduction to Adaptive Optics (SPIE Press,2000) by Robert Tyson.

Multi-Sensor, Multi-SourceInformation Fusion:Architectures, Algorithms,and ApplicationsSC149Course level: Advanced

This introductory course offers the currentview of multi-sensor, and multi-sourceinformation fusion architectures, algorithms,and applications. The architectures and theassociated algorithms are described. Thesedevelopments are illustrated with applicationsfrom real experience and the latest publishedliterature. These applications span defense,industrial, bio-medical, and other civiliansituations. This course discusses fusion atfeature and decision levels since these are lessdirectly driven by sensor and applicationspecific considerations and appeal to a broadaudience with differing interests.

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Courses at SPIE EventsLive instruction for Defense &Security will take place at the SPIEEvents listed below. Registration andcourse information is available 12weeks prior to the event dates.

Photonics West

Defense & Security

Optics & Photonics

Optics East














INTENDED AUDIENCEDefense, civilian, and industrial engineers,scientists and managers involved in the designand development of automated intelligentdecision systems in multi-sensor, multi-sourcedata environments will find this courseinformative. Some background in decisiontheory and related topics would be helpful butnot critical.

Infrared Focal Plane ArraysSC152Course level: Introductory

The course presents a fundamentalunderstanding of two-dimensional arraysapplied to detecting the infrared spectrum.The physics and electronics associated with 2-D infrared detection are stressed with specialemphasis on the hybrid architecture unique totwo-dimensional infrared arrays.

INTENDED AUDIENCEThis material is intended for engineers,scientists and project managers who need tolearn more about two-dimensional IR arraysfrom a user’s point of view. It gives the studentinsight into the optical detection process, aswell as what is available to applicationengineers, advantages, characteristics andperformance.

Fundamentals of AutomaticTarget RecognitionSC158 VTCourse level: Intermediate

This course is an overview of ATR systems,architecture, and components. First, itdescribes the basic components of an ATRsystem: preprocessing, target detection,segmentation, feature extraction, tracking, andclassifications. Then conventional statisticalpattern recognition approaches and otheradvanced concepts such as: multi-sensorsystems, model-based, adaptive and neuralnet, and other artificial intelligence techniquesare described. Finally, we discuss evaluationtechniques of ATR systems.

INTENDED AUDIENCEThis course is for engineers entering the fieldor currently working in ATR, managers andmarketing personnel, and program managers.

SAR Signal ProcessingSC162Course level: Intermediate

This course presents a signal theoryframework for understanding the functionalproperties of a Synthetic Aperture Radar (SAR)signal, the requirements and algorithms for itsdigital signal processing. The emphasis is ondeveloping principles that are applicable inboth stripmap and spotlight SAR systems forpractical radar signals in the HF to Ka band.Applications in reconnaissance with ultra-wideband foliage-penetrating UHF-band SARand X-band SAR systems are discussed.

INTENDED AUDIENCEThis course is intended for engineers withinterest in radar imaging, array processing,and applications of multidimensional digitalsignal processing.

COURSE PRICE INCLUDES the text SyntheticAperture Radar Signal Processing withMATLAB Algorithms (Wiley, 1999) by MehrdadSoumekh.

Dynamic Infrared SceneProjectionSC164 VTCourse level: Advanced

Dynamic infrared scene projection isdeveloping rapidly, driven by the need tosimulate imaging infrared systems againstcomplex real-time scenes generated in either aclosed-loop or open-loop environment.Applications include simulated operation ofimaging infrared missile seekers, search andtrack systems, thermal imagers and FLIRs, re-entry vehicle trackers, threat warners andinfrared fuzes. This course provides apresentation of the status of dynamic infraredscene projection that with a background ininfrared imaging technology is designed forusers of real-time infrared projection systems.

INTENDED AUDIENCEThis course is intended for scientists,engineers and technologists interested inunderstanding the status and prospects of thisdeveloping field. The course also providescoverage of issues relevant to imaging infraredtest and evaluation systems. An understandingof the basic principles of optical and imaginginfrared technology is assumed.

Introduction toLaser RadarSC167 VT · DVDCourse level: Intermediate

This course explains the principles ofoperation and the basis of laser radarsystems. An analytical approach to theevaluation of system performance ispresented. This approach is derived fromphysical optics and from classical antennatheory. Practical applications for laser radarand alternative system architectures aredescribed. Major system components areidentified.

INTENDED AUDIENCEThis material is intended for engineers,managers, scientists, and students to becomefamiliar with laser radar or to evaluate theperformance of laser radar systems.

Advanced Coherent LaserRadars Design andApplicationsSC168Course level: Advanced

This course identifies the procedures and therequirements for a comprehensive coherentlaser radar design. Using a detailedexamination of the design process for military,industrial and medical applications, the coursecovers system level requirements as applied todiversified applications, development, andallocation for the major subsystems.Candidate system designs, optimization,making compromises and component optionsare presented. Heterodyne and homodynedetection systems, transmitter modulationtechniques and compatible formats areemphasized. System architectures, subsystemapproaches and component options arecompared. Machine vision, 3-D imagingsystems, unmanned vehicle sensors,atmospheric sensing, chemical detection,visualization of structures of industrial andbiomedical objects and evaluation of theiroptical parameters are used to illustrate thedesign techniques.

INTENDED AUDIENCEThis material is intended for engineers,scientists and students to further understandthe practical applications and limitations oflaser radar. Previous experience with radarand optical systems is recommended.

Defense & Security

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training, anytime.


Multispectral ImageProcessingSC174 VTCourse level: Advanced

Multispectral imagery contains a wealth ofinformation beyond panchromatic imagery.This course describes and evaluates computerprocessing techniques used to extractinformation from multispectral imagery. Theemphasis is on earth remote sensing, but thetechniques discussed apply to anymultispectral imagery.

INTENDED AUDIENCEThis course is for engineers and scientists whoneed an introduction to multi/hyperspectralimagery and technical knowledge of computeralgorithms for processing multi/hyperspectraldata. A BS degree in physical science orengineering is a prerequisite. Prior experiencewith computer image processing is highlyrecommended.

COURSE PRICE INCLUDES the text RemoteSensing—Models and Methods for ImageProcessing, Second Edition (Academic Press,1997) by Robert Schowengerdt.

Laser Beam Propagation forApplications in LaserCommunications, LaserRadar, and Active ImagingSC188Course level: Intermediate

This course describes beam wave propagationthrough optical turbulence. Satellitecommunication systems, laser radar, remotesensing, and adaptive optics are some of theapplications affected by optical turbulence.Tractable analytic equations are provided forcalculating Gaussian-beam wave statisticalquantities affecting system performance. Themutual coherence function (MCF), meanintensity, degree of coherence, and intensityfluctuations (scintillation) are presented.Videos of actual experiments show how togather data. Examples are presented usingMATHEMATICA software programs. Copies ofthese programs are available in the text.

INTENDED AUDIENCEThis course is intended for scientists,supervising and design engineers who areinterested in understanding the propagationphenomena, which impose limitations onsystem performance, and in learning newapproaches to improving system design.

COURSE PRICE INCLUDES the texts LaserBeam Propagation through Random Media(SPIE Press, 1998) by Ronald Phillips andLarry Andrews and the Field Guide toAtmospheric Optics (SPIE Press, 2004) byLarry C. Andrews.

Image Recognition UsingStatistical FilteringTechniques, Wavelets andNeural NetworksSC189Course level: Intermediate

Image processing and recognition is one ofthe important applications of informationsystems. This course is aimed at peopleinterested to learn practical applications ofimage processing techniques applied to real-time applications including biomedical imageprocessing and image recognition problems.This course will review fundamentals of digitalimage processing, imaging systems, imagerecognition, statistical filtering for imageprocessing, fundamentals of wavelettransforms for image processing,fundamentals of neural networks for imageprocessing, and recent advances in imagerecognition techniques. The course willpresent examples on applications of thesetechniques in real-time pattern recognition,target tracking, classification, and real-timebiometrics recognition.

INTENDED AUDIENCEThis course is intended for engineers,physicists, biomedical engineers, computerscientists, physicians, and managers who areinterested in learning about fundamentals ofdigital image processing, biomedical imageprocessing applications, neural networks forimage processing, wavelet transforms,statistical filters for image processing, imagerecognition, real-time pattern recognitionsystems, and applications including imagetracking, classification, high speed imageprocessing systems, real-time imageprocessing, and biometrics image processing.

COURSE PRICE INCLUDES the text SmartImaging Systems (SPIE Press, 2001) byBahram Javidi.

Infrared Window and DomeMaterialsSC214Course level: Advanced

This course presents an overview of theoptical, thermal and mechanicalcharacteristics of infrared-transmitting windowand dome materials. Other topics includethermal shock response, rain and particleerosion, protective coatings, antireflectioncoatings, electromagnetic shielding, prooftesting, and fabrication of optical ceramics.The course concludes with a brief discussionof sapphire and diamond as infrared materials.

INTENDED AUDIENCEThe course is directed at engineers, scientists,managers and marketing personnel who needan introduction to properties, performance,and manufacture of windows and domes. Abasic degree in engineering or science is theexpected background, but care will be takento provide introductory backgroundinformation for each topic.

COURSE PRICE INCLUDES the text Materialsfor Infrared Windows and Domes (SPIE Press)by Daniel Harris.

Infrared DetectorsSC278Course level: Introductory

This course will provide a broad and usefulbackground on optical detectors, both photonand thermal, with a special emphasis placedon the infrared detectors. Discussion of opticaldetection will be stressed. The fundamentalsof responsivity (Rl), noise equivalent power(NEPl) and specific detectivity (D*) will bediscussed. These figures of merit will beextended to photon noise limited performanceand Johnson noise limitations (RA product).Discussion of optical detector fundamentalswill be stressed. To aid the attendee inselecting the proper detector choice, thedetailed behavior of the more important IRdetector materials will be described in detail.Newer technologies such as quantum wellinfrared photodetectors and blocked impuritybands as well as IR detectors will be coveredbriefly.

INTENDED AUDIENCEThis class is directed at people who need tolearn more about optical detectors from a userpoint of view. It will give the student insightinto the optical detection process as well aswhat is available to application engineers,advantages, shortcomings, and pitfalls.

COURSE PRICE INCLUDES the text InfraredDetectors and Systems (Wiley, 1996) by E. L.Dereniak and G. D. Boreman.

Defense & Security


Introduction to SensorSystemsSC279 VTCourse level: Introductory

This course presents a unified introductoryexplanation of electro-optical sensor systems,both passive (IR/VIS/UV) and active (laserradar, ladar). Principles of operation arederived in an analytical approach to enableperformance prediction. System componentsare identified and technology andphenomenology issues are described.Emphasis is placed on (1) the complementaryroles of passive and active sensors, (2) therequirements allocation process, and (3)performance of integrated passive and activesensor systems in emerging practicalapplications.

INTENDED AUDIENCEThis course is directed to engineers, scientists,and managers who desire a unifiedintroductory understanding of passive andactive electro-optical sensors and theirperformance in emerging practicalapplications.

Limitations to Imaging andLaser Propagation in theAtmosphereSC338Course level: Advanced

The atmosphere limits visual, infrared, andmillimeter wave sensor operational capability.It decreases image contrast and resolution;reduces laser, high frequency radar, and non-imaging/radiometer system range andsensitivity. Atmospheric gases, aerosols,dusts, precipitation, fogs, radiation, andrefractive turbulence under variousmeteorological conditions limit imaging andlaser system design, performance, dataacquisition, and data interpretation. Closedform analytical models for imaging and lasersystem outputs illustrate the limitationsimposed on remote sensing by theatmosphere. Approximations provide a usefulworking knowledge of the relationshipsbetween atmospheric limitations and imagingand laser system performance.

INTENDED AUDIENCEThe course is for managers, environmentalscientists, engineers and technicians,meteorologists, imaging and laser systemusers, and students who require rapidassistance in defining imaging and lasersystem limitations, determining effectivesensor design, defining experimental designsto support atmospheric measurements, andapplying atmospheric measuring instrumentsto support observations through theatmosphere.

Course price includes the texts TheAtmosphere Filter, Volumes I and II, by theinstructor (JCD Publishing, 2001).

Introduction to CCD andCMOS Imaging Sensorsand ApplicationsSC504Course level: Introductory

This course provides a review of generaltheory and operation for CCD and CMOSimaging technologies looking at thedevelopment and application statuses of both.Performance differences between CMOS andCCD imaging arrays are covered. Fundamentalperformance limits behind major sensoroperations are presented in addition to imagedefects, shorts, device yield, popular chipfoundries, chip cost; custom designed and off-the-shelf sensors. We discuss operationprinciples behind popular commercial andscientific CMOS pixel architectures, andvarious array readout schemes. We coverbackside illuminated arrays for UV, EUV and x-ray applications; high QE frontside illuminatedsensors; deep depletion CCDs, ultra largeCMOS and CCD arrays; high speed/ low noiseparallel readout sensors. We describe thephoton transfer technique in measuringperformance and calibrating camera and chipsystems, and charge transfer mechanisms. Wereview correlated double sampling theory usedto achieve low noise performance andconclude with a look at future research anddevelopment trends for each technology.

INTENDED AUDIENCEThis course is for scientists, engineers, andmanagers involved with high performanceCCD and CMOS imaging sensors and camerasystems.

COURSE PRICE INCLUDES the text ScientificCharge Coupled Devices (SPIE Press, 2001)by James Janesick.

Infrared Characterization ofSources and BackgroundsSC545:Course level: Advanced

This course will treat the most importantphysical processes and parameters which areused to describe the infrared (IR) contrastbetween targets and backgrounds. Theoreticaland empirical IR modeling, image calibrationmethodology and field experiments will bediscussed.

INTENDED AUDIENCEEngineers and scientists working in the area ofIR detection and countermeasuredevelopment, with a special focus on thecharacterization of target and backgroundsignatures. Basic familiarity with flowdynamics and heat and radiation transfermechanisms is helpful.

COURSE PRICE INCLUDES the text ThermalInfrared Characterization of Ground Targetsand Backgrounds, Second Edition (SPIEPress, 2006) by Pieter A. Jacobs.

Terahertz WaveTechnology andApplicationsSC547 VT · CDCourse level: Intermediate

A pulsed terahertz (THz) wave with afrequency range from 0.1 THz to 10 THz iscalled a “T-ray.” T-rays occupy a large portionof the electromagnetic spectrum between theinfrared and microwave bands. However,compared to the relatively well-developedscience and technology in the microwave,optical, and x-ray frequencies for defense andcommercial applications, basic research, newinitiatives and advanced technologydevelopments in the THz band are very limitedand remain unexplored. However, just as onecan use visible light to create a photograph,radio waves to transmit music and speech,microwave radiation (MRI) or X-rays to revealbroken bones, T-ray can be used to createimages or communicate information. Thiscourse will provide the fundamentals of free-space THz optoelectronics. We will cover thebasic concepts of generation, detection,propagation, and applications of the T-rays,and how the up-to-date research results applyto industry. The free-space T-rayoptoelectronic detection system, which usesphotoconductive antennas or electro-opticcrystals, provides diffraction-limited spatialresolution, femtosecond temporal resolution,DC-THz spectral bandwidth and mV/cm fieldsensitivity. Examples of homeland security anddefense related projects will be highlighted.

INTENDED AUDIENCEThis course is designed for researchers inacademia and industry, who are interested inthe mid-infrared and far-infrared pulsed THzradiation.

Use of CCD and CMOSSensors in VisibleImaging ApplicationsSC557Course level: Introductory

This course will describe the imagingcapabilities of visible sensors and illustratetheir use with examples as varied as acommercial color scanning Telecineapplication and multispectral satellite imaging.The methodology for configuring andspecifying a visible imaging system will bedescribed, including the role of charge-coupled device (CCD), and complementarymetal-oxide-silicon (CMOS) focal planetechnologies.

INTENDED AUDIENCEEngineers, scientists, and managers who areinterested in utilizing CCD, CMOS or CIDsensors in advanced camera and imagingapplications.

Defense & Security

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Optically-Based BiologicalAgent SensorsSC585Course level: Introductory

This course will introduce the basic techniquesof optically-based sensing of biological agents.An overview of the nature of biological agentsrelevant to military and homeland securityinterests will be presented, as will anintroduction to understanding the basics ofparticle analysis in the presence of complexbackgrounds. The primary focus of the coursewill be on an understanding of the varioustechniques for the optical interrogation ofpotential biological pathogens for the purposeof early warning detection, as well as thelimited identification of those agents. In thisregard, a particular emphasis will be placed onultraviolet laser induced fluorescence, andrecent advances in the development of sensorscapable of providing rapid, reliable earlywarning detection in a compact and costeffective system. The technique of UV-resonance enhanced Raman will also behighlighted. The course will cover both pointdetection and stand-off detection.

INTENDED AUDIENCEThis is an introductory course and is intendedfor those interested in gaining a basicknowledge of threat posed by biological agentsand the optically-based techniques fordetecting those threats. Both managers andengineers will benefit from this overviewcourse, however the design details will belimited. No prior training in optics, biology, orelectrical engineering is required.

IR Threat Detection SystemsSC628Course level: Intermediate

This short course provides an overview of therole that IR Search and Alerting systems (IRSA)may give in the protection of military and non-military platforms. All system aspects includingthe definition of the threat and associatedscenarios, requirements, target signatures,background- and atmospheric (includingspectral) effects, sources of false alarm, sensordesign, signal processing, range performance,test and evaluation, situational awareness,coupling with candidate weapon andcountermeasure systems, survivability and killassessment will be discussed. The applicationsinclude the defense of tanks, helicopters andships as they are used in peace keeping andpeace-enforcing operations. The threatincludes small arms weapons, rocket propelledgrenades, missiles, unmanned aerial vehicles,small surface targets, operating in complex(including littoral) backgrounds.

INTENDED AUDIENCEScientists, engineers, technicians, users andmanagers involved in the defense of militaryplatforms. Undergraduate level of knowledgeon physics, optics, electronics and signalprocessing is recommended.

Algorithms for BiometricRecognitionSC633Course level: Intermediate

Biometric recognition is becoming increasinglyimportant for security applications. This shortcourse is aimed at introducing severalalgorithms useful for biometric recognition. Inparticular, common recognition algorithms forface, fingerprint, iris and palmprint biometricswill be discussed. This tutorial will have thefollowing components: motivation forbiometric recognition; pattern recognitionbasics; performance metrics for biometricrecognition; biometric recognition algorithms(Principal Component Analysis, LinearDiscriminant Analysis, Correlation Filters,Artificial Neural Networks, minutiae-basedfingerprint recognition methods, Iris codemethod for iris recognition and feature-basedapproaches for palmprint recognition); multi-modal biometric recognition.

INTENDED AUDIENCEEngineers, scientists and managers who wantto understand algorithms useful for biometricrecognition. Some background in probabilitytheory, some familiarity with vectors andmatrices, and basic signals and systemstheory is assumed.

COURSE PRICE INCLUDES the textCorrelation Pattern Recognition by B. V. K.Vijaya Kumar, Abhijit Mahalanobis, andRichard Juday (Cambridge University Press,2005)

Introduction to SensorNetworksSC640Course level: Introductory

Networks consisting of miniature sensors arean exciting new technological developmentmade possible by advances in miniaturization,wireless systems and energy storage devices.Typical deployments consist of miniaturebattery-operated sensor nodes with wirelesscommunication capabilities resulting in ad hocconfigurations. They have a wide range ofpotential application in areas such as defense,homeland security, environmental monitoringand remote monitoring for plant safety. Thiscourse will provide a tutorial overview ofsensor network systems covering variousaspects such as collaborative processing,energy-aware routing, data aggregation andapplications. Topics covered will include:sensor networks, basic frameworks for sensornetwork operation, energy and bandwidthconstraints, reducing communicationoverhead through local processing, dataaggregation: correlation strategies, distributedcoding and compression, energy-awaresensor operations: routing and coverage,collaborative information processing,distributed computing paradigms, data andsensor fusion, and target/event detection.

INTENDED AUDIENCEScientists, engineers and managers interestedin an introductory exposition of sensornetworking.

NIR and SWIR ImagingApplicationsSC710Course level: Introductory

This course provides attendees with anoverview of the diverse range of applicationsfor NIR and SWIR imaging systems and howthese systems are calibrated andcharacterized. The emphasis is on thecapabilities of InGaAs and InSb sensorsoperating in the 0.7 to 3.0 micron NIR andSWIR bands with discussions of optics andtunable filter technology. Discussion will alsoinclude extended InGaAs and VisGaAs, asensor material with both visible and NIRresponse.

INTENDED AUDIENCEThis material is intended for anyone wishing tobecome familiar with NIR/SWIR technologyand imaging applications.

COURSE PRICE INCLUDES the text AlienVision: Exploring the ElectromagneticSpectrum with Imaging Technology by AustinRichards.

Techniques for AccurateInfrared TemperatureMeasurementSC711Course level: Intermediate

This course provides attendees with anunderstanding of how to properly select anduse infrared thermometers. This coursefocuses on understanding infrared theory andhow infrared thermometers operate. Coursedemonstrates the importance of properequipment selection and usage and how tomeasure and compensate for error sources.The course is a must for anyone wishing tomake accurate non-contact temperaturemeasurements.

INTENDED AUDIENCEThis material is intended for anyone wishing touse infrared equipment to accurately measuretemperatures. Course will cover equipmentselection and operation, equipmentcalibration, compensating for error sourcesand cross verification of radiometrictemperature data.

COURSE PRICE INCLUDES printed handoutsof course PowerPoint slides andcomplimentary copies of InfraspectionInstitute Guidelines.

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3D Visualization Techniquesfor Laser RadarSC717Course level: Introductory

Visualization of 3D-laser-radar data hasspecial challenges beyond those forconventional computer graphics for 3Dscanners. Such challenges include samplinglimitations, very large data sets, obscuringmaterial, increased noise, and the need forrapid identification of interesting features. Thecourse provides an introduction to 3D-laser-radar characteristics relevant to visualization.Several key 3D processing and visualizationmethods (e.g., jitter noise reduction, dataclassification, surface generation, point-clouddisplay-enhancement, selectabletransparency, and rapid display of large datasets) will be discussed.

INTENDED AUDIENCEEngineers, scientists, researchers, andmanagers who need a basic understanding ofvisualization techniques for 3D laser radar.Some prior background with image processingand computer technology will be helpful.

Chemical & BiologicalDetection: Overview ofPoint and StandoffSensing TechnologiesSC719Course level: Introductory

This course introduces chemical andbiological detection and identificationtechniques which are commonly utilized formilitary and civil applications. Remote andsampled detection, discrimination, andidentification techniques are introduced withdesign parameters and performance models.A sampling of specific technology applicationsfor chemical point, chemical standoff,biological point, and biological standoffsensing will be described. These technologiesinclude Ion Mobility Spectrometry, SurfaceAcoustic Waves, Fourier Transform InfraredSpectrometry, Differential Absorption Lidar,Laser-Induced Fluorescence, and LidarBackscatter systems. The course will include abrief overview of chemical and biologicalagents and features which may beinterrogated by detection systems.

INTENDED AUDIENCEThis course is intended for those interested inthe design and development of chemical andbiological sensors for applications rangingfrom military to industrial sensing.Mathematical models for the various sensorswill be presented and discussed; however, thiscourse does not require an in-depthunderstanding of the mathematical principlesto appreciate the technological benefits of thevarious approaches. Some background inelectro-optical and infrared systems is helpful,but not required.

DISCLAIMER: The information provided in thisshort course was developed from acompilation of sources available in openliterature The information delivered in writtenand oral form does not represent the officialposition or interests of, or endorsement by theDepartment of Defense or General DynamicsCorporation.

Network Centric TargetTracking and ClassificationSC728Course level: Intermediate

This course is offered in response to thegrowing interest in network centric processingsystems. It is designed to provide eachattendee with the knowledge and insights toeffectively deal with systems for multiple targettracking and classification with distributedsensor data. The emphasis is on theinformation needed to analyze, select, design,develop, and evaluate algorithms for practicalsensor fusion to track and classify smalltargets. The term classification is used here inthe more general sense to include decisions,detection, target typing, identification, orrecognition. Of particular interest arealgorithms that provide a single consistenttarget view across platforms (sometimescalled SIAP) so that users on the distributedplatform can coordinate their actions. Thiscourse is based on pertinent material of thespeaker’s intensive five-day short coursesupplemented by recent findings.

INTENDED AUDIENCEThis intensive course is designed forengineers, scientists, and managersconcerned with fusing multiple sensor data fortarget tracking and classification systems.Familiarity with single sensor data associationand manipulations of vector-matrix equationsis desirable. The course starts at theintroductory level and builds up to advancedsensor data fusion techniques. The criticaldetails for designing algorithms for networkcentric processing under challengingconditions, such as clutter and dim targetsthat are close or crossing, are highlighted.

Optical Fiber SensingTechnology for Chemical &Biological ApplicationsSC736Course level: Introductory


Human Shape PerceptionSC754Course level: Introductory

Shape recognition plays a central role in objectrecognition and while a large number oftechnical papers on shape representation andsimilarity exist, shape recognition still remainsan unsolved problem. The main goal of thiscourse is to present results on human shapeperception, including 2D as well as 3D shaperepresentation and similarity. This course willprovide needed background knowledge aboutimportant features of shape recognition fromthe point of view of human visual perception. Itwill include a tutorial about human shapeperception with an emphasis on the mostimportant psychophysical experiments onshape recognition and reconstruction thathave been performed during the last 100years, as well as on computational models ofhuman shape perception. The course will alsoinclude an overview of computationalapproaches to shape similarity and to shape-based retrieval in multimedia databases. Wewill report an experimental evaluation of theirperformance on the dataset used in MPEG-7Core Experiment CE-Shape-1. This datasetprovides a unique opportunity to comparevarious shape descriptors.

INTENDED AUDIENCEResearchers working in the areas of imageprocessing, computer vision, and multimediaprocessing. There are no prerequisites.

Zone Plate Antennas forMillimeter-Wave andTerahertz FrequenciesSC782Course level: Intermediate

Zone plate antennas are being usedextensively in applications such ascommunications, radar, radiometry, andguidance, where they offer lower weight andvolume, as well as simplicity of design. Thiscourse provides attendees with the basicprinciples of phase-correcting Fresnel zoneplate antennas at millimeter-wave andterahertz frequencies. The courseconcentrates on describing characteristicssuch as antenna gain, bandwidth, frequency

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dependence, far-field patterns, efficiency,aberrations, off-axis performance, focalbehavior, and feed considerations for zoneplate designs having focal lengths anddiameters that are similar. Their performance iscomparable or sometimes superior to astandard lens. Many practical and usefulexamples are included. You will become fluentwith how one designs zone plate antennas forvarying applications. The effects of going tothe higher frequencies will be described.

INTENDED AUDIENCEThis material is intended for persons interestedin design technology, including antennadesigners, at millimeter-wave or terahertzfrequencies.

Fiber Lasers for DefenseApplications: Fibers,Components and SystemDesign ConsiderationsSC784Course level: Intermediate

Fiber laser technology has the potential tomake a significant impact in many defenseapplications, from LIDAR and remote sensingto high energy laser weapons systems. Thisemerging laser technology offers manyintrinsic advantages over traditional DPSSLs.Widespread publications in the researchcommunity have demonstrated an impressivearray of power scaling results, both CW andpulsed and at wavelengths from 1um to theeyesafe 1.5um and 2um wavelengths.Advantages associated with the technologyare high wallplug efficiency leading to reducedelectrical power requirements and easiersystem cooling, but also robustness, goodbeam quality and highly flexible systemperformance. These, coupled with (remote)fiber delivery options make the technologyunique in certain applications.

The topics to be covered include: anexplanation of the basic fiber parameters,double-clad fiber designs and covering suchconcepts such as large mode area fibers,modal/beam quality, PM fibers etc.; rare earthdoping and spectroscopy of Yb-1um, Yb:Er-1550 and Tm-2um; component specificationsand availability (couplers, isolators, seed laserdiodes etc); limitations to scaling fiber devices,non-linear limitations, damage thresholds, etc.;design rules and concepts for pulsed fiberlasers and amplifier chains, recent results fromthe literature; and system specifications andpossible application areas, comparison andadvantages over other laser technologies.

This tutorial will cover the major aspects ofdesigning and building a fiber laser, from thefiber itself through the various state of the artfiber components and discuss the systemparameter space that best makes use of theintrinsic advantages of the technology.

INTENDED AUDIENCEThe tutorial is designed for researchers andengineers interested in investigating thisapplication area but without the detailedknowledge of fibers and fiber based devices.Higher level managers and system designers/integrators will also be interested in the broadcomparisons made between the fiber lasertechnology and current lasers and how thiscan impact future system designs.

Aerospace MiniaturizationUsing Multifunctional MEMSSC785Course level: Intermediate


Introduction to Opticaland Infrared SensorSystemsSC789Course level: Introductory

This course provides a broad introduction tooptical (near UV-visible) and infrared sensorsystems, with an emphasis on systems usedin defense and security. Topics include bothpassive imagers and active laser radars (lidar/ladar). We begin with a discussion ofradiometry and radiometric calculations todetermine how much optical power iscaptured by a sensor system. We surveyatmospheric propagation and phenomenology(absorption, emission, scattering, andturbulence) and explore how these issuesaffect sensor systems. Finally, we performsignal calculations that consider the source,the atmosphere, and the optical system anddetector, to arrive at a signal-to-noise ratio fortypical passive and active sensor systems.These principles of optical radiometry,atmospheric propagation, and opticaldetection are combined in examples of realsensors studied at the block-diagram level.Sensor system examples include passiveinfrared imagers, polarization imagers, andhyperspectral imaging spectrometers, andactive laser radars (lidars or ladars) for sensingdistributed or hard targets. The courseorganization is approximately one third on theradiometric analysis of sensor systems, onethird on atmospheric phenomenology anddetector parameters, and one third onexample calculations and examination ofsensor systems at the block-diagram level.

INTENDED AUDIENCEScientists, engineers, technicians, ormanagers who find themselves working on (orcurious about) optical (uv-vis) and infraredsensor systems without formal training in thisarea. Undergraduate training in engineering orscience is assumed.

Practical RadiometrySC798Course level: Introductory


Image Processing,Understanding, and theAnalysis of Master Drawingsand PaintingsSC814Course level: Intermediate

This course-a distillation of an undergraduatecourse taught at Stanford University and shortcourses at ICIP05 and ICPR06-is anintroduction to the application of computervision and image analysis to problems in artand art history, specifically realist art andphotography. Realist paintings are a richsource of information, both of the sceneportrayed and the techniques the artist usedto render that scene. Students will learn theprinciples of perspective and how to applyperspective analysis to paintings to infervanishing points, locate perspectiveinconsistencies, and to determine whether theartist used perspective constructions or tools.Students will learn how to infer the number,color, and position of light sources based onposition, color, and blur of cast shadows andhighlights along occluding boundaries, as wellas how to estimate sizes of depicted objectsbased on perspective and fiducial or referenceobjects or relationships. Students will learnhow to estimate “camera parameters” of theartist (or imaging system), such as theeffective magnification, focal length and insome cases aberrations. Some of thesemethods require no more than ruler andpencil, some commercial software (e.g.,Adobe Illustrator), others were adapted fromtheir use in forensic analysis of digitalphotographs and require powerful commercialimage processing packages (including onesbased on C, Matlab, Mathematica), and yetothers require researchers to write specialcode.

INTENDED AUDIENCEImage processing researchers interested inforensic image analysis and art. Priorknowledge of basic art history is desirable, butwill not be assumed.

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Multimedia and Security: AnIntroduction toCryptography, DigitalWatermarking, MediaForensics, and Biometricsand How Things go TogetherSC816Course level: Introductory

This course will present an integrativeoverview of recent work of cryptography,digital watermarking, media forensics, andbiometrics in the field of multimedia systems.Recent advances in image, video, and audioprocessing to achieve security are introducedcovering the full range of security aspects:data confidentiality, data integrity andauthenticity, and non-repudiation, as well asuser identification and authentication.

Defense & SecurityThe first part of the course will introduce

symmetric (private-key) and asymmetric(public-key) crypto systems to ensureconfidentiality along with authenticationtechniques to ensure integrity and authenticity.Infrastructure solutions for non-repudiation ofdigital signatures will be discussed.

Furthermore, the course will describe digitalwatermarking techniques that include bothspatial, spectral, and temporal watermarkingalgorithms, as well as the approaches androles of steganography, perceptual hashingtechniques, and media forensics. The goal isto show which security aspects can be met bysecurity mechanisms, as well as how allmechanisms can be combined usefully toachieve, for example, data authentication.Additionally, the unique nature of these newtechnologies relative to intellectual propertyrights and digital rights management systems(DRM) will be presented.

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For subscription information, call or write:Tel.: +1 360 676 3290E-mail: [email protected]

SPIE is a not-for-profit international society dedicated tofurthering technological innovations in optics, photonics,imaging and nanotechnology.

■ Micro/Nanotechnology■ Sensor Technologies■ Biomedical Optics■ Defense & Security■ Communications■ Imaging■ Lighting & Energy■ Astronomy

In the second part of the course, particularemphasis will be placed on user authenticationtechniques by image and signal processingand multimodal approaches by combining andfusing multiple single biometric traits for moreconvenient and reliable identification orverification of users. Based on a case-by-caseexamination of the modalities of face (2D and3D face analysis), fingerprint (fingerprint imageanalysis), signature (handwriting analysis ofvisual and dynamic signals), and voice (speechsignals), the underlying technical concepts willbe elaborated and design paradigms, as wellas performance evaluations, will be given.

INTENDED AUDIENCEThe course is intended for engineers andscientists who work in the imaging and/ormultimedia fields who are interested in thearea of data and user security. Attendeesshould have an undergraduate degree inscience or engineering.


Biomedical Optics & Medical Imaging

Tissue OpticsSC029 VT · DVDCourse level: Introductory

This course outlines the principles of lighttransport in tissues that underlie design ofoptical measurement devices and laserdosimetry for medicine. Topics includeradiative transport in turbid tissues, the opticalproperties of tissues, modeling techniques forlight transport simulation in tissues, analysis ofreflectance and fluorescence spectrameasured in turbid tissues by topical andimbedded optical fiber devices, videotechniques, and criteria involved inestablishing laser dosimetry protocols.Lessons are illustrated using case studies ofoptical fiber devices, video imagingtechniques, and design of therapeutic laserprotocols.

INTENDED AUDIENCEThis material is intended for biomedicalengineers and medical physicists interested inmedical applications of ultraviolet, visible, andnear infrared wavelengths from bothconventional and laser light sources.

Multispectral andHyperspectral ImageSensorsSC194 VT · DVDCourse level: Advanced

This course will describe the imagingcapabilities and applications of the principaltypes of multispectral (MS) and hyperspectral(HS) sensors. The focus will be on sensors thatwork in the visible, near-infrared andshortwave-infrared spectral regimes, but thecourse will touch on longwave-infraredapplications. A summary of the salient featuresof classical color imaging (human observation)will also be provided in an appendix.

INTENDED AUDIENCEEngineers, scientists, and technical managerswho are interested in understanding andapplying multispectral and hyperspectralsensors in advanced military, civil, scientificand commercial applications.

Biochips: Fundamentals,Fabrication, andApplicationsSC259Course level: Intermediate

Planar technology, the driving force behind themicroelectronic revolution has quietly becomethe central technology in the biomedicalrevolution. Biomedical micro- and nano-devices (biochips) from microarrays forgenomics, proteomics and drug discovery, tolab-on-a-chip devices and biosensors, arenow fabricated by planar technology methods.In contrast with semiconductor manufacturing,which had a champion product, the transistor,and a champion technology, biomedicalmicrodevices are enormously diverse andevolving rapidly. This product diversity andrapid evolution requires constant andaccelerated upgrade of the technology andmaterials for biochip design.

The course, which will focus primarily, butnot exclusively, on nanodevices, will start withthe exploration of the molecular interactions atbiochip surfaces which dictate the selection ofthe appropriate design, fabrication techniqueand critically impact on the operation ofbiochips. The present evolution of biochipsconcomitantly towards disposable devices(e.g. polymer-made), single molecule detectiondevices (e.g. nanoarrays) and dynamic devices(e.g. lab-on-a-chip and molecular motorsbased devices) make the understanding andcontrol of surface biomolecular interactionseven more critical. The course will emphasizethe developments in nano-enabled anddynamic devices and will also explore theprojected trends in biochip markets,technology and design.

INTENDED AUDIENCEEngineers, scientists and managers who needto understand the concepts, the opportunitiesbut also the challenges of biochiptechnologies. Prior background on biomedicalfield or semiconductor technology will behelpful but not mandatory. Attendees may alsoconsider attending one or more of theserelated courses: SC437 MicrofabricationTechniques for MicroFluidics & BioMEMS,SC532 Micro- and Nanofluidics - Technologyand Applications, and SC699 PolymerMicrofabrication.

FCCourses at SPIE EventsLive instruction for BiomedicalOptics & Medical Imaging will takeplace at the SPIE Events listed below.Registration and course informationis available 12 weeks prior to theevent dates.

Photonics West

Electronic Imaging

Medical Imaging

Optics & Photonics

Optics East














Fluorescent Markers: Usageand Optical SystemOptimizationSC309Course level: Intermediate

Fluorescent dyes are used frequently asmarkers in conjugation with biologicalsamples. They allow a very good detection ofcellular processes and are used for tagging ofDNA strands and other target biological cells.The number of dyes and their variousapplications have grown very rapidly in the lastdecade. Understanding the fundamentalparameters of the dyes and tailoring theoptical system design for specificrequirements results in a variety of new bio-optical systems. Light sources for fluorescentmicroscopy have also diversified from lampsto lasers and lately to LEDs and VCSELs. Theproper usage of fluorescent microscopy is akey feature to the successful implementationof many bio-optical devices. The recentdevelopment of efficient DNA sequencers,DNA micro-array readers, and new chemicalprobes are few examples for this fast evolvingfield.

INTENDED AUDIENCEEngineers, scientists, students and managersinvolved in research, design, andmanufacturing of medical optical devices andfluorescence based systems. Some priorknowledge in optoelectronic devices andmicroscopy is desirable.

Principles and Applicationsof Optical CoherenceTomographySC312Course level: Advanced

Optical coherence tomography (OCT) is a newimaging modality, which is the optical analogof ultrasound. OCT can perform highresolution cross sectional imaging of theinternal structure of biological tissues andmaterials. OCT is promising for biomedicalimaging because it functions as a type ofoptical biopsy, enabling tissue pathology to beimaged in suit and in real time. Thistechnology also has numerous applications inother fields ranging from nondestructiveevaluation of materials to optical data storage.This course describes OCT and the integrateddisciplines including fiber optics,interferometry, high-speed optical detection,biomedical imaging, in vitro and in vivostudies, and clinical medicine

INTENDED AUDIENCEThis material is appropriate for scientists,engineers, and clinicians who are performingresearch in medical imaging.

Microfabrication Techniquesfor MicroFluidics &BioMEMSSC437 VT · CDCourse level: Intermediate


Bio-Optical DetectionSystemsSC461Course level: Intermediate

Optical systems allow for non-invasivesensitive detection of absorption, scattering,and fluorescent light emission in live tissues.Detection systems can be divided into twomain categories: macro- and micro-scaleoptical systems. Recently, drug discovery andthe Human Genome mapping haveaccelerated the development of dedicatedminiature detection systems for fast andsensitive readout of micro-arrays and bio-chips. In addition, bio-chip fabrication wasgreatly improved using advancedmicroelectronics fabrication methods andautomated parallel arrayers. In parallel to thesedevelopments, advanced scanningmicroscopy techniques like two-photon andconfocal microscopy were improved to allowhigh-resolution three-dimensional imagecollection from live tissues. These detectionsystems complement each other in manycases and will be reviewed as part of thiscourse. Optical design considerations andsensor system integration and optimizationissues will be presented with emphasis onminiature sensor systems.

INTENDED AUDIENCEEngineers, scientists, students and managersinvolved in research, design, andmanufacturing of medical optical devices andfluorescence-based sensor systems. Someprior knowledge in fluorescent tags andmicroscopy is desirable.

BiophotonicsSC463Course level: Advanced

Science and technology breakthroughs in the21st Century are more likely to occur at theinterfaces of disciplines. Biophotonics isdefined as the interface of photonics orlightwave technology and the biologicalsciences. It is a new frontier, offeringtremendous prospects for optical diagnosticsas well as for light activated therapy, surgery,biosensing and restoration of biologicalfunctions. The course will include the followingtopics: photobiology (interaction of light withcells, interaction of light with tissues, nonlinearoptical processes with intense laser beams,photo-induced effects in biological systems),bioimaging (various imaging techniques,fluorescent markers, cellular imaging, imagingof soft and hard tissues, in vivo imaging,dynamic imaging), optical diagnostics(biosensors, fluorescence immunoassay, flowcytometry), optical tweezers and scissors(laser trapping and dissection for biologicalmanipulation, single molecule biophysicsstudies, DNA-protein interactions), lightactivated therapy (photodynamic therapy, lowlevel light therapy), nanotechnology(application of nanoprobes, nems), and tissueengineering (use of short pulse lasers fortissue welding, tissue contouring; tissueregeneration).

INTENDED AUDIENCEAnyone who needs to learn how to utilizelasers and optics in biomedical research. Thecourse is intended for a multidisciplinaryaudience including biomedical researchers,cell physiologists, pharmacologists, MDs,DDSs, cancer therapists, chemists, opticalphysicists, optical engineers and bioengineers.

COURSE PRICE INCLUDES the textIntroduction to Biophotonics (Wiley, 2003) byParas Prasad.

Introduction to OpticalTweezers and OpticalMicromanipulationSC655Course level: Introductory

This course is intended as an introduction tosystems that use light for actuation andmicromanipulation, including examples fromthe biological and colloid sciences.Throughout, the emphasis will upon basicprinciples and designs. You will learn ofopportunities for enhanced degrees of control,resolution, and sensitivity - as well as manytradeoffs and limitations. The course willprovide “hands-on” experience using a realoptical tweezers system.

INTENDED AUDIENCEThis material is appropriate to researchers whoare considering work with opticalmicromanipulation.

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Optical in vivo BiosensingBased on Color FluorescentProteinsSC695Course level: Introductory

This course provides attendees with a basicworking knowledge of fluorescent in vivobiosensors. Green fluorescent protein (GFP)was only the first of many types used for invivo biosensing. Novel fluorescent proteins(nFP) from different sources comprise a rapidlygrowing arsenal of gene-based optical probesfor numerous applications in biology,biotechnology, and medicine.

This course concentrates First, on thesystematization and classification of differentnFP and major photophysical and chemicalfeatures of nFP. Second, on the principles ofoperation of molecular biosensors withfluorescent detection in living cells andanimals. Third, on the application of nFP fordrug design and screening.

A survey of available genetic constructionsand optical systems used for microscopicfluorescence detection as well as small animalwhole-body imaging are included throughoutthe course.

INTENDED AUDIENCEThis material is intended for anyone whoparticipates in development of opticalinstruments for drug design, discovery, andscreening. Those who either design geneticallyengineered optical probes or who work on theoptical engineering of these instruments willfind this course valuable.

Fundamental Principles andStatistical Analysis ofMagnetic ResonanceImagingSC701Course level: Intermediate


Image Guided Proceduresand Computer AidedSurgerySC704Course level: Introductory


Chemical & BiologicalDetection: Overview ofPoint and StandoffSensing TechnologiesSC719Course level: Introductory




Diffuse OpticalSpectroscopy and Imagingof TissuesSC749Course level: Intermediate


Optical Clearing of Tissueand BloodSC750Course level: Intermediate

This course presents structural and opticalmodels of tissues with basic single andmultiple scattering, with ordered and randomlydistributed scatterers. Coherent, spatially-modulated, and polarized light propagation inrandom and quasi-ordered tissue structureswill be considered. It will be shown that tissuereflection and transmission, as well asscattered intensity and polarization can beeffectively controlled by changes of itsstructure and refractive index of tissuecomponents. Mechanisms of optical clearing(OC) at optical immersion of turbid tissues willbe analyzed. Matching of refractive indices ofscatterers and ground matter as a mainmechanism of optical clearing atadministration of optical clearing agents (OCA)for control of optical properties of tissues andblood will be discussed. Controllable tissuedehydration and rehydration and the usage ofOC for optical and laser diagnostic and

therapeutic purposes will be demonstrated. Aconsiderable increase of penetration depth ofprobing light and improvement of imagecontrast will be shown. Optical monitoring ofdiffusion of endogenous and exogenoussubstances within a tissue also will bedemonstrated. A considerable improvement ofdiagnostic methods and instruments, basedon CW, time- and spatially-resolved lightscattering, OCT, SHG, two-photon andconfocal microscopy, speckle andpolarization-sensitive techniques, will beshown for various medical applications. Theseapplications include tissue and bloodspectroscopy, OCT glucose sensing, opticalimaging and laser surgery through the humanskin, eye sclera, cerebral membrane, scull,bone, cartilage, tendon, body’s interior tissues(vessel wall, esophagus, stomach), and vesselnet.

INTENDED AUDIENCEEngineers, scientists, and physicians who areinterested in optical and laser methods andinstruments design and application for medicalscience and clinics will benefit from thiscourse.

COURSE PRICE INCLUDES the text OpticalClearing of Tissues and Blood (SPIE Press,2006) by Valery Tuchin.

Vibrational Spectroscopy:From Physics to MedicineSC751Course level: Introductory





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Multiphoton Microscopy(MM) - Basics, TechnologyDevelopment, andApplicationsSC819Course level: Intermediate

This course introduces the basics ofmultiphoton microscopy, technologydevelopment, image acquisition and analysisrelated to various biological and clinicalapplications. The first part of the course willcover the basics of microscopy, imageformation, detectors, lenses used in MM, andcalculation of absorption cross-sections. Thesecond part of the course will focus on how tobuild your own MM, or integrate one with anexisting confocal microscope. The tricksinvolved in MM development and imaging willbe covered. Finally, we will review manyapplications including tissue imaging, MM inNeuro and developmental biology, labelingissues for MM imaging, FLIM, FRET and otherclinical applications. We will also provide ademo on FLIM and FRET data analysis.

INTENDED AUDIENCEThis course is intended for scientists andengineers who need to understand variouscomponents involved in multiphotonmicroscopy development, acquisition,imaging, and data analysis. The course isdesigned in such a way that novice andadvanced level researchers can participate.


Diagnostic EndoscopySC823Course level: Intermediate

This course starts with an introduction to thebasic optics, electronics, and mechanics ofmedical endoscopes. The course thenconcentrates on the principles of white lightendoscopy, fluorescence endoscopy, andvarious methods of endoscopic spectroscopyincluding fluorescence, elastic scattering, andRaman (non-elastic) scattering. Microscopicendoscopy imaging such as OCT, confocalimaging, and multi-photon imaging will bebriefly reviewed at the end. Example clinicalapplications of endoscopic optical imagingand spectroscopy techniques for lung cancerdetection and localization are includedthroughout.

INTENDED AUDIENCEThis material is intended for anyone who isinterested in developing optical diagnosticapplications through endoscopes. Those whoare thinking of how to adapt their own opticaltechnologies for endoscopic applications willfind this course valuable.

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Micro/Nano Lithography & Fabrication

Introduction to Electron-Beam LithographySC100 VTCourse level: Introductory

Electron-beam lithography is used forpatterning photomasks, for writing directly onsemiconductor substrates, and for research innanofabrication. A brief history of thetechnique is given, and an overview ispresented of the optical, mechanical, andelectronic components that make an electronlithography tool. Writing methods will becompared and contrasted, including rasterscan, vector scan, shaped beam, cellprojection, and SCALPEL. Energy depositionphysics in the resist film is described, with theresist exposure chemistry and developmentprocesses. Special attention is given to theproximity effect and correction. Tool limitations(resolution, throughput, and placementaccuracy) are discussed. The courseconcludes with a forecast of the technology’sfuture and how it relates to the ever-decreasing feature sizes in semiconductormanufacturing.

INTENDED AUDIENCELithography and device engineers,nanolithography researchers, maskmanufacturing engineers, and managers willexpand their expertise with this material. Anundergraduate education in physics orengineering is recommended.

Introduction toMicrolithography:Theory, Materials,and ProcessingSC101Course level: Introductory

The course covers the physics of aerial imagegeneration, the chemistry that is responsiblefor generation of differential solubility inresists, and the effects of processing variableson the final relief image. While opticalexposure is the major topic of this course,both electron beam and x-ray exposure areaddressed. The physics section providesexplanation for partial coherence effects. Thechemistry section provides detaileddescription methods for quantifying resistperformance, and the process section usesthe lithographic process as an outline fordiscussion-from wafer cleaning to resiststripping.

INTENDED AUDIENCEProcess engineers, technicians, scientists andmanagers new to the field of microlithographyand those who want to understand thephysical and chemical principles that causeresist function find this course mostinformative.

COURSE PRICE INCLUDES the textIntroduction to Microlithography authored bythe instructors (Oxford Press, 1994).

Optical LithographyModelingSC102Course level: Advanced

This course presents the theory andapplications of optical lithography simulationtools. Using examples, practical applicationsto typical material and image problems will bediscussed.

INTENDED AUDIENCEPracticing lithography engineers, or engineersand scientists who need to gain anunderstanding of optical lithographysimulation and its applications will find thismaterial useful.

Resists for Deep UVLithographySC103Course level: Advanced

This course provides an overview of thetheory, materials, and processes involved inlithographic pattern generation in the deepultraviolet. A perspective of the evolution ofdeep UV imaging materials is the basis of theintroduction. The first section addresses thespecial problem of deep UV resist design. Thesecond section covers the research that led todeep UV resist development. The design ofresists and processes including chemicalamplification, silylation, dry developing, topsurface imaging, and contrast enhancement isdiscussed in detail. The course concludeswith a discussion of the chemistry andphysics responsible for atmosphericcontaminant sensitivity in acid catalyzedsystems, a brief discussion of 193nm resistissues, and the instructor’s view of the future.

INTENDED AUDIENCEThis course is designed for processengineers, resist chemists, and those who areinterested in any aspect of deep UV resisttechnology. Some knowledge of organicchemistry is helpful but not required.

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Courses at SPIE EventsLive instruction for Micro/NanoLithography & Fabrication will takeplace at the SPIE Events listed below.Registration and course informationis available 12 weeks prior to theevent dates.

Photonics West

Microlithography

Optics & Photonics

Photomask/BACUS

Optics East














CD Metrology and ImageFormation in the ScanningElectron Microscope (SEM)SC105Course level: Advanced

The scanning electron microscope (SEM) isused extensively in semiconductor productionas a measurement tool for inspection andcritical dimension (CD) metrology. Improvedimages and measurements can be obtainedand interpreted better by studying the detailsof the image-formation process. Non-mathematical explanations of the basicprinciples will allow the participant to get thebest possible information from the specimen.There is also a discussion of how to get themost accurate measurements with thisinstrument.

INTENDED AUDIENCEThis course is intended for scientists,technologists and managers in the physical orbiological sciences with a need either tooperate a SEM or to understand the acquiredimages.

Lithographic Optimization: ATheoretical ApproachSC116Course level: Intermediate

This course discusses the techniques requiredto characterize and optimize an opticallithography process. The lithographic processis made up of a series of basic steps: theformation of an aerial image, the transfer of theaerial image into the photoresist duringexposure, and the development of this latentimage into the final photoresist profile. In orderto characterize and optimize this process onemust understand the principles andinteractions of each step of the process.

INTENDED AUDIENCEThis course will be particularly useful forpracticing lithography engineers, or engineersand scientists who need to gain a basicunderstanding of optical lithography andlithographic optimization.

The Fundamental Limits ofOptical LithographySC117Course level: Advanced

Optical lithography is pushing beyond 0.25k1imaging, where conventional limitations do notsufficiently describe the situation. The need forlithography robust designs makes the situationyet more critical. Understanding imaging from adimensional description of the mask and waferas well as a spatial frequency perspective ofthe optics has become necessary. This allowsfor the insight needed to describe fundamentaloptical limits and the consequences ofincreasing NA, changing coherence, andimplementing optical enhancements (includingPSM, OAI, and OPC). The goal is to develop afundamental and intuitive understanding oftopics related to diffraction by a photomask,collection by an optical system, and imaginginto a photoresist. Fourier spectral analysis,coherency theory, lens interaction, aberrationconcepts, and image enhancement aredescribed. Several optical demonstrations helpdevelop the intuitive sense to the concepts.This course is the first of a two-part sequencebut both parts don’t need to be taken.

INTENDED AUDIENCEThe course is intended for those involved in thesemiconductor lithography business, includingbut not limited to engineers, scientists, andtechnicians.

COURSE PRICE INCLUDES the textMicrolithography: Science and Technology(Marcel Dekker, 1998) by J. Sheats and BruceSmith.

Anti-Reflective Coatings:Theory and PracticeSC118Course level: Advanced

Antireflective bottom coats are important forlithography engineers to enhance theperformance of the lithographic process. Thiscourse discusses the physical basis ofantireflection, including the derivation ofoptimal conditions for top and bottomantireflective layers. Fresnel and Airy formulaefor the reflection amplitude can be related tothe swing ratio by Brunner’s equation. Theperformance enhancements of organic andinorganic coatings can reduce the swing ratioto a fraction of its original value, removereflective notching and standing waves,increase the exposure latitude and finalresolution of photoresists, remove the need forsubstrate priming, improve adhesion andinsulate the resist from potentiallycontaminating substrates. A guide to theparticular type of antireflective coating suited towhat process is provided.

INTENDED AUDIENCEEngineers, scientists and managers who workwith or need to understand antireflectionstrategies and materials will find this courseinformative.

193-nm PhotoresistMaterialsSC120Course level: Advanced

This course reviews the present status of 193-nm photoresist technology at a time when ithas seen successful productionimplementation and is moving into immersiontechnology. It describes the initial technicalhurdles that had to be overcome to make 193nm photoresists viable materials, describesthe currently used platforms for drylithography, and goes on to review theremaining issues still being resolved in thetransition to immersion lithography with waterand high refractive index liquids. The coursewill include a review of the status of the designand performance of 193 nm photoresists andprocesses for dry and immersion lithography.It will highlight the remaining issues that willneed to be addressed for successful extensionof 193 nm lithography, such as limitations ofoverlapping process windows, line edgeroughness, PEB sensitivity, substrateinteractions, dry etching capability, patterncollapse, and defectivity (dry and immersion),and the availability of materials required forextension beyond the 45 nm node. Thesetopics will be discussed from both amechanistic point of view as well as withrespect to their impact on productionimplementation.

INTENDED AUDIENCEEngineers and scientists working or interestedin the use of 193-nm photolithography for the90 to 32 nm roadmap nodes. Somebackground in photolithography is assumed.

Pushing the Limits: OpticalEnhancement, Polarization,and Immersion LithographySC124Course level: Advanced

This stand-alone course covers low k1 opticalmicrolithography concepts that can follow the“The Fundamental Limits of OpticalLithography” course, SC117. Topics coveredrelate to current and future approaches thatcan allow optical imaging into sub-65nmdevice generations. This course builds on theextension of fundamental concepts byproviding a spatial frequency description toimaging, allowing for an intuitiveunderstanding of the technologies involved. Amore complete description of optical imaging



processes is pursued with discussions offeature and pitch specific illumination, opticalproximity correction (high and low order),phase-masking, and aberration compensation.The causes of imaging artifacts will beaddressed (including pitch dependencies) alsofrom the spatial frequency perspective.Immersion Lithography has now become aoptical extension technology candidate,allowing for increased resolution and focaldepth scaled with the refractive index of animmersion media. The potential of thistechnology will be covered, along with theimplications of large angle (high NA) imaging.The impact of polarization to imaging will becovered (including benefits and detriments)and methods to control effects will beaddressed. Attendees will learn how far wecan go, what is tolerable, and what must besacrificed to push optical lithography as far aspossible. Several optical demonstrations willhelp to develop an intuitive sense to theconcepts.

INTENDED AUDIENCEThe course is intended for those involved inthe semiconductor lithography business,including but not limited to engineers,scientists, and technicians.

Advanced ThermalManagement Materials forOptoelectronic and MEMS/MOEMS PackagingSC386Course level: Intermediate

Material selection impacts thermalmanagement, performance, alignment,reliability, cost, weight and manufacturingyield. Increasingly, traditional packagingmaterials are failing to meet the requirementsof new optoelectronic and MEMS designs. Forexample, traditional low-coefficient-of-thermal-expansion (CTE) metallic materialshave thermal conductivities that are no betterthan aluminum. In response to this need,numerous advanced composites andmonolithic materials have been, and arecontinuing to be developed. For example,there are now at least (15)low-CTE materialswith thermal conductivities in the range of 400to 1700 W/m-K. Some advanced materialshave been used in high-volume commercialand military applications for years.

Advanced material property improvementsinclude: thermal conductivities over four timesthat of copper, as well as thermal insulators;low, tailorable CTEs; tailorable electricalresistivity; high strengths and stiffnesses; lowdensities; and low cost, net shape fabricationprocesses.

INTENDED AUDIENCEThis course is designed for engineers,scientists and managers involved in designand manufacture of optoelectronic andMEMS/MOEMS packaging, materialdevelopment, and thermal management.This course replaces its previousversions,“Advanced Thermal Management andPackaging Materials” and “AdvancedMaterials for Optoelectronic and MEMSPackaging,” and has been updated to includenumerous recent advances in technology andapplications.

Microfabrication Techniquesfor MicroFluidics &BioMEMSSC437 VT · CDCourse level: Intermediate

In this course we explore the science ofminiaturization providing an in-depthunderstanding of applications, knowledge ofdifferent manufacturing options, familiarity withall materials choices, and an understanding ofscaling laws. Miniaturization techniquessurveyed are both top-down methods, inwhich one builds down from the large to thesmall, and bottom-up methods, in which onebuilds up from the small to the large. Top-down miniaturization methods and materialssurveyed include micro-machining with singlecrystal and polycrystalline Si and othermicromachining methods and materials basedon lithography as well as nonlithographicminiaturization. In dealing with micromachiningtechniques borrowed from the electronicsindustry, we emphasize those that differ mostfrom standard processes and materials usedin regular integrated circuit (IC) and hybridmanufacturing. Although miniaturization andIC fabrication methods are intertwined, inminiaturization science a much wider variety ofprocesses, more and different materials, andother applications are considered.

INTENDED AUDIENCEMEMS researchers.

Solid State Lighting ISC490 VT · CDCourse level: Introductory


Data to Silicon:Understanding theFundamentals of MDP,Frame Generation, RETand DFMSC505Course level: Introductory

More than ever before, the creation andconversion of design data has become anintegral part of the process of creatingsemiconductor chips. Historically, datapreparation largely consisted of complexBoolean operations, fracturing, framegeneration and job decks. The focus was oncycle time, cost and accuracy. Subwavelengthmanufacturing required for today’s advancedtechnologies requires extraordinarily complexand expensive simulation-based softwaretools and a focus on manufacturability. Thesenew elements require an even broaderunderstanding of the entire process fromdesign to lithography. Nevertheless, theprocess by which IC design data defined andturned into write-ready photomaskmanufacturing data still is not universallyunderstood. This course will provide a basicoverview of the entire design-to-silicon dataflow. It will describe the fundamentals of aGDS2 design database and how this relates tothe selection of manufacturing equipment, andthe relationship to the final photomask andwafer images. The use of Boolean operationsand other manipulations of the design data tocreate photomask layer data, including‘dummy-data,’ OPC and PSM, will also bedescribed. DFM will be defined and a generaloverview of the work being done in the DFMarena to enable high end manufacturing will bepresented. In addition, more traditional back-end functions like reticle layout optimization,frame generation, job decks, and fracturingwill be covered along with an overview of theuse of the SEMI P-10 standard.

INTENDED AUDIENCEThe course is intended for anybody in the ICdesign to manufacturing flow including, ofcourse, mask makers. It presumes at least abasic understanding of what a photomask isand how it is used, including a generalknowledge of the major manufacturing stepsand equipment. However, the concentrationwill be on a layman’s approach to theunderstanding of the principals withoutcomplex scientific discussion. Designers, CADengineers, data prep/planning operators,anybody involved in tapeout, chip-finishingand of course, those in manufacturing whouse, make, or specify masks. Management willdevelop an appreciation for the strategicmanufacturing issues which start back indesign and the earliest stages of technologydevelopment.


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Applying Optical ProximityCorrection and Design forManufacturability to ProductDesignsSC540Course level: Introductory

Optical proximity correction (OPC) is now arequirement for advanced semiconductormanufacturing. OPC alters the designed layoutto compensate for systematic patterningdistortions and/or to implement processlatitude improving methods. Accurate andpractical model-based OPC implementation isneeded with essentially all lithographyresolution enhancement techniques (RET) oncomplex real world designs. This practicalexample-oriented class will prepare attendeesto implement manufacturable rule and model-based OPC on their product designs andintroduce them to optimized OPC, design &process solution methods known aslithographic Design for Manufacturability(DFM).

INTENDED AUDIENCEThis class is intended for lithography, device,product, tapeout, design engineers, andmanagers who need specific knowledge ofOPC & DFM implementation techniques,concepts and issues. The course will be ofvalue to those who develop lithographicprocesses, implement OPC, or have theirdesigns OPC’d.

Photomask Fabricationand Technology BasicsSC579Course level: Introductory

This course provides attendees with a basicknowledge of photomask technology. Thecourse focuses on process flow with emphasisin the challenges associated with design dataconversions, lithography, process, metrology,inspection, and advanced mask manufacture.Other topics such as the application of SPC,signature matching, Phase Shifting Masks,and Imprint Templates will also be covered.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to learn about mask making and itsimpact in the microlithography process. Asthere is a focus on design data conversion andits impact, those who work with advancedsemiconductor designs or deal with maskspecification will find this course valuable.

Photonic Crystals: A CrashCourse, from Bandgaps toFibersSC608Course level: Intermediate

This half-day course will survey basicprinciples and developments in the field ofphotonic crystals, nano-structured opticalmaterials that achieve new levels of controlover optical phenomena. This leverage overphotons is primarily achieved by the photonicband gap: a range of wavelengths in whichlight cannot propagate within a suitablydesigned crystal, forming a sort of opticalinsulator.

The course will begin with an introduction tothe fundamentals of wave propagation inperiodic systems, Bloch’s theorem and banddiagrams, and from there moves on to theorigin of the photonic band gap and itsrealization in practical structures. After that wewill cover a number of topics and applicationsimportant for understanding the field and itsfuture.

Topics will include: the introduction ofintentional defects to create waveguides,cavities, and ideal integrated optical devices ina crystal; exploitation of exotic dispersions fornegative-refraction, super-prisms, and super-lensing; the combination of photonic bandgaps and conventional index guiding to formeasily fabricated hybrid systems (photonic-crystal slabs); the origin and control of lossesin hybrid systems; photonic band gap andmicrostructured optical fibers; andcomputational approaches to understandingthese systems (from brute-force simulation tosemi-analytical techniques).

INTENDED AUDIENCEThis course is designed for engineers andscientists who wish to understand howphotonic crystals work and its potentialapplications to quantum optical devices andoptoelectronics. It is aimed at those who havean understanding of elementaryelectromagnetism and some familiarity withthe applications and governing principles ofoptical devices.

Practical PhotoresistProcessingSC616Course level: Introductory

Photolithography is the technique underlyingall integrated circuit manufacture. To a largeextent, the minimum feature size and theperformance of ICs is determined by theresolution achievable in this step. Also, theprocess yield has a strong impact on a Fab’seconomy. The troubleshooting of photoresistperformance is therefore a key concern to

every microlithography engineer. However, thisrequires a highly interdisciplinaryunderstanding of many areas, fromphotochemistry to polymer science to optics,that are usually not taught in a unified way inmost educational curricula.

In this course, photoresist processing isexamined by walking a wafer through thelithographic sequence, beginning with thewafer preparation and ending when the resistfeature has been prepared for dry etching.Both classic near-UV DNQ/novolak resists aswell as chemically amplified systems (248 and193 nm) will be covered. The chemicalchanges occurring in photoresists during thedifferent process steps will be discussed.Pitfalls and failure modes will be pointed out atevery step and correlated to the underlyingproperties of the photoresist materials. Theaim of the course is to give microlithographyengineers a practical basis from which tobegin the detective work involved in identifyingthe root cause of a processing problem.

INTENDED AUDIENCEThis material is directed to engineers,scientists and managers who work withphotoresist materials. Some chemicalbackground is helpful but not required.

Introduction to Modern ChipDesign MethodologiesSC620Course level: Intermediate

This course will provide attendees with a basicworking knowledge of modern chip designmethodologies. It is intended formanufacturing-oriented professionals with aninterest in the pre-tape-out design side. Thecourse will concentrate on functional, logic,circuit, and layout design using state-of-the-art methods and tools. More focus will begiven to the most popular design styles,including semi-custom design. Many practicaland useful examples will be includedthroughout. Attendees will become fluent withhow one designs modern chips for manyvaried applications. The course price includesa full slide package created by the instructor.

INTENDED AUDIENCEThis material is intended for manufacturing-oriented professionals who want tounderstand the intricacies involved indesigning a chip. Any audience interested inimproving the design-manufacturingcommunication bandwidth will find this coursevaluable.


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Nano-Scale Patterning withImprint LithographySC622Course level: Introductory

This course will start by discussing the basicsof nanoimprint lithography including adiscussion of the various kinds of imprintlithography. It will cover advantages andchallenges of using imprint lithography forsub-100 nm and sub-50 nm patterning. Thecourse will focus on step and repeat UVnanoimprint lithography tools and processes.Specific topics addressed will include: tooldesign and performance, process resolutionlimits, CD control, etch requirements, overlayalignment, process defects, materialsdevelopment, and 1X mask infrastructure.Potential applications of the technology willalso be discussed.

INTENDED AUDIENCEThis material is intended for anyone interestedin learning about sub-100 nm patterning usingimprint lithography. A basic understanding ofsemiconductor process technologies andmask fabrication technologies is desirable butnot required.

Accurate Measurement ofLED Optical PropertiesSC657Course level: Intermediate

This course provides attendees with a workingknowledge of the optical properties of LEDsand how to measure them correctly. Thecourse concentrates on techniques forcontrolling variables that can lead to largeerrors. Traceability to NIST and uncertainty areexplained clearly. Many practical examples areincluded throughout, including actualmeasurements of die and packaged LEDs.Attendees will be able to identify and controlcritical variables to give high accuracymeasurements.

INTENDED AUDIENCEThis material is intended for anyone whomeasures, supervises or specifies opticalproperties of LEDs. Attendees at all levels ofknowledge will benefit from attendance.

COURSE PRICE INCLUDES a CD-ROM copyof the presentations within the course,provided by the instructor.

Nanotribology andNanomechanicsSC660Course level: Introductory


Introduction toMicroMachining UsingLasersSC689Course level: Introductory

This course will discuss several differentaspects of laser micromachining technology.First, a comparative review will be made ofseveral laser technologies including CO2,excimer and Nd:YAG lasers. Several types ofCO2 lasers will be discussed, followed by anexamination of several different types of UVlasers including frequency shifted solid stateand excimer lasers. IR and UV material/photoninteraction, basic optical components andsystem integration will also be discussed.Finally, real applications from the medical,microelectronic, aerospace and other fieldswill be presented.

INTENDED AUDIENCEThe course will benefit anyone with an interestin small-scale industrial laser machining andachieving the best edge quality, highestresolution and cost effectiveness.

Quantum Dot LEDs andLaser DiodesSC698Course level: Intermediate


Polymer MicrofabricationSC699Course level: Introductory


Instruments andMethodologies for AccurateMetrology and FleetMatchingSC705Course level: Intermediate


Imaging and OpticsFundamentals inMicrolithographySC706Course level: Advanced

Optical imaging in microlithography involvesthe physical formation of sub-micronstructures within a photosensitive material forsubsequent transfer into underlying films orsubstrates. Since the optical exposuresystems used in lithography are some of themost advanced and complex opticalinstruments ever built, they involve ever morecomplex illuminator designs, nearly aberrationfree lenses, and hyper numerical aperturesapproaching unity and beyond.

Fortunately, the lithography community hasrisen to the challenge by devising manyinventive methods to characterize andoptimize exposure systems. Moreover, theadvanced use of simulation not only tiestogether characterization data to form acohesive picture of exposure systemcapability, but it allows for a shorter time todevelopment if the appropriate modelcalibration is successfully used. The imagingtheory and models that are subsequently usedin this industry, either in commercial or in-house simulation packages, have successivelyevolved in complexity with each newgeneration of the optics, but can seem verycomplicated to the uninitiated.

This course will cover and explain thefundamentals behind imaging and optics instate-of-the-art microlithography. The basicoptical concepts will be explained, includinghyper-NA, polarization, and immersion optics.A systematic, step-by-step construction ofpartial coherent imaging models will bedeveloped for vector and scalar assumptions.The description is enhanced by simpleapplication examples to allow these models tobe easily understood. Additional techniquesare described that reduce the complexity ofthese models to allow for the formation ofexposure tool performance prediction.

INTENDED AUDIENCEThis course is targeted at the lithography oroptical engineer with an interest inunderstanding advanced imaging with anemphasis on methods to simulate, model andcharacterize the behavior of the lithographicexposure system. The student should befamiliar with basic Fourier transforms.


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Basics of Optical Imaging inMicrolithography: A Hands-on ApproachSC707Course level: Introductory

A basic ‘hands on’ lecture is presented, inwhich students are given various opticalcomponents, including a source, lenses,gratings, etc., that are used to build a personaloptical bench. Basic concepts of imaging,resolution, coherence factor, on-axisillumination, off-axis illumination, binary masks,phase-shift masks, etc., are examined by thestudents operating in small groups under thedirection of the instructor. These concepts arerelated to real lithographic systems using basicprinciples and simulation. This course isintended to provide a foundation for the follow-on course, “Imaging and Optics Fundamentalsin Microlithography” (SC706).

INTENDED AUDIENCEThis course is targeted at the lithographicengineer, scientist, manager or technician withan interest in understanding basic imagingconcepts with an emphasis on doingexperiments and “seeing” the results.

Impact of Variability on VLSICircuitsSC708Course level: Intermediate

Sub-90nm CMOS technologies are giving riseto significant variation in physical parametersof VLSI designs which has adverse impact ontheir electrical behavior. Most manufacturing-oriented professionals are familiar with thevariations in physical parameters. This coursewill provide attendees with knowledge of howthese physical variations impact the circuitoperations, i.e., their electrical behavior. Theimpact on timing as well as power will bediscussed. We will describe relative impact ofthese variations on various circuit families aswell as circuit design techniques to mitigate theimpact of manufacturing variations. Due to thelarge mangnitude of these variations, it is clearthat designing for worst case behavior leavessignificant performance on the table. We willdiscuss how systematic variation can beexploited in the current static timingmethodology if it is known. A statistical timingand design methodology will also be discussedthat can help regain some of this performance.With an eye towards the future, we will alsoexplore manufacturing aware design closure.The course will be illustrated with practicalexamples throughout.

INTENDED AUDIENCEThis material is intended for bothsemiconductor manufacturing and designprofessionals who want to understand theinteration between manufacturing variation anddesign closure.

Optical LithographyExtension: Design forManufacturing andNew ResolutionEnhancement TechniquesSC724Course level: Advanced

Optical lithography has been extendedthrough the use of resolution enhancementtechniques (RET) like off-axis illumination,phase-shifting mask, and proximity effectcorrection. As these techniques reach theirlimits, their practical implementation becomesmore dubious and requires a carefulconsideration of their use at the design phasein order to achieve sufficient yields.

Recently the field of design formanufacturing (DFM) has enjoyed a largesuccess in part because of the poor ramp-upof the latest technology nodes due to limitedprocess latitude at low k1.

At the same time, the industry is looking fornew ways to improve the resolution and theprocess latitude on the wafer by using newresolution enhancement techniques goingbeyond the established techniques (off-axisillumination, phase-shifting mask, andproximity effect correction). These newtechniques include immersion lithography, theuse of polarized sources, or the use of multipleexposures.

This course will describe the most relevantdesign for manufacturing techniques and theirpractical implementation. The fundamentals ofthe new resolution enhancement techniqueswill also be explained and their implementationwill be discussed. This course is the secondpart of a two part sequence but each part canbe taken separately.

INTENDED AUDIENCEThe course is intended for those involved inthe semiconductor lithography business,including but not limited to engineers,scientists, and technicians.

Nano-Photonics:Physics and TechniquesSC742Course level: Intermediate

This course will start with an introduction tophotonic crystals, photonic crystalnanocavities, and lasers fabricated in thinsemiconductor slabs containing quantumwells. The applications of high Q cavitiescontaining single quantum dots and thedemonstration of strong coupling betweencavities and light emitters will be described forquantum information processing. This will befollowed by a description of the integrationopportunities of photonic crystal cavities withvertical cavity surface emitting lasers. Thecourse will also cover photonic crystal

waveguides, dispersion control in photoniccrystals and the opportunities of super-prismsand the challenges of coupling into photoniccrystals from conventional index guidedwaveguides. Finally, a comparison will bemade between photonic crystal geometriesand conventional high index optics, and theapplications of photonic crystal andnanophotonic devices in chemical andbiological sensors will be outlined. At the endof the course, surface plasmon enhanced lightemitters and waveguides will be introduced,and their applications in highly efficient solid-state light emitters will be summarized.

INTENDED AUDIENCEThis course is intended for those interested inthe opportunities and problems associatedwith miniaturizing and integrating opticaldevices with electronics and fluidics.

Micromachining withFemtosecond LasersSC743Course level: Intermediate


SemiconductorOptoelectronic DeviceFundamentalsSC747Course level: Introductory

This provides a review of the basics ofsemiconductor materials, with primaryemphasis on their optoelectronic properties.The motion of electrons and holes isdiscussed, and photon absorption andgeneration mechanisms are presented. Thecourse examines basic device structures suchas quantum wells and quantum dots, Braggreflectors, cascade devices, distributedfeedback devices, avalanching, tunneling, andvarious electro-optic effects. Device operatingprinciples are presented, and an overview ofcurrent device applications is given. Theparticipants should walk away with a goodunderstanding of semiconductoroptoelectronics covering the entire UV toterahertz spectral region, including devicessuch as diode and cascade lasers, LEDs,SLEDs, VCSELs, modulators, andphotodetectors.

INTENDED AUDIENCEAimed at managers, engineers, systemdesigners, R&D personnel, and techniciansworking on components and sub-assembliesas well as systems. No formal mathematics orphysics background is necessary.


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Polarization forLithographersSC779Course level: Intermediate

The advent of ultra high numerical aperture(NA) systems enabled by immersionlithography has quickly brought polarizationtoward the top of the lithographer’s list ofconcerns. A high index liquid between theresist and the last lens element allows betterresolution by enabling larger angles ofincidence, and thus more diffraction energy tocouple into the resist. However variouspolarizing effects can become severe withthese large angles of incidence. Most notablycontrast from the TM component drops to nearor below zero. Thus, the engineering ofpolarization states is becoming a necessaryresolution enhancement technique.Consequently, understanding and controllingpolarization throughout all components of theoptical system become critical.

This course provides the lithographer a basicknowledge of polarization and its application tohigh-NA imaging. After an introduction to theconcept of polarization and the various ways itcan be represented, both the benefits andlimitations of its application to lithography arediscussed. The polarizing effects of eachcomponent of the optical system areaddressed, offering an understanding of theirultimate impact on imaging.

INTENDED AUDIENCEThis course is intended for lithographers whowant to understand polarization. Those who tryto apply polarization for lithography applicationwill find this course valuable. This course hasno prerequisites.

Tracks 101: MicrolithographyCoat and Develop BasicsSC780Course level: Introductory

This course provides attendees with a basicworking knowledge of microlithography coatand develop or “track” processes. “Track” isthe industry jargon for the equipment used todeposit photoresist and subsequently developthe image after the substrate has beenexposed. The course provides insight onprocess, equipment setup, andtroubleshooting, focusing mainly on thehardware and the hardware’s impact on theprocess results. Many practical and usefulexamples are included throughout. You willbecome fluent with “track” parameters formany varied applications. The course priceincludes the course presentation materials bythe instructor.

INTENDED AUDIENCEThis material is intended for lithographyengineers with little to no track experience. Thecourse is also a good primer for managers andnon-lithography engineers to gain a workingknowledge of the “track” hardware andprocesses.

Aerospace MiniaturizationUsing Multifunctional MEMSSC785Course level: Intermediate

Spacecraft and robotic vehicle miniaturizationis a topic of increasing interest amongaerospace engineers from academia, industryand government. Miniature spacecraft promisetruly cost-effective and rapid access to space.However, traditional paradigms used for thedesign and construction of conventional, largespacecraft are no longer applicable under thesevere constraints of mass, size and powerfaced by miniature spacecraft. In order toexploit the full potential of miniaturespacecraft, a radically new MultifunctionalMicro Systems (MMS) approach is required.This course provides attendees with anadvanced working knowledge of MMSarchitecture for both miniature spacecraft androbotic vehicles. Rather than the conventionalapproach of integrating dedicatedsubsystems, the MMS approach takes a “topdown” approach of optimizing the overallminiature spacecraft architecture as anintegrated set of functions. The courseconcentrates on system configurations andperformance optimization and analysis of bothsoftware and hardware aspects. AdvancedMicro Electro Mechanical Systems (MEMS)-based functional blocks are incorporated intothe MMS design. Attendees will becomefamiliar with the process for designing modularand scalable MEMS systems for MMSapplications. Many practical and usefulexamples of MMS architectures will beprovided.

INTENDED AUDIENCEThis material is intended primarily forengineers and scientists involved in thedevelopment of miniaturized systems, andwould like to learn to optimize the design ofsuch systems using a Multifunctional MicroSystems approach. Aerospace professionalsinvolved in the design of advanced spacecraftwill find this course valuable. The coursecaters to an audience with a range ofbackgrounds from basic to advanced.

COURSE PRICE INCLUDES a CD-ROMcontaining the text Miniaturized MultifunctionalSystem Architecture for Satellites andRobotics by Fredrik Bruhn.

Optoelectronic Devices:Introduction to Physics andSimulationSC801Course level: Introductory


Principles of GaN-basedDevicesSC822Course level: Introductory

The course introduces basic physicalprinciples of nitride semiconductor devicessuch as light-emitting diodes, laser diodes,and transistors. Design and operation ofpractical devices is explained and analyzedusing advanced computer simulation.Mathematical models and available softwarepackages are reviewed briefly. Key materialproperties are reviewed and their impact ondevice performance is investigated. Practicalsimulation results provide a deep insight intointernal device physics and help to understandperformance limitations. Some novel deviceconcepts are discussed.

INTENDED AUDIENCEStudents, device engineers, and researcherswho are interested in a deeper understandingof nitride device principles and in usingadvanced simulation software for designingand analyzing GaN-based devices.

COURSE PRICE INCLUDES the text NitrideSemiconductor Devices: Principles andSimulation (Wiley, 2007) edited by JoachimPiprek.

Recent Advances in ElectronBeam LithographySC830Course level: Intermediate

This course provides attendees with acomprehensive knowledge of recent advancesin electron beam lithography. The courseconcentrates on innovative new techniqueswhich have been and still are being developedto overcome throughput limitationsencountered with more conventional e-beamsystems. The new electron optics techniquesare based on ‘massively parallel’ projection ofpixels and several practical examples of theseemerging lithography technologies arepresented and analysed. The various technicalchallenges of ongoing tool developmentefforts are discussed together with theirpotential for advancing the state-of-the-art inelectron beam lithography. Applicationsconsidered for these new lithography tools arediscussed in context of their lithographiccapability, their business value and viability.You will be able to identify emerginglithographic technologies by their specific levelof complexity which will enable you to judgetheir applicability and opportunity for success.The course price includes a complete set ofblack and white handouts of the chartspresented by the instructor.



Micro/Nano Lithography & FabricationINTENDED AUDIENCELithography and device engineers andmanagers will gain knowledge of latestadvances in electron beam lithography andtheir potential applications in thesemiconductor fabrication process. Anundergraduate education in physics orengineering is recommended together withcourse SC100, Introduction to Electron BeamLithography.

Introduction toScatterometry Metrology:Theory and ApplicationSC831Course level: Introductory

This course provides an introduction to thetheory of scatterometry metrology, as well asits application for process control insemiconductor manufacturing. Both thesoftware and the hardware portions of thescatterometry system are covered.Scatterometry is an optical method tomeasure profiles (CD, sidewall angle, height)features on semiconductor wafers andphotomasks. Scatterometry is becomingwidely adopted for production-worthymetrology as an alternative andcomplementary tool to CD-SEM and AFM.

INTENDED AUDIENCEThis course is intended for metrology andprocess engineers who use, or intend to use,scatterometry metrology in a wafer fab.

IP Issues in AdvancedLithography andSemiconductorManufacturingSC832Course level: Introductory

The semiconductor industry is known for itsculture of innovation and for havingrecognized early on the value of protectingintellectual property (IP). For better or worse,this has left the IP spaces of its varioustechnologies densely packed and highlycompetitive. Yet the continuing emphasis onIP, the omnipresent technological challenges(as reflected by Moore’s law), and competitivepressures require semiconductor businessesto constantly innovate and protect their IP justto keep apace. Industry and academic effortsdirected to advanced lithography and theattendant rush to occupy its IP spacesillustrate the dynamic interplay betweenbusiness, legal and technical goals thatpervades virtually all semiconductortechnologies.

The aim of this course is to provide theaudience with a modern view of the nature ofIP in semiconductor manufacturing and thekey IP issues, with special emphasis onadvanced lithography. The key IP issuesaddressed include: dealing with dense IPspaces, managing IP for both mature andemerging technologies, the role of IP licensingand cross-licensing, IP litigation, optimizing IPbusiness value, protecting core IP from valueerosion, joint development efforts andagreements, IP space mapping, the changingnature of patenting in high-tech business, andothers. Advanced lithography IP spaces arealso explored and discussed in connectionwith the various IP issues and topics covered.The course includes a “round table”discussion session with the course attendeesbased on real-life issues, fact-patterns andquestions raised prior to or during the course.Attendees are invited to submit discussiontopics to the instructor they would like to seeaddressed in the course and/or discussed inthe roundtable discussion (send discussiontopics to: [email protected]).

INTENDED AUDIENCEThis course is designed for those interested inIP issues in the semiconductor industry, andparticularly those that have an interest inadvanced lithography technologies.

Lithography Integration forSemiconductor Back-End-Of-The-Line (BEOL)SC833Course level: Introductory

Semiconductor Back-End-Of-The-Line (BEOL)or interconnect constitutes the bulk of the filmstack and the fabrication cost of moderncomputer chips. The state-of-the-art BEOLfeatures Cu/low-k interconnects with adielectric constant (k) of the low-k material ofabout 3.0. These Cu/low-k interconnects arefabricated predominantly with a dualdamascene process using plasma-enhancedCVD (PECVD) deposited interlayer dielectric(ILDs) and PVD Cu barrier materials.Successful fabrication and qualification ofmodern semiconductor BEOL requires a deepunderstanding of the intricate interplaybetween materials and processes employed.This course provides an overview of modernsemiconductor BEOL, its integration schemesand fabrication processes. It highlights uniquechallenges in lithography for BEOL anddiscusses potential solutions as well aspractical techniques. The goal of this course isto provide materials and lithography engineersa fundamental basis to develop materials andprocesses for BEOL patterning and to troubleshoot BEOL fabrication problems.

INTENDED AUDIENCEThis course is designed for engineers,scientists, managers, technicians, andtechnical support, marketing and salepersonnel of BEOL lithographic materialsuppliers as well as engineers, scientists,managers, and technicians in BEOLlithography development and manufacturing. Itis also intended for those who have a generalinterest in semiconductor BEOL.

Lithography Friendly Designand Beyond - A BroaderReview of DfMSC834Course level: Advanced

As the microelectronic industry’s need fordimensional scaling continues to outpace theavailability of patterning systems withsufficient resolving power, resolutionenhancement techniques (RET) of everincreasing complexity are becomingcommonplace. The most severely resolutionchallenged products competing at the leadingedge of the technology roadmap, are relyingon lithography friendly designs as a keycomponent of their design formanufacturability (DfM) strategy. This coursewill explain lithography resolution limits, basicconcepts of RET and their layout impact, andoptimization techniques for high resolutionlithography. The increasing importance oflithography friendly design, however, does notalleviate the need for other DfM techniquesaddressing random and systematic failuremechanism such as critical area analysis(CAA), layout redundancy, or chemicalmechanical polishing (CMP) aware layoutoptimization. This course will review a varietyof process characterization techniques andtheir uses in DfM. Combining distinctlydifferent DfM techniques into a cohesiveoptimization solution and then integrating thissolution into existing design flows presents itsown set of challenges. By reviewing the basicelements of common design flows andexploring how emerging and established DfMsolutions affect such flows, this course willconvey a broad system level view of anintegrated DfM approach.

INTENDED AUDIENCEThis course is intended for anyone who isfascinated with the apparently suddenescalation of interest in DfM within thelithography community. Those that operate inany specific function within the design-to-silicon flow will get a glimpse at the broaderchallenge. Lithographers and processengineers will be introduced to layout issueswhile chip designers will better appreciate thegrowing need for change.


Nanotechnology

Fabrication and Processingof NanostructuresSC496Course level: Introductory

The objective of this course is to provideattendees with a good understanding of thefundamentals and comprehensive knowledgeof the recent advances in nanostructurefabrication and processing. Specifically, thiscourse will cover (1) basic principles (includingthermodynamics, kinetics and mass transfer)related to nanoscale fabrication andprocessing, (2) a comprehensive review of theestablished techniques and methods in thesynthesis of nanostructured materials andnanoscale structures, and (3) variousapplications of the above techniques andmethods. The detailed subjects will includeself-assembly, fundamentals of colloids andrelated topics, quantum dots (zero-dimensional nanostructures), quantum wires(one-dimensional nanostructures), softlithography, and applications ofnanostructured materials.

INTENDED AUDIENCEAnyone who wants to learn the know-how tofabricate nanostructures and synthesizenanomaterials, and/or to acquire a betterunderstanding of the fundamentals innanostructure processing. This course will beof value to those who either have beenworking on the synthesis of nanomaterials andfabrication of nanostructure, or those who planto enter the field. This course will also bevaluable to those who want to have a generalknowledge of nanotechnology andnanoscience.

COURSE PRICE INCLUDES the textNanostructures And Nanomaterials: Synthesis,Properties And Applications (2004) byGuozhong Cao.

NanophotonicsSC497Course level: Introductory

Nanophotonics, defined as nanoscale opticalscience and technology, is a new frontier. Itoffers challenging opportunities for studyingthe interaction between light and matter on ascale much smaller than the wavelength ofradiation, as well as for the design of novelnanostructural optical materials and devices.Furthermore, the use of such a confinedinteraction to spatially localize photochemicalprocesses offers exciting opportunities fornanofabrication. Nanophotonics is thus ofconsiderable technological significance.Nanophotonics also has important biomedicalapplications in bioimaging, optical diagnosticsand photodynamic therapy. This course willcover the fundamentals of nanoscale light-matter interaction; various nanoscale linearand nonlinear optical effects; near fieldgeometry to probe nanoscale interactions;near field microscopy to probe nanoscale

structure and dynamics; near field microscopyfor nanoscopic imaging and bioimaging;photonic crystals and ordered nanoscalematerials; nanocomposites for photonics;novel optical effects in nanostructuralmaterials; nanofabrication using nanoscalephotochemistry; and applications ofnanophotonics for bioimaging, opticaldiagnostics and light activated therapy.

INTENDED AUDIENCEThis course is intended for anyone who needsto learn about light-matter interactions atnanoscale as well as the applications ofphotonics for nanotechnology andnanobiotechnology. The course is appropriatefor a multidisciplinary audience includingengineers, materials scientists, opticalphysicists, theorists, chemists and biomedicalresearchers.

Nanotribology andNanomechanicsSC660Course level: Introductory

This course provides attendees with a basicworking knowledge of nanotribology andnanomechanics and applications of MEMS/NEMS. The course concentrates on the recentresearch carried out using atomic forcemicroscopy. Topics include:

Principles of Nanotribology andNanomechanics: Tribology including anoverview of surface roughness, friction,interface temperatures, wear, and lubrication;micro/nanotribology and materialcharacterization studies using atomic/frictionforce microscopy; including an overview offriction, lubrication, scratching, wear andindentation/localized deformation.

Adhesion and Stiction: mechanisms ofsolid-solid adhesion; mechanisms of liquidmediated contact; adhesion measurementtechniques; lubrication approaches and typicalstiction data; examples of methods to reduceadhesion and stiction in magnetic storagedevices and MEMS/NEMS

Applications to MEMS/NEMS andBioMEMS/NEMS: current status of micro/nanodevices in the market place; tribologicalissues in MEMS/NEMS and BioMEMS/NEMS;importance of mechanics of nanostructures;micro/nanotribological studies of MEMSmaterials and lubricants for MEMS/NEMS andBioMEMS/NEMS; component level studies;mechanics of nanostructures; directions andthe future of MEMS and nanodevices.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to learn how to carry out nanocharacterization of components and devices,understand failure modes and developalternate design and material concepts. Thosewho either design their own nanodevices orwho work with designers will find this coursevaluable.

COURSE PRICE INCLUDES the textIntroduction to Tribology by Bharat Bhushan.

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Courses at SPIE EventsLive instruction for Nanotechnologywill take place at the SPIE Eventslisted below. Registration and courseinformation is available 12 weeksprior to the event dates.

Photonics West

Microlithography

Optics & Photonics














Carbon Nanotubes:Properties, Growth, andApplicationsSC671Course level: Introductory

Carbon nanotubes, which have attracted asignificant amount of research attention inrecent years, are promising one-dimensionalnanomaterials as building blocks for “bottom-up” assembly of nanoscale devices. Thiscourse provides an introduction to carbonnanotubes, focusing on three main subjectareas: Properties of carbon nanotubes; growthand assembly techniques; and applications invarious fields. Specific topics will include therole of carbon nanotubes in nanotechnology,recent advances in chemical vapor depositiongrowth and assembly of carbon nanotubes,applications of nanotubes as transistors,electromechanical systems, and chemicalsensors, and fabrication methods of nanotubebased devices.

INTENDED AUDIENCEScientists and engineers in any field who wantto have a general knowledge of carbonnanotubes and their role in nanotechnology.

NanoplasmonicsSC727Course level: Intermediate

Nanooptics deals with optical phenomena andspectroscopy on the nanoscale, i.e., in theregions of space whose size is much smallerthan the light wavelength. Whileelectromagnetic waves cannot be localized inthe regions with sizes significantly less thanhalf wavelength, nanooptics is based onelectric fields oscillating at optical frequency.From the positions of the interaction withmatter and spectroscopy, such local opticalfields mostly produce the same type ofresponses as electromagnetic waves.Elementary excitations that are carriers ofenergy and coherence in nanooptics aresurface plasmons (SPs). These local fieldscause a wealth of gigantically enhancedoptical phenomena of which the surfaceenhanced Raman scattering (SERS) is themost studied and widely known.This one-day course will encompass thefundamental properties and applications of thesurface plasmonics at the nanoscale. It willinclude coherent effects associated withphase memory of the SPs, in particular,coherent control of nanooptical phenomena.Nonlinear processes such as generation ofharmonics and two-photon excitation bynanoscale fields will also be covered. Ultrafast(femtosecond and attosecond) phenomena arewithin the scope of this course. We will alsoinclude quantum phenomena associated withproperties of surface plasmons as quantumquasiparticles such as quantum generationand fluctuations. Along with fundamentalproperties of SPs, we will consider manyapplications of nanoplasmonics, in particular,detection of ultrasmall amounts of chemicaland biological compounds, scanning near-fieldoptical microscopes or SNOMs, andnanolithography.

INTENDED AUDIENCEThis course is intended for engineers,physicists, chemists, and biologists interestedin fundamentals and applications ofnanooptics.

Nanotechnology


training, anytime.


Gratings, Mono-chromators, andSpectrometersSC040Course level: Introductory

This course introduces gratings,monochromator, and spectrometer operationsto the novice. Using a minimum ofmathematics, this course provides thefundamental concepts necessary to thesuccessful implementation of these frequency-selective devices. The differing frequencyscales (gigahertz, Angstroms, inversecentimeters, nanometers, microns, etc.) aredescribed and compared. The basic operationof gratings is reviewed, including issues ofblaze, holographic gratings, backlash, andresolving power. The implementation ofgratings into spectrometers andmonochromators are addressed. The FabryPerot device is discussed, emphasizing its usefor laser frequency analysis. Other spectralanalyzing interferometers are explained,including the Michelson and the Fizeau.

INTENDED AUDIENCEThis course is for engineers, technicians, andmanagers who need to gain a familiarity withfrequency analysis of optical signals, withgrating spectrometer devices, and with otherspectroscopic techniques.

Imaging SpectrometrySC153Course level: Intermediate

This course covers the design of imagingspectrometers, from instrumentation to dataexploitation. Emphasis is placed on scanningsystems in recognition of their prevalence. Allsystem concepts are discussed from theperspective of acquiring an image cube.Example systems (AVIRIS, HYDICE, etc.)illustrate current design practices. Noise-equivalent spectral radiance (NESR) will beintroduced and explained. In addition, dataexploitation is discussed and examplesdemonstrated.

INTENDED AUDIENCEThis course is intended for engineers,scientists, and program managers interestedin a full summary of imaging spectrometry.Anyone looking at recent advances design anddata-exploitation techniques can benefit fromthis practical tutorial. To benefit maximallyfrom this course, attendees should be familiarwith the materials covered in SPIE SC040,Gratings, Monochromators, andSpectrometers, or equivalent.

Imaging PolarimetrySC180Course level: Advanced

This course covers imaging polarimeters froman instrumentation-design point of view. Basicpolarization elements for the visible, mid-waveinfrared, and long-wave infrared are describedin terms of Mueller matrices and the Poincarésphere. Polarization parameters such as thedegree of polarization (DOP), the degree oflinear polarization (DOLP) and the degree ofcircular polarization (DOCP) are explained inan imaging context. Emphasis is on imagingsystems designed to detect polarized light in a2-D image format. System concepts arediscussed using a Stokes-parameter(s0,s1,s2,s3) image. Imaging-polarimetersystems design, pixel registration, and signalto noise ratios are explored. Temporalartifacts, characterization and calibrationtechniques are defined.

INTENDED AUDIENCEThis course is for engineers, scientists, andprogram managers interested in an overviewof imaging polarimetry. The tutorial is intendedto give students intuitive insight intofundamental concepts with a minimum ofrigorous mathematical treatment. To benefitmaximally from this course, attendees shouldbe familiar with the materials covered in SPIESC206, Introductory and Intermediate Topicsin Polarized Light.

Predicting Target AcquisitionPerformance of Electro-Optical ImagersSC181Course level: Advanced

This course describes how to predict therange-dependent probability that a target willbe detected, recognized, or identified whenusing an electro-optical (EO) imager. The“target” can be a tank, a man, a handgun, aknife, or any object of interest. The detection,recognition, and identification tasks arediscussed, and the meaning of acquisitionprobabilities is explained. The basic theory ofoperation of thermal imagers, imageintensifiers, and video cameras is presented.This course describes how to quantify theresolution and noise characteristics of an EOimager. The theory and analysis of sampledimagers is emphasized. Image quality metricsare described, and the relationship betweenimage quality and target acquisitionperformance is explained. The course providesa complete overview of how to analyze theperformance of EO imagers.

INTENDED AUDIENCEThis course is intended for the design engineeror system analyst who is interested inquantifying the performance of EO imagers.Some background in linear systems analysis ishelpful but not mandatory.

Industrial Sensing & Measurement

FCCourses at SPIE EventsLive instruction for IndustrialSensing & Measurement will takeplace at the SPIE Events listed below.Registration and course informationis available 12 weeks prior to theevent dates.

Photonics West

Microlithography

Defense & Security

Optics & Photonics

Optics East

Optifab 2007














Image Recognition UsingStatistical FilteringTechniques, Wavelets andNeural NetworksSC189Course level: Intermediate


Fourier TransformSpectrometry: Theory,Methods, and NewApplicationsSC410Course level: Introductory

The Fourier transform spectrometer (FTS) hasbeen recognized as a critical technology forremote sensing and is central to many NASA/ESA missions. The FTS enables a large familyof visible and infrared applications fromlaboratory studies to atmospheric sounding toplanetary exploration. In essence, the FTSinstrument is a realization in glass and metal ofFourier’s theorem. Consequently, designingthe instrument requires a firm grounding inboth optics and digital signal processing—sothat one can ‘see’ through the Fouriertransform and relate the measured signal (theinterferogram) to the desired spectrum andunderstand the distortions of the spectrumintroduced by the transfer function of theinstrument. The course will be divided into twoparts: theoretical and practical considerationsand a survey of implementations andapplications.

INTENDED AUDIENCEThis course will benefit anyone who needs tolearn how to design or use spectral separationsystems and interferometric systems inspecific. This course will be of value to thosewho either design their own instruments, orthose who work directly or indirectly withinstrument designers, or have purchased acommercial instrument.

COURSE PRICE INCLUDES the text FourierTransform Spectrometry (Academic Press,2001), by Mark Abrams.

Accuracy of InterferometricMeasurements for Nano-MetrologySC562Course level: Intermediate

This course gives the attendees insight intothe physical principles that enable and limitthe possibilities of metrology at the nm-uncertainty level. An overview will be given ofmeasurement techniques and principles thatare available, with emphasis on their suitabilityfor accurate measurements. Special attentionwill be given to laser-interferometry. Thistechnique for measuring displacements can beused in several ways as part of a nanometermeasuring- or manufacturing device. Anotherimportant measuring technique is themeasurement of flatness and form deviationsby Fizeau or similar interferometers. It will bedemonstrated where the limits are and howthese can be established for this technique.Examples will be given in the measurement ofnanostructures.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to learn about interferometry for nano-metrology applications. Those who alreadyapply these techniques, as well as those whoconsider doing so, will find this coursevaluable.

How to Use Machine VisionIn Your Industrial InspectionApplicationSC583Course level: Introductory

This course will provide the potential user,developer, or current practitioner with a broadunderstanding of the tools available for theapplication of machine vision and opticalmetrology methods as applied to industrialinspection and measurement needs. Materialcovered in this course will include theselection of optical components such aslenses, filters, cameras and light sources toachieve specific performance objectives. Inaddition, this course will review a wide rangeof standard and specialized methods oflighting, imaging and analyzing industrial partsusing current off-the-shelf systems andsoftware packages. Finally, this course willprovide case study examples of successfulapplications and the steps needed to reachsuch success. Attendees are encouraged tobring their application problems for a hands-on workshop session with actual machinevision hardware and software at the end of thecourse.

INTENDED AUDIENCEThis course is intended for the engineer ortechnician who needs to understand thepractical details involved in developingsuccessful machine vision applications.

Night Vision Tools forHomeland SecuritySC584Course level: Introductory

For more than half a century the military hasbeen the driving force in the evolution ofphotonics night vision devices and systems.The benefits to the scientific industrial and lawenforcement communities have beennumerous, and new applications for thesedevices to homeland security continue toemerge.

This course will trace the evolution of nightvision imaging through several generations ofimage intensification and thermal imagingdevices. The curriculum will include a briefreview of the basic principles of imageintensification and infrared thermal imaging.You will be shown classic and innovative fieldapplications of the new compact, highperformance thermal viewing devices with astrong emphasis on homeland security. Youwill learn how the new generation ofinstruments is applied to the solution of a widevariety of problems in:• Border, port, airport and perimeter security

and surveillance• Detection of land mines, hidden

compartments and disturbed surfaces• Biosensing for SARS, human stress and

related topics• Law enforcement• Search and rescue• Firefighting• Plant facility security and maintenance

INTENDED AUDIENCESecurity specialists, technologists andmanagers and who wish to learn how to applyinfrared thermal imaging and imageintensification to solving problems related tohomeland security.

COURSE PRICE INCLUDES the text PracticalApplications of Infrared Thermal Sensing andImaging Equipment, Second Edition (SPIEPress, 1999) by Herbert Kaplan.

Introduction toMicroMachining UsingLasersSC689Course level: Introductory



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Polymer MicrofabricationSC699Course level: Introductory

This course provides attendees with anintroductory overview on the fabricationmethods and applications of polymer basedmicrosystems, including an examination offabrications methods such asphotolithography, LIGA, laser ablation, casting,hot embossing and injection molding. Thecourse covers an overview on polymermaterials, the methods used in opticalpatterning, and replication methods for high-volume fabrication. Based on a variety ofpractical examples in microoptics, BioMEMSand medical devices, you will be able tounderstand the basic principles of thefabrication methods as well as identifypossible solutions for your specific applicationarea. The course will provide a practicalapproach to microfabrication techniques andthe necessary equipment.

INTENDED AUDIENCEThis material is intended for a technical ormanagerial audience with an interest inmicrofabrication techniques and applications.For those with an education and knowledge inclassical silicon MEMS it will prove a valuableextension of their know-how.

Instruments andMethodologies for AccurateMetrology and FleetMatchingSC705Course level: Intermediate

This course teaches the methodologies oftotal measurement uncertainty analysis andfleet matching. The course concentrates onthe theory of Mandel analysis and applicationsfor metrology instrument optimization andassessment. Case studies include assessingCD-SEM, scatterometry, dualbeam, and CD-AFM as well as optimizing CD-SEM algorithmsand scatterometer models for targetedapplications. A methodology for fleet matchingbased on Mandel analysis that aids in theidentification of major detractors will also bepresented with examples in CD and overlaymetrology.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to learn how to critically evaluatemetrology instruments for accuracy, precision,and matching. Those who need to optimizemetrology instruments with the right balanceof precision and accuracy will find this coursevaluable. Those who are responsible formaintaining a well-matched fleet of metrologyinstruments will also find this metrology useful.

NIR and SWIR ImagingApplicationsSC710Course level: Introductory


Cost-Conscious Tolerancingof Optical SystemsSC720Course level: Introductory


Diffuse OpticalSpectroscopy and Imagingof TissuesSC749Course level: Intermediate

This course covers fundamentals and recentadvances in in-vivo near-infrared (NIR)spectroscopy and imaging of deep biologicaltissues. The course reviews physical andphysiological background of light transport intissues: absorption and scattering of light,optical properties of tissues and relatedphysiological quantities such asconcentrations of fat, water and hemoglobin.The background also includes physicalprinciples of quantitative spectroscopy andimaging and is followed by the discussion ofthe design of the near-infrared time-domain,frequency-domain, continuous wave, andoptoacoustic systems for spectroscopic andimaging applications in deep tissues.

The course concentrates on the humanapplications of the spectroscopic and imagingNIR techniques.

Spectroscopic applications reviewedinclude bone marrow, peripheral vasculardisease and sleep apnea studies. NIR imagingapplications in neonatal brain imaging,functional brain activity studies, andmammography are included. Applications ofNIR imaging in combination with MRI are alsoconsidered. The practical demonstration of aNear Infrared Tissue Oximeter (ISS,Champaign IL) will teach you how to measurehemoglobin concentration in tissues.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to learn about near-infraredspectroscopy and imaging of deep biologicaltissues. The course is appropriate for amultidisciplinary audience including engineers,optical physicists, and biomedical researchers.SPIE course SC029 or video VT029, TISSUEOPTICS, is recommended.

Vibrational Spectroscopy:From Physics to MedicineSC751Course level: Introductory

Vibrational spectroscopy offers theopportunity to investigate the composition ofunknown substances on a molecular basis.Although this fact was discovered long ago,recent technical advances have generatedstrong and increasing interest in theapplication potential of molecular vibrationalspectroscopy, particularly in biology andmedicine. This half-day introductory course isintended for those who are entering the fieldsof infrared, Terahertz or Raman spectroscopyand/or its applications to biology andmedicine.

The course will start with a short illustrationof the theoretical origin of molecular vibrationsand their spectroscopy. The fundamentaltechnical options for vibrational spectroscopywill be outlined together with selectedspecialized techniques such as attenuatedtotal reflection (ATR) spectroscopy or surface-enhanced Raman spectroscopy (SERS).Following an introduction into the qualitativeinterpretation of spectra in terms of commonchemical groups, quantitative analysismethods as well as classification and patternrecognition techniques will be explained in asimple and practice-oriented way. Finally,selected application examples in the fields ofmicrobiology, laboratory diagnostics,veterinary medicine, and molecular imagingwill be presented.

INTENDED AUDIENCEThis introductory course is directed atengineers, scientists, and physiciansinterested in the spectroscopy of molecularvibrations and its applications to biology andmedicine. Those who recently entered the fieldof biomedical vibrational spectroscopy, whoare specialized in one of the above topics butwant to learn more about the other aspects, orwho in general want to become more familiarwith the overall concept of this emerging fieldwill particularly benefit from this course.



Practical Implementations ofMachine Vision Systemswithin Technical ProcessesSC767Course level: Intermediate

This course is intended to support engineerswho develop and design industrial machinevision applications using additional informationbeside the central technology of imageprocessing. It will be shown that many otherfactors looked at during implementation canstrengthen or weaken the probability of thesuccess of a durable machine vision system.Examples will be given of effective and failingimplementations. A virtual machine visionproject will be calculated in total to illustratethe estimated costs that have to be paidbefore the system earns money caused byreducing process costs.

INTENDED AUDIENCEThis course is designed for engineers whohave to develop/design machine visionsystems e.g. for industrial automationprocesses or for managers who guide theengineers. Participants should haveknowledge of image processing, or at leastelectrical engineering, and should be familiarwith technological processes and theorganization of the corresponding work flow.This class will also be of value to processengineers who have to live with machine visionsystems in their automation process.

Introduction to AdvancedProcess Control (APC) forSemiconductorManufacturingSC778Course level: Introductory

This course provides a comprehensiveintroduction to APC that will enable processcontrol engineers to tackle the control issuesthey are facing in their manufacturingenvironments. Specifically, the participants willbe introduced to the fundamentals of processcontrol and fault detection and classification(FDC). The basic introduction will besupplemented with class exercises whereparticipants will be involved in developingRun-to-Run control loops and FDC systemsfor semiconductor manufacturing processessuch as deposition, polishing, litho and etch.Additionally, we will present a multi-scaleapproach to process control, where unit-levelcontrol is highlighted and differentiated frommodule-level (combination of 2 or more unit-level control loops) process control. Thematerial is presented through a blend oftheory, specific case studies, and thedevelopment of a check-list that will identifythe type of APC system appropriate forvarious circumstances.

INTENDED AUDIENCEThis course is appropriate for bothtechnologists and fab managers who wish tobe introduced to the concepts of APC and itschallenges in fabs. As a pre-requisite,participants need only be familiar with thebasics of semiconductor manufacturing.Participants are not required to have any in-depth knowledge of APC.

COURSE PRICE INCLUDES an electronicversion of the course material (~250 pages) asdeveloped by the instructors.

How to Validate Your Modelsand SimulationsSC783Course level: Introductory

In this course we present techniques forbuilding valid and credible simulation models.Ideas to be discussed include the importanceof a definitive problem formulation,discussions with subject-matter experts,interacting with the decision-maker on aregular basis, development of a writtenassumptions document (conceptual model),structured walk-through of the assumptionsdocument, use of sensitivity analysis todetermine important model factors, andcomparison of model and system performancemeasures for an existing system (if any). Eachidea will be illustrated by one or more real-world examples. We will also discuss thedifficulty in using formal statistical techniques(e.g., confidence intervals and hypothesistests) to validate simulation models.

INTENDED AUDIENCEThis course is designed for anyone who wantsto learn practical techniques for validatingtheir models and simulations.

COURSE PRICE INCLUDES the textSimulation Modeling and Analysis by AvevillLaw.

Practical Thermographyfor NondestructiveTestingSC786Course level: Intermediate

This course will provide a basic understandingof the principles and capabilities of modernsystems for Thermographic NondestructiveTesting (TNDT). TNDT is widely used to detectand evaluate a range of sub-surface defectsincluding voids, delaminations, inclusions,porosity and corrosion. The courseconcentrates on clarifying the fundamentalphysical limitations that apply to allthermographic methods, and then showinghow various approaches to excitation,acquisition, instrumentation and analysis canbe used to reach and even exceed thoselimits. Examples of TNDT for metals,composites and ceramics will be presentedand discussed. Approaches including flash,step, modulated, lock-in and sonic TNDT willbe covered.

INTENDED AUDIENCEThis material is intended for practitioners ofTNDT as well as those who are consideringTNDT as a possible inspection method.

Practical Design ofExperiments for Scientistsand EngineersSC793Course level: Introductory

This course will enable the participant to planthe most cost-effective experiment or testwhich will result with a successful conclusionof the experiment or test objectives. It willshow how properly designed tests are easilyanalyzed and prepared for presentation in areport or paper.

Many companies are reporting significantsavings and increased productivity from theirengineering, process control and R&Dprofessionals. These companies applystatistical methods and statistically-designedexperiments to their critical manufacturingprocesses, product designs, and laboratoryexperiments. Multifactor experimentation,often called Design of Experiments (DOE), willbe shown to increase efficiencies, improveproduct quality, and decrease costs.


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This first course in experimental design willstart you into statistical planning before youactually start taking data and will guide you toperform hands-on analysis of your resultsimmediately after completing the lastexperimental run. During the course, you willlearn how to design practical full factorial andfractional factorial experiments. You will learnhow to systematically manipulate manyvariables simultaneously to discover the fewmajor factors affecting performance and todevelop a mathematical model of the actualinstruments. The course is taught with eachparticipant assigned to a group that performsstatistical analysis using a demo version ofmodern statistical software. At the end of thiscourse, participants will be able to designexperiments and analyze them on their owndesktop computers. Because emphasis of thecourse is on practical implementation of DOE,each participant is highly encouraged to bringa laptop computer.

INTENDED AUDIENCEThis course is designed for engineers,scientists, program managers and studentswho want to gain a working knowledge of theuse of statistical design of experiments. It willgreatly increase the information content oftheir test plans, while utilizing much less timeand resources. In addition, the results will be100% statistically defendable and technicallyvalid. The instructor has no financialrelationship to any commercial softwarecompany and does not endorse a specificvendor for participants to use.

Instruments for LightSpectroscopySC800Course level: Introductory

This course teaches the instrumentationfundamentals of popular UV - IRspectrometers including the Fourier transformspectrometer, monochromator, spectrograph,filter-based spectrometer and tunable laserspectrometer. The course aims at providingattendees with quantitative and objectivemethods to compare key performance metricsof the various spectrometers mentionedabove. The metrics include signal-to-noiseratio, sensitivity, detection limit, dynamicrange, spectral bandwidth and resolution. Youwill learn the design trade space of eachinstrument and tradeoffs between theinstruments. Practical considerations includingcost, ruggedness and operation requirementsare also discussed. Real-world examplesencompassing UV - IR spectrum and variousspectroscopy applications are included.

INTENDED AUDIENCEThis material is intended for engineers,scientists, managers and graduate studentswho are working or planning to work with lightspectroscopic instruments. In particular, thiscourse will be valuable for those who intend tospecify and purchase light spectrometers, orwish to improve the performance of theirsystems.

Optoelectronic Devices:Introduction to Physics andSimulationSC801Course level: Introductory

The course introduces basic physicalprinciples of semiconductor optoelectronicdevices. Key material properties are discussedfor a broad array of semiconductorcompounds. Modern light emitting diodes,laser diodes, and photodetectors are analyzedusing real-world device examples. Deepinsight into micro- and nano-scale physicalprocesses is provided by advanced devicesimulation. Available simulation software isreviewed and strategies for obtaining realisticperformance predictions are described.

INTENDED AUDIENCEStudents, device engineers, and researcherswho are interested in a deeper understandingof optoelectronic device principles and inusing advanced simulation software fordesigning and analyzing modern devices suchas laser diodes, LEDs, and photodetectors.

COURSE PRICE INCLUDES the textSemiconductor Optoelectronic Devices:Introduction to Physics and Simulation(Academic Press, 2003) by Joachim Piprek.

Practical Near Infrared andRaman SpectroscopyApplicationsSC802Course level: Intermediate

This course provides attendees with a basicworking knowledge of NIR and Ramanspectroscopy, and the applications of thesetechnologies. The course concentrates oncurrent system designs and technologies andapplications of existing systems in end-useapplications. Many practical and usefulexamples are included throughout.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to become familiar with NIR and Ramanspectroscopy applications. Those who eitherintend to apply these technologies or designtheir own systems will find this coursevaluable.


Silicon PhotonicsSC817Course level: Introductory

Silicon Microphotonics is a platform for thelarge scale integration of CMOS electronicswith photonic components. This course willevaluate the most promising silicon opticalcomponents and the path to electronic-photonic integration. The subjects will bepresented in two parts: 1) Context: a review ofoptical interconnection and the enablingsolutions that arise from integrating opticaland electronic devices at a micron-scale,using thin film processing; and 2) Technology:case studies in High Index Contrast design forsilicon-based waveguides, filters,photodetectors, modulators, laser devices,and an application-specific opto-electroniccircuit. The course objective is an overview ofthe silicon microphotonic platform drivers andbarriers in design or fabrication.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to learn how to design integratedoptical systems on a silicon platform. Thosewho either design their own photonic devicesor who work with engineers and scientists willfind this course valuable.


Lasers & Sources

Miniature Optics for DiodeLasers and Beam ShapingSC012Course level: Intermediate

This course will introduce the design andpackaging of present and future laser diodesystems for applications in sensors,instrumentation and telecommunications.Topics will include (1) a review of laser diodeoptical properties; (2) collimation, focusing,circularization and astigmatism correction inlaser diodes; (3) a topical overview of miniatureoptical components; and (4) an advanceddesign example.

INTENDED AUDIENCEThis material is directed to those persons whowork directly or peripherally with diode lasersystems and/or miniature optics. It issuggested that attendees have a basicfamiliarity with optics as background.

Introduction toNonlinear OpticsSC047Course level: Introductory

This introductory and intermediate level courseprovides the basic concepts of bulk medianonlinear optics. Although some mathematicalformulas are provided, the emphasis is onsimple explanations. It is recognized that thebeginning practitioner in nonlinear optics isoverwhelmed by a constellation ofcomplicated nonlinear optical effects,including second-harmonic generation, opticalparametric oscillation, optical Kerr effect, self-focusing, self-phase modulation, self-steepening, fiber-optic solitons, chirping,stimulated Raman and Brillouin scattering,two-photon absorption, and photorefractivephenomena. It is our job in this course todemystify this daunting collection of seeminglyunrelated effects by developing simple andclear explanations for how each works, andlearning how each effect can be used for themodification, manipulation, or conversion oflight pulses. Where possible, examples willaddress the nonlinear optical effects thatoccur inside optical fibers. Also covered areexamples in liquids, bulk solids, and gases.

INTENDED AUDIENCEThe material presented will be useful toengineers, scientists, students and managerswho need a fundamental understanding ofnonlinear optics.

Light-EmittingDiodesSC052Course level: Intermediate

This course presents the history, operatingprinciples, fabrication processes, andapplications of light-emitting diodes (LEDs)with particular emphasis on solid-state lightingapplications. The course provides an overviewof LED fundamentals, design, and fabricationtechniques. Furthermore, the fundamentals ofsolid-state lighting are discussed, includinghuman factors, efficacy, efficiency, and colorrendering properties of novel light sources.Although the course participants do not needto be specialists in optoelectronic devicephysics, familiarity with semiconductors isexpected.

INTENDED AUDIENCEThis course is intended for scientists,engineers, technicians, and managers workingon light-emitting diodes, solid-state lighting,and LED application areas.

COURSE PRICE INCLUDES the text Light-Emitting Diodes, (Cambridge University Press,2003) by E. Fred Schubert.

An Introduction toLasersSC325Course level: Introductory

This course introduces the enablingtechnology of lasers to those having little to noprior knowledge. We use a minimum ofmathematics, relying instead on simplepictures to explain the principles of laseraction, laser modes, mode-locking, single-longitudinal mode operation (SLM), the MOPA(Master-Oscillator, Power-Amplifier), Q-switched operation, etc. We review theunusual features of laser light, namely thepotential narrow-band properties and theability to focus a laser beam to a very smalland intense spot. The various laser types arediscussed. Each topic is explained in simpleterms with an emphasis on underlying physicalprinciples and a minimum of mathematics.References and materials are identified.

INTENDED AUDIENCEThis material is intended for engineers,technicians, and managers who need afundamental understanding of lasers and theirapplications.

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Courses at SPIE EventsLive instruction for Lasers &Sources will take place at the SPIEEvents listed below. Registration andcourse information is available 12weeks prior to the event dates.

Photonics West

Defense & Security

Optics & Photonics

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Diode Lasers: How toSelect the Best Laserfor Your ApplicationSC448Course level: Introductory

This course reviews those general principles ofsemiconductor device operation necessary tounderstand how diode lasers work, and whatdesign features influence the lasercharacteristics. The course reviews the basicoperating principles of diode lasers, andsurveys the various types of laser devicescurrently in use, such as quantum well lasers,distributed feedback (DFB) and vertical cavitysurface emitting lasers (VCSELs), high poweredge-emitters, pump lasers, and specialsingle-mode laser designs. A discussion ofdiode laser reliability and handling issues isincluded. The course concludes with anoverview of currently available laser types andsome of their applications. A recommendedlist of references is provided.

INTENDED AUDIENCEThis course is intended for engineers,managers, technicians, scientists, salesmen,and others who wish to obtain a thoroughunderstanding of how semiconductor diodelasers operate and how to select those bestsuited for specific applications.

An Introduction toFemtosecond LaserTechniquesSC541Course level: Intermediate

This interactively taught half-day courseprovides basic knowledge of themeasurements and optical physics researchcurrently being carried out with femtosecondlaser pulses. Beginning with the basicprinciples of the interaction of light and matter,we’ll discuss the interaction of intense shortpulses with matter. Using worksheets we’lladdress a number of common conceptualmisconceptions in an interactive andcollaborative setting.

INTENDED AUDIENCEThis course is aimed at people intending tolearn more about ultrashort laser pulses andtheir interaction with matter. Anyone workingin this rapidly growing field will benefit fromthe material presented.

Introduction to RefractiveLaser Beam Shaping OpticsSC565Course level: Introductory

This course covers the design and use ofrefractive optics to transform the transverseintensity profile of a laser beam. Typically,beam shaping is used to convert the Gaussianprofile emitted by a stable resonator or single-mode fiber to a more uniform, flat-top profile,but the formalism used is general enough toaccomodate other profile transformations aswell. The course describes the advantages ofbeam shaping and presents an overview of themany possible methods to perform theintensity profile transformation. It procedes toa detailed study of refractive beam shaping,including the choice of a suitable outputintensity profile, limitations on beam shapingimposed by diffraction, and the calculation ofthe necessary aspheric refractive surfaces.Finally, we discuss practical issues pertainingto the use of beam shaping optics, such asinput beam preparation, alignment of thebeam shaping elements, diagnostics,propagation effects, dispersion, and theresizing and relaying of the output beam.

INTENDED AUDIENCEThe course is intended for optical engineersand designers who are contemplating the useof beam shaping elements to improve theperformance of laser systems.

The Measurement ofUltrashort Laser PulsesSC602Course level: Introductory

To measure an event in time requires a shorterone. As a result, the development of atechnique to measure ultrashort laser pulses—less than a picosecond long and the shortestevents ever created—has been particularlydifficult. Recently, however, revolutionary newtechniques have emerged for fully measuringthese ephemeral, seemingly unmeasurableevents, and this course will describe them indetail.

INTENDED AUDIENCEThis course is intended for anyone with anultrashort laser pulse who’d like to measure it.It’s also intended for anyone who’d just like tosee how we can measure the shortest eventsever created without using a shorter one.Familiarity with the Fourier transform is allthat’s required to understand this course.

COURSE PRICE INCLUDES the text (with CD-ROM) Frequency-Resolved Optical Gating:The Measurement of Ultrashort Laser Pulses(Kluwer Academic Publishers, 2002).

Laser ProductCertification to Nationaland InternationalRegulationsSC603Course level: Introductory

This course will explain the duties andresponsibilities of manufacturers of devices,instruments and systems incorporating lasers,and provide them with a working knowledge ofexisting Canadian, US and internationalregulations, including latest developments inthe field. The course is focused on theperformance (engineering), labelling,documentation and testing requirements ofthe applicable standards and providesguidance for successful and timely completionof the certification process includingdeviations granted by FDA’s conditionalacceptance (2001) of conformance with IEC60825-1:1998+A2:2001 and IEC 60601-2-22.

INTENDED AUDIENCEAnyone involved in the design, productdevelopment, manufacturing or integrationand testing of laser devices or systems. Thecourse will help product developmentmanagers, engineers, scientists, qualityassurance engineers, and industrial designersto consider safety compliance and certificationissues in advance, and to take all necessarysteps to meet standards and eliminateunnecessary delays.

Fundamentals of Free-Space LaserCommunicationsSC656Course level: Introductory

This course introduces the fundamentalconcepts involved in understanding free-space laser communication system designand performance. Concepts for system andsubsystem design using commerciallyavailable laser, opto-electronic components,and fast detectors will be developed. Startingfrom a basic treatment of the effects ofatmospheric turbulence and scattering mediaon high-data-rate laser signals, we discusshow to analyze overall link budgetperformance including the effects of theatmospheric channel.

INTENDED AUDIENCEThis class is intended for engineers,technicians, managers, and students whoneed to understand the basic principles offree-space laser communication systemdesign and performance.

Lasers & Sources

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Quantum Dot LEDs andLaser DiodesSC698Course level: Intermediate

Quantum dots are enabling significantadvances to be made in the characteristics oflight emitting diodes and laser diodes, forexample ultra-low threshold current lasers,ultra-short pulse generation, and highperformance super-luminescent LEDs. Theseadvances derive from distinctive features ofquantum dot structures.This course provides attendees with anintroduction to the basic principles ofoperation of quantum dot lasers and LEDs,and gives a survey of their currentperformance characteristics. The courseincludes a description of typical devicestructures and material systems, and providesan account of optical gain and recombinationprocesses in dots, comparing and contrastingtheir properties with those of quantum wellsystems. A survey of the current status ofquantum dot emitters is given and it is shownhow their distinctive performance featuresderive from their basic properties. Keyapplication areas are discussed and key topicsfor continuing research identified.

INTENDED AUDIENCEThe course is intended for researchers andgraduate students with science andengineering backgrounds, in academia orindustry. Newcomers to research anddevelopment on quantum dot light emitters, orthose who wish to gain an overview of thecurrent status of the field will find it ofparticular value. A basic knowledge of theprinciples of operation of diode lasers isassumed and a background knowledge ofsemiconductor physics would be helpful.

Optical & Laser ScanningTechnology: Devices,Systems & ApplicationsSC725Course level: Introductory

This course provides attendees with a basicworking knowledge of optical and laserscanning devices and scanning systemdesign. The course covers: scan patterns; pre-objective and post-objective systemconfigurations; reflective, holographic andtransmissive scanners; polygonal,galvanometric, resonant and acousto-opticalscanners; their advantages anddisadvantages.

The course illustrates:• Cross- and along-scan errors and how to

minimize their effects.• Polygonal facet errors and how to reduce

their effects on image quality.• Stationary ghost images in the image

format and how to eliminate them.You will become at ease with how one

designs an optical scanning system formany varied applications.

INTENDED AUDIENCEThis material is intended for managers andengineers or anyone who needs tounderstand, learn, or gain an insight into thefundamentals of optical and laser scanningsystem design. Those who either design theirown scanners or who work with opticaldesigners will find this course valuable.

COURSE PRICE INCLUDES the textHandbook Of Optical And Laser Scanning(2004), of which the instructor is the Editor anda contributor.

Micromachining withFemtosecond LasersSC743Course level: Intermediate

This course provides attendees with theknowledge necessary to understand and applyfemtosecond laser pulses for micromachiningtasks in a variety of materials. Emphasis willbe placed on developing a fundamentalunderstanding of how femtosecond pulsesinteract with the sample. From this knowledge,the advantages and limitations offemtosecond lasers for variousmicromachining tasks can be readilyunderstood. Examples will be given in themicromachining of the surface of metals,semiconductors, and transparent materials, aswell as the formation of photonic andmicrofluidic devices in the bulk of transparentmaterials.

INTENDED AUDIENCEThis course is aimed at people already doingor interested in starting research on short-pulse laser micromachining, as well as atpeople who have specific micromachiningproblems and wish to evaluate the potential offemtosecond lasers for accomplishing theirtask. Those who do not have a background insome of the unique properties of femtosecondlaser pulses would benefit from attendingSC541, “An Introduction to FemtosecondLaser Techniques,” and/or SC746“Introduction to Ultrafast Technology” beforeattending this course.

As a part of the course materials, a detailedreading list of key papers will be provided.

Lasers & Sources

Ultrafast Fiber LasersSC744Course level: Intermediate


Introduction to UltrafastTechnologySC746Course level: Introductory

Ultrafast Optics-the science, technology, andapplications of ultrashort laser pulses-is one ofthe most exciting and dynamic fields ofscience. While ultrashort laser pulses seemquite exotic (they’re the shortest events evercreated!), their applications are many, rangingfrom the study of ultrafast fundamental eventsto telecommunications to micro-machining tobiomedical imaging, to name a few.Interestingly, these lasers are easy tounderstand, and they are readily available. Buttheir use requires some sophistication. Thiscourse is a basic introduction to the nature ofthese lasers, their use, and some of theirapplications.

INTENDED AUDIENCEThe intended audience is any scientist,engineer or biomedical researcher interestedin this exciting field, especially those new tothe field.

High-Power Fiber SourcesSC748Course level: Advanced


Solid State LaserTechnologySC752Course level: Intermediate

This course provides an overview of thedesign, performance characteristics and thecurrent state of the art of solid state lasers anddevices. The course reviews the laser-relevantproperties of key solid state materials anddiscusses the design principles for flashlamppumped and diode-pumped solid state lasersin cw, pulsed, Q-switched and modelockedoperation. Solid state media emphasizedinclude primary transitions in Nd and Yb-doped crystals but mid-IR materials such asTm, Ho and Er-doped fluorides will be brieflyaddressed as well. The course will cover thefundamental scaling laws for power, energyand beam quality in various geometries of thegain medium (rod, slab, disk, waveguide) andpumping arrangements (side and end-pumped).

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Lasers & SourcesImportant technical advances (such as

pump diode developments) that allowed thetechnology to mature into diverse industrialand biomedical OEM devices as well as highpower and scientific applications will behighlighted along with some remaining designand performance challenges. Topics will alsoinclude nonlinear frequency conversiontechniques, such as harmonic, Raman andparametric processes, commonly used in solidstate lasers to extend operation to alternativespectral regimes. The course concludes withan overview of currently available laser typesand their applications and summarizes recentR&D and power scaling results.

INTENDED AUDIENCEThis course is intended for graduate students,engineers, scientists, technicians andmanagers working in solid state laser researchor product development.

Laser Safety: Principlesand Accident PreventionSC769Course level: Introductory

The first half of this course will provideattendees with an insightful look at laser safetyin a research or product development setting.It will include a brief review of laser hazardclassification, Biological effects, and help inselecting personnel protective equipment(laser eyewear, etc.). In addition, an expandedtechnique for hazard evaluation will bereviewed with an emphasis on practicalcontrol measures.

The second half of the course will focus ona review of several recent laser accidents.With an explanation of the incidents, whatpractices lead to them and more importantlyhow they could have been prevented. Thecourse show how a change in anorganization’s laser safety culture can helpprevent future accidents. Methods to deal withperceived laser hazards will be shared and anexamination made of how they can lead toregulatory inspections and morale problems.You will leave the class with concepts andtools to help make your laser use area safer. Inaddition you will be able to take back laserlessons learned material to your work site andhopefully stop future incidents.

INTENDED AUDIENCEThis material is intended for anyone who hassafety responsibility in a laser laboratory, or isexpected to maintain a safe laser-workingenvironment. It will benefit anyone who isconcerned about how to prevent laser injuriesto themselves or others.

Solid State Lighting IISC770Course level: Advanced


Laser Beam QualitySC818Course level: Intermediate

This course will address all aspects of laserbeam quality. Topics to be covered are: a shortintroduction to Gaussian beams, definitionsand importance of beam quality, measurementtechniques, typical beam quality issues relatedto various kinds of lasers (primarily solid statelasers and semiconductor lasers), an overviewof techniques to optimize the beam qualityparticularly of diode-pumped solid statelasers, and the working principles of commonbeam shapers and mode cleaners.

INTENDED AUDIENCEThis material is intended for engineers andresearchers dealing with solid state andsemiconductor lasers. They should alreadyhave some basic knowledge of optics andlasers, but do not need to be experts in opticalmodeling or laser design. It would be useful,although not strictly required, to acquire somebasic knowledge of Gaussian beams beforethe course - e.g., by studying the web pagehttp://www.rp-photonics.com/gaussian_beams.html.

Fundamentals andApplications of Slow LightSC820Course level: Intermediate

This course serves as an introduction to therapidly growing phenomena of lightpropagation at a reduced speed, commonlyreferred to as a “slow light”. The courseprovides a basic understanding of the factorsinfluencing the group velocity of light indispersive media and in photonic structures.Important physical processes responsible for“slow light” are explained on a very accessiblelevel. Potential practical applications of slowlight are considered - tunable all-opticalbuffers and delay lines, low voltage electro-optic modulators, frequency converters andall-optical switches. For each application a setof metrics is introduced and various slow lightschemes are compared on the basis of thesemetrics with an emphasis on the performancein high bit rate communication or signalprocessing systems. Practical methods formitigation of high order dispersion andinsertion loss are described.

INTENDED AUDIENCEThis course is intended for engineers,physicists, and computer scientists who wantto become familiar with this new andexpanding field and consider applications ofslow light in their work.

COURSE PRICE INCLUDES a CD-ROM withthe copy of the presentation and about 50 ofthe most relevant publications in the field.

Understanding Laser BeamPerformance SpecificationsWS828Course level: Introductory

This workshop will provide attendees with abasic understanding of laser beamperformance specifications. Topics to becovered include Beam Pointing Stability,Polarization Ratio, RMS Noise, Peak-to-PeakNoise, Pulse Duration and Duty Cycle, PeakPower, Average Power, Pulse Repetition Rate,and M2. These specifications constitute thecritical parameters that determine whether ornot a laser, or laser system, will do theintended job.

INTENDED AUDIENCESales/marketing personnel will find the coursequite beneficial to precisely grasp clients’requirements and specifications. Engineers,technicians and other support staff may alsofind this course useful as they strive to meetclient needs as directed by sales/marketing.

COURSE PRICE INCLUDES two weeks offollow-up e-mail and phone consultations.

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training, anytime.


Remote Sensing

Multispectral ImageProcessingSC174 VTCourse level: Advanced

Multispectral imagery contains a wealth ofinformation beyond panchromatic imagery.This course describes and evaluates computerprocessing techniques used to extractinformation from multispectral imagery. Theemphasis is on earth remote sensing, but thetechniques discussed apply to anymultispectral imagery.

INTENDED AUDIENCEThis course is for engineers and scientists whoneed an introduction to multi/hyperspectralimagery and technical knowledge of computeralgorithms for processing multi/hyperspectraldata. A BS degree in physical science orengineering is a prerequisite. Prior experiencewith computer image processing is highlyrecommended.

COURSE PRICE INCLUDES the text RemoteSensing—Models and Methods for ImageProcessing, Second Edition (Academic Press,1997) by Robert Schowengerdt.

Incorporating GPSTechnology into Commercialand Military ApplicationsSC549Course level: Introductory

The Global Positioning System (GPS) hasevolved from its military roots to an idealexample of dual-use technology. This coursebriefly describes the GPS theory and the stateof art in GPS technology. The issues involvedin incorporating GPS in various commercialand military applications will be highlightedand various technologies will be illustratedusing case studies.

INTENDED AUDIENCEThis course is for engineers, systemsdesigners, and managers who wish tounderstand the recent innovations in GPStechnology and how to design systems thattake advantage of these capabilities forcommercial and military applications. Somefamiliarity with basic GPS operation is helpful.Examples will be presented from airbornesystems for remote sensing and otherapplications.

Introduction to OpticalRemote SensingSystemsSC567Course level: Introductory

This course provides a broad introduction tooptical remote sensing systems andmeasurements, including both passiveimagers and active laser radars (lidars). Webegin with a discussion of radiometry andradiometric calculations to determine howmuch power or energy is captured by anoptical system. We survey optical propagationin the atmosphere (e.g. absorption, emission,and scattering) and examine how theseprinciples can be exploited to infer propertiesof the atmosphere or a remote object.Students learn how to calculate an opticalsignal that travels from a source, though theatmosphere, and through an optical system toa detector, where we determine the detectedpower and resulting signal-to-noise ratio fortypical passive and active sensor systems.These principles of optical radiometry,atmospheric propagation, and opticaldetection are combined in examples of realsensors studied at the block-diagram level.Example sensors are from the environmental,military, and homeland security sensingcommunities, although the principles arebroadly applicable. Examples include passivehyperspectral sensors and Fourier transformspectrometers for Earth and atmosphericsensing, airborne imaging spectrometers forground-based target sensing, active laserradars (lidars) for sensing particles and gasesin the atmosphere, and laser sensors fortracking hard targets (lidar and ladar).

INTENDED AUDIENCEScientists, engineers, technicians, ormanagers who find themselves working on (orcurious about) optical sensing projects withoutformal training in this area. Undergraduatetraining in engineering or science is assumed.

FCCourses at SPIE EventsLive instruction for Remote Sensingwill take place at the SPIE Eventslisted below. Registration and courseinformation is available 12 weeksprior to the event dates.

Photonics West

Defense & Security

Optics & Photonics

Optics East














Introduction to the OpticalSystem Engineering ofRemote SensingSystemsSC726Course level: Intermediate

Scientists and engineers use optical andinfrared instruments to create images andmake remote measurements. Quantitativemeasurements of the intensity, the wavelengthcontent and the polarization content of white-light scenes, such as the Earth’s atmosphereand surface, astronomical objects, andlaboratory sources are frequently needed. Thisshort course is intended to provide the studentwith an understanding of the first order opticaldesign principals behind several remotesensing optical systems. Examples are takenfrom recent optics challenges surrounding thedesign of imagers, astronomicalcoronagraphs, spectrometers and imagingspectrometers.

INTENDED AUDIENCEThe audience for this class includestechnologists, scientists, engineers andmanagers who want to learn about the designand development of scientific remote sensingsystems for scientific measurements. It isexpected that the attendee will have had acollege level introductory optics course,calculus, and engineering mathematics orequivalent.

Remote Sensing

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Introduction to Opticaland Infrared SensorSystemsSC789Course level: Introductory

This course provides a broad introduction tooptical (near UV-visible) and infrared sensorsystems, with an emphasis on systems usedin defense and security. Topics include bothpassive imagers and active laser radars (lidar/ladar). We begin with a discussion ofradiometry and radiometric calculations todetermine how much optical power iscaptured by a sensor system. We surveyatmospheric propagation and phenomenology(absorption, emission, scattering, andturbulence) and explore how these issuesaffect sensor systems. Finally, we performsignal calculations that consider the source,the atmosphere, and the optical system anddetector, to arrive at a signal-to-noise ratio fortypical passive and active sensor systems.These principles of optical radiometry,atmospheric propagation, and opticaldetection are combined in examples of realsensors studied at the block-diagram level.Sensor system examples include passiveinfrared imagers, polarization imagers, andhyperspectral imaging spectrometers, andactive laser radars (lidars or ladars) for sensingdistributed or hard targets. The courseorganization is approximately one third on theradiometric analysis of sensor systems, onethird on atmospheric phenomenology anddetector parameters, and one third onexample calculations and examination ofsensor systems at the block-diagram level.

INTENDED AUDIENCEScientists, engineers, technicians, ormanagers who find themselves working on (orcurious about) optical (uv-vis) and infraredsensor systems without formal training in thisarea. Undergraduate training in engineering orscience is assumed.


training, anytime.


Astronomy

Gratings, Mono-chromators, andSpectrometersSC040Course level: Introductory

This course introduces gratings,monochromator, and spectrometer operationsto the novice. Using a minimum ofmathematics, this course provides thefundamental concepts necessary to thesuccessful implementation of these frequency-selective devices. The differing frequencyscales (gigahertz, Angstroms, inversecentimeters, nanometers, microns, etc.) aredescribed and compared. The basic operationof gratings is reviewed, including issues ofblaze, holographic gratings, backlash, andresolving power. The implementation ofgratings into spectrometers andmonochromators are addressed. The FabryPerot device is discussed, emphasizing its usefor laser frequency analysis. Other spectralanalyzing interferometers are explained,including the Michelson and the Fizeau.

INTENDED AUDIENCEThis course is for engineers, technicians, andmanagers who need to gain a familiarity withfrequency analysis of optical signals, withgrating spectrometer devices, and with otherspectroscopic techniques.

Imaging SpectrometrySC153Course level: Intermediate

This course covers the design of imagingspectrometers, from instrumentation to dataexploitation. Emphasis is placed on scanningsystems in recognition of their prevalence. Allsystem concepts are discussed from theperspective of acquiring an image cube.Example systems (AVIRIS, HYDICE, etc.)illustrate current design practices. Noise-equivalent spectral radiance (NESR) will beintroduced and explained. In addition, dataexploitation is discussed and examplesdemonstrated.

INTENDED AUDIENCEThis course is intended for engineers,scientists, and program managers interestedin a full summary of imaging spectrometry.Anyone looking at recent advances design anddata-exploitation techniques can benefit fromthis practical tutorial. To benefit maximallyfrom this course, attendees should be familiarwith the materials covered in SPIE SC040,Gratings, Monochromators, andSpectrometers, or equivalent.

Imaging PolarimetrySC180Course level: Advanced

This course covers imaging polarimeters froman instrumentation-design point of view. Basicpolarization elements for the visible, mid-waveinfrared, and long-wave infrared are describedin terms of Mueller matrices and the Poincarésphere. Polarization parameters such as thedegree of polarization (DOP), the degree oflinear polarization (DOLP) and the degree ofcircular polarization (DOCP) are explained inan imaging context. Emphasis is on imagingsystems designed to detect polarized light in a2-D image format. System concepts arediscussed using a Stokes-parameter(s0,s1,s2,s3) image. Imaging-polarimetersystems design, pixel registration, and signalto noise ratios are explored. Temporalartifacts, characterization and calibrationtechniques are defined.

INTENDED AUDIENCEThis course is for engineers, scientists, andprogram managers interested in an overviewof imaging polarimetry. The tutorial is intendedto give students intuitive insight intofundamental concepts with a minimum ofrigorous mathematical treatment. To benefitmaximally from this course, attendees shouldbe familiar with the materials covered in SPIESC206, Introductory and Intermediate Topicsin Polarized Light.

X-Ray DetectorPerformance: Principles andMeasurements using aLinear Systems ApproachSC358Course level: Advanced

Medical x-ray imaging systems must bedesigned to ensure that maximum imagequality is obtained for an acceptable radiationrisk to the patient, and quality assuranceprograms are used to ensure these standardsare maintained. The first part of this courseaddresses the principles of detectorperformance and the Fourier metrics (MTF,NPS, NEQ and DQE) required to quantifysignal-to-noise performance. The second partaddresses methods of measuring thesemetrics. Both non-mathematical intuitivedescriptions and more rigorous mathematicaldescriptions will be used.

INTENDED AUDIENCEThis course is designed for anyone who wantsto extend their understanding of image qualityand the performance of x-ray imagingsystems. It is of value to physicists, engineersand others involved in the design, production,assessment or purchase of medical-imagingequipment.

FCCourses at SPIE EventsLive instruction for Astronomy willtake place at the SPIE Events listedbelow. Registration and courseinformation is available 12 weeksprior to the event dates.

Photonics West

Defense & Security

Optics & Photonics














Understanding X-RayImaging SystemsSC383Course level: Introductory

This course provides a basic understanding ofX-ray imaging systems and the fundamentalphysical mechanisms that limit image quality.A complete engineering systems analysis ispresented. The relative effect of thesemechanisms upon image quality is discussedfor a variety of applications including soft X-ray microscopy, high-energy astrophysics, X-ray microlithography, and X-ray synchrotronbeam lines.

INTENDED AUDIENCEThis course is intended for scientists,engineers, and technical managers who wantto gain insight into the optical performancecapabilities and limitations of X-ray imagingsystems, and to the degradation ofperformance by state-of-the-art opticalfabrication tolerances.

Fourier TransformSpectrometry: Theory,Methods, and NewApplicationsSC410Course level: Introductory

The Fourier transform spectrometer (FTS) hasbeen recognized as a critical technology forremote sensing and is central to many NASA/ESA missions. The FTS enables a large familyof visible and infrared applications fromlaboratory studies to atmospheric sounding toplanetary exploration. In essence, the FTSinstrument is a realization in glass and metal ofFourier’s theorem. Consequently, designingthe instrument requires a firm grounding inboth optics and digital signal processing—sothat one can ‘see’ through the Fouriertransform and relate the measured signal (theinterferogram) to the desired spectrum andunderstand the distortions of the spectrumintroduced by the transfer function of theinstrument. The course will be divided into twoparts: theoretical and practical considerationsand a survey of implementations andapplications.

INTENDED AUDIENCEThis course will benefit anyone who needs tolearn how to design or use spectral separationsystems and interferometric systems inspecific. This course will be of value to thosewho either design their own instruments, orthose who work directly or indirectly withinstrument designers, or have purchased acommercial instrument.

COURSE PRICE INCLUDES the text FourierTransform Spectrometry (Academic Press,2001) by Mark Abrams.


The range of applications of micro ComputedTomography (microCT) and the number ofsystems operating worldwide have expandedenormously over the last decade. This courseprovides attendees with a working knowledgeof microCT and emphasizes practicalexamples. The course concentrates on x-rayabsorption-based techniques but also coversphase contrast modalities. After introducingthe physics behind the imaging methods, themathematics of tomographic reconstructionand microCT apparatus designs are describedat the qualitative, conceptual level required tounderstand the trade-offs in the experimentaldesigns of the exemplar studies. Examplestaken from diverse scientific and engineeringfields illustrate data analysis and visualizationstrategies and include studies of:• Crack opening as a function of 3D position

and applied load• Amount and spatial distribution of different

phases- Calcification of heart valves- Metal matrix composites- Fluid distributions in porous solids- Interpretation of linear attenuation

coefficients• Geometric characteristics of

microstructures- Channels in chemical vapor infiltrated

ceramic composites- Spongy or trabecular bone- Blood vessel networks

A thread throughout is how improvedinstrumentation affects the ways investigatorsthink about their characterization problems.The examples are also used to suggestpromising directions for future studies.

INTENDED AUDIENCEThis material is intended for anyone interestedin learning about the strengths and limitationsof x-ray microCT. Those who wish to broadentheir background in nondestructive evaluation,who are considering using microCT for the firsttime or who need to develop/purchase in-house microCT capabilities will find thiscourse valuable.

Astronomy

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Illumination Engineering

Non-Imaging OpticsSC388Course level: Introductory

Nonimaging optics departs from the methodsof traditional optical design by insteaddeveloping techniques for maximizing thecollecting power of illumination elements andsystems. Nonimaging designs exceed theconcentration attainable with focusingtechniques by factors of four or more andapproach the theoretical limit (idealconcentrators). This course develops theconceptual foundations and is an excellentcompanion to Dr. David Jenkins’ course whichemphasizes applications.

INTENDED AUDIENCEThe course is designed for optical designers,engineers, and scientists whose workencounters demanding problems of lightcollection or illumination. The course is self-contained. No specialized technicalbackground required.

Solid State Lighting ISC490Course level: Introductory

The recent development of high-brightnessLEDs based on III-Nitrides and AlInGaP hasled to the possibility of revolutionary newapproaches for lighting that have becomeknown as Solid State Lighting. Solid StateLighting technology has largely beendeveloped by those in the compoundsemiconductor community who have little orno understanding of the lighting industry. Asimilar lack of knowledge also exists about theadvances of LEDs for lighting applications inthe general lighting community. The scope ofthis course is to provide a state-of-the-artreview of the Solid State Lighting technologyfrom both the perspective of the solid statescientist and those involved in the lightingindustry.

INTENDED AUDIENCEAnyone who wants to develop anunderstanding of Solid State Lighting and itsfuture applications in general illumination. Thiscourse will be of value to those who eitherdesign their own optics or those who workdirectly or indirectly with optical designers, asyou will now understand what is really goingon as well as how to ask the right questions ofyour designers.

Techniques for AccurateInfrared TemperatureMeasurementSC711Course level: Intermediate

This course provides attendees with anunderstanding of how to properly select anduse infrared thermometers. This coursefocuses on understanding infrared theory andhow infrared thermometers operate. Coursedemonstrates the importance of properequipment selection and usage and how tomeasure and compensate for error sources.The course is a must for anyone wishing tomake accurate non-contact temperaturemeasurements.

INTENDED AUDIENCEThis material is intended for anyone wishing touse infrared equipment to accurately measuretemperatures. Course will cover equipmentselection and operation, equipmentcalibration, compensating for error sourcesand cross verification of radiometrictemperature data.

COURSE PRICE INCLUDES printed handoutsof course PowerPoint slides andcomplimentary copies of InfraspectionInstitute Guidelines.

Solid State Lighting IISC770Course level: Advanced

The course builds on its sister course, SolidState Lighting I (SC490) by providing moredepth in many of the same technical areassuch as in understanding the illuminationcharacteristics of Light Emitting Diodes (LEDs)and in illumination. While the prior course tooka phenomenological approach in developingan understanding of SSL (and assumed thatthe student has minimal technical backgroundor expertise in the area), this course developsa more quantitatively rigorous approach tounderstanding SSL in clearly defined technicalmetrics.

The intent of this course is to provide astate-of-the-art review of Solid State Lightingtechnology from both the perspective of thesolid state device engineer and the lightingdesigner. Additional coverage will be providedin phosphor technology and the operationalcharacteristics of organic LEDs (OLEDs) thatwas not covered in Solid State Lighting I.

INTENDED AUDIENCEAnyone who has a basic understanding ofSolid State Lighting and wants to learn aboutits future adoption in general illumination. Thiscourse will be of value to those whounderstand LEDs but want to understandelements of lighting design, or to lightingdesigners who want to understand LEDs.

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FCCourses at SPIE EventsLive instruction for IlluminationEngineering will take place at theSPIE Events listed below.Registration and course informationis available 12 weeks prior to theevent dates.

Photonics West

Optics & Photonics

Optics East

Defense & Security














Solid State LightingPhosphorsSC799Course level: Introductory

The development of blue and UV InGaN lightemitting diodes is being complemented by aparallel exploration of new phosphor materialsystems for use with these new diodetechnologies. Currently, two approaches arebeing investigated: the use of a blue LEDphosphor pump which combines with thephosphor emission to give a white spectrum,and secondly the use of a tri-color red, greenand blue phosphor set, which are pumped inthe near-UV, between 380-406 nm. For bothapproaches it is necessary to develop highlyefficient and long-lived phosphor materialsthat are well matched to the excitationconditions of the diode, and whose spectralemission properties produce a high colorrendition index (>95).

This course, therefore, complements theSolid State Lighting I & II courses (SC490 &SC770), by providing an in depth review of therecent developments in phosphors for SSL.Examples of excitation and emission spectrawill be given for the important materialsystems. The scope is to provide a state-of-the-art review of Solid State LightingPhosphors from both the perspective of thesolid state device engineer and the lightingdesigner.

INTENDED AUDIENCEThose who have an interest in Solid StateLighting and who want to understand theissues involved in manipulating the sourcespectrum using phosphors. This course willalso be of value to those who understandLEDs, but who want to better understand theelements of lighting design.

Course notes include the instructor’s chapter“Phosphors for Solid State Lighting: DiodePhosphors” from the forthcoming SPIE textSolid State Lighting (Editors: I. T. Fergusonand N. Narendran).

The Science and Technologyof Organic Solar CellsSC797Course level: Intermediate

Solar cells made from organic semiconductorsare very attractive because they canpotentially be made at very low cost in roll-to-roll coating machines. This tutorial will startwith an introduction to organicsemiconductors that will explain whyconjugated molecules can be semiconductors,what determines their absorption spectrum,how molecular packing affects the chargecarrier mobility and how they are used tomake transistors, light-emitting diodes andsolar cells. Then the various designs that havebeen used to make organic solar cells- singlesemiconductor, planar heterojunctions, bulkheterojunctions and tandems- will be covered.All of the important processes that occur in thecells will be addressed, including:• optical interference and light absorption• exciton diffusion and energy transfer• forward and back electron transfer (exciton

splitting and recombination)• charge transport

Device modeling and prospects for raisingthe efficiency from the current level of 5% to20% will be discussed.

INTENDED AUDIENCEThe course in for engineers or scientists whowant to learn how organic solar cells aremade, how they work and how much potentialthey have.

Illumination Engineering


spiedl.org


Communications & Networking

Fiber Laser Sources andAmplifiers for LightwaveSystem ApplicationsSC228Course level: Intermediate

Rare-earth-doped fiber lasers and amplifiershave revolutionized the field of opticalcommunications. Amplifiers allow propagatingmultiple-wavelength light signals modulated atextremely high bit rates along fibers thousandsof kilometers long. Fiber lasers providecoherent light emission in wavelength regions(ultraviolet to mid-infrared) and with power andcoherence properties not available from diodelasers. This course describes thespectroscopy of rare-earth-doped glass fibers,the operating principles of the laser andamplifier devices based on these fibers, andthe basic mathematical models that describetheir performance. It also provides a broadoverview of the different types of fiber lasersand amplifiers, as well as detailed descriptionsof cornerstone devices, such as Er-dopedfiber amplifiers, Raman fiber amplifiers, andhigh-power Yb-doped and Nd-doped fibermaster-oscillator power amplifiers. Theperformance and characteristics of numerousrepresentative devices are reviewed, includingthe configuration, threshold, conversionefficiency, and polarization behavior of fiberlasers, and the pumping schemes, gain, noise,and polarization dependence of fiberamplifiers.

INTENDED AUDIENCEEngineers, scientists, managers, technicalsupport, and students who need to learn thebasic concepts of fiber lasers and amplifiersfrom theoretical and physical standpoints.Some prior knowledge of lasers and lightpropagation in fibers or optical waveguides isdesirable.

Design and Applicationof Fiber Optic SensorsSC286 VTCourse level: Introductory

Improvements in optical components and fiberoptic technology have enabled fiber opticsensors to be used in navigation systems forautomobiles, the 777, the Dornier commuteraircraft, robots, and remotely piloted vehicles.These sensors are beginning to be used onbridges, dams and buildings to support civilstructure applications. Structural healthmonitoring systems have also been used onhydrogen tanks for the DC-X and the X-33demonstration vehicle. Other areas activelybeing pursued using fiber optic sensorsinclude process monitoring, environmentalsensing and biomedical applications. Thiscourse is intended to introduce elements offiber optic sensor design while presenting awide variety of real world applicationexamples.

INTENDED AUDIENCEEngineers, scientists, technicians andmanagers who need to improve theirunderstanding of the operation andimplementation of fiber optic sensortechnology would benefit strongly from thiscourse. This course is also highly useful todevelopers of components used in fiber opticsystems who want to understand how theircomponents are used in the emerging fiberoptic sensor field as well as potential endusers who are contemplating utilizing fiberoptic sensor systems.

Thin Film OpticalCoatingsSC321Course level: Intermediate

Virtually no modern optical system couldoperate without optical coatings. Much of anyoptical system consists of a series of coatedand shaped surfaces. The shape determinesthe power of the surface but it is the coatingthat determines the specular properties, theamount of light transmitted or reflected, thephase change, the emittance, the color, thepolarization, the retardation, including even themechanical properties. Optical coatingsconsist of assemblies of thin films of materialswhere interference properties combine withthe intrinsic properties of the materials to yieldthe desired optical performance. They act toreduce the reflectance losses of lenses,increase the reflectance of mirrors, reduceglare and electromagnetic emission fromdisplay systems, improve the thermalinsulation of buildings, protect eyes from laserradiation, analyze gases, act asanticounterfeiting devices on banknotes,multiplex or demultiplex communicationsignals, separate or combine color channels indisplay projectors, and these are just a few oftheir roles. This course emphasizesunderstanding and takes students fromfundamentals to techniques for design andmanufacture.

INTENDED AUDIENCEAnyone who is or wishes to become involvedin the manufacture or use of optical coatingsor who wants to know more about this rapidlygrowing and important field. The level isappropriate for someone who has completedhigh school mathematics and/or science.

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Courses at SPIE EventsLive instruction for Communications& Networking will take place at theSPIE Events listed below.Registration and course informationis available 12 weeks prior to theevent dates.

Photonics West

Defense & Security

Optics & Photonics

Optics East














Understanding Lasers, FiberOptics, and PhotonicsComponentsSC402Course level: Introductory

This course covers the unique properties oflasers; how a basic laser works; some of theproblems with lasers and how to eliminatethem; and types of lasers available and howthey work. Also covered are the uniqueproperties of optical fibers; some of theproblems with fibers and how to control them;and an introduction to integrated optics.Various techniques for the manipulation oflaser light based on electro-optic, magneto-optic and acousto-optic effects are described.The course ends with a discussion of thecritical issues in the creation of ultra-broadband fiber communication systems andoptical sensors, and an exposure to someexciting future predictions.

INTENDED AUDIENCEThe course is intended for all those who wantto find out and understand what lasers, fiberoptics, and photonic devices are all aboutwithout a reliance on a mathematicaltreatment. It is suitable for managers,engineers, scientists, medical personnel andothers with little or no background in lasersand optics but are curious to find out and tohave their questions answered.

Energy-Constrained SensorNetworks, Aeroacoustics,and Distributed SignalProcessingSC712Course level: Intermediate

This course presents the rich interplaybetween sensing, signal processing, andcommunications in energy-constrained sensornetworks. The communications load in thenetwork is highly dependent on the distributedsignal processing strategy that is used fordetection and estimation tasks. Decoupleddesign of the signal processing algorithms andcommunication network protocols may bedrastically inefficient from the perspectives ofminimizing communications bandwidth andnode energy consumption. A cross-layerdesign approach that spans sensing, signalprocessing, and communications is the key toenergy-constrained network design.

The first half of the course presents a broadview of many aspects of communications andnetwork topology, including a DoD perspectiveon current and future applications. Topicsinclude duty cycling for energy savings,network architecture and capacity, networksynchronization, node geolocation, and theinteraction of the physical, MAC, and higherlayers for energy saving communications.

The second half of the course is focused onthe specific application of an aeroacousticsensor network used for detection, localization,classification, and tracking of acoustic sourcessuch as vehicles. Topics include the basics ofacoustic propagation, source detection, angle-of-arrival estimation, Doppler processing, andsource localization. The theory is illustratedwith many experimental examples. The networkperformance is strongly impacted byaeroacoustic propagation, and we presentdistributed signal processing schemes thatmaintain nearly globally optimal performancewith significantly reduced communicationsload.

INTENDED AUDIENCEThis tutorial is intended for scientists andengineers in industry, government, andacademia who want to learn the research anddesign issues in the rapidly emerging disciplineof sensor networks. It will be useful for thosewho want an overview of this area, as well as tothose actively involved in research anddevelopment. An extensive bibliography will beprovided to aid further exploration. The in-depth look at aeroacoustic sensor networksserves as a case-study to illustrate thefundamental issues, and it includes practical“lessons learned” from the instructors’ 10+years of experience with research, design, andevaluation of fielded systems.


This course provides a broad overview ofoptical fiber sensing principles and techniquesfor chemical and biological (CB) sensingapplications. The course is divided into twoparts. Part I provides an introduction to opticalfiber sensors, their different types, associatedcomponents and specialty fiber types requiredfor CB sensing system integration. In Part II, areview of different types of chemical andbiological fiber sensors is made (based on VIS-UV-IR absorption, optical spectroscopy,fluorescence, chemiluminescence, evanescentfields, Raman, and others), along withdiscussions on reactive agents, detectiontechniques, data analysis and interpretation.Emphasis is placed on practical applicationsand actual industrial and biotechnologysolutions.

INTENDED AUDIENCETechnical managers, scientists, engineers,technicians and research students who wish tolearn about CB detection via fiber-sensingtechnology and review their implementationand applications. The course is also suitable togain an overview on the field of and learn aboutthe state-of-the-art in on-line CB monitoringtechniques for medical, life sciences,environmental, defense and industrialapplications.

Ultrafast Fiber LasersSC744Course level: Intermediate

This course gives an overview of short pulsegeneration techniques in optical fibers,comprising descriptions of state of the artdiode-pumped ultrafast fiber oscillators,amplifiers, frequency converters as well aspulse compressors. The emphasis will be onindustrially relevant laser systems as used ininstrumentation and optical processing.Numerous design examples will be given,illustrating the recurring physical phenomenagoverning these systems.

The attendee will learn how to producepico-second and femto-second pulses as wellas canonical pulse forms, such as, solitons,gaussians, similaritons and cubicons. Therelevance of these canonical pulse forms in avariety of applications will further beelucidated. Specifically, the design principlesof ultra-high power fiber amplification systemsbased on similaritons and cubicons, capableof generating peak powers in excess of 1 GW,will be explained. The attendee will beintroduced to the governing physical limits ofsuch ultra high power fiber lasers and how tooptimally approach these limits in actualsystem design.

To conclude the participant will beintroduced to a variety of exemplaryapplications of ultrafast lasers, as applied tofiber systems. The application examples are toprovide a short summary of recent ultrafastresearch activities and comprise, EOsampling, THz generation, micro-structuring,medical imaging, as well as frequencymetrology.

INTENDED AUDIENCEThis course is intended for researchers,engineers and graduate students who areinterested in ultrafast optical technology. It willnot only be a ‘how to’ instruction but will alsoaddress the ‘why’ for those who want to buildtheir own ultrafast fiber laser systems.

COURSE PRICE INCLUDES the chapter on“Ultrafast Fiber Oscillators” by the instructorfrom the text Ultrafast Lasers, Technology andApplications edited by Martin Fermam.


FC


High-Power Fiber SourcesSC748Course level: Advanced

This course describes the principles of high-power fiber lasers and amplifiers, with outputpowers that can exceed a kilowatt. It reviewscurrent state of the art and research directionsof this rapidly advancing field. Fibertechnology, pump lasers and input couplingwill be addressed. Rare-earth-doped fiberdevices including those based on Yb-dopedfibers at 1.0 - 1.1 m and the morecomplicated Er:Yb codoped fibers at 1.5 - 1.6m will be covered. Devices based onnonlinear scattering phenomena such asstimulated Raman scattering will beconsidered if time allows. The operatingregimes to be treated extend from continuous-wave single-frequency to short pulses. A fewkey equations will be introduced to find limitsand identify critical parameters. For example,pump brightness is a critical parameter forsome devices in some regimes but not always.Methods to mitigate limitations in differentoperating regimes will be discussed. A largecore is a critical fiber design feature of high-power fiber lasers, and the potential and limitsof this approach will be covered, e.g., as itcomes to beam quality.

INTENDED AUDIENCEThis course is intended for scientists andengineers involved in the research anddevelopment of commercial and military highpower fiber systems.



spiedl.org


Business & Professional Development

Intellectual Property Issuesin High-Tech BusinessWS412Course level: Introductory

Intellectual property (IP), in the form ofcopyrights, trademarks, trade secrets, ideasand patents, is of critical importance in high-tech business. In today’s economy, IP is anasset that high-tech companies seek toleverage to add to their bottom line, whetherthrough licensing or lawsuits. For many high-tech companies, IP represents their mostvaluable asset. Not surprisingly, the typicalhigh-tech company’s level of technicalsophistication far outweighs its level of IPsophistication; yet both are needed toultimately be successful in the high-techmarketplace. It is therefore imperative thatemployees of a high-tech company know thefundamentals of IP and understand their role inthe IP-related aspects of a high-tech business.The aim of this course is to provide theaudience with an overview of the numerous IPissues related to high-tech business. Topicscovered include: the basic forms of IP,developing an IP strategy, IP licensing,litigation issues, IP insurance, IP management,directed development and generation of IP,and patent mapping.

INTENDED AUDIENCEThis course is designed for technicians,engineers, scientists, managers andexecutives involved in high-tech business.

Pulling Property Out of ThinAir: The Optical PatentWS487 VT · CDCourse level: Introductory

What is a patent? What kinds of things arepatentable? How do I use a patent as abusiness tool? What sorts of inventions shouldbe patented, and what sorts should not? Howdo I make my patent dollars count? How do Imake sure my attorney is patenting theinventions that give me or my company acompetitive advantage? Anyone interested infinding out the answers to these questions willbenefit from attending this presentation.This will not be a legal lecture or overlytechnical pregram, but rather an informal nuts-and-bolts session giving “how to” answers.Examples of optical inventions will be used toshow how common sense patentingtechniques can be applied in real-worldsituations to maximize individual and/orcorporate advantage.

Basic Optics for Non-Optics PersonnelWS609Course level: Introductory

This course will provide the technical manager,sales engineering, marketing staff, or othernon-optics personnel with a basicunderstanding of the terms, specifications,and measurements used in optical technologyto facilitate effective communication withoptics professionals on a functional level.Topics to be covered include basic conceptssuch as interference, diffraction, polarizationand aberrations, definitions relating to colorand optical quality, and an overview of thebasic measures of optical performance suchas MTF and wavefront error. The material willbe presented with a minimal amount of math,rather emphasising working concepts,definitions, rules of thumb, and visualinterpretation of specifications. Specificapplications will include defining basic imagingneeds such as magnification and depth-of-field, understanding MTF curves andinterferograms, and interpreting radiometricterms.

INTENDED AUDIENCEThis course is intended for the non-opticalprofessional who needs to understand basicoptics and interface with optics professionals.

The Craft of ScientificPresentations:A Workshop onTechnical PresentationsWS667Course level: Introductory

This course provides attendees with anoverview of what distinguishes the bestscientific presentations. The course introducesa new design for presentation slides that isboth more memorable and persuasive fromwhat is typically shown at conferences.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to present scientific research. Thosewho either have not yet presented or havemade several presentations will find thiscourse valuable.

COURSE PRICE INCLUDES the text The Craftof Scientific Presentations by Michael Alley.

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Courses at SPIE EventsLive instruction for Business &Professional Development will takeplace at the SPIE Events listedbelow. Registration and courseinformation is available 12 weeksprior to the event dates.

Photonics West

Medical Imaging

Microlithography

Defense & Security

Optics & Photonics

Optics East















The Craft of ScientificWriting: A Workshopon Technical WritingWS668Course level: Introductory

This course provides an overview on writing ascientific paper. The course focuses on thestructure, language, and illustration ofscientific papers.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to write about scientific research. Thosewho either have not yet written a paper orhave written several papers will find thiscourse valuable.

COURSE PRICE INCLUDES the text The Craftof Scientific Writing by Michael Alley.

How to Start a Small HighTech Business AlmostAnywhereWS756Course level: Introductory

This course focuses on the elements that canminimize investment capital and the timeneeded to set up a viable and vibrant smallbusiness with growth potential. For individualscontemplating or engaged in starting a smallbusiness, understanding the process canliterally be the difference between success andfailure.

It is possible to set up such an entity withina large company, where one or a handful ofindividuals can grow new ideas andtechnology into high tech products that canhave a significant impact on thecompetitiveness of the company.

The course provides an overview of theskills necessary to operate a successful hightech business within a large organization, andpoints out how these skills can form the basisfor developing small high tech businesses asspin-offs or standalone entities. It alsoaddresses the steps needed to start a smallhigh tech business, even under less-than-idealconditions.

Elements to be considered include:motivation; start up planning; types oforganizations that can be operated; and theset up of structures that will greatly aidsuccess. Crucial topics such as consulting,small business contracts, subcontracts,intellectual property, licensing, productdevelopment, long term planning, andmergers/acquisitions will be reviewed.

INTENDED AUDIENCEEngineers, scientists, technicians andmanagers in both large and smallorganizations can benefit from this course.People from large organizations will benefitfrom developing skills that can make their ownorganizations more cost effective and efficient,as well as understanding the advantages anddisadvantages of having small businesses aspartners.

Intellectual Property: PriorArt SearchingWS758Course level: Intermediate

This course provides attendees with the basicskills needed to search for prior art whendeveloping a patent application and/or takingyour technology from R&D to productionstage. The course includes a detailedpresentation of the methods and tools forinformation retrieval, current sources ofinformation, and modern trends in intellectualproperty search and analysis. The scope ofthis course encompasses searches of U.S.patents and published applications, foreignpatents and published applications and non-patent literature. Case studies will bepresented showing detailed examples of eachtype of search.

INTENDED AUDIENCEThis material is intended for anyone whoneeds to learn how to perform a prior artsearch. Inventors who want to protect theirinnovations will find this course valuable,because it teaches how to avoid infringementsand to accelerate prosecution of your patent.Business development managers will learnhow to uncover trends in product developmentbased on patent analysis. Scientists,engineers, and technicians may learn how toquickly access existing solutions for theirtasks.

Essential Interpersonal Skillsfor Technical ProfessionalsWS774Course level: Introductory

This one-day workshop provides acomprehensive overview of essentialinterpersonal skills and detailed discussion ofkey skills that apply to most engineering jobsand other technical work. Interpersonal skills -including teamwork, communication,networking, public speaking, negotiation, andleadership - are the techniques you need toeffectively work with others.The objective of this course is to acceleratelearning by enabling technical professionals tocontinuously develop the most importantinterpersonal skills in today’s fast-paced andcompetitive work environment. Participantswill leave with tools that will help them excelquickly as engineers and technical leaders,and they will be inspired to apply what theylearn to improve their personal productivityand productivity in their respectiveworkgroups.

INTENDED AUDIENCEThis material is intended for anyone who canbenefit from improving interpersonal skills. Thecourse is tailored for engineers, managers,prospective managers, and other technicalprofessionals through the use of real-worldcase studies, exercises and examplespertaining to the experiences of individualsand teams involved in technology projects.

COURSE PRICE INCLUDES a comprehensiveworkbook and e-mail/phone follow-up with theinstructor after the workshop to assist withimplementation.

Book Publishing forEngineers and ScientistsWS775Course level: Introductory

Authors are often surprised at just howdifferent book publishing can be from theprocess of publishing proceedings or journalarticles. Writing a book can take months oreven years of your time - don’t be caught off-guard. This course takes you through thepublishing process from the moment the ideastrikes you (or the moment an AcquisitionsEditor approaches you) to that unforgettablefirst moment of seeing your book on the shelf.

INTENDED AUDIENCEThis material is intended for all engineers andscientists interested in the book-publishingprocess. Those who are interested in writing orare currently penning a technical book will findthis course valuable.

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Strategies and Tactics forHigh-Tech Sales SuccessWS826Course level: Introductory

This course introduces proven strategies andtactics for high-tech sales success.Participants will gain a strong understandingand appreciation of the purchase process asseen through the eyes of their customers.Attendees will learn how to align their salesprocess with how their customers wish tomake purchase decisions. The workshop ishands-on, with interactive exercises andworksheets that attendees will complete usingtheir own products and services as a guide.

INTENDED AUDIENCEAnyone who is involved with the sales,marketing and support of highly technicalproducts and services will benefit from thiscourse. (This includes pre and post-salesengineers and customer supportrepresentatives.)

COURSE PRICE INCLUDES a workbookcontaining worksheets, templates andsections from the instructor’s upcoming sales-training book. While several exercises will becompleted during the course, these additionalresources will help attendees effectively utilizethe techniques and tactics introduced duringthe course.

Off the Beaten Path: CareerOpportunities for Engineersin the Patent Boom (LawDegree Not Required)WS827Course level: Introductory

Looking for a position where you are exposedto cutting edge technology, while at the sametime not becoming pigeon-holed into aspecific technological field, never to return? Aposition in the ever-growing field of intellectualproperty (IP) support might be for you. Lawfirms, businesses, and government entities arehiring engineers as never before due to theexplosion in the number of patent filings overthe last decade.

This course will skim over the patent basicsonly to the extent necessary to indoctrinatethose having no background in the area. Next,you will be guided to the places of opportunity- law firms, in-house corporate, and the UnitedStates Patent and Trademark Office - andprovided with job descriptions for each.Finally, and most importantly, you will learnhow to get the job you want from actualpractitioners in the field. These insiders willprovide you with the tips you need to getaround the “outside-looking-in” barrier thatkeeps most people out.

INTENDED AUDIENCEAnyone who has interest in employment in thefield of patents. This course intends to exposeengineers, scientists, and others toopportunities outside the realm of the typicalscience / technology career track. Practicingengineers, students and early-careerprofessionals, corporate executives, andothers may have interest.

Understanding Laser BeamPerformance SpecificationsWS828Course level: Introductory

This workshop will provide attendees with abasic understanding of laser beamperformance specifications. Topics to becovered include Beam Pointing Stability,Polarization Ratio, RMS Noise, Peak-to-PeakNoise, Pulse Duration and Duty Cycle, PeakPower, Average Power, Pulse Repetition Rate,and M2. These specifications constitute thecritical parameters that determine whether ornot a laser, or laser system, will do theintended job.

INTENDED AUDIENCESales/marketing personnel will find the coursequite beneficial to precisely grasp clients’requirements and specifications. Engineers,technicians and other support staff may alsofind this course useful as they strive to meetclient needs as directed by sales/marketing.

COURSE PRICE INCLUDES two weeks offollow-up e-mail and phone consultations.


training, anytime.


Self Directed Learning

Multimedia Educational Products from SPIEPrice Video CD-ROM DVD

member/nonmemberDefense and SecuritySC547 Terahertz Wave Technology and Applications (Xi-Cheng Zhang) $299/$335 VT CDSC194 Multispectral and Hyperspectral Image Sensors (Terrence S. Lomheim) $299/$335 VT DVDSC174 Multispectral Image Processing (Robert A. Schowengerdt) $299/$335 VTSC217 Fundamentals of Radiometry: Calculation, Measurement

and Calibration (James M. Palmer) $299/$335 VT DVDSC134 Fundamental Approach to IR Optical Systems Design (Max J. Riedl) $299/$335 VT DVDSC587 Imaging Detector Arrays (Eustace Dereniak) $299/$335 VTSC164 Dynamic Infrared Scene Projection (Owen M. Williams) $299/$335 VT CDSC158 Fundamentals of Automatic Target Recognition (Hatem N. Nasr) $299/$335 VTSC165 Uncooled IR Focal Plane Arrays (Paul W. Kruse) $299/$335 VTSC073 Low Noise CCD Electronics (Thomas H. Ebben) $450/$500 VTSC074 Evaluation of CCD Arrays and Solid State Cameras (Gerald Holst) $299/$335 VTSC138 Introduction to CCDs (James Janesick) $299/$335 VT CDSC167 Introduction to Laser Radar (Gary Kamerman) $299/$335 VT DVDSC279 Sensor Systems Engineering* (Richard J. Becherer) $199/$225 VT

Industrial Sensing and MeasurementSC212 Modern Optical Testing (James C. Wyant) $299/$335 VT CDSC011 Design of Efficient Illumination Systems (William J. Cassarly) $299/$335 VT CDSC393 Optical Waveguide Fabrication (Paul R. Ashley) $299/$335 VT CDSC167 Introduction to Laser Radar (Gary Kamerman) $299/$335 VTSC280 The Implementation of Virtual Reality* (Steve Bryson) $199/$225 VTSC281 Industrial Optical Metrology for Quality Control and Process

Improvement* (Kevin Harding) $199/$225 VT

Biomedical OpticsSC029 Tissue Optics (Steven L. Jacques) $299/$335 VT DVDSC566 An Engineering Introduction to Biotechnology (J. Patrick Fitch) $334/$370 VT CDSC437 Microfabrication Techniques for MicroFluidics & BioMEMS (Marc Madou) $299/$335 VT CDSC393 Optical Waveguide Fabrication (Paul R. Ashley) $299/$335 VT CD

Electronic Imaging and Signal ProcessingSC138 Introduction to CCDs (James Janesick) $299/$335 VT CDSC073 Low Noise CCD Electronics (Thomas H. Ebben) $450/$500 VT DVDSC074 Evaluation of CCD Arrays and Solid State Cameras (Gerald Holst) $299/$335 VTSC068 Use of CCDs in Visible Imaging Applications (Terrence S. Lomheim) $299/$335 VTSC284 Overview of CMOS Image Sensors (Hon-Sum P. Wong) $299/$335 VTSC282 Applications of Modern Image Processing (Harley R. Myler, Arthur R. Weeks) $299/$335 VTSC283 Image Processing and Analysis (Mohan M. Trivedi) $299/$335 VTSC064 Introduction to Electronic Imaging (Majid Rabbani) $299/$335 VT CDSC080 Fundamentals of Wavelet Image Compression and the Emerging

JPEG-2000 Standard (Majid Rabbani) $299/$335 VTSC245 Introduction to Digital Image Processing (Majid Rabbani) $540/$605 VTSC558 Digital Image Enhancement* (Majid Rabbani) $199/$225 VTSC589 Image and Video Compression Fundamentals and International

Standards* (Majid Rabbani) $199/$225 VTSC087 Optical Document Security (Rudolf L. van Renesse) $299/$335 VT CDSC393 Optical Waveguide Fabrication (Paul R. Ashley) $299/$335 VT CDSC301 Introduction to Artificial Neural Networks for Pattern

Recognition* (Steven K. Rogers) $199/$225 VTSC302 Fuzzy and Neural Pattern Recognition* (James C. Bezdek) $199/$225 VTSC017 Introduction to Fourier Optics (Jack D. Gaskill) $299/$335 VT CD

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Self Directed Learning

* SPIE Original Video Collection Continued



WS001 = Workshop NumberVT = Course also available on Video TapeCD = Course also available on CD-ROM

DVD = Course also available on DVD

Communications & NetworkingSC234 DWDM Sources (Jens Buus) $299/$335 VTSC260 Fiber Gratings for WDM Applications (Dmitry S. Starodubov) $299/$335 VTSC274 Review of Critical DWDM Component and System Issues-A 10-Part

Series (Andre Girard) $299/$335 VTSC233 Optical MEMS for Lightwave Networks (David Bishop) $299/$335 VTSC224Z Understanding Fiber Optic Components and Systems—

Full 2 Part Series (Jeff C. Hecht) $615/$680 VT CDSC224A Understanding Fiber Optic Components—Part A of 2-Part Series

(Jeff C. Hecht) $299/$335 VT CDSC224B Understanding Fiber Optic Communications Systems and Optical

Networking—Part B of 2-Part Series (Jeff C. Hecht) $299/$335 VT CDSC230 Integration of Optical Coatings into and Optical System

(Philip W. Baumeister) $299/$335 VTSC285 Introduction to Optical Fiber Components and Systems* (Michael Corke) $399/$445 VTSC286 Fiber Optic Sensors: An Introduction for Engineers and Scientists*

(Eric Udd) $199/$225 VTSC393 Optical Waveguide Fabrication (Paul R. Ashley) $299/$335 VT CD

Lasers & SourcesSC294 Fundamentals of Lasers and Laser Applications (Anthony E. Siegman) $540/$605 VT DVDSC364Z Basic Laser Technologies for Engineers And Technicians—

Full 3-Part Series (Breck Hitz) $869/$955 VTSC364A The Nature of Light and Laser Light: Optical Effects and Components-

Part A of a 3-Part Series (Breck Hitz) $299/$335 VTSC364B The Two Basic Laser Principles: Gain and Feedback—

Part B of a 3-Part Series (Breck Hitz) $299/$335 VTSC364C Modifying Lasers: Pulsed Lasers, Narrowband Lasers, and Nonlinear

Optics—Part C of a 3-Part Series (Breck Hitz) $299/$335 VTSC131 Introduction to Diode Lasers, LEDs, and Detectors (Kurt J. Linden) $299/$335 VT CDSC012 Miniature Optics for Diode Lasers and Beam Shaping (Tom D. Milster) $299/$335 VTSC049 Introduction to Laser Diode-Pumped Solid-State Lasers (Richard Scheps) $299/$335 VTSC339 Developments in Vertical-Cavity Surface Emitting Lasers (Kent Choquette) $299/$335 VT

Micro/Nano Lithography & FabricationSC497 Nanophotonics (Paras N. Prasad) $299/$335 VT CDSC437 Microfabrication Techniques for MicroFluidics & BioMEMS (Marc Madou) $299/$335 VT CDSC115 Microlithographic Lens Design (David M. Williamson) $299/$335 VT CDSC100 Introduction to Electron-Beam Lithography (Mark A. McCord) $299/$335 VTSC111 Lithography Process Control (Harry J. Levinson) $299/$335 VTSC113 Here is Why in Optical Lithography (Burn J. Lin) $299/$335 VT CDSC121 Practical Process Design for Microlithography (John L. Sturtevant,

John S. Petersen) $299/$335 VT CDSC145 Submicron Device Physics and Technology (Jack C. Lee) $299/$335 VTSC237 Microoptics and MEMS (M. E. Motamedi, Thomas W. Krygowski) $299/$335 VTSC239 Process Integration and Characterization in Microelectronic

Manufacturing (Badih El-Kareh) $299/$335 VTSC295 Introduction to Nonlinear Optical Materials (Paras N. Prasad) $299/$335 VTSC393 Optical Waveguide Fabrication (Paul R. Ashley) $299/$335 VT CD


member/nonmember



member/nonmember

Self Directed Learning continued

View course descriptions and order online: spie.org/store/6130

SPIE is a not-for-profit international societydedicated to furthering technological innovations.

International HeadquartersP.O. Box 10, Bellingham, WA 98227-0010 USATel: +1 360 676 3290 • Fax: +1 360 647 [email protected] • spie.org

2 Alexandra Gate, Ffordd Pengam, Cardiff, CF24 2SA, UKTel: +44 29 20 89 4747 • Fax: +44 29 20 89 [email protected] • spieeurope.org

Optical Design & EngineeringSC001 Optical Design: Principles of Optical System Layout (Warren J. Smith) $367/$403 VT CDSC003 Practical Optical System Design-Updated (Robert E. Fischer) $374/$410 VT CDSC156 Basic Electro-Optics for Electrical Engineers (Glenn Boreman) $334/$370 VT DVDSC192 Introduction to Optics for Non-Optical Engineers (Mark Kahan) $299/$335 VT DVDSC299 Precision Plastic Optics (Xiaohui Ning) $299/$335 VTSC368 Fundamentos de Electro-Óptica para Ingenieros (Javier Alda) $334/$370 VTSC264 Basic Optical Engineering for Electrical Engineers (Clint D. Harper) $380/$416 VT CDSC017 Introduction to Fourier Optics (Jack D. Gaskill) $299/$335 VT CDSC008 Microlens Arrays: Properties and Applications (James R. Leger) $299/$335 VT CDSC020 Optical Scattering: Measurement and Analysis (John C. Stover) $299/$335 VTSC067 Testing and Evaluation of Electro-Optical Imaging Systems (Gerald Holst) $299/$335 VTSC296 Properties and Performance of Optical Materials (Michael E. Thomas) $299/$335 VTSC298 Principles of Diffraction, Interferometry, Holography and Diffractive

Optical Elements (Emmett Leith) $299/$335 VT DVDSC300 Diffractive Optical Elements (Neal C. Gallagher Jr., Donald W. Sweeney) $299/$335 VTSC552 Aspheric Optics: Design, Fabrication, and Test (Robert E. Fischer) $374/$410 VT CDSC490 Introduction to Solid State Lighting in General Illumination (Ian T. Ferguson) $299/$335 VT CDSC012 Miniature Optics for Diode Lasers and Beam Shaping (Tom D. Milster) $299/$335 VTSC230 Integration of Optical Coatings into and Optical System

(Philip W. Baumeister) $299/$335 VTWS487 Pulling Property Out of Thin Air: The Optical Patent (Marshall Honeyman) $59/$79 VT CD

Optomechanical EngineeringSC014 Introduction to Optomechanical Design (Daniel Vukobratovich) $540/$605 VT DVDSC429 Basic Optomechanical Engineering (Paul R. Yoder, Jr.) $422/$458 VT CDSC010 Fundamentals of Optical Alignment Techniques (Mitchell C. Ruda) $299/$335 VT CDSC588 Optomechanical Interface Design and Analysis (Paul R. Yoder, Jr.) $299/$335 VTSC297 Basic Optics for Mechanical Engineers (Gary Wiese) $299/$335 VT

* SPIE Original Video Collection



WS001 = Workshop NumberVT = Course also available on Video TapeCD = Course also available on CD-ROM

DVD = Course also available on DVD


17–22 February 2007San Diego, California USAspie.org/events/mi

25 February–2 March 2007San Jose, California USAspie/org/events/al

18–22 March 2007San Diego, California USAspie/org/events/ssmnde

9–13 April 2007Orlando, Florida USAspie.org/events/dss

16–20 April 2007Prague, Czech Republic

2–4 May 2007Maspalomas, Gran Canaria, Spain

Building a Better Future with Light

Events

14–17 May 2007Rochester, New York USAspie.org/events/ofb

SPIE

Fluctuationsand Noise20–24 May 2007Florence, Italy European Conferences on

Biomedical Optics17–21 June 2007Munich, GermanyCo-sponsored by OSA and SPIE

18–21 June 2007Munich, GermanyCo-located with EuropeanConferences on Biomedical Optics

26–30 August 2007San Diego, California USAspie.org/events/op

9–12 September 2007Boston, Massachusetts USAspie.org/events/oe

Get more information at spie.org

16–21 September 2007Monterey, California USAspie.org/events/pm

1–5 November 2007Wuhan, Chinaspie.org/events/apoc

11–15 November 2007Beijing, Chinaspie.org/events/pa

19–24 January 2008San Jose, California USAspie.org/events/pw


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2007

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Professional Development from SPIEspie.org/education

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