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Background Statement for SEMI Draft Document 4523REVISION TO SEMI P45, SPECIFICATION FOR JOB DECK DATA FORMAT FOR VSB MASK WRITERS Note: This background statement is not part of the balloted item. It is provided solely to assist the recipient inreaching an informed decision based on the rationale of the activity that preceded the creation of this document.

Note: Recipients of this document are invited to submit, with their comments, notification of any relevant patentedtechnology or copyrighted items of which they are aware and to provide supporting documentation. In this context,“patented technology” is defined as technology for which a patent has issued or has been applied for. In the lattercase, only publicly available information on the contents of the patent application is to be provided.

Note: Additions are indicated by underline and deletions are indicated by strikethrough.

BackgroundOne year have passed since the first edition of SEMI P45 (MALY) was published, and revisions for the practical use of MALY are proposed in this ballot. The correspondence to the revision of SEMI P44 to apply the standard to other mask tools in addition to VSB mask writers is also proposed.

Below summarizes the suggested revisions to the SEMI P45 specification.

The standard title is changed from “SPECIFICATION FOR JOB DECK DATA FORMAT FOR VSB MASK WRITERS” to “SPECIFICATION FOR JOB DECK DATA FORMAT FOR MASK TOOLS” in order to apply to other mask tools in addition to VSB mask writers. The wording “EB writers” in this document is also changed into “mask tools”

The format name “OASIS.VSB” is changed into “OASIS.MASK” according to the suggested revisions to SEMI P44 in another ballot.

The keyword name indicates the file type of the mask data in the ROOT record is changed from “NEO | EB” to “OASIS.MASK | NATIVE” according to the comment in last Yellow Ballot that the keyword name of the file type is not appropriate word.

The mask size of 7 and 8 in the MASKSIZE record are added according to the increase in kind of the mask size. .

The effective place of decimals of the scale factor for the structure is expanded from 3 to 4 for the needs of high accuracy.

The start record “BEGIN MALY” and the end record “END MALY” are added to define the format kind and the version number in a MALY file.

The parameter name “oasis_vsb_name” in the AREF and SREF record is changed into “oasis_mask_name”. The word “directory” in the definition of “oasis_mask_name” is changed into “file” for the error correction.

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Informational (Blue) Ballot1000AThe result of this ballot may be reviewed at next Japan Micropatterning Committee, which is scheduled on April 23, 2008, at SEMI Japan..

This is a draft document of the SEMI International Standards program. No material on this page is to be construed as an official or adopted standard. Permission is granted to reproduce and/or distribute this document, in whole or in part, only within the scope of SEMI International Standards committee (document development) activity. All other reproduction and/or distribution without the prior written consent of SEMI is prohibited.

Doc. 4523 SEMI

Semiconductor Equipment and Materials International3081 Zanker RoadSan Jose, CA 95134-2127Phone:408.943.6900 Fax: 408.943.7943

DRAFTDocument Number: 4523

Date: 5/20/2023

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Informational (Blue) Ballot1000A

SEMI Draft Document 4523REVISION TO SEMI P45, SPECIFICATION FOR JOB DECK DATA FORMAT FOR VSB MASK WRITERSMASK TOOLS

1 Purpose1.1 This document defines the common job deck data format specifications for VSB EB writersmask tools, namely

“MALY”.

2 Scope2.1 MALY specification applies to the input data format for VSB EB writersmask tools. It may be also used for other EB writers, mask defect inspection equipments, and mask defect repair equipments.

NOTICE: This standard does not purport to address safety issues, if any, associated with its use. It is the responsibility of the users of this standard to establish appropriate safety and health practices and determine the applicability of regulatory or other limitations prior to use.

3 Limitations3.1 This standard does not include the job deck data specification different in each VSB mask writermask tool.

4 Referenced Standards and Documents4.1 SEMI Standards

SEMI P39 — OASISTM – Open Artwork System Interchange Standard

SEMI P44 — Specification for Open Artwork System Interchange Standard (OASISTM) Specific to VSB Mask WritersMask ToolsNOTICE: Unless otherwise indicated, all documents cited shall be the latest published versions.

5 Terminology5.1 Abbreviations and Acronyms

5.1.1 EB — Electron Beam

5.1.2 5.1.1 MALY — Mask Layout Data Format

5.1.3 5.1.2 OASISTM — Open Artwork System Interchange Standard

5.1.4 5.1.3 OASIS.VSBMASK — Open Artwork System Interchange Standard (OASISTM) specific to VSB mask writersMask Tools

5.1.5 VSB — Variable Shaped Beam

5.2 Definitions

5.2.1 mask — a photomask for one layer.

5.2.2 mask set — a set of masks necessary to manufacture a semiconductor product.

5.2.3 structure — a group of patterns placed on masks, a cell in OASIS.VSB.

5.2.4 structure group — a group of structures with identical drawing condition.

5.2.5 title — character strings which identify masks such as the drawing date, the serial number, and the product name.

5.2.6 parameter — parameters necessary for drawing masks such as the size of mask and the reference point of placement.


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Informational (Blue) Ballot1000A6 Requirements6.1 Outline

6.1.1 MALY is a text file format which defines the mask layout data necessary for drawing masks with VSB EB writersmask tools. It is possible to combine this format with the various parameters for creating job deck data in EB writersmask tools.

6.1.2 MALY does not depend on EB writersmask tools. MALY is the common job deck data format among VSB EB writersmask tools.

6.1.3 This format defines a portion of the data required for job deck generation in VSB EB writersmask tools.

6.1.4 This format defines mask layout information such as chip positions and title positions.

6.1.5 The position of MALY in mask data preparation is shown in Figure 1.

Figure 1

Position of MALY

6.2 Fundamental Concepts

6.2.1 File Composition

6.2.1.1 Figure 2 shows the file composition of MALY. MALY is a file used to create job decks in combination with parameter files for EB writersmask tools. MALY defines parameter data, structure positioning data, and title positioning data. It is possible to define a number of masks in a MALY file. Parameter files contain the specific job deck data for EB writersmask tools except the mask layout data. The content and the number of files are different in each EB writermask tool .


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Design dataGDS-II/OASIS

MALY

Device makers

EB writers mask tools

Data conversion 2

Data conversion 1

EB dataOASIS.VSBMASK

Structure expansionField partitionSorting

SizingOPCRemove OverlapsDivide Trapezoids

Mask makers

Parameters for EB writers mask

tools

Data conversion 4

Data conversion 3

Mask layoutinformation

Format conversionEquipment conditions

Format conversionCoodinate conversion for

EB writers mask tools

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Figure 2

File Composition

6.2.2 Data Structure

6.2.2.1 Figure 3 shows MALY data items and their relationships.

Figure 3

Data Structure


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TitleStructure group

Mask

Mask set

Parameters for EB writersmask tools

OASIS.VSBMASK

MALY

Reference

Common maskMask

Parameter

1 to n inclusive relationship1: white circle, n: black circles

1 n

Maly

Parameters for EB writers mask tools

MALYOASIS.VSBMASK

Job deck data for EB writers mask tools

writers

Reference　Reference

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Informational (Blue) Ballot1000A6.2.3 Preconditions

6.2.3.1 Preconditions of MALY are shown in Table 1, Table 2, and Table 3.

Table 1 Preconditions of Masks

Item Condition

Data orientation The chrome surface is to be facing upwards (i.e., in the opposite direction to the design data).

Coordinate origin The origin is center of the mask.

Coordinate space Upper right is positive.Rotation Not supported.

MirroringY–axis mirroring based on the mask origin is supported.Mirroring only at each structure is not supported.

Scaling Not supported.

Table 2 Preconditions of Structures

Item Condition

Reference point of placement

One of the following three items must be selected. The origin of the structure Center of the window defined for the structure Lower left corner of the window defined for the structure

Reference point of array placement

One of the following three items must be selected. Reference point of the lower left structure in the array Center of the array region Lower left corner of the array region

Rotation Not supported.Mirroring Not supported.


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Title string

+

(0,0)

+

Structure center Lower leftStructure origin

Array area centerLower left structure Lower left corner origin

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Item Condition

ScalingScaling is based on the reference point of the structure.Scaling is defined in the ratio such as 0.5000 and 0.8000. Scaling does not influence the pitch of the array.

Table 3 Preconditions of Titles

Item Condition

Font Standard font or specific font for EB writersmask tools must be selected.

SizeHeight, width, and pitch of the standard font are fixed to 1mm. The size of the specific font for EB writersmask tools depends on the specification of EB writersmask tools.

Reference point of placement Reference point is center of the entire character string.

Rotation

The entire character string rotates every 90 degrees based on the reference point of the title. Counterclockwise rotation is positive.

MirroringY–axis mirroring based on the reference point is possible.With the chrome side facing upward, a readable character orientation is standard. (NONE)

Scaling Not supported.

6.2.4 Range of Parameter Specification

6.2.4.1 The ranges of parameter specification are shown in Table 4.

Table 4 Ranges of Parameter Specification

Item Limits

MALY file

Length of the file name 64 (not including the directory names)

Usable characters

The following characters may be used.A–Z a–z 0–9 . _The following characters may not be used.! " # $ % & ' ( ) * + , - / : ; < = > ? @ [ \ ] ^ { | } ~ [space] [tab]

OASIS.VSBMASK file

Number of reference files 2,000 per mask

Length of the file name64 (not including the directory names) or 256 (including the directory name)

Usable characters


Mask Length of the mask name 32


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Item Limits

Usable characters


Mask size 5, 6, 7, 8, or 9 (25.40 mm units)Number of masks 100 per file

Structure group

Length of the structure group name 64

Usable characters


Number of structure group 2,000 per mask (total of MASK and CMASK)

Structure

Length of structure name 256; based on OASIS.VSBMASK standardUsable characters A to Z, a to z, 0 to 9 and; based on OASIS.VSBMASK standard

Number of placements2,000 per mask, including both structure positions and array positions(total of MASK and CMASK)

Coordinates of placementsRange: within the mask size (from −114300μm to 114300μm)Effective places of decimals: 5

ScalingRange: from 0.5000 to 1.0000Effective places of decimals: 34Scaling does not influence the array pitch.

Number of array repetitions From 1 to 100 in the x direction and in the y direction.

Array pitchUnits: m, positive values onlyEffective places of decimals: 5

Property(common to DNAME, MNAME, and ENAME)

Length of property name 64

Usable characters


Title

Number of placements

6 per mask (total of MASK and CMASK)[Breakdown] Date title: 1 per mask Serial number title: 1 per mask Character string titles: 4 per mask

Coordinates of placementsRange: within the mask size (from −114300μm to 114300μm)Effective places of decimals: 5

Number of characters 64 per title

Usable characters

The following characters may be used.A–Z 0–9 ! # % & * + , - . / : ; < = > ? @ _ [space]The following characters may not be used.a–z “ $ ' ( ) [ \ ] ^ { | } ~ [tab]


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Item Limits

Size

Units: mmHeight, width, and pitch of the standard font are fixed to 1mm. The size of the specific font for EB writersmask tools depends on the specification of EB writersmask tools.Effective places of decimals: In accordance with the specification of EB writersmask tools.

Angle 0, 90, 180, and 270 only

6.3 Description of Records

6.3.1 Record Formats

6.3.1.1 Record formats are shown in Table 5.

Table 5 Record Formats

Symbol Meaning

// This symbol indicates that the remainder of the line will be treated as a comment./* */ All text between these symbols will be treated as a comment.

[space] This character is used for punctuation. However, if enclosed in quotation marks (i.e., “ “), it will be treated a space character.

+ (first column) When this character is present in the first column, it will indicate a continuation from the previous line. Line feed is to be carried out before and after punctuation characters (i.e., spaces).

6.3.2 List of Records

6.3.2.1 Records of MALY are shown in Table 6 to Table 1112.

Table 6 Maly Section [MALY]

Record Name Description

BEGIN MA LY version_number Start of the ma ly section END MA LY End of the ma ly section

Table 67 Mask Set Section Records [MASKSET]


BEGIN MASKSET Start of the mask set sectionEND MASKSET End of the mask set section

Table 78 Common Mask Section Records [CMASK]


BEGIN CMASK Start of the common mask sectionEND CMASK End of the common mask section

Table 89 Mask Section Records [MASK]


BEGIN MASK mask_name Start of the mask sectionEND MASK End of the mask section


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Informational (Blue) Ballot1000ATable 910 Parameter Section Records [PARAMETER]


BEGIN PARAMETER Start of the parameter sectionEND PARAMETER End of the parameter sectionMASKSIZE size Mask sizeFONT {STANDARD | NATIVE} Font settingBASE {ORIGIN | CENTER | LOWERLEFT} Structure reference point settingARYBASE {ORIGIN | CENTER | LOWERLEFT} Array structure reference point settingROOT {NEOOASIS.MASK | EBNATIVE} directory Root directory settingREFERENCE EBTOOL file_name Reference file settingMASKMIRROR {NONE | Y} Mask mirror setting

Table 1011 Title Section Records [TITLE]


BEGIN TITLE Start of the title sectionEND TITLE End of the title sectionDATE {x y | OFF} Date title settingSERIAL {x y | OFF} Serial number title settingSTRING string x y [SIZE width height pitch] [MIRROR {NONE | Y}] [ROTATE angle] Optional string title setting

Table 1112 Structure Group Section Records [STRGROUP]


BEGIN STRGROUP group_name Start of the structure group sectionEND STRGROUP End of the structure group sectionSREF oasis.vsbmask_name structure_name layer ORG x y SIZE x1 y1 x2 y2 [SCALE scale]

Structure placement setting

AREF oasis.vsbmask_name structure_name layer ORG x y SIZE x1 y1 x2 y2 [SCALE scale]ITERATION xiter yiter xpitch ypitch

Array structure placement setting

PROPERTY [DNAME design_name] [MNAME mask_name] [ENAME ebnative_name] Property setting

6.3.3 Maly Section Records

6.3.3.1 BEGIN MALY Record

6.3.3.1.1A BEGIN MALY record represents the start of the maly section.

BEGIN MA LY version_number Start of the ma ly section

V ersion_number Indicates the version number of the MALY specification. With this specification, the value is “1. 1 ”.

6.3.3.1.2In the MALY file, it is necessary to define the BEGIN MALY record once and to begin with this record.

6.3.3.1.3The following section may appear between the BEGIN MALY record and the END MALY record.


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[MASKSET] Mask set section — I t is necessary to define this section once .

6.3.3.2 END MALY Record

6.3.3.2.1An END MALY record represents the end of the ma ly section .

END MA LY End of the ma ly section

6.3.3.2.2A section start ing with the BEGIN MA LY record must end using the END MA LY record . In the MALY file, it is necessary to define this record once and to end with this record .

6.3.4 Mask Set Section Records

6.3.4.1 BEGIN MASKSET Record

6.3.4.1.1A BEGIN MASKSET record represents the start of the mask set section.

BEGIN MASKSET Start of the mask set section

6.3.4.1.2In the MALY file, it is necessary to define the BEGIN MASKSET record once and to begin with this record. The BEGIN MASKSET record must appear immediately after the BEGIN MALY record.

6.3.4.1.3The following sections may appear between the BEGIN MASKSET record and the END MASKSET record.

[CMASK] Common mask section — It is necessary to define this section once. [MASK] Mask section

6.3.4.2 END MASKSET Record

6.3.4.2.1An END MASKSET record represents the end of the mask set section.

END MASKSET End of the mask set section

6.3.4.2.2A section starting with the BEGIN MASKSET record must end using the END MASKSET record. In the MALY file, it is necessary to define this record once and to end with this record.

6.3.5 Common Mask Section Records

6.3.5.1 BEGIN CMASK Record

6.3.5.1.1A BEGIN CMASK record represents the start of the common mask section.

BEGIN CMASK Start of the common mask section

6.3.5.1.2In the MALY file, it is necessary to define the BEGIN CMASK record once. The BEGIN CMASK record must appear immediately after the BEGIN MASKSET record.

6.3.5.1.3The following sections may appear between the BEGIN CMASK record and the END CMASK record.

[PARAMETER] Parameter section[TITLE] Title section[STRGROUP] Structure group section


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6.3.5.1.4Caution — The CMASK section must appear before MASK sections.

6.3.5.2 END CMASK Record

6.3.5.2.1An END CMASK record represents the end of the common mask section.

END CMASK End of the common mask section

6.3.5.2.2A section starting with the BEGIN CMASK record must end using the END CMASK record.

6.3.6 Mask Section Records

6.3.6.1 BEGIN MASK Record

6.3.6.1.1A BEGIN MASK record represents the start of the mask section.

BEGIN MASK mask_name Start of the mask section

mask_name Indicates the mask name which must be unique in the mask set.

6.3.6.1.2This section may appear multiple times in a MALY file. If this record is omitted, the mask will not be drawn.

6.3.6.1.3The following sections may appear between the BEGIN MASK record and the END MASK record.

[PARAMETER] Parameter section[TITLE] Title section[STRGROUP] Structure group section

6.3.6.2 END MASK Record

6.3.6.2.1An END MASK record represents the end of the mask section.

END MASK End of the mask section

6.3.6.2.2A section starting with the BEGIN MASK record must end using the END MASK record.

6.3.6.2.3Example — The relationship between the CMASK section and the MASK sections.

BEGIN MALY 1.1BEGIN MASKSET

BEGIN CMASK : Common mask settings END CMASK BEGIN MASK A : Settings for mask A END MASK BEGIN MASK B : Settings for mask B END MASK

END MASKSETEND MALY

6.3.7 Parameter Section Records


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Informational (Blue) Ballot1000A6.3.7.1 BEGIN PARAMETER Record

6.3.7.1.1A BEGIN PARAMETER record represents the start of the parameter section.

BEGIN PARAMETER Start of the parameter section

6.3.7.1.2The parameter section can appear in both the common mask section and the mask section. There are differences in records of the parameter section which can be used in the common mask section and the mask section. The following records may appear between the BEGIN PARAMETER record and the END PARAMETER record.

Parameter section records which may appear in the common mask section:[MASKSIZE] Mask size[FONT] Font settings[BASE] Structure positioning origin settings[ARYBASE] Array–structure positioning origin settings[ROOT] Root directory settings[REFERENCE] Reference file settings[MASKMIRROR] Mask mirror settings

Parameter section records which may appear in the mask section:[ROOT] Root directory settings[REFERENCE] Reference file settings[MASKMIRROR] Mask mirror settings

6.3.7.1.3The parameter section cannot be omitted from the CMASK section and can be omitted from the MASK section.

6.3.7.1.4When each record of the parameter section is omitted, the default setting is used.

6.3.7.1.5The order of records in the parameter section is free.

6.3.7.2 END PARAMETER Record

6.3.7.2.1An END PARAMETER record represents the end of the parameter section.

END PARAMETER End of the parameter section

6.3.7.2.2A section starting with the BEGIN PARAMETER record must end using the END PARAMETER record.

6.3.7.3 MASKSIZE Record

6.3.7.3.1A MASKSIZE record represents the size of the mask.

MASKSIZE size Mask size

size Indicates the mask size in the unit of 25.4 mm.Specification range: 5, 6, 7, 8, or 9

6.3.7.3.2This record must appear in the common mask section and must not appear in the mask section.

6.3.7.4 FONT Record

6.3.7.4.1A FONT record represents the font type.

FONT {STANDARD | NATIVE} Font setting

STANDARD Indicates that the standard font will be used.


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Informational (Blue) Ballot1000ANATIVE Indicates that the specific font for EB writers will be used.


6.3.7.5 BASE Record

6.3.7.5.1A BASE record represents the reference point of structures.

BASE {ORIGIN | CENTER | LOWERLEFT} Structure reference point settings

ORIGIN Indicates that the structure origin will be used.

CENTER Indicates that the center of the window defined for the structure will be used.

LOWERLEFT Indicates that the lower left corner of the window defined for the structure will be used.


6.3.7.6 ARYBASE Record

6.3.7.6.1An ARYBASE record represents the reference point of array structures.


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Structure origin

Center of window area

Lower–left of window

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ARYBASE {ORIGIN | CENTER | LOWERLEFT} Array structure reference point setting

ORIGIN Indicates that the origin of the lower left structure will be used. Note that the reference point of the structure will vary with respect to the BASE record.

CENTER Indicates that the center of the array region is to be used.

LOWERLEFT Indicates that the lower left corner of the array region is to be used.


6.3.7.7 ROOT Record

6.3.7.7.1A ROOT record represents the type of the root directory specification.

ROOT {NEOOASIS.MASK | EBNATIVE} directory Root directory setting

NEOOASIS.MASK Indicates the location of OASIS.VSBMASK files.EBNATIVE Indicates the location of EB native data files of mask tools . directory Indicates the name of the root directory for OASIS.VSBMASK files or EB native

data files of mask tools. The method of indicating the directory depends on the OS used in EB writersmask tools. The file which appears in MALY makes this directory the root directory. When a full directory is specified for the file, this directory is disregarded.

Example: The relationship between the root directory and file names ROOT NEOOASIS.MASK “/home/oasisvsbmask” : SREF M1/A1.oas CHIP_A 1 ORG -20.0 0 SIZE 0.0 0.0 1.0 1.0


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Lower–left structure origin

(for central structure origins)

Array region center

Array region lower–left

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Informational (Blue) Ballot1000A /* /home/oasisvsbmask/M1/A1.oas is referenced. */ SREF /home/oasisvsbmask2/A1.oas CHIP_A 1 …. /* /home/oasisvsbmask2/A1.oas is referenced. */

6.3.7.7.2This record may appear in both the common mask section and the mask section. If this record appears in both sections, the mask section is given priority.

6.3.7.7.3When this record is omitted, the file makes the current directory the root directory.

6.3.7.8 REFERENCE EBTOOL Record

6.3.7.8.1REFERENCE EBTOOL record represents the files to be referenced from MALY.

REFERENCE EBTOOL file_name Reference file setting

EBTOOL Indicates that the file of parameters for EB writersmask tools is referred to.file_name Indicates the name of the reference file, including the directory name. The method

of indicating the directory depends on the OS used in EB writersmask tools.


6.3.7.8.3When this record is omitted, no file is referred to.

6.3.7.9 MASKMIRROR Record

6.3.7.9.1MASKMIRROR record represents the mirroring of the mask.

MASKMIRROR {NONE | Y} Mask mirroring setting

NONE Indicates that the chrome side is facing upward.


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(0,0)

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Informational (Blue) Ballot1000AY Indicates mirroring based on the y-axis. All placements of structures and all patterns

in structures are mirrored based on the y-axis of the mask center.


6.3.7.9.3When this record is omitted, the mirroring is not done.

6.3.8 Title Section Records

6.3.8.1 BEGIN TITLE Record

6.3.8.1.1A BEGIN TITLE record represents the start of the title section.

BEGIN TITLE Start of the title section

6.3.8.1.2 This record may appear in both the common mask section and the mask section.

6.3.8.1.3 If this record is omitted, the mask will not be drawn.

6.3.8.1.4The following records may appear between the BEGIN TITLE record and the END TITLE record.[DATE] Date title setting[SERIAL] Serial number title setting[STRING] Optional string title setting

6.3.8.1.5The order of records in the title section is free.

6.3.8.2 END TITLE Record

6.3.8.2.1An END TITLE record represents the end of the title section.

END TITLE End of the title section

6.3.8.2.2A section starting with the BEGIN TITLE record must end using the END TITLE record.

6.3.8.3 DATE Record

6.3.8.3.1A DATE record represents the setting for the date title.

DATE {x y | OFF} Date title setting

x y Indicates the position of the date title in the unit of m.


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Informational (Blue) Ballot1000AOFF Indicates that the date title is not drawn. This parameter is to be used in the mask

section to cancel the date title setting in the common mask section.Example: Date title settingBEGIN MALY 1.1 BEGIN MASKSET BEGIN CMASK BEGIN TITLE DATE 50.0 -50.0 /* The date title is drawn for all masks. */ END TITLE END CMASK BEGIN MASK A BEGIN TITLE DATE OFF /* The date title is not drawn for the mask A. */ END TITLE END MASKEND MASKSET

END MALY

6.3.8.3.2This record can be specified only once in each common mask section and mask section.


6.3.8.3.4When this record is omitted, the date title is not drawn.

6.3.8.3.5The date title is drawn in accordance with the display format of EB writersmask tools.

6.3.8.4 SERIAL Record

6.3.8.4.1A SERIAL record represents the setting for the serial number title.

SERIAL {x y | OFF} Serial number title setting

x y Indicates the position of the serial number title in the unit of m.OFF Indicates that the serial number title is not drawn. This parameter is to be used in the

mask section to cancel the serial number title setting in the common mask section.

6.3.8.4.2This record can be specified only once in each common mask section and mask section.


6.3.8.4.4When this record is omitted, the serial number title is not drawn.

6.3.8.4.5The serial number title is drawn in accordance with the display format of EB writersmask tools.

6.3.8.5 STRING Record

6.3.8.5.1A STRING record represents the setting for optional string title.

STRING string x y [SIZE width height pitch] [MIRROR {NONE | Y}] [ROTATE angle] Optional string title setting


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Informational (Blue) Ballot1000AString Indicates the character string for the title to be drawn. Any spaces to be included in

the string must be enclosed in quotation marks (i.e., “ “).

Example:AAA001, “BBB 001”, BBBCCC

x y Indicates the position of the optional string title in the unit of m.SIZE Indicates the size of the optional string title by width, height, and pitch. When the

size of the optional string title is omitted, 1.0mm is set for the size. When the standard font is specified, 1.0mm is set for the size.

width Indicates the width of the optional string title in the unit of mm.height Indicates the height of the optional string title in the unit of mm.pitch Indicates the pitch of the optional string title in the unit of mm.MIRROR Indicates the mirroring for the optional string title. The mirroring is performed based

on the origin of the title (i.e., the center of the optional string title) before the rotation. When this item is omitted, NONE is set for the mirroring.

NONE Indicates that the title becomes readable direction when the chrome side is facing upward.

Y Indicates the mirroring based on the y-axis.

ROTATE Indicates the rotation for the optional string title. The rotation is performed based on the origin of the title (i.e., the center of the optional string title) after the mirroring. When this item is omitted, 0 is set for the rotation.

angle Indicates the rotation angle (0, 90, 180, or 270) for the title.

0 90 180 270

6.3.8.5.2This record may appear in both the common mask section and the mask section. All optional string titles in the common mask section and the mask section are drawn in EB writersmask tools.

6.3.8.5.3When this record is omitted, the optional string title is not drawn.


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Informational (Blue) Ballot1000A6.3.9 Structure Group Section Records

6.3.9.1 BEGIN STRGROUP Record

6.3.9.1.1A BEGIN STRGROUP record represents the start of the structure group section.

BEGIN STRGROUP group_name Start of the structure group section

group_name Indicates the name for the structure group.

6.3.9.1.2This record may appear in both the common mask section and the mask section.

6.3.9.1.3Multiple structure groups can appear in each common mask section and the mask section.

6.3.9.1.4All structures to be drawn under the same drawing conditions in EB writersmask tools can be gathered in a structure group.

6.3.9.1.5Structure group name can be arbitrarily named and need not be made unique.

6.3.9.1.6When the structure group section is omitted, the structure is not placed.

6.3.9.1.7The following records may appear between the BEGIN STRGROUP record and the END STRGROUP record.

[SREF] Structure placement setting[AREF] Array–structure placement setting[PROPERTY] Property setting

6.3.9.1.8The order of records in the structure group section is free.

6.3.9.2 END STRGROUP Record

6.3.9.2.1An END STRGROUP record represents the end of the structure group section.

END STRGROUP End of the structure group section

6.3.9.2.2A section starting with the BEGIN STRGROUP record must end using the END STRGROUP record.

6.3.9.3 SREF Record

6.3.9.3.1A SREF record represents the structure placement setting.

SREF oasis.vsbmask_name structure_name layer ORG x y SIZE x1 y1 x2 y2 [SCALE scale]

Structure placement setting

oasis.vsbmask_name Indicates the name of the directoryfile which contains the structure to be placed.structure_name Indicates the name of the structure (the top cell) to be placed.layer Indicates the number of the layer for drawing.ORG Indicates the placement position of the structure. The reference point of the structure

is placed to the position. x y Indicates the position in the unit of m.SIZE Indicates the structure region in terms of coordinates from the origin of the

structure. This item specifies the coordinates of the structure before the scaling. x1 y1 Indicates the lower left coordinate of the structure in the unit of m to define the

placement region. x2 y2 Indicates the upper right coordinate of the structure in the unit of m to define the

placement region.SCALE Indicates the scaling factor for the structure.


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Informational (Blue) Ballot1000Ascale Indicates the scaling of the structure as a ratio (i.e., 0.5000, 0.8000)

6.3.9.4 AREF Record

6.3.9.4.1An AREF record represents the setting for the placement of array structures.

AREF oasis.vsbmask_name structure_name layer ORG x y SIZE x1 y1 x2 y2 [SCALE scale]ITERATION xiter yiter xpitch ypitch

Array structure placement setting

oasis.vsbmask_name Indicates the name of the directoryfile which contains the structure to be placed.structure_name Indicates the name of the structure (the top cell) to be placed.layer Indicates the number of the layer for drawing.ORG Indicates the placement position of the structure. The reference point of the structure

is placed to the position. x y Indicates the position in the unit of m.SIZE Indicates the structure region in terms of coordinates from the origin of the

structure. This item specifies the coordinates of the structure before the scaling. x1 y1 Indicates the lower left coordinate of the structure in the unit of m to define the

placement region. x2 y2 Indicates the upper right coordinate of the structure in the unit of m to define the

placement region.SCALE Indicates the scaling factor for the structure.scale Indicates the scaling of the structure as a ratio (i.e., 0.5000, 0.8000)ITERATION Indicates the setting for the placement of array structures.xiter Indicates the number of repetitions in the x direction.yiter Indicates the number of repetitions in the y direction.xpitch Indicates the x direction pitch in the unit of m.ypitch Indicates the y direction pitch in the unit of m.

6.3.9.5 PROPERTY Record

6.3.9.5.1A PROPERTY record represents the setting for the property of the structure.

PROPERTY [DNAME design_name] [MNAME mask_name] [ENAME ebnative_name] Property setting

DNAME design_name Indicates the identifier of the structure for the design process. An optional name can be specified besides the structure name in the OASIS.VSBMASK file. It may be omitted this item.

MNAME mask_name Indicates the identifier of the structure for the mask process. An optional name can be specified besides the structure name in the OASIS.VSBMASK file. It may be omitted this item.

ENAME ebnative_name Indicates the identifier of the structure for EB writersmask tools. An optional name can be specified besides the structure name in the OASIS.VSBMASK file. It may be omitted this item.

6.3.9.5.2This record appears immediately after the SREF record or the AREF record. The identifiers defined in this record according to the usage are added to the structure in the SREF record or the array structure in the AREF record.

6.4 Syntax

6.4.1 The following table is the notation to describe the MALY syntax.


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Informational (Blue) Ballot1000ATable 12 Notation Method (Syntax)

Symbol Name Symbol Meaning

Double Colon :: Indicates the structure. Square brackets [] The information within the brackets is optional. If not provided, the

default value is used. Braces {} Select one of the items in the braces. Braces with an asterisk {}* Indicates that any number of the items in the braces with asterisk can

be used. It may be omitted. Angle brackets <> Indicates that an element name in the angle brackets is defined

elsewhere in the syntax. Vertical bar | Indicates a choice between elements within in the braces.Italics string Indicates a variable.Under bar NONE Indicates a default value.

6.4.2 The MALY syntax is detailed as follows.

<MALY>::= MALY VERSION version_string BEGIN MASKSET

<cmask>{<mask>}*

END MASKSET

<cmask>::= BEGIN CMASK <cparameter>

[<title>]{<strgroup>}*

END CMASK

<mask>::= BEGIN MASK mask_name[<parameter>][<title>]{<strgroup>}*

END MASK

<cparameter>::= BEGIN PARAMETER{ <masksize> | <font> | <base> | <arybase> | [<root>] |[<reference>] | [<maskmirror>] }

END PARAMETER

<parameter>::= BEGIN PARAMETER{ [<root>] | [<reference>] | [<maskmirror>] }

END PARAMETER

<masksize>::= MASKSIZE size

<font>::= FONT {STANDARD | NATIVE}

<base>::= BASE {ORIGIN | CENTER | LOWERLEFT}


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Informational (Blue) Ballot1000A<arybase>::= ARYBASE {ORIGIN | CENTER | LOWERLEFT}

<root>::= [ROOT {NEOOASIS.MASK | EBNATIVE} directory]

<reference>::= REFERENCE EBTOOL file_name

<maskmirror>::= MASKMIRROR {NONE | Y}

<title>::= BEGIN TITLE{ [<date>] | [<serial>] | {<string>}* }

END TITLE

<date>::= DATE {x y | OFF}

<serial>::= SERIAL {x y | OFF}

<string>::= STRING string x y [SIZE width height pitch][MIRROR {NONE | Y}] [ROTATE angle]

<strgroup>::= BEGIN STRGROUP group_name{ {<sref> [<property>]}* | {<aref> [<property>]}* }

END STRGROUP

<sref>::= SREF oasis.vsbmask_name structure_name layer ORG x y SIZE x1 y1 x2 y2 [SCALE scale]

<aref>::= AREF oasis.vsbmask_name structure_name layer ORG x y SIZE x1 y1 x2 y2 [SCALE scale] ITERATION xiter yiter xpitch ypitch

<property>::= PROPERTY [DNAME design_name] [MNAME mask_name][ENAME ebnative_name]

6.5 Example of MALY

6.5.1 An example of the MALY file is detailed as follows.

BEGIN MALY 1.1BEGIN MASKSET

BEGIN CMASKBEGIN PARAMETER

MASKSIZE 5FONT STANDARDBASE ORIGINARYBASE ORIGINROOT NEOOASIS.MASK /home/VSBMASKROOT EBNATIVE /home/EBNATIVEREFERENCE EBTOOL a.para

END PARAMETER


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Informational (Blue) Ballot1000ABEGIN TITLE

DATE 50.0 -50.0SERIAL 0 -50.0STRING TEST 50.0 0 SIZE 1.0 1.0 1.0 MIRROR Y ROTATE 90

END TITLEEND CMASKBEGIN MASK A

BEGIN PARAMETERROOT NEOOASIS.MASK /home/vsbmask1MASKMIRROR Y

END PARAMETERBEGIN TITLE

DATE OFFSTRING MaskA1 -50.0 50.00

END TITLEBEGIN STRGROUP G1

SREF A1.oas CHIP_A 1 ORG -20.0 0 SIZE 0.0 0.0 10.0 10.0AREF A2.oas CHIP_A 2 ORG -20.0 0 SIZE 0.0 0.0 50.0 50.0

+ SCALE 0.800 ITERATION 5 2 2.0 1.0PROPERTY DNAME d001 ENAME e001

END STRGROUPBEGIN STRGROUP G2

SREF B3.oas CHIP_A 2 ORG -20.0 0.0 SIZE 0.0 0.0 12.0 12.0 END STRGROUP

END MASKEND MASKSET

END MALY

NOTICE: SEMI makes no warranties or representations as to the suitability of the standard(s) set forth herein for any particular application. The determination of the suitability of the standard(s) is solely the responsibility of the user. Users are cautioned to refer to manufacturer’s instructions, product labels, product data sheets, and other relevant literature respecting any materials or equipment mentioned herein. These standards are subject to change without notice.

By publication of this standard, Semiconductor Equipment and Materials International (SEMI) takes no position respecting the validity of any patent rights or copyrights asserted in connection with any item mentioned in this standard. Users of this standard are expressly advised that determination of any such patent rights or copyrights, and the risk of infringement of such rights are entirely their own responsibility.


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