syllabus

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E6617 Nanoelectronics Acad Unit: 3.0 Prerequisite: Nil Effective: Academic Year 2004-2005 (Semester 1) Last update: February 2004 OBJECTIVE To learn the fundamental and application of nanotechnology. To study the synthesis, properties, characterization, manipulation and application of nanostructured materials and devices. DESIRED OUTCOME Students should be able to understand and appreciate various technologies for nanoelectronics in this course. Understanding of the emerging nanotechnology from fabrication, and analysis methods to device applications is emphasized. OTHER RELEVANT INFORMATION This is a multi-disciplinary subject, knowledge in optics, materials science and electronic are required but not essential. CONTENT Introduction to Nanotechnology. Synthesis of Nanomaterials. Lithography. Analysis and Manipulation Methods. Carbon Nanotubes and its applications. Quantum Computing. ASSESSMENT SCHEME Continuous Assessment 20% Final Examination 80% SYLLABUS (39 HOURS) Introduction to Nanotechnology (6 hours) Scientific revolutions. Types of nanotechnology. Electronic properties and Quantum Effects. Top down and Bottom up approach. Quantum wells, wires, and dots. Synthesis of Nanomaterials (3 hours) Fundamental of film deposition. Physical deposition methods. Chemical deposition methods. Lithography (6 hours) Optical lithography. Extreme ultraviolet lithography. X-ray lithography. Electron beam lithography. Ion Beam lithography. Nanoimprint lithography. 1

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Page 1: Syllabus

E6617 Nanoelectronics Acad Unit: 3.0 Prerequisite: Nil Effective: Academic Year 2004-2005 (Semester 1) Last update: February 2004 OBJECTIVE To learn the fundamental and application of nanotechnology. To study the synthesis, properties, characterization, manipulation and application of nanostructured materials and devices. DESIRED OUTCOME Students should be able to understand and appreciate various technologies for nanoelectronics in this course. Understanding of the emerging nanotechnology from fabrication, and analysis methods to device applications is emphasized. OTHER RELEVANT INFORMATION This is a multi-disciplinary subject, knowledge in optics, materials science and electronic are required but not essential. CONTENT Introduction to Nanotechnology. Synthesis of Nanomaterials. Lithography. Analysis and Manipulation Methods. Carbon Nanotubes and its applications. Quantum Computing. ASSESSMENT SCHEME Continuous Assessment 20% Final Examination 80%

SYLLABUS (39 HOURS) Introduction to Nanotechnology

(6 hours)

Scientific revolutions. Types of nanotechnology. Electronic properties and Quantum Effects. Top down and Bottom up approach. Quantum wells, wires, and dots. Synthesis of Nanomaterials

(3 hours)

Fundamental of film deposition. Physical deposition methods. Chemical deposition methods. Lithography (6 hours)Optical lithography. Extreme ultraviolet lithography. X-ray lithography. Electron beam lithography. Ion Beam lithography. Nanoimprint lithography.

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Page 2: Syllabus

Analysis and Manipulation Methods (9 hours)X-ray analysis methods. Transmission electron microscope. Scanning electron microscope. Electron energy loss spectroscopy. Secondary ion mass spectrometry. X-ray photoelectron spectroscopy and auger electron spectroscopy. Scanning tunneling microscope. Scanning force microscope. Manipulation of atoms and molecules. Carbon Nanotubes and its applications

(9 hours)

Electronic structure of carbon nanotubes. Synthesis of carbon nanotubes. Carbon nanotube interconnects. Carbon nanotube field effect transistors. Electron field emission. Hydrogen storage. Sensors. Quantum Computing

(6 hours)

The principle of quantum computing. Implementations of quantum computes. Single-electron devices. TEXTBOOK 1. Rainer Waser (Editor), “Nanoelectronics and Information Technology – Advanced Electronic

Materials and Novel Devices”, Wiley-VCH Verlag GmbH & Co. 2003. REFERENCE 1. M. Wilson, K. Kannangara, G. Smith, M. Simmons, B. Raguse, “Nanotechnology: Basic Science

and Emerging Technologies”, Chapman & Hall/CRC 2002. 2. Gregory L. Timp, “Nanotechnology”, Springer 1998.

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