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The top documents tagged [lithography technology]
Advanced Photoresist Technology Jie Sun EE 518 Instructor: Dr. Jerzy Ruzyllo Apr. 4 2006
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Final Public_ORTC Model Status Review 2009 vs 2008_Rev 10_w
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Nanoimprint lithography (NIL) 1.Overview. 2.Thermal NIL resists. 3.Residual layer after NIL. 4.NIL for large features (more difficult than small one)
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