the variation of the secondary electron emission …cern.ch/conf-ecloud02/talks/hilleret.pdf ·...
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NH – 2STREAMS/02 1
THE VARIATION OF THE SECONDARY ELECTRON
EM ISSION WITH SURFACE M ODIF ICATIONS
B. Henrist, N. Hilleret, M. Jimenez, C. Scheuerlein, M. Taborelli, G. Vorlaufer
CERN - LHC/VAC
EST-SM
NH – 2STREAMS/02 2
TOPICS:
S E CONDARY ELECTRON YIE LD BEFO RE AND AFTER ELE CTRO N B OMB ARDMENT
THE ”SIMULAT OR” TOOL K IT
VA RIA TION OF GA S FL UX DUR ING CONDIT IONING
CONDE NSED GA SES
SURFA CE MODIFIC ATIONS DUR ING CONDIT IONING
NH – 2STREAMS/02 3
E
Rz
SECONDARY
REFLECTED
SIM ULATOR TOOL KIT
MODEL FOR S ECONDARY ELECTRON EMIS S ION
ASSUMPTIONS : FOR SECONDARIESPRIMARY ELECTRON: CONSTANT ENERGY LOSS :
∂∂E
z
E
R=
ESCAPE PROBABILITY
P A z= × −( )exp /λ
NORMALISATION TO δm, Em TO ELIMINATE PHYSICAL CONSTANTS ( e.g. λ )
(D.C. Joy Journal of microscopy 147,1,51-64, 1987)
SIMPLIFIED BY M. FURMANδ δs MAX
p
MAX
p
MAX
s
sE
E
sE
E
=×
− +
( )
1
NH – 2STREAMS/02 4
CU AS RECEIVED
0.0
0.5
1.0
1.5
2.0
2.5
0 100 200 300 400 500
ENERGY (eV)
SE
CO
ND
AR
Y E
LE
CT
RO
N Y
IEL
D
EXPERIMENTAL
DATA
FIT FURMAN
REFLECTED
FIT + REFLECTED
SIM ULATOR TOOL KIT
MODEL FOR S ECONDARY ELECTRON EMIS S ION
NUMERICAL VALUE TO FIT OUR EXPERIMENTAL DATA:
SAMPLE STATE AS RECEIVED FULLYCONDITIONED
dM A X 2.03 1.13
EM A X 262 318
s 1.39 1.35
PRECEDING APPROXIMATION TO FIT HIGHENERGY PART
IF LOW ENERGY ELECTRONS HAVE TO BECONSIDERED:
REFLECTED NOT NEGLIGIBLE :
NH – 2STREAMS/02 5
ENERGY DISTRIBUTION OF SECONDARY ELECTRON EMITTED BY COPPER
0.00
100.00
200.00
300.00
400.00
500.00
600.00
700.00
800.00
900.00
1000.00
0.00 0.10 0.20 0.30 0.40 0.50 0.60 0.70 0.80 0.90 1.00
NORMALISED ENERGY
NO
RM
AL
ISE
D I
NT
EN
SIT
Y Ep=30 eV
REFLECTED
SECONDARIES
OTHER CONTRIBUTIONS
E
Rz
SECONDARY
REFLECTED
SIM ULATOR TOOL KIT
δ δ δt S R= +
FOR Ep> 300 eVREFLECTED CONTRIBUTION NEGLIGIBLE
S ECONDARY / REFLECTED PROCES S ES COMPLETELY DIFFERENT
NH – 2STREAMS/02 6
SIM ULATOR TOOL KIT
REFLECTED CONTRIBUTION
δ δ δt S R= + => δ δ δ δ δR t t S tf f= × ⇒ = + ×δ δt s f
= ×−( )1
1
FRACTION OF REFLECTED ELECTRONS (f) : NR / NT OT
CAN BE MEASURED FROM PRECEDING CURVES
AND APPROXIMATED BY THE FOLLOWING RELATION:
1(J.J. Scholtz, D. Dijkkamp, R.W.A. Schmitz, Philips J. Res. 50, 375-389, 1996).
USING: A0 = 20.699890, A1= -7.07605, A2= 0.483547, A3= 0, E0=56.914686
ln( ) (ln( )) (ln( )) (ln( ))f A A E E A E E A E Ep p p= + × + + × + + × +0 1 0 2 02
3 03
NH – 2STREAMS/02 7
ENERGY DISTRIBUTION OF SECONDARY ELECTRON EMITTED BY COPPER
0
100
200
300
400
500
600
700
800
900
1000
0.0 0.2 0.4 0.6 0.8 1.0
NORMALISED ENERGY
NO
RM
AL
ISE
D I
NT
EN
SIT
Y
Ep= 10 eVEp=30 eV
Ep= 100 eVEp=300 eVEp=550 eV
NH – 2STREAMS/02 8
RATIO REFLECTED/TOTAL
1%
10%
100%
0 50 100 150 200 250 300
PRIMARY ELECTRON ENERGY
RA
TIO
RE
FL
EC
TE
D/T
OT
AL
REF/TOT
FIT II
FIT II LOW ENERGY
EXP FIT
NH – 2STREAMS/02 9
CU AS RECEIVED
0.0
0.5
1.0
1.5
2.0
2.5
0 200 400 600 800 1000
ENERGY (eV)
SEC
ON
DA
RY
EL
EC
TR
ON
YIE
LD
EXPERIMENTAL DATA (AVERAGE ON 25
SAMPLES)FIT FURMAN
REFLECTED
FIT + REFLECTED
EXP FIT + REFLECTED
NH – 2STREAMS/02 10
CU AS RECEIVED
0.0
0.2
0.4
0.6
0.8
1.0
1.2
1.4
1.6
1.8
0 20 40 60 80 100
ENERGY (eV)
SEC
ON
DA
RY
EL
EC
TR
ON
YIE
LD
EXPERIMENTAL DATA (AVERAGE
ON 25 SAMPLES)FIT FURMAN
REFLECTED
FIT + REFLECTED
FIT + REFLECTED (EXP)
NH – 2STREAMS/02 11
RELATIVE CONTRIBUTIONS IN THE SECONDARY ELECTRON ENERGY DISTRIBUTIONS
0%
10%
20%
30%
40%
50%
60%
70%
80%
90%
10 30 100 300 550INCIDENT ELECTRON ENERGY (eV)
FR
AC
TIO
NTRUE SECONDARIES < 20 eV
FRACT > 20 eV (reflected included)
REFLECTED
INTERMEDIATE ENERGY
NH – 2STREAMS/02 12
SIM ULATOR TOOL KIT
TRUE S ECONDARY ENERGY DIS TRIBUTION
ENERGY DISTRIBUTION FITTED USING THE EXPRESSION:
D E C
E
Es
s
( ) exp
ln
= × −
0
2
22τ
(J.J. S cho ltz, D. Dijkkamp, R.W.A. S chmitz, Philips J. Res . 50, 375-389, 1996).
PRIMARYENERGY
(eV)
C E0 τ UPPERENERGYBOUND
(eV)10 0.277 1.57 0.985 530 0.136 1.9 0.99 22100 .126 1.58 1.16 22300 .155 2.1 0.85 21550 0.2 1.48 0.909 26
NH – 2STREAMS/02 13
. S IMULATOR TOOL KIT
TRUE S ECONDARY ENERGY DIS TRIBUTION
TRUE SECONDARY PEAK
0
0.05
0.1
0.15
0.00 5.00 10.00 15.00 20.00 25.00 30.00
30 eV EXPERIMENT
FIT II
TRUE SECONDARY PEAK
0.00
0.05
0.10
0.15
0.00 5.00 10.00 15.00 20.00 25.00 30.00 35.00
100 eV EXPERIMENT
FIT II
NH – 2STREAMS/02 14
CONDITIONING
VARIATION OF THE MAXIMUM SECONDARY ELECTRON YIELD WITH THE ELECTRON DOSE
1.00
1.20
1.40
1.60
1.80
2.00
2.20
2.40
2.60
1.00E-08 1.00E-07 1.00E-06 1.00E-05 1.00E-04 1.00E-03 1.00E-02
DOSE (C/mm2)
SEC
ON
DA
RY
EL
EC
TR
ON
YIE
LD
DELTA MAX 23-03
DELTA MAX 31-01
ELECTRON GUN measured at 500 eV
DELTA MAX EPA 99V
NH – 2STREAMS/02 15
CONDITIONING
DES ORPTION AND S ECONDARY ELECTRON EMIS S ION
PRIMARYPARTICLE
ENERGY LOSS
ENERGYTRANSMISSION
DESORPTIONELECTRONEMISSION
INCIDENT PARTICLE
STIMULATION OFDIFFUSION,
CREATION OFDEFECTS
NH – 2STREAMS/02 16
VARIATION OF THE ELECTRON INDUCED DESORPTION WITH THE ELECTRON DOSE (AS RECEIVED COPPER)
1.E-05
1.E-04
1.E-03
1.E-02
1.E-01
1.E+00
1E+13 1E+14 1E+15 1E+16 1E+17 1E+18 1E+19 1E+20
ELECTRON DOSE ( cm-2 )
DE
SOR
PT
ION
YIE
LD
RA
TIO
H2
CO
CO2
CH4
C2H6
NH – 2STREAMS/02 17
VARIATION OF THE ELECTRON INDUCED DESORPTION WITH THE BEAM DOSE(AS RECEIVED COPPER)
1.E-04
1.E-03
1.E-02
1.E-01
1.E+00
1E+12 1E+13 1E+14 1E+15 1E+16 1E+17 1E+18 1E+19 1E+20
ELECTRON DOSE (cm-2)
NO
RM
AL
ISE
D
DE
SOR
PT
ION
YIE
LD
0.1
1
NO
RM
AL
ISE
D
SEC
ON
DA
RY
E
LE
CT
RO
N Y
IEL
D
H2
CH4
CO
C2H6
CO2
DELTA MAX 31-01
DELTA MAX 23-03
NH – 2STREAMS/02 18
CONDITIONING
DES ORPTION AND S ECONDARY ELECTRON EMIS S ION
RELATIONS BETWEEN DESORPTION AND CONDITIONING
EASY OBSERVABLE IN ACCELERATOR : GAS FLUX (I.E. PRESSURE)
RELATION BETWEEN CONDITIONING AND GAS FLUX??
VARIATION OF THE SECONDARY ELECTRON YIELD WITH THE DESORPTION YIELD
1.00
1.20
1.40
1.60
1.80
2.00
2.20
2.40
0.00 0.05 0.10 0.15 0.20 0.25 0.30 0.35 0.40 0.45
DESORPTION YIELD (MOL. PER EL.)
SEC
ON
DA
RY
EL
EC
TR
ON
YIE
LD
δδδδ = 10.4 x ηηηη + 1.09
δδδδ = 0.822 x ηηηη + 1.836
DOSE: ~ 1016 e- / cm2
NH – 2STREAMS/02 19
CONDITIONING
DES ORPTION AND S ECONDARY ELECTRON EMIS S ION
RELATIONS BETWEEN SecElectronEmission, FLUX AND CONDITIONING
Q gas flux: Q I I k Q k= × ≈ × ⇒ ≈ × ×η δ η δ,
DOSE VARIATION VERSUS TIME:
D I t I k D D k D t= × ≈ × ( ) ⇒ = × ( ) ×δ δ
OVERSIMPLIFIED TO START,
POSSIBLE INFLUENCE OF PRESSURE ON e CLOUD CURRENT
=>FASTER PROCESSING AS DESORPTION DECREASES ALSO WITH THE DOSE
NH – 2STREAMS/02 20
CONDITIONING
DES ORPTION AND S ECONDARY ELECTRON EMIS S ION
VARIATION OF THE DESORPTION AND ELECTRON EMISSION WITH THE ELECTRON DOSE
DELTA = 64.234 DOSE -0.0961
1.00E-04
1.00E-03
1.00E-02
1.00E-01
1.00E+00
1.00E+15 1.00E+16 1.00E+17 1.00E+18 1.00E+19
ELECTRON DOSE ( e - / cm 2 )
DE
SOR
PT
ION
YIE
LD
(
mol
/ e
- )
0.00
0.50
1.00
1.50
2.00
2.50
SEC
ON
DA
RY
EL
EC
TR
ON
Y
IEL
D
ETA = 15.84 DOSE - 0.5167
NH – 2STREAMS/02 21
CONDITIONING
DES ORPTION AND S ECONDARY ELECTRON EMIS S ION
ACCUMULATED DOSE
1.E+15
1.E+16
1.E+17
1.E+18
1.E+19
0 2000 4000 6000 8000 10000 12000
TIME (arb. units)
AC
CU
MU
LA
TE
D D
OSE
(e
-/cm
2)
1.00
1.20
1.40
1.60
1.80
2.00
2.20
2.40
seco
ndar
y el
ectr
on y
ield
DELTA
CONSTANT
DELTA
VARIABLE CURRENT
DOSE
CONSTANT CURRENT DOSE VARIABLE
CURRENT
NH – 2STREAMS/02 22
CONDITIONING
DES ORPTION AND S ECONDARY ELECTRON EMIS S ION
VARIATION OF SURFACES PROPERTIES WITH CONDITIONNING
1.E-02
1.E-01
1.E+00
1 10 100 1000 10000
TIME ( arb. units)
RA
TIO
TO
IN
ITIA
L V
AL
UE
1.00E-01
1.00E+00
NORMALISED
SEY
NORMALISED
DESORPTION
NORMALISED
DESORBED FLUX
NH – 2STREAMS/02 23
VARIATION OF SURFACES PROPERTRIES WITH CONDITIONNING
ETA = FLUX0.8299
1.E-02
1.E-01
1.E+00
1.E-03 1.E-02 1.E-01 1.E+00
GAS FLUX REDUCTION
SPS 2000
SPS 2001
DELTA = FLUX0.1701
TARGET LHC
CONDITINNING
DES ORPTION AND S ECONDARY ELECTRON EMIS S ION
GAS FLUX PRESSURE IN ACCLERATORS
VARIATION OF FLUX ALLOW TO DEDUCE VARIATION OF ETA AND DELTA
ALLOW TO EXTRAPOLATE FROMSPS TOWARDS LHC
RELATION BETWEEN EL. CLOUD INTENSITY AND DELTA/ETA TO BE REFINED
NH – 2STREAMS/02 24
Maximum SEY from
ondensed Gases on Copper
0
5
10
15
20
25
30
35
0 50 100 150 200 250 30
Gas Coverage ( 1E19 molecules / m2)
Maximum SEY
Ar/Cu(4K)
O2/Cu(77K)
2/Cu(3K)
CO ND ENS ED GA SE S
NO INFLUENCE FOR PRACTICALCOVERAGES
FOR NOBLE GASES
INSULATING
LARGE INCREASE
NH – 2STREAMS/02 25
SURFACE M ODIFICATIONS DURING CONDITIONING
SHIFT IN THE POSITION OF C-KLL PEAK =>
MODIFICATION OF THE CARBON CHEMICAL BOND NO SHIFT FOR OXYGEN
200 220 240 260 280 300
kinetic energy (eV)
N(E
)
2 E-6 C/mm2
2 E-2 C/mm2
NH – 2STREAMS/02 26
SURFACE M ODIFICATIONS DURING CONDITIONING
0
500
1000
1.E-06 1.E-05 1.E-04 1.E-03 1.E-02 1.E-01
Electron dose (C/mm2)
Aug
er p
eak
area
(a.
u.)
C-KLL
Cu-L3M45M45
O-KLL
1E15 1E16 1E17 1E18 1E19
e-/cm2
NH – 2STREAMS/02 27
SURFACE M ODIFICATIONS DURING CONDITIONING
INITIAL DECREASE OF OXYGEN AND CARBON ON THE SURFACE (101 7 e-/cm2)
SMALLER DECREASE FOR OXYGEN:
DESORPTION COMPENSATED BY MORE SIGNAL FROM OXIDE
MAXIMUM COPPER PEAK FOR A DOSE ~ 101 7 e-/cm2
DESORPTION MEASUREMENTS =>6x101 5 mol/cm2 RELEASED FOR THIS DOSE
FOR HIGHER DOSES CARBON PEAK INCREASES
EXPERIMENTS AT VARIABLE PARTIAL PRESSURES OF CO, CH4
=> NO INFLUENCE ON THE DOSE DEPENDENCE
ORIGIN OF THE CARBON??? STILL A QUESTION
CONDITIONING:=> INITIAL CLEANING FOLLOWED BY CARBON LAYER BUILD UP
NH – 2STREAMS/02 28
CONCLUSIONS
IMPORTANCE OF THE CORRECTION FOR REFLECTED ELECTRONS WHEN VERY LOW
INCIDENT ENERGY IMPORTANT IN SIMULATIONS
FORMULAE GIVEN FOR : YIELD AND ENERGY DISTRIBUTION
USUAL CONDENSED GASES HAVE LITTLE EFFECT ON THE SECONDARY ELECTRON
YIELD EXCEPTION : NOBLE GASES AT THICK COVERAGES
DESORPTION AND CONDITIONING PARALLEL PHENOMENA:
GAS FLUX VARIATION IS A GOOD INDICATOR OF THE CONDITIONING PROCESS
SUBTLE CHANGES IN THE SURFACE COMPOSITION PARALLEL (AT THE ORIGIN OF}
CONDITIONING
FORMULA AVAILABLE FOR SIMULATIONS :
NH – 2STREAMS/02 29
RECONDITIONING AFTER AIR EXPOSURE IS