unit i mos transistor theory and process technology
TRANSCRIPT
UNIT IMOS TRANSISTOR THEORY
AND PROCESS TECHNOLOGY
TOPICS
• NMOS and PMOS transistors • Threshold voltage • Body effect • Design equations• Second order effects • MOS models• Small signal AC characteristics • Basic CMOS technology
MOS TRANSISTOR• MOS Metal Oxide Semiconductor• MOS transistor is a majority carrier device,
current is the conducting channel b/w source & drain.
• 2 types of MOS transistor:n-MOS transistorp-MOS transistor
• Various symbol representation for n-MOS & p-MOS
n-MOS
n-MOS
• Majority carriers electrons• When +ive voltage is applied on gate, no. of
electrons will be increased.• So, conductivity of channel is increased.• If Vg < Vt ,Then the channel is cutoff.
• Threshold voltage is the voltage at which MOS device starts to conduct.
p-MOS
• Majority carriers holes
• 2 types of modes in n-MOS & p-MOS:– Enhancement mode– Depletion mode.
• n-MOS Enhancement mode:– Device will be cut off when Vgs= 0
• n-MOS Depletion mode:– Device will conduct even if Vgs= 0
• p-MOS Enhancement mode:– Above Vtp, device will start to conduct.
• p-MOS Depletion mode:– Device will be in conducting state even if Vgs= 0
Conduction characteristics
n-MOS ENHANCEMENT TRANSISTOR
• It has Moderately doped p - type silicon substrate
• In that p-substrate, Heavily doped n + source and drain.
• Channel – a thin insulating layer made up of Silicon dioxide (SiO 2)
• Gate –polycrystaline silicon (polysilicon)
Working principle• When Vgs= 0, Vds is applied.
• There is no current flow b/w source & drain.• When positive voltage is applied to gate,
electric field is produced across p-substrate.• It attracts electrons towards the channel.• It is continued when gate voltage is increased
further, the region below gate will be converted from p-type to n-type.
• So the channel becomes n-type(n-channel).
• Three types of modes of MOS transistor:– Accumulation mode– Depletion mode– Inversion mode
Accumulation mode
• In this mode Vgs < Vt
• Initially p-substrate is having holes only.
Depletion mode
• In this mode Vgs =Vt
• Depletion region is created in this mode .
• Vgs is increased and reach Vt
• So holes are repelled from the channel.
• Because of this, depletion region is created.
Inversion mode
• In this mode Vgs > Vt
• Voltage increased further, so electrons are attracted towards the region below gate.
• So, the layers of electrons will be formed below the gate.
• Bcoz of this layer, this mode is known as inversion mode.
Operation regions of MOS transistor
• Cut-off mode• Non-saturated mode(linear or resistive or
unsaturated mode)• Saturated mode
Cut-off mode
• When Vgs > Vt and Vds = 0.
• Depletion layer is created.• So the region is completely cut-off.
Non-saturated mode
• When Vds < Vgs - Vt
• Deep channel is created in this mode.• Inversion region is weak in this region.
Saturated mode
• Here, Vds > Vgs - Vt and Vgd < Vt
• The channel becomes pinched off.
• Inversion is strong.• Channel current is
controlled by gate voltage & it is independent of drain voltage
• Ids depends following:– Distance b/w source & drain– Channel width– Threshold voltage– Thickness of oxide layer– Dielectric constant of gate insulator– Carrier mobility(μ)
Conclusion
• Three conduction regions are available in nMOS enhancement transistor.
Cut-off region (no current flow)Non-saturated (Id depends Vg and Vd)
Saturated mode (Id independent of Vds )
p-MOS ENHANCEMENT TRANSISTOR