vacuum technology advanced - idv.sinica.edu.tw

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Vacuum Technology advanced Jim Jr-Min Lin 林志民 Institute of Atomic and Molecular Sciences Academia Sinica, Taipei, Taiwan 106 中央研究院 原分所 交大應化系台大化學系 合聘

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Page 1: Vacuum Technology advanced - idv.sinica.edu.tw

Vacuum Technology

advancedJim Jr-Min Lin 林志民

Institute of Atomic and Molecular SciencesAcademia Sinica, Taipei, Taiwan 106

中央研究院 原分所

交大應化系、台大化學系合聘

Page 2: Vacuum Technology advanced - idv.sinica.edu.tw

Basic:

Mean Free Path of gas molecules: Viscose flow Vs. Molecular flow

Gas flow: Throughput, Conductance, Pumping speed

Pumps: Mechanical pump, Roots, Turbo, Diffusion, Dry pumps

Gauges: Mechanical, Thermal conductance, Ionization,

Chambers: Joints (metal, elastomer), parts

Advanced:

Outgas; Baking

Material: SUS, Al alloy, ceramic, plastic,

Virtual leak

Differential pumping

Leak test

Outlines:

Page 3: Vacuum Technology advanced - idv.sinica.edu.tw

Surface Outgas Concernexample: 103 mol H2O, 18 mg, liquid 1.8x102 cm3;gas 2.4x102 L at 1 atm

If there is 0.001 mol of H2O on the chamber surface and if thecorresponding outgas pressure is 107 torr, how long will ittake to pump down to 108 torr when the pumping speed is1000 L/s?

Initial pumping throughput is 107 torr * 1000 L/s = 104 torr L/sTotal amount of water is

1 atm * 2.4x102 L = 760 torr * 2.4x102 L = 1.8 x 101 torr L

Page 4: Vacuum Technology advanced - idv.sinica.edu.tw

i.e. first order rate equation

/

0)(1 teAtAA

dtdA

Assume: outgas rate ∝ water amount ∝ P,i.e. ∝ pump out throughput Q=PS

0 200 400 600 800 10000.000

0.002

0.004

0.006

0.008

0.010

X Axis

F1 = 100^-1*exp(-x/100)F2 = 1000^-1*exp(-x/1000)

Page 5: Vacuum Technology advanced - idv.sinica.edu.tw

0 200 400 600 800 10000.000

0.002

0.004

0.006

0.008

0.010

X Axis

F1 = 100^-1*exp(-x/100)F2 = 1000^-1*exp(-x/1000)

example of exponential decaysame area under both curves

0 500 1000 1500 2000 2500 30001E-8

1E-7

1E-6

1E-5

1E-4

1E-3

0.01F1 = 100^-1*exp(-x/100)F2 = 1000^-1*exp(-x/1000)

Page 6: Vacuum Technology advanced - idv.sinica.edu.tw

hr50s108.1s/torr10

torr108.1rateinitial

amounttotalτ 5

4

1

2.3 = 115 hr to reduce pressure by a factor of 10

Often for a chamber with big surface area

Pump out time constant =

0

/0

t/τ0 ePP PdteP t P

τ1

tP

dd

Big chamber ≠ big surface area

Page 7: Vacuum Technology advanced - idv.sinica.edu.tw
Page 8: Vacuum Technology advanced - idv.sinica.edu.tw

How to minimize surface area

Remove thick surface oxide:

electro polish SUS chamber and parts

basic wash (NaOH solution) Al alloy

acid wash copper/brass parts

sand blast

Oxide could be porous

Dirty surface is thicker

Strong detergent is much more efficient than solventCleaning

Page 9: Vacuum Technology advanced - idv.sinica.edu.tw
Page 10: Vacuum Technology advanced - idv.sinica.edu.tw

Estimate the effect of Baking

When temperature rises by 100 oC, outgas rate rises by roughlytwo orders of magnitude, i.e., 105 torr instead of 107 torr

Initial pumping throughput is 105 torr * 1000 L/s = 102 torr L/s

hr5.0s108.1s/torr10

torr108.1τ 3

2

1

to P = 1010 torr, P0/P = 105 hr11.5PP

lnτΔt 0

Practically, it takes a little bit longer (≲100 hr)

∵ Single exponential delay is only an approximation

Deeper water has smaller outgas rate, thus longer

Page 11: Vacuum Technology advanced - idv.sinica.edu.tw

bake uniformly is important to avoid distortion

Don’t bake oily surface. oil tar

Aluminum foil on SUS chamber, heating tape on the

aluminum foil, another layer of aluminum foil to

reduce heat loss

Degas ion gauge during baking

Clean ion gauge and its surrounding by excess heating

Page 12: Vacuum Technology advanced - idv.sinica.edu.tw

Estimate the effect of using plastic parts

plastic may absorb H2O to 1~2 % w/w

Assume 100 g plastic can absorb ~1.8 g H2O = 0.1 mol

If the initial outgas pressure is 107 torr, = 5000 hrIf the initial outgas pressure is 106 torr, = 500 hr

more troublesome is that most plastics cannot be baked

PVC,bad for vacuum!!

PE, PPOK for vacuum

Page 13: Vacuum Technology advanced - idv.sinica.edu.tw

Use only1) Inert material: Teflon, PE, PP, Kel-F, Viton,

Teflon insulated wire

2) High temperature material :polyimide (Vespel, Kapton),Kalrez perfluoro elastomer (O-ring)

Less absorption

Bakable to 200oC

plasticnormal101

Page 14: Vacuum Technology advanced - idv.sinica.edu.tw

Material outgas (volume outgas)

SUS: H2 & CO.

SUS316L can be vacuum firing at 1000 oC to removedeeper contaminants

Al alloy: less H2 & CO. Bakable to 120 oC

Zn & Cd alloy have high vapor pressure

High temperature increase outgas @ bake out

Cooling can reduce outgas @ use

It lasts forever! More than your life!

Page 15: Vacuum Technology advanced - idv.sinica.edu.tw

An interesting new technology

Page 16: Vacuum Technology advanced - idv.sinica.edu.tw
Page 17: Vacuum Technology advanced - idv.sinica.edu.tw

Metal seal: copper gasket & ConFlat flange are preferred

Sealing Concern:

100% seallow outgasbakable

O-ring seal: Viton O-ring bakable to 100 oC15 ~ 18 % compression to sealvolume compression is not allowed sealing surface polish is important

small leak is possible(Hard to find small leaks)

convenientnon-consuming

Careful to use viton gasket on conflat flanges very easy to leakfor size larger than4.5”O.D.

two surfaces may fuse togetheruse silver plated screws in SUS taps

not cheap

Page 18: Vacuum Technology advanced - idv.sinica.edu.tw

pump

Leak Rate is similar to Conductance

760 torrP

Through put = (760 –P)*L, L=leak rate, P<<760 torr

Caution: water leak is very dangerous!

Density of water vapor ≑density of liquid water /1300that is, a small liquid leak is a huge gas leak.

liquid:18g/18cc

vapor:18g/24 ℓ

Page 19: Vacuum Technology advanced - idv.sinica.edu.tw

Dynamic Seal

a virtual leak

without differential pumping

760 torr * L = 10-7 torr * 1000 ℓ/s

Leak rate L = 1.3 x107 ℓ/s

760 torr

107 torr

1000 ℓ/s

760 torr760 torr

P20.1 ℓ/s

P3

with differential pumping

760 torr * L = P2 * 0.1 ℓ/s

P2 = 1 x103 torr

P2*L=P3*1000 ℓ/s

P3= 1.3x1013 torr

rotatableor

translational

1000 ℓ/s

Page 20: Vacuum Technology advanced - idv.sinica.edu.tw

O-ring: 15 2 % compression + Greasepolished surfaces to have the above leak rateCareless work makes 1~2 orders worse

O-ring may trap gas & water⇒ small Virtual leak

O-ring seal is cheaper and easily being machined

Page 21: Vacuum Technology advanced - idv.sinica.edu.tw

If there is a “black hole”pump,

2lim

//

7.3/ cm

AamuMKT

sS

For pumping port = 20 cm,

A = 314 cm2,

Slim(air) = 3750 L/s

(Conductance of an Aperture)

Page 22: Vacuum Technology advanced - idv.sinica.edu.tw
Page 23: Vacuum Technology advanced - idv.sinica.edu.tw

S/Slim84% ~ 140% ~ 1/215% < 1/238% ~ 1/2

Slim47433750142293182

Page 24: Vacuum Technology advanced - idv.sinica.edu.tw

Leak Check, not a trivial Job!

Spread CH3OH or C2H5OH on a possible leak to see if pressure rises

Acetone is OK for metal, bad for O-ring, bad for healthResponse rise time ~ few seconds, Don’t move too fast.It takes very long to dry out the solvent. Very long fall time !!From lower spots to higher spots.

350 400 450 500 5500.0

0.5

1.0

1.5

2.0

Ave

rage

Cha

mbe

rP

ress

ure

Time, ms

Liquid

Gas

few hours is possible

Page 25: Vacuum Technology advanced - idv.sinica.edu.tw

Helium leak check:Spread He to see if PHe risesMASS is required. RGA or He leak detectorfast ≲1 sec ∵ light mass ∴ fast speedHe is fast to escape, fast to pump downlow background, inertfrom higher spots to lower spotsHe is easy to reach a nearby spot.

⇒ isolation

35 40 45 50 550.0

0.5

1.0

1.5

2.0

Ave

rage

Cha

mbe

rP

ress

ure

Time, ms

Page 26: Vacuum Technology advanced - idv.sinica.edu.tw
Page 27: Vacuum Technology advanced - idv.sinica.edu.tw

high m28/m32 (4:1) indicate air leak

daughter ion is useful. CO+ / C+ , O+ Vs. N2+ / N+

Don’t make vacuum chamber wet, especially at a rainy dayH2O is very common

RGA provide very important information

ontransmissiquadrupoleTtioncrossionization

Theightpeak

Q

EI

QEI

sec

Page 28: Vacuum Technology advanced - idv.sinica.edu.tw

Good vacuum practices

No leak

Clean: traps for oil pumps: molecular sieve, LN2

Metal & non-porous ceramic is excellent

Plastic and grease: as less as possible

Confident sealing. Finding a leak is very labor-consuming.

Bakable for 10-10 torr or better

Good Local Conductance for pumping speed concern.

Gas composition (partial pressure) is often more important than thetotal pressure, as most vacuum parameters are species dependent.e.g. surface laser burn, background masses

RGA is very nice to have (it is cheap now)

Page 29: Vacuum Technology advanced - idv.sinica.edu.tw

Example of utilizing a sorption pump to recycle isotope gases

turbo pump2000 ℓ/s

P1= 1x105 torr

O2 (18O, 97%, > NT$30,000/ℓ)

If foreline pump = mechanical pump,O2 will be mixed with air and oil.

If foreline pump = molecular sievesorption pump, O2 can be absorbed atliquid nitrogen temperature andretrieved at room temperature.

molecular sieve

gas inlet

25mm

6mm= valve

foreline pump

Page 30: Vacuum Technology advanced - idv.sinica.edu.tw
Page 31: Vacuum Technology advanced - idv.sinica.edu.tw

Untra High Vacuum < 1x1010 torr

Example of 1 x 1012 torr

Practically

clean chamber, turbo pump, not baked, 109 torr

clean chamber, 2 serial turbo pumps, baked, 1011 torr

(compression ratio for H2)

Page 32: Vacuum Technology advanced - idv.sinica.edu.tw

LN2 78K

<10K

50K

He cold head

(remove displacer to bake)

room temperature5x1011 torr

LN2 3x1011 torr(much cleaner)

cold head1x1012 torr

Page 33: Vacuum Technology advanced - idv.sinica.edu.tw
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How to make Ultra High Vacuum (UHV):

Outgas rate = pumping speed x pressure

~ 100 L/s x 10-11 torr

Effectivepumping speed

Bakable to remove water and light/medium hydrocarbon.

Low temperature to reduce outgas of all species

CSS pump

111

Page 38: Vacuum Technology advanced - idv.sinica.edu.tw

Turbo pumps: 400 L/s, 600 L/s

compression ratio: 102 ~104 for H2, 106 for He,109 for N2

Baking Temp <125oC

Oil, grease, or magnetic bearing and insulated wires

Foreline back stream when Electric shutdown

Getter pumps: Ion, Ti, Non Evaporative Getter (NEG)

No foreline needed, no continuous electricity needed

250oC, 400oC

Not for every gas, memory effect

Low maintenances for low load systems

Page 39: Vacuum Technology advanced - idv.sinica.edu.tw

Cryopumps: >1500 L/s,

bake to 70oC only,

Not for every gas, memory effect

Outgas due to activated carbon absorber

Electric shutdown

Cryopump + turbo pump:

Very high pumping speed even for H2 at 109 torr

Page 40: Vacuum Technology advanced - idv.sinica.edu.tw

Bakable Cryohead without absorber:

high pumping speed for H2 at <1011 torr

Low outgas 1012 torr

hr9sec103.3torr103

sectorr101 411

6

Time for Monolayer H2 Adsorption